JP2001019483A - Glass composition - Google Patents
Glass compositionInfo
- Publication number
- JP2001019483A JP2001019483A JP11191746A JP19174699A JP2001019483A JP 2001019483 A JP2001019483 A JP 2001019483A JP 11191746 A JP11191746 A JP 11191746A JP 19174699 A JP19174699 A JP 19174699A JP 2001019483 A JP2001019483 A JP 2001019483A
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- Prior art keywords
- composition
- glass
- hours
- crystal phase
- composition ratio
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はガラス組成、特に結
晶化ガラスに適したガラス組成に関する。さらに詳しく
は、結晶化ガラス磁気ディスクの組成に関する。The present invention relates to a glass composition, particularly a glass composition suitable for crystallized glass. More specifically, it relates to the composition of a crystallized glass magnetic disk.
【0002】[0002]
【従来の技術】従来、磁気ディスク用の基板としては、
アルミニウム基板、ガラス基板等が実用化されている。
中でもガラス基板は、表面の平滑性や機械的強度が優れ
ていることから、最も注目されている。そのようなガラ
ス基板としては、ガラス基板表面をイオン交換で強化し
た化学強化ガラス基板や、基板に結晶成分を析出させて
結合の強化を図る結晶化ガラス基板が知られている。2. Description of the Related Art Conventionally, as a substrate for a magnetic disk,
Aluminum substrates and glass substrates have been put to practical use.
Among them, a glass substrate has received the most attention because of its excellent surface smoothness and mechanical strength. As such a glass substrate, a chemically strengthened glass substrate in which the surface of the glass substrate is strengthened by ion exchange, and a crystallized glass substrate in which a crystal component is precipitated on the substrate to strengthen the bond are known.
【0003】[0003]
【発明が解決しようとする課題】ところで最近の基板に
対する性能の要求は、日に日に厳しくなってきており、
とくに高速回転時のたわみやそりに直接的に関わる強度
に対する性能の向上が求められている。これは基板材料
の比弾性率(=ヤング率/比重)によって表すことがで
き、数値が高ければ高いほど望ましい。またこのような
要求を満たしながら、生産性の向上が求められている。
そこで本発明は、ガラスの比弾性率が向上し、さらに生
産性の高いを組成を提供することを目的とする。By the way, the recent demand for the performance of the substrate is becoming stricter day by day.
In particular, there is a demand for an improvement in performance with respect to strength directly related to deflection and warpage during high-speed rotation. This can be represented by the specific elastic modulus (= Young's modulus / specific gravity) of the substrate material, and the higher the numerical value, the more desirable. Further, there is a demand for improvement in productivity while satisfying such requirements.
Therefore, an object of the present invention is to provide a composition with improved specific elastic modulus of glass and higher productivity.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
に請求項1に記載された発明は、主成分の組成範囲を、
SiO2が65wt%以上で且つ 80wt%以下、A
l2O3が3wt%以上で且つ 15wt%以下、Li2
Oが3wt%以上で且つ 15wt%以下、P2O5が
0.2wt%以上で且つ 5wt%以下、TiO2が
0.1wt%以上で且つ 10wt%以下、ZrO2が
0.1wt%以上で且つ 3.3wt%以下、にしたこ
とを特徴とする。Means for Solving the Problems In order to achieve the above object, the invention described in claim 1 provides a composition range of a main component,
SiO 2 is 65 wt% or more and 80 wt% or less, A
l 2 O 3 is and 15 wt% or less at 3 wt% or more, Li 2
O is 3 wt% or more and 15 wt% or less, P 2 O 5 is 0.2 wt% or more and 5 wt% or less, TiO 2 is 0.1 wt% or more and 10 wt% or less, ZrO 2 is 0.1 wt% or more. And 3.3 wt% or less.
【0005】[0005]
【発明の実施の形態】以下、本発明の実施形態について
説明する。本発明に係る実施形態のガラス基板は、主成
分の組成範囲が、SiO2が65wt%以上で且つ80
wt%以下、Al2O3が3wt%以上で且つ15wt%
以下、Li2Oが3wt%以上で且つ15wt%以下、
P2O5が0.2wt%以上で且つ5wt%以下、TiO
2が0.1wt%以上で且つ10wt%以下、ZrO2が
0.1wt%以上で且つ3.3wt%以下であることを
特徴としている。Embodiments of the present invention will be described below. In the glass substrate of the embodiment according to the present invention, the composition range of the main component is such that SiO 2 is 65 wt% or more and 80 wt% or more.
wt% or less, Al 2 O 3 is 3 wt% or more and 15 wt%
In the following, Li 2 O is 3 wt% or more and 15 wt% or less,
P 2 O 5 ≧ 0.2 wt% and ≦ 5 wt%, TiO
2 is 0.1 wt% or more and 10 wt% or less, and ZrO 2 is 0.1 wt% or more and 3.3 wt% or less.
【0006】SiO2はガラス形成酸化物のため組成比
が65wt%より少ないと、溶融性が悪くなり、80w
t%を越えるとガラスとして安定状態になるため、結晶
が析出しにくくなる。Since SiO 2 is a glass-forming oxide, if its composition ratio is less than 65% by weight, its melting property deteriorates and 80 w
If it exceeds t%, the glass will be in a stable state, and it will be difficult for crystals to precipitate.
【0007】Al2O3はガラス中間酸化物であり、熱処
理によって析出する結晶相であるホウ酸アルミニウム系
結晶の構成成分である。組成比が3wt%より少ないと
析出結晶が少なく、強度が得られず、15wt%を越え
ると溶融温度が高くなり失透しやすくなる。[0007] Al 2 O 3 is a glass intermediate oxide, and is a component of aluminum borate-based crystals that are crystal phases precipitated by heat treatment. If the composition ratio is less than 3 wt%, the number of precipitated crystals is small, and strength cannot be obtained. If the composition ratio is more than 15 wt%, the melting temperature becomes high and the glass tends to be devitrified.
【0008】Li2Oは融剤としての役割を果たすとと
もに、リチウムダイシリケート系結晶の構成成分であ
る。組成比が3wt%より少ないと結晶相であるリチウ
ムダイシリケートの析出が不十分となり、15wt%を
越えると、析出結晶相のリチウムダイシリケートが不安
定となり結晶化を制御しにくくなる。また化学的耐久性
が低下し磁気膜に影響を与える恐れがあり、また研磨−
洗浄工程における安定性が悪くなる。[0008] Li 2 O plays a role as a flux and is a component of lithium disilicate-based crystals. If the composition ratio is less than 3 wt%, the precipitation of lithium disilicate as a crystal phase becomes insufficient, and if it exceeds 15 wt%, the lithium disilicate in the precipitated crystal phase becomes unstable and crystallization becomes difficult to control. In addition, chemical durability may be reduced and the magnetic film may be affected.
The stability in the washing process is deteriorated.
【0009】P2O5は融剤として働き、リチウムダイシ
リケート系結晶を析出させる核形成剤であり、ガラス全
体に結晶を均一に析出させるために重要な成分である。
組成比が0.2wt%より少ないと十分な結晶核が形成
されにくくなり、結晶粒子が粗大化したり結晶が不均質
に析出し、微細で均質な結晶構造が得られにくくなり、
研磨加工においてディスク基板として必要な平滑面が得
られなくなる。また難溶融性のZrO2成分に対する融
剤としての効果が十分得られなくなる。5wt%を越え
ると、溶融時の炉剤に対する反応性が増し、また失透性
も強くなることから溶融成形時の生産性が低下する。ま
た化学的耐久性が低下し、磁気膜に影響を与える恐れが
あると共に、研磨−洗浄工程における安定性が悪くな
る。P 2 O 5 is a nucleating agent that functions as a flux and precipitates lithium disilicate-based crystals, and is an important component for uniformly depositing crystals throughout the glass.
If the composition ratio is less than 0.2 wt%, it is difficult to form sufficient crystal nuclei, crystal grains are coarsened or crystals are heterogeneously deposited, and it is difficult to obtain a fine and uniform crystal structure,
In polishing, a smooth surface required as a disk substrate cannot be obtained. Further, the effect as a flux for the hardly-fusible ZrO 2 component cannot be obtained. If it exceeds 5% by weight, the reactivity with the furnace agent at the time of melting increases, and the devitrification also increases, so that the productivity at the time of melt molding decreases. In addition, the chemical durability may be reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process may be deteriorated.
【0010】TiO2は融剤であり、結晶成長を促進さ
せる。組成比が0.1wt%より少ないと溶融性が悪く
なると共に、結晶成長がしにくくなり、10wt%を越
えると結晶化が急激に促進され、結晶化状態の制御が困
難となり析出結晶の粗大化、結晶相の不均質が発生し、
微細で均質な結晶構造が得られなくなり、研磨加工にお
いてディスク基板として必要な平滑面が得られなくな
る。さらに溶融成形時に失透しやすくなり、生産性が低
下する。TiO 2 is a flux and promotes crystal growth. If the composition ratio is less than 0.1 wt%, the meltability deteriorates, and the crystal growth becomes difficult. If the composition ratio exceeds 10 wt%, crystallization is rapidly promoted, the control of the crystallization state becomes difficult, and the deposited crystals become coarse. , Crystal phase heterogeneity occurs,
A fine and uniform crystal structure cannot be obtained, and a smooth surface required as a disk substrate in polishing cannot be obtained. Further, devitrification tends to occur during melt molding, and productivity is reduced.
【0011】ZrO2はガラス修飾酸化物であり、ガラ
スの結晶核剤である。特にクオーツ系結晶をガラス全体
に均一に析出させるために非常に有効である。組成比が
0.1wt%より少ないと十分な結晶核が形成されなく
にくくなり、結晶粒子が粗大化したり結晶が不均質に析
出し、微細で均質な結晶構造が得られなくなり、研磨加
工においてディスク基板として必要な平滑面が得られな
くなる。また化学的耐久性および耐マイグレーションが
低下し、磁気膜に影響を与える恐れがあるとともに、研
磨−洗浄工程において安定性が悪くなる。また3.3w
t%を越えると溶融温度が高くなり、また失透しやすく
なり溶融成形が困難となる。また析出結晶相が変化し求
める特性が得られにくくなる。ZrO 2 is a glass-modified oxide and is a crystal nucleating agent for glass. In particular, it is very effective for uniformly depositing a quartz crystal over the entire glass. If the composition ratio is less than 0.1 wt%, it is difficult to form sufficient crystal nuclei, crystal grains are coarsened, crystals are heterogeneously deposited, and a fine and uniform crystal structure cannot be obtained. A smooth surface required as a substrate cannot be obtained. In addition, chemical durability and migration resistance are reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process is deteriorated. Also 3.3w
If it exceeds t%, the melting temperature will be high, and the glass will be easily devitrified, making melt molding difficult. In addition, the precipitated crystal phase changes, making it difficult to obtain desired characteristics.
【0012】以下製造方法を説明する。最終的に生成さ
れるガラス基板の主成分の組成を含む原料を所定の割合
にて充分に混合し、これを白金るつぼに入れ溶融を行
う。溶融後金型に流し概略の形状を形成する。これを室
温までアニールする。続いて、示される1次熱処理温度
と1次処理時間により保持し(熱処理)、結晶核生成が
行われる。引き続き、2次熱処理温度と2次処理時間に
より保持し結晶核成長を行う。これを除冷することによ
り目的とする結晶化ガラスが得られる。The manufacturing method will be described below. Raw materials including the composition of the main components of the finally produced glass substrate are sufficiently mixed at a predetermined ratio, and the mixture is put into a platinum crucible and melted. After melting, it is poured into a mold to form a rough shape. This is annealed to room temperature. Subsequently, the temperature is maintained at the indicated primary heat treatment temperature and primary treatment time (heat treatment), and crystal nucleation is performed. Subsequently, the crystal nucleus is grown while maintaining the temperature at the secondary heat treatment and the secondary treatment time. By cooling this, the desired crystallized glass is obtained.
【0013】以上の製造方法によって得られたガラス基
板は、SiO2が65wt%以上で且つ80wt%以
下、Al2O3が3wt%以上で且つ15wt%以下、L
i2Oが3wt%以上で且つ15wt%以下、P2O5が
0.2wt%以上で且つ5wt%以下、TiO2が0.
1wt%以上で且つ10wt%以下、ZrO2が0.1
wt%以上で且つ3.3wt%以下とするために、非常
に高い比弾性率と高い生産性を得ることが可能となっ
た。The glass substrate obtained by the above-described manufacturing method has a SiO 2 content of 65 wt% or more and 80 wt% or less, an Al 2 O 3 content of 3 wt% or more and 15 wt% or less,
i 2 O is 3 wt% or more and 15 wt% or less, P 2 O 5 is 0.2 wt% or more and 5 wt% or less, and TiO 2 is 0.2 wt% or less.
1 wt% or more and 10 wt% or less, ZrO 2 is 0.1
By setting the content to be not less than wt% and not more than 3.3 wt%, it has become possible to obtain a very high specific modulus and a high productivity.
【0014】[0014]
【実施例】次に実施形態を実施した具体的な実施例につ
いて説明する。第1〜第4実施例のガラスを構成する材
料組成比(単位:wt%)、溶融温度と溶融時間、1次
熱処理温度と1次処理時間、2次熱処理温度と2次処理
時間、主析出結晶相、副析出結晶相、平均結晶粒径、比
重、ヤング率、比弾性率を表1に示す。同様に第5〜第
8実施例のガラスを表2に示す。同様に第9〜第12実
施例のガラスを表3に示す。同様に第13〜第16実施
例のガラスを表4に示す。同様に第17〜第20実施例
のガラスを表5に示す。同様に第21〜第24実施例の
ガラスを表6に示す。Next, a specific example of the embodiment will be described. Material composition ratio (unit: wt%), melting temperature and melting time, primary heat treatment temperature and primary treatment time, secondary heat treatment temperature and secondary treatment time, main precipitation constituting the glasses of the first to fourth embodiments Table 1 shows the crystal phase, sub-precipitated crystal phase, average crystal grain size, specific gravity, Young's modulus, and specific elastic modulus. Table 2 similarly shows the glasses of the fifth to eighth examples. Table 3 similarly shows the ninth to twelfth examples. Table 4 similarly shows glasses of the thirteenth to sixteenth examples. Table 5 similarly shows glasses of the seventeenth to twentieth examples. Table 6 similarly shows glasses of Examples 21 to 24.
【0015】[0015]
【表1】 [Table 1]
【0016】[0016]
【表2】 [Table 2]
【0017】[0017]
【表3】 [Table 3]
【0018】[0018]
【表4】 [Table 4]
【0019】[0019]
【表5】 [Table 5]
【0020】[0020]
【表6】 [Table 6]
【0021】第1の実施例のガラス組成は、SiO2を
74.6wt%、Al2O3を8wt%、Li2Oを8.
5wt%、P2O5を1.8wt%、TiO2を2.2w
t%、ZrO2を0.2wt%、CaOを2.9wt
%、K2Oを1.5wt%、Sb2O3を0.5wt%の
組成比である。The glass composition of the first embodiment is such that SiO 2 is 74.6 wt%, Al 2 O 3 is 8 wt%, and Li 2 O is 8.8 wt%.
5 wt%, 1.8 wt% of P 2 O 5, the TiO 2 2.2 W
t%, ZrO 2 0.2 wt%, CaO 2.9 wt
%, K 2 O is 1.5 wt%, and Sb 2 O 3 is 0.5 wt%.
【0022】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が40.5という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 40.5. The above composition has not only a high specific modulus, but also a very high productivity.
【0023】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くCaOを加えているため高い溶
融性、安定した結晶相があることができる。組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。The basic composition is Si
Since CaO that acts as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0024】また、融剤として働くK2Oを加えている
ため生産時の安定性が向上している。ただし、組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、また化学的耐久性が低下し、磁気膜に影響を
与える恐れがあると共に、研磨−洗浄工程における安定
性が悪くなる。Further, since K 2 O serving as a flux is added, the stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.
【0025】また、清澄剤として働くSb2O3を加えて
いるため生産時の安定性が向上している。ただし、組成
比が0.1wt%より少ないと十分な清澄効果が得られ
なくなり、生産性が低下する。5wt%を越えると、ガ
ラスの結晶化が不安定となり析出結晶相を制御できなく
なり、求める特性が得られにくくなる。Further, since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0026】第2の実施例のガラス組成は、SiO2を
72.5wt%、Al2O3を7.2wt%、Li2Oを
3.6wt%、P2O5を2wt%、TiO2を8wt
%、ZrO2を3.2wt%、CaOを2.2wt%、
K2Oを3wt%、Sb2O3を1.5wt%の組成比で
ある。The glass composition of the second embodiment is as follows: 72.5 wt% of SiO 2 , 7.2 wt% of Al 2 O 3 , 3.6 wt% of Li 2 O, 2 wt% of P 2 O 5 , TiO 2 8wt
%, ZrO 2 3.2 wt%, CaO 2.2 wt%,
The composition ratio of K 2 O is 3 wt% and Sb 2 O 3 is 1.5 wt%.
【0027】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
1.75時間、1次処理温度580度、1次処理時間5
時間、2次処理温度700度、2次処理時間3時間にて
処置した結果、主析出結晶相がクオーツ、副析出結晶相
がリチウムダイシリケートで、比弾性率が35.2とい
う特性のガラス基板が得られた。上記組成は高い比弾性
率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 1.75 hours, the primary processing temperature is 580 ° C., and the primary processing time is
Time, the secondary processing temperature was 700 ° C., and the secondary processing time was 3 hours. As a result, a glass substrate having a characteristic that the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 35.2 was obtained. was gotten. The above composition has not only a high specific modulus, but also a very high productivity.
【0028】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くCaOを加えているため高い溶
融性、安定した結晶相があることができる。組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
Since CaO that acts as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0029】また、融剤として働くK2Oを加えている
ため生産時の安定性が向上している。ただし、組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、また化学的耐久性が低下し、磁気膜に影響を
与える恐れがあると共に、研磨−洗浄工程における安定
性が悪くなる。Further, since K 2 O serving as a flux is added, stability during production is improved. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If the content exceeds 5 wt%, the glass becomes stable, crystallization is suppressed, the chemical durability is reduced, the magnetic film may be affected, and the stability in the polishing-cleaning step is deteriorated.
【0030】また、清澄剤として働くSb2O3を加えて
いるため生産時の安定性が向上している。ただし、組成
比が0.1wt%より少ないと十分な清澄効果が得られ
なくなり、生産性が低下する。5wt%を越えると、ガ
ラスの結晶化が不安定となり析出結晶相を制御できなく
なり、求める特性が得られにくくなる。Further, since Sb 2 O 3 serving as a fining agent is added, stability during production is improved. However, if the composition ratio is less than 0.1 wt%, a sufficient fining effect cannot be obtained, and the productivity is reduced. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0031】第3の実施例のガラス組成は、SiO2を
75.3wt%、Al2O3を10.8wt%、Li2O
を8.5wt%、P2O5を2.4wt%、TiO2を3
wt%、ZrO2を0.5wt%の組成比である。The glass composition of the third embodiment is as follows: 75.3 wt% of SiO 2 , 10.8 wt% of Al 2 O 3 , Li 2 O
8.5 wt%, P 2 O 5 2.4 wt%, TiO 2 3
wt% and ZrO 2 at a composition ratio of 0.5 wt%.
【0032】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が40.2と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 40.2 was obtained. . The above composition has not only a high specific modulus, but also a very high productivity.
【0033】第4の実施例のガラス組成は、SiO2を
74wt%、Al2O3を8wt%、Li2Oを8.5w
t%、P2O5を3wt%、TiO2を6.5wt%、Z
rO2を3wt%の組成比である。The glass composition of the fourth embodiment is such that 74 wt% of SiO 2 , 8 wt% of Al 2 O 3 and 8.5 w of Li 2 O are used.
t%, P 2 O 5 3 wt%, TiO 2 6.5 wt%, Z
rO 2 has a composition ratio of 3 wt%.
【0034】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が38.2と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 degrees, the melting time is 2.5 hours, the primary processing temperature is 575 degrees, the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 38.2. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0035】第5の実施例のガラス組成は、SiO2を
72.2wt%、Al2O3を10.5wt%、Li2O
を10.5wt%、P2O5を3wt%、TiO2を1.
3wt%、ZrO2を2wt%、CaOを0.5wt%
の組成比である。The glass composition of the fifth embodiment is as follows: 72.2 wt% of SiO 2 , 10.5 wt% of Al 2 O 3 , Li 2 O
The 10.5 wt%, 3 wt% of P 2 O 5, the TiO 2 1.
3 wt%, ZrO 2 2 wt%, CaO 0.5 wt%
Is the composition ratio.
【0036】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.3と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 degrees, the melting time is 2.5 hours, the primary processing temperature is 575 degrees, the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 39.3. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0037】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くCaOを加えているため高い溶
融性、安定した結晶相があることができる。組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。As the composition, the basic composition of Si
Since CaO that acts as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0038】第6の実施例のガラス組成は、SiO2を
75.5wt%、Al2O3を11.2wt%、Li2O
を7.8wt%、P2O5を1.5wt%、TiO2を1
wt%、ZrO2を1wt%、CaOを2wt%の組成
比である。The glass composition of the sixth embodiment is as follows: 75.5 wt% of SiO 2 , 11.2 wt% of Al 2 O 3 , and Li 2 O
7.8 wt%, P 2 O 5 1.5 wt%, TiO 2 1
The composition ratio is 1 wt% for ZrO 2 and 2 wt% for CaO.
【0039】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度690度、2次処理時間2.5時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が39.7と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of treatment at 690 ° C. and a secondary treatment time of 2.5 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 39.7. . The above composition has not only a high specific modulus, but also a very high productivity.
【0040】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くCaOを加えているため高い溶
融性、安定した結晶相があることができる。組成比が
0.1wt%より少ないと十分な溶融性改善がなされな
い。5wt%を越えると、ガラスが安定となり結晶化が
抑制され、求める強度が得られにくくなる。The composition is the basic composition of Si
Since CaO that acts as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , a high melting property and a stable crystal phase can be obtained. If the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 5% by weight, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0041】第7の実施例のガラス組成は、SiO2を
67.2wt%、Al2O3を10.5wt%、Li2O
を9.5wt%、P2O5を4wt%、TiO2を5wt
%、ZrO2を2.8wt%、K2Oを1wt%の組成比
である。The glass composition of the seventh embodiment is as follows: 67.2 wt% of SiO 2 , 10.5 wt% of Al 2 O 3 , Li 2 O
The 9.5 wt%, 4 wt% of P 2 O 5, 5wt the TiO 2
%, ZrO 2 is 2.8 wt%, and K 2 O is 1 wt%.
【0042】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度720度、2次処理時間4時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が38.1と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1460 ° C., the melting time was 2.5 hours, the primary processing temperature was 570 ° C., and the primary processing time was 5.
As a result of treating for 5 hours at a secondary treatment temperature of 720 degrees and a secondary treatment time of 4 hours, a glass having lithium disilicate as the main precipitated crystal phase, quartz as the sub-precipitated crystal phase and a specific elastic modulus of 38.1 was obtained. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0043】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くK2Oを加えているため生産時
の安定性が向上している。ただし、組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
また化学的耐久性が低下し、磁気膜に影響を与える恐れ
があると共に、研磨−洗浄工程における安定性が悪くな
る。As the composition, the basic composition of Si
Since K 2 O serving as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , stability during production is improved. However, the composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
In addition, the chemical durability may be reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process may be deteriorated.
【0044】第8の実施例のガラス組成は、SiO2を
70.3wt%、Al2O3を10.2wt%、Li2O
を9wt%、P2O5を3.5wt%、TiO2を2.8
wt%、ZrO2を1.2wt%、K2Oを3wt%の組
成比である。The glass composition of the eighth embodiment is as follows: 70.3 wt% of SiO 2 , 10.2 wt% of Al 2 O 3 , and Li 2 O
The 9 wt%, 3.5 wt% of P 2 O 5, the TiO 2 2.8
wt%, ZrO 2 is 1.2 wt%, and K 2 O is 3 wt%.
【0045】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度575度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がリチウムダイシリケー
ト、副析出結晶相がクオーツで、比弾性率が39.2と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 575 ° C., and the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is lithium disilicate, the sub-precipitated crystal phase is quartz, and the specific elastic modulus is 39.2. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0046】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くK2Oを加えているため生産時
の安定性が向上している。ただし、組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
また化学的耐久性が低下し、磁気膜に影響を与える恐れ
があると共に、研磨−洗浄工程における安定性が悪くな
る。The composition is the basic composition of Si
Since K 2 O serving as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , stability during production is improved. However, the composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
In addition, the chemical durability may be reduced, which may affect the magnetic film, and the stability in the polishing-cleaning process may be deteriorated.
【0047】第9の実施例のガラス組成は、SiO2を
73wt%、Al2O3を9.8wt%、Li2Oを8.
7wt%、P2O5を2.5wt%、TiO2を2.3w
t%、ZrO2を3.2wt%、Sb2O3を0.5wt
%の組成比である。The glass composition of the ninth embodiment is as follows: 73% by weight of SiO 2 , 9.8% by weight of Al 2 O 3, and 8.8% of Li 2 O.
7 wt%, 2.5 wt% of P 2 O 5, 2.3w of TiO 2
t%, ZrO 2 3.2 wt%, Sb 2 O 3 0.5 wt
%.
【0048】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が38.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 38.2. The above composition has not only a high specific modulus, but also a very high productivity.
【0049】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、清澄剤として働くSb2O3を加えているため生
産時の安定性が向上している。ただし、組成比が0.1
wt%より少ないと十分な清澄効果が得られなくなり、
生産性が低下する。5wt%を越えると、ガラスの結晶
化が不安定となり析出結晶相を制御できなくなり、求め
る特性が得られにくくなる。As the composition, the basic composition of Si
Since Sb 2 O 3 serving as a fining agent is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , stability during production is improved. However, when the composition ratio is 0.1
If it is less than wt%, a sufficient fining effect cannot be obtained,
Productivity decreases. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0050】第10の実施例のガラス組成は、SiO2
を72.3wt%、Al2O3を9.5wt%、Li2O
を11.5wt%、P2O5を1.2wt%、TiO2を
2.5wt%、ZrO2を1.5wt%、Sb2O3を
1.5wt%の組成比である。The glass composition of the tenth embodiment was SiO 2
72.3 wt%, Al 2 O 3 9.5 wt%, Li 2 O
Is 11.5 wt%, P 2 O 5 is 1.2 wt%, TiO 2 is 2.5 wt%, ZrO 2 is 1.5 wt%, and Sb 2 O 3 is 1.5 wt%.
【0051】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が38.8という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 38.8. The above composition has not only a high specific modulus, but also a very high productivity.
【0052】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、清澄剤として働くSb2O3を加えているため生
産時の安定性が向上している。ただし、組成比が0.1
wt%より少ないと十分な清澄効果が得られなくなり、
生産性が低下する。5wt%を越えると、ガラスの結晶
化が不安定となり析出結晶相を制御できなくなり、求め
る特性が得られにくくなる。As the composition, the basic composition of Si
Since Sb 2 O 3 serving as a fining agent is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , stability during production is improved. However, when the composition ratio is 0.1
If it is less than wt%, a sufficient fining effect cannot be obtained,
Productivity decreases. If it exceeds 5 wt%, the crystallization of the glass becomes unstable and the control of the precipitated crystal phase becomes impossible, so that it becomes difficult to obtain the required characteristics.
【0053】第11の実施例のガラス組成は、SiO2
を69.8wt%、Al2O3を9.5wt%、Li2O
を10.5wt%、P2O5を2.2wt%、TiO2を
3wt%、ZrO2を3wt%、B2O3を2wt%の組
成比である。The glass composition of the eleventh embodiment was SiO 2
69.8 wt%, Al 2 O 3 9.5 wt%, Li 2 O
Is 10.5 wt%, P 2 O 5 is 2.2 wt%, TiO 2 is 3 wt%, ZrO 2 is 3 wt%, and B 2 O 3 is 2 wt%.
【0054】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度720度、2次処理時間4時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が38.9という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 720 degrees and the secondary treatment time of 4 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate having a crystal having a sub-precipitated crystal phase and a specific elastic modulus of 38.9 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0055】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、フォーマーとして働くB2O3を加えているため
ガラスの分相を促し、結晶析出および成長を促進させ
る。ただし、組成比が0.1wt%より少ないと十分な
溶融性改善がなされない。15wt%を越えると、ガラ
スが失透しやすくなり成形が困難になると共に、結晶が
粗大化し微細な結晶が得られなくなる。As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , B 2 O 3 serving as a former is added to promote the phase separation of the glass, thereby promoting crystal precipitation and growth. Promote. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 15% by weight, the glass tends to be devitrified and molding becomes difficult, and the crystals become coarse and fine crystals cannot be obtained.
【0056】第12の実施例のガラス組成は、SiO2
を70.2wt%、Al2O3を10.7wt%、Li2
Oを9.8wt%、P2O5を1.5wt%、TiO2を
3wt%、ZrO2を1.8wt%、B2O3を3wt%
の組成比である。The glass composition of the twelfth embodiment was SiO 2
70.2 wt%, Al 2 O 3 10.7 wt%, Li 2
O to 9.8 wt%, 1.5 wt% of P 2 O 5, the TiO 2 3 wt%, the ZrO 2 1.8wt%, B 2 O 3 and 3 wt%
Is the composition ratio.
【0057】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が39.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to contain the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 39.2. The above composition has not only a high specific modulus, but also a very high productivity.
【0058】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、フォーマーとして働くB2O3を加えているため
ガラスの分相を促し、結晶析出および成長を促進させ
る。ただし、組成比が0.1wt%より少ないと十分な
溶融性改善がなされない。15wt%を越えると、ガラ
スが失透しやすくなり成形が困難になると共に、結晶が
粗大化し微細な結晶が得られなくなる。As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , B 2 O 3 serving as a former is added to promote the phase separation of the glass, thereby promoting crystal precipitation and growth. Promote. However, if the composition ratio is less than 0.1% by weight, sufficient melting property cannot be improved. If it exceeds 15% by weight, the glass tends to be devitrified and molding becomes difficult, and the crystals become coarse and fine crystals cannot be obtained.
【0059】第13の実施例のガラス組成は、SiO2
を70wt%、Al2O3を8.7wt%、Li2Oを9
wt%、P2O5を2.5wt%、TiO2を6.8wt
%、ZrO2を2wt%、MgOを1wt%の組成比で
ある。The glass composition of the thirteenth embodiment was SiO 2
70 wt%, Al 2 O 3 8.7 wt%, Li 2 O 9
wt%, 2.5 wt% of P 2 O 5, the TiO 2 6.8 wt
%, 2 wt% of ZrO 2 and 1 wt% of MgO.
【0060】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート
で、副析出結晶相がクオーツ、比弾性率が37.2とい
う特性のガラス基板が得られた。上記組成は高い比弾性
率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is in accordance with the above-mentioned manufacturing method. As a result of the treatment at 700 ° C. for a secondary treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 37.2 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0061】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くMgOを加えているため結晶相
の一つである粒状のクオーツ結晶を凝集させ結晶粒子塊
を形成する。ただし、組成比が0.1wt%より少ない
と作業温度幅が狭くなりう、ガラスマトリクス相の化学
的耐久性が向上しない。12wt%を越えると、他の結
晶相が析出して求める強度を得ることが難しくなる。As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , MgO serving as a flux is added, so that a granular quartz crystal which is one of the crystal phases is aggregated. Form crystal grain mass. However, if the composition ratio is less than 0.1 wt%, the working temperature range becomes narrow, and the chemical durability of the glass matrix phase does not improve. If it exceeds 12% by weight, it is difficult to obtain the required strength due to precipitation of another crystal phase.
【0062】第14の実施例のガラス組成は、SiO2
を74.2wt%、Al2O3を8.8wt%、Li2O
を8wt%、P2O5を1.5wt%、TiO2を3wt
%、ZrO2を0.5wt%、MgOを4wt%の組成
比である。The glass composition of the fourteenth embodiment was SiO 2
74.2 wt%, Al 2 O 3 8.8 wt%, Li 2 O
The 8 wt%, 1.5 wt% of P 2 O 5, 3wt of TiO 2
%, 0.5 wt% of ZrO 2 and 4 wt% of MgO.
【0063】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度585度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が38.0という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 585 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 ° C. and the secondary treatment time of 3 hours, a glass substrate having a characteristic that the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 38.0 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0064】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くMgOを加えているため結晶相
の一つである粒状のクオーツ結晶を凝集させ結晶粒子塊
を形成する。ただし、組成比が0.1wt%より少ない
と作業温度幅が狭くなりう、ガラスマトリクス相の化学
的耐久性が向上しない。12wt%を越えると、他の結
晶相が析出して求める強度を得ることが難しくなる。As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , MgO serving as a flux is added, so that a granular quartz crystal which is one of the crystal phases is aggregated. Form crystal grain mass. However, if the composition ratio is less than 0.1 wt%, the working temperature range becomes narrow, and the chemical durability of the glass matrix phase does not improve. If it exceeds 12% by weight, it is difficult to obtain the required strength due to precipitation of another crystal phase.
【0065】第15の実施例のガラス組成は、SiO2
を75.8wt%、Al2O3を9.3wt%、Li2O
を5.7wt%、P2O5を1.2wt%、TiO2を
3.5wt%、ZrO2を2.5wt%、BaOを2w
t%の組成比である。The glass composition of the fifteenth embodiment was SiO 2
75.8 wt%, Al 2 O 3 9.3 wt%, Li 2 O
5.7 wt%, P 2 O 5 1.2 wt%, TiO 2 3.5 wt%, ZrO 2 2.5 wt%, BaO 2 w
The composition ratio is t%.
【0066】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1500度、溶融時間2
時間、1次処理温度585度、1次処理時間5時間、2
次処理温度690度、2次処理時間2.5時間にて処置
した結果、主析出結晶相がクオーツ、副析出結晶相がリ
チウムダイシリケートで、比弾性率が37.1という特
性のガラス基板が得られた。上記組成は高い比弾性率を
有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1500 ° C. and the melting time was 2 according to the above-mentioned production method.
Time, primary processing temperature 585 degrees, primary processing time 5 hours, 2
As a result of the treatment at the next treatment temperature of 690 ° C. and the second treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase is quartz, the sub-precipitated crystal phase is lithium disilicate, and the specific elastic modulus is 37.1 is obtained. Obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0067】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くBaOを加えているため生産時
の安定性が向上している。ただし、組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
求める強度が得られにくくなる。As the composition, the basic composition of Si
Since BaO serving as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , the stability during production is improved. However, the composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
It becomes difficult to obtain the required strength.
【0068】第16の実施例のガラス組成は、SiO2
を74wt%、Al2O3を8.1wt%、Li2Oを
7.5wt%、P2O5を1wt%、TiO2を4.2w
t%、ZrO2を2.2wt%、BaOを3wt%の組
成比である。The glass composition of the sixteenth embodiment was SiO 2
74 wt%, Al 2 O 3 8.1 wt%, Li 2 O 7.5 wt%, P 2 O 5 1 wt%, TiO 2 4.2 w
The composition ratio is t%, ZrO 2 is 2.2 wt%, and BaO is 3 wt%.
【0069】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1540度、溶融時間
1.75時間、1次処理温度585度、1次処理時間5
時間、2次処理温度700度、2次処理時間3時間にて
処置した結果、主析出結晶相がクオーツ、副析出結晶相
がリチウムダイシリケートで、比弾性率が36.2とい
う特性のガラス基板が得られた。上記組成は高い比弾性
率を有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1540 ° C., the melting time was 1.75 hours, the primary processing temperature was 585 ° C., and the primary processing time was 5 in accordance with the above-mentioned manufacturing method.
Time, the secondary treatment temperature was 700 ° C., and the secondary treatment time was 3 hours. As a result, a glass substrate whose main precipitated crystal phase was quartz, whose secondary precipitated crystal phase was lithium disilicate, and whose specific elastic modulus was 36.2 was obtained. was gotten. The above composition has not only a high specific modulus, but also a very high productivity.
【0070】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くBaOを加えているため生産時
の安定性が向上している。ただし、組成比が0.1wt
%より少ないと十分な溶融性改善がなされない。5wt
%を越えると、ガラスが安定となり結晶化が抑制され、
求める強度が得られにくくなる。As the composition, the basic composition of Si
Since BaO serving as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , the stability during production is improved. However, the composition ratio is 0.1wt
%, The meltability is not sufficiently improved. 5wt
%, The glass becomes stable and crystallization is suppressed,
It becomes difficult to obtain the required strength.
【0071】第17の実施例のガラス組成は、SiO2
を74.5wt%、Al2O3を8.5wt%、Li2O
を5.7wt%、P2O5を4wt%、TiO2を5.2
wt%、ZrO2を1.8wt%、ZnOを0.3wt
%の組成比である。The glass composition of the seventeenth embodiment was SiO 2
74.5 wt%, Al 2 O 3 8.5 wt%, Li 2 O
The 5.7 wt%, 4 wt% of P 2 O 5, the TiO 2 5.2
wt%, 1.8 wt% ZrO 2 , 0.3 wt% ZnO
%.
【0072】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度570度、1次処理時間5.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が37.0と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 degrees, the melting time is 2.5 hours, the primary processing temperature is 570 degrees, the primary processing time is 5.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, a glass having a characteristic that the main precipitated crystal phase is quartz, the sub-precipitated crystal phase is lithium disilicate, and the specific elastic modulus is 37.0. A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0073】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くZnOを加えているため均一な
結晶析出を補助する。ただし、組成比が0.1wt%よ
り少ないと十分な結晶均質化の改善がなされない。5w
t%を越えると、ガラスが安定となり結晶化が抑制さ
れ、求める強度が得られにくくなる。As the composition, the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , ZnO serving as a flux is added to help uniform crystal deposition. However, if the composition ratio is less than 0.1% by weight, sufficient improvement in crystal homogenization cannot be achieved. 5w
If it exceeds t%, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0074】第18の実施例のガラス組成は、SiO2
を72wt%、Al2O3を10wt%、Li2Oを8.
8wt%、P2O5を2.5wt%、TiO2を3.5w
t%、ZrO2を1.2wt%、ZnOを2wt%の組
成比である。The glass composition of the eighteenth embodiment was SiO 2
7. 72 wt%, Al 2 O 3 10 wt%, Li 2 O 8.
8 wt%, P 2 O 5 2.5 wt%, TiO 2 3.5 w
The composition ratio is t%, ZrO 2 is 1.2 wt%, and ZnO is 2 wt%.
【0075】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が37.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, the secondary processing temperature is As a result of treatment at 700 degrees and a secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 37.2. The above composition has not only a high specific modulus, but also a very high productivity.
【0076】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くZnOを加えているため均一な
結晶析出を補助する。ただし、組成比が0.1wt%よ
り少ないと十分な結晶均質化の改善がなされない。5w
t%を越えると、ガラスが安定となり結晶化が抑制さ
れ、求める強度が得られにくくなる。The composition is Si, which is the basic composition.
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , ZnO serving as a flux is added to help uniform crystal deposition. However, if the composition ratio is less than 0.1% by weight, sufficient improvement in crystal homogenization cannot be achieved. 5w
If it exceeds t%, the glass becomes stable, crystallization is suppressed, and it becomes difficult to obtain the required strength.
【0077】第19の実施例のガラス組成は、SiO2
を71wt%、Al2O3を9.8wt%、Li2Oを
9.6wt%、P2O5を2.5wt%、TiO2を3.
5wt%、ZrO2を3.1wt%、Nb2O5を0.5
wt%の組成比である。The glass composition of the nineteenth embodiment was SiO 2
The 71wt%, Al 2 O 3 to 9.8wt%, Li 2 O to 9.6wt%, P 2 O 5 to 2.5 wt%, the TiO 2 3.
5 wt%, 3.1 wt% of ZrO 2 and 0.5 of Nb 2 O 5
The composition ratio is wt%.
【0078】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1460度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がリチウムダイシリケート、
副析出結晶相がクオーツで、比弾性率が38.2という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1460 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 degrees and the secondary treatment time of 3 hours, the main precipitated crystal phase was lithium disilicate,
A glass substrate was obtained in which the by-precipitated crystal phase was quartz and the specific elastic modulus was 38.2. The above composition has not only a high specific modulus, but also a very high productivity.
【0079】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くNb2O5を加えているため結晶
核剤物質が増加することになる。ただし、組成比が0.
1wt%より少ないと十分な剛性の向上がなされない。
5wt%を越えると、ガラスの結晶化が不安定となり、
析出結晶相を制御できなくなり、求める特性が得られに
くくなる。The composition is the basic composition of Si
Since Nb 2 O 5 acting as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , the nucleating agent substance increases. However, when the composition ratio is 0.1.
If the amount is less than 1 wt%, the rigidity cannot be sufficiently improved.
If it exceeds 5 wt%, crystallization of glass becomes unstable,
It becomes impossible to control the precipitated crystal phase, and it becomes difficult to obtain desired characteristics.
【0080】第20の実施例のガラス組成は、SiO2
を72wt%、Al2O3を12.6wt%、Li2Oを
8.2wt%、P2O5を0.5wt%、TiO2を3w
t%、ZrO2を2.2wt%、Nb2O5を1.5wt
%の組成比である。The glass composition of the twentieth embodiment was SiO 2
The 72 wt%, 12.6 wt% of Al 2 O 3, 8.2wt% of Li 2 O, 0.5wt% of P 2 O 5, 3w of TiO 2
t%, the ZrO 2 2.2 wt%, the Nb 2 O 5 1.5wt
%.
【0081】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度600度、1次処理時間4.
5時間、2次処理温度700度、2次処理時間3時間に
て処置した結果、主析出結晶相がクオーツ、副析出結晶
相がリチウムダイシリケートで、比弾性率が38.1と
いう特性のガラス基板が得られた。上記組成は高い比弾
性率を有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1480 ° C., the melting time was 2.5 hours, the primary processing temperature was 600 ° C., and the primary processing time was 4.
As a result of treatment for 5 hours at a secondary treatment temperature of 700 ° C. and a secondary treatment time of 3 hours, glass having a characteristic that the main precipitated crystal phase is quartz, the sub-precipitated crystal phase is lithium disilicate, and the specific elastic modulus is 38.1 A substrate was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0082】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くNb2O5を加えているため結晶
核剤物質が増加することになる。ただし、組成比が0.
1wt%より少ないと十分な剛性の向上がなされない。
5wt%を越えると、ガラスの結晶化が不安定となり、
析出結晶相を制御できなくなり、求める特性が得られに
くくなる。As the composition, the basic composition of Si
Since Nb 2 O 5 acting as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , the nucleating agent substance increases. However, when the composition ratio is 0.1.
If the amount is less than 1 wt%, the rigidity cannot be sufficiently improved.
If it exceeds 5 wt%, crystallization of glass becomes unstable,
It becomes impossible to control the precipitated crystal phase, and it becomes difficult to obtain desired characteristics.
【0083】第21の実施例のガラス組成は、SiO2
を77wt%、Al2O3を7.3wt%、Li2Oを
6.5wt%、P2O5を2wt%、TiO2を3wt
%、ZrO2を3wt%、Ta2O5を1.2wt%の組
成比である。The glass composition of the twenty-first embodiment was SiO 2
The 77 wt%, 7.3 wt% of Al 2 O 3, 6.5wt% of Li 2 O, 2wt% of P 2 O 5, 3wt of TiO 2
%, ZrO 2 is 3 wt%, and Ta 2 O 5 is 1.2 wt%.
【0084】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1500度、溶融時間2
時間、1次処理温度580度、1次処理時間5時間、2
次処理温度690度、2次処理時間2.5時間にて処置
した結果、主析出結晶相がクオーツ、副析出結晶相がリ
チウムダイシリケートで、比弾性率が37.6という特
性のガラス基板が得られた。上記組成は高い比弾性率を
有するだけでなく、非常に高い生産性を有する。The raw materials were prepared so as to have the above composition ratio, and the melting temperature was 1500 ° C. and the melting time was 2 according to the above-mentioned production method.
Time, primary processing temperature 580 degrees, primary processing time 5 hours, 2
As a result of the treatment at the next treatment temperature of 690 ° C. and the second treatment time of 2.5 hours, a glass substrate having a characteristic that the main precipitated crystal phase is quartz, the sub-precipitated crystal phase is lithium disilicate, and the specific elastic modulus is 37.6 is obtained. Obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0085】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くTa2O5を加えているため溶融
性、強度を向上させ、またガラスマトリクス相の化学的
耐久性を向上させる。ただし、組成比が0.1wt%よ
り少ないと十分な剛性の向上がなされない。5wt%を
越えると、ガラスの結晶化が不安定となり、析出結晶相
を制御できなくなり、求める特性が得られにくくなる。The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , Ta 2 O 5 serving as a flux is added to improve the meltability and strength, and to improve the glass matrix. Improve the chemical durability of the phase. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0086】第22の実施例のガラス組成は、SiO2
を68.5wt%、Al2O3を9.8wt%、Li2O
を9.7wt%、P2O5を3wt%、TiO2を3wt
%、ZrO2を2.2wt%、Ta2O5を4wt%の組
成比である。The glass composition of the twenty-second embodiment was SiO 2
68.5 wt%, Al 2 O 3 9.8 wt%, Li 2 O
The 9.7 wt%, 3 wt% of P 2 O 5, 3wt of TiO 2
%, ZrO 2 is 2.2 wt%, and Ta 2 O 5 is 4 wt%.
【0087】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1540度、溶融時間
1.75時間、1次処理温度575度、1次処理時間
5.5時間、2次処理温度720度、2次処理時間4時
間にて処置した結果、主析出結晶相がリチウムダイシリ
ケート、副析出結晶相がクオーツで、比弾性率が34.
1という特性のガラス基板が得られた。上記組成は高い
比弾性率を有するだけでなく、非常に高い生産性を有す
る。The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1540 ° C., the melting time was 1.75 hours, the primary processing temperature was 575 ° C., the primary processing time was 5.5 hours, and the secondary As a result of treatment at a treatment temperature of 720 degrees and a secondary treatment time of 4 hours, the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 34.
A glass substrate having a characteristic of 1 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0088】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くTa2O5を加えているため溶融
性、強度を向上させ、またガラスマトリクス相の化学的
耐久性を向上させる。ただし、組成比が0.1wt%よ
り少ないと十分な剛性の向上がなされない。5wt%を
越えると、ガラスの結晶化が不安定となり、析出結晶相
を制御できなくなり、求める特性が得られにくくなる。The composition is the basic composition of Si
In addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , Ta 2 O 5 serving as a flux is added to improve the meltability and strength, and to improve the glass matrix. Improve the chemical durability of the phase. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0089】第23の実施例のガラス組成は、SiO2
を73.5wt%、Al2O3を8.5wt%、Li2O
を7.5wt%、P2O5を2.5wt%、TiO2を4
wt%、ZrO2を3wt%、La2O3を1wt%の組
成比である。The glass composition of the twenty-third embodiment was SiO 2
73.5 wt%, Al 2 O 3 8.5 wt%, Li 2 O
The 7.5 wt%, 2.5 wt% of P 2 O 5, the TiO 2 4
The composition ratio is 3 wt% for ZrO 2 and 1 wt% for La 2 O 3 .
【0090】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1480度、溶融時間
2.5時間、1次処理温度580度、1次処理時間5時
間、2次処理温度700度、2次処理時間3時間にて処
置した結果、主析出結晶相がクオーツ、副析出結晶相が
リチウムダイシリケートで、比弾性率が35.8という
特性のガラス基板が得られた。上記組成は高い比弾性率
を有するだけでなく、非常に高い生産性を有する。The raw materials are prepared so as to have the above composition ratio, and the melting temperature is 1480 ° C., the melting time is 2.5 hours, the primary processing temperature is 580 ° C., the primary processing time is 5 hours, and the secondary processing temperature is according to the above-mentioned manufacturing method. As a result of the treatment at 700 ° C. and the secondary treatment time of 3 hours, a glass substrate was obtained in which the main precipitated crystal phase was quartz, the sub-precipitated crystal phase was lithium disilicate, and the specific elastic modulus was 35.8. The above composition has not only a high specific modulus, but also a very high productivity.
【0091】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くLa2O3を加えているため結晶
析出が抑制される。ただし、組成比が0.1wt%より
少ないと十分な剛性の向上がなされない。5wt%を越
えると、ガラスの結晶化が不安定となり、析出結晶相を
制御できなくなり、求める特性が得られにくくなる。The composition is the basic composition of Si
Since La 2 O 3 acting as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , crystal precipitation is suppressed. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0092】第24の実施例のガラス組成は、SiO2
を67.3wt%、Al2O3を9.7wt%、Li2O
を8.5wt%、P2O5を4wt%、TiO2を4.5
wt%、ZrO2を2wt%、La2O3を4wt%の組
成比である。The glass composition of the twenty-fourth embodiment was SiO 2
67.3 wt%, Al 2 O 3 9.7 wt%, Li 2 O
The 8.5 wt%, 4 wt% of P 2 O 5, the TiO 2 4.5
wt%, a ZrO 2 2 wt%, a 4 wt% of the composition ratio of the La 2 O 3.
【0093】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、溶融温度1540度、溶融時間
1.75時間、1次処理温度570度、1次処理時間
5.5時間、2次処理温度720度、2次処理時間4時
間にて処置した結果、主析出結晶相がリチウムダイシリ
ケート、副析出結晶相がクオーツで、比弾性率が34.
1という特性のガラス基板が得られた。上記組成は高い
比弾性率を有するだけでなく、非常に高い生産性を有す
る。The raw materials were prepared so as to contain the above composition ratio, and the melting temperature was 1540 ° C., the melting time was 1.75 hours, the primary processing temperature was 570 ° C., the primary processing time was 5.5 hours, and the secondary As a result of treatment at a treatment temperature of 720 degrees and a secondary treatment time of 4 hours, the main precipitated crystal phase was lithium disilicate, the sub-precipitated crystal phase was quartz, and the specific elastic modulus was 34.
A glass substrate having a characteristic of 1 was obtained. The above composition has not only a high specific modulus, but also a very high productivity.
【0094】また組成として、基本組成であるSi
O2、Al2O3、Li2O、P2O5、TiO2、ZrO2に
加えて、融剤として働くLa2O3を加えているため結晶
析出が抑制される。ただし、組成比が0.1wt%より
少ないと十分な剛性の向上がなされない。5wt%を越
えると、ガラスの結晶化が不安定となり、析出結晶相を
制御できなくなり、求める特性が得られにくくなる。The composition is the basic composition of Si
Since La 2 O 3 acting as a flux is added in addition to O 2 , Al 2 O 3 , Li 2 O, P 2 O 5 , TiO 2 , and ZrO 2 , crystal precipitation is suppressed. However, if the composition ratio is less than 0.1 wt%, the rigidity cannot be sufficiently improved. If the content exceeds 5 wt%, crystallization of the glass becomes unstable, the crystal phase to be precipitated cannot be controlled, and it becomes difficult to obtain desired characteristics.
【0095】[0095]
【発明の効果】本発明によると、比弾性率が30以上か
つ生産性の高いガラス基板を得ることができる。According to the present invention, a glass substrate having a specific elastic modulus of 30 or more and high productivity can be obtained.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 遊亀 博 大阪市中央区安土町二丁目3番13号 大阪 国際ビル ミノルタ株式会社内 (72)発明者 石丸 和彦 大阪市中央区安土町二丁目3番13号 大阪 国際ビル ミノルタ株式会社内 Fターム(参考) 4G062 AA11 BB01 DA03 DA04 DA06 DA07 DC01 DD02 DD03 DE01 DF01 EA03 EA04 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB02 FB03 FC02 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN33 QQ02 QQ06 5D006 CB04 CB07 DA03 FA00 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Hiroshi Yugame 2-3-13 Azuchicho, Chuo-ku, Osaka City Osaka International Building Minolta Co., Ltd. (72) Kazuhiko Ishimaru 2-3-3 Azuchicho, Chuo-ku, Osaka-shi No. 13 Osaka International Building Minolta Co., Ltd. F term (reference) 4G062 AA11 BB01 DA03 DA04 DA06 DA07 DC01 DD02 DD03 DE01 DF01 EA03 EA04 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB02 FB03 FC02 FC03 FD01 FE01 FF01 GA01 F01 FL01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN33 QQ02 QQ06 5D006 CB04 CB07 DA03 FA00
Claims (1)
下、としたことを特徴とするガラス組成。The composition range of the main component is as follows: SiO 2 is 65 wt% or more and 80 wt% or less, Al 2 O 3 is 3 wt% or more and 15 wt% or less, Li 2 O is 3 wt% or more and 15 wt% or less. , P 2 O 5 is and less 5 wt% or more 0.2 wt%, and 10 wt% in TiO 2 is more than 0.1 wt% or less, that ZrO 2 is and 3.3 wt% or less at 0.1 wt% or more, and the A glass composition characterized by the following.
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JP2001019483A true JP2001019483A (en) | 2001-01-23 |
Family
ID=16279825
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115432923A (en) * | 2022-09-07 | 2022-12-06 | 包头稀土研究院 | Light modification material, LED lamp tube and preparation method thereof |
-
1999
- 1999-07-06 JP JP11191746A patent/JP2001019483A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115432923A (en) * | 2022-09-07 | 2022-12-06 | 包头稀土研究院 | Light modification material, LED lamp tube and preparation method thereof |
CN115432923B (en) * | 2022-09-07 | 2023-06-16 | 包头稀土研究院 | Light modification material, LED lamp tube and preparation method of LED lamp tube |
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