JP2001002806A - Method and apparatus for plasma surface treatment - Google Patents

Method and apparatus for plasma surface treatment

Info

Publication number
JP2001002806A
JP2001002806A JP17463199A JP17463199A JP2001002806A JP 2001002806 A JP2001002806 A JP 2001002806A JP 17463199 A JP17463199 A JP 17463199A JP 17463199 A JP17463199 A JP 17463199A JP 2001002806 A JP2001002806 A JP 2001002806A
Authority
JP
Japan
Prior art keywords
processed
electrodes
drum
drum electrode
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17463199A
Other languages
Japanese (ja)
Inventor
Munemasa Ueno
宗正 上野
Masayuki Yunamochi
正行 弓納持
Kenichi Kani
賢一 可児
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uenotex Co Ltd
Original Assignee
Uenotex Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uenotex Co Ltd filed Critical Uenotex Co Ltd
Priority to JP17463199A priority Critical patent/JP2001002806A/en
Publication of JP2001002806A publication Critical patent/JP2001002806A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method and an apparatus for a plasma surface treatment that enhance flexibility in surface treatment by providing in a plasma treatment chamber two continuous constructions each of which includes a drum electrode rotatably mounted to adapt a film sheet-like material to be treated to follow the outer periphery surface thereof and a plurality of arranged electrodes disposed to confront the drum electrode and bringing one surface of the material to be treated in contact with one of the two drum electrodes and the other surface of the material to be treated in contact with the other one thereof. SOLUTION: A material W to be treated is continuously passed and traveled into a plasma treatment chamber 1 under an atmosphere displaced with a gas for plasma excitation. A voltage is applied between each of two drum electrodes 7 and 7 rotatably mounted to adapt the material W to be treated to follow the outer periphery surface thereof and a plurality of arranged electrodes 8... disposed to confront the respective drum electrodes so as to provide a gap R for the passage of the material W along the outer periphery surface thereof. Then, the surface treatment of the material W to be treated is carried out with a plasma generated between the electrodes 7 and 8 while the material W is being passed and traveled through the gap R. Each surface of the material W to be treated is continuously subjected one after the other to the surface treatment through one drum electrode 7 which one surface of the material W to be treated is adapted to follow and the other drum electrode 7 which the other surface thereof is adapted to follow.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は例えばフイルムシー
ト状の被処理物に大気圧又は微小加圧下のプラズマ放電
により表面改質等の表面処理を行う際に用いられるプラ
ズマ表面処理方法及びその装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma surface treatment method and apparatus used for performing surface treatment such as surface modification on a film-sheet-like workpiece by plasma discharge under atmospheric pressure or minute pressure. Things.

【0002】[0002]

【従来の技術】この種のプラズマ表面処理は、例えば、
プラスチックフイルム等のフイルムシート状の被処理物
の表面の接着性、印刷性或いは親水性を向上させる等の
表面改質処理等に用いられる。
2. Description of the Related Art This type of plasma surface treatment includes, for example,
It is used for a surface modification treatment such as improving the adhesiveness, printability or hydrophilicity of the surface of a film-sheet-like processed object such as a plastic film.

【0003】従来、この種のプラズマ表面処理装置とし
て、フイルムシート状の被処理物の移送経路途中に壁体
により処理室を形成し、処理室内に外周面に被処理物を
沿わせる回転可能なドラム電極と該ドラム電極の外周面
に被処理物の通過間隙を存して対向並設される複数個の
配列電極とを配設し、処理室内を真空雰囲気に作製し、
該真空雰囲気下において対向するドラム電極と配列電極
との間に電圧を印加し、該被処理物をドラム電極に沿わ
せて通過間隙において連続的に通過移送させ、該通過間
隙での被処理物の通過移送により両電極間に発生するプ
ラズマにより被処理物の表面処理を行う構造のものが提
案されている。
Conventionally, as a plasma surface treatment apparatus of this type, a processing chamber is formed by a wall in the middle of a transfer path of a film-sheet-like workpiece, and a rotatable processing chamber is provided along the outer peripheral surface in the processing chamber. A drum electrode and a plurality of arrayed electrodes arranged side by side on the outer peripheral surface of the drum electrode facing each other with a passage gap of the object to be processed are provided, and the processing chamber is formed in a vacuum atmosphere,
In the vacuum atmosphere, a voltage is applied between the opposing drum electrode and the array electrode, and the object is continuously passed and transferred along the drum electrode in the passage gap. There is proposed a structure having a structure in which the surface of an object to be processed is treated by plasma generated between the two electrodes due to the passage and transfer of the object.

【0004】[0004]

【発明が解決しようとする課題】しかしながら上記提案
構造の場合、真空雰囲気を作製するため、装置が大型化
すると共に設備コストが高騰し易く、又、この構造は被
処理物の片面のみを表面処理する構造であり、両面を連
続して表面処理することができず、勿論、各面の改質程
度を異ならせる表面処理の要望に応えることができず、
更には、処理室内に各電極が一体的に配設されているの
で、処理室内の周囲の掃除等の保守や内部点検の作業性
が低下することがあるという不都合を有している。
However, in the case of the above proposed structure, the vacuum atmosphere is created, so that the size of the apparatus is increased and the equipment cost is liable to increase. In addition, this structure has only one surface of the object to be treated. The surface cannot be continuously treated on both sides, and of course, it is not possible to respond to the demand for the surface treatment of varying the degree of modification of each surface.
Furthermore, since the electrodes are integrally disposed in the processing chamber, there is a disadvantage that the workability of maintenance such as cleaning around the processing chamber and internal inspection may be reduced.

【0005】[0005]

【課題を解決するための手段】本発明はこのような課題
を解決することを目的とするもので、本発明のうちで、
請求項1記載の方法の発明は、フイルムシート状の被処
理物をプラズマ励起用ガスで置換された雰囲気の処理室
内に連続的に通過移送させ、該処理室内において、外周
面に被処理物を沿わせる回転可能なドラム電極と該ドラ
ム電極の外周面に被処理物の通過間隙を存して対向並設
される複数個の配列電極との間に電圧を印加し、該通過
間隙での被処理物の通過移送により両電極間に発生する
プラズマによって被処理物の表面処理を行うに際し、上
記被処理物の片面を沿わせるドラム電極と残りの片面を
沿わせるドラム電極とにより被処理物を片面ずつ連続し
て表面処理を行うことを特徴とするプラズマ表面処理方
法にある。
The object of the present invention is to solve such a problem.
In the method according to the first aspect of the present invention, an object to be processed in the form of a film sheet is continuously passed and transferred into a processing chamber in an atmosphere replaced with a plasma excitation gas, and the object to be processed is placed on the outer peripheral surface in the processing chamber. A voltage is applied between the rotatable drum electrode to be extended and a plurality of arrayed electrodes which are arranged side by side facing each other with a passage gap for the object to be processed on the outer peripheral surface of the drum electrode. In performing the surface treatment of the object to be processed by the plasma generated between the two electrodes due to the transfer of the object to be processed, the object to be processed is treated by the drum electrode along one surface of the object and the drum electrode along the other surface. There is provided a plasma surface treatment method characterized in that surface treatment is performed continuously on each side.

【0006】又、請求項2記載の装置の発明は、フイル
ムシート状の被処理物の移送経路途中に壁体により処理
室を形成し、該処理室内に外周面に被処理物を沿わせる
回転可能なドラム電極と該ドラム電極の外周面に被処理
物の通過間隙を存して対向並設される複数個の配列電極
とを配設し、該処理室内をプラズマ励起用ガスで置換さ
れた雰囲気に作製し、該雰囲気下において対向するドラ
ム電極と配列電極との間に電圧を印加し、該被処理物を
ドラム電極に沿わせて通過間隙において連続的に通過移
送させ、該通過間隙での被処理物の通過移送により両電
極間に発生するプラズマによって被処理物の表面処理を
行う装置において、上記ドラム電極として、上記被処理
物の片面を沿わせるドラム電極と残りの片面を沿わせる
ドラム電極とにより形成し、該各ドラム電極の外周面に
被処理物の通過間隙を存して複数個の配列電極を対向並
設して構成したことを特徴とするプラズマ表面処理装置
にある。
According to a second aspect of the present invention, a processing chamber is formed by a wall in the middle of a transfer path of a film-sheet-like object to be processed, and a rotating member is provided in the processing chamber so that the object to be processed follows the outer peripheral surface. A possible drum electrode and a plurality of arrayed electrodes which are arranged side by side on the outer peripheral surface of the drum electrode so as to face each other with a passage gap for the object to be processed, and the processing chamber is replaced with a plasma excitation gas. In the atmosphere, a voltage is applied between the opposing drum electrode and the array electrode under the atmosphere, and the object to be processed is continuously passed and transferred in the passage gap along the drum electrode. In an apparatus for performing surface treatment of an object to be processed by plasma generated between both electrodes due to the passage and transfer of the object to be processed, the drum electrode is formed so that one surface of the object is aligned with the other surface as the drum electrode. With the drum electrode Formed, in a plasma surface treatment apparatus characterized by being configured to face juxtaposed a plurality of sequences electrode by presence passage gaps of the workpiece on the outer peripheral surface of each of the drum electrode.

【0007】又、請求項3記載の発明は、上記壁体を上
記各ドラム電極が配設される固定壁体と上記各配列電極
が配置され、固定壁体に対して分離可能な可動壁体とに
より形成したことを特徴とするものであり、又、請求項
4記載の発明は、上記被処理物の表面にプラズマ励起用
ガスを供給可能な予備ガス供給ノズルを配設したことを
特徴とするものであり、又、請求項5記載の発明は、上
記フイルムシート状の被処理物の移送経路途中に上記処
理室を複数個形成し、該各処理室内に上記被処理物の片
面を沿わせるドラム電極と残りの片面を沿わせるドラム
電極とを配設すると共に各ドラム電極の外周面に被処理
物の通過間隙を存して複数個の配列電極を対向並設して
構成したことを特徴とするものである。
According to a third aspect of the present invention, there is provided a movable wall in which the fixed wall on which the respective drum electrodes are disposed and the respective array electrodes are disposed, and the wall is separable from the fixed wall. The invention according to claim 4 is characterized in that a spare gas supply nozzle capable of supplying a plasma excitation gas is provided on the surface of the object to be processed. According to a fifth aspect of the present invention, a plurality of the processing chambers are formed in the middle of a transfer path of the film-sheet-like workpiece, and one side of the workpiece is provided in each of the processing chambers. And a plurality of array electrodes are arranged in opposition to each other with a passage gap for the object to be processed on the outer peripheral surface of each drum electrode. It is a feature.

【0008】[0008]

【発明の実施の形態】図1乃至図4は本発明の実施の形
態例を示し、図1乃至図3は第一形態例、図4は第二形
態例である。
1 to 4 show an embodiment of the present invention. FIGS. 1 to 3 show a first embodiment and FIG. 4 shows a second embodiment.

【0009】図1乃至図3の第一形態例において、1は
処理室であって、この場合、固定壁体2aと固定壁体に
対して分離可能な二個の可動壁体2b・2bからなる壁
体2により密閉状に形成され、可動壁体2b・2bは装
置機体3に直線摺動機構4により水平摺動自在に設けら
れ、この固定壁体2aに二個の回転軸5を横設すると共
に回転軸5に回転用モータ6を連結し、各回転軸5にフ
イルムシート状の被処理物Wの片面を沿わせる一方のド
ラム電極7及び残りの片面を沿わせる他方のドラム電極
7をそれぞれ固定し、各可動壁体2b・2bに各ドラム
電極7・7の外周面に被処理物Wの通過間隙Rを存して
複数個の配列電極8を対向並設して構成している。
In the first embodiment shown in FIGS. 1 to 3, reference numeral 1 denotes a processing chamber, in this case, a fixed wall 2a and two movable walls 2b, 2b which can be separated from the fixed wall. The movable wall 2b is provided in the apparatus body 3 so as to be horizontally slidable by a linear sliding mechanism 4, and the two rotating shafts 5 are horizontally mounted on the fixed wall 2a. A rotating motor 6 is connected to the rotating shaft 5, and one drum electrode 7 along which one side of the film-sheet-shaped workpiece W is arranged along each rotating shaft 5, and the other drum electrode 7 along which the remaining one side extends. Are fixed to each other, and a plurality of arrayed electrodes 8 are arranged opposite to each other on the movable wall bodies 2b, 2b so as to have a passage gap R of the workpiece W on the outer peripheral surface of each of the drum electrodes 7, 7. I have.

【0010】この場合、上記ドラム電極7・7及び配列
電極8内に冷却水を供給する冷却水接続口9・10が形
成され、又、処理室1の壁体2にヘリウムガスやヘリウ
ムガスを主成分とする混合ガス、その他のプラズマ励起
用の不活性ガス又は酸素等の活性ガスを供給するガス供
給口11を形成し、これにより処理室1内のドラム電極
7と配列電極8との間の通過間隙Rを不活性ガス又は活
性ガスが満たされた雰囲気とし、この雰囲気下において
対向する低圧電極としてのドラム電極7と高圧電極とし
ての複数個の配列電極8との間に図外の電源により電圧
を印加するように構成している。
In this case, cooling water connection ports 9 and 10 for supplying cooling water are formed in the drum electrodes 7 and the array electrodes 8 and helium gas or helium gas is supplied to the wall 2 of the processing chamber 1. A gas supply port 11 for supplying a mixed gas as a main component, another inert gas for plasma excitation, or an active gas such as oxygen is formed, whereby a gas supply port 11 between the drum electrode 7 and the array electrode 8 in the processing chamber 1 is formed. Is defined as an atmosphere filled with an inert gas or an active gas. Under this atmosphere, a power supply (not shown) is provided between the opposing drum electrode 7 as a low-voltage electrode and a plurality of array electrodes 8 as high-voltage electrodes. Is configured to apply a voltage.

【0011】又、この場合、上記処理室1の下部に被処
理物Wの入口部12を形成すると共に上部に被処理物W
の出口部13を形成し、入口部12及び出口部13にシ
ールロール及びシールシートからなるシール機構14を
配設し、被処理物Wをガイドロール15を介して入口部
12から処理室1内に導入移送させ、絶縁ロール16を
介して下側のドラム電極7の外周面に沿わせて折り返し
たのち上側のドラム電極7の外周面に沿わせて折り返
し、絶縁ロール17を介して出口部13から外部に導出
させ、ガイドロール18により導出案内するように構成
している。
In this case, an inlet 12 for the workpiece W is formed in the lower part of the processing chamber 1 and the workpiece W is formed in the upper part.
Is formed, and a seal mechanism 14 including a seal roll and a seal sheet is disposed at the inlet 12 and the outlet 13, and the workpiece W is guided from the inlet 12 through the guide roll 15 into the processing chamber 1. After being folded back along the outer peripheral surface of the lower drum electrode 7 via the insulating roll 16, it is folded back along the outer peripheral surface of the upper drum electrode 7, and the outlet 13 is provided via the insulating roll 17. And is guided out by a guide roll 18.

【0012】19は予備ガス供給ノズルであって、この
場合被処理物Wがドラム電極7の外周面に沿い始める位
置に配設され、上記被処理物Wの表面にプラズマ励起用
ガスを供給可能に構成されている。
Reference numeral 19 denotes a preliminary gas supply nozzle, which is provided at a position where the object to be processed W starts along the outer peripheral surface of the drum electrode 7, and which can supply a plasma excitation gas to the surface of the object to be processed W. Is configured.

【0013】この実施の第一形態例は上記構成であるか
ら、フイルムシート状の被処理物Wは処理室1の下部の
入口部12から処理室1内に入り、処理室1内の被処理
物Wの片面を沿わせる一方のドラム電極7及び残りの片
面を沿わせる他方のドラム電極7の外周面を介して処理
室1の上部の出口部13から導出され、連続的に下方か
ら上方へと移送されることになり、処理室1内におい
て、ガス供給口11からヘリウムガスやヘリウムガスを
主成分とする混合ガス、その他のプラズマ励起用の不活
性ガス又は酸素等の活性ガスを供給して処理室1内のド
ラム電極7・7及び配列電極8の間の通過間隙Rを不活
性ガス又は活性ガスが満たされた雰囲気となし、この雰
囲気下において対向するドラム電極7・7及び配列電極
8の間に図外の電源により電圧を印加し、この通過間隙
Rでの被処理物Wの通過移送により一方のドラム電極7
と配列電極8との通過間隙Rに発生したプラズマによっ
て被処理物Wの配列電極8側の表面である片面を改質表
面処理し、次いで、他方のドラム電極7と配列電極8と
の通過間隙Rに発生したプラズマによって被処理物Wの
配列電極8側の表面である残りの片面を連続して改質表
面処理し、これにより被処理物Wの両面を片面ずつ連続
して表面処理することになる。
Since the first embodiment of the present invention has the above-described structure, the object W to be processed in the form of a film sheet enters the processing chamber 1 through the inlet 12 at the lower portion of the processing chamber 1 and is processed in the processing chamber 1. It is led out from the outlet 13 at the upper part of the processing chamber 1 through the outer peripheral surface of one drum electrode 7 along one side of the object W and the other drum electrode 7 along the other side, and continuously from below to above. In the processing chamber 1, helium gas, a mixed gas containing helium gas as a main component, an inert gas for plasma excitation, or an active gas such as oxygen is supplied from the gas supply port 11. The passage gap R between the drum electrodes 7, 7 and the array electrode 8 in the processing chamber 1 is formed as an atmosphere filled with an inert gas or an active gas, and under this atmosphere, the opposed drum electrode 7, 7 and the array electrode Power supply not shown during 8 Applying more voltage, one of the drum electrode 7 by passing the transfer of the workpiece W at the passage gap R
One surface, which is the surface of the workpiece W on the side of the array electrode 8, is modified and surface-treated by plasma generated in the gap R between the array electrode 8 and the gap between the drum electrode 7 and the array electrode 8. The remaining one surface, which is the surface on the array electrode 8 side, of the object to be processed W is continuously subjected to the modified surface treatment by the plasma generated in the R, whereby the both surfaces of the object to be processed W are continuously surface-treated one by one. become.

【0014】従って、上記被処理物Wの片面を一方のド
ラム電極7の外周面に沿わせると共に残りの片面を他方
のドラム電極7に沿わせて被処理物Wを連続移送させ、
各ドラム電極7・7に対向する配列電極8との間に発生
するプラズマにより被処理物Wを片面ずつ連続して表面
処理することができ、このため、被処理物Wの片面と残
りの片面との同仕様の表面処理は勿論のこと、片面のみ
を強く改質したり、片面は改質処理しない等の異なる表
面処理を行うことができ、それだけ被処理物Wの表面処
理の仕様に対しての融通性を高めることができ、かつ、
大気圧若しくはプラズマ励起用ガスの供給に伴う微小加
圧下でプラズマ処理することができ、真空雰囲気作製及
び厳密なシール構造を採用せず、装置全体の構造を簡素
化することができ、設備コストの低減を図ることができ
る。
Therefore, the workpiece W is continuously transferred with one surface of the workpiece W along the outer peripheral surface of one of the drum electrodes 7 and the other one surface along the other drum electrode 7.
The workpiece W can be continuously surface-treated one surface at a time by plasma generated between the array electrodes 8 opposed to the respective drum electrodes 7. Therefore, one surface of the workpiece W and the remaining one surface can be treated. Not only surface treatment of the same specifications as above, but also one surface can be strongly modified, and one surface can be subjected to different surface treatments such as no modification treatment. Flexibility, and
Plasma processing can be performed under atmospheric pressure or under micro-pressurization accompanying the supply of plasma excitation gas, and the entire structure of the apparatus can be simplified without using a vacuum atmosphere and a strict sealing structure, thus reducing equipment costs. Reduction can be achieved.

【0015】又、この場合、上記壁体2を上記各ドラム
電極7・7が配設される固定壁体2aと上記各配列電極
8が配置され、固定壁体2aに対して分離可能な可動壁
体2b・2bとにより形成しているから、ドラム電極7
・7、配列電極8、通過間隙R近傍及び処理室1内の周
囲の掃除等の保守や内部点検、被処理物Wの掛回に際し
ては、図3の如く、可動壁体2b・2bを直線摺動機構
4により水平摺動させて分離移動させることができ、保
守点検等の作業性を向上することができ、又、この場
合、上記被処理物Wのプラズマ表面処理される配列電極
8側の表面にプラズマ励起用ガスを供給可能な予備ガス
供給ノズル19を配設しているから、確実にプラズマ処
理を行うことができ、それだけ作業性を向上することが
できる。
In this case, the wall 2 is provided with a fixed wall 2a on which the respective drum electrodes 7, 7 are disposed and the respective array electrodes 8, and is movable so as to be separable from the fixed wall 2a. The drum electrode 7 is formed by the wall 2b.
7, for maintenance and internal inspection such as cleaning of the arrangement electrode 8, the vicinity of the passage gap R and the periphery of the inside of the processing chamber 1, and the hanging of the workpiece W, the movable wall 2b is straightened as shown in FIG. The sliding mechanism 4 can be horizontally moved to separate and move, so that workability such as maintenance and inspection can be improved. In this case, the surface of the workpiece W on the side of the array electrode 8 on which the plasma surface treatment is performed. Since the preliminary gas supply nozzle 19 capable of supplying the plasma excitation gas is provided on the surface of the substrate, the plasma processing can be reliably performed, and the workability can be improved accordingly.

【0016】図4の第二形態例は別例構造を示し、この
場合、上記フイルムシート状の被処理物Wの移送経路途
中に上記処理室1を二個配設し、該各処理室1内に上記
被処理物Wの片面を沿わせるドラム電極7と残りの片面
を沿わせるドラム電極7とを配設すると共に各ドラム電
極7・7の外周面に被処理物Wの通過間隙Rを存して複
数個の配列電極8を対向並設し、処理室1・1間に被処
理物Wを移送案内するガイドロール20を配設して構成
している。
The second embodiment shown in FIG. 4 shows another structure. In this case, two processing chambers 1 are provided in the middle of the transfer path of the film-sheet-like workpiece W, and each of the processing chambers 1 is provided. A drum electrode 7 extending along one side of the workpiece W and a drum electrode 7 extending along the remaining one side are provided therein, and the passage gap R of the workpiece W is formed on the outer peripheral surface of each of the drum electrodes 7. A plurality of arrayed electrodes 8 are arranged facing each other, and a guide roll 20 for transporting and guiding the workpiece W is disposed between the processing chambers 1.

【0017】この第二形態例にあっては、処理内容の相
違する表面処理を各処理室1において、順次連続的に片
面宛連続して処理することができ、それだけ表面処理の
融通性を高めることができる。
In the second embodiment, the surface treatments having different treatment contents can be successively and continuously applied to one side in each of the processing chambers 1, thereby increasing the flexibility of the surface treatment. be able to.

【0018】尚、本発明は上記実施の形態例に限られる
ものではなく、処理室1、ドラム電極7・7、配列電極
8、その他の構造は適宜変更して設計されるものであ
り、又、本発明は表面改質処理に限らず、例えば集積回
路基板表面のエッチング後のレジストパターン除去、表
面コーティング等の他の大気圧又は微小加圧下のプラズ
マ処理技術を用いる表面処理にも適用される。
The present invention is not limited to the above embodiment, and the processing chamber 1, the drum electrodes 7, 7, the array electrodes 8, and other structures are designed with appropriate modifications. The present invention is not limited to the surface modification treatment, but is also applicable to other surface treatments using plasma treatment technology under atmospheric pressure or minute pressure, such as removal of a resist pattern after etching of the surface of an integrated circuit substrate and surface coating. .

【0019】[0019]

【発明の効果】本発明は上述の如く、請求項1又は2記
載の発明にあっては、上記被処理物の片面を一方のドラ
ム電極の外周面に沿わせると共に残りの片面を他方のド
ラム電極に沿わせて被処理物を連続移送させ、各ドラム
電極に対向する配列電極との間に発生するプラズマによ
り被処理物を片面ずつ連続して表面処理することがで
き、このため、被処理物の片面と残りの片面との同仕様
の表面処理は勿論のこと、片面のみを強く改質したり、
片面は改質処理しない等の異なる表面処理を行うことが
でき、それだけ被処理物の表面処理の仕様に対しての融
通性を高めることができ、かつ、大気圧若しくは微小加
圧下でプラズマ処理することができ、真空雰囲気作製及
び厳密なシール構造を採用せず、装置全体の構造を簡素
化することができ、設備コストの低減を図ることができ
る。
As described above, according to the present invention, one surface of the object to be processed is arranged along the outer peripheral surface of one of the drum electrodes, and the other surface is connected to the other drum. The object to be processed is continuously transferred along the electrodes, and the surface of the object to be processed can be continuously surface-treated one by one by plasma generated between the array electrodes facing each of the drum electrodes. Not only the surface treatment of the same specifications of the one side of the product and the other side, but also one side strongly modified,
One side can be subjected to different surface treatments such as no modification treatment, which can increase the flexibility of the surface treatment specifications of the object to be treated, and perform the plasma treatment under atmospheric pressure or minute pressure The structure of the entire apparatus can be simplified without using a vacuum atmosphere and a strict sealing structure, and equipment costs can be reduced.

【0020】又、請求項3記載の発明にあっては、上記
壁体を上記各ドラム電極が配設される固定壁体と上記各
配列電極が配置され、固定壁体に対して分離可能な可動
壁体とにより形成しているから、ドラム電極、配列電
極、通過間隙近傍及び処理室内の周囲の掃除等の保守や
内部点検、被処理物の掛回に際しては、可動壁体を分離
移動させることができ、保守点検等の作業性を向上する
ことができ、又、請求項4記載の発明にあっては、上記
被処理物の表面にプラズマ励起用ガスを供給可能な予備
ガス供給ノズルを配設しているから、確実にプラズマ処
理を行うことができ、それだけ作業性を向上することが
できる。
According to the third aspect of the present invention, the wall is provided with the fixed wall on which the drum electrodes are arranged and the array electrodes, and can be separated from the fixed wall. Since the movable wall is formed by the movable wall, the movable wall is separated and moved for maintenance such as cleaning of the drum electrode, the array electrode, the vicinity of the passage gap and the periphery of the processing chamber, internal inspection, and hanging of the workpiece. In addition, in the invention according to the fourth aspect, a spare gas supply nozzle capable of supplying a plasma excitation gas to the surface of the workpiece is provided. Since it is provided, the plasma processing can be reliably performed, and the workability can be improved accordingly.

【0021】又、請求項5記載の発明にあっては、上記
フイルムシート状の被処理物の移送経路途中に上記処理
室を複数個配設し、該各処理室内に上記被処理物の片面
を沿わせるドラム電極と残りの片面を沿わせるドラム電
極とを配設すると共に各ドラム電極の外周面に被処理物
の通過間隙を存して複数個の配列電極を対向並設して構
成しているから、処理内容の相違する表面処理を各処理
室において、順次連続的に片面宛連続して処理すること
ができ、それだけ表面処理の融通性を高めることができ
る。
Further, in the invention according to claim 5, a plurality of the processing chambers are arranged in the middle of a transfer path of the film-sheet-like workpiece, and one side of the workpiece is provided in each of the processing chambers. And a plurality of arrayed electrodes are arranged side by side facing each other with a passage gap for the object to be processed on the outer peripheral surface of each drum electrode. Therefore, the surface treatments having different processing contents can be sequentially and continuously processed on one side in each processing chamber, so that the flexibility of the surface treatment can be improved accordingly.

【0022】以上、所期の目的を充分達成することがで
きる。
As described above, the intended purpose can be sufficiently achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の第一形態例の説明正面図であ
る。
FIG. 1 is an explanatory front view of a first embodiment of the present invention.

【図2】本発明の実施の第一形態例の部分拡大断面図で
ある。
FIG. 2 is a partially enlarged cross-sectional view of the first embodiment of the present invention.

【図3】本発明の実施の第一形態例の説明正面である。FIG. 3 is an explanatory front view of the first embodiment of the present invention.

【図4】本発明の実施の第二形態例の説明正面図であ
る。
FIG. 4 is an explanatory front view of a second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

W 被処理物 R 通過間隙 1 処理室 2 壁体 2a 固定壁体 2b 可動壁体 7 ドラム電極 8 配列電極 19 予備ガス供給ノズル W Workpiece R Passage gap 1 Processing chamber 2 Wall 2a Fixed wall 2b Movable wall 7 Drum electrode 8 Array electrode 19 Spare gas supply nozzle

───────────────────────────────────────────────────── フロントページの続き (72)発明者 可児 賢一 新潟県中頸城郡柿崎町大字柿崎7396番地10 ウエノテックス株式会社内 Fターム(参考) 4F073 AA01 BB01 CA01 CA07 CA08 CA09  ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Kenichi Kani 7396-10, Kakizaki, Kakizaki-cho, Nakakubiki-jo, Niigata F-term in Unotex Co., Ltd. (reference) 4F073 AA01 BB01 CA01 CA07 CA08 CA09

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 フイルムシート状の被処理物をプラズマ
励起用ガスで置換された雰囲気の処理室内に連続的に通
過移送させ、該処理室内において、外周面に被処理物を
沿わせる回転可能なドラム電極と該ドラム電極の外周面
に被処理物の通過間隙を存して対向並設される複数個の
配列電極との間に電圧を印加し、該通過間隙での被処理
物の通過移送により両電極間に発生するプラズマによっ
て被処理物の表面処理を行うに際し、上記被処理物の片
面を沿わせるドラム電極と残りの片面を沿わせるドラム
電極とにより被処理物を片面ずつ連続して表面処理を行
うことを特徴とするプラズマ表面処理方法。
An object to be processed in the form of a film sheet is continuously passed through and transferred into a processing chamber in an atmosphere replaced with a plasma excitation gas, and a rotatable object is provided along the outer peripheral surface in the processing chamber. A voltage is applied between the drum electrode and a plurality of electrodes arranged side by side facing each other with a passage gap for the workpiece on the outer peripheral surface of the drum electrode, and the passage of the workpiece in the passage gap is performed. In performing the surface treatment of the object to be processed by the plasma generated between the two electrodes, the object to be processed is continuously formed one by one by the drum electrode extending along one side of the object and the drum electrode extending along the other side of the object. A plasma surface treatment method comprising performing a surface treatment.
【請求項2】 フイルムシート状の被処理物の移送経路
途中に壁体により処理室を形成し、該処理室内に外周面
に被処理物を沿わせる回転可能なドラム電極と該ドラム
電極の外周面に被処理物の通過間隙を存して対向並設さ
れる複数個の配列電極とを配設し、該処理室内をプラズ
マ励起用ガスで置換された雰囲気に作製し、該雰囲気下
において対向するドラム電極と配列電極との間に電圧を
印加し、該被処理物をドラム電極に沿わせて通過間隙に
おいて連続的に通過移送させ、該通過間隙での被処理物
の通過移送により両電極間に発生するプラズマによって
被処理物の表面処理を行う装置において、上記ドラム電
極として、上記被処理物の片面を沿わせるドラム電極と
残りの片面を沿わせるドラム電極とにより形成し、該各
ドラム電極の外周面に被処理物の通過間隙を存して複数
個の配列電極を対向並設して構成したことを特徴とする
プラズマ表面処理装置。
2. A rotatable drum electrode for forming a processing chamber with a wall in the middle of a transfer path of a film-sheet-shaped object to be processed, and a rotatable drum electrode for moving the object along an outer peripheral surface in the processing chamber, and an outer periphery of the drum electrode A plurality of arrayed electrodes arranged side by side facing each other with a passage gap for the object to be processed are provided on the surface, and the processing chamber is formed in an atmosphere replaced with a plasma excitation gas. A voltage is applied between the drum electrode and the array electrode to be processed, and the object to be processed is continuously passed and transported along the drum electrode in the passage gap. In an apparatus for performing a surface treatment of an object to be processed by plasma generated therebetween, the drum electrode is formed by a drum electrode extending along one surface of the object and a drum electrode extending along the other surface. Outer surface of electrode Characterized in that a plurality of arrayed electrodes are arranged in opposition to each other with a passage gap for the object to be processed.
【請求項3】 上記壁体を上記各ドラム電極が配設され
る固定壁体と上記各配列電極が配置され、固定壁体に対
して分離可能な可動壁体とにより形成したことを特徴と
する請求項2記載のプラズマ表面処理装置。
3. The apparatus according to claim 1, wherein the wall is formed by a fixed wall on which the drum electrodes are arranged and a movable wall on which the array electrodes are arranged and which can be separated from the fixed wall. The plasma surface treatment apparatus according to claim 2, wherein
【請求項4】 上記被処理物の表面にプラズマ励起用ガ
スを供給可能な予備ガス供給ノズルを配設したことを特
徴とする請求項2又は3記載のプラズマ表面処理装置。
4. The plasma surface treatment apparatus according to claim 2, wherein a preliminary gas supply nozzle capable of supplying a plasma excitation gas is provided on a surface of the workpiece.
【請求項5】 上記フイルムシート状の被処理物の移送
経路途中に上記処理室を複数個形成し、該各処理室内に
上記被処理物の片面を沿わせるドラム電極と残りの片面
を沿わせるドラム電極とを配設すると共に各ドラム電極
の外周面に被処理物の通過間隙を存して複数個の配列電
極を対向並設して構成したことを特徴とする請求項2、
3又は4記載のプラズマ表面処理装置。
5. A plurality of the processing chambers are formed in the middle of a transfer path of the film-sheet-like object to be processed, and a drum electrode that extends along one surface of the object and a remaining surface along each of the processing chambers. 3. A method according to claim 2, wherein a plurality of arrayed electrodes are arranged in opposition to each other with a passage space for the object to be processed on the outer peripheral surface of each of the drum electrodes.
5. The plasma surface treatment apparatus according to 3 or 4.
JP17463199A 1999-06-21 1999-06-21 Method and apparatus for plasma surface treatment Pending JP2001002806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17463199A JP2001002806A (en) 1999-06-21 1999-06-21 Method and apparatus for plasma surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17463199A JP2001002806A (en) 1999-06-21 1999-06-21 Method and apparatus for plasma surface treatment

Publications (1)

Publication Number Publication Date
JP2001002806A true JP2001002806A (en) 2001-01-09

Family

ID=15981979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17463199A Pending JP2001002806A (en) 1999-06-21 1999-06-21 Method and apparatus for plasma surface treatment

Country Status (1)

Country Link
JP (1) JP2001002806A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002339075A (en) * 2001-05-17 2002-11-27 Konica Corp Surface treatment method for long material and optical film produced by the method
KR100442309B1 (en) * 2003-07-22 2004-07-30 주식회사 에폰 Continuous surface-treating apparatus for film shape of polymer and continuous surface-treating method thereof
US20100215848A1 (en) * 2007-02-26 2010-08-26 Leybold Optics Gmbh Vacuum treatment of strip-shaped substrates

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002339075A (en) * 2001-05-17 2002-11-27 Konica Corp Surface treatment method for long material and optical film produced by the method
KR100442309B1 (en) * 2003-07-22 2004-07-30 주식회사 에폰 Continuous surface-treating apparatus for film shape of polymer and continuous surface-treating method thereof
WO2005008718A1 (en) * 2003-07-22 2005-01-27 Epon Co., Ltd. Continuous surface-treating apparatus for film shape of polymer and continuous surface-treating method thereof
US20100215848A1 (en) * 2007-02-26 2010-08-26 Leybold Optics Gmbh Vacuum treatment of strip-shaped substrates
US9297065B2 (en) * 2007-02-26 2016-03-29 Leybold Optics Gmbh Vacuum treatment of strip-shaped substrates

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