JP2001019479A - Glass composition - Google Patents
Glass compositionInfo
- Publication number
- JP2001019479A JP2001019479A JP11191741A JP19174199A JP2001019479A JP 2001019479 A JP2001019479 A JP 2001019479A JP 11191741 A JP11191741 A JP 11191741A JP 19174199 A JP19174199 A JP 19174199A JP 2001019479 A JP2001019479 A JP 2001019479A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- glass
- hours
- composition ratio
- crystal phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はガラス組成、特に結
晶化ガラスに適したガラス組成に関する。さらに詳しく
は、結晶化ガラス磁気ディスクの組成に関する。The present invention relates to a glass composition, particularly a glass composition suitable for crystallized glass. More specifically, it relates to the composition of a crystallized glass magnetic disk.
【0002】[0002]
【従来の技術】従来、磁気ディスク用の基板としては、
アルミニウム基板、ガラス基板等が実用化されている。
中でもガラス基板は、表面の平滑性や機械的強度が優れ
ていることから、最も注目されている。そのようなガラ
ス基板としては、ガラス基板表面をイオン交換で強化し
た化学強化ガラス基板や、基板に結晶成分を析出させて
結合の強化を図る結晶化ガラス基板が知られている。2. Description of the Related Art Conventionally, as a substrate for a magnetic disk,
Aluminum substrates and glass substrates have been put to practical use.
Among them, a glass substrate has received the most attention because of its excellent surface smoothness and mechanical strength. As such a glass substrate, a chemically strengthened glass substrate in which the surface of the glass substrate is strengthened by ion exchange, and a crystallized glass substrate in which a crystal component is precipitated on the substrate to strengthen the bond are known.
【0003】[0003]
【発明が解決しようとする課題】ところで最近の基板に
対する性能の要求は、日に日に厳しくなってきており、
とくに高速回転時のたわみやそりに直接的に関わる強度
に対する性能の向上が求められている。これは基板材料
の比弾性率(=ヤング率/比重)によって表すことがで
き、数値が高ければ高いほど望ましい。またこのような
要求を満たしながら、生産性の向上が求められている。
そこで本発明は、ガラスの比弾性率が向上し、さらに生
産性の高いを組成を提供することを目的とする。By the way, the recent demand for the performance of the substrate is becoming stricter day by day.
In particular, there is a demand for an improvement in performance with respect to strength directly related to deflection and warpage during high-speed rotation. This can be represented by the specific elastic modulus (= Young's modulus / specific gravity) of the substrate material, and the higher the numerical value, the more desirable. Further, there is a demand for improvement in productivity while satisfying such requirements.
Therefore, an object of the present invention is to provide a composition with improved specific elastic modulus of glass and higher productivity.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
に請求項1に記載された発明は、主成分の組成範囲を、
SiO2が65wt%以上で且つ 80wt%以下、A
l2O3が3wt%以上で且つ 15wt%以下、Li2
Oが3wt%以上で且つ 12wt%以下、TiO2が
0.1wt%以上で且つ 10wt%以下、ZrO2が
1.5wt%以上で且つ 8wt%以下、P2O5が0.
2wt%以上で且つ 5wt%以下、K2Oが1.6w
t%以上で且つ 5wt%以下、にしたことを特徴とす
る。Means for Solving the Problems In order to achieve the above object, the invention described in claim 1 provides a composition range of a main component,
SiO 2 is 65 wt% or more and 80 wt% or less, A
l 2 O 3 is and 15 wt% or less at 3 wt% or more, Li 2
O is 3 wt% or more and 12 wt% or less, TiO 2 is 0.1 wt% or more and 10 wt% or less, ZrO 2 is 1.5 wt% or more and 8 wt% or less, and P 2 O 5 is 0.1 wt% or less.
At least 2 wt% and at most 5 wt%, K 2 O is 1.6w
It is characterized by being at least t% and at most 5 wt%.
【0005】[0005]
【発明の実施の形態】以下、本発明の実施形態について
説明する。本発明に係る実施形態のガラス基板は、主成
分の組成範囲が、SiO2が65wt%以上で且つ80
wt%以下、Al2O3が3wt%以上で且つ15wt%
以下、Li2Oが3wt%以上で且つ12wt%以下、
TiO2が0.1wt%以上で且つ10wt%以下、Z
rO2が1.5wt%以上で且つ8wt%以下、P2O5
が0.2wt%以上で且つ5wt%以下、K2Oが1.
6wt%以上で且つ5wt%以下であることを特徴とし
ている。Embodiments of the present invention will be described below. In the glass substrate of the embodiment according to the present invention, the composition range of the main component is such that SiO 2 is 65 wt% or more and 80 wt% or more.
wt% or less, Al 2 O 3 is 3 wt% or more and 15 wt%
Hereinafter, Li 2 O is at least 3 wt% and at most 12 wt%,
TiO 2 not less than 0.1 wt% and not more than 10 wt%, Z
rO 2 is not less than 1.5 wt% and not more than 8 wt%, and P 2 O 5
Is 0.2 wt% or more and 5 wt% or less, and K 2 O is 1.
It is characterized by being at least 6 wt% and at most 5 wt%.
【0006】SiO2はガラス形成酸化物のため組成比
が65wt%より少ないと、溶融性が悪くなり、80w
t%を越えるとガラスとして安定状態になるため、結晶
が析出しにくくなる。Since SiO 2 is a glass-forming oxide, if its composition ratio is less than 65% by weight, its melting property deteriorates and 80 w
If it exceeds t%, the glass will be in a stable state, and it will be difficult for crystals to precipitate.
【0007】Al2O3はガラス中間酸化物であり、熱処
理によって析出する結晶相であるホウ酸アルミニウム系
結晶の構成成分である。組成比が3wt%より少ないと
析出結晶が少なく、強度が得られず、15wt%を越え
ると溶融温度が高くなり失透しやすくなる。[0007] Al 2 O 3 is a glass intermediate oxide, and is a component of aluminum borate-based crystals that are crystal phases precipitated by heat treatment. If the composition ratio is less than 3 wt%, the number of precipitated crystals is small, and strength cannot be obtained. If the composition ratio is more than 15 wt%, the melting temperature becomes high and the glass tends to be devitrified.
【0008】Li2Oは融剤としての役割を果たすとと
もに、リチウムダイシリケート系結晶の構成成分であ
る。組成比が3wt%より少ないと結晶相であるリチウ
ムダイシリケートの析出が不十分となり、12wt%を
越えると、析出結晶相のリチウムダイシリケートが不安
定となり結晶化を制御しにくくなる。また化学的耐久性
が低下し磁気膜に影響を与える恐れがあり、また研磨−
洗浄工程における安定性が悪くなる。[0008] Li 2 O plays a role as a flux and is a component of lithium disilicate-based crystals. If the composition ratio is less than 3 wt%, the precipitation of lithium disilicate as a crystal phase becomes insufficient. If the composition ratio exceeds 12 wt%, the lithium disilicate in the precipitated crystal phase becomes unstable and crystallization becomes difficult to control. In addition, chemical durability may be reduced and the magnetic film may be affected.
The stability in the washing process is deteriorated.
【0009】TiO2は融剤であり、結晶成長を促進さ
せる。組成比が0.1wt%より少ないと溶融性が悪く
なると共に、結晶成長がしにくくなり、10wt%を越
えると結晶化が急激に促進され、結晶化状態の制御が困
難となり析出結晶の粗大化、結晶相の不均質が発生し、
微細で均質な結晶構造が得られなくなり、研磨加工にお
いてディスク基板として必要な平滑面が得られなくな
る。さらに溶融成形時に失透しやすくなり、生産性が低
下する。TiO 2 is a flux and promotes crystal growth. If the composition ratio is less than 0.1 wt%, the meltability deteriorates, and the crystal growth becomes difficult. If the composition ratio exceeds 10 wt%, crystallization is rapidly promoted, the control of the crystallization state becomes difficult, and the deposited crystals become coarse. , Crystal phase heterogeneity occurs,
A fine and uniform crystal structure cannot be obtained, and a smooth surface required as a disk substrate in polishing cannot be obtained. Further, devitrification tends to occur during melt molding, and productivity is reduced.
【0010】ZrO2はガラス修飾酸化物であり、ガラ
スの結晶核剤である。特にクオーツ系結晶をガラス全体
に均一に析出させるために非常に有効である。組成比が
1.5wt%より少ないと十分な結晶核が形成されなく
にくくなり、結晶粒子が粗大化したり結晶が不均質に析
出し、微細で均質な結晶構造が得られなくなり、研磨加
工においてディスク基板として必要な平滑面が得られな
くなる。また化学的耐久性および耐マイグレーションが
低下し、磁気膜に影響を与える恐れがあるとともに、研
磨−洗浄工程において安定性が悪くなる。また8wt%
を越えると溶融温度が高くなり、また失透しやすくなり
溶融成形が困難となる。また析出結晶相が変化し求める
特性が得られにくくなる。ZrO 2 is a glass-modified oxide and is a crystal nucleating agent for glass. In particular, it is very effective for uniformly depositing a quartz crystal over the entire glass. If the composition ratio is less than 1.5% by weight, it is difficult to form sufficient crystal nuclei, crystal grains are coarsened or crystals are heterogeneously deposited, and a fine and uniform crystal structure cannot be obtained. A smooth surface required as a substrate cannot be obtained. In addition, chemical durability and migration resistance are reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process is deteriorated. Also 8wt%
If the temperature exceeds the above range, the melting temperature will be high, the glass will be easily devitrified, and the melt molding will be difficult. In addition, the precipitated crystal phase changes, making it difficult to obtain desired characteristics.
【0011】P2O5は融剤として働き、リチウムダイシ
リケート系結晶を析出させる核形成剤であり、ガラス全
体に結晶を均一に析出させるために重要な成分である。
組成比が0.2wt%より少ないと十分な結晶核が形成
されにくくなり、結晶粒子が粗大化したり結晶が不均質
に析出し、微細で均質な結晶構造が得られにくくなり、
研磨加工においてディスク基板として必要な平滑面が得
られなくなる。また難溶融性のZrO2成分に対する融
剤としての効果が十分得られなくなる。5wt%を越え
ると、溶融時の炉剤に対する反応性が増し、また失透性
も強くなることから溶融成形時の生産性が低下する。ま
た化学的耐久性が低下し、磁気膜に影響を与える恐れが
あると共に、研磨−洗浄工程における安定性が悪くな
る。P 2 O 5 is a nucleating agent that functions as a flux and precipitates lithium disilicate-based crystals, and is an important component for uniformly depositing crystals throughout the glass.
If the composition ratio is less than 0.2 wt%, it is difficult to form sufficient crystal nuclei, crystal grains are coarsened or crystals are heterogeneously deposited, and it is difficult to obtain a fine and uniform crystal structure,
In polishing, a smooth surface required as a disk substrate cannot be obtained. Further, the effect as a flux for the hardly-fusible ZrO 2 component cannot be obtained. If it exceeds 5% by weight, the reactivity with the furnace agent at the time of melting increases, and the devitrification also increases, so that the productivity at the time of melt molding decreases. In addition, the chemical durability may be reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process may be deteriorated.
【0012】K2Oは融剤として働き、生産時の安定性
が向上している。ただし、組成比が1.6wt%より少
ないと十分な溶融性改善がなされない。5wt%を越え
ると、ガラスが安定となり結晶化が抑制され、また化学
的耐久性が低下し、磁気膜に影響を与える恐れがあると
共に、研磨−洗浄工程における安定性が悪くなる。K 2 O acts as a flux and has improved stability during production. However, if the composition ratio is less than 1.6% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.
【0013】以下製造方法を説明する。最終的に生成さ
れるガラス基板の主成分の組成を含む原料を所定の割合
にて充分に混合し、これを白金るつぼに入れ溶融を行
う。溶融後金型に流し概略の形状を形成する。これを室
温までアニールする。続いて、示される1次熱処理温度
と1次処理時間により保持し(熱処理)、結晶核生成が
行われる。引き続き、2次熱処理温度と2次処理時間に
より保持し結晶核成長を行う。これを除冷することによ
り目的とする結晶化ガラスが得られる。Hereinafter, the manufacturing method will be described. Raw materials including the composition of the main components of the finally produced glass substrate are sufficiently mixed at a predetermined ratio, and the mixture is put into a platinum crucible and melted. After melting, it is poured into a mold to form a rough shape. This is annealed to room temperature. Subsequently, the temperature is maintained at the indicated primary heat treatment temperature and primary treatment time (heat treatment), and crystal nucleation is performed. Subsequently, the crystal nucleus is grown while maintaining the temperature at the secondary heat treatment and the secondary treatment time. By cooling this, the desired crystallized glass is obtained.
【0014】以上の製造方法によって得られたガラス基
板は、SiO2が65wt%以上で且つ80wt%以
下、Al2O3が3wt%以上で且つ15wt%以下、L
i2Oが3wt%以上で且つ12wt%以下、TiO2が
0.1wt%以上で且つ10wt%以下、ZrO2が
1.5wt%以上で且つ8wt%以下、P2O5が0.2
wt%以上で且つ5wt%以下、K2Oが1.6wt%
以上で且つ5wt%以下とするために、非常に高い比弾
性率と高い生産性を得ることが可能となった。The glass substrate obtained by the above manufacturing method has a SiO 2 content of 65 wt% or more and 80 wt% or less, an Al 2 O 3 content of 3 wt% or more and 15 wt% or less,
i 2 O is 3 wt% or more and 12 wt% or less, TiO 2 is 0.1 wt% or more and 10 wt% or less, ZrO 2 is 1.5 wt% or more and 8 wt% or less, and P 2 O 5 is 0.2 wt% or less.
not less than 5 wt% and not more than 5 wt%, and 1.6 wt% of K 2 O
As described above, it is possible to obtain a very high specific elastic modulus and a high productivity by setting the content to 5 wt% or less.
【0015】[0015]
【実施例】次に実施形態を実施した具体的な実施例につ
いて説明する。第1〜第4実施例のガラスを構成する材
料組成比(単位:wt%)、溶融温度と溶融時間、1次
熱処理温度と1次処理時間、2次熱処理温度と2次処理
時間、主析出結晶相、副析出結晶相、平均結晶粒径、比
重、ヤング率、比弾性率を表1に示す。同様に第5〜第
8実施例のガラスを表2に示す。同様に第9〜第12実
施例のガラスを表3に示す。同様に第13〜第16実施
例のガラスを表4に示す。同様に第17〜第20実施例
のガラスを表5に示す。同様に第21実施例のガラスを
表6に示す。Next, a specific example of the embodiment will be described. Material composition ratio (unit: wt%), melting temperature and melting time, primary heat treatment temperature and primary treatment time, secondary heat treatment temperature and secondary treatment time, main precipitation constituting the glasses of the first to fourth embodiments Table 1 shows the crystal phase, sub-precipitated crystal phase, average crystal grain size, specific gravity, Young's modulus, and specific elastic modulus. Table 2 similarly shows the glasses of the fifth to eighth examples. Table 3 similarly shows the ninth to twelfth examples. Table 4 similarly shows glasses of the thirteenth to sixteenth examples. Table 5 similarly shows glasses of the seventeenth to twentieth examples. Table 6 similarly shows the glass of the 21st example.
【0016】[0016]
【表1】 [Table 1]
【0017】[0017]
【表2】 [Table 2]
【0018】[0018]
【表3】 [Table 3]
【0019】[0019]
【表4】 [Table 4]
【0020】[0020]
【表5】 [Table 5]
【0021】[0021]
【表6】 [Table 6]
【0022】第1の実施例のガラス組成は、SiO2を
75wt%、Al2O3を6wt%、Li2Oを8.5w
t%、TiO2を0.5wt%、ZrO2を3.5wt
%、P2O5を1.5wt%、K2Oを1.6wt%、C
aOを2.9wt%、Sb2O3を0.5wt%の組成比
である。The glass composition of the first embodiment is as follows: 75% by weight of SiO 2 , 6% by weight of Al 2 O 3 , 8.5% by weight of Li 2 O.
t%, TiO 2 0.5 wt%, ZrO 2 3.5 wt
%, P 2 O 5 at 1.5 wt%, K 2 O at 1.6 wt%, C
The composition ratio of aO is 2.9 wt% and Sb 2 O 3 is 0.5 wt%.
【0023】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が37.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 37.2. The above composition has not only a high specific modulus, but also a very high productivity.
【0024】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くCaOを加えているた
め高い溶融性、安定した結晶相があることができる。組
成比が0.1wt%より少ないと十分な溶融性改善がな
されない。5wt%を越えると、ガラスが安定となり結
晶化が抑制され、求める強度が得られにくくなる。The basic composition is Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since CaO acting as a flux is added in addition to K 2 O, a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0025】また、清澄剤として働くSb2O3を加えて
いるため生産時の安定性が向上している。ただし、組成
比が0.1wt%より少ないと十分な清澄効果が得られ
なくなり、生産性が低下する。5wt%を越えると、ガ
ラスの結晶化が不安定となり析出結晶相を制御できなく
なり、求める特性が得られにくくなる。Further, since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0026】第2の実施例のガラス組成は、SiO2を
78wt%、Al2O3を7wt%、Li2Oを8.5w
t%、TiO2を0.5wt%、ZrO2を2.5wt
%、P2O5を1.5wt%、K2Oを2wt%の組成比
である。The glass composition of the second embodiment is as follows: 78% by weight of SiO 2 , 7% by weight of Al 2 O 3 , and 8.5% by weight of Li 2 O.
t%, the TiO 2 0.5 wt%, a ZrO 2 2.5 wt
%, P 2 O 5 is 1.5 wt%, and K 2 O is 2 wt%.
【0027】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が38.9と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase is lithium disilicate and the sub-precipitated crystal phase is quartz and the specific elastic modulus is 38.9 was obtained. . The above composition has not only a high specific modulus, but also a very high productivity.
【0028】第3の実施例のガラス組成は、SiO2を
74wt%、Al2O3を6wt%、Li2Oを8wt
%、TiO2を1.5wt%、ZrO2を4wt%、P2
O5を2wt%、K2Oを4.5wt%の組成比である。The glass composition of the third embodiment is as follows: 74% by weight of SiO 2 , 6% by weight of Al 2 O 3 , and 8% by weight of Li 2 O.
%, TiO 2 1.5 wt%, ZrO 2 4 wt%, P 2
The composition ratio of O 5 is 2 wt% and K 2 O is 4.5 wt%.
【0029】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が37.3という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 700 ° C. for a secondary treatment time of 3 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 37.3. The above composition has not only a high specific modulus, but also a very high productivity.
【0030】第4の実施例のガラス組成は、SiO2を
67wt%、Al2O3を12wt%、Li2Oを7wt
%、TiO2を1wt%、ZrO2を3.5wt%、P2
O5を3wt%、K2Oを2.5wt%、CaOを4wt
%の組成比である。The glass composition of the fourth embodiment is as follows: SiO 2 is 67 wt%, Al 2 O 3 is 12 wt%, and Li 2 O is 7 wt%.
%, TiO 2 1 wt%, ZrO 2 3.5 wt%, P 2
O 5 to 3 wt%, 2.5 wt% of K 2 O, 4 wt CaO,
%.
【0031】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度720度、2次処理時間4時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が37.3と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1480 degrees, the melting time is 2.5 hours, the primary processing temperature is 575 degrees, the primary processing time is 5.
The glass was treated for 5 hours at a secondary treatment temperature of 720 degrees and a secondary treatment time of 4 hours. As a result, the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 37.3. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0032】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くCaOを加えているた
め高い溶融性、安定した結晶相があることができる。組
成比が0.1wt%より少ないと十分な溶融性改善がな
されない。5wt%を越えると、ガラスが安定となり結
晶化が抑制され、求める強度が得られにくくなる。The basic composition is Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since CaO acting as a flux is added in addition to K 2 O, a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0033】第5の実施例のガラス組成は、SiO2を
72wt%、Al2O3を10wt%、Li2Oを6wt
%、TiO2を1.2wt%、ZrO2を2.3wt%、
P2O5を4.3wt%、K2Oを4wt%、CaOを
0.2wt%の組成比である。The glass composition of the fifth embodiment is such that SiO 2 is 72 wt%, Al 2 O 3 is 10 wt%, and Li 2 O is 6 wt%.
%, TiO 2 1.2 wt%, ZrO 2 2.3 wt%,
The composition ratio of P 2 O 5 is 4.3 wt%, K 2 O is 4 wt%, and CaO is 0.2 wt%.
【0034】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が37.9と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 570 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a main precipitated crystal phase of quartz, a sub-precipitated crystal phase of lithium disilicate and a specific elastic modulus of 37.9 was obtained. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0035】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くCaOを加えているた
め高い溶融性、安定した結晶相があることができる。組
成比が0.1wt%より少ないと十分な溶融性改善がな
されない。5wt%を越えると、ガラスが安定となり結
晶化が抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since CaO acting as a flux is added in addition to K 2 O, a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0036】第6の実施例のガラス組成は、SiO2を
70wt%、Al2O3を9.2wt%、Li2Oを8.
5wt%、TiO2を0.5wt%、ZrO2を4wt
%、P2O5を1.8wt%、K2Oを3wt%、Sb2O
3を3wt%の組成比である。The glass composition of the sixth embodiment is such that SiO 2 is 70 wt%, Al 2 O 3 is 9.2 wt%, and Li 2 O is 8.
5 wt%, the TiO 2 0.5 wt%, a ZrO 2 4 wt
%, P 2 O 5 1.8 wt%, K 2 O 3 wt%, Sb 2 O
3 is a composition ratio of 3 wt%.
【0037】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1520度、溶融時間
1.75時間、1次処理温度585度、1次処理時間5
時間、2次処理温度700度、2次処理時間3時間にて
処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が34.8と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1,520 degrees, the melting time is 1.75 hours, the primary processing temperature is 585 degrees, the primary processing time is 5, according to the above-mentioned manufacturing method.
Glass substrate with a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 34.8. was gotten. The above composition has not only a high specific modulus, but also a very high productivity.
【0038】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、清澄剤として働くSb2O3を加えてい
るため生産時の安定性が向上している。ただし、組成比
が0.1wt%より少ないと十分な清澄効果が得られな
くなり、生産性が低下する。5wt%を越えると、ガラ
スの結晶化が不安定となり析出結晶相を制御できなくな
り、求める特性が得られにくくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since Sb 2 O 3 serving as a fining agent is added in addition to K 2 O, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0039】第7の実施例のガラス組成は、SiO2を
72wt%、Al2O3を10.5wt%、Li2Oを8
wt%、TiO2を0.4wt%、ZrO2を2.2wt
%、P2O5を3.9wt%、K2Oを1.8wt%、S
b2O3を1.2wt%の組成比である。The glass composition of the seventh embodiment is such that SiO 2 is 72 wt%, Al 2 O 3 is 10.5 wt%, and Li 2 O is 8 wt%.
wt%, the TiO 2 0.4 wt%, a ZrO 2 2.2 wt
%, P 2 O 5 3.9 wt%, K 2 O 1.8 wt%, S
The composition ratio of b 2 O 3 is 1.2 wt%.
【0040】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が37.6と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 degrees, the melting time is 2.5 hours, the primary processing temperature is 575 degrees, the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is quartz, the sub-precipitated crystal phase is lithium disilicate, and the specific elastic modulus is 37.6. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0041】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、清澄剤として働くSb2O3を加えてい
るため生産時の安定性が向上している。ただし、組成比
が0.1wt%より少ないと十分な清澄効果が得られな
くなり、生産性が低下する。5wt%を越えると、ガラ
スの結晶化が不安定となり析出結晶相を制御できなくな
り、求める特性が得られにくくなる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since Sb 2 O 3 serving as a fining agent is added in addition to K 2 O, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0042】第8の実施例のガラス組成は、SiO2を
74wt%、Al2O3を8.5wt%、Li2Oを7.
2wt%、TiO2を0.6wt%、ZrO2を3.5w
t%、P2O5を1.2wt%、K2Oを3wt%、B2O
3を2wt%の組成比である。The glass composition of the eighth embodiment is such that 74 wt% of SiO 2 , 8.5 wt% of Al 2 O 3 , and 7 wt% of Li 2 O.
2 wt%, TiO 2 0.6 wt%, ZrO 2 3.5 w
t%, P 2 O 5 1.2 wt%, K 2 O 3 wt%, B 2 O
3 is a composition ratio of 2 wt%.
【0043】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が38.1という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 ° C. and the secondary treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 38.1 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0044】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、フォーマーとして働くB2O3を加えて
いるためガラスの分相を促し、結晶析出および成長を促
進させる。ただし、組成比が0.1wt%より少ないと
十分な溶融性改善がなされない。15wt%を越える
と、ガラスが失透しやすくなり成形が困難になると共
に、結晶が粗大化し微細な結晶が得られなくなる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since B 2 O 3 serving as a former is added in addition to K 2 O, it promotes the phase separation of the glass and promotes crystal precipitation and growth. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 15% by weight, the glass tends to be devitrified and molding becomes difficult, and the crystals become coarse and fine crystals cannot be obtained.
【0045】第9の実施例のガラス組成は、SiO2を
72wt%、Al2O3を6.5wt%、Li2Oを6.
5wt%、TiO2を1.5wt%、ZrO2を2wt
%、P2O5を1.5wt%、K2Oを4wt%、B2O3
を6wt%の組成比である。The glass composition of the ninth embodiment is as follows: 72 wt% of SiO 2 , 6.5 wt% of Al 2 O 3, and 6.5 wt% of Li 2 O.
5 wt%, TiO 2 1.5 wt%, ZrO 2 2 wt
%, P 2 O 5 1.5 wt%, K 2 O 4 wt%, B 2 O 3
Is a composition ratio of 6 wt%.
【0046】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が39.6という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 700 ° C. for a secondary treatment time of 3 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 39.6. The above composition has not only a high specific modulus, but also a very high productivity.
【0047】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、フォーマーとして働くB2O3を加えて
いるためガラスの分相を促し、結晶析出および成長を促
進させる。ただし、組成比が0.1wt%より少ないと
十分な溶融性改善がなされない。15wt%を越える
と、ガラスが失透しやすくなり成形が困難になると共
に、結晶が粗大化し微細な結晶が得られなくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since B 2 O 3 serving as a former is added in addition to K 2 O, it promotes the phase separation of the glass and promotes crystal precipitation and growth. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 15% by weight, the glass tends to be devitrified and molding becomes difficult, and the crystals become coarse and fine crystals cannot be obtained.
【0048】第10の実施例のガラス組成は、SiO2
を74wt%、Al2O3を8.5wt%、Li2Oを
6.3wt%、TiO2を0.7wt%、ZrO2を3w
t%、P2O5を1.5wt%、K2Oを4wt%、Mg
Oを2wt%の組成比である。The glass composition of the tenth embodiment was SiO 2
74 wt%, Al 2 O 3 8.5 wt%, Li 2 O 6.3 wt%, TiO 2 0.7 wt%, ZrO 2 3 w
t%, P 2 O 5 1.5 wt%, K 2 O 4 wt%, Mg
O has a composition ratio of 2 wt%.
【0049】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が37.7という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratios, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 ° C. and the secondary treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 37.7 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0050】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くMgOを加えているた
め結晶相の一つである粒状のクオーツ結晶を凝集させ結
晶粒子塊を形成する。ただし、組成比が0.1wt%よ
り少ないと作業温度幅が狭くなりう、ガラスマトリクス
相の化学的耐久性が向上しない。12wt%を越える
と、他の結晶相が析出して求める強度を得ることが難し
くなる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since MgO serving as a flux is added in addition to K 2 O, granular quartz crystals, which are one of the crystal phases, are aggregated to form crystal particle masses. However, if the composition ratio is less than 0.1 wt%, the working temperature range becomes narrow, and the chemical durability of the glass matrix phase does not improve. If it exceeds 12% by weight, it is difficult to obtain the required strength due to precipitation of another crystal phase.
【0051】第11の実施例のガラス組成は、SiO2
を70wt%、Al2O3を7.5wt%、Li2Oを
6.2wt%、TiO2を1.4wt%、ZrO2を6w
t%、P2O5を3.3wt%、K2Oを1.6wt%、
MgOを4wt%の組成比である。The glass composition of the eleventh embodiment was SiO 2
70 wt%, Al 2 O 3 7.5 wt%, Li 2 O 6.2 wt%, TiO 2 1.4 wt%, ZrO 2 6 w
t%, P 2 O 5 is 3.3 wt%, K 2 O is 1.6 wt%,
MgO has a composition ratio of 4 wt%.
【0052】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1500度、溶融時間2
時間、1次処理温度575度、1次処理時間5.5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が36.1という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and according to the above-mentioned production method, the melting temperature is 1500 ° C. and the melting time is 2 hours.
Treatment time was 575 ° C., primary treatment time was 5.5 hours, primary treatment time was 5.5 hours, secondary treatment temperature was 700 ° C., and secondary treatment time was 3 hours. A glass substrate having a specific elastic modulus of 36.1 was obtained from disilicate. The above composition has not only a high specific modulus, but also a very high productivity.
【0053】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くMgOを加えているた
め結晶相の一つである粒状のクオーツ結晶を凝集させ結
晶粒子塊を形成する。ただし、組成比が0.1wt%よ
り少ないと作業温度幅が狭くなりう、ガラスマトリクス
相の化学的耐久性が向上しない。12wt%を越える
と、他の結晶相が析出して求める強度を得ることが難し
くなる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since MgO serving as a flux is added in addition to K 2 O, granular quartz crystals, which are one of the crystal phases, are aggregated to form crystal particle masses. However, if the composition ratio is less than 0.1 wt%, the working temperature range becomes narrow, and the chemical durability of the glass matrix phase does not improve. If it exceeds 12% by weight, it is difficult to obtain the required strength due to precipitation of another crystal phase.
【0054】第12の実施例のガラス組成は、SiO2
を76wt%、Al2O3を8.3wt%、Li2Oを5
wt%、TiO2を0.5wt%、ZrO2を2wt%、
P2O5を1.5wt%、K2Oを4.2wt%、BaO
を2.5wt%の組成比である。The glass composition of the twelfth embodiment was SiO 2
76 wt%, Al 2 O 3 8.3 wt%, Li 2 O 5
wt%, the TiO 2 0.5 wt%, a ZrO 2 2 wt%,
1.5 wt% of P 2 O 5 , 4.2 wt% of K 2 O, BaO
Is a composition ratio of 2.5 wt%.
【0055】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1520度、溶融時間
1.75時間、1次処理温度585度、1次処理時間5
時間、2次処理温度690度、2次処理時間2.5時間
にて処置した結果、主析出結晶相がクオーツ、副析出結
晶相がリチウムダイシリケートで、比弾性率が35.6
という特性のガラス基板が得られた。上記組成は高い比
弾性率を有するだけでなく、非常に高い生産性を有す
る。The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1,520 ° C., the melting time was 1.75 hours, the primary processing temperature was 585 ° C., and the primary processing time was 5, according to the above-mentioned manufacturing method.
Treatment time was 690 ° C., the secondary treatment temperature was 690 ° C., and the secondary treatment time was 2.5 hours. As a result, the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 35.6.
Thus, a glass substrate having such characteristics was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0056】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くBaOを加えているた
め生産時の安定性が向上している。ただし、組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since BaO that acts as a flux is added in addition to K 2 O, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0057】第13の実施例のガラス組成は、SiO2
を72wt%、Al2O3を7wt%、Li2Oを6wt
%、TiO2を1.5wt%、ZrO2を3wt%、P2
O5を4.7wt%、K2Oを1.8wt%、BaOを4
wt%の組成比である。The glass composition of the thirteenth embodiment was SiO 2
72 wt%, Al 2 O 3 7 wt%, Li 2 O 6 wt%
%, TiO 2 1.5 wt%, ZrO 2 3 wt%, P 2
4.7 wt% of O 5 , 1.8 wt% of K 2 O and 4 of BaO
The composition ratio is wt%.
【0058】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1540度、溶融時間
1.75時間、1次処理温度570度、1次処理時間
5.5時間、2次処理温度700度、2次処理時間3時
間にて処置した結果、主析出結晶相がクオーツ、副析出
結晶相がリチウムダイシリケートで、比弾性率が33.
6という特性のガラス基板が得られた。上記組成は高い
比弾性率を有するだけでなく、非常に高い生産性を有す
る。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1540 ° C., the melting time is 1.75 hours, the primary processing temperature is 570 ° C., the primary processing time is 5.5 hours, and the secondary processing time is according to the above-mentioned manufacturing method. As a result of treatment at a treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 33.
A glass substrate having characteristics of 6 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0059】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くBaOを加えているた
め生産時の安定性が向上している。ただし、組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since BaO that acts as a flux is added in addition to K 2 O, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0060】第14の実施例のガラス組成は、SiO2
を76wt%、Al2O3を8wt%、Li2Oを7.5
wt%、TiO2を0.5wt%、ZrO2を2wt%、
P2O5を1.5wt%、K2Oを3.5wt%、ZnO
を1wt%の組成比である。The glass composition of the fourteenth embodiment was SiO 2
76 wt%, Al 2 O 3 8 wt%, Li 2 O 7.5
wt%, the TiO 2 0.5 wt%, a ZrO 2 2 wt%,
1.5 wt% of P 2 O 5 , 3.5 wt% of K 2 O, ZnO
Is a composition ratio of 1 wt%.
【0061】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が38.0と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 38.0. . The above composition has not only a high specific modulus, but also a very high productivity.
【0062】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くZnOを加えているた
め均一な結晶析出を補助する。ただし、組成比が0.1
wt%より少ないと十分な結晶均質化の改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
In addition to K 2 O, ZnO serving as a flux is added to assist uniform crystal precipitation. However, when the composition ratio is 0.1
If the amount is less than wt%, sufficient improvement in crystal homogenization cannot be achieved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0063】第15の実施例のガラス組成は、SiO2
を76.5wt%、Al2O3を7wt%、Li2Oを6
wt%、TiO2を1.5wt%、ZrO2を2wt%、
P2O5を0.5wt%、K2Oを4.5wt%、ZnO
を2wt%の組成比である。The glass composition of the fifteenth embodiment was SiO 2
76.5 wt%, Al 2 O 3 7 wt%, Li 2 O 6
wt%, the TiO 2 1.5 wt%, a ZrO 2 2 wt%,
0.5 wt% of P 2 O 5 , 4.5 wt% of K 2 O, ZnO
Is a composition ratio of 2 wt%.
【0064】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度600度、1次処理時間4.
5時間、2次処理温度690度、2次処理時間2.5時
間にて処置した結果、主析出結晶相がクオーツ、副析出
結晶相がリチウムダイシリケートで、比弾性率が37.
0という特性のガラス基板が得られた。上記組成は高い
比弾性率を有するだけでなく、非常に高い生産性を有す
る。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 degrees, the melting time is 2.5 hours, the primary processing temperature is 600 degrees, the primary processing time is 4.
As a result of treating for 5 hours at a secondary treatment temperature of 690 ° C. and a secondary treatment time of 2.5 hours, the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 37.
A glass substrate having a characteristic of 0 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0065】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くZnOを加えているた
め均一な結晶析出を補助する。ただし、組成比が0.1
wt%より少ないと十分な結晶均質化の改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
In addition to K 2 O, ZnO serving as a flux is added to assist uniform crystal precipitation. However, when the composition ratio is 0.1
If the amount is less than wt%, sufficient improvement in crystal homogenization cannot be achieved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0066】第16の実施例のガラス組成は、SiO2
を77.7wt%、Al2O3を6wt%、Li2Oを
8.5wt%、TiO2を0.5wt%、ZrO2を3.
5wt%、P2O5を1.5wt%、K2Oを1.8wt
%、Nb2O5を0.5wt%の組成比である。The glass composition of the sixteenth embodiment was SiO 2
The 77.7wt%, 6wt% of Al 2 O 3, 8.5wt% of Li 2 O, the TiO 2 0.5 wt%, a ZrO 2 3.
5 wt%, 1.5 wt% of P 2 O 5, 1.8wt the K 2 O
% And Nb 2 O 5 in a composition ratio of 0.5 wt%.
【0067】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が37.4と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1460 ° C., the melting time was 2.5 hours, the primary processing temperature was 585 ° C., the primary processing time was 5 hours, and the secondary processing temperature was in accordance with the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase is lithium disilicate and the sub-precipitated crystal phase is quartz and the specific elastic modulus is 37.4 was obtained. . The above composition has not only a high specific modulus, but also a very high productivity.
【0068】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くNb2O5を加えている
ため結晶核剤物質が増加することになる。ただし、組成
比が0.1wt%より少ないと十分な剛性の向上がなさ
れない。5wt%を越えると、ガラスの結晶化が不安定
となり、析出結晶相を制御できなくなり、求める特性が
得られにくくなる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since Nb 2 O 5 acting as a flux is added in addition to K 2 O, the nucleating agent material increases. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0069】第17の実施例のガラス組成は、SiO2
を74.5wt%、Al2O3を6wt%、Li2Oを
8.5wt%、TiO2を0.5wt%、ZrO2を3.
5wt%、P2O5を1.5wt%、K2Oを2.5wt
%、Nb2O5を3wt%の組成比である。The glass composition of the seventeenth embodiment was SiO 2
The 74.5wt%, 6wt% of Al 2 O 3, 8.5wt% of Li 2 O, the TiO 2 0.5 wt%, a ZrO 2 3.
5 wt%, 1.5 wt% of P 2 O 5, 2.5wt the K 2 O
%, Nb 2 O 5 is 3 wt%.
【0070】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1500度、溶融時間2
時間、1次処理温度585度、1次処理時間5時間、2
次処理温度700度、2次処理時間3時間にて処置した
結果、主析出結晶相がリチウムダイシリケート、副析出
結晶相がクオーツで、比弾性率が35.4という特性の
ガラス基板が得られた。上記組成は高い比弾性率を有す
るだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and according to the above-mentioned production method, the melting temperature is 1500 ° C. and the melting time is 2 hours.
Time, primary processing temperature 585 degrees, primary processing time 5 hours, 2
As a result of treatment at the next treatment temperature of 700 degrees and the second treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase is lithium disilicate and the sub-precipitated crystal phase is quartz and the specific elastic modulus is 35.4 is obtained. Was. The above composition has not only a high specific modulus, but also a very high productivity.
【0071】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くNb2O5を加えている
ため結晶核剤物質が増加することになる。ただし、組成
比が0.1wt%より少ないと十分な剛性の向上がなさ
れない。5wt%を越えると、ガラスの結晶化が不安定
となり、析出結晶相を制御できなくなり、求める特性が
得られにくくなる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since Nb 2 O 5 acting as a flux is added in addition to K 2 O, the nucleating agent material increases. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0072】第18の実施例のガラス組成は、SiO2
を74wt%、Al2O3を7wt%、Li2Oを8.5
wt%、TiO2を0.5wt%、ZrO2を5wt%、
P2O5を1.5wt%、K2Oを2.5wt%、Ta2O
5を1wt%の組成比である。The glass composition of the eighteenth embodiment was SiO 2
74 wt%, Al 2 O 3 7 wt%, Li 2 O 8.5
wt%, the TiO 2 0.5 wt%, a ZrO 2 5 wt%,
1.5 wt% of P 2 O 5 , 2.5 wt% of K 2 O, Ta 2 O
5 is a composition ratio of 1 wt%.
【0073】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1500度、溶融時間2
時間、1次処理温度585度、1次処理時間5時間、2
次処理温度700度、2次処理時間3時間にて処置した
結果、主析出結晶相がリチウムダイシリケート、副析出
結晶相がクオーツで、比弾性率が35.1という特性の
ガラス基板が得られた。上記組成は高い比弾性率を有す
るだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and according to the above-mentioned production method, the melting temperature was 1500 ° C. and the melting time was 2 hours.
Time, primary processing temperature 585 degrees, primary processing time 5 hours, 2
As a result of the treatment at the next treatment temperature of 700 degrees and the second treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 35.1 is obtained. Was. The above composition has not only a high specific modulus, but also a very high productivity.
【0074】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くTa2O5を加えている
ため溶融性、強度を向上させ、またガラスマトリクス相
の化学的耐久性を向上させる。ただし、組成比が0.1
wt%より少ないと十分な剛性の向上がなされない。5
wt%を越えると、ガラスの結晶化が不安定となり、析
出結晶相を制御できなくなり、求める特性が得られにく
くなる。As the composition, the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since Ta 2 O 5 serving as a flux is added in addition to K 2 O, the meltability and strength are improved, and the chemical durability of the glass matrix phase is improved. However, when the composition ratio is 0.1
If the amount is less than wt%, the rigidity cannot be sufficiently improved. 5
If the content exceeds wt%, the crystallization of the glass becomes unstable, the control of the precipitated crystal phase becomes impossible, and it becomes difficult to obtain the required characteristics.
【0075】第19の実施例のガラス組成は、SiO2
を75wt%、Al2O3を5wt%、Li2Oを8.5
wt%、TiO2を0.5wt%、ZrO2を1.5wt
%、P2O5を1.5wt%、K2Oを4wt%、Ta2O
5を4wt%の組成比である。The glass composition of the nineteenth embodiment was SiO 2
75 wt%, Al 2 O 3 5 wt%, Li 2 O 8.5
wt%, the TiO 2 0.5 wt%, a ZrO 2 1.5 wt
%, P 2 O 5 at 1.5 wt%, K 2 O at 4 wt%, Ta 2 O
5 is a composition ratio of 4 wt%.
【0076】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1540度、溶融時間
1.75時間、1次処理温度585度、1次処理時間5
時間、2次処理温度700度、2次処理時間3時間にて
処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が33.4と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1540 ° C., the melting time was 1.75 hours, the primary processing temperature was 585 ° C., and the primary processing time was 5 in accordance with the above-mentioned manufacturing method.
Time, the secondary processing temperature was 700 ° C., and the secondary processing time was 3 hours. As a result, a glass substrate having a characteristic that the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 33.4 was obtained. was gotten. The above composition has not only a high specific modulus, but also a very high productivity.
【0077】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くTa2O5を加えている
ため溶融性、強度を向上させ、またガラスマトリクス相
の化学的耐久性を向上させる。ただし、組成比が0.1
wt%より少ないと十分な剛性の向上がなされない。5
wt%を越えると、ガラスの結晶化が不安定となり、析
出結晶相を制御できなくなり、求める特性が得られにく
くなる。The composition is Si, which is a basic composition.
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since Ta 2 O 5 serving as a flux is added in addition to K 2 O, the meltability and strength are improved, and the chemical durability of the glass matrix phase is improved. However, when the composition ratio is 0.1
If the amount is less than wt%, the rigidity cannot be sufficiently improved. 5
If the content exceeds wt%, the crystallization of the glass becomes unstable, the control of the precipitated crystal phase becomes impossible, and it becomes difficult to obtain the required characteristics.
【0078】第20の実施例のガラス組成は、SiO2
を75wt%、Al2O3を6.5wt%、Li2Oを8
wt%、TiO2を2wt%、ZrO2を3.5wt%、
P2O5を2.5wt%、K2Oを1.7wt%、La2O
3を0.8wt%の組成比である。The glass composition of the twentieth embodiment was SiO 2
The 75wt%, Al 2 O 3 and 6.5 wt%, the Li 2 O 8
wt%, the TiO 2 2 wt%, a ZrO 2 3.5 wt%,
P 2 O 5 2.5 wt%, K 2 O 1.7 wt%, La 2 O
3 is a composition ratio of 0.8 wt%.
【0079】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が37.8という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is in accordance with the above-mentioned manufacturing method. As a result of the treatment at 700 ° C. and the secondary treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 37.8 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0080】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くLa2O3を加えている
ため結晶析出が抑制される。ただし、組成比が0.1w
t%より少ないと十分な剛性の向上がなされない。5w
t%を越えると、ガラスの結晶化が不安定となり、析出
結晶相を制御できなくなり、求める特性が得られにくく
なる。The basic composition is Si.
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since La 2 O 3 acting as a flux is added in addition to K 2 O, crystal precipitation is suppressed. However, the composition ratio is 0.1w
If it is less than t%, the rigidity cannot be sufficiently improved. 5w
If the content exceeds t%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0081】第21の実施例のガラス組成は、SiO2
を75wt%、Al2O3を6wt%、Li2Oを6.5
wt%、TiO2を0.5wt%、ZrO2を3.5wt
%、P2O5を1.5wt%、K2Oを3.5wt%、L
a2O3を3.5wt%の組成比である。The glass composition of the twenty-first embodiment was SiO 2
75 wt%, Al 2 O 3 6 wt%, Li 2 O 6.5
wt%, the TiO 2 0.5 wt%, a ZrO 2 3.5 wt
%, 1.5 wt% of P 2 O 5 , 3.5 wt% of K 2 O, L
The composition ratio of a 2 O 3 is 3.5 wt%.
【0082】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1540度、溶融時間
1.75時間、1次処理温度585度、1次処理時間5
時間、2次処理温度700度、2次処理時間3時間にて
処置した結果、主析出結晶相がクオーツ、副析出結晶相
がリチウムダイシリケートで、比弾性率が34.7とい
う特性のガラス基板が得られた。上記組成は高い比弾性
率を有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1540 ° C., the melting time was 1.75 hours, the primary processing temperature was 585 ° C., and the primary processing time was 5 in accordance with the above-mentioned manufacturing method.
Time, the secondary treatment temperature was 700 ° C., and the secondary treatment time was 3 hours. As a result, the glass substrate whose main precipitated crystal phase was quartz, the secondary precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 34.7 was obtained. was gotten. The above composition has not only a high specific modulus, but also a very high productivity.
【0083】また組成として、基本組成であるSi
O2、Al2O3、Li2O、TiO2、ZrO2、P2O5、
K2Oに加えて、融剤として働くLa2O3を加えている
ため結晶析出が抑制される。ただし、組成比が0.1w
t%より少ないと十分な剛性の向上がなされない。5w
t%を越えると、ガラスの結晶化が不安定となり、析出
結晶相を制御できなくなり、求める特性が得られにくく
なる。The composition is the basic composition of Si
O 2 , Al 2 O 3 , Li 2 O, TiO 2 , ZrO 2 , P 2 O 5 ,
Since La 2 O 3 acting as a flux is added in addition to K 2 O, crystal precipitation is suppressed. However, the composition ratio is 0.1w
If it is less than t%, the rigidity cannot be sufficiently improved. 5w
If the content exceeds t%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0084】[0084]
【発明の効果】本発明によると、比弾性率が30以上か
つ生産性の高いガラス基板を得ることができる。According to the present invention, a glass substrate having a specific elastic modulus of 30 or more and high productivity can be obtained.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 遊亀 博 大阪市中央区安土町二丁目3番13号 大阪 国際ビル ミノルタ株式会社内 (72)発明者 石丸 和彦 大阪市中央区安土町二丁目3番13号 大阪 国際ビル ミノルタ株式会社内 Fターム(参考) 4G062 AA11 BB01 DA06 DA07 DB03 DB04 DC01 DD02 DD03 DE01 DF01 EA03 EA04 EB01 EC03 ED01 EE01 EF01 EG01 FA01 FB02 FB03 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN33 QQ06 QQ20 5D006 CB04 CB07 DA03 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Hiroshi Yugame 2-3-13 Azuchicho, Chuo-ku, Osaka City Osaka International Building Minolta Co., Ltd. (72) Kazuhiko Ishimaru 2-3-3 Azuchicho, Chuo-ku, Osaka-shi No. 13 Osaka International Building Minolta Co., Ltd. F-term (reference) 4G062 AA11 BB01 DA06 DA07 DB03 DB04 DC01 DD02 DD03 DE01 DF01 EA03 EA04 EB01 EC03 ED01 EE01 EF01 EG01 FA01 FB02 FB03 FC03 FD01 FE01 FF01 GB01 F01 GA01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN33 QQ06 QQ20 5D006 CB04 CB07 DA03
Claims (1)
たことを特徴とするガラス組成。1. The composition range of a main component is as follows: SiO 2 is 65 wt% or more and 80 wt% or less, Al 2 O 3 is 3 wt% or more and 15 wt% or less, Li 2 O is 3 wt% or more and 12 wt% or less. TiO 2 is 0.1 wt% or more and 10 wt% or less, ZrO 2 is 1.5 wt% or more and 8 wt% or less, P 2 O 5 is 0.2 wt% or more and 5 wt% or less, and K 2 O is 1 A glass composition characterized by being at least 6 wt% and at most 5 wt%.
Priority Applications (1)
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Cited By (3)
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JP2002338297A (en) * | 2001-05-09 | 2002-11-27 | Minolta Co Ltd | Glass substrate and medium for information recording and element for optical communication using the substrate |
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1999
- 1999-07-06 JP JP11191741A patent/JP2001019479A/en active Pending
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