JP2001013686A5 - - Google Patents
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- JP2001013686A5 JP2001013686A5 JP1999186607A JP18660799A JP2001013686A5 JP 2001013686 A5 JP2001013686 A5 JP 2001013686A5 JP 1999186607 A JP1999186607 A JP 1999186607A JP 18660799 A JP18660799 A JP 18660799A JP 2001013686 A5 JP2001013686 A5 JP 2001013686A5
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- JP
- Japan
- Prior art keywords
- group
- alkyl group
- alicyclic hydrocarbon
- carbon atoms
- linear
- Prior art date
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Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18660799A JP3976109B2 (ja) | 1999-06-30 | 1999-06-30 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US09/563,436 US6596458B1 (en) | 1999-05-07 | 2000-05-03 | Positive-working photoresist composition |
| TW089108532A TW546548B (en) | 1999-05-07 | 2000-05-04 | Positive-working photoresist composition |
| KR1020000025558A KR100645847B1 (ko) | 1999-05-07 | 2000-05-08 | 포지티브-작용 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18660799A JP3976109B2 (ja) | 1999-06-30 | 1999-06-30 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001013686A JP2001013686A (ja) | 2001-01-19 |
| JP2001013686A5 true JP2001013686A5 (https=) | 2005-07-07 |
| JP3976109B2 JP3976109B2 (ja) | 2007-09-12 |
Family
ID=16191541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18660799A Expired - Fee Related JP3976109B2 (ja) | 1999-05-07 | 1999-06-30 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3976109B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4102032B2 (ja) * | 2001-03-12 | 2008-06-18 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4186497B2 (ja) * | 2001-04-12 | 2008-11-26 | 東レ株式会社 | ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法 |
| JP3912767B2 (ja) * | 2001-06-21 | 2007-05-09 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP4494161B2 (ja) * | 2004-10-14 | 2010-06-30 | 東京応化工業株式会社 | 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP4684740B2 (ja) * | 2005-05-19 | 2011-05-18 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
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1999
- 1999-06-30 JP JP18660799A patent/JP3976109B2/ja not_active Expired - Fee Related