JP4612520B2 - Atmospheric pressure plasma processing equipment - Google Patents

Description

  By applying plasma generation and control technology, the present invention provides surface modification and cleaning necessary for manufacturing, for example, semiconductors, liquid crystal display elements, flat panel displays such as EL and PDP, and solar cells. The present invention relates to an atmospheric pressure plasma processing apparatus that performs processing such as processing and film formation.

Conventionally, in the manufacturing process of semiconductors, flat panel displays, solar cells, etc., plasma generated under reduced pressure has been used to modify, clean, process, and form films on glass substrates and semiconductor wafers. In recent years, with the intensification of low-cost competition, attention has been focused on atmospheric pressure plasma technology that does not require large-scale equipment such as vacuum chambers and exhaust devices, and it has been put to practical use in some processes such as surface modification, cleaning, and dry etching. And development is progressing.
As a conventional example of such a plasma processing apparatus, one described below is known (for example, see Patent Document 1).

FIG. 13 is an explanatory view showing an example of a conventional plasma processing apparatus.
In the figure, 101 is a chamber, 102 is an electrode, 103 is an electrode, 104 is an insulator, 105 is an object to be processed, 106 is a conveying means, 107 is a coating film, 108 is an inlet, 109 is an outlet, 110 is an entrance door , 111 is an exit door, 115 is a roller, 116 is a drive device, 117 is a partition plate, 121 is a gas supply port, 122 is a gas discharge port, 123 is a flow path, 125 is a drive source, 126 is a drive shaft, and 127 is a drive Belt, L is an interval (gap) between adjacent electrodes 102 and 103, arrow a is supply of plasma generating gas, and arrow B is discharge of surplus plasma generating gas.

  In this conventional plasma processing apparatus, at least a pair of electrodes arranged opposite to each other are disposed in the chamber, a plasma generating gas is supplied between the electrodes, and an electric field is applied between the paired electrodes. In a plasma processing apparatus in which a glow discharge is generated under atmospheric pressure, a plasma is generated from a plasma generating gas by the glow discharge, and the plasma is applied to the workpiece to perform surface treatment. The transporting means for transporting is disposed in the chamber and is arranged downstream of the pair of electrodes in the flow of the plasma generating gas.

Further, the conveying means is arranged at a position that does not face the facing space between the paired electrodes in the flow direction of the plasma generating gas.
In addition, an inlet for introducing the workpiece into the chamber and an outlet for extracting the workpiece in the chamber are provided in the chamber, an inlet door for opening and closing the inlet is provided at the inlet, and an outlet is opened and closed at the outlet. An exit door is provided.
In addition, an inlet / outlet for introducing the object to be processed into the chamber and for extracting the object to be processed from the chamber is provided in the chamber, and an inlet / outlet door for opening / closing the inlet / outlet is provided at the inlet / outlet.

Further, an inlet for introducing the object to be processed into the chamber and an outlet for deriving the object to be processed in the chamber are provided in the chamber, respectively, and the inlet and the outlet are each formed in a slit shape.
Further, relaxation chambers are provided outside the inlet and outlet of the chamber to alleviate the outflow of plasma generation gas in the chamber and the inflow of outside air into the chamber.
Further, a conveying means for conveying the object to be processed is formed by a roller, and a driving device for rotating the roller is provided outside the chamber.

Moreover, the space | interval of the opposing space between the electrodes which make a pair is 1 mm-10 mm.
A partition plate is provided between the electrode and the inner surface of the chamber.
In addition, the workpiece is introduced into the chamber from the entrance by opening the entrance door, the plasma treatment is performed on the workpiece after the entrance door is closed, and then the workpiece is led out from the exit by opening the exit door. You can also
In addition, the workpiece is introduced into the chamber from the entrance by opening the entrance door, the plasma treatment is performed on the workpiece after closing the entrance door, and then the workpiece is led out from the entrance by opening the entrance door. You can also

Therefore, the characteristics of the prior art are summarized as follows.
-The conveyance means which conveys a to-be-processed object exists in a chamber.
-The conveyance means which conveys a to-be-processed object is arrange | positioned downstream of a gas flow rather than an electrode.
-The conveyance means which conveys a to-be-processed object is arrange | positioned in the position which does not oppose the opposing space between the electrodes which make a pair.
-The chamber has separate inlets and outlets for introducing and discharging workpieces, each with a door.
・ Alternatively, the chamber has an entrance that serves both as an entrance and an exit, and has a door.
・ Alternatively, the chamber has a separate inlet and outlet and is slit-shaped (no door).
A relaxation chamber for relaxing the outflow of the plasma generating gas and the inflow of outside air is provided outside the inlet and the outlet (or the inlet / outlet or the slit-shaped inlet and outlet).
-The conveyance means for conveying the workpiece is a roller.
The roller is driven by a drive device outside the chamber.
-There is a partition plate between the electrode and the inner surface of the chamber.
-Plasma treatment is performed with both the entrance door and exit door (or entrance door) closed.
-Before and after the plasma treatment, there is an opening / closing operation of the entrance door, the exit door or the entrance door.
-If the entrance and exit are slit-shaped, the door will not open.
・ Plasma generating gas always passes through the discharge space (1 to 10mm) between the electrodes by the partition plate provided in the chamber.
・ If the distance of the discharge space is less than 1 mm, glow discharge is less likely to occur, and it may be difficult to generate plasma efficiently.
JP 2001-102197 A

However, the conventional plasma processing apparatus as described above has the following problems.
-In the treatment mode using the door, the gas flow during the plasma treatment is stable, but the door needs to be opened and closed before and after the treatment, so the tact time is long as a series of treatments.
-Although the tact time is shortened in the processing mode (relaxation chamber) that does not use a door, the plasma may become unstable due to the outside air entering the chamber during the plasma processing, which may affect the processing.
In other words, it has been impossible or difficult to shorten the tact time without affecting the plasma in the above-described conventional technology.

  The present invention relates to a plasma generation space for generating plasma using a processing gas, a carry-in path for carrying a work piece into the space through the carry-in port of the work piece and the space, An unloading path for communicating the unloading port and the space to unload the object to be processed and a plurality of shutters provided in the unloading path at intervals in the unloading direction, the object to be processed being a predetermined length in the unloading direction. The plurality of shutters provide a plasma processing apparatus in which an object to be processed is selectively opened and closed while passing through a carry-out path, and the space and the carry-out port are always hermetically closed. .

The plurality of shutters may be three or more shutters.
The interval may be determined by the length in the unloading direction of the workpiece and the interval of the workpiece to be continuously conveyed to the unloading port through the unloading path.
The plurality of shutters may be opened and closed corresponding to the position of the object being processed.
The carry-out path preferably has a constant cross-sectional shape with respect to the carry-out direction of the workpiece.
The apparatus further comprises conveying means for continuously conveying the object to be processed from the carry-in entrance through the plasma generation space to the carry-out exit, and the carrying means comprises a partition plate extending from the carry-in entrance to the carry-out exit, and a plurality of transport rollers. It is preferable that the top portion of the roller protrudes from a slit-like opening provided in the.

Gas supply means for supplying gas to the plasma generation space via the nozzle may be further provided, and the nozzle may be a nozzle that ejects gas from a slit-like or shower-like opening.
A gas exhaust unit having a discharge amount larger than the gas supply amount of the gas supply unit may be further provided outside the carry-in port, and the gas from the plasma generation space may be discharged through the carry-in path.
The gas supply means may change the gas supply amount during the plasma processing and at other times.
An electrode for generating plasma in the plasma generation space may be further provided, and the power applied to the electrode may be set in a range of 1 to 100 W / cm ² .

  According to the present invention, the plurality of shutters are selectively opened and closed while the object to be processed passes through the carry-out path, and is always hermetically closed between the plasma generation space and the carry-out port. The incoming workpieces can be processed and carried out one after another, and the tact time can be shortened.

Example 1
Hereinafter, Example 1 of the present invention will be described with reference to the drawings.
FIG. 1 is an example of an atmospheric pressure plasma processing apparatus, and is a side cross-sectional view of the entire apparatus cut by a plane perpendicular to the river width direction. Various gases supplied from the gas cylinder 9 or storage means such as a gas tank through the gas pipe 25 are mixed by the mass flow and the mixer 10 to become a processing gas, and are supplied to the gas supply nozzle 4 through the gas pipe 26. The processing gas supplied to the gas supply nozzle 4 spreads in the depth direction of the paper surface in the gas reservoir 4a, and is ejected into the gas flow path 19 from a slit-like or shower-like gas ejection port 4b having a sufficiently smaller cross-sectional area than the gas reservoir 4a. . By using such a gas supply nozzle 4, it is possible to uniformly eject the processing gas into the flow path even when the object to be processed becomes large.

  As the processing gas at this time, for example, when surface modification is performed, helium, argon, nitrogen alone or a mixture thereof is added with oxygen or the like, and in the case of silicon etching, helium, argon, nitrogen alone, Alternatively, a fluorine-containing compound gas or oxygen is added to the mixture.

  The high-frequency power output from the high-frequency power source 7 is applied to the electrode (voltage application side) 14 via the power transmission path (voltage application side) 23, and the presence of the electrode (ground side) 15 separated by the dielectric 16 An electric field is formed in the plasma generation space 13. The processing gas ejected from the gas outlet 4b moves under the atmospheric pressure due to the electric field formed in the space 13 when moving through the gas flow path upstream portion 19a in the direction G of the processing gas G and passing through the plasma generation space 13. It is turned into plasma. Here, the atmospheric pressure refers to a pressure range of 0.9 atm or more and 1.1 atm or less. In this example, the electrode (voltage application side) 14 and the electrode (ground side) 15 are arranged to face each other with the dielectric 16 in between. However, the present invention is not limited to this configuration, and the gas channel 19 Other than this, as long as an electric field can be formed.

  A refrigerant flow path (voltage application side) 14a and a refrigerant flow path (ground side) 15a are provided inside each of the electrodes 14 and 15, and the refrigerant is supplied and discharged from a refrigerant supply device or a refrigerant supply facility (not shown). The refrigerant can be used not only for the purpose of cooling the electrodes, but also for performing stable plasma treatment by keeping the temperature of the electrodes 14 and 15 constant.

  As a structure of the electrode unit 6 at this time, it is preferable that the electrode (voltage application side) 14 and the electrode (ground side) 15 are surrounded by the dielectric 16 without a gap as shown in FIG. As a result, discharge inside the dielectric 16 can be suppressed, and power loss and damage to the electrodes 14 and 15 and the dielectric 16 can be prevented. The dielectric 16 itself is preferably covered with a metal electrode cover 17. By doing so, it is possible to prevent the electric field from leaking to the outside and affecting peripheral devices and the human body. Further, when the electrode unit 6 is attached to the gas flow path main body 1, it is preferable that the joint portion is sealed with an O-ring, packing, or the like. In addition to facilitating maintenance of the electrode unit 6, this prevents the processing gas in the gas flow path 19 from flowing out and affecting the human body or adversely affecting the environment. Therefore, it is possible to avoid the influence of the plasma processing due to the inflow of outside air.

  The processing gas converted into plasma in the plasma generation space 13 acts on the surface of the workpiece 18 transported by the workpiece transport roller 11, and performs plasma processing such as surface modification, cleaning, processing, and film formation.

  The processing gas converted into plasma in the plasma generation space 13 passes through the gas flow path downstream portion 19b, passes through the open end (object to be processed inlet) 20, and is discharged out of the gas flow path 19. The exhausted processing gas is recovered in the vicinity of the gas recovery port 21 of the gas exhaust unit 5, passes through the exhaust pipe 22, and is rendered harmless by an exhaust pump (not shown) or a blower or, in some cases, an abatement device. It is discharged outside. The exhaust flow rate at this time is set to be larger than the supply flow rate and to collect the outside air together. By doing so, it is possible to reliably prevent the processing gas from flowing out.

  Here, the gas flow path 19 is common to the conveyance path of the workpiece 18. That is, the gas flow path downstream portion 19b that communicates the carry-in port of the workpiece 18 and the plasma generation space 13 is common to the carry-in path of the workpiece 18, and the carry-out port of the workpiece 18 and the plasma generation space 13 The gas flow channel upstream portion 19a communicating with the same is common with the carry-out path of the workpiece 18.

  The gas flow path main body 1 is preferably made of a metal or a resin material, and a dielectric film is preferably formed on the surface of the metal by thermal spraying or anodic oxidation. The dimension of the gas flow path 19 is preferably 10 mm or more larger than the object to be processed in the depth direction of the paper surface, more preferably 200 mm or more. If it is smaller than this, the difference between the flow velocity at the end and the flow velocity at the center is large, and the uniformity of the plasma processing is lowered. On the other hand, the length L4 of the downstream portion of the gas flow path is preferably 100 mm or more, more preferably 2000 mm or more. If it is smaller than this, the inflow of the outside air due to the change of the outside pressure from the open end 20 and the diffusion at the interface between the outside air and the processing gas may affect the plasma processing. In order to solve this problem, we set a problem to suppress the entry of outside air at a low flow rate of the order of 10 mm / s, for example, in order to carry out the desired process while minimizing the consumption of processing gas. Has been empirically found as a result of intensive research.

  In addition, according to the apparatus of the present invention, an airtight space without any outflow of processing gas or inflow of outside air other than the open end 20 into which the object to be processed enters will be an airtight space without any inflow of outside gas as described later. However, the relative pressure relationship in the gas flow path 19 is maintained, the flow velocity distribution of the processing gas around the plasma generation space 13 does not change, and the concentration does not decrease. In addition, since the gas flow path itself has a structure in which a constant cross section that does not change in the conveyance direction of the object to be processed continues, even while the supply of the processing gas is small, while the gas flow path 19 is passing Is always constant without changing the magnitude or direction of the flow velocity.

As for the power supply method, there are a method of supplying from a pulse power supply in addition to the high-frequency power supply 7, a method of supplying both by alternately switching, and a method of superimposing both. The method must be determined from the viewpoints of the frequency of the supplied power, the various conditions required for the process in addition to the repetition frequency, the limit of gas used, the required processing capacity, and whether or not damage has occurred. The high-frequency power source here means one having a frequency of 1 kHz to 100 MHz, and the pulse power source means one having a repetition frequency of 1 MHz or less, a waveform rise time of 100 μsec or less, and a pulse application time of 1 msec or less. The power applied to the electrode is preferably in the range of 1 to 100 W / cm ² , and if it is smaller than this, the processing capability is low, and conversely if it is large, the plasma is concentrated and the processing becomes uneven or the workpiece is damaged. Occurs or the electrode breaks.

FIG. 5 shows a voltage waveform 31 applied between the electrode (voltage application side) 14 and the electrode (ground side) 15.
FIG. 6 shows a voltage waveform 32 when the voltage is a sine waveform pulse. FIG. 7 shows a voltage waveform 33 when the power is a square pulse. Although the case where the voltage waveform has a single form is shown above, this is an example, and a mixed waveform or a superimposed waveform of a sine waveform pulse and a square pulse may be used.

FIG. 11 shows another example of the electrode unit 6, and plasma is generated between an electrode (voltage application side) 14 and an electrode (ground side) 15. FIG. 12 shows still another example of the electrode unit 6. In this case, since the processing gas can be supplied to the gas flow path 19 from between the electrode (voltage application side) 14 and the electrode (ground side) 15, The gas supply nozzle 4 (FIG. 1) may or may not be provided.
The electrode, voltage waveform, application form, and processing gas supply form shown above do not limit the scope of application of the present invention, and any of the number, the arrangement, etc. may be other than this.

  FIG. 8 is a top view of an example of the partition plate 12 in FIG. The partition plate 12 has a plurality of slit portions 12a, and only the top portion of the roller 11a penetrates the partition plate 12 and protrudes toward the plasma generation space 13 side. The partition plate 12 is preferably made of a metal or a resin material in the same manner as the gas flow path body 1, and a dielectric film is preferably formed on the surface of the metal by spraying or anodizing. More preferably, it is made of a dielectric material such as alumina. A roller-type conveyor is used as a conveying means for carrying in / out the object to / from the gas flow path 19 having a structure in which a constant cross section does not change in the conveying direction of the object to be processed as in the apparatus of the present invention. Is preferred. By using such a conveying means, it becomes easy to control the deflection of its own weight as needed, and continuous processing is possible. The reason for this will be described below.

  FIG. 9 shows another example of the partition plate 12. Near the center of the partition plate 12 on which the electrode unit 6 is provided, the pitch of the roller shaft 11b in the conveyance (left and right) direction is narrow, and further, the rollers 11a are arranged in the river width (up and down) direction so that the rollers 11a do not interfere with each other. The mounting position is shifted. This increases the number of points that support the object to be processed. For example, even if the object to be processed is a thin plate or a film, the deflection of its own weight is suppressed, and the distance between the electrode and the object to be processed becomes constant. The design can be improved. Therefore, a roller type conveyor is preferable as the conveying means.

  Further, the presence of the partition plate 12 stabilizes the flow of the processing gas in the gas flow path 19, and further includes a processing object transport roller 11a in the processing object transport mechanism storage unit 3, a motor or a bearing (not shown), and the like. The workpiece transfer mechanism is not directly exposed to plasma. Although not shown, the support portion and the bearing of the roller shaft 11b are provided at the end of the roller shaft 11b. Note that the motor may be placed in a place other than the workpiece conveyance mechanism storage unit 3 if there is a space limitation. However, in this case, the motor and the driving force transmission portion are also disposed in the workpiece conveyance mechanism storage unit 3. It is preferable to be housed in an airtight space that is spatially connected to and separated from the outside air.

  FIG. 10 shows another example of the partition plate 12. The difference from the partition plate 12 of FIG. 8 is that the slit 12a is large, which is in line with the fact that the roller 11a is cylindrical. By carrying out the partition plate 12 and the roller 11a in this way, it can be expected that the support of the workpiece in the river width direction is more stable.

  In addition, when operating as an actual production device, it is possible to reduce the running cost by changing the gas supply amount between when the workpiece is processed by generating plasma and when it is not processed. It is also preferable from the viewpoint of reducing environmental load. For example, after processing an object to be processed at a predetermined flow rate, an operation method is conceivable in which the supply amount is reduced or stopped to reduce the consumption amount of the processing gas, and the flow rate is returned to the predetermined flow rate before starting the processing again. .

FIG. 2 is an enlarged view of the portion of the shutter group 2 in FIG. In FIG. 2, L1 is a shutter arrangement interval, L2 is a length in the conveyance direction of the objects to be processed, and L3 is an interval between the objects to be processed. A method of installing the shutter group 2 will be described with reference to FIG.
The shutter arrangement interval L1 is larger than the length L2 of the workpiece (see FIG. 2B) and smaller than the interval L3 between the workpieces (see FIG. 2C). That is, L1> L2 (condition 1) and L1 <L3 (condition 2) are set.

  Next, the opening / closing operation of the shutter will be described with reference to FIG. The objects to be processed 18a and 18b are moved at a constant speed from the left to the right of the paper surface by the object to be processed conveyance roller 11a. Until the workpiece 18a reaches the shutter group 2, the shutters 2a and 2b are in a state as shown in FIG. When the workpiece 18a reaches the front of the shutter 2b (FIG. 2B), the shutter 2a is closed (1). At this time, the shutter 2a does not collide with the workpiece 18a. This is because the shutter is arranged according to the condition 1. After the shutter 2a is completely closed, the shutter 2b is opened (2). It is assumed that the opening / closing operation of the shutters 2a and 2b is completed instantaneously, and the workpiece 18a always moves at a constant speed during this operation. As one method for determining this timing, for example, an optical sensor provided in the middle of the gas flow path is used to detect an object to be processed, and the shutter is opened and closed.

  Subsequently, the shutter 2b is closed (3) when the workpiece 18b reaches the front of the shutter 2a (FIG. 2 (c)). At this time, the shutter 2b does not collide with the workpiece 18a. This is because the shutter is arranged according to condition 2. After the shutter 2b is completely closed, the shutter 2a is opened (4). After that, this operation is repeated.

  With such a shutter arrangement, by opening and closing the shutter according to the position or position of the object to be processed, there is an airtight space where there is no outflow of processing gas or inflow of outside air other than the open end 20 where the object to be processed enters. Therefore, the relative pressure relationship in the gas flow path 19 is maintained even when the external pressure changes unexpectedly, the flow velocity distribution of the processing gas around the plasma generation space 13 does not change, and the concentration does not decrease.

(Example 2)
FIG. 3 shows another example of an atmospheric pressure plasma processing apparatus. The basic structure is the same as in FIG. 1, but the difference from the apparatus in FIG. 1 is that there are N (three or more) shutters.
FIG. 4 is an enlarged view of the shutter group 2 portion of FIG. In FIG. 4, L1 is the shutter arrangement interval, L2 is the length of the objects to be processed, and L3 is the distance between the objects to be processed. A method of arranging the shutter 2 will be described with reference to FIG.

  When the interval L3 between the objects to be processed is not more than the length L2 of the objects to be processed, at least three shutters are necessary. When the number of shutters is N, (shutter arrangement interval L1 × (N−1)) is larger than the length L2 of the workpiece (FIG. 4B), and the shutter arrangement interval L1 is larger than the interval L3 between the workpieces. It is made small (FIG.4 (c)). That is, when L3 ≦ L2, (L1 × (N−1))> L2 (condition 3) and L1 <L3 (condition 4) are set.

  Next, the opening / closing operation of the shutter will be described with reference to FIG. The workpiece 18 is moved at a constant speed from the left to the right of the drawing by the workpiece transport roller 11. Until the workpiece 18 reaches the shutter group 2, the shutters 2c, 2d, and 2e are in a state as shown in FIG. When the object 18c reaches the front of the shutter 2e (FIG. 4B), the shutter 2c is closed (1). At this time, the shutter 2c does not collide with the workpiece 18c. This is because the shutter is arranged according to the condition 3. After the shutter 2c is completely closed, the shutter 2e is opened (2).

  Subsequently, the shutter 2d is closed (3) when the object 18d reaches the front of the shutter 2c (FIG. 4C). At this time, the shutter 2d does not collide with the workpiece 18c. This is because the shutter is arranged according to condition 4. After the shutter 2d is completely closed, the shutter 2c is opened (4).

  Furthermore, the shutter 2e is closed (5) when the workpiece 18d reaches the front of the shutter 2d (FIG. 4D). After the shutter 2e is completely closed, the shutter 2d is opened (6). After that, this operation is repeated.

By adopting such a shutter arrangement and opening and closing the shutter according to the position of the object to be processed, an airtight space where there is no outflow of processing gas or inflow of outside air other than the open end 20 where the object to be processed enters. Therefore, the relative pressure relationship in the gas flow path 19 is maintained even when the external pressure changes unexpectedly, the flow velocity distribution of the processing gas around the plasma generation space 13 does not change, and the concentration does not decrease. .
As the interval L3 between the objects to be processed decreases, the shutter arrangement interval L1 decreases. In such a case, the shutter number N is determined according to the condition 3.

It is side surface sectional drawing explaining the structure of the atmospheric pressure plasma processing apparatus of Example 1. FIG. FIG. 6 is an explanatory diagram illustrating an operation of the shutter according to the first exemplary embodiment. It is side surface sectional drawing explaining the structure of the atmospheric pressure plasma processing apparatus of Example 2. FIG. FIG. 10 is an explanatory diagram for explaining the operation of the shutter according to the second embodiment. 2 is an example of a voltage waveform applied to the atmospheric pressure plasma processing apparatus of Example 1. FIG. 2 is an example of a voltage waveform applied to the atmospheric pressure plasma processing apparatus of Example 1. FIG. 2 is an example of a voltage waveform applied to the atmospheric pressure plasma processing apparatus of Example 1. FIG. 3 is a top view illustrating an example of a partition plate of the atmospheric pressure plasma processing apparatus according to Embodiment 1. FIG. It is a top view which shows the other example of the partition plate of the atmospheric pressure plasma processing apparatus of Example 1. FIG. 6 is a top view illustrating still another example of the partition plate of the atmospheric pressure plasma processing apparatus according to Embodiment 1. FIG. 2 is a side cross-sectional view showing an example of an electrode unit of the atmospheric pressure plasma processing apparatus of Example 1. FIG. It is side surface sectional drawing which shows the other example of the electrode unit of the atmospheric pressure plasma processing apparatus of Example 1. FIG. It is explanatory drawing which shows an example of the conventional plasma processing apparatus.

Explanation of symbols

1 Gas flow path body
2 Shutter group
2a ~ 2e Shutter
3 Transport mechanism storage
4 Gas supply nozzle
4a Gas reservoir
4b Gas outlet
5 Gas exhaust unit
6 Electrode unit
7 High frequency power supply
8 Pulse power supply
9 Gas cylinder
10 Mass flow and mixer
11a roller
11b Roller shaft
12 Partition plate
12a Slit
13 Plasma generation space
14 electrodes (voltage application side)
14a Refrigerant flow path (voltage application side)
15 electrodes (ground side)
15a Refrigerant flow path (ground side)
16 Dielectric
17 Electrode cover
18 Workpiece
19 Gas flow path
19a Upstream part of gas flow path
19b Downstream part of gas flow path
20 Open end
21 Gas exhaust port
22 Exhaust pipe

Claims (9)

A plasma generation space for generating plasma using a processing gas; a carry-in path for carrying a work piece into the space through the carry-in port of the work piece and the space; a carry-out port for the work piece; An unloading path for communicating the space and unloading the workpiece; a plurality of shutters provided in the unloading path at intervals in the unloading direction; and a gas supply means for supplying gas to the plasma generation space via a nozzle And a gas exhaust means provided outside the carry-in port and having a discharge amount larger than the gas supply amount of the gas supply means. The gas exhaust means discharges the gas from the plasma generation space through the carry-in path, and An atmospheric pressure in which the object has a predetermined length in the unloading direction, the plurality of shutters are selectively opened and closed while the object to be processed passes through the unloading path, and the space and the unloading port are always airtightly closed. Plasma processing equipment.   The atmospheric pressure plasma processing apparatus according to claim 1, wherein the plurality of shutters are three or more shutters. A plurality of shutters atmospheric pressure plasma processing apparatus according to claim 1 or 2 for opening and closing in response to the position of the object in the unloading. The atmospheric pressure plasma processing apparatus according to any one of claims 1 to 3 , wherein the carry-out path has a constant cross-sectional shape in the carry-out direction of the workpiece. The apparatus further comprises conveying means for continuously conveying the object to be processed from the carry-in port through the plasma generation space to the carry-out port, and the carrying means includes a partition plate extending from the carry-in port to the carry-out port, and a plurality of transport rollers. The atmospheric pressure plasma processing apparatus according to any one of claims 1 to 4 , wherein a top portion of the roller protrudes from a slit-like opening provided on the surface. In the gas supply means for supplying a gas via a nozzle into the plasma generation space, the nozzle according to any one of claims 1 to 5 is a nozzle that discharges gas from the slit-like or a shower-like opening Atmospheric pressure plasma processing equipment. Gas supply means, the atmospheric pressure plasma processing apparatus according to claim 1 for changing the amount of gas supplied at the time of plasma generation and the other. Plasma generating space includes an electrode for generating plasma, atmospheric pressure plasma processing apparatus according to any one of claims 1 to 7 in which the power is set in the range of 1~100W / cm ² to give the electrode. A plasma generation space for generating plasma using a processing gas; a carry-in path for carrying a work piece into the space through the carry-in port of the work piece and the space; a carry-out port for the work piece; An unloading path for communicating the space and unloading the object to be processed, a plurality of shutters provided in the unloading path at intervals in the unloading direction, and an unloading path and an unloading path for the object to be processed Gas supply means provided downstream of the plasma generation space in the transport direction and gas exhaust means provided upstream of the carry-in port upstream of the plasma generation space in the transport direction, and gas from downstream to upstream of the transport path And a plurality of shutters are selectively opened and closed while the object to be processed passes through the carry-out path, and the space and the carry-out port are always hermetically closed.

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