JP2001024110A - Resin sealed semiconductor device - Google Patents

Resin sealed semiconductor device

Info

Publication number
JP2001024110A
JP2001024110A JP19775699A JP19775699A JP2001024110A JP 2001024110 A JP2001024110 A JP 2001024110A JP 19775699 A JP19775699 A JP 19775699A JP 19775699 A JP19775699 A JP 19775699A JP 2001024110 A JP2001024110 A JP 2001024110A
Authority
JP
Japan
Prior art keywords
resin
heat
semiconductor device
mold
lead frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19775699A
Other languages
Japanese (ja)
Other versions
JP4120101B2 (en
Inventor
Hisanori Takenaka
久宜 竹中
Shinichi Hirose
伸一 広瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denso Corp filed Critical Denso Corp
Priority to JP19775699A priority Critical patent/JP4120101B2/en
Publication of JP2001024110A publication Critical patent/JP2001024110A/en
Application granted granted Critical
Publication of JP4120101B2 publication Critical patent/JP4120101B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent short circuit between a heat-radiation plate and an inner lead, and effectively transfer heat from the inner lead, related to a resin sealed semiconductor device incorporated a heat radiation plate formed by injecting a resin with a die. SOLUTION: A lead frame 3 where a semiconductor element 2 is mounted is provided on one surface of a heat radiation plate 10. The heat radiation plate 10, semiconductor element 2, and lead frame 3 are sealed with a resin 5. Related to the heat radiation plate 10, an outer edge (heat dispersion part) 10b is bent in the opposite direction on the side where the lead frame 3 is arranged. Thus, the resin flows downward to the heat radiation plate 10 when the resin is injected into a die, so the tilt and rise of the heat radiation plate 10 are prevented at resin molding. Since the interval between the inner lead 3b and the heat radiation plate 10 is larger, the contact between them is easily prevented.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、放熱板(ヒートス
プレッダ)を内蔵する樹脂封止型半導体装置に関する。
[0001] 1. Field of the Invention [0002] The present invention relates to a resin-sealed semiconductor device having a built-in heat sink (heat spreader).

【0002】[0002]

【従来の技術】近年、ロジック回路とパワー素子の混在
するチップの普及およびロジック回路の規模の増大等に
伴う消費電力の上昇により、多ピンタイプのモールドパ
ッケージの低熱抵抗化が望まれている。この目的のた
め、従来より半導体装置の樹脂成形を行う際に、熱伝導
率のよいAlやCu等の金属からなる放熱板(ヒートス
プレッダ)を金型内に投げ込み、樹脂で同時に成形する
タイプの樹脂封止型半導体装置がある。この樹脂封止型
半導体装置について図5、図6に基づいて説明する。図
5(a)は樹脂封止型半導体装置の概略構成を示す平面
図であり、図5(b)は図5(a)のB−B断面図であ
り、図6(a)は放熱板の平面図であり、図6(b)は
図6(a)のC−C断面図である。なお、図5(a)で
は半導体チップ2とインナリード3bとを接続するワイ
ヤ6を省略している。
2. Description of the Related Art In recent years, with the spread of chips in which a logic circuit and a power element are mixed and an increase in power consumption due to an increase in the scale of a logic circuit, it is desired to reduce the thermal resistance of a multi-pin type mold package. For this purpose, conventionally, when performing resin molding of a semiconductor device, a heat sink (heat spreader) made of a metal such as Al or Cu having a good thermal conductivity is thrown into a mold, and the resin is molded simultaneously with the resin. There is a sealed semiconductor device. This resin-sealed semiconductor device will be described with reference to FIGS. 5A is a plan view showing a schematic configuration of a resin-sealed semiconductor device, FIG. 5B is a cross-sectional view taken along the line BB of FIG. 5A, and FIG. 6 (b) is a cross-sectional view taken along the line CC of FIG. 6 (a). In FIG. 5A, the wires 6 connecting the semiconductor chip 2 and the inner leads 3b are omitted.

【0003】図5(a)(b)に示すように、この種の
樹脂封止型半導体装置100は、一般に、パワーMOS
FET等を含んだ半導体チップ2と、この半導体チップ
2を搭載するアイランド部3aを有するリードフレーム
3と、半導体チップ2の放熱を促進するための放熱板1
0′とをモールド樹脂5で封止したパッケージ形態を採
用している。金型内に半導体チップ2、リードフレーム
3、放熱板10′を配置した状態で、樹脂5を注入、充
填することにより形成される。
As shown in FIGS. 5A and 5B, this type of resin-sealed semiconductor device 100 is generally a power MOS type.
A semiconductor chip 2 including an FET and the like, a lead frame 3 having an island portion 3a on which the semiconductor chip 2 is mounted, and a heat radiating plate 1 for promoting heat radiation of the semiconductor chip 2
0 ′ is sealed with a mold resin 5. It is formed by injecting and filling a resin 5 in a state where the semiconductor chip 2, the lead frame 3, and the heat sink 10 'are arranged in a mold.

【0004】このような放熱板10′を内蔵する半導体
装置100は、放熱板10′とリードフレーム3とが独
立した別個の部品であり、放熱板10′は他の部品と固
着しておらず、成形金型7に投げ込んだだけの構造であ
ることから、「ドロップイン方式」のヒートスプレッダ
内蔵型パッケージと呼ばれている。
In the semiconductor device 100 incorporating such a heat sink 10 ', the heat sink 10' and the lead frame 3 are separate and independent components, and the heat sink 10 'is not fixed to other components. It is called a “drop-in type” heat spreader built-in type package because it is simply thrown into the molding die 7.

【0005】放熱板10′は、図6(a)(b)に示す
ように、半導体チップ2から発生した熱がリードフレー
ム3のアイランド部3aを介して伝達される熱伝達部1
0a′と、熱をパッケージ全体に広げて熱抵抗を下げる
熱拡散部10b′と、放熱板が樹脂成形時に外部に露出
しないように支える突出部10c′とから構成されてい
る。図5(b)に示すように、通常はリードフレーム3
のアイランド部3aをダウンセットすることによって、
インナリード3bと放熱板10′との接触(ショート)
を防止している。
As shown in FIGS. 6 (a) and 6 (b), the heat radiating plate 10 'has a heat transfer portion 1 to which heat generated from the semiconductor chip 2 is transmitted through the island portion 3a of the lead frame 3.
0a ', a heat diffusion portion 10b' for spreading the heat over the entire package to lower the thermal resistance, and a projecting portion 10c 'for supporting the heat sink so as not to be exposed to the outside during resin molding. Normally, as shown in FIG.
By setting the island portion 3a of
Contact between inner lead 3b and heat sink 10 '(short)
Has been prevented.

【0006】[0006]

【発明が解決しようとする課題】上記の製造方法は、樹
脂封止型半導体装置を簡便で安価に作成することができ
るが、以下のような問題があった。すなわち、金型内へ
の樹脂注入時には、放熱板10′が固定されていないた
め、樹脂成形時に放熱板10′が著しく傾くとインナリ
ード3bと放熱板10′とが接触し、ショート不良を発
生させる場合がある。また、インナリード3bと放熱板
10′との接触を防ぐためにリードフレーム3の下方空
間を大きくした場合には、図7に示すように、放熱板1
0′とアイランド部3aとの隙間が大きくなり熱抵抗が
大きくなってしまい放熱性が悪くなるという問題があっ
た。
According to the above-mentioned manufacturing method, a resin-encapsulated semiconductor device can be simply and inexpensively manufactured, but has the following problems. That is, when the resin is injected into the mold, the heat radiating plate 10 'is not fixed. Therefore, if the heat radiating plate 10' is extremely inclined during the resin molding, the inner lead 3b and the heat radiating plate 10 'come into contact with each other to cause a short circuit. May be caused. When the space below the lead frame 3 is increased in order to prevent the inner lead 3b from contacting the heat sink 10 ', as shown in FIG.
There has been a problem that the gap between 0 'and the island portion 3a is increased, the thermal resistance is increased, and the heat dissipation is deteriorated.

【0007】このような問題を防ぐため、特開平8−7
0016号公報に記載の半導体装置では、樹脂成形金型
に凹部を設け、その部分に放熱板をはめ込むことにより
樹脂注入時の放熱板の位置ずれを防止している。しかし
ながら、この方法では金型内での放熱板の浮き上がりを
防止することはできず、放熱板がインナリードと接触し
てショートする可能性があった。また、金型に切り込み
を作るため、成形物の型離れが悪くなるという問題があ
る。
In order to prevent such a problem, Japanese Patent Application Laid-Open No.
In the semiconductor device described in Japanese Unexamined Patent Publication No. 0016, a concave portion is provided in a resin molding die, and a heat radiating plate is fitted into the concave portion to prevent displacement of the heat radiating plate during resin injection. However, this method cannot prevent the heat sink from floating in the mold, and there is a possibility that the heat sink contacts the inner lead to cause a short circuit. In addition, there is a problem in that a cut is formed in the mold, so that the mold is hardly separated from the mold.

【0008】一方、特開昭61−194861号公報に
記載の半導体装置では、半導体チップが配置されるアイ
ランド部と、その下方の放熱板に突出部を設けることに
よって放熱板を固定しているが、この方法ではアイラン
ド部周辺に突出部を設けるためにインナリードの形状に
大きな制約が生じるという問題があった。
On the other hand, in the semiconductor device described in Japanese Patent Application Laid-Open No. 61-194861, the heat radiating plate is fixed by providing a projecting portion on the island portion on which the semiconductor chip is arranged and the heat radiating plate below the island portion. However, in this method, there is a problem that the shape of the inner lead is largely restricted because the protrusion is provided around the island portion.

【0009】そこで、本発明は上記点に鑑みて、金型を
用いて樹脂を注入することにより形成される放熱板を内
蔵型の樹脂封止型半導体装置において、放熱板とインナ
リードとのショートを防止するとともにインナリードか
らの熱伝達を効果的に行うことを可能とすることを目的
とする。
In view of the above, the present invention is directed to a resin-sealed semiconductor device having a built-in heat sink formed by injecting a resin using a mold, and a short circuit between the heat sink and the inner lead. It is an object of the present invention to prevent the occurrence of heat and effectively conduct heat transfer from the inner lead.

【0010】[0010]

【課題を解決するための手段】本発明は、従来において
は、放熱板が平板形状であったため、金型内への樹脂注
入時における挙動が不安定であるため上記問題が発生す
る点に着目してなされたものであり、請求項1に記載の
発明では、放熱板(10)は、外縁部(10b)がリー
ドフレーム(3)の配置側の反対方向に折り曲げられて
いることを特徴としている。
SUMMARY OF THE INVENTION The present invention focuses on the point that the above-described problem occurs because the behavior of the resin at the time of injecting the resin into the mold is unstable because the heat radiation plate has a flat plate shape. In the invention according to the first aspect, the heat radiating plate (10) is characterized in that the outer edge portion (10b) is bent in a direction opposite to the side where the lead frame (3) is arranged. I have.

【0011】放熱板(10)をこのような形状にするこ
とにより、樹脂注入時における放熱板(10)の挙動を
積極的に制御することができる。すなわち、樹脂の流れ
が放熱板(10)に対して下向きに働くことになり、樹
脂成形の際に放熱板(10)の傾きや上昇を防止するこ
とができる。また、インナリード(3b)と放熱板(1
0)との間隔が大きくなるので、これらの接触を容易に
防止できる。
By forming the heat radiating plate (10) in such a shape, the behavior of the heat radiating plate (10) during resin injection can be positively controlled. That is, the flow of the resin acts downward with respect to the radiator plate (10), so that the resin plate can be prevented from tilting or rising during resin molding. Also, the inner lead (3b) and the heat sink (1
0), the contact therebetween can be easily prevented.

【0012】また、請求項2に記載の発明では、放熱板
(10)は、リードフレーム(3)の配置側の反対方向
に突出した突出部(10c)を備え、外縁部(10b)
の折り曲げ量は突出部(10c)の突出量より小さいこ
とを特徴としている。
According to the second aspect of the present invention, the heat radiating plate (10) is provided with a protruding portion (10c) protruding in a direction opposite to the side where the lead frame (3) is disposed, and the outer edge portion (10b).
Is characterized in that the amount of bending is smaller than the amount of protrusion of the protrusion (10c).

【0013】なお、上記各手段の括弧内の符号は、後述
する実施形態に記載の具体的手段との対応関係を示すも
のである。
The reference numerals in parentheses of the above means indicate the correspondence with specific means described in the embodiments described later.

【0014】[0014]

【発明の実施の形態】以下、本発明を図に示す実施形態
について説明する。図1は本発明の実施形態に係る樹脂
封止型半導体装置(以下、半導体装置という)1の断面
図である。本例の半導体装置1は、QFP(Quad
Flat Package)であり、例えば、自動車に
おけるエンジン制御ECU、ABS用ECU等に用いら
れるドライバICあるいは電源ICのような電力用半導
体装置に用いられる。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram showing a first embodiment of the present invention. FIG. 1 is a sectional view of a resin-sealed semiconductor device (hereinafter, referred to as a semiconductor device) 1 according to an embodiment of the present invention. The semiconductor device 1 according to the present embodiment has a QFP (Quad
Flat package), which is used, for example, in a power semiconductor device such as a driver IC or a power supply IC used in an engine control ECU, an ABS ECU, or the like in an automobile.

【0015】ここで、図1に示す半導体装置1は、上記
図5に示した半導体装置100において、放熱板の構成
を変えたのみであるため、上記図5と同一部分について
は、図中、同一符号を付する。また、図2(a)は放熱
板10の平面図であり、図2(b)は図2(a)のA−
A断面図である。半導体装置1は平面矩形状となってい
る。
Here, the semiconductor device 1 shown in FIG. 1 is different from the semiconductor device 100 shown in FIG. 5 only in the configuration of the heat radiating plate. The same reference numerals are given. FIG. 2A is a plan view of the heat sink 10, and FIG.
It is A sectional drawing. The semiconductor device 1 has a planar rectangular shape.

【0016】半導体装置1は、放熱板10と、この放熱
板10の上面に配置されたリードフレーム3と、半導体
チップ(半導体素子)2とが収納され、これらの部材
は、例えばエポキシ樹脂等からなるモールド樹脂5にて
薄型矩形状に封止され一体化されている。
The semiconductor device 1 houses a heat sink 10, a lead frame 3 arranged on the upper surface of the heat sink 10, and a semiconductor chip (semiconductor element) 2, and these members are made of, for example, epoxy resin. It is sealed and integrated in a thin rectangular shape with a mold resin 5.

【0017】リードフレーム3は、半導体チップ2を搭
載するアイランド部3aと、アイランド部3a周囲から
モールド樹脂5外部に引き出された複数本のリード部3
b、3cとから構成されている。リード部3b、3c
は、モールド樹脂5内に位置する部分であるインナリー
ド3bと、モールド樹脂5外部に引き出された部分であ
るアウタリード3cとからなる。なお、アイランド部3
aは、リードフレーム3のうちモールド樹脂5外部の図
示しない部分と連結されている。
The lead frame 3 includes an island portion 3a on which the semiconductor chip 2 is mounted, and a plurality of lead portions 3 drawn out of the mold resin 5 from around the island portion 3a.
b, 3c. Leads 3b, 3c
Is composed of an inner lead 3b which is a part located in the mold resin 5, and an outer lead 3c which is a part drawn out of the mold resin 5. The island 3
a is connected to a portion (not shown) of the lead frame 3 outside the mold resin 5.

【0018】そして、リードフレーム3のアイランド部
3aには、半導体チップ2が、Agペースト等の導電性
樹脂もしくは半田等の接着部材(図示せず)を介して搭
載されている。半導体チップ2は、各インナリード3b
とワイヤボンディングにより接続され、リード部3b、
3c及びワイヤ6を介して、半導体チップ2と外部との
電気信号のやり取りが可能となっている。
The semiconductor chip 2 is mounted on the island portion 3a of the lead frame 3 via a conductive resin such as Ag paste or an adhesive (not shown) such as solder. The semiconductor chip 2 includes the inner leads 3b
To the lead portion 3b,
An electric signal can be exchanged between the semiconductor chip 2 and the outside via the wires 3c and the wires 6.

【0019】上記放熱板10は、0.1〜0.5mm程
度の板厚を有するアルミニウム合金あるいは銅合金等の
熱伝導性に優れた材料から形成される。放熱板10は、
図2(a)(b)に示すように、半導体チップ2から発
生した熱がリードフレーム3のアイランド部3aを介し
て伝達される熱伝達部10aと、熱をパッケージ全体に
広げて熱抵抗を下げる熱拡散部10bと、放熱板が樹脂
成形時に外部に露出しないように支える突出部10cと
から構成されている。熱拡散部10bは本発明でいう外
縁部を構成する。
The heat radiating plate 10 is made of a material having excellent thermal conductivity such as an aluminum alloy or a copper alloy having a thickness of about 0.1 to 0.5 mm. The heat sink 10
As shown in FIGS. 2A and 2B, the heat generated from the semiconductor chip 2 is transmitted through the island portion 3a of the lead frame 3, and the heat transfer portion 10a spreads the heat over the entire package to reduce the thermal resistance. It is composed of a heat diffusion portion 10b to be lowered, and a protruding portion 10c that supports the heat dissipation plate so as not to be exposed to the outside during resin molding. The heat diffusion portion 10b constitutes an outer edge in the present invention.

【0020】放熱板10はプレス加工等にて形成され
る。熱伝達部10aは平板形状に形成され、熱拡散部1
0bは、パッケージ全体への熱の伝導性を高めるととも
に、樹脂成形時に放熱板10下方への樹脂充填性を高め
るために放射形状に形成され、突出部10cは、放熱板
10が樹脂成形時に外部に露出しないように支持するた
め、熱伝達部10aからリードフレーム3が配置された
側の反対方向(図1、図2(b)中下方)に突出形成さ
れている。本実施形態では突出部10cの突出量を0.
5mm程度としている。
The radiator plate 10 is formed by press working or the like. The heat transfer section 10a is formed in a flat plate shape,
0b is formed in a radial shape in order to increase the heat conductivity to the entire package and to enhance the resin filling property below the heat radiating plate 10 at the time of molding the resin. In order to support the lead frame 3 so as not to be exposed, the protrusion is formed in a direction opposite to the side on which the lead frame 3 is disposed (downward in FIGS. 1 and 2B) from the heat transfer portion 10a. In the present embodiment, the amount of protrusion of the protrusion 10c is set to 0.
It is about 5 mm.

【0021】図1、図2(b)に示すように、熱拡散部
10bは熱伝達部10aからリードフレーム3が配置さ
れた側の反対方向に折り曲げられている。このとき、熱
拡散部10bの先端部が突出部10cより下方にならな
いようにする必要がある。上記のように本実施形態で
は、突出部10cの突出量は0.5mm程度なので、熱
拡散部10bの折曲量は熱伝達部10aから0.1〜
0.3mm程度としている。
As shown in FIGS. 1 and 2B, the heat diffusion portion 10b is bent from the heat transfer portion 10a in a direction opposite to the side on which the lead frame 3 is disposed. At this time, it is necessary to prevent the tip of the heat diffusion unit 10b from being lower than the protrusion 10c. As described above, in the present embodiment, since the protrusion amount of the protrusion 10c is about 0.5 mm, the bending amount of the heat diffusion unit 10b is 0.1 to 0.1 mm from the heat transfer unit 10a.
It is about 0.3 mm.

【0022】次に、上記構成の半導体装置1の製造方法
について、金型7内への樹脂注入時の樹脂5の流れを示
す図3を参照して述べる。なお、図3ではワイヤ6を省
略している。まず、所定の温度に加熱された金型(成形
金型)7の下型7bに放熱板10単体を落とし込む。そ
の後、半導体チップ2が搭載され且つワイヤボンディン
グされたリードフレーム3を、アイランド部3aと放熱
板10の熱伝達部10aとを当接させて、下型7bにセ
ットする。
Next, a method of manufacturing the semiconductor device 1 having the above configuration will be described with reference to FIG. 3 showing a flow of the resin 5 when the resin 5 is injected into the mold 7. In FIG. 3, the wires 6 are omitted. First, the heat sink 10 alone is dropped into a lower mold 7b of a mold (molding mold) 7 heated to a predetermined temperature. Thereafter, the lead frame 3 on which the semiconductor chip 2 is mounted and wire-bonded is set on the lower die 7b by bringing the island portion 3a into contact with the heat transfer portion 10a of the heat sink 10.

【0023】そして、金型7の上型7aをセットし、金
型7内にモールド樹脂5を軟化状態で注入、充填するこ
とで樹脂封止を行なう。まず、金型7の熱により粘度の
下がったモールド樹脂5が、金型7の下型7bに設けら
れたゲート(注入口)8からキャビティ9内に注入、充
填される。このとき、本実施形態の放熱板10は熱拡散
部10bが下方に折り曲げられているので、樹脂の流れ
方向は図3中矢印に示すように放熱板10に対して下向
きになる。樹脂硬化後、アウタリード3cに半田を付け
る表面処理等を行い、最後に、このアウタリード3cを
所定の形状に加工することにより、半導体装置1が完成
する。
Then, the upper mold 7a of the mold 7 is set, and the mold resin 5 is injected and filled in the mold 7 in a softened state to perform resin sealing. First, the mold resin 5 whose viscosity has been reduced by the heat of the mold 7 is injected and filled into the cavity 9 from a gate (injection port) 8 provided in the lower mold 7b of the mold 7. At this time, since the heat diffusion portion 10b of the heat sink 10 of the present embodiment is bent downward, the flow direction of the resin is downward with respect to the heat sink 10 as indicated by the arrow in FIG. After the resin is hardened, surface treatment for soldering the outer leads 3c is performed, and finally, the outer leads 3c are processed into a predetermined shape, thereby completing the semiconductor device 1.

【0024】以上のように本実施形態の放熱板によれ
ば、樹脂注入時における放熱板の挙動を積極的に制御す
ることが可能となる。すなわち、通常、放熱板10とイ
ンナリード3aとの接触は、金型内への樹脂注入時に放
熱板10が傾いたり上昇することにより発生する。これ
に対し、本実施形態のように放熱板10の熱拡散部10
bを下方に折り曲げることによって、図3に示すよう
に、金型内での樹脂の流れが放熱板10に対して下向き
になり、放熱板の下方に樹脂が入り込む際にも放熱板に
は確実に下向きの力が働くことになる。従って、本実施
形態の放熱板では、従来の平面形状の放熱板のように金
型内で傾いたり上昇することを防止できる。
As described above, according to the heat sink of the present embodiment, the behavior of the heat sink during resin injection can be positively controlled. That is, the contact between the radiator plate 10 and the inner lead 3a usually occurs when the radiator plate 10 tilts or rises when the resin is injected into the mold. On the other hand, as in the present embodiment, the heat diffusion portion 10
By bending b downward, as shown in FIG. 3, the flow of the resin in the mold is directed downward with respect to the radiator plate 10, so that even when the resin enters below the radiator plate, the radiator plate is securely placed. A downward force will act on Therefore, in the heat sink of the present embodiment, it is possible to prevent the heat sink from being inclined or rising in the mold as in the case of the conventional flat heat sink.

【0025】また、放熱板10が何らかの原因で傾いた
まま金型内にセットされた場合であっても、上記のよう
な形状であれば突出部10cと熱拡散部10bの先端部
が金型内で移動を制限されることになり、従来の平面形
状の放熱板に比較して金型内での傾きを大幅に小さくす
ることができる。
Even when the heat sink 10 is set in the mold while being inclined for some reason, if the shape is as described above, the protruding portion 10c and the tip of the heat diffusion portion 10b may be in the mold. The movement inside the mold is restricted, and the inclination in the mold can be greatly reduced as compared with the conventional flat heat sink.

【0026】また、放熱板10とインナリード3bとの
接触(ショート)は、放射状形状の熱拡散部10bの先
端部で最も発生しやすいが、本実施形態では、熱拡散部
10bの先端に行くに従いインナリード3bから離れる
ように形成されているので、放熱板10とインナリード
3bとの接触を容易に防止できる。
The contact (short) between the heat sink 10 and the inner lead 3b is most likely to occur at the tip of the radial heat diffusion portion 10b, but in the present embodiment, the contact goes to the tip of the heat diffusion portion 10b. Therefore, contact between the heat sink 10 and the inner leads 3b can be easily prevented.

【0027】また、半導体装置1の樹脂の厚さは薄い方
が熱抵抗を低下させることができるので、放熱板10を
配置する下型7bは、可能な限り薄くすることが求めら
れる。しかし、樹脂厚を薄くした場合に、アイランド部
3aと放熱板10との間隔を大きくすることのみでイン
ナリード3bとのショートを防止すると、放熱板10下
方の樹脂厚が薄くなってしまい、樹脂の未充填等の成形
不良を起こしやすい。これに対し、本実施形態のように
熱拡散部10bの先端を下方に折り曲げ加工した場合
は、アイランド部3aと放熱板10との隙間を小さくす
ることができるので、放熱板10下方において樹脂厚が
薄い部分を最小限にすることができ、樹脂の未充填等を
防止できる。さらに、アイランド部3aと放熱板10と
の間隔を小さくできることは、熱抵抗低下の観点からも
有効である。
Since the thinner the resin of the semiconductor device 1 is, the lower the thermal resistance can be, the lower mold 7b on which the heat radiating plate 10 is disposed is required to be as thin as possible. However, in the case where the resin thickness is reduced, if a short circuit between the inner lead 3b and the inner lead 3b is prevented only by increasing the distance between the island portion 3a and the heat radiating plate 10, the resin thickness below the heat radiating plate 10 becomes small. It is easy to cause molding failure such as unfilling. On the other hand, when the distal end of the heat diffusion portion 10b is bent downward as in the present embodiment, the gap between the island portion 3a and the radiator plate 10 can be reduced. However, a thin portion can be minimized, and unfilled resin can be prevented. Further, it is effective from the viewpoint of reducing the thermal resistance that the distance between the island portion 3a and the heat sink 10 can be reduced.

【0028】(他の実施形態)なお、リードフレームの
アイランド部に接する熱伝達部を上記実施形態の放熱板
のように平板形状でなく、図4に示すような凸形状にし
て、さらに熱拡散部10bの下方への折り曲げを組み合
わせることにより、樹脂厚の厚い半導体装置にも容易に
対応することが可能になる。
(Other Embodiments) Note that the heat transfer portion in contact with the island portion of the lead frame is not a flat plate like the heat sink of the above embodiment, but a convex shape as shown in FIG. By combining the downward bending of the portion 10b, it is possible to easily cope with a semiconductor device having a thick resin.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本実施形態の半導体装置の断面図である。FIG. 1 is a cross-sectional view of a semiconductor device according to an embodiment.

【図2】(a)は図1の半導体装置における放熱板の平
面図であり、(b)は(a)のA−A断面図である。
2A is a plan view of a heat sink in the semiconductor device of FIG. 1, and FIG. 2B is a cross-sectional view taken along line AA of FIG.

【図3】図1の半導体装置の製造時における樹脂の流れ
を示す断面図である。
FIG. 3 is a cross-sectional view illustrating a flow of a resin at the time of manufacturing the semiconductor device of FIG. 1;

【図4】本実施形態の半導体装置の変形例を示す断面図
である。
FIG. 4 is a cross-sectional view showing a modification of the semiconductor device of the embodiment.

【図5】(a)は従来の半導体装置の概略構成を示す平
面図であり、(b)は(a)のB−B断面図である。
FIG. 5A is a plan view showing a schematic configuration of a conventional semiconductor device, and FIG. 5B is a sectional view taken along line BB of FIG.

【図6】(a)は図5の半導体装置における放熱板の平
面図であり、(b)は(a)のC−C断面図である。
6A is a plan view of a heat sink in the semiconductor device of FIG. 5, and FIG. 6B is a cross-sectional view taken along line CC of FIG.

【図7】従来の半導体装置の断面図である。FIG. 7 is a sectional view of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1…半導体装置、2…半導体チップ、3…リードフレー
ム、3a…アイランド部、3b…インナリード、3c…
アウタリード、10…放熱板、10a…熱伝達部、10
b…熱拡散部(外縁部)、10c…突出部。
DESCRIPTION OF SYMBOLS 1 ... Semiconductor device, 2 ... Semiconductor chip, 3 ... Lead frame, 3a ... Island part, 3b ... Inner lead, 3c ...
Outer lead, 10: heat sink, 10a: heat transfer part, 10
b: thermal diffusion portion (outer edge), 10c: projecting portion.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4M109 AA01 BA01 CA21 DB02 DB04 FA04 GA05 5F036 AA01 BB01 BE01 5F061 AA01 BA01 CA21 DD12 FA05 5F067 AA03 AB03 CA02 CA05  ──────────────────────────────────────────────────の Continued on the front page F term (reference) 4M109 AA01 BA01 CA21 DB02 DB04 FA04 GA05 5F036 AA01 BB01 BE01 5F061 AA01 BA01 CA21 DD12 FA05 5F067 AA03 AB03 CA02 CA05

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 放熱板(10)の一面に、半導体素子
(2)が搭載されたリードフレーム(3)が配置され、
これら放熱板(10)、半導体素子(2)及びリードフ
レーム(3)が樹脂(5)で封止されてなる樹脂封止型
半導体装置において、 前記放熱板(10)は、外縁部(10b)が前記リード
フレーム(3)の配置側の反対方向に折り曲げられてい
ることを特徴とする樹脂封止型半導体装置。
A lead frame (3) on which a semiconductor element (2) is mounted is disposed on one surface of a heat sink (10),
In the resin-encapsulated semiconductor device in which the heat radiating plate (10), the semiconductor element (2) and the lead frame (3) are sealed with a resin (5), the heat radiating plate (10) has an outer edge portion (10b). Are bent in a direction opposite to a side on which the lead frame (3) is arranged.
【請求項2】 前記放熱板(10)は、前記リードフレ
ーム(3)の配置側の反対方向に突出した突出部(10
c)を備え、 前記外縁部(10b)の折り曲げ量は前記突出部(10
c)の突出量より小さいことを特徴とする請求項1に記
載の樹脂封止型半導体装置。
2. The radiating plate (10) has a protruding portion (10) protruding in a direction opposite to a side on which the lead frame (3) is disposed.
c), and the amount of bending of the outer edge portion (10b) is
2. The resin-encapsulated semiconductor device according to claim 1, wherein the protrusion amount is smaller than c).
JP19775699A 1999-07-12 1999-07-12 Resin-sealed semiconductor device Expired - Fee Related JP4120101B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19775699A JP4120101B2 (en) 1999-07-12 1999-07-12 Resin-sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19775699A JP4120101B2 (en) 1999-07-12 1999-07-12 Resin-sealed semiconductor device

Publications (2)

Publication Number Publication Date
JP2001024110A true JP2001024110A (en) 2001-01-26
JP4120101B2 JP4120101B2 (en) 2008-07-16

Family

ID=16379834

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4120101B2 (en)

Also Published As

Publication number Publication date
JP4120101B2 (en) 2008-07-16

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