JP2000511346A - 光子検出器及び光子検出器を製造する方法 - Google Patents
光子検出器及び光子検出器を製造する方法Info
- Publication number
- JP2000511346A JP2000511346A JP09541544A JP54154497A JP2000511346A JP 2000511346 A JP2000511346 A JP 2000511346A JP 09541544 A JP09541544 A JP 09541544A JP 54154497 A JP54154497 A JP 54154497A JP 2000511346 A JP2000511346 A JP 2000511346A
- Authority
- JP
- Japan
- Prior art keywords
- light
- photon detector
- crystallite
- detector
- particle beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title description 10
- 239000002131 composite material Substances 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 17
- 239000002245 particle Substances 0.000 claims abstract description 12
- 230000008021 deposition Effects 0.000 claims abstract description 9
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 9
- 230000001419 dependent effect Effects 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 239000011159 matrix material Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 229910000510 noble metal Inorganic materials 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000007858 starting material Substances 0.000 abstract description 6
- 239000002159 nanocrystal Substances 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- 206010034960 Photophobia Diseases 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000009191 jumping Effects 0.000 description 2
- 208000013469 light sensitivity Diseases 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- RZZPDXZPRHQOCG-OJAKKHQRSA-O CDP-choline(1+) Chemical compound O[C@@H]1[C@H](O)[C@@H](COP(O)(=O)OP(O)(=O)OCC[N+](C)(C)C)O[C@H]1N1C(=O)N=C(N)C=C1 RZZPDXZPRHQOCG-OJAKKHQRSA-O 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002707 nanocrystalline material Substances 0.000 description 1
- 239000006251 one-dimensional electron gas Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/301—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to very short wavelength, e.g. being sensitive to X-rays, gamma-rays or corpuscular radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Light Receiving Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 導電性の端子の間に、光に依存する導電性を有する材料が配置されている光 子検出器において、前記材料が、非導電性のマトリクス(2)内に互いに絶縁さ れて埋め込まれている偏析した金属導電性の単クリスタリット(1)からなるナ ノ結晶複合材料であることを特徴とする、光子検出器。 2. 単クリスタリット(1)が、貴金属−単クリスタリット(1)である、請求 項1に記載の光子検出器。 3. 単クリスタリット(1)が、数ナノメートルの大きさを有する、請求項2に 記載の光子検出器。 4. 単クリスタリット(1)が、強力に量子化されたエネルギーギャップを有す るゼロ次元の電子ガスを有する、請求項1から3までのいずれか1項に記載の光 子検出器。 5. 非導電性のマトリクス(2)内に互いに絶縁されて埋め込まれた偏析した金 属導電性の単クリスタリット(1)からなるナノ結晶複合材料を粒子線によって 誘起される堆積によって支持体上に施与し、その際、出発物質として有機金属化 合物を使用し、これらの化合物がその高い蒸気圧に基づいて支持体の表面上に吸 着されていることを特徴とする、請求項1から4までのいずれか1項に記載の光 子検出器を 製造する方法。 6. 真空中において分子線装置によって基板の表面に吸着された有機金属化合物 の層を粒子線による高エネルギー衝撃によりナノ結晶化合物に変換する、請求項 5に記載の方法。 7. 衝撃の間に基板の温度が0℃ないし100℃である、請求項5又は6に記載 の方法。 8. 有機金属化合物が貴金属、有利に白金又は金を含む、請求項5から7までの いずれか1項に記載の方法。 9. 粒子線として高エネルギー電子ビームを使用する、請求項5から8までのい ずれか1項に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19621175 | 1996-05-24 | ||
DE19621175.1 | 1996-05-24 | ||
DE19720926A DE19720926A1 (de) | 1996-05-24 | 1997-05-20 | Photonendetektor und Verfahren zur Herstellung des Photonendetektors |
DE19720926.2 | 1997-05-20 | ||
PCT/EP1997/002576 WO1997045710A1 (de) | 1996-05-24 | 1997-05-21 | Photonendetektor und verfahren zur herstellung des photonendetektors |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000511346A true JP2000511346A (ja) | 2000-08-29 |
JP3953525B2 JP3953525B2 (ja) | 2007-08-08 |
Family
ID=26026051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54154497A Expired - Fee Related JP3953525B2 (ja) | 1996-05-24 | 1997-05-21 | 光子検出器及び光子検出器を製造する方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6246055B1 (ja) |
EP (1) | EP0901613B1 (ja) |
JP (1) | JP3953525B2 (ja) |
AT (1) | ATE212435T1 (ja) |
CA (1) | CA2255862C (ja) |
ES (1) | ES2171944T3 (ja) |
PL (1) | PL183653B1 (ja) |
WO (1) | WO1997045710A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7594443B2 (en) | 2006-10-09 | 2009-09-29 | The Board Of Regents, University Of Texas System | Mechanically tunable optical-encoded force sensor |
WO2014037475A1 (en) | 2012-09-07 | 2014-03-13 | Hawilko Gmbh | Nano Granular Materials (NGM) material, methods and arrangements for manufacturing said material and electrical components comprising said material |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4234671C2 (de) * | 1992-10-14 | 1997-06-05 | Marquardt Peter Dr | Ein- und mehrkomponentige lockere Netzwerkstrukturen aus Nanokristallen und ihre Verwendung als Detektoren, Sensoren und Wandler |
US5446286A (en) * | 1994-08-11 | 1995-08-29 | Bhargava; Rameshwar N. | Ultra-fast detectors using doped nanocrystal insulators |
US5759230A (en) * | 1995-11-30 | 1998-06-02 | The United States Of America As Represented By The Secretary Of The Navy | Nanostructured metallic powders and films via an alcoholic solvent process |
-
1997
- 1997-05-21 US US09/194,311 patent/US6246055B1/en not_active Expired - Fee Related
- 1997-05-21 PL PL97330083A patent/PL183653B1/pl unknown
- 1997-05-21 CA CA002255862A patent/CA2255862C/en not_active Expired - Fee Related
- 1997-05-21 EP EP97924964A patent/EP0901613B1/de not_active Expired - Lifetime
- 1997-05-21 ES ES97924964T patent/ES2171944T3/es not_active Expired - Lifetime
- 1997-05-21 JP JP54154497A patent/JP3953525B2/ja not_active Expired - Fee Related
- 1997-05-21 WO PCT/EP1997/002576 patent/WO1997045710A1/de active IP Right Grant
- 1997-05-21 AT AT97924964T patent/ATE212435T1/de active
Also Published As
Publication number | Publication date |
---|---|
US6246055B1 (en) | 2001-06-12 |
CA2255862A1 (en) | 1997-12-04 |
ATE212435T1 (de) | 2002-02-15 |
EP0901613B1 (de) | 2002-01-23 |
CA2255862C (en) | 2005-03-22 |
ES2171944T3 (es) | 2002-09-16 |
WO1997045710A1 (de) | 1997-12-04 |
JP3953525B2 (ja) | 2007-08-08 |
EP0901613A1 (de) | 1999-03-17 |
PL330083A1 (en) | 1999-04-26 |
PL183653B1 (pl) | 2002-06-28 |
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