JP2000351940A5 - - Google Patents
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- JP2000351940A5 JP2000351940A5 JP1999162818A JP16281899A JP2000351940A5 JP 2000351940 A5 JP2000351940 A5 JP 2000351940A5 JP 1999162818 A JP1999162818 A JP 1999162818A JP 16281899 A JP16281899 A JP 16281899A JP 2000351940 A5 JP2000351940 A5 JP 2000351940A5
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- JP
- Japan
- Prior art keywords
- group
- composition
- parts
- emulsion
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000203 mixture Substances 0.000 description 41
- 239000011248 coating agent Substances 0.000 description 20
- 238000000576 coating method Methods 0.000 description 20
- -1 organosilane compound Chemical class 0.000 description 20
- 239000008199 coating composition Substances 0.000 description 17
- 229920000642 polymer Polymers 0.000 description 17
- 239000000839 emulsion Substances 0.000 description 14
- 239000007787 solid Substances 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 12
- 238000005507 spraying Methods 0.000 description 11
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N iso-propanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 150000001282 organosilanes Chemical class 0.000 description 8
- OGIDPMRJRNCKJF-UHFFFAOYSA-N TiO Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atoms Chemical group C* 0.000 description 7
- 125000000524 functional group Chemical group 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910001929 titanium oxide Inorganic materials 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000011780 sodium chloride Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N Acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- QDOXWKRWXJOMAK-UHFFFAOYSA-N Chromium(III) oxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000000443 aerosol Substances 0.000 description 3
- 230000003373 anti-fouling Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052803 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000003995 emulsifying agent Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000011941 photocatalyst Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 235000014692 zinc oxide Nutrition 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N AI2O3 Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- IBVAQQYNSHJXBV-UHFFFAOYSA-N Adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 2
- 229920000180 Alkyd Polymers 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L Barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L Barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- AXCZMVOFGPJBDE-UHFFFAOYSA-L Calcium hydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N Copper(I) oxide Chemical compound [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- PIJPYDMVFNTHIP-UHFFFAOYSA-L Lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N Methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N Trimethylglycine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N Valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000008051 alkyl sulfates Chemical class 0.000 description 2
- 229910052782 aluminium Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N silicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Chemical group 0.000 description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-Aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- LGXVIGDEPROXKC-UHFFFAOYSA-N 1,1-Dichloroethene Chemical compound ClC(Cl)=C LGXVIGDEPROXKC-UHFFFAOYSA-N 0.000 description 1
- ZQUROMIGLUXXNW-UHFFFAOYSA-N 1-triethoxysilylpropan-2-ol Chemical compound CCO[Si](CC(C)O)(OCC)OCC ZQUROMIGLUXXNW-UHFFFAOYSA-N 0.000 description 1
- AFAZQMFMBKQIDW-UHFFFAOYSA-N 1-trimethoxysilylpropan-2-ol Chemical compound CO[Si](OC)(OC)CC(C)O AFAZQMFMBKQIDW-UHFFFAOYSA-N 0.000 description 1
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 1
- DLLMHEDYJQACRM-UHFFFAOYSA-N 2-(carboxymethyldisulfanyl)acetic acid Chemical compound OC(=O)CSSCC(O)=O DLLMHEDYJQACRM-UHFFFAOYSA-N 0.000 description 1
- NICLKHGIKDZZGV-UHFFFAOYSA-N 2-cyanopentanoic acid Chemical compound CCCC(C#N)C(O)=O NICLKHGIKDZZGV-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZHTLMPWATZQGAP-UHFFFAOYSA-N 2-triethoxysilylethanol Chemical compound CCO[Si](CCO)(OCC)OCC ZHTLMPWATZQGAP-UHFFFAOYSA-N 0.000 description 1
- BOSZBTFBHSYELP-UHFFFAOYSA-N 2-trimethoxysilylethanol Chemical compound CO[Si](OC)(OC)CCO BOSZBTFBHSYELP-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- NMUBRRLYMADSGF-UHFFFAOYSA-N 3-triethoxysilylpropan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCO NMUBRRLYMADSGF-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- LVACOMKKELLCHJ-UHFFFAOYSA-N 3-trimethoxysilylpropylurea Chemical compound CO[Si](OC)(OC)CCCNC(N)=O LVACOMKKELLCHJ-UHFFFAOYSA-N 0.000 description 1
- AQYKIROTAGYYQK-UHFFFAOYSA-N 5,5-dimethyl-3-methylidenehex-1-ene Chemical compound CC(C)(C)CC(=C)C=C AQYKIROTAGYYQK-UHFFFAOYSA-N 0.000 description 1
- 210000001565 ALC Anatomy 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K Aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 210000000988 Bone and Bones Anatomy 0.000 description 1
- 229960003563 Calcium Carbonate Drugs 0.000 description 1
- 108091005937 Cerulean Proteins 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N Chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- LBFUKZWYPLNNJC-UHFFFAOYSA-N Cobalt(II,III) oxide Chemical compound [Co]=O.O=[Co]O[Co]=O LBFUKZWYPLNNJC-UHFFFAOYSA-N 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- BWFPGXWASODCHM-UHFFFAOYSA-N Copper monosulfide Chemical compound [Cu]=S BWFPGXWASODCHM-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N Dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L Iron(II) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- XCAUINMIESBTBL-UHFFFAOYSA-N Lead(II) sulfide Chemical compound [Pb]=S XCAUINMIESBTBL-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L Magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- NUJOXMJBOLGQSY-UHFFFAOYSA-N Manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N Molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N N#B Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N N,N'-Methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N N-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- QGNBDSPDXGLEJP-UHFFFAOYSA-N N-fluoroacetamide Chemical group CC(=O)NF QGNBDSPDXGLEJP-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N Silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N Silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N Simethicone Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- NVKTUNLPFJHLCG-UHFFFAOYSA-N Strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N Tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229920002803 Thermoplastic polyurethane Polymers 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N Titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N Triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HWKQNAWCHQMZHK-UHFFFAOYSA-N Trolnitrate Chemical compound [O-][N+](=O)OCCN(CCO[N+]([O-])=O)CCO[N+]([O-])=O HWKQNAWCHQMZHK-UHFFFAOYSA-N 0.000 description 1
- 210000003135 Vibrissae Anatomy 0.000 description 1
- 229920001567 Vinyl ester Polymers 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N Zirconium(IV) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- YCEJLNKYYGDNTD-UHFFFAOYSA-L barium(2+);oxozinc;sulfanylidenezinc;sulfate Chemical compound [Ba+2].[Zn]=O.[Zn]=S.[O-]S([O-])(=O)=O YCEJLNKYYGDNTD-UHFFFAOYSA-L 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 235000011116 calcium hydroxide Nutrition 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- FKTMFLUERPVMAS-UHFFFAOYSA-N cyclohexyl(triethoxy)silane;cyclohexyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C1CCCCC1.CCO[Si](OCC)(OCC)C1CCCCC1 FKTMFLUERPVMAS-UHFFFAOYSA-N 0.000 description 1
- 230000004059 degradation Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- DGPFXVBYDAVXLX-UHFFFAOYSA-N dibutyl(diethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)CCCC DGPFXVBYDAVXLX-UHFFFAOYSA-N 0.000 description 1
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- NRMUHDACMQEQMT-UHFFFAOYSA-N diethoxy(diheptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)CCCCCCC NRMUHDACMQEQMT-UHFFFAOYSA-N 0.000 description 1
- UDFQIGODCFRNJY-UHFFFAOYSA-N diethoxy(dihexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)CCCCCC UDFQIGODCFRNJY-UHFFFAOYSA-N 0.000 description 1
- YETKAVVSNLUTEQ-UHFFFAOYSA-N diethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OCC)(OCC)CCCCCCCC YETKAVVSNLUTEQ-UHFFFAOYSA-N 0.000 description 1
- VDXFKFNGIDWIQQ-UHFFFAOYSA-N diethoxy(dipentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)CCCCC VDXFKFNGIDWIQQ-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- HZLIIKNXMLEWPA-UHFFFAOYSA-N diethoxy(dipropyl)silane Chemical compound CCC[Si](CCC)(OCC)OCC HZLIIKNXMLEWPA-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- DZBCKWWFOPPOCW-UHFFFAOYSA-N diheptyl(dimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)CCCCCCC DZBCKWWFOPPOCW-UHFFFAOYSA-N 0.000 description 1
- CYICXDQJFWXGTC-UHFFFAOYSA-N dihexyl(dimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)CCCCCC CYICXDQJFWXGTC-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- LXAPXYULCIKKNK-UHFFFAOYSA-N dimethoxy(dipentyl)silane Chemical compound CCCCC[Si](OC)(OC)CCCCC LXAPXYULCIKKNK-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- AHAREKHAZNPPMI-UHFFFAOYSA-N hexa-1,3-diene Chemical compound CCC=CC=C AHAREKHAZNPPMI-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000014413 iron hydroxide Nutrition 0.000 description 1
- 229910000460 iron oxide Inorganic materials 0.000 description 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- YJOMWQQKPKLUBO-UHFFFAOYSA-L lead(2+);phthalate Chemical compound [Pb+2].[O-]C(=O)C1=CC=CC=C1C([O-])=O YJOMWQQKPKLUBO-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 239000011776 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910000529 magnetic ferrite Inorganic materials 0.000 description 1
- FSQQTNAZHBEJLS-UPHRSURJSA-N maleamic acid Chemical compound NC(=O)\C=C/C(O)=O FSQQTNAZHBEJLS-UPHRSURJSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 229910000468 manganese oxide Inorganic materials 0.000 description 1
- AMWRITDGCCNYAT-UHFFFAOYSA-L manganese(II,III) oxide Inorganic materials [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- VASIZKWUTCETSD-UHFFFAOYSA-N oxomanganese Chemical compound [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N pentadiene group Chemical group C=CC=CC PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- XKTMIJODWOEBKO-UHFFFAOYSA-M sodium;3-[[N-ethyl-4-[[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]cyclohexa-2,5-dien-1-ylidene]-phenylmethyl]anilino]methyl]benzenesulfonate Chemical compound [Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=2C=CC=CC=2)C=CC=1N(CC)CC1=CC=CC(S([O-])(=O)=O)=C1 XKTMIJODWOEBKO-UHFFFAOYSA-M 0.000 description 1
- HWLCXJRHGUPXJZ-RTLSQWIOSA-K sodium;iron(2+);(1E)-1-oxidoiminonaphthalen-2-one;(1Z)-1-oxidoiminonaphthalen-2-one Chemical compound [Na+].[Fe+2].C1=CC=C2C(=N/[O-])\C(=O)C=CC2=C1.C1=CC=C2C(=N/[O-])\C(=O)C=CC2=C1.C1=CC=C2C(=N/[O-])/C(=O)C=CC2=C1 HWLCXJRHGUPXJZ-RTLSQWIOSA-K 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N sulfonic acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- CQDTUBLRLRFEJX-UHFFFAOYSA-N tricopper;diborate Chemical compound [Cu+2].[Cu+2].[Cu+2].[O-]B([O-])[O-].[O-]B([O-])[O-] CQDTUBLRLRFEJX-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910052846 zircon Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Description
【0001】
【発明の属する技術分野】
本発明は、光触媒を噴霧し、住宅設備、内装材などの各種部材に防汚性を付与することのできる、スプレー用コーティング組成物およびこのコーティング組成物が充填されたエアゾール缶および塗膜の形成方法に関する。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention provides a spray coating composition capable of imparting antifouling properties to various members such as housing equipment and interior materials by spraying a photocatalyst, and formation of an aerosol can and a coating film filled with the coating composition. About the method .
【0002】
【従来の技術】
近年、耐候性、耐汚染性、耐薬品性に優れ、しかも硬度の高い塗膜を形成させることのできるコーティング用組成物が求められており、さらに今後は汎用性の高いものが求められる。これまでには、シリル基含有ビニル系樹脂とオルガノシラン化合物からなる組成物として、特開平01−69673号公報や特開平01−69674号公報があるが、いずれも、基材が限定されている。また、特開平04−108172号公報や特開平04−117473号公報などがあるが、いずれも、対象基材は広いが、具体的な塗装仕様については述べられていない。
[0002]
[Prior art]
In recent years, a coating composition that is excellent in weather resistance, stain resistance, and chemical resistance and that can form a coating film having high hardness has been demanded. In the future, a highly versatile composition will be required. Until now, as a composition comprising a silyl group-containing vinyl resin and an organosilane compound, there are JP-A-01-69673 and JP-A-01-69674, all of which have limited substrates. . Further, there is such Hei 04-108172 and JP 04-117473 discloses, but both, although the subject substrate is wide, does not mention the specific paint specifications.
一方、オルガノシラン系コーティング材に対する要求性能をある程度満たすコーティング用組成物として、オルガノシランの部分縮合物、コロイダルシリカの分散液およびシリコーン変性アクリル樹脂を配合した組成物(特開昭60−135465号公報)、オルガノシランの縮合物、ジルコニウムアルコキシドのキレート化合物および加水分解性シリル基含有ビニル系樹脂を配合した組成物(特開昭64−1769号公報)、オルガノシランの縮合物、コロイド状アルミナおよび加水分解性シリル基含有ビニル系樹脂を配成した組成物(米国特許第4,904,721号明細書)などが提案されている。 On the other hand, as co-Tin grayed composition satisfying the required performance for the organosilane-based coating material to some extent, partial condensate of organosilane, dispersions and compositions containing the silicone-modified acrylic resin of colloidal silica (JP 60-135465 JP-A-64-1769, a composition containing a condensate of an organosilane, a chelate compound of a zirconium alkoxide and a vinyl resin containing a hydrolyzable silyl group, a condensate of an organosilane, colloidal alumina Further, a composition having a hydrolyzable silyl group-containing vinyl resin (US Pat. No. 4,904,721) has been proposed.
さらに、本願特許出願人は、既にオルガノシランの加水分解物および/またはその部分縮合物、加水分解性および/または水酸基と結合したケイ素原子を有するシリル基を有するビニル系樹脂、金属キレート化合物ならびにβ−ジケトン類および/またはβ−ケトエステル類を含有するコーティング用組成物(特開平5−345877号公報)を提案しており、該組成物は、オルガノシラン系コーティング材に求められている上記塗膜性能のバランスに優れているが、これらの性能についても、さらなる改善が求められている。 Further, the applicant of the present application has already disclosed a hydrolyzate of an organosilane and / or a partial condensate thereof, a vinyl resin having a hydrolyzable and / or silyl group having a silicon atom bonded to a hydroxyl group, a metal chelate compound and β - proposes a diketone and / or β- ketoester coating composition containing (JP flat 5-345877), the composition, the coating being asked to organosilane-based coating material Although the film performance is excellently balanced, further improvements are required for these properties.
【0011】
【発明が解決しようとする課題】
本発明は、上記従来の技術的課題を背景になされたもので、光触媒を噴霧し、住宅設備、内装材などの各種部材に防汚性を付与することのできる、硬度、透明性に優れたスプレー用コーティング組成物、このコーティング組成物が充填されたエアゾール缶および塗膜の形成方法を提供することを目的とする。
[0011]
[Problems to be solved by the invention]
The present invention has been made against the background of the above-mentioned conventional technical problems, and is capable of spraying a photocatalyst to impart antifouling properties to various members such as housing equipment and interior materials , and has excellent hardness and transparency. An object of the present invention is to provide a spray coating composition , an aerosol can filled with the coating composition, and a method for forming a coating film .
一般式(1)において、R1の炭素数1〜8の1価の有機基としては、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、sec−ブチル基、t−ブチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、2−エチルヘキシル基などのアルキル基;アセチル基、プロピオニル基、ブチリル基、バレリル基、ベンゾイル基、トリオイル基、カプロイル基などのアシル基;ビニル基、アリル基、シクロヘキシル基、フェニル基、エポキシ基、グリシジル基、(メタ)アクリルオキシ基、ウレイド基、アミド基、フルオロアセトアミド基、イソシアネート基などのほか、これらの基の置換誘導体などを挙げることができる。 In the general formula (1), examples of the monovalent organic group having 1 to 8 carbon atoms for R 1 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and an i-butyl group. Group, sec-butyl group, t-butyl group, n-hexyl group, n-heptyl group, n-octyl group, alkyl group such as 2-ethylhexyl group; acetyl group, propionyl group, butyryl group, valeryl group, benzoyl group , Torioiru group, an acyl group such as caproyl group; a vinyl group, an allyl group, a cyclohexyl group, a phenyl group, an epoxy group, a glycidyl group, (meth) acryloxy group, ureido group, amide group, fluoro acetamide group, diisocyanate over preparative In addition to the groups, there can be mentioned substituted derivatives of these groups.
R1の置換誘導体における置換基としては、例えば、ハロゲン原子、置換もしくは非置換のアミノ基、水酸基、メルカプト基、イソシアネート基、グリシドキシ基、3,4−エポキシシクロヘキシル基、(メタ)アクリルオキシ基、ウレイド基、アンモニウム塩基などを挙げることができる。ただし、これらの置換誘導体からなるR1の炭素数は、置換基中の炭素原子を含めて8以下である。
一般式(1)中に、R1が2個存在するときは、相互に同一でも異なってもよい。
The substituted derivatives of R 1, for example, a halogen atom, a substituted or unsubstituted amino group, a hydroxyl group, a mercapto group, diisocyanate over preparative group, glycidoxy group, 3,4-epoxycyclohexyl group, (meth) acrylic Oxy groups, ureido groups, ammonium bases and the like can be mentioned. However, the carbon number of R 1 comprising these substituted derivatives is 8 or less including the carbon atom in the substituent.
When two R 1 are present in the general formula (1), they may be the same or different from each other.
このようなオルガノシラン(1)の具体例としては、
テトラメトキシシラン、テトラエトキシシラン、テトラ−n−プロポキシシラン、テトラ−i−プロポキシシラン、テトラ−n−ブトキシシランなどのテトラアルコキシシラン類;メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、i−プロピルトリメトキシシラン、i−プロピルトリエトキシシラン、n−ブチルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ペンチルトリメトキシシラン、n−ヘキシルトリメトキシシラン、n−ヘプチルトリメトキシシラン、n−オクチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、シクロヘキシルトリメトキシシラン、シクロヘキシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、3,3,3−トリフルオロプロピルトリメトキシシラン、3,3,3−トリフルオロプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、2−ヒドロキシエチルトリメトキシシラン、2−ヒドロキシエチルトリエトキシシラン、2−ヒドロキシプロピルトリメトキシシラン、2−ヒドロキシプロピルトリエトキシシラン、3−ヒドロキシプロピルトリメトキシシラン、3−ヒドロキシプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン、3−イソシアネートプロピルトリメトキシシラン、3−イソシアネートプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アタクリルオキシプロピルトリエトキシシラン、3−ウレイドプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシランなどのトリアルコキシシラン類;ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジ−n−プロピルジメトキシシラン、ジ−n−プロピルジエトキシシラン、ジ−i−プロピルジメトキシシラン、ジ−i−プロピルジエトキシシラン、ジ−n−ブチルジメトキシシラン、ジ−n−ブチルジエトキシシラン、ジ−n−ペンチルジメトキシシラン、ジ−n−ペンチルジエトキシシラン、ジ−n−ヘキシルジメトキシシラン、ジ−n−ヘキシルジエトキシシラン、ジ−n−ヘプチルジメトキシシラン、ジ−n−ヘプチルジエトキシシラン、ジ−n−オクチルジメトキシシラン、ジ−n−オクチルジエトキシシラン、ジ−n−シクロヘキシルジメトキシシラン、ジ−n−シクロヘキシルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシランなどのジアルコキシシラン類のほか、メチルトリアセチルオキシシラン、ジメチルジアセチルオキシシランなどを挙げることができる。
Specific examples of such an organosilane (1) include:
Tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, tetra-n-butoxysilane; methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, Ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, i-propyltrimethoxysilane, i-propyltriethoxysilane, n-butyltrimethoxysilane, n-butyltriethoxysilane, n-pentyl Trimethoxysilane, n-hexyltrimethoxysilane, n-heptyltrimethoxysilane, n-octyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, cyclohexyltrimethoxysilane Cyclohexyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, 3,3,3- Trifluoropropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-hydroxyethyltrimethoxysilane, 2-hydroxyethyltriethoxysilane, 2-hydroxypropyltrimethoxysilane, 2-hydroxy Propyltriethoxysilane, 3-hydroxypropyltrimethoxysilane, 3-hydroxypropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltrie Kishishiran, 3-diisocyanate over preparative trimethoxysilane, 3-diisocyanate over preparative triethoxysilane, 3-glycidoxypropyl trimethoxysilane, 3-glycidoxypropyl triethoxysilane, 2- (3,4 -Epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) attacryloxypropyltriethoxysilane, 3 Trialkoxysilanes such as ureidopropyltrimethoxysilane and 3-ureidopropyltriethoxysilane; dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, di-n-propyldimethoxy Sisilane, di-n-propyldiethoxysilane, di-i-propyldimethoxysilane, di-i-propyldiethoxysilane, di-n-butyldimethoxysilane, di-n-butyldiethoxysilane, di-n-pentyl Dimethoxysilane, di-n-pentyldiethoxysilane, di-n-hexyldimethoxysilane, di-n-hexyldiethoxysilane, di-n-heptyldimethoxysilane, di-n-heptyldiethoxysilane, di-n- In addition to dialkoxysilanes such as octyldimethoxysilane, di-n-octyldiethoxysilane, di-n-cyclohexyldimethoxysilane, di-n-cyclohexyldiethoxysilane, diphenyldimethoxysilane, and diphenyldiethoxysilane, methyl triacetyl Oxysilane, dimethyldiacetyl Or the like can be mentioned Kishishiran.
また、(a)成分の市販品には、三菱化学(株)製のMKCシリケート、コルコート社製のエチルシリケート、東レ・ダウコーニング社製のシリコーンレジン、東芝シリコーン(株)製のシリコーンレジン、信越化学工業(株)製のシリコーンレジン、ダウコーニング・アジア(株)製のヒドロキシル基含有ポリジメチルシロキサン、日本ユニカー(株)製のシリコンオリゴマーなどがあり、これらをそのまま、または縮合させて使用してもよい。 Further, (a) The components of the commercial products, MKC silicate manufactured by Mitsubishi Chemical Corporation, Colcoat Co. ethyl silicate, manufactured by Dow Corning Toray Co., Ltd. silicone over Nrejin, Toshiba Silicone Co., Ltd. silicone over Nrejin Shin-Etsu Chemical Co., Ltd. silicone over Nrejin, manufactured by Dow Corning Asia Ltd. of hydroxyl group-containing dimethyl polysiloxane include Nippon Unicar over Corp. silicon oligomer causes them directly, or fused May be used.
本発明において、(c)成分は、単独でまたは2種以上を混合して使用することができる。
(c)成分の使用量は、(a)成分中の(R1)nSiO(4−n)/2で表される構造単位100重量部に対して、固形分換算で、通常、1〜500重量部、好ましくは、5〜400重量部である。1重量部未満では、光触媒反応による防汚効果が不足する場合があり、一方、500重量部を超えると、得られるコーティング組成物の成膜性が低下する場合がある。
In the present invention, (c) component, Ru can use alone or in combination of two or more.
The amount of the component (c) used is usually 1 to 100 parts by weight of the structural unit represented by (R 1 ) n SiO (4-n) / 2 in the component (a) in terms of solid content. 500 parts by weight, preferably 5 to 400 parts by weight. If the amount is less than 1 part by weight, the antifouling effect due to the photocatalytic reaction may be insufficient, while if it exceeds 500 parts by weight, the film-forming properties of the obtained coating composition may decrease.
(式中、Xはハロゲン原子、アルコキシ基、アセトキシ基、フェノキシ基、チオアルコキシ基、アミノ基などの加水分解性基または水酸基を示し、R6は水素原子、炭素数1〜10のアルキル基または炭素数1〜10のアラルキル基を示し、iは1〜3の整数である。) (Wherein, X represents a halogen atom, an alkoxy group, an acetoxy group, a phenoxy group, Chioarukoki sheet group, a hydrolyzable group or a hydroxyl group such as an amino group, R 6 is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms Or an aralkyl group having 1 to 10 carbon atoms, and i is an integer of 1 to 3.)
(ロ)下記一般式(5)
〔式中、X,R6,iは一般式(4)におけるそれぞれX,R6,iと同義であり、R7は重合性二重結合を有する有機基を示す。〕で表されるシラン化合物(以下「不飽和シラン化合物(ロ)」という)と、他のビニル系単量体とを共重合する方法。
(B) The following general formula (5)
Wherein, X, R 6, i has the same meaning as X, R 6, i, respectively, in the general formula (4), R 7 represents an organic group having a polymerizable double bond. ] (Hereinafter referred to as "unsaturated silane compound (II)") and another vinyl monomer.
(イ−2)官能基(α)を有するラジカル重合開始剤(例えば、4,4’−アゾビス−4−シアノ吉草酸など)を使用し、あるいは、ラジカル重合開始剤と連鎖移動剤の双方に官能基(α)を有する化合物(例えば、4,4’−アゾビス−4−シアノ吉草酸とジチオグリコール酸など)を使用して、ビニル系単量体を(共)重合して、重合体分子鎖の片末端あるいは両末端にラジカル重合開始剤や連鎖移動剤に由来する官能基(α)を有する(共)重合体を合成したのち、該(共)重合体中の官能基(α)に、官能基(β)と炭素・炭素二重結合とを有する不飽和化合物を反応させることにより、重合体分子鎖の片末端あるいは両末端に炭素−炭素二重結合を有する不飽和ビニル系重合体を製造する方法。 (A-2) a radical polymerization initiator having a functional group (alpha) (e.g., 4,4 '- azobis-4-like cyanovaleric acid) was used, or both of the radical polymerization initiator and a chain transfer agent compound having a functional group (alpha) (e.g., 4,4 '- azobis-4-cyano like valeric acid and dithioglycolic acid) using, a vinyl monomer (co) polymerized to the polymer molecule After synthesizing a (co) polymer having a functional group (α) derived from a radical polymerization initiator or a chain transfer agent at one end or both ends of the chain, the functional group (α) in the (co) polymer is By reacting an unsaturated compound having a functional group (β) with a carbon-carbon double bond to form an unsaturated vinyl polymer having a carbon-carbon double bond at one or both ends of the polymer molecular chain How to manufacture.
(ニ)(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド、N−メトキシメチル(メタ)アクリルアミド、N−ブトキシメチル(メタ)アクリルアミド、N,N’−メチレンビスアクリルアミド、ダイアセトンアクリルアミド、マレイン酸アミド、マレイミドなどの酸アミド化合物;
(ホ)塩化ビニル、塩化ビニリデン、脂肪酸ビニルエステルなどのビニル化合物;
(ヘ)1,3−ブタジエン、2,3−ジメチル−1,3−ブタジエン、2−ネオペンチル−1,3−ブタジエン、2−クロロ−1,3−ブタジエン、2−シアノ−1,3−ブタジエン、イソプレン、アルキル基、ハロゲン原子、シアノ基などの置換基で置換された置換直鎖共役ペンタジエン類、直鎖状および側鎖状の共役ヘキサジエンなどの脂肪族共役ジエン;
(D) (meth) acrylamide, N-methylol (meth) acrylamide, N-methoxymethyl (meth) acrylamide, N-butoxymethyl (meth) acrylamide, N, N'-methylenebisacrylamide, diacetone acrylamide, maleic amide And acid amide compounds such as maleimide;
(E) vinyl compounds such as vinyl chloride, vinylidene chloride, and fatty acid vinyl esters;
(F) 1,3-butadiene, 2,3 - dimethyl-1,3-butadiene, 2-neopentyl-1,3-butadiene, 2-chloro-1,3-butadiene, 2-cyano-1,3 Aliphatic conjugated dienes such as substituted linear conjugated pentadienes substituted with substituents such as butadiene, isoprene, an alkyl group, a halogen atom, and a cyano group, and linear and side-chain conjugated hexadiene;
また、上記(ロ)の方法に使用される不飽和シラン化合物(ロ)の具体例としては、
CH2=CHSi(CH3)(OCH3)2、
CH2=CHSi(OCH3)3、
CH 2 =CHSi(CH3)Cl2、CH2=CHSiCl3、
CH2=CHCOO(CH2)2Si(CH3)(OCH3)2、
CH2=CHCOO(CH2)2Si(OCH3)3、
CH2=CHCOO(CH2)3Si(CH3)(OCH3)2、
CH2=CHCOO(CH2)3Si(OCH3)3、
CH2=CHCOO(CH2)2Si(CH3)Cl2、
CH2=CHCOO(CH2)2SiCl3、
CH2=CHCOO(CH2)3Si(CH3)Cl2、
CH2=CHCOO(CH2)3SiCl3、
CH2=C(CH3)COO(CH2)2Si(CH3)(OCH3)2、
CH2=C(CH3)COO(CH2)2Si(OCH3)3、
CH2=C(CH3)COO(CH2)3Si(CH3)(OCH3)2、
CH2=C(CH3)COO(CH2)3Si(OCH3)3、
CH2=C(CH3)COO(CH2)2Si(CH3)Cl2、
CH2=C(CH3)COO(CH2)2SiCl3、
CH2=C(CH3)COO(CH2)3Si(CH3)Cl2、
CH2=C(CH3)COO(CH2)3SiCl3、
Specific examples of the unsaturated silane compound (b) used in the method (b) include:
CH 2 CHCHSi (CH 3 ) (OCH 3 ) 2 ,
CH 2 CHCHSi (OCH 3 ) 3 ,
CH 2 CHCHSi (CH 3 ) Cl 2 , CH 2 CHCHSiCl 3 ,
CH 2 = CHCOO (CH 2) 2 Si (CH 3) (OCH 3) 2,
CH 2 CHCHCOO (CH 2 ) 2 Si (OCH 3 ) 3 ,
CH 2 CHCHCOO (CH 2 ) 3 Si (CH 3 ) (OCH 3 ) 2 ,
CH 2 CHCHCOO (CH 2 ) 3 Si (OCH 3 ) 3 ,
CH 2 CHCHCOO (CH 2 ) 2 Si (CH 3 ) Cl 2 ,
CH 2 CHCHCOO (CH 2 ) 2 SiCl 3 ,
CH 2 CHCHCOO (CH 2 ) 3 Si (CH 3 ) Cl 2 ,
CH 2 CHCHCOO (CH 2 ) 3 SiCl 3 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 2 Si (CH 3 ) (OCH 3 ) 2 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 2 Si (OCH 3 ) 3 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 3 Si (CH 3 ) (OCH 3 ) 2 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 3 Si (OCH 3 ) 3 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 2 Si (CH 3 ) Cl 2 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 2 SiCl 3 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 3 Si (CH 3 ) Cl 2 ,
CH 2 CC (CH 3 ) COO (CH 2 ) 3 SiCl 3 ,
(b3−2)単量体;
(b3−2)単量体は、下記一般式(3)’で表される。
〔式中、Rfはフッ素原子を含むアルキル基またはアルコキシアルキル基を示し、R3〜R 5 は、一般式(2)’と同義であり、同義の範囲内で、一般式(2)のR3〜R5と異なっていてもよい。〕
(B3-2) a monomer;
(B3-2) The monomer is represented by the following general formula (3) ′.
[In the formula, Rf represents an alkyl group or an alkoxyalkyl group containing a fluorine atom, and R 3 to R 5 have the same meaning as in the general formula (2) ′, and within the same meaning, R 3 to R 5 in the general formula (2) 3 may be different from the ~R 5. ]
(b3)成分を構成する(b3−1)構成単位と(b3−2)構成単位との合計含有量は、(b3)成分中に、通常、0.5〜80モル%、好ましくは、1〜70モル%である。0.5モル%未満では、透明性、密着性などに優れたバランスの良い塗膜を得るのが難しい場合がある。一方、80モル%を超えると、得られる塗膜が基板との密着性に劣るものとなる場合がある。
このうち、(b3−1)構成単位の含有量は、(b3)成分中に、好ましくは、0.5〜70モル%である。また、(b3−2)構成単位の含有量は、(b3)成分中に、好ましくは、0.5〜70モル%である。
さらに、(b3−3)構成単位の含有量は、特定シリル基の含有量として、(b3)成分中に、通常、0.1〜60モル%、好ましくは、0.5〜50モル%となる量である。0.1モル%未満では、(a)成分との共縮合の効果が得られない。一方、60モル%を超えると、得られるコーティング組成物の保存安定性が悪くなる傾向にある。
なお、共重合可能な他の単量体である(b3−4)単量体からなる構成単位〔(b3−4)構成単位〕は、(b3)成分中に、通常、90モル%以下、好ましくは、80モル%以下程度である。
The total content of the (b3-1) structural unit and the (b3-2) structural unit constituting the component (b3) is usually 0.5 to 80 mol%, preferably 1 to 3, in the component (b3). ~ 70 mol%. If the amount is less than 0.5 mol%, it may be difficult to obtain a well-balanced coating film having excellent transparency and adhesion. On the other hand, if it exceeds 80 mol%, the resulting coating film may have poor adhesion to the substrate.
Among these, the content of the (b3-1) structural unit is preferably 0.5 to 70 mol% in the component (b3). Further, the content of the (b3-2) structural unit in the component (b3) is preferably 0.5 to 70 mol%.
Further, the content of (b3-3) structure units, the content of specific silyl group, in (b3) component, usually 0.1 to 60 mol%, preferably, a 0.5 to 50 mol% Amount. If it is less than 0.1 mol%, the effect of co-condensation with the component (a) cannot be obtained. On the other hand, if it exceeds 60 mol%, the storage stability of the obtained coating composition tends to be poor.
In addition, the structural unit ((b3-4) structural unit) composed of the (b3-4) monomer, which is another copolymerizable monomer, is usually 90 mol% or less in the component (b3). Preferably, it is about 80 mol% or less.
組成物(IV)に用いられる水系分散体は、(a)ポリオルガノシロキサンと(b2)シリル基含有重合体とからなる特定重合体が水系媒体中に分散しているものである。この特定重合体は、例えば、粒子状あるいは水性ゾル状に分散しており、粒子状体の平均粒子径は、通常、0.001〜100μm、好ましくは、0.001〜1μmである。水系分散体における水系媒体は、本質的に水からなるが、場合により、アルコールなどの有機溶媒が数重量%程度まで含まれていてもよい。 The aqueous dispersion used in the composition (IV) is one in which a specific polymer composed of (a) a polyorganosiloxane and (b2) a silyl group-containing polymer is dispersed in an aqueous medium. This specific polymer is dispersed, for example, in the form of particles or an aqueous sol, and the average particle diameter of the particles is usually 0.001 to 100 μm, preferably 0.001 to 1 μm. The aqueous medium in the aqueous dispersion, but consists essentially of water, optionally, an organic solvent such as an alcohol may be included up to about several percent by weight.
上記の方法において反応生成物を水系媒体中に分散させる際には、乳化調整剤などを使用することができる。
上記乳化調整剤としては、例えば、アルキル硫酸エステル塩、アルキルアリール硫酸エステル塩、アルキルりん酸エステル塩、脂肪酸塩などのアニオン系界面活性剤;アルキルアミン塩、アルキル四級アミン塩などのカチオン系界面活性剤;ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリールエーテル、ブロック型ポリエーテルなどのノニオン系界面活性剤;カルボン酸型(例えば、アミノ酸型、ベタイン型など)、スルホン酸型などの両性界面活性剤などの何れでも使用可能である。これらの乳化剤は、単独でまた上を混合して使用することができる。
The reaction product in the above method Symbol in dispersing in an aqueous medium may be used and emulsion modifier.
As the emulsion modifier, for example, alkyl sulfates, alkylaryl sulfates, alkyl phosphate ester salt, anionic surfactants such as fatty acid salts; cationic surfactants such as alkylamine salts, alkyl quaternary amine salt Activator; nonionic surfactant such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, block type polyether; amphoteric surfactant such as carboxylic acid type (for example, amino acid type, betaine type, etc.) and sulfonic acid type Any of such agents can be used. These emulsifiers can be used alone or as a mixture of the above.
上記の方法に使用される有機溶媒としては、例えば、アルコール類、芳香族炭化水素類、エーテル類、ケトン類、エステル類などが好適である。これらの有機溶媒、反応溶液を水系媒体中に分散させる前に反応溶液から除去しておくこともできる。
上記の方法における加水分解および/または部分縮合時の反応条件は、通常、40〜70℃であり、反応時間は、通常、1〜8時間である。
The organic solvent used in the above process reporting, for example, alcohols, Fang aromatic hydrocarbons, ethers, ketones, and esters. These organic solvents and the reaction solution can be removed from the reaction solution before being dispersed in the aqueous medium.
The reaction conditions of the hydrolysis and / or partial condensation in the upper Symbol method is usually 40 to 70 ° C., the reaction time is usually 1-8 hours.
上記の方法において、(b2)シリル基含有重合体がカルボキシル基やカルボン酸無水物基などの酸性基を有する場合は、加水分解および/または部分縮合後に少なくとも1種の塩基性化合物を添加してpHを調節することが好ましい。また、(b2)シリル基含有重合体が、アミノ基やアミンイミド基などの塩基性基を有する場合は、加水分解および/または部分縮合後に、少なくとも1種の酸性化合物を添加してpHを調節することが好ましい。さらに、(b2)シリル基含有重合体が、酸性基と塩基性基とを有する場合は、加水分解および/または部分縮合後に、これらの基の割合に応じて少なくとも1種の塩基性化合物あるいは酸性化合物を添加して、pHを調節することにより、得られる特定重合体の親水性を高めて、該特定重合体の乳化分散性を向上させることができる。 In the above method SL, (b2) silyl group-containing polymer when having an acidic group such as carboxyl group or carboxylic anhydride groups, by adding at least one basic compound after the hydrolysis and / or partial condensation It is preferred to adjust the pH by adjusting the pH. In the case where the (b2) silyl group-containing polymer has a basic group such as an amino group or an amine imide group, the pH is adjusted by adding at least one acidic compound after the hydrolysis and / or partial condensation. Is preferred. Further, when (b2) the silyl group-containing polymer has an acidic group and a basic group, after hydrolysis and / or partial condensation, at least one basic compound or an acidic compound is added depending on the ratio of these groups. By adjusting the pH by adding a compound, the hydrophilicity of the specific polymer obtained can be increased, and the emulsification and dispersibility of the specific polymer can be improved.
以上、本発明の組成物(I)〜(IV)からは、防汚性、耐久性、透明性に優れ、光触媒機能を有するフィルムが得られるが、光触媒による基材(フィルム)の劣化を防止し、長期耐久密着性にも優れたコーティングフィルムを得るために、フィルム上に、上記組成物(i)〜(iv)の群から選ばれたいずれか1種を下塗りすることが望ましい。
ここで、組成物(i)は組成物(I)に、組成物(ii)は組成物(II)に、組成物(iii)は組成物(III)に、組成物(iv)は組成物(IV)にそれぞれ対応し、いずれも、後者の組成物〔(I)〜(IV)〕から(c)成分を除いた組成物である。そして、これらの組成物(i)〜(iv)において、各成分の種類・配合量も、(c)成分を含まない以外、組成物(I)〜(IV)と同様であるので、省略する。
Above, the compositions of the present invention (I) ~ (IV) is, stain resistance, durability, excellent in transparency, anti although films having photocatalytic function is obtained, the base material by the photocatalyst degradation of (film) Then, in order to obtain a coating film having excellent long-term durability adhesion, it is desirable to undercoat any one of the above-mentioned compositions (i) to (iv) on the film.
Here, composition (i) is composition (I), composition (ii) is composition (II), composition (iii) is composition (III), and composition (iv) is composition Each corresponds to (IV) and is a composition obtained by removing the component (c) from the latter compositions [(I) to (IV)]. In these compositions (i) to (iv), the types and amounts of the respective components are the same as those of the compositions (I) to (IV) except that they do not contain the component (c), and therefore are omitted. .
M(OR8)r(R9COCHCOR10)s・・・(6)
〔式中、Mはジルコニウム、チタンまたはアルミニウムを示し、R8およびR9は、同一または異なって、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、n−ヘキシル基、シクロヘキシル基、フェニル基などの炭素数1〜6の1価の炭化水素基を示し、R10は、R8およびR9と同様の炭素数1〜6の1価の炭化水素基のほか、メトキシ基、エトキシ基、n−プロポキシ基、i−プロポキシ基、n−ブトキシ基、sec−ブトキシ基、t−ブトキシ基、ラウリルオキシ基、ステアリルオキシ基などの炭素数1〜16のアルコキシ基を示し、rおよびsは0〜4の整数で、(r+s)=(Mの原子価)である。〕
M (OR 8 ) r (R 9 COCHCOR 10 ) s (6)
[Wherein M represents zirconium, titanium or aluminum, and R 8 and R 9 are the same or different and are an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, a sec-butyl group, a t-butyl group; - butyl group, n- pentyl group, n- hexyl group, a cyclohexyl group, a monovalent hydrocarbon group having 1 to 6 carbon atoms such as a phenyl group, R 10 is the same number of carbon atoms and R 8 and R 9 In addition to monovalent hydrocarbon groups of 1 to 6, methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, sec-butoxy, t-butoxy, lauryloxy, stearyloxy It indicates an alkoxy group having 1 to 16 carbon atoms such as groups, r and s are integers of 0 to 4, which is (r + s) = (valence of M). ]
上記充填材の具体例としては、鉄、銅、アルミニウム、ニッケル、銀、亜鉛、フェライト、カーボンブラック、ステンレス鋼、二酸化ケイ素、顔料用酸化チタン、酸化アルミニウム、酸化クロム、酸化マンガン、酸化鉄、酸化ジルコニウム、酸化コバルト、合成ムライト、水酸化アルミニウム、水酸化鉄、炭化ケイ素、窒化ケイ素、窒化ホウ素、クレー、ケイソウ土、消石灰、石膏、タルク、炭酸バリウム、炭酸カルシウム、炭酸マグネシウム、硫酸バリウム、ベントナイト、雲母、亜鉛緑、クロム緑、コバルト緑、ビリジアン、ギネー緑、コバルトクロム緑、シェーレ緑、緑土、マンガン緑、ピグメントグリーン、群青、紺青、岩群青、コバルト青、セルリアンブルー、ホウ酸銅、モリブデン青、硫化銅、コバルト紫、マルス紫、マンガン紫、ピグメントバイオレット、亜酸化鉛、鉛酸カルシウム、ジンクエロー、硫化鉛、クロム黄、黄土、カドミウム黄、ストロンチウム黄、チタン黄、リサージ、ピグメントエロー、亜酸化銅、カドミウム赤、セレン赤、クロムバーミリオン、ベンガラ、亜鉛白、アンチモン白、塩基性硫酸鉛、チタン白、リトポン、ケイ酸鉛、酸化ジルコン、タングステン白、鉛、亜鉛華、バンチソン白、フタル酸鉛、マンガン白、硫酸鉛、黒鉛、ボーン黒、ダイヤモンドブラック、サーマトミック黒、植物性黒、チタン酸カリウムウィスカー、二硫化モリブデンなどを挙げることができる。
これらの充填材は、単独でまたは2種以上を混合して使用することができる。
充填材の使用量は、組成物の全固形分100重量部に対して、通常、300重量部以下である。
Specific examples of the filler include iron, copper, aluminum, nickel, silver, zinc, ferrite, carbon black, stainless steel, silicon dioxide, titanium oxide for pigments, aluminum oxide, chromium oxide, manganese oxide, iron oxide, oxide Zirconium, cobalt oxide, synthetic mullite, aluminum hydroxide, iron hydroxide, silicon carbide, silicon nitride, boron nitride, clay, diatomaceous earth, slaked lime, gypsum, talc, barium carbonate, calcium carbonate, magnesium carbonate, barium sulfate, bentonite, Mica, zinc green, chrome green, cobalt green, viridian, guinea green, cobalt chrome green, shale green, green earth, manganese green, pigment green, ultramarine, navy blue, rock ultramarine , cobalt blue, cerulean blue, copper borate, molybdenum Blue, copper sulfide, cobalt purple, mars purple, manganese , Pigment Violet, Lead Oxide, Calcium Lead Acid, Zinc Yellow, Lead Sulfide, Chrome Yellow, Loess, Cadmium Yellow, Strontium Yellow, Titanium Yellow, Lisage, Pigment Yellow, Cuprous Oxide, Cadmium Red, Selenium Red, Chrome Vermillion, Bengala, zinc white, antimony white, basic lead sulfate, titanium white, lithopone, lead silicate, zircon oxide, tungsten white, lead, zinc white, buntisone white, lead phthalate, manganese white, lead sulfate, graphite, bone black , Diamond black, thermatomic black, vegetable black, potassium titanate whiskers, molybdenum disulfide and the like.
These fillers can be used alone or in combination of two or more.
The amount of the filler used is usually 300 parts by weight or less based on 100 parts by weight of the total solid content of the composition.
硬化体
本発明の組成物から得られる硬化体の構成としては、例えば、
(1)基材/本発明の組成物(I)〜(IV)のいずれか
(2)基材/組成物(i)〜(iv)のいずれか/組成物(I)〜(IV)のいずれか
(3)基材/プライマー/組成物(i)〜(iv)のいずれか/組成物(I)〜(IV)のいずれかなどが挙げられる。本発明のコーティング組成物を塗布する際には、本発明のエアゾール缶を用いてスプレー塗装を行う。また、上記下塗り用組成物(i)〜(iv)の塗布方法としては、スプレー塗装であってもよく、そのほか、刷毛、ロールコーター、フローコーター、遠心コーター、超音波コーターなどを用いたり、ディップコート、流し塗り、スクリーンプロセス、電着、蒸着などであってもよい。
As the configuration of the cured product obtained from the composition of the present invention, for example,
(1) Substrate / any of the compositions (I) to (IV) of the present invention
(2) Base material / any of compositions (i) to (iv) / any of compositions (I) to (IV)
(3) Base material / primer / any of compositions (i) to (iv) / any of compositions (I) to (IV). When applying the coating composition of the present invention, spray coating is performed using the aerosol can of the present invention. The method for applying the undercoating compositions (i) to (iv) may be spray coating, and may be performed using a brush, a roll coater, a flow coater, a centrifugal coater, an ultrasonic coater, or the like. Coating, flow coating, screen processing, electrodeposition, vapor deposition and the like may be used.
プライマーの種類としては、例えば、アルキド樹脂、アミノアルキド樹脂、エポキシ樹脂、ポリエステル、アクリル樹脂、ウレタン樹脂、フッ素樹脂、アクリルシリコーン樹脂、アクリル樹脂エマルジョン、エポキシ樹脂エマルジョン、ポリウレタンエマルジョン、ポリエステルエマルジョンなどを挙げることができる。また、これらのプライマーには、厳しい条件での基材と塗膜との密着性が必要な場合、各種の官能基を付与することもできる。このような官能基としては、例えば、水酸基、カルボキシル基、カルボニル基、アミド基、アミノ基、グリシジル基、アルコキシシリル基、エーテル結合、エステル結合などを挙げることができる。さらに、プライマーには、紫外線吸収剤、紫外線安定剤などが配合されていてもよい。 The primers, for example, alkyd resins, amino alkyd resins, epoxy resins, polyesters, acrylic resins, urethane resins, fluororesins, acrylic silicone over down resin, an acrylic resin emulsion, epoxy resin emulsion, polyurethane emulsion, and polyester emulsion Can be mentioned. In addition, these primers can be provided with various functional groups when adhesion between the substrate and the coating film under severe conditions is required. Examples of such a functional group, for example, a hydroxyl group, a carboxyl group, a carbonyl group, an amido group, an amino group, a glycidyl group, alkoxysilyl group, ether bond, and the like ester bond. Further, an ultraviolet absorber, an ultraviolet stabilizer and the like may be blended in the primer.
(1)Mw
下記条件によるゲルパーミエーションクロマトグラフィー(GPC)法により測定した。
試料:テトラヒドロフランを溶媒として使用し、オルガノシランの縮合物1gまたはシリル基含有ビニル系樹脂0.1gを、それぞれ100ccのテトラヒドロフランに溶解して調製した。
標準ポリスチレン:米国プレッシャーケミカル社製の標準ポリスチレンを使用した。
装置:米国ウォーターズ社製の高温高速ゲル浸透クロマトグラム
(モデル150−C ALC/GPC)
カラム:昭和電工(株)製のSHODEX A−80M(長さ50cm)
測定温度:40℃
流速:1cc/分
(2)密着性JIS K5400による碁盤目テスト(ます目100個)により、テープ剥離試験を3回実施し、その平均に拠った。
(3)硬度
JIS K5400による鉛筆硬度に拠った。
(4)耐アルカリ性
試験片を、飽和水酸化カルシウム水溶液中に60日間浸漬したのち、塗膜の状態を目視により観察した。変化のないものを“良好”とした。
(5)耐有機薬品性塗膜上にイソプロピルアルコールを2cc滴下し、5分後に布で拭き取ったのち、塗膜の状態を目視により観察した。変化のないものを“良好”とした。
(6)耐湿性試験片を、温度50℃、湿度95%の環境下に、連続1,000時間保持したのち、取り出して塗膜の状態を目視により観察した。変化のないものを“良好”とした。
(7)耐候性JIS K5400により、サンシャインウェザーメーターで3,000時間照射試験を実施して、塗膜の外観(割れ、はがれなど)を目視により観察した。変化のないものを“良好”とした。
(8)耐水性
試験片を、水道水中に常温で60日間浸漬したのち、塗膜の状態を目視により観察した。変化のないものを“良好”とした。
(9)耐汚染性
塗膜上に、カーボンブラック/灯油=1/2(重量比)の混合物からなるペーストを塗り付け、室温で24時間放置したのち、スポンジを用いて水洗して、塗膜の汚染状態を観察し、下記基準で評価した。
○:汚染なし
△:少し汚染されている
×:汚染が著しい
(10)透明性試験片の可視光の透過率を測定して、下記基準で評価した。
◎;透過率が80%を超える。
○;透過率が60〜80%
△;透過率が60%未満
(1) Mw
The measurement was performed by gel permeation chromatography (GPC) under the following conditions.
Sample: Prepared by dissolving 1 g of organosilane condensate or 0.1 g of silyl group-containing vinyl resin in 100 cc of tetrahydrofuran using tetrahydrofuran as a solvent.
Standard polystyrene: Standard polystyrene manufactured by Pressure Chemical Co., USA was used.
Apparatus: USA Wo Tazu manufactured by hot fast gel permeation chromatogram (Model 150-C ALC / GPC)
Column: SHOdex A-80M manufactured by Showa Denko KK (length 50 cm)
Measurement temperature: 40 ° C
Flow rate: 1 cc / min (2) Adhesion A tape peel test was conducted three times by a grid test (100 squares) according to JIS K5400, and the average was used.
(3) Hardness Based on pencil hardness according to JIS K5400.
(4) Alkali Resistance After the test piece was immersed in a saturated calcium hydroxide aqueous solution for 60 days, the state of the coating film was visually observed. Those that did not change were regarded as “good”.
(5) 2 cc of isopropyl alcohol was dropped on the organic chemical resistant coating film, and after 5 minutes, wiped off with a cloth, and the state of the coating film was visually observed. Those that did not change were regarded as “good”.
(6) The moisture-proof test piece was kept under an environment of a temperature of 50 ° C. and a humidity of 95% continuously for 1,000 hours, and then taken out, and the state of the coating film was visually observed. Those that did not change were regarded as “good”.
(7) Weather resistance JIS K5400, was performed 3,000 hours irradiation test with Sunshine web-user meter, the appearance of the coating film (cracks, peeling, etc.) was observed visually. Those that did not change were regarded as “good”.
(8) Water resistance After the test piece was immersed in tap water at normal temperature for 60 days, the state of the coating film was visually observed. Those that did not change were regarded as “good”.
(9) Stain resistance A paste consisting of a mixture of carbon black / kerosene = 1/2 (weight ratio) is applied on the coating film, left at room temperature for 24 hours, and then washed with a sponge to wash the coating film. Was observed and evaluated according to the following criteria.
:: No contamination Δ: Slightly contaminated X: Severe contamination (10) The transmittance of visible light of the transparency test piece was measured and evaluated according to the following criteria.
A: The transmittance exceeds 80%.
;: Transmittance is 60 to 80%
Δ: transmittance is less than 60%
実施例1’〜27’〔スプレー用コーティング組成物の調製〕
攪拌機、還流冷却器を備えた反応器に、表2〜7に記載した各成分(アセチルアセトン以外)を加えて混合し、攪拌下、60℃で4時間反応させた。次いで、室温まで冷却し、アセチルアセトン10部((III)−1〜(III)−9では5部)を後添加して、固形分濃度約20%の組成物を得た。得られた組成物100部に、i−プロピルアルコール100部を加えてよく混合し、本発明のスプレー用コーティング組成物(I−1)〜(I−9)、(II−1)〜(II−9)および(III−1)〜(III−9)を得た。
Examples 1 'to 27' [Preparation of spray coating composition]
The components (other than acetylacetone) described in Tables 2 to 7 were added to a reactor equipped with a stirrer and a reflux condenser, mixed, and reacted at 60 ° C. for 4 hours with stirring. Next, the mixture was cooled to room temperature, and 10 parts of acetylacetone (5 parts for (III) -1 to (III) -9) were added thereto to obtain a composition having a solid content of about 20%. To 100 parts of the obtained composition, 100 parts of i-propyl alcohol was added and mixed well, and the spray coating compositions (I-1) to (I-9) and (II-1) to (II) of the present invention were mixed. -9) and (III-1) to (III-9).
表2〜7中、*1〜7は、次のとおりである。
*1:信越化学工業(株)製、メチルシリコーンレジン、Mw:500
*2:日本ユニカー(株)製、エトキシシラン含有ポリジメチルシロキサン、Mw:5,000
*3:水分散(pH4)アナターゼ型酸化チタン(固形分濃度20%)
*4:i−プロピルアルコール分散アナターゼ型酸化チタン(固形分濃度20%)
*5:水分散(pH4)アナターゼ型酸化チタン(固形分濃度30%)
*6:トルエン分散酸化亜鉛(固形分濃度30%)
In Tables 2 to 7, * 1 to 7 are as follows.
* 1: Made by Shin-Etsu Chemical Co., Ltd., methyl silicone resin, Mw: 500
* 2: Nippon Unicar Co., Ltd., ethoxysilane-containing polydimethylsiloxane, Mw: 5,000
* 3: Water-dispersed (pH 4) anatase-type titanium oxide (solid content 20%)
* 4: i-propyl alcohol-dispersed anatase type titanium oxide (solid content concentration 20%)
* 5: Water-dispersed (pH 4) anatase type titanium oxide (solid content 30%)
* 6: Zinc oxide dispersed in toluene (solid content: 30%)
実施例28’〔スプレー用コーティング組成物の調製〕
攪拌機、還流冷却器を備えた反応器に、(c)成分として、酸化チタンゾル〔アナターゼ型TiO220%(固形分)、硝酸水80%〕350部を入れ、メチルトリメトキシシラン70部、ジメチルジメトキシシラン30部、参考例1で得られた重合体溶液(b2−A)50部およびi−プロピルアルコール180部を滴下しながら攪拌させたのち、ジ−i−プロポキシ・エチルアセトアセテートアルミニウム5部を加え、60℃で4時間反応させた。次いで、アセチルアセトン5部を添加し、全固形分濃度が20%の特定重合体溶液(以下「重合体溶液(α)」ともいう)を得た。
この重合体溶液(α)100部に、30℃以下の温度で、乳化剤であるアルキル硫酸エステル塩と10%アンモニア水を加え、よく混合してpH7.5に調節した。次いで、i−プロピルアルコール50部で希釈し、得られた溶液をイオン交換水250部中に2時間かけて除々に加えてエマルジョンとした。このエマルジョンに、アジピン酸ジヒドラジド2部を加え、次いでこのエマルジョンから減圧下、50℃以下の温度でi−プロピルアルコールおよび水を除去し、全固形分濃度を20%に調整して、本発明のスプレー用コーティング組成物(IV−1)を得た。
Example 28 ' [Preparation of coating composition for spray]
In a reactor equipped with a stirrer and a reflux condenser, 350 parts of titanium oxide sol (20% of anatase type TiO 2 (solid content), 80% of nitric acid aqueous solution) were added as a component (c), 70 parts of methyltrimethoxysilane, 30 parts of dimethoxysilane, 50 parts of the polymer solution (b2-A) obtained in Reference Example 1 and 180 parts of i-propyl alcohol were dropped and stirred, and then 5 parts of di-i-propoxyethyl acetoacetate aluminum was added. And reacted at 60 ° C. for 4 hours. Next, 5 parts of acetylacetone was added to obtain a specific polymer solution having a total solid content of 20% (hereinafter, also referred to as “polymer solution (α)”).
To 100 parts of this polymer solution (α), an alkyl sulfate ester salt as an emulsifier and 10% aqueous ammonia were added at a temperature of 30 ° C. or lower, and mixed well to adjust the pH to 7.5. Next, the mixture was diluted with 50 parts of i-propyl alcohol, and the resulting solution was gradually added to 250 parts of ion-exchanged water over 2 hours to form an emulsion. To this emulsion was added 2 parts of adipic dihydrazide, and then the i-propyl alcohol and water were removed from the emulsion under reduced pressure at a temperature of 50 ° C. or less, and the total solid content was adjusted to 20% to obtain the emulsion of the present invention. A spray coating composition (IV-1) was obtained.
実施例29’〜32’〔スプレー用コーティング組成物の調製〕
表8に示される処方で、実施例28’と同様にして、特定重合体を調製し、その後、実施例28’と同様にして、本発明のスプレー用コーティング組成物(IV−2)〜(IV−5)を得た。
Examples 29 'to 32' [Preparation of coating composition for spray]
In formulations shown in Table 8, Examples 28 'in the same manner as in the specific polymer is prepared and then Example 28' was prepared in analogy to, spray coating composition of the present invention (IV-2) ~ ( IV-5) was obtained.
実施例33’〔スプレー用コーティング組成物の調製〕
実施例1’において(c)成分を用いなかった以外は実施例1’と同様にして重合体溶液を得、得られた重合体溶液100部に、30℃以下の温度で、乳化剤であるアルキル硫酸エステル塩と10%アンモニア水を加え、よく混合してpH7.5に調節した。次いで、i−プロピルアルコール100部で希釈し、得られた溶液をイオン交換水200部中に2時間かけて除々に加えてエマルジョンとした。このエマルジョンに、アジピン酸ジヒドラジド4部を加え、次いでこのエマルジョンから減圧下、50℃以下の温度でi−プロピルアルコールおよび水を除去し、全固形分濃度を20%に調整した。
このエマルジョン100部に、pHが7に調整された酸化チタンゾル〔アナターゼ型酸化チタン20%(固形分)、水80%〕100部を滴下し、良く攪拌して、全固形分濃度20%の本発明のスプレー用コーティング組成物(IV−6)を得た。
Example 33 ' [Preparation of coating composition for spray]
A polymer solution was obtained in the same manner as in Example 1 ' except that the component (c) was not used in Example 1', and 100 parts of the obtained polymer solution was added at a temperature of 30 ° C or lower to an alkyl emulsifier. Sulfate and 10% aqueous ammonia were added, mixed well, and adjusted to pH 7.5. Then, the mixture was diluted with 100 parts of i-propyl alcohol, and the obtained solution was gradually added to 200 parts of ion-exchanged water over 2 hours to form an emulsion. To this emulsion, 4 parts of adipic dihydrazide were added, and then the i-propyl alcohol and water were removed from the emulsion under reduced pressure at a temperature of 50 ° C. or less, and the total solid content was adjusted to 20%.
To 100 parts of this emulsion, 100 parts of titanium oxide sol (anatase type titanium oxide 20% (solid content), water 80%) whose pH was adjusted to 7 was dropped, and the mixture was thoroughly stirred to obtain a book having a total solid content of 20%. A spray coating composition (IV-6) of the invention was obtained.
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US6653519B2 (en) | 1998-09-15 | 2003-11-25 | Nanoscale Materials, Inc. | Reactive nanoparticles as destructive adsorbents for biological and chemical contamination |
JP2001278624A (en) * | 2000-03-29 | 2001-10-10 | Kawaken Fine Chem Co Ltd | Titania sol composition and coating liquid composition containing same |
US20030215355A1 (en) * | 2002-05-14 | 2003-11-20 | Nanoscale Materials, Inc. | Method and apparatus for control of chemical or biological warfare agents |
US7959980B2 (en) * | 2004-05-28 | 2011-06-14 | Ppg Industries Ohio, Inc. | Hydrophilic compositions, methods for their production, and substrates coated with such compositions |
US10258046B2 (en) | 2014-11-04 | 2019-04-16 | Allied Bioscience, Inc. | Antimicrobial coatings comprising quaternary silanes |
US9856360B2 (en) * | 2014-11-04 | 2018-01-02 | Allied Bioscience, Inc. | Composition and method to form a self decontaminating surface |
US10980236B2 (en) | 2014-11-04 | 2021-04-20 | Allied Bioscience, Inc. | Broad spectrum antimicrobial coatings comprising combinations of organosilanes |
US10993441B2 (en) | 2014-11-04 | 2021-05-04 | Allied Bioscience, Inc. | Antimicrobial coatings comprising organosilane homopolymers |
JP5863936B1 (en) * | 2014-12-02 | 2016-02-17 | 日本発條株式会社 | Aerosol coating composition and metal machine part having the coating film |
KR102014006B1 (en) | 2015-02-11 | 2019-08-23 | 얼라이드 바이오사이언스, 인크. | Anti-microbial coating and method to form same |
DK3288860T3 (en) * | 2015-04-28 | 2019-07-29 | Paragon Nordic Ab | TWO-COMPONENT PAINTING SYSTEM |
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