JP2001019485A - Glass composition - Google Patents

Glass composition

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Publication number
JP2001019485A
JP2001019485A JP11191748A JP19174899A JP2001019485A JP 2001019485 A JP2001019485 A JP 2001019485A JP 11191748 A JP11191748 A JP 11191748A JP 19174899 A JP19174899 A JP 19174899A JP 2001019485 A JP2001019485 A JP 2001019485A
Authority
JP
Japan
Prior art keywords
composition
glass
tio
hours
composition ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11191748A
Other languages
Japanese (ja)
Inventor
Hideki Osada
英喜 長田
Hideki Kawai
秀樹 河合
Toshiharu Mori
登史晴 森
Hiroshi Yugame
博 遊亀
Kazuhiko Ishimaru
和彦 石丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP11191748A priority Critical patent/JP2001019485A/en
Publication of JP2001019485A publication Critical patent/JP2001019485A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0018Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
    • C03C10/0027Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Magnetic Record Carriers (AREA)
  • Glass Compositions (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a glass having a high specific Young's modulus. SOLUTION: In the glass composition, ranges of the main components are specified to >=65 wt.% and <=80 wt.% of SiO2, >=3 wt.% and <=15 wt.% of Al2O3, >=3 wt.% and <=15 wt.% of Li2O, >=0.2 wt.% and <=5 wt.% of P2O5, >=0.1 wt.% to <=10 wt.% of TiO2, and >=0.1 and <=0.9 of TiO2/P2O5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はガラス組成、特に結
晶化ガラスに適したガラス組成に関する。さらに詳しく
は、結晶化ガラス磁気ディスクの組成に関する。
The present invention relates to a glass composition, particularly a glass composition suitable for crystallized glass. More specifically, it relates to the composition of a crystallized glass magnetic disk.

【0002】[0002]

【従来の技術】従来、磁気ディスク用の基板としては、
アルミニウム基板、ガラス基板等が実用化されている。
中でもガラス基板は、表面の平滑性や機械的強度が優れ
ていることから、最も注目されている。そのようなガラ
ス基板としては、ガラス基板表面をイオン交換で強化し
た化学強化ガラス基板や、基板に結晶成分を析出させて
結合の強化を図る結晶化ガラス基板が知られている。
2. Description of the Related Art Conventionally, as a substrate for a magnetic disk,
Aluminum substrates and glass substrates have been put to practical use.
Among them, a glass substrate has received the most attention because of its excellent surface smoothness and mechanical strength. As such a glass substrate, a chemically strengthened glass substrate in which the surface of the glass substrate is strengthened by ion exchange, and a crystallized glass substrate in which a crystal component is precipitated on the substrate to strengthen the bond are known.

【0003】[0003]

【発明が解決しようとする課題】ところで最近の基板に
対する性能の要求は、日に日に厳しくなってきており、
とくに高速回転時のたわみやそりに直接的に関わる強度
に対する性能の向上が求められている。これは基板材料
の比弾性率(=ヤング率/比重)によって表すことがで
き、数値が高ければ高いほど望ましい。またこのような
要求を満たしながら、生産性の向上が求められている。
そこで本発明は、ガラスの比弾性率が向上し、さらに生
産性の高いを組成を提供することを目的とする。
By the way, the recent demand for the performance of the substrate is becoming stricter day by day.
In particular, there is a demand for an improvement in performance with respect to strength directly related to deflection and warpage during high-speed rotation. This can be represented by the specific elastic modulus (= Young's modulus / specific gravity) of the substrate material, and the higher the numerical value, the more desirable. Further, there is a demand for improvement in productivity while satisfying such requirements.
Therefore, an object of the present invention is to provide a composition with improved specific elastic modulus of glass and higher productivity.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に請求項1に記載された発明は、主成分の組成範囲を、
SiO2が65wt%以上で且つ 80wt%以下、A
23が3wt%以上で且つ 15wt%以下、Li2
Oが3wt%以上で且つ 15wt%以下、P25
0.2wt%以上で且つ 5wt%以下、TiO2
0.1wt%以上で且つ 10wt%以下、TiO2
25が0.1wt%以上で且つ 0.9wt%以下、
にしたことを特徴とする。
Means for Solving the Problems In order to achieve the above object, the invention described in claim 1 provides a composition range of a main component,
SiO 2 is 65 wt% or more and 80 wt% or less, A
l 2 O 3 is and 15 wt% or less at 3 wt% or more, Li 2
O is 3 wt% or more and 15 wt% or less, P 2 O 5 is 0.2 wt% or more and 5 wt% or less, TiO 2 is 0.1 wt% or more and 10 wt% or less, TiO 2 /
P 2 O 5 is 0.1 wt% or more and 0.9 wt% or less,
It is characterized by the following.

【0005】[0005]

【発明の実施の形態】以下、本発明の実施形態について
説明する。本発明に係る実施形態のガラス基板は、主成
分の組成範囲が、SiO2が65wt%以上で且つ80
wt%以下、Al23が3wt%以上で且つ15wt%
以下、Li2Oが3wt%以上で且つ15wt%以下、
25が0.2wt%以上で且つ5wt%以下、TiO
2が0.1wt%以上で且つ10wt%以下、TiO2
25が0.1以上で且つ0.9であることを特徴とし
ている。
Embodiments of the present invention will be described below. In the glass substrate of the embodiment according to the present invention, the composition range of the main component is such that SiO 2 is 65 wt% or more and 80 wt% or more.
wt% or less, Al 2 O 3 is 3 wt% or more and 15 wt%
In the following, Li 2 O is 3 wt% or more and 15 wt% or less,
P 2 O 5 ≧ 0.2 wt% and ≦ 5 wt%, TiO
2 is 0.1 wt% or more and 10 wt% or less, and TiO 2 /
P 2 O 5 is 0.1 or more and 0.9.

【0006】SiO2はガラス形成酸化物のため組成比
が65wt%より少ないと、溶融性が悪くなり、80w
t%を越えるとガラスとして安定状態になるため、結晶
が析出しにくくなる。
Since SiO 2 is a glass-forming oxide, if its composition ratio is less than 65% by weight, its melting property deteriorates and 80 w
If it exceeds t%, the glass will be in a stable state, and it will be difficult for crystals to precipitate.

【0007】Al23はガラス中間酸化物であり、熱処
理によって析出する結晶相であるホウ酸アルミニウム系
結晶の構成成分である。組成比が3wt%より少ないと
析出結晶が少なく、強度が得られず、15wt%を越え
ると溶融温度が高くなり失透しやすくなる。
[0007] Al 2 O 3 is a glass intermediate oxide, and is a component of aluminum borate-based crystals that are crystal phases precipitated by heat treatment. If the composition ratio is less than 3 wt%, the number of precipitated crystals is small, and strength cannot be obtained. If the composition ratio is more than 15 wt%, the melting temperature becomes high and the glass tends to be devitrified.

【0008】Li2Oは融剤としての役割を果たすとと
もに、リチウムダイシリケート系結晶の構成成分であ
る。組成比が3wt%より少ないと結晶相であるリチウ
ムダイシリケートの析出が不十分となり、15wt%を
越えると、析出結晶相のリチウムダイシリケートが不安
定となり結晶化を制御しにくくなる。また化学的耐久性
が低下し磁気膜に影響を与える恐れがあり、また研磨−
洗浄工程における安定性が悪くなる。
[0008] Li 2 O plays a role as a flux and is a component of lithium disilicate-based crystals. If the composition ratio is less than 3 wt%, the precipitation of lithium disilicate as a crystal phase becomes insufficient, and if it exceeds 15 wt%, the lithium disilicate in the precipitated crystal phase becomes unstable and crystallization becomes difficult to control. In addition, chemical durability may be reduced and the magnetic film may be affected.
The stability in the washing process is deteriorated.

【0009】P25は融剤として働き、リチウムダイシ
リケート系結晶を析出させる核形成剤であり、ガラス全
体に結晶を均一に析出させるために重要な成分である。
組成比が0.2wt%より少ないと十分な結晶核が形成
されにくくなり、結晶粒子が粗大化したり結晶が不均質
に析出し、微細で均質な結晶構造が得られにくくなり、
研磨加工においてディスク基板として必要な平滑面が得
られなくなる。また難溶融性のZrO2成分に対する融
剤としての効果が十分得られなくなる。5wt%を越え
ると、溶融時の炉剤に対する反応性が増し、また失透性
も強くなることから溶融成形時の生産性が低下する。ま
た化学的耐久性が低下し、磁気膜に影響を与える恐れが
あると共に、研磨−洗浄工程における安定性が悪くな
る。
P 2 O 5 is a nucleating agent that functions as a flux and precipitates lithium disilicate-based crystals, and is an important component for uniformly depositing crystals throughout the glass.
If the composition ratio is less than 0.2 wt%, it is difficult to form sufficient crystal nuclei, crystal grains are coarsened or crystals are heterogeneously deposited, and it is difficult to obtain a fine and uniform crystal structure,
In polishing, a smooth surface required as a disk substrate cannot be obtained. Further, the effect as a flux for the hardly-fusible ZrO 2 component cannot be obtained. If it exceeds 5% by weight, the reactivity with the furnace agent at the time of melting increases, and the devitrification also increases, so that the productivity at the time of melt molding decreases. In addition, the chemical durability may be reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process may be deteriorated.

【0010】TiO2は融剤であり、結晶成長を促進さ
せる。組成比が0.1wt%より少ないと溶融性が悪く
なると共に、結晶成長がしにくくなり、10wt%を越
えると結晶化が急激に促進され、結晶化状態の制御が困
難となり析出結晶の粗大化、結晶相の不均質が発生し、
微細で均質な結晶構造が得られなくなり、研磨加工にお
いてディスク基板として必要な平滑面が得られなくな
る。さらに溶融成形時に失透しやすくなり、生産性が低
下する。
TiO 2 is a flux and promotes crystal growth. If the composition ratio is less than 0.1 wt%, the meltability deteriorates, and the crystal growth becomes difficult. If the composition ratio exceeds 10 wt%, crystallization is rapidly promoted, the control of the crystallization state becomes difficult, and the deposited crystals become coarse. , Crystal phase heterogeneity occurs,
A fine and uniform crystal structure cannot be obtained, and a smooth surface required as a disk substrate in polishing cannot be obtained. Further, devitrification tends to occur during melt molding, and productivity is reduced.

【0011】TiO2/P25は結晶成長を促進させる
融剤と、リチウムダイシリケート系結晶を析出させる核
形成剤の比であり、0.1より小さいと結晶成長が少な
く、求める特性が得られにくく、0.9より大きいと結
晶が成長しすぎ、求める特性が得にくい。
TiO 2 / P 2 O 5 is a ratio of a flux that promotes crystal growth to a nucleating agent that precipitates lithium disilicate-based crystals. If it is larger than 0.9, the crystals grow too much, and it is difficult to obtain the desired characteristics.

【0012】以下製造方法を説明する。最終的に生成さ
れるガラス基板の主成分の組成を含む原料を所定の割合
にて充分に混合し、これを白金るつぼに入れ溶融を行
う。溶融後金型に流し概略の形状を形成する。これを室
温までアニールする。続いて、示される1次熱処理温度
と1次処理時間により保持し(熱処理)、結晶核生成が
行われる。引き続き、2次熱処理温度と2次処理時間に
より保持し結晶核成長を行う。これを除冷することによ
り目的とする結晶化ガラスが得られる。
The manufacturing method will be described below. Raw materials including the composition of the main components of the finally produced glass substrate are sufficiently mixed at a predetermined ratio, and the mixture is put into a platinum crucible and melted. After melting, it is poured into a mold to form a rough shape. This is annealed to room temperature. Subsequently, the temperature is maintained at the indicated primary heat treatment temperature and primary treatment time (heat treatment), and crystal nucleation is performed. Subsequently, the crystal nucleus is grown while maintaining the temperature at the secondary heat treatment and the secondary treatment time. By cooling this, the desired crystallized glass is obtained.

【0013】以上の製造方法によって得られたガラス基
板は、SiO2が65wt%以上で且つ80wt%以
下、Al23が3wt%以上で且つ15wt%以下、L
2Oが3wt%以上で且つ15wt%以下、P25
0.2wt%以上で且つ5wt%以下、TiO2が0.
1wt%以上で且つ10wt%以下、TiO2/P25
が0.1以上で且つ0.9以下とするために、非常に高
い比弾性率と高い生産性を得ることが可能となった。
The glass substrate obtained by the above-described manufacturing method has a SiO 2 content of 65 wt% or more and 80 wt% or less, an Al 2 O 3 content of 3 wt% or more and 15 wt% or less,
i 2 O is 3 wt% or more and 15 wt% or less, P 2 O 5 is 0.2 wt% or more and 5 wt% or less, and TiO 2 is 0.2 wt% or less.
TiO 2 / P 2 O 5 ≧ 1 wt% and ≦ 10 wt%
Is 0.1 or more and 0.9 or less, it is possible to obtain a very high specific modulus and a high productivity.

【0014】[0014]

【実施例】次に実施形態を実施した具体的な実施例につ
いて説明する。第1〜第4実施例のガラスを構成する材
料組成比(単位:wt%)、条件式の値、溶融温度と溶
融時間、1次熱処理温度と1次処理時間、2次熱処理温
度と2次処理時間、主析出結晶相、副析出結晶相、平均
結晶粒径、比重、ヤング率、比弾性率を表1に示す。同
様に第5〜第8実施例のガラスを表2に示す。同様に第
9〜第12実施例のガラスを表3に示す。同様に第13
〜第16実施例のガラスを表4に示す。同様に第17〜
第20実施例のガラスを表5に示す。同様に第21〜第
24実施例のガラスを表6に示す。
Next, a specific example of the embodiment will be described. Material composition ratio (unit: wt%), values of conditional expressions, melting temperature and melting time, primary heat treatment temperature and primary treatment time, secondary heat treatment temperature and secondary constituting glass of the first to fourth embodiments. Table 1 shows the treatment time, main precipitated crystal phase, sub-precipitated crystal phase, average crystal grain size, specific gravity, Young's modulus, and specific elastic modulus. Table 2 similarly shows the glasses of the fifth to eighth examples. Table 3 similarly shows the ninth to twelfth examples. Similarly, the thirteenth
Table 4 shows the glasses according to the sixteenth examples. Similarly, the seventeenth to
Table 5 shows the glass of the twentieth example. Table 6 similarly shows glasses of Examples 21 to 24.

【0015】[0015]

【表1】 [Table 1]

【0016】[0016]

【表2】 [Table 2]

【0017】[0017]

【表3】 [Table 3]

【0018】[0018]

【表4】 [Table 4]

【0019】[0019]

【表5】 [Table 5]

【0020】[0020]

【表6】 [Table 6]

【0021】第1の実施例のガラス組成は、SiO2
74.6wt%、Al23を6.5wt%、Li2Oを
8.5wt%、P25を3.3wt%、TiO2を2.
2wt%、CaOを2.9wt%、K2Oを1.5wt
%、Sb23を0.5wt%、TiO2/P25を0.
67の組成比である。
The glass composition of the first embodiment is as follows: 74.6 wt% of SiO 2 , 6.5 wt% of Al 2 O 3 , 8.5 wt% of Li 2 O, 3.3 wt% of P 2 O 5 , TiO 2 2.
2wt%, 2.9wt% CaO, 1.5wt K 2 O
%, 0.5 wt% of Sb 2 O 3, and 0.1% of TiO 2 / P 2 O 5 .
The composition ratio is 67.

【0022】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が40.2と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 575 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 40.2. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0023】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くCaOを加えているため高い溶融性、安
定した結晶相があることができる。組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
求める強度が得られにくくなる。
The basic composition is Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since CaO acting as a flux is added, a high melting property and a stable crystal phase can be obtained. Composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
It becomes difficult to obtain the required strength.

【0024】また、融剤として働くK2Oを加えている
ため生産時の安定性が向上している。ただし、組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、また化学的耐久性が低下し、磁気膜に影響を
与える恐れがあると共に、研磨−洗浄工程における安定
性が悪くなる。
Further, since K 2 O serving as a flux is added, the stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.

【0025】また、清澄剤として働くSb23を加えて
いるため生産時の安定性が向上している。ただし、組成
比が0.1wt%より少ないと十分な清澄効果が得られ
なくなり、生産性が低下する。5wt%を越えると、ガ
ラスの結晶化が不安定となり析出結晶相を制御できなく
なり、求める特性が得られにくくなる。
Further, since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.

【0026】第2の実施例のガラス組成は、SiO2
72.5wt%、Al23を7.2wt%、Li2Oを
6wt%、P25を4wt%、TiO2を3.6wt
%、CaOを2.2wt%、K2Oを3wt%、Sb2
3を1.5wt%、TiO2/P25を0.90の組成比
である。
The glass composition of the second embodiment is as follows: 72.5% by weight of SiO 2 , 7.2% by weight of Al 2 O 3 , 6% by weight of Li 2 O, 4% by weight of P 2 O 5 , and 3% by weight of TiO 2 . 0.6wt
%, 2.2 wt% of CaO, 3 wt% of K 2 O, Sb 2 O
3 has a composition ratio of 1.5 wt% and TiO 2 / P 2 O 5 has a composition ratio of 0.90.

【0027】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が37.2と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 degrees, the melting time is 2.5 hours, the primary processing temperature is 570 degrees, the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, the glass whose main precipitated crystal phase is quartz, whose secondary precipitated crystal phase is lithium disilicate, and whose specific elastic modulus is 37.2, is obtained. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0028】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くCaOを加えているため高い溶融性、安
定した結晶相があることができる。組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
求める強度が得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since CaO acting as a flux is added, a high melting property and a stable crystal phase can be obtained. Composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
It becomes difficult to obtain the required strength.

【0029】また、融剤として働くK2Oを加えている
ため生産時の安定性が向上している。ただし、組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、また化学的耐久性が低下し、磁気膜に影響を
与える恐れがあると共に、研磨−洗浄工程における安定
性が悪くなる。
Further, since K 2 O serving as a flux is added, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.

【0030】また、清澄剤として働くSb23を加えて
いるため生産時の安定性が向上している。ただし、組成
比が0.1wt%より少ないと十分な清澄効果が得られ
なくなり、生産性が低下する。5wt%を越えると、ガ
ラスの結晶化が不安定となり析出結晶相を制御できなく
なり、求める特性が得られにくくなる。
Further, since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.

【0031】第3の実施例のガラス組成は、SiO2
76.3wt%、Al23を10.8wt%、Li2
を8.5wt%、P25を2.4wt%、TiO2を2
wt%、TiO2/P25を0.83の組成比である。
The glass composition of the third embodiment is as follows: 76.3 wt% of SiO 2 , 10.8 wt% of Al 2 O 3 , Li 2 O
The 8.5 wt%, 2.4 wt% of P 2 O 5, the TiO 2 2
wt%, a composition ratio of TiO 2 / P 2 O 5 and 0.83.

【0032】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.2と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1440 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate was obtained in which the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 39.2. . The above composition has not only a high specific modulus, but also a very high productivity.

【0033】第4の実施例のガラス組成は、SiO2
74wt%、Al23を8wt%、Li2Oを9.5w
t%、P25を4.5wt%、TiO2を4wt%、T
iO2/P25を0.89の組成比である。
The glass composition of the fourth embodiment is such that SiO 2 is 74 wt%, Al 2 O 3 is 8 wt%, and Li 2 O is 9.5 w%.
t%, P 2 O 5 4.5 wt%, TiO 2 4 wt%, T
iO 2 / P 2 O 5 has a composition ratio of 0.89.

【0034】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.4と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 570 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 39.4 is obtained. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0035】第5の実施例のガラス組成は、SiO2
72.2wt%、Al23を11.3wt%、Li2
を10.5wt%、P25を3wt%、TiO2を2.
5wt%、CaOを0.5wt%、TiO2/P25
0.83の組成比である。
The glass composition of the fifth embodiment is as follows: 72.2 wt% of SiO 2 , 11.3 wt% of Al 2 O 3 , and Li 2 O
The 10.5 wt%, 3 wt% of P 2 O 5, the TiO 2 2.
The composition ratio is 5 wt%, CaO is 0.5 wt%, and TiO 2 / P 2 O 5 is 0.83.

【0036】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.8と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1440 degrees, the melting time is 2.5 hours, the primary processing temperature is 575 degrees, the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 39.8. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0037】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くCaOを加えているため高い溶融性、安
定した結晶相があることができる。組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
求める強度が得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since CaO acting as a flux is added, a high melting property and a stable crystal phase can be obtained. Composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
It becomes difficult to obtain the required strength.

【0038】第6の実施例のガラス組成は、SiO2
75.5wt%、Al23を10.2wt%、Li2
を7.8wt%、P25を2.5wt%、TiO2を2
wt%、CaOを2wt%、TiO2/P25を0.8
0の組成比である。
The glass composition of the sixth embodiment is as follows: 75.5 wt% of SiO 2 , 10.2 wt% of Al 2 O 3 , and Li 2 O
7.8 wt%, P 2 O 5 2.5 wt%, TiO 2 2
wt%, CaO 2 wt%, TiO 2 / P 2 O 5 0.8
The composition ratio is 0.

【0039】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が39.4と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 39.4. . The above composition has not only a high specific modulus, but also a very high productivity.

【0040】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くCaOを加えているため高い溶融性、安
定した結晶相があることができる。組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
求める強度が得られにくくなる。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since CaO acting as a flux is added, a high melting property and a stable crystal phase can be obtained. Composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
It becomes difficult to obtain the required strength.

【0041】第7の実施例のガラス組成は、SiO2
71.5wt%、Al23を10.5wt%、Li2
を9.5wt%、P25を4wt%、TiO2を3.5
wt%、K2Oを1wt%、TiO2/P25を0.88
の組成比である。
The glass composition of the seventh embodiment is as follows: SiO 2 : 71.5 wt%, Al 2 O 3 : 10.5 wt%, Li 2 O
The 9.5 wt%, 4 wt% of P 2 O 5, the TiO 2 3.5
wt%, 1 wt% of K 2 O, the TiO 2 / P 2 O 5 0.88
Is the composition ratio.

【0042】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度720度、2次処理時間4時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.4と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1460 ° C., the melting time was 2.5 hours, the primary processing temperature was 570 ° C., and the primary processing time was 5.
As a result of treating for 5 hours at a secondary treatment temperature of 720 degrees and a secondary treatment time of 4 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 39.4 is obtained. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0043】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くK2Oを加えているため生産時の安定性
が向上している。ただし、組成比が0.1wt%より少
ないと十分な溶融性改善がなされない。5wt%を越え
ると、ガラスが安定となり結晶化が抑制され、また化学
的耐久性が低下し、磁気膜に影響を与える恐れがあると
共に、研磨−洗浄工程における安定性が悪くなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since K 2 O serving as a flux is added, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.

【0044】第8の実施例のガラス組成は、SiO2
73.5wt%、Al23を10.2wt%、Li2
を9wt%、P25を3.8wt%、TiO2を0.5
wt%、K2Oを3wt%、TiO2/P25を0.13
の組成比である。
The glass composition of the eighth embodiment is as follows: 73.5 wt% of SiO 2 , 10.2 wt% of Al 2 O 3 , and Li 2 O
The 9 wt%, 3.8 wt% of P 2 O 5, the TiO 2 0.5
wt%, 3 wt% of K 2 O, the TiO 2 / P 2 O 5 0.13
Is the composition ratio.

【0045】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.7と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1440 ° C., the melting time is 2.5 hours, the primary processing temperature is 575 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 39.7. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0046】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くK2Oを加えているため生産時の安定性
が向上している。ただし、組成比が0.1wt%より少
ないと十分な溶融性改善がなされない。5wt%を越え
ると、ガラスが安定となり結晶化が抑制され、また化学
的耐久性が低下し、磁気膜に影響を与える恐れがあると
共に、研磨−洗浄工程における安定性が悪くなる。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since K 2 O serving as a flux is added, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.

【0047】第9の実施例のガラス組成は、SiO2
76wt%、Al23を11.3wt%、Li2Oを
8.7wt%、P25を2.5wt%、TiO2を1w
t%、Sb23を0.5wt%、TiO2/P25
0.4の組成比である。
The glass composition of the ninth embodiment is as follows: 76 wt% of SiO 2 , 11.3 wt% of Al 2 O 3 , 8.7 wt% of Li 2 O, 2.5 wt% of P 2 O 5 , TiO 2 1w
The composition ratio is t%, Sb 2 O 3 is 0.5 wt%, and TiO 2 / P 2 O 5 is 0.4.

【0048】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.7と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate was obtained in which the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 39.7. . The above composition has not only a high specific modulus, but also a very high productivity.

【0049】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
清澄剤として働くSb23を加えているため生産時の安
定性が向上している。ただし、組成比が0.1wt%よ
り少ないと十分な清澄効果が得られなくなり、生産性が
低下する。5wt%を越えると、ガラスの結晶化が不安
定となり析出結晶相を制御できなくなり、求める特性が
得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.

【0050】第10の実施例のガラス組成は、SiO2
を73.8wt%、Al23を9.7wt%、Li2
を11.5wt%、P25を2wt%、TiO2を1.
5wt%、Sb23を1.5wt%、TiO2/P25
を0.75の組成比である。
The glass composition of the tenth embodiment was SiO 2
73.8 wt%, Al 2 O 3 9.7 wt%, Li 2 O
The 11.5 wt%, 2 wt% of P 2 O 5, the TiO 2 1.
5 wt%, Sb 2 O 3 1.5 wt%, TiO 2 / P 2 O 5
Is a composition ratio of 0.75.

【0051】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が39.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 39.2. The above composition has not only a high specific modulus, but also a very high productivity.

【0052】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
清澄剤として働くSb23を加えているため生産時の安
定性が向上している。ただし、組成比が0.1wt%よ
り少ないと十分な清澄効果が得られなくなり、生産性が
低下する。5wt%を越えると、ガラスの結晶化が不安
定となり析出結晶相を制御できなくなり、求める特性が
得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.

【0053】第11の実施例のガラス組成は、SiO2
を72.8wt%、Al23を11.7wt%、Li2
Oを10.5wt%、P25を2.2wt%、TiO2
を0.8wt%、B23を2wt%、TiO2/P25
を0.36の組成比である。
The glass composition of the eleventh embodiment was SiO 2
72.8 wt%, Al 2 O 3 11.7 wt%, Li 2
O: 10.5 wt%, P 2 O 5 : 2.2 wt%, TiO 2
The 0.8wt%, B 2 O 3 to 2wt%, TiO 2 / P 2 O 5
Is a composition ratio of 0.36.

【0054】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が40.5という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1440 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 40.5. The above composition has not only a high specific modulus, but also a very high productivity.

【0055】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
フォーマーとして働くB23を加えているためガラスの
分相を促し、結晶析出および成長を促進させる。ただ
し、組成比が0.1wt%より少ないと十分な溶融性改
善がなされない。15wt%を越えると、ガラスが失透
しやすくなり成形が困難になると共に、結晶が粗大化し
微細な結晶が得られなくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since B 2 O 3 serving as a former is added, the phase separation of the glass is promoted, and the crystal precipitation and growth are promoted. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 15% by weight, the glass tends to be devitrified and molding becomes difficult, and the crystals become coarse and fine crystals cannot be obtained.

【0056】第12の実施例のガラス組成は、SiO2
を74wt%、Al23を10.7wt%、Li2Oを
9.8wt%、P25を1.5wt%、TiO2を1w
t%、B23を3wt%、TiO2/P25を0の組成
比である。
The glass composition of the twelfth embodiment was SiO 2
74 wt%, Al 2 O 3 10.7 wt%, Li 2 O 9.8 wt%, P 2 O 5 1.5 wt%, TiO 2 1 w
The composition ratio is t%, B 2 O 3 is 3 wt%, and TiO 2 / P 2 O 5 is 0.

【0057】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が40.8という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1440 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate having a crystal having a sub-precipitated crystal phase and a specific elastic modulus of 40.8 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0058】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
フォーマーとして働くB23を加えているためガラスの
分相を促し、結晶析出および成長を促進させる。ただ
し、組成比が0.1wt%より少ないと十分な溶融性改
善がなされない。15wt%を越えると、ガラスが失透
しやすくなり成形が困難になると共に、結晶が粗大化し
微細な結晶が得られなくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since B 2 O 3 serving as a former is added, the phase separation of the glass is promoted, and the crystal precipitation and growth are promoted. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 15% by weight, the glass tends to be devitrified and molding becomes difficult, and the crystals become coarse and fine crystals cannot be obtained.

【0059】第13の実施例のガラス組成は、SiO2
を74wt%、Al23を11wt%、Li2Oを9.
5wt%、P25を3wt%、TiO2を1.5wt
%、MgOを1wt%、TiO2/P25を0の組成比
である。
The glass composition of the thirteenth embodiment was SiO 2
74 wt%, Al 2 O 3 11 wt%, Li 2 O 9.
5 wt%, 3 wt% of P 2 O 5, the TiO 2 1.5 wt
%, MgO is 1 wt%, and TiO 2 / P 2 O 5 is 0.

【0060】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
トで、副析出結晶相がクオーツ、比弾性率が39.8と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1440 ° C., the melting time is 2.5 hours, the primary processing temperature is 575 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that a main precipitated crystal phase is lithium disilicate, a sub-precipitated crystal phase is quartz, and a specific elastic modulus is 39.8. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0061】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くMgOを加えているため結晶相の一つで
ある粒状のクオーツ結晶を凝集させ結晶粒子塊を形成す
る。ただし、組成比が0.1wt%より少ないと作業温
度幅が狭くなりう、ガラスマトリクス相の化学的耐久性
が向上しない。12wt%を越えると、他の結晶相が析
出して求める強度を得ることが難しくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since MgO that acts as a flux is added, granular quartz crystals, which are one of the crystal phases, are aggregated to form crystal particle masses. However, if the composition ratio is less than 0.1 wt%, the working temperature range becomes narrow, and the chemical durability of the glass matrix phase does not improve. If it exceeds 12% by weight, it is difficult to obtain the required strength due to precipitation of another crystal phase.

【0062】第14の実施例のガラス組成は、SiO2
を74.2wt%、Al23を11.1wt%、Li2
Oを8wt%、P25を1.5wt%、TiO2を1.
2wt%、MgOを4wt%、TiO2/P25を0の
組成比である。
The glass composition of the fourteenth embodiment was SiO 2
74.2 wt%, Al 2 O 3 11.1 wt%, Li 2
O is 8 wt%, P 2 O 5 is 1.5 wt%, and TiO 2 is 1.
The composition ratio is 2 wt%, MgO is 4 wt%, and TiO 2 / P 2 O 5 is 0.

【0063】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が39.6という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1440 degrees, the melting time was 2.5 hours, the primary processing temperature was 585 degrees, the primary processing time was 5 hours, and the secondary processing temperature was in accordance with the above-mentioned manufacturing method. As a result of treatment at 700 ° C. for a secondary treatment time of 3 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 39.6. The above composition has not only a high specific modulus, but also a very high productivity.

【0064】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くMgOを加えているため結晶相の一つで
ある粒状のクオーツ結晶を凝集させ結晶粒子塊を形成す
る。ただし、組成比が0.1wt%より少ないと作業温
度幅が狭くなりう、ガラスマトリクス相の化学的耐久性
が向上しない。12wt%を越えると、他の結晶相が析
出して求める強度を得ることが難しくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since MgO that acts as a flux is added, granular quartz crystals, which are one of the crystal phases, are aggregated to form crystal particle masses. However, if the composition ratio is less than 0.1 wt%, the working temperature range becomes narrow, and the chemical durability of the glass matrix phase does not improve. If it exceeds 12% by weight, it is difficult to obtain the required strength due to precipitation of another crystal phase.

【0065】第15の実施例のガラス組成は、SiO2
を76.8wt%、Al23を10.8wt%、Li2
Oを8.2wt%、P25を1.2wt%、TiO2
1wt%、BaOを2wt%、TiO2/P25を0を
0.83wt%の組成比である。
The glass composition of the fifteenth embodiment was SiO 2
76.8 wt%, Al 2 O 3 10.8 wt%, Li 2
The composition ratio of O is 8.2 wt%, P 2 O 5 is 1.2 wt%, TiO 2 is 1 wt%, BaO is 2 wt%, and TiO 2 / P 2 O 5 is 0.83 wt%.

【0066】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が38.9と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 38.9. . The above composition has not only a high specific modulus, but also a very high productivity.

【0067】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くBaOを加えているため生産時の安定性
が向上している。ただし、組成比が0.1wt%より少
ないと十分な溶融性改善がなされない。5wt%を越え
ると、ガラスが安定となり結晶化が抑制され、求める強
度が得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since BaO serving as a flux is added, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.

【0068】第16の実施例のガラス組成は、SiO2
を75.5wt%、Al23を11wt%、Li2Oを
9.3wt%、P25を1wt%、TiO2を0.2w
t%、BaOを3wt%、TiO2/P25を0の組成
比である。
The glass composition of the sixteenth embodiment was SiO 2
The 75.5wt%, 11wt% of Al 2 O 3, 9.3wt% of Li 2 O, 1wt% of P 2 O 5, 0.2w of TiO 2
The composition ratio is t%, BaO is 3 wt%, and TiO 2 / P 2 O 5 is 0.

【0069】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間2
時間、1次処理温度585度、1次処理時間5時間、2
次処理温度690度、2次処理時間2.5時間にて処置
した結果、主析出結晶相がリチウムダイシリケート、副
析出結晶相がクオーツで、比弾性率が38.8という特
性のガラス基板が得られた。上記組成は高い比弾性率を
有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1480 ° C. and the melting time was 2 according to the above-mentioned production method.
Time, primary processing temperature 585 degrees, primary processing time 5 hours, 2
As a result of the treatment at the next treatment temperature of 690 ° C. and the second treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 38.8 is obtained. Obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0070】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くBaOを加えているため生産時の安定性
が向上している。ただし、組成比が0.1wt%より少
ないと十分な溶融性改善がなされない。5wt%を越え
ると、ガラスが安定となり結晶化が抑制され、求める強
度が得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since BaO serving as a flux is added, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.

【0071】第17の実施例のガラス組成は、SiO2
を74.5wt%、Al23を12wt%、Li2Oを
7.2wt%、P25を4wt%、TiO2を2wt
%、ZnOを0.3wt%、TiO2/P25を0.5
の組成比である。
The glass composition of the seventeenth embodiment was SiO 2
The 74.5wt%, 12wt% of Al 2 O 3, 7.2wt% of Li 2 O, 4wt% of P 2 O 5, 2wt of TiO 2
%, ZnO 0.3 wt%, TiO 2 / P 2 O 5 0.5
Is the composition ratio.

【0072】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が39.3と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 570 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a main precipitated crystal phase of quartz, a sub-precipitated crystal phase of lithium disilicate and a specific elastic modulus of 39.3 is obtained. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0073】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くZnOを加えているため均一な結晶析出
を補助する。ただし、組成比が0.1wt%より少ない
と十分な結晶均質化の改善がなされない。5wt%を越
えると、ガラスが安定となり結晶化が抑制され、求める
強度が得られにくくなる。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
The addition of ZnO acting as a flux aids uniform crystal precipitation. However, if the composition ratio is less than 0.1% by weight, sufficient improvement in crystal homogenization cannot be achieved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.

【0074】第18の実施例のガラス組成は、SiO2
を73.2wt%、Al23を10.5wt%、Li2
Oを9.8wt%、P25を2.5wt%、TiO2
2wt%、ZnOを2wt%、TiO2/P25を0.
8の組成比である。
The glass composition of the eighteenth embodiment was SiO 2
73.2 wt%, Al 2 O 3 10.5 wt%, Li 2
O to 9.8wt%, P 2 O 5 to 2.5 wt%, the TiO 2 2wt%, 2wt% of ZnO, the TiO 2 / P 2 O 5 0 .
The composition ratio is 8.

【0075】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が39.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, the secondary processing temperature is As a result of treatment at 700 degrees and a secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 39.2. The above composition has not only a high specific modulus, but also a very high productivity.

【0076】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くZnOを加えているため均一な結晶析出
を補助する。ただし、組成比が0.1wt%より少ない
と十分な結晶均質化の改善がなされない。5wt%を越
えると、ガラスが安定となり結晶化が抑制され、求める
強度が得られにくくなる。
The composition is Si, which is the basic composition.
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
The addition of ZnO acting as a flux aids uniform crystal precipitation. However, if the composition ratio is less than 0.1% by weight, sufficient improvement in crystal homogenization cannot be achieved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.

【0077】第19の実施例のガラス組成は、SiO2
を73.2wt%、Al23を11.7wt%、Li2
Oを10.1wt%、P25を2.5wt%、TiO2
を2wt%、Nb25を0.5wt%、TiO2/P2
5を0.8の組成比である。
The glass composition of the nineteenth embodiment was SiO 2
73.2 wt%, Al 2 O 3 11.7 wt%, Li 2
O and 10.1 wt%, 2.5 wt% of P 2 O 5, TiO 2
The 2 wt%, 0.5 wt% of Nb 2 O 5, TiO 2 / P 2 O
5 is a composition ratio of 0.8.

【0078】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が39.6という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1440 ° C., the melting time was 2.5 hours, the primary processing temperature was 580 ° C., the primary processing time was 5 hours, and the secondary processing temperature was in accordance with the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 39.6. The above composition has not only a high specific modulus, but also a very high productivity.

【0079】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くNb25を加えているため結晶核剤物質
が増加することになる。ただし、組成比が0.1wt%
より少ないと十分な剛性の向上がなされない。5wt%
を越えると、ガラスの結晶化が不安定となり、析出結晶
相を制御できなくなり、求める特性が得られにくくな
る。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since Nb 2 O 5 acting as a flux is added, the nucleating agent material increases. However, the composition ratio is 0.1 wt%
If it is less than the above, sufficient improvement in rigidity cannot be achieved. 5wt%
If it exceeds, the crystallization of the glass becomes unstable, the control of the precipitated crystal phase becomes impossible, and it becomes difficult to obtain the required characteristics.

【0080】第20の実施例のガラス組成は、SiO2
を72wt%、Al23を12.6wt%、Li2Oを
13.2wt%、P25を0.5wt%、TiO2
0.2wt%、Nb25を1.5wt%、TiO2/P2
5を0.4の組成比である。
The glass composition of the twentieth embodiment was SiO 2
72 wt%, Al 2 O 3 12.6 wt%, Li 2 O 13.2 wt%, P 2 O 5 0.5 wt%, TiO 2 0.2 wt%, Nb 2 O 5 1.5 wt% , TiO 2 / P 2
O 5 has a composition ratio of 0.4.

【0081】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1440度、溶融時間
2.5時間、1次処理温度600度、1次処理時間4.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が38.8と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1440 ° C., the melting time was 2.5 hours, the primary processing temperature was 600 ° C., and the primary processing time was 4.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 38.8. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0082】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くNb25を加えているため結晶核剤物質
が増加することになる。ただし、組成比が0.1wt%
より少ないと十分な剛性の向上がなされない。5wt%
を越えると、ガラスの結晶化が不安定となり、析出結晶
相を制御できなくなり、求める特性が得られにくくな
る。
As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since Nb 2 O 5 acting as a flux is added, the nucleating agent material increases. However, the composition ratio is 0.1 wt%
If it is less than the above, sufficient improvement in rigidity cannot be achieved. 5wt%
If it exceeds, the crystallization of the glass becomes unstable, the control of the precipitated crystal phase becomes impossible, and it becomes difficult to obtain the required characteristics.

【0083】第21の実施例のガラス組成は、SiO2
を77wt%、Al23を8.3wt%、Li2Oを1
0wt%、P25を2wt%、TiO2を1.5wt
%、Ta25を1.2wt%、TiO2/P25を0.
75の組成比である。
The glass composition of the twenty-first embodiment was SiO 2
77 wt%, Al 2 O 3 8.3 wt%, Li 2 O 1
0 wt%, P 2 O 5 2 wt%, TiO 2 1.5 wt
%, Ta 2 O 5 at 1.2 wt%, and TiO 2 / P 2 O 5 at 0.
The composition ratio is 75.

【0084】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が36.8と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to have the above composition ratios, and the melting temperature was 1460 ° C., the melting time was 2.5 hours, the primary processing temperature was 580 ° C., the primary processing time was 5 hours, and the secondary processing temperature was in accordance with the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase was lithium disilicate and the sub-precipitated crystal phase was quartz and the specific elastic modulus was 36.8 was obtained. . The above composition has not only a high specific modulus, but also a very high productivity.

【0085】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くTa25を加えているため溶融性、強度
を向上させ、またガラスマトリクス相の化学的耐久性を
向上させる。ただし、組成比が0.1wt%より少ない
と十分な剛性の向上がなされない。5wt%を越える
と、ガラスの結晶化が不安定となり、析出結晶相を制御
できなくなり、求める特性が得られにくくなる。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since Ta 2 O 5 serving as a flux is added, the meltability and strength are improved, and the chemical durability of the glass matrix phase is improved. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.

【0086】第22の実施例のガラス組成は、SiO2
を70.5wt%、Al23を9.8wt%、Li2
を11.7wt%、P25を3wt%、TiO2を1w
t%、Ta25を4wt%、TiO2/P25を0.3
3の組成比である。
The glass composition of the twenty-second embodiment was SiO 2
70.5 wt%, Al 2 O 3 9.8 wt%, Li 2 O
The 11.7wt%, 3wt% of P 2 O 5, 1w of TiO 2
t%, Ta 2 O 5 to 4 wt%, the TiO 2 / P 2 O 5 0.3
The composition ratio is 3.

【0087】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1520度、溶融時間
1.75時間、1次処理温度575度、1次処理時間
5.5時間、2次処理温度700度、2次処理時間4時
間にて処置した結果、主析出結晶相がリチウムダイシリ
ケート、副析出結晶相がクオーツで、比弾性率が35.
2という特性のガラス基板が得られた。上記組成は高い
比弾性率を有するだけでなく、非常に高い生産性を有す
る。
The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1520 ° C., the melting time was 1.75 hours, the primary processing temperature was 575 ° C., the primary processing time was 5.5 hours, and the secondary processing was performed according to the above-mentioned manufacturing method. As a result of treatment at a treatment temperature of 700 ° C. and a secondary treatment time of 4 hours, the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 35.
A glass substrate having a characteristic of 2 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.

【0088】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くTa25を加えているため溶融性、強度
を向上させ、またガラスマトリクス相の化学的耐久性を
向上させる。ただし、組成比が0.1wt%より少ない
と十分な剛性の向上がなされない。5wt%を越える
と、ガラスの結晶化が不安定となり、析出結晶相を制御
できなくなり、求める特性が得られにくくなる。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since Ta 2 O 5 serving as a flux is added, the meltability and strength are improved, and the chemical durability of the glass matrix phase is improved. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.

【0089】第23の実施例のガラス組成は、SiO2
を76wt%、Al23を9.5wt%、Li2Oを
9.5wt%、P25を2.5wt%、TiO2を1.
5wt%、La23を1wt%、TiO2/P25を0
の組成比である。
The glass composition of the twenty-third embodiment was SiO 2
76 wt%, Al 2 O 3 9.5 wt%, Li 2 O 9.5 wt%, P 2 O 5 2.5 wt%, TiO 2 1.
5 wt%, 1 wt% of La 2 O 3, a TiO 2 / P 2 O 5 0
Is the composition ratio.

【0090】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度690度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が37.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 690 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 37.2. The above composition has not only a high specific modulus, but also a very high productivity.

【0091】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くLa23を加えているため結晶析出が抑
制される。ただし、組成比が0.1wt%より少ないと
十分な剛性の向上がなされない。5wt%を越えると、
ガラスの結晶化が不安定となり、析出結晶相を制御でき
なくなり、求める特性が得られにくくなる。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since La 2 O 3 acting as a flux is added, crystal precipitation is suppressed. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If it exceeds 5 wt%,
The crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain the required characteristics.

【0092】第24の実施例のガラス組成は、SiO2
を67.3wt%、Al23を9.7wt%、Li2
を12wt%、P25を4wt%、TiO2を4wt
%、La23を4wt%、TiO2/P25を3の組成
比である。
The glass composition of the twenty-fourth embodiment was SiO 2
67.3 wt%, Al 2 O 3 9.7 wt%, Li 2 O
The 12 wt%, 4 wt% of P 2 O 5, 4wt of TiO 2
%, La 2 O 3 is 4 wt%, and TiO 2 / P 2 O 5 is 3.

【0093】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1500度、溶融時間2
時間、1次処理温度570度、1次処理時間5.5時
間、2次処理温度720度、2次処理時間4時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が36.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。
The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1500 ° C. and the melting time was 2 according to the above-mentioned production method.
Time, the primary processing temperature was 570 degrees, the primary processing time was 5.5 hours, the secondary processing temperature was 720 degrees, and the secondary processing time was 4 hours. As a result, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 36.2. The above composition has not only a high specific modulus, but also a very high productivity.

【0094】また組成として、基本組成であるSi
2、Al23、Li2O、P25、TiO2に加えて、
融剤として働くLa23を加えているため結晶析出が抑
制される。ただし、組成比が0.1wt%より少ないと
十分な剛性の向上がなされない。5wt%を越えると、
ガラスの結晶化が不安定となり、析出結晶相を制御でき
なくなり、求める特性が得られにくくなる。
The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 and TiO 2 ,
Since La 2 O 3 acting as a flux is added, crystal precipitation is suppressed. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If it exceeds 5 wt%,
The crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain the required characteristics.

【0095】[0095]

【発明の効果】本発明によると、比弾性率が30以上か
つ生産性の高いガラス基板を得ることができる。
According to the present invention, a glass substrate having a specific elastic modulus of 30 or more and high productivity can be obtained.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 遊亀 博 大阪市中央区安土町二丁目3番13号 大阪 国際ビル ミノルタ株式会社内 (72)発明者 石丸 和彦 大阪市中央区安土町二丁目3番13号 大阪 国際ビル ミノルタ株式会社内 Fターム(参考) 4G062 AA11 BB01 BB09 DA06 DA07 DB03 DB04 DC01 DD02 DD03 DE01 DF01 EA03 EA04 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB02 FB03 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN33 QQ02 QQ06 5D006 CB04 CB07 DA03 FA00  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Hiroshi Yugame 2-3-13 Azuchicho, Chuo-ku, Osaka City Inside Osaka International Building Minolta Co., Ltd. (72) Kazuhiko Ishimaru 2-3-3 Azuchicho, Chuo-ku, Osaka-shi No.13 Osaka International Building Minolta Co., Ltd. F-term (reference) 4G062 AA11 BB01 BB09 DA06 DA07 DB03 DB04 DC01 DD02 DD03 DE01 DF01 EA03 EA04 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB02 FB03 FC01 FD01 FE01 FF01 GA01 F01 GA01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN33 QQ02 QQ06 5D006 CB04 CB07 DA03 FA00

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 主成分の組成範囲を、 SiO2が65wt%以上で且つ 80wt%以下、 Al23が3wt%以上で且つ 15wt%以下、 Li2Oが3wt%以上で且つ 15wt%以下、 P25が0.2wt%以上で且つ 5wt%以下、 TiO2が0.1wt%以上で且つ 10wt%以下、 TiO2/P25が0.1wt%以上で且つ 0.9w
t%以下、としたことを特徴とするガラス組成。
1. The composition range of a main component is as follows: SiO 2 is 65 wt% or more and 80 wt% or less, Al 2 O 3 is 3 wt% or more and 15 wt% or less, Li 2 O is 3 wt% or more and 15 wt% or less. P 2 O 5 is 0.2 wt% or more and 5 wt% or less, TiO 2 is 0.1 wt% or more and 10 wt% or less, TiO 2 / P 2 O 5 is 0.1 wt% or more and 0.9 w%.
A glass composition characterized by being at most t%.
JP11191748A 1999-07-06 1999-07-06 Glass composition Pending JP2001019485A (en)

Priority Applications (1)

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Applications Claiming Priority (1)

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Publication Number Publication Date
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Family

ID=16279857

Family Applications (1)

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Country Link
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Cited By (5)

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WO2008034797A2 (en) * 2006-09-18 2008-03-27 Colorobbia Italia S.P.A. Process for the preparation of ceramic glass material in the form of sheets, sheets thus obtained and use thereof
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JP2007166399A (en) * 2005-12-15 2007-06-28 Toshiba Corp Telephone exchange device and group incoming-call control method for telephone exchange device
WO2008034797A2 (en) * 2006-09-18 2008-03-27 Colorobbia Italia S.P.A. Process for the preparation of ceramic glass material in the form of sheets, sheets thus obtained and use thereof
WO2008034797A3 (en) * 2006-09-18 2008-09-12 Colorobbia Italiana Spa Process for the preparation of ceramic glass material in the form of sheets, sheets thus obtained and use thereof
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US9402699B2 (en) 2011-10-14 2016-08-02 Ivoclar Vivadent Ag Lithium silicate glass ceramic and lithium silicate glass comprising a trivalent metal oxide
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US9695082B2 (en) 2011-10-14 2017-07-04 Ivoclar Vivadent Ag Lithium silicate glass ceramic and lithium silicate glass comprising a tetravalent metal oxide
JP2015504400A (en) * 2011-10-14 2015-02-12 イフォクレール ヴィヴァデント アクチェンゲゼルシャフトIvoclar Vivadent AG Lithium silicate glass ceramic and glass containing tetravalent metal oxide
US10160687B2 (en) 2011-10-14 2018-12-25 Ivoclar Vivadent Ag Lithium silicate glass ceramic and glass with tetravalent metal oxide
US10321980B2 (en) 2011-10-14 2019-06-18 Ivoclar Vivadent Ag Lithium silicate glass ceramic and glass with trivalent metal oxide
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