JP2000345103A - Insulation varnish and multilayered printed circuit board using the same - Google Patents

Insulation varnish and multilayered printed circuit board using the same

Info

Publication number
JP2000345103A
JP2000345103A JP15506699A JP15506699A JP2000345103A JP 2000345103 A JP2000345103 A JP 2000345103A JP 15506699 A JP15506699 A JP 15506699A JP 15506699 A JP15506699 A JP 15506699A JP 2000345103 A JP2000345103 A JP 2000345103A
Authority
JP
Japan
Prior art keywords
resin
molecular weight
insulating
average molecular
whisker
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15506699A
Other languages
Japanese (ja)
Inventor
Yasushi Kamishiro
恭 神代
Kazuhito Kobayashi
和仁 小林
Atsushi Takahashi
敦之 高橋
Takashi Morita
高示 森田
Takahiro Tanabe
貴弘 田邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP15506699A priority Critical patent/JP2000345103A/en
Publication of JP2000345103A publication Critical patent/JP2000345103A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain the subject insulation varnish that has excellent insulation reliability and excellent handleability and is useful for multilayer printed circuit board, or the like, by using a polymer material with a specific number-average molecular weight. SOLUTION: This varnish consists of (A) a resin, (B) an electric insulation whisker and contains (C) a polymer material with a number-average molecular weight of >=10,000. It is preferable that the component C is a resin that is compatible to an epoxy resin or a phenoxy resin, a brominated phenoxy resin or a high molecular weight epoxy resin with a number-average molecular weight of >=30,000, particularly a super-high molecular weight epoxy resin with a number-average molecular weight of >=80,000, and the content of the component C is in the range of from 5 to 7 wt.% on the solid basis in the varnish resin and the component B is a ceramic whisker with an average diameter of 0.3-3.0 μm and with an average length of 3-50 μm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、絶縁ワニス及びこ
れを用いた多層プリント配線板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating varnish and a multilayer printed wiring board using the same.

【0002】[0002]

【従来の技術】プリント配線板は、通常、銅箔とプリプ
レグを積層、熱圧成形して得た銅張積層板に回路加工し
て得られる。また、多層プリント配線板は、これらのプ
リント配線板同士をプリプレグを介して熱圧成形するか
又は、これらのプリント配線板と銅箔とをプリプレグを
介して熱圧成形して一体化して得た内層回路入り多層銅
張積層板の表面に回路を形成して得られる。
2. Description of the Related Art A printed wiring board is usually obtained by laminating a copper foil and a prepreg, and performing circuit processing on a copper-clad laminate obtained by hot pressing. Further, a multilayer printed wiring board was obtained by hot-pressing these printed wiring boards via a prepreg, or by hot-pressing these printed wiring boards and copper foil through a prepreg and integrating them. It is obtained by forming a circuit on the surface of a multilayer copper clad laminate containing an inner layer circuit.

【0003】プリント配線板用のプリプレグには、従
来、ガラスクロスに樹脂を含浸、乾燥し、樹脂を半硬化
状態にしたガラスクロスプリプレグが、多層プリント配
線板には、該ガラスクロスプリプレグの他にガラスクロ
スを用いないプリプレグであるフィルム形成能を有する
樹脂を半硬化状態にした接着フィルム(特開平6−20
0216、特開平6−242465号公報参照)や該接
着フィルムを銅箔の片面に形成した銅箔付き接着フィル
ム(特開平6−196862号公報参照)が使用されて
いる。なお、ここでいうフィルム形成能とは、プリプレ
グの搬送、切断及び積層等の工程中において、樹脂の割
れや欠落等のトラブルを生じにくく、その後の熱圧成形
時に層間絶縁層が内層回路存在部等で異常に薄くなった
り、層間絶縁抵抗低下やショートというトラブルを生じ
にくい性能を意味する。
Conventionally, a prepreg for a printed wiring board includes a glass cloth prepreg obtained by impregnating a glass cloth with a resin and drying the resin to make the resin semi-cured. Adhesive film in which a resin having a film forming ability, which is a prepreg that does not use a glass cloth, is made into a semi-cured state (JP-A-6-20
0216, JP-A-6-242465) and an adhesive film with a copper foil formed on one side of a copper foil (see JP-A-6-196682). The film-forming ability referred to here means that troubles such as cracking or chipping of the resin hardly occur during the steps of transporting, cutting, and laminating the prepreg, and the interlayer insulating layer is formed in the portion where the inner layer circuit exists at the time of subsequent hot pressing. This means that the film hardly causes troubles such as abnormal thinning, a decrease in interlayer insulation resistance and a short circuit.

【0004】[0004]

【発明が解決しようとする課題】近年、電子機器の小型
軽量化、高性能化、低コスト化が進行し、プリント配線
板には高密度化、薄型化、高信頼性化、低コスト化が要
求されている。高密度化のためには、微細配線が必要で
あり、そのためには表面の平坦性が良好でかつ、寸法安
定性が良好でなくてはならない。
In recent years, electronic devices have been reduced in size, weight, performance, and cost, and printed wiring boards have been required to have higher density, thinner, higher reliability, and lower cost. Has been requested. For high density, fine wiring is required, and for that purpose, the surface must have good flatness and good dimensional stability.

【0005】さらに微細なスルーホールやインターステ
ィシャルバイアホール(IVH)が必要であり、ドリル
穴加工性、レーザ穴加工性が良好であることが要求され
ている。表面の平坦性を良好にするためには、多層化積
層成形時の樹脂の流動性を高くする必要があり、これに
はエポキシ樹脂等の熱硬化性樹脂の適用が望ましい。
[0005] Further, fine through holes and interstitial via holes (IVH) are required, and good drill hole workability and laser hole workability are required. In order to improve the flatness of the surface, it is necessary to increase the fluidity of the resin at the time of multilayer lamination molding, and it is desirable to use a thermosetting resin such as an epoxy resin.

【0006】ところが、エポキシ樹脂は、成形前の段階
では分子量が低いために高い流動性を示すが脆いため、
シート状の絶縁材料を形成する性質を有していない。そ
こで、従来はガラスクロス等の補強基材に絶縁樹脂を含
浸させたプリプレグを予め作製し、これを絶縁層に用い
てきた。
[0006] However, epoxy resins exhibit high fluidity due to their low molecular weight before molding, but are brittle.
It does not have the property of forming a sheet-like insulating material. Therefore, conventionally, a prepreg in which a reinforcing base material such as a glass cloth is impregnated with an insulating resin has been prepared in advance and used for the insulating layer.

【0007】しかし、従来のプリプレグに使用されてい
るガラスクロスは、その厚さが薄くなるに従いヤーン
(ガラス繊維束)同士の間の隙間が大きくなるため、厚
さが薄いクロスほどヤーンが曲がったり、本来直角に交
差すべき縦糸と横糸が直角でなく交差する、目曲がりと
呼ばれる現象が発生しやすく、この目曲がりが原因とな
り、熱圧成形後に異常な寸法変化やそりを生じやすくな
る。
However, in the glass cloth used in the conventional prepreg, the gap between the yarns (glass fiber bundles) becomes larger as the thickness becomes thinner. The warp and weft, which should intersect at right angles, do not intersect at right angles but intersect with each other. A phenomenon called "bent" is likely to occur, and this bend tends to cause abnormal dimensional change and warpage after hot pressing.

【0008】さらに、薄いガラスクロスほどヤーン間の
隙間が大きいためプリプレグの繊維の体積分率が低くな
り、層間絶縁層の剛性が低下するため、外層の回路を加
工した後の部品実装工程において、たわみが大きくなり
やすく、部品実装する上で障害となっている。現在、一
般に使用されているガラスクロスで最も薄いのは30μ
mのクロスであり、これを使用したプリプレグの厚さは
40μm程度になる。これ以上にプリプレグの厚さを薄
くするために、樹脂分を減らすと、内層回路の凹凸への
樹脂による穴埋め性が低下しボイドが発生する。また、
これ以上にガラスクロスを薄くするとクロス自体の強度
が低下するため、ガラスクロスに樹脂を含浸する工程で
ガラスクロスが破断しやすくなり、プリプレグの製造が
困難になる。さらに、樹脂分を減らしたりガラスクロス
を薄くしたガラスクロスを使用したプリプレグを用いて
作製した多層プリント配線板は、「小径ドリル加工時に
偏在するガラスクロスによって芯ぶれがしやすく、ドリ
ルを折りやすい。」、「ガラス繊維の存在のため、レー
ザによる穴あけ性が悪く、内層回路の凹凸が表面に現れ
やすく表面平坦性が悪い。」等の課題を有する。
Further, the thinner the glass cloth, the larger the gap between the yarns, the lower the volume fraction of the fiber of the prepreg, and the lower the rigidity of the interlayer insulating layer. Therefore, in the component mounting process after processing the outer layer circuit, The deflection tends to increase, which is an obstacle to component mounting. Currently, the thinnest glass cloth generally used is 30μ.
m, and the thickness of the prepreg using this is about 40 μm. If the resin content is reduced in order to further reduce the thickness of the prepreg, the ability to fill holes in the unevenness of the inner layer circuit with the resin is reduced and voids are generated. Also,
If the glass cloth is made thinner than this, the strength of the cloth itself decreases, so that the glass cloth is easily broken in the step of impregnating the resin with the glass cloth, and it becomes difficult to manufacture the prepreg. Furthermore, a multilayer printed wiring board manufactured by using a prepreg using a glass cloth with a reduced resin content or a thinner glass cloth "is easily misaligned due to unevenly distributed glass cloth at the time of small-diameter drilling, and the drill is easily folded. And "the presence of glass fibers makes laser drilling difficult, and irregularities in the inner layer circuit are likely to appear on the surface, resulting in poor surface flatness".

【0009】一方、ガラスクロスのないプリプレグであ
る接着フィルムや銅箔付き接着フィルムは、厚さをより
薄くでき、小径ドリル加工性、レーザ加工性及び表面平
坦性に優れる。しかしながら、これらのプリプレグで作
製した多層プリント配線板は、外層絶縁層にガラスクロ
ス基材がないため、剛性が極めて低い。この剛性の低さ
は、高温下において極めて顕著であり、部品実装工程に
おいてたわみが生じやすく、ワイヤーボンディング性も
極めて悪い。また、外層絶縁層にガラスクロス基材がな
く熱膨張率が大きいため実装部品との熱膨張の差が大き
く、実装部品との接続信頼性が低く、加熱冷却の熱膨張
収縮によるはんだ接続部にクラックや破断が起こり易い
等、多くの問題を抱える。したがって、現状のガラスク
ロスのないプリプレグである接着フィルムや銅箔付き接
着フィルムを使用しては、高まる多層プリント配線板の
高密度化、薄型化の要求に対応出来ない状況にある。
On the other hand, the adhesive film which is a prepreg without a glass cloth or the adhesive film with a copper foil can be made thinner, and is excellent in small-diameter drill workability, laser workability, and surface flatness. However, the multilayer printed wiring boards made with these prepregs have extremely low rigidity because the outer insulating layer does not have a glass cloth base material. This low rigidity is extremely remarkable at a high temperature, and is likely to bend in the component mounting process, and the wire bonding property is extremely poor. In addition, since there is no glass cloth substrate in the outer insulating layer and the coefficient of thermal expansion is large, the difference in thermal expansion with the mounted component is large, the connection reliability with the mounted component is low, and the solder joint due to the thermal expansion and contraction of heating and cooling It has many problems, such as cracks and breakage. Therefore, it is not possible to meet the increasing demand for higher density and thinner multilayer printed wiring boards by using an adhesive film which is a prepreg without a glass cloth or an adhesive film with a copper foil.

【0010】そこで、従来のプリプレグでは解決できな
い多層プリント配線板に対する高密度化、薄型化、高信
頼性化、低コスト化という課題を解決するための新規絶
縁材料として、ガラスクロス等の基材を含まず、形状保
持のための電気絶縁性ウィスカーを絶縁樹脂中に分散さ
せることにより得られるワニスを、キャリア基材に流延
して得られるシート状の絶縁材料が有効であることを見
出してきた。
Therefore, a base material such as glass cloth is used as a new insulating material for solving the problems of high density, thinness, high reliability, and low cost for a multilayer printed wiring board that cannot be solved by a conventional prepreg. It has been found that a sheet-like insulating material obtained by casting a varnish obtained by dispersing an electrically insulating whisker for shape retention in an insulating resin on a carrier base material is effective. .

【0011】しかし、電気絶縁性ウィスカー等の充填剤
を絶縁樹脂中に複合化したシート状の絶縁材料を使用す
る場合、製品のカット工程における破断片の発生や、可
とう性の不足により多層化工程等での取扱時に、接着フ
ィルムが割れる等の問題が起こりやすく、破断片によ
り、多層化のためのプレス時に外層銅箔面に打痕が発生
したり、接着フィルムが割れた部分で絶縁樹脂が異常に
薄くなる等の不具合が発生し、歩留りが低下する等の課
題があった。
However, when a sheet-like insulating material in which a filler such as an electrically insulating whisker or the like is compounded in an insulating resin is used, broken pieces are generated in a cutting process of the product, and a multilayer structure is formed due to a lack of flexibility. During handling in the process, etc., problems such as cracking of the adhesive film are likely to occur, and broken fragments cause dents on the outer layer copper foil surface during pressing for multilayering, and insulation resin at the part where the adhesive film is broken However, problems such as abnormal thinning occur, and the yield is reduced.

【0012】この可とう性を向上させるためには、エポ
キシ樹脂中にアクリルゴムやアクリロニトリルブタジエ
ンゴム等の各種ゴムを添加するのが通常であるが手法が
あるが、各種ゴムがエポキシ樹脂と相溶性が悪いため、
エポキシ樹脂とゴムが分離するため、ゴム添加エポキシ
樹脂を用いてプリント配線板を作製した場合、絶縁信頼
性、耐熱性、耐溶剤性が悪いという課題がある。
In order to improve the flexibility, it is usual to add various rubbers such as acrylic rubber and acrylonitrile butadiene rubber to the epoxy resin, but there is a method, but various rubbers are compatible with the epoxy resin. Is bad,
Since the epoxy resin and the rubber are separated, when a printed wiring board is manufactured using a rubber-added epoxy resin, there is a problem that insulation reliability, heat resistance, and solvent resistance are poor.

【0013】本発明は、絶縁信頼性及び取扱性に優れた
絶縁ワニスとその絶縁ワニスを用いた多層プリント配線
板を提供することを目的とするものである。
An object of the present invention is to provide an insulating varnish excellent in insulation reliability and handleability and a multilayer printed wiring board using the insulating varnish.

【0014】[0014]

【課題を解決するための手段】本発明の絶縁ワニスは、
熱硬化性樹脂と電気絶縁性ウィスカーからなる絶縁ワニ
スであって、さらに数平均分子量が10,000以上の
高分子材料を添加したことを特徴とする。
Means for Solving the Problems The insulating varnish of the present invention comprises:
An insulating varnish comprising a thermosetting resin and an electrically insulating whisker, wherein a polymer material having a number average molecular weight of 10,000 or more is added.

【0015】[0015]

【発明の実施の形態】(高分子材料)本発明に用いる高
分子材料としては、数平均分子量10,000以上の、
フェノキシ樹脂、難燃化されたブロム化フェノキシ樹
脂、数平均分子量が30,000〜80,000の高分
子量エポキシ樹脂、さらには、数平均分子量が80,0
00を超える超高分子量エポキシ樹脂等を用いることが
できる。本発明において、数平均分子量は、ゲルパーミ
エーションクロマトグラフィーにより、標準ポリスチレ
ンの検量線を用いて測定したものである。
BEST MODE FOR CARRYING OUT THE INVENTION (Polymer material) The polymer material used in the present invention has a number average molecular weight of 10,000 or more.
Phenoxy resin, flame retarded brominated phenoxy resin, high molecular weight epoxy resin having a number average molecular weight of 30,000 to 80,000, and further, a number average molecular weight of 80,0
An ultra-high molecular weight epoxy resin exceeding 00 can be used. In the present invention, the number average molecular weight is measured by gel permeation chromatography using a standard polystyrene calibration curve.

【0016】これらの高分子材料は、絶縁ワニスの樹脂
固形分のうち、5〜75wt%の範囲で用いるのが好ま
しく、10〜60wt%がより好ましく、10〜50w
t%が特性と成形性のバランスが良好であり特に好まし
い。5wt%未満であると、作製した接着フィルムの取
扱性向上に効果がなく、75wt%を超えると多層化の
ためのプレス積層時に、内層回路やスルーホールを充填
するための樹脂の流動性が不足する。
These polymer materials are preferably used in the range of 5 to 75% by weight, more preferably 10 to 60% by weight, and more preferably 10 to 50% by weight based on the resin solid content of the insulating varnish.
t% is particularly preferable because the balance between properties and moldability is good. If it is less than 5 wt%, there is no effect in improving the handleability of the produced adhesive film, and if it exceeds 75 wt%, the fluidity of the resin for filling the inner layer circuit and the through hole is insufficient at the time of press lamination for multilayering. I do.

【0017】(ウィスカー)本発明に用いるウィスカー
としては、電気絶縁性のセラミックウィスカーであり、
ウィスカーの種類としては、例えば、ほう酸アルミニウ
ム、ウォラストナイト、チタン酸カリウム、塩基性硫酸
マグネシウム、窒化けい素、α−アルミナの中から選ば
れた1以上のものを用いることができる。その中でも、
ほう酸アルミニウムウィスカーは、弾性率が高く、熱膨
張率も小さく、しかも比較的安価である。このほう酸ア
ルミニウムウィスカーを用いた本発明のプリプレグを使
用して作製したプリント配線板は、従来のガラスクロス
を用いたプリント配線板よりも、常温及び高温下におけ
る剛性が高く、ワイヤーボンディング性に優れ、電気信
号の伝達特性に優れ、熱膨張率が小さく、寸法安定性に
優れる。
(Whisker) The whisker used in the present invention is an electrically insulating ceramic whisker.
As the type of whisker, for example, one or more selected from aluminum borate, wollastonite, potassium titanate, basic magnesium sulfate, silicon nitride, and α-alumina can be used. Among them,
Aluminum borate whiskers have a high modulus of elasticity, a low coefficient of thermal expansion, and are relatively inexpensive. The printed wiring board manufactured using the prepreg of the present invention using this aluminum borate whisker has higher rigidity at ordinary temperature and high temperature than the conventional printed wiring board using glass cloth, and has excellent wire bonding properties. Excellent electrical signal transmission characteristics, low coefficient of thermal expansion, and excellent dimensional stability.

【0018】ウィスカーの平均直径は、0.3μm未満
であると樹脂ワニスへの混合が難しくなると共に塗工作
業性が低下し、3μmを超えると表面の平坦性に悪影響
が出ると共に、ウィスカーの微視的な均一分散性が損な
われる。したがって、ウィスカーの平均直径は0.3μ
m〜3μmが好ましい。さらに同様の理由と塗工性が良
い(平滑に塗りやすい)ことから、平均直径は0.5μ
m〜1μmの範囲がより好ましい。このような直径のウ
ィスカーを選択することにより、従来のガラスクロスを
基材としたプリプレグを使用するよりも、表面平坦性に
優れたプリント配線板を得ることができる。
If the average diameter of the whiskers is less than 0.3 μm, mixing with the resin varnish becomes difficult and the coating operability decreases. If the average diameter exceeds 3 μm, the flatness of the surface is adversely affected, and the whisker fineness is reduced. Visual uniform dispersibility is impaired. Therefore, the average diameter of the whiskers is 0.3μ
m to 3 μm are preferred. Further, for the same reason and good coatability (easy to coat smoothly), the average diameter is 0.5 μm.
The range of m to 1 μm is more preferred. By selecting a whisker having such a diameter, a printed wiring board having better surface flatness can be obtained than using a prepreg using a conventional glass cloth as a base material.

【0019】また、ウィスカーの平均長さは、平均直径
の10倍未満であると、繊維としての補強効果が僅かに
なると同時に、後述するウィスカーの樹脂層中での2次
元配向が困難になるため、配線板にしたときに十分な剛
性が得られない。また、ウィスカーが長すぎる場合は、
ワニス中への均一分散が難しくなり、塗工性が低下す
る。また、ある一つの導体回路と接触したウィスカーが
他の導体回路と接触する確率が高くなり、繊維に沿って
移動する傾向にある銅イオンのマイグレーションによる
回路間の短絡事故を起こす可能性があるという問題があ
る。したがって、ウィスカーの平均長さは、平均直径の
10倍以上で50μm以下の範囲であることが好まし
い。このような長さのウィスカーを使用した本発明の絶
縁材料を用いて作製したプリント配線板は、従来のガラ
スクロスを基材にしたプリプレグを使用したプリント配
線板よりも、耐マイグレーション性に優れる。
On the other hand, if the average length of the whiskers is less than 10 times the average diameter, the reinforcing effect of the fibers becomes small, and at the same time, the two-dimensional orientation of the whiskers described later in the resin layer becomes difficult. However, sufficient rigidity cannot be obtained when the wiring board is used. If the whiskers are too long,
Uniform dispersion in the varnish becomes difficult, and the coatability decreases. Also, the probability that a whisker in contact with one conductor circuit comes into contact with another conductor circuit increases, which may cause a short circuit between circuits due to migration of copper ions that tend to move along the fiber. There's a problem. Therefore, the average length of the whiskers is preferably in the range of 10 times or more and 50 μm or less of the average diameter. A printed wiring board manufactured using the insulating material of the present invention using the whiskers having such a length has better migration resistance than a conventional printed wiring board using a prepreg based on a glass cloth.

【0020】(処理液)本発明では、絶縁樹脂とウィス
カー表面との界面の密着性を向上するため、カップリン
グ剤を用いることができ、このようなカップリング剤と
しては、シラン系カップリング剤やチタネート系カップ
リング剤等があり、シラン系カップリング剤としては、
一般にエポキシシラン系、アミノシラン系、カチオニッ
クシラン系、ビニルシラン系、アクリルシラン系、メル
カプトシラン系及びこれらの複合系等がある。添加剤は
何種類を併用してもよく、その配合量も特に制限はな
い。
(Treatment Solution) In the present invention, a coupling agent can be used to improve the adhesion at the interface between the insulating resin and the whisker surface. As such a coupling agent, a silane coupling agent can be used. And titanate-based coupling agents, and as the silane-based coupling agent,
Generally, there are an epoxy silane type, an amino silane type, a cationic silane type, a vinyl silane type, an acryl silane type, a mercapto silane type and a composite type thereof. Any number of additives may be used in combination, and the amount of the additives is not particularly limited.

【0021】(樹脂)本発明で使用する樹脂は、従来の
ガラスクロスを基材としたプリプレグに使用されている
樹脂及びガラスクロス基材を含まない接着フィルム、あ
るいは銅箔付き接着フィルムに使用されている樹脂を使
用することが出来る。ここでいう樹脂とは、樹脂、硬化
剤、硬化促進剤、必要に応じて、カップリング剤や希釈
剤を含むものを意味する。
(Resin) The resin used in the present invention is used for a resin used for a conventional prepreg based on a glass cloth and an adhesive film containing no glass cloth substrate or an adhesive film with a copper foil. Resin can be used. The resin as used herein means a resin, a curing agent, a curing accelerator, and if necessary, a coupling agent or a diluent.

【0022】従来のガラスクロスを基材としたプリプレ
グに使用されている樹脂は、それ単独では、フィルム形
成能がないため、銅箔の片面に塗工により接着剤層とし
て形成し、加熱により溶剤除去し樹脂を半硬化した場
合、搬送、切断及び積層等の工程中において、樹脂の割
れや欠落等のトラブルを生じやすいか又は、その後の熱
圧成形時に層間絶縁層が内層回路存在部等で異常に薄く
なり、層間絶縁抵抗低下やショートというトラブルを生
じやすかったため、従来、銅箔付き接着フィルム用途に
使用することが困難であった。しかし、本発明では、樹
脂中にはウィスカーが分散され、該樹脂は充填剤により
補強されているため、本発明の樹脂とウィスカーからな
るプリプレグ層にはフィルム形成能が発現し、搬送、切
断及び積層等の工程中において、ウィスカーを含まない
場合と比べて、樹脂の割れや欠落等のトラブルを生じに
くく、またウィスカーが存在するため熱圧成形時の層間
絶縁層が、異常に薄くなる現象の発生も防止できる。ま
た、従来接着フィルムや銅箔付き接着フィルムに使用さ
れている樹脂を用いることも効果的である。これらの樹
脂は、高分子量成分等を含むことにより、樹脂単独でも
フィルム形成能があるが、本発明によりウィスカーをそ
の樹脂中に分散することにより、いっそうフィルム形成
能が高められ取扱性が向上し、さらに絶縁信頼性もより
高めることが可能となる。また、ウィスカーの分散によ
りフィルム形成能を高めた分だけ高分子量成分の添加量
を減らすことも可能であり、それによって樹脂の耐熱性
や接着性等を改善できる場合もある。
The resin used in conventional prepregs based on glass cloth has no film-forming ability by itself, so it is formed as an adhesive layer on one side of a copper foil by coating, and the solvent is heated. When the resin is removed and semi-cured, troubles such as cracking or missing of the resin are likely to occur during the process of transport, cutting, lamination, etc. Conventionally, it was difficult to use for an adhesive film with a copper foil because it was abnormally thin, and it was easy to cause troubles such as a decrease in interlayer insulation resistance and a short circuit. However, in the present invention, whiskers are dispersed in the resin, and the resin is reinforced by the filler, so that the prepreg layer composed of the resin of the present invention and the whiskers exhibits a film forming ability, and is transported, cut and cut. In the process of lamination etc., compared to the case where whiskers are not included, troubles such as cracking and chipping of resin are less likely to occur, and the presence of whiskers causes the interlayer insulating layer during hot pressing to become abnormally thin. Occurrence can also be prevented. It is also effective to use a resin conventionally used for an adhesive film or an adhesive film with a copper foil. These resins have a film forming ability even when used alone by containing a high molecular weight component and the like.However, by dispersing whiskers in the resin according to the present invention, the film forming ability is further enhanced and the handleability is improved. In addition, the insulation reliability can be further improved. In addition, it is also possible to reduce the amount of the high molecular weight component to be added by the amount corresponding to the enhancement of the film forming ability by dispersing the whiskers, thereby improving the heat resistance and adhesiveness of the resin in some cases.

【0023】樹脂の種類としては、例えばエポキシ樹
脂、ビスマレイミドトリアジン樹脂、ポリイミド樹脂、
フェノール樹脂、メラミン樹脂、けい素樹脂、不飽和ポ
リエステル樹脂、シアン酸エステル樹脂、イソシアネー
ト樹脂、ポリイミド樹脂またはこれらの種々の変性樹脂
類が好適である。この中で、プリント配線板特性上、特
にビスマレイミドトリアジン樹脂、エポキシ樹脂が好適
である。そのエポキシ樹脂としては、ビスフェノールA
型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビ
スフェノールS型エポキシ樹脂、フェノールノボラック
型エポキシ樹脂、クレゾールノボラック型エポキシ樹
脂、ビスフェノールAノボラック型エポキシ樹脂、サリ
チルアルデヒドノボラック型エポキシ樹脂、ビスフェノ
ールFノボラック型エポキシ樹脂、脂環式エポキシ樹
脂、グリシジルエステル型エポキシ樹脂、グリシジルア
ミン型エポキシ樹脂、ヒダントイン型エポキシ樹脂、イ
ソシアヌレート型エポキシ樹脂、脂肪族環状エポキシ樹
脂及びそれらのハロゲン化物、水素添加物、及び前記樹
脂の混合物が好適である。中でも、ビスフェノールAノ
ボラック型エポキシ樹脂またはサリチルアルデヒドノボ
ラック型エポキシ樹脂は、耐熱性に優れ好ましい。
Examples of the type of resin include epoxy resin, bismaleimide triazine resin, polyimide resin,
Phenol resins, melamine resins, silicon resins, unsaturated polyester resins, cyanate ester resins, isocyanate resins, polyimide resins and various modified resins thereof are preferred. Among them, bismaleimide triazine resin and epoxy resin are particularly preferable in terms of printed wiring board characteristics. As the epoxy resin, bisphenol A
Epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolak epoxy resin, cresol novolak epoxy resin, bisphenol A novolak epoxy resin, salicylaldehyde novolak epoxy resin, bisphenol F novolak epoxy resin, fat Cyclic epoxy resins, glycidyl ester type epoxy resins, glycidylamine type epoxy resins, hydantoin type epoxy resins, isocyanurate type epoxy resins, aliphatic cyclic epoxy resins and their halides, hydrogenated products, and mixtures of the above resins are preferred. It is. Among them, bisphenol A novolak type epoxy resin or salicylaldehyde novolak type epoxy resin is preferable because of its excellent heat resistance.

【0024】(硬化剤)このような樹脂の硬化剤として
は、従来使用しているものが使用でき、樹脂がエポキシ
樹脂の場合、例えばジシアンジアミド、ビスフェノール
A、ビスフェノールF、ポリビニルフェノール、フェノ
ールノボラック樹脂、ビスフェノールAノボラック樹脂
及びこれらのフェノール樹脂のハロゲン化物、水素化物
等を使用できる。中でも、ビスフェノールAノボラック
樹脂は耐熱性に優れ好ましい。この硬化剤の前記樹脂に
対する場合は、従来使用している割合でよく、樹脂10
0重量部に対して、2〜100重量部の範囲が好まし
く、さらには、ジシアンジアミドでは、2〜5重量部、
それ以外の硬化剤では、30〜80重量部の範囲が好ま
しい。硬化剤の量が、2重量部未満であると、硬化不足
を生じやすく、100重量部を超えると、未反応硬化剤
が可塑剤として作用し、いずれも特性を低下させる。
(Curing agent) As the curing agent for such a resin, those conventionally used can be used. When the resin is an epoxy resin, for example, dicyandiamide, bisphenol A, bisphenol F, polyvinyl phenol, phenol novolak resin, Bisphenol A novolak resins and halides and hydrides of these phenolic resins can be used. Among them, bisphenol A novolak resin is preferable because of its excellent heat resistance. In the case where the curing agent is used for the resin, the ratio conventionally used may be sufficient.
The amount is preferably in the range of 2 to 100 parts by weight with respect to 0 parts by weight, and further, in dicyandiamide, 2 to 5 parts by weight,
For other curing agents, the range is preferably 30 to 80 parts by weight. If the amount of the curing agent is less than 2 parts by weight, insufficient curing is likely to occur, and if it exceeds 100 parts by weight, the unreacted curing agent acts as a plasticizer, and all of the properties deteriorate.

【0025】(硬化促進剤)硬化促進剤としては、樹脂
がエポキシ樹脂の場合、イミダゾール化合物、有機リン
化合物、第3級アミン、第4級アンモニウム塩等を使用
する。この硬化促進剤の前記樹脂に対する割合は、従来
使用している割合でよく、樹脂100重量部に対して、
0.01〜20重量部の範囲が好ましく、0.1〜1.
0重量部の範囲がより好ましい。効果促進剤の量が、
0.01重量部未満であると、硬化不足を生じ易く、2
0重量部を超えると、作成したワニスのポットライフの
低下、コストの上昇を引き起こすため望ましくない。
(Curing Accelerator) When the resin is an epoxy resin, an imidazole compound, an organic phosphorus compound, a tertiary amine, a quaternary ammonium salt or the like is used as the curing accelerator. The ratio of the curing accelerator to the resin may be a conventionally used ratio, and is based on 100 parts by weight of the resin.
It is preferably in the range of 0.01 to 20 parts by weight, and 0.1 to 1.
A range of 0 parts by weight is more preferred. If the amount of effect promoter is
If the amount is less than 0.01 part by weight, insufficient curing is likely to occur, and 2
If the amount exceeds 0 parts by weight, the pot life of the produced varnish decreases and the cost increases, which is not desirable.

【0026】(希釈剤)本発明で用いる熱硬化性樹脂
は、溶剤にて希釈して樹脂ワニスとして使用することも
できる。溶剤には、アセトン、メチルエチルケトン、ト
ルエン、キシレン、メチルイソブチルケトン、酢酸エチ
ル、エチレングリコールモノメチルエーテル、メタノー
ル、エタノール、N,N−ジメチルホルムアミド、N,
N−ジメチルアセトアミド等を使用できる。この希釈剤
の前記樹脂に対する割合は、従来使用している割合でよ
く、樹脂100重量部に対して1〜200重量部の範囲
が好ましく、30〜100重量部の範囲がさらに好まし
い。希釈剤の量が1重量部未満であると、取扱性に劣
り、200重量部を超えると、作業性に劣るため望まし
くない。
(Diluent) The thermosetting resin used in the present invention can be diluted with a solvent and used as a resin varnish. Solvents include acetone, methyl ethyl ketone, toluene, xylene, methyl isobutyl ketone, ethyl acetate, ethylene glycol monomethyl ether, methanol, ethanol, N, N-dimethylformamide, N, N
N-dimethylacetamide and the like can be used. The ratio of the diluent to the resin may be a conventionally used ratio, and is preferably in the range of 1 to 200 parts by weight, more preferably 30 to 100 parts by weight, per 100 parts by weight of the resin. If the amount of the diluent is less than 1 part by weight, the handleability is poor, and if it exceeds 200 parts by weight, the workability is poor, which is not desirable.

【0027】(その他の配合剤)さらに本発明において
は、上記した各成分の他に、必要に応じて従来より公知
のカップリング剤、充填剤、イオン補足剤、高分子量樹
脂等を樹脂中に適宜配合してもよい。
(Other Compounding Agents) In the present invention, in addition to the above-mentioned components, if necessary, conventionally known coupling agents, fillers, ion scavengers, high molecular weight resins and the like may be added to the resin. You may mix suitably.

【0028】(樹脂とウィスカーの割合)樹脂への電気
絶縁性ウィスカーの配合量は、樹脂固形分100重量部
に対し5重量部未満であると、このプリプレグは切断時
に樹脂が細かく砕けて飛散しやすくなる等の取扱性が悪
くなると共に、配線板にしたときに十分な剛性が得られ
ない。一方、ウィスカーの配合量が350重量部以上で
あると、熱圧成形時の内層回路の穴埋め性や回路間への
樹脂充填性が損なわれ、熱圧成形後のウィスカー複合樹
脂層中に、ボイドやかすれが発生しやすくなり、配線板
特性を損なう恐れがある。したがって、ウィスカーの配
合量は、樹脂固形分100重量部に対し5〜350重量
部が好ましい。さらに、内層回路の穴埋め性や回路間へ
の樹脂充填性に優れ、なおかつ、製造した配線板が従来
のガラスクロス使用のプリプレグを用いて製造した配線
板と比較し、同等または同等以上の剛性と寸法安定性と
ワイヤーボンディング性を持つことが出来る理由から、
ウィスカーの配合量は、樹脂固形分100重量部に対し
30〜230重量部であることがより好ましい。
(Proportion of Resin and Whisker) When the amount of the electrically insulating whisker in the resin is less than 5 parts by weight based on 100 parts by weight of the resin solid content, the resin is finely crushed and scattered at the time of cutting the prepreg. In addition, the handleability is deteriorated, for example, and sufficient rigidity cannot be obtained when the wiring board is used. On the other hand, when the compounding amount of the whisker is 350 parts by weight or more, the filling property of the inner layer circuit and the resin filling property between the circuits during the hot pressing are impaired, and the whisker composite resin layer after the hot pressing is voided. Fainting is likely to occur, and the characteristics of the wiring board may be impaired. Therefore, the amount of the whisker is preferably 5 to 350 parts by weight based on 100 parts by weight of the resin solids. In addition, it has excellent fillability of the inner layer circuit and resin filling between the circuits, and the manufactured wiring board has the same or higher rigidity as compared to the wiring board manufactured using the prepreg using the conventional glass cloth. Because it can have dimensional stability and wire bonding properties,
The mixing amount of the whiskers is more preferably 30 to 230 parts by weight based on 100 parts by weight of the resin solids.

【0029】(混練方法)電気絶縁性ウィスカーの分散
性を向上させるために、絶縁ワニスを作製した後、らい
かい機、3本ロールミルまたはビーズミル等での混練を
組み合わせて行うことができる。混練後、減圧下での攪
拌脱泡等によりワニス中の気泡を除去することが望まし
い。
(Kneading Method) In order to improve the dispersibility of the electrically insulating whiskers, after preparing an insulating varnish, kneading can be performed in combination with a grinder, a three-roll mill or a bead mill. After kneading, it is desirable to remove bubbles in the varnish by stirring and defoaming under reduced pressure.

【0030】(キャリアフィルム)本発明において絶縁
層であるウィスカー複合樹脂層(Bステージ状態)をそ
の片面に形成する対象であるキャリアフィルムとして
は、銅箔、アルミ箔等の金属箔、ポリエステルフィル
ム、ポリイミドフィルム、あるいは前記金属箔及びフィ
ルムの表面を離型剤により処理したものを使用する。
(Carrier Film) In the present invention, the carrier film on which the whisker composite resin layer (B-stage state), which is an insulating layer, is formed on one surface thereof is a metal foil such as a copper foil or an aluminum foil, a polyester film, or the like. A polyimide film or a film obtained by treating the surfaces of the metal foil and the film with a release agent is used.

【0031】(プリプレグ層中のウィスカー配向)本発
明の電気絶縁性ウィスカーとBステージ状態の樹脂とか
ら構成される絶縁材料の中のウィスカーは、2次元配向
に近い状態(ウィスカーの軸方向が絶縁材料層の形成す
る面と平行に近い状態)にさせることが好ましい。この
ようなウィスカーを配向させることにより、本発明の絶
縁材料は良好な取扱性が得られると同時に、配線板にし
た時に高い剛性と良好な寸法安定性及び表面平坦性が得
られる。
(Whisker Orientation in Prepreg Layer) A whisker in an insulating material composed of the electrically insulating whisker of the present invention and a resin in a B-stage state is in a state close to two-dimensional orientation (whisker is in an axial direction). (A state close to parallel to the surface on which the material layer is formed). By orienting such whiskers, the insulating material of the present invention can obtain good handleability, and at the same time, can obtain high rigidity, good dimensional stability and surface flatness when formed into a wiring board.

【0032】(塗工方式)上記のようにウィスカーを配
向させるには、前述した好ましい範囲の繊維長のウィス
カーを使用すると同時に、銅箔にウィスカーを配合した
樹脂ワニスを塗工する際に、ブレードコータ、ロッドコ
ータ、ナイフコータ、スクイズコータ、リバースロール
コータ、トランスファーロールコータ等の銅箔と平行な
面方向にせん断力を負荷できるかあるいは、銅箔の面に
垂直な方向に圧縮力を負荷できる塗工方式を採用すれば
よい。
(Coating method) In order to orient the whiskers as described above, a whisker having a fiber length in the above-described preferred range is used, and at the same time, when a resin varnish in which whiskers are mixed with a copper foil is coated, a blade is used. Coating that can apply a shearing force in the direction parallel to the copper foil such as a coater, rod coater, knife coater, squeeze coater, reverse roll coater, transfer roll coater, etc., or can apply a compressive force in the direction perpendicular to the copper foil surface. The construction method may be adopted.

【0033】(作用)以上で述べた本発明によれば、電
気絶縁性ウィスカーを使用した絶縁ワニスにエポキシ樹
脂と相溶性の高分子材料を用いることにより、接着フィ
ルムの可とう性、取扱性を向上し、製造時の歩留りの向
上をはかることができる。また、本発明の絶縁材料を使
用して作製した絶縁層は、基材がガラスクロスよりレー
ザに対し被加工性が良好でしかも微細なウィスカーであ
るため、従来のガラスクロスプリプレグを使用した絶縁
層では、困難であったレーザ穴明けが容易にできる。そ
のため、直径100μm以下の小径のインタースティシ
ャルバイアホール(IVH)が容易に作製可能となり、
プリント配線板の回路を微細化でき、電子機器の高密度
化、高性能化に大きく貢献できる。
(Function) According to the present invention described above, the flexibility and handleability of the adhesive film can be improved by using a polymer material compatible with the epoxy resin for the insulating varnish using the electrically insulating whiskers. Thus, the yield at the time of manufacturing can be improved. In addition, the insulating layer manufactured using the insulating material of the present invention has a better workability with respect to the laser than the glass cloth and is a fine whisker. Therefore, the insulating layer using the conventional glass cloth prepreg is used. Then, laser drilling, which was difficult, can be easily performed. Therefore, a small-diameter interstitial via hole (IVH) having a diameter of 100 μm or less can be easily manufactured,
The circuit of the printed wiring board can be miniaturized, which can greatly contribute to higher density and higher performance of electronic devices.

【0034】[0034]

【実施例】実施例1 ビスフェノールAノボラック型エポキシ樹脂(エポキシ
当量210)100重量部にビスフェノールAノボラッ
ク樹脂40重量部、4臭素化ビスフェノールA40重量
部、イミダゾール系硬化促進剤0.4重量部からなる組
成物に、臭素化フェノキシ樹脂(数平均分子量12,0
00)20重量部(樹脂固形分のうち10wt%)、メ
チルエチルケトンを加え60wt%のワニスを調整し
た。得られたワニスに、平均直径0.8μm、平均繊維
長20μmのほう酸アルミニウムウィスカーを30wt
%になるように混合し、ビーズミルを用いて混練した
後、真空脱気した。得られたワニスを、厚さ18μmの
銅箔及び厚さ50μmのポリエチレンテレフタレート
(PET)フィルムにナイフコータにて塗工し、温度1
50℃で10min間加熱乾燥して、溶剤を除去すると
共に、樹脂を半硬化して、ウィスカー重量分率が30w
t%でウィスカーと半硬化状態にあるエポキシ樹脂から
なる絶縁層の厚さが80μmと100μmの銅箔付き絶
縁材料及びPETを剥離により除去して、半硬化状態の
エポキシ樹脂からなる厚さ80μmの絶縁材料を作製し
た。
EXAMPLE 1 100 parts by weight of bisphenol A novolak type epoxy resin (epoxy equivalent 210) was composed of 40 parts by weight of bisphenol A novolak resin, 40 parts by weight of 4-brominated bisphenol A, and 0.4 part by weight of an imidazole curing accelerator. A brominated phenoxy resin (number average molecular weight of 12,0
00) 20 parts by weight (10 wt% of the resin solid content) and methyl ethyl ketone were added to prepare a 60 wt% varnish. An aluminum borate whisker having an average diameter of 0.8 μm and an average fiber length of 20 μm was added to the obtained varnish in an amount of 30 wt.
%, Kneaded using a bead mill, and then vacuum degassed. The obtained varnish was applied to a copper foil having a thickness of 18 μm and a polyethylene terephthalate (PET) film having a thickness of 50 μm using a knife coater.
By heating and drying at 50 ° C. for 10 minutes to remove the solvent and semi-curing the resin, the whisker weight fraction is 30 w
The insulating layer made of a whisker and a semi-cured epoxy resin having a thickness of 80 μm and 100 μm is removed by removing the insulating material with a copper foil having a thickness of 100 μm and PET, and an 80 μm-thick epoxy resin made of a semi-cured state is removed. An insulating material was manufactured.

【0035】実施例2 臭素化フェノキシ樹脂を80重量部(樹脂固形分のうち
33wt%)に変更した他は、実施例1と同様にして絶
縁材料を作製した。
Example 2 An insulating material was produced in the same manner as in Example 1, except that the amount of the brominated phenoxy resin was changed to 80 parts by weight (33 wt% of the solid content of the resin).

【0036】実施例3 臭素化フェノキシ樹脂を300重量部(樹脂固形分のう
ち63wt%)に変更した他は、実施例1と同様にして
絶縁材料を作製した。
Example 3 An insulating material was produced in the same manner as in Example 1 except that the amount of the brominated phenoxy resin was changed to 300 parts by weight (63 wt% of the solid content of the resin).

【0037】実施例4 臭素化フェノキシ樹脂をフェノキシ樹脂(数平均分子量
30,000)60重量部(樹脂固形分のうち25wt
%)に変更した他は、実施例1と同様にして絶縁材料を
作製した。
Example 4 A brominated phenoxy resin was converted to 60 parts by weight of phenoxy resin (number average molecular weight 30,000) (25 wt% of resin solid content).
%), Except that the insulating material was manufactured in the same manner as in Example 1.

【0038】実施例5 臭素化フェノキシ樹脂を超高分子エポキシ樹脂(数平均
分子量300,000)60重量部(樹脂固形分のうち
25wt%)に変更した他は、実施例1と同様にして絶
縁材料を作製した。
Example 5 Insulation was carried out in the same manner as in Example 1, except that the brominated phenoxy resin was changed to 60 parts by weight (25 wt% of the resin solid content) of an ultrahigh molecular weight epoxy resin (number average molecular weight 300,000). Materials were made.

【0039】比較例1 臭素化フェノキシ樹脂を5重量部(樹脂固形分のうち3
wt%)に変更した他は、実施例1と同様にして絶縁材
料を作製した。
Comparative Example 1 5 parts by weight of brominated phenoxy resin (3% of resin solids)
wt%), except that an insulating material was produced in the same manner as in Example 1.

【0040】比較例2 臭素化フェノキシ樹脂を600重量部(樹脂固形分のう
ち77wt%)に変更した他は、実施例1と同様にして
絶縁材料を作製した。
Comparative Example 2 An insulating material was produced in the same manner as in Example 1, except that the amount of the brominated phenoxy resin was changed to 600 parts by weight (77% by weight of the solid content of the resin).

【0041】比較例3 臭素化フェノキシ樹脂をアクリルゴム(数平均分子量5
00,000)80重量部(樹脂固形分のうち33wt
%)に変更した他は、実施例1と同様にして絶縁材料を
作製した。
Comparative Example 3 Brominated phenoxy resin was replaced with acrylic rubber (number average molecular weight 5
(00,000) 80 parts by weight (33 wt% of resin solid content)
%), Except that the insulating material was manufactured in the same manner as in Example 1.

【0042】比較例4 臭素化フェノキシ樹脂を用いない他は、実施例1と同様
にして絶縁材料を作製した。
Comparative Example 4 An insulating material was produced in the same manner as in Example 1 except that the brominated phenoxy resin was not used.

【0043】作製した絶縁材料に関して、以下の項目に
ついて評価を行った。 (Bステージフィルム取扱性)取扱性はカッターナイフ
及びシャーにより、樹脂の飛散等なくきれいに切断で
き、絶縁材料同士のブロッキングが発生しなかったもの
を○、それ以外を×とした。
With respect to the produced insulating material, the following items were evaluated. (B-stage film handleability) The handleability was evaluated as "O" when the material could be cut cleanly by a cutter knife and a shear without scattering of resin, and no blocking occurred between insulating materials.

【0044】(硬化物特性)上記で作製した絶縁層の厚
さ80μmの銅箔付き絶縁材料を絶縁層が向かい合うよ
うに重ねて積層し、熱圧成形した。成形後銅箔部分をエ
ッチングにより取り除き、樹脂板を得た。この樹脂板に
ついて弾性率、熱膨張率を測定した。弾性率はTMAの
引張りモードにて、熱膨張率はTMAの引張りモードに
て測定した。
(Cured Product Properties) The insulating material with a copper foil having a thickness of 80 μm and prepared as described above was laminated and laminated so that the insulating layers faced each other, and was subjected to hot pressing. After the molding, the copper foil was removed by etching to obtain a resin plate. The elastic modulus and the coefficient of thermal expansion of this resin plate were measured. The modulus of elasticity was measured in a tensile mode of TMA, and the coefficient of thermal expansion was measured in a tensile mode of TMA.

【0045】(回路充填性試験)厚さ0.8mmのガラ
スエポキシ両面銅張積層板(銅箔厚18μm)にパター
ン(パターン幅(mm)/パターン間距離(mm)=
5.0/5.0、1.0/1.0、0.5/0.5、
0.2/0.2)及びスルーホール(穴径(mm)/穴
ピッチ(mm)=0.3/1.27、0.3/1.9)
の内層面の電極となるパターンをエッチングにより作製
した後、無電解銅メッキ(15μm)を行い、回路充填
性評価用内層板を作製した。この上下に上記で作製した
絶縁層の厚さ80μmの銅箔付き絶縁材料を絶縁材料が
回路充填性評価用内層板の電極となるパターンと接する
ように重ね合わせて積層し、熱圧成形した。その後、外
層銅箔をエッチングにより除去し、実体顕微鏡観察によ
り回路充填性を評価し、内層回路、絶縁材料間にボイド
が発生していないものを○、それ以外を×とした。その
後、スルーホール部分の断面観察を実体顕微鏡を用いて
行い、スルーホール内部にボイドの発生していないもの
を○、それ以外を×とした。
(Circuit filling test) A pattern (pattern width (mm) / inter-pattern distance (mm)) was formed on a 0.8 mm thick glass epoxy double-sided copper-clad laminate (copper foil thickness 18 μm).
5.0 / 5.0, 1.0 / 1.0, 0.5 / 0.5,
0.2 / 0.2) and through holes (hole diameter (mm) / hole pitch (mm) = 0.3 / 1.27, 0.3 / 1.9)
After forming a pattern to be an electrode on the inner layer surface by etching, electroless copper plating (15 μm) was performed to prepare an inner layer plate for evaluating circuit filling properties. The insulating material with the copper foil having the thickness of 80 μm of the insulating layer prepared above was laminated on the upper and lower sides such that the insulating material was in contact with the pattern to be the electrode of the inner layer plate for evaluating circuit filling properties, and the resultant was hot-pressed. Thereafter, the outer layer copper foil was removed by etching, and the circuit filling property was evaluated by observation with a stereoscopic microscope. After that, the cross section of the through hole was observed using a stereoscopic microscope. A sample in which no void was generated inside the through hole was evaluated as ○, and the others were evaluated as ×.

【0046】(表面粗さ)作製した厚さ100μmの絶
縁材料の上下に、厚さ18μmの片面粗化銅箔を該粗化
面が絶縁材料に向き合うように積層し、熱圧成形した。
この銅張積層板に回路加工を施し、その両面に先に作製
した厚さ80μmの本発明の絶縁材料を、そのさらに外
側に厚さ18μmの片面粗化銅箔を粗化面が絶縁材料に
向き合うように積層し、熱圧成形し内層回路入り多層銅
張積層板を作製した。この内層回路入り多層銅張積層板
の表面粗さを、触針式表面粗さ計にて測定した。測定箇
所は、その直下に内層回路のある部分とない部分とを含
む長さ25mmの一直線上の外層表面とした。内層回路
のある部分とない部分の段差の10点平均が3μm以下
であるものを○、それ以外を×とした。
(Surface Roughness) A single-sided roughened copper foil having a thickness of 18 μm was laminated on and under the prepared insulating material having a thickness of 100 μm so that the roughened surface faced the insulating material, followed by hot pressing.
This copper-clad laminate is subjected to circuit processing, and the insulating material of the present invention having a thickness of 80 μm previously prepared is provided on both surfaces thereof, and a single-side roughened copper foil having a thickness of 18 μm is further provided on the outer side thereof with the roughened surface as the insulating material. They were laminated so as to face each other, and were hot-pressed to produce a multilayer copper-clad laminate containing an inner circuit. The surface roughness of the multilayer copper-clad laminate containing the inner layer circuit was measured with a stylus type surface roughness meter. The measurement location was the outer layer surface on a straight line having a length of 25 mm including a portion with and without an inner layer circuit immediately below. When the 10-point average of the level difference between the portion having the inner layer circuit and the portion not having the inner layer circuit was 3 μm or less, it was evaluated as ○, and the others were evaluated as ×.

【0047】(耐電食性試験)厚さ0.8mmのガラス
エポキシ両面銅張積層板に電食試験の内層面の電極とな
るパターンをエッチングにより作製し、この上下に上記
で作製した絶縁層の厚さ80μmの銅箔付き絶縁材料を
絶縁材料が電食試験の内層面の電極となるパターンと接
するように重ね合わせて積層し、熱圧成形した。得られ
た積層板の、内層の電極となる電食試験パターンの位置
に合わせて、外層の電極となるパターンをエッチングで
作製し、電食試験片を得た。この内層と外層の電極間に
50Vの電圧を印加し、85℃、85%RHの雰囲気下
で1000時間経過後の絶縁抵抗値を測定した。100
0時間経過後の絶縁抵抗値を測定した結果、109Ω以
上の良好な値を示したものを○、それ以外を×とした。
以上の結果をまとめて表1に示す。
(Electro-corrosion resistance test) A pattern to be used as an electrode on the inner layer surface of the electro-corrosion test was formed on a 0.8 mm thick glass epoxy double-sided copper-clad laminate by etching, and the thickness of the insulating layer formed above and below was formed above and below this. An insulating material with a copper foil having a thickness of 80 μm was overlapped and laminated so that the insulating material was in contact with a pattern to be an electrode on the inner layer surface of the electrolytic corrosion test, and was hot-pressed. An outer layer electrode pattern was formed by etching in accordance with the position of the inner layer electrode corrosion test pattern of the obtained laminate, and an electrolytic corrosion test piece was obtained. A voltage of 50 V was applied between the inner layer electrode and the outer layer electrode, and the insulation resistance value was measured after a lapse of 1000 hours in an atmosphere of 85 ° C. and 85% RH. 100
As a result of measuring the insulation resistance value after the elapse of 0 hour, those showing a good value of 10 9 Ω or more were evaluated as ○, and the others were evaluated as ×.
Table 1 summarizes the above results.

【0048】[0048]

【表1】 [Table 1]

【0049】以上の結果から、次のことが分かる。実施
例1〜5は、比較例と比較して、積層板が有する特性を
下げることなく、取扱性、高耐電食性化を達成する。し
たがって、本発明の絶縁ワニスは、低分子量エポキシ樹
脂に電気絶縁性ウィスカーを配合した樹脂ワニスに高分
子材料を配合することにより、フィルム形状とした際の
絶縁材料の取扱性を向上し、製造時の歩留りを向上でき
る。また、この絶縁ワニスを用いた多層プリント配線板
を作製する際の歩留りの向上、さらに多層プリント配線
板の高絶縁信頼性を達成できる。本発明にしたがって製
造した絶縁ワニスを用いて得られた絶縁材料は、電気絶
縁性ウィスカーを用いた絶縁材料への高分子物質の添加
により、シート状絶縁材料を形成した際の取扱性を改善
できたもので、これを使用したプリント配線板は、回路
充填性が良好なため多層IVH等の形成が可能で、表面
が平坦で回路加工性が良く、剛性が高いため実装信頼性
が高く、熱膨張率が小さいため、寸法安定性が良くな
る。
The following can be understood from the above results. In Examples 1 to 5, the handleability and the high corrosion resistance are achieved without lowering the properties of the laminated plate as compared with the comparative examples. Therefore, the insulating varnish of the present invention improves the handleability of the insulating material in the form of a film by adding a polymer material to a resin varnish obtained by mixing an electrically insulating whisker with a low-molecular-weight epoxy resin. Yield can be improved. Further, it is possible to improve the yield when manufacturing a multilayer printed wiring board using this insulating varnish, and to achieve high insulation reliability of the multilayer printed wiring board. The insulating material obtained by using the insulating varnish manufactured according to the present invention can improve the handleability when a sheet-like insulating material is formed by adding a polymer substance to the insulating material using an electrically insulating whisker. A printed wiring board using this has good circuit filling properties, and can form a multilayer IVH, etc., and has a flat surface, good circuit workability, high rigidity, high mounting reliability, and high heat resistance. Since the coefficient of expansion is small, dimensional stability is improved.

【0050】[0050]

【発明の効果】以上に説明したとおり、本発明によっ
て、絶縁信頼性及び取扱性に優れた絶縁ワニスとその絶
縁ワニスを用いた多層プリント配線板を提供することが
できる。
As described above, according to the present invention, it is possible to provide an insulating varnish excellent in insulation reliability and handleability and a multilayer printed wiring board using the insulating varnish.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高橋 敦之 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館研究所内 (72)発明者 森田 高示 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館研究所内 (72)発明者 田邊 貴弘 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 Fターム(参考) 4D075 CA23 DA06 DB14 DC22 EA03 EA07 EB33 EB44 EB52 EB56 EC22 EC53 4J038 DB001 DF061 HA246 HA476 KA19 MA14 NA21 PB09 5E346 AA12 AA15 CC08 CC09 GG02 HH08 HH13 HH18  ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Atsuyuki Takahashi 1500 Odai Ogawa, Shimodate City, Ibaraki Pref.Hitachi Chemical Industry Co., Ltd. Inside the Shimodate Research Laboratory (72) Inventor Takahiro Tanabe 1500 Oji Ogawa, Shimodate City, Ibaraki Prefecture F-term in the Shimodate Plant of Hitachi Chemical Co., Ltd. KA19 MA14 NA21 PB09 5E346 AA12 AA15 CC08 CC09 GG02 HH08 HH13 HH18

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】樹脂と電気絶縁性ウィスカーからなる絶縁
ワニスであって、数平均分子量が10,000以上の高
分子材料を含むことを特徴とする絶縁ワニス。
1. An insulating varnish comprising a resin and an electrically insulating whisker, wherein the insulating varnish contains a polymer material having a number average molecular weight of 10,000 or more.
【請求項2】数平均分子量が10,000以上の高分子
材料が、エポキシ樹脂と相溶性の樹脂であることを特徴
とする請求項1に記載の絶縁ワニス。
2. The insulating varnish according to claim 1, wherein the polymer material having a number average molecular weight of 10,000 or more is a resin compatible with an epoxy resin.
【請求項3】数平均分子量が10,000以上の高分子
材料が、フェノキシ樹脂であることを特徴とする請求項
1または2に記載の絶縁ワニス。
3. The insulating varnish according to claim 1, wherein the polymer material having a number average molecular weight of 10,000 or more is a phenoxy resin.
【請求項4】数平均分子量が10,000以上の高分子
材料が、臭素化フェノキシ樹脂であることを特徴とする
請求項1〜3のうちいずれかに記載の絶縁ワニス。
4. The insulating varnish according to claim 1, wherein the polymer material having a number average molecular weight of 10,000 or more is a brominated phenoxy resin.
【請求項5】数平均分子量が10,000以上の高分子
材料が、数平均分子量30,000以上の高分子量エポ
キシ樹脂であることを特徴とする請求項1または2に記
載の絶縁ワニス。
5. The insulating varnish according to claim 1, wherein the polymer material having a number average molecular weight of 10,000 or more is a high molecular weight epoxy resin having a number average molecular weight of 30,000 or more.
【請求項6】数平均分子量が10,000以上の高分子
材料が、数平均分子量80,000以上の超高分子量エ
ポキシ樹脂であることを特徴とする請求項1、2、また
は5のうちいずれかに記載の絶縁ワニス。
6. A high molecular weight epoxy resin having a number average molecular weight of 10,000 or more is an ultrahigh molecular weight epoxy resin having a number average molecular weight of 80,000 or more. An insulating varnish according to any of the claims.
【請求項7】数平均分子量が10,000以上の高分子
材料が、絶縁ワニス中の樹脂固形分の5〜75wt%の
範囲であることを特徴とする請求項1〜6のうちいずれ
かに記載の絶縁ワニス。
7. The method according to claim 1, wherein the polymer material having a number average molecular weight of 10,000 or more is in the range of 5 to 75 wt% of the resin solid content in the insulating varnish. An insulating varnish as described.
【請求項8】電気絶縁性ウィスカーが、セラミックウィ
スカーであって、該ウィスカーの平均直径が0.3〜
3.0μmの範囲にあり、平均長さが3〜50μmであ
るものを用いたことを特徴とする請求項1〜7のうちい
ずれかに記載の絶縁ワニス。
8. The electrically insulating whisker is a ceramic whisker, wherein the whisker has an average diameter of 0.3 to 0.3.
The insulating varnish according to any one of claims 1 to 7, wherein the insulating varnish is in a range of 3.0 µm and has an average length of 3 to 50 µm.
【請求項9】請求項1〜8のうちいずれかに記載された
絶縁ワニスを、銅箔またはキャリアフィルムに塗布して
得た絶縁材料を、内層回路板と積層した後、外層面の回
路を形成し、内層回路と電気的に接続して作製したこと
を特徴とする多層プリント配線板。
9. An insulating material obtained by applying the insulating varnish according to any one of claims 1 to 8 to a copper foil or a carrier film, and laminating the insulating material on an inner circuit board. A multilayer printed wiring board formed and electrically connected to an inner layer circuit.
JP15506699A 1999-06-02 1999-06-02 Insulation varnish and multilayered printed circuit board using the same Pending JP2000345103A (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
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Family

ID=15597932

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7294660B2 (en) 2002-06-14 2007-11-13 Asahi Denka Co., Ltd. Epoxy resin composition

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09202832A (en) * 1996-01-26 1997-08-05 Hitachi Chem Co Ltd Prepreg for printing circuit board and its production
JPH10224033A (en) * 1997-02-05 1998-08-21 Hitachi Chem Co Ltd Method for manufacturing multilayer printed wiring board
JPH1117346A (en) * 1997-06-20 1999-01-22 Hitachi Chem Co Ltd Multilayer wiring board
JPH1171539A (en) * 1997-06-24 1999-03-16 Hitachi Chem Co Ltd Production of insulating vanish, insulating vanish obtained thereby and multilayer print circuit board by using the insulating vanish
JP3932635B2 (en) * 1997-12-04 2007-06-20 日立化成工業株式会社 Insulating varnish and multilayer printed wiring board using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09202832A (en) * 1996-01-26 1997-08-05 Hitachi Chem Co Ltd Prepreg for printing circuit board and its production
JPH10224033A (en) * 1997-02-05 1998-08-21 Hitachi Chem Co Ltd Method for manufacturing multilayer printed wiring board
JPH1117346A (en) * 1997-06-20 1999-01-22 Hitachi Chem Co Ltd Multilayer wiring board
JPH1171539A (en) * 1997-06-24 1999-03-16 Hitachi Chem Co Ltd Production of insulating vanish, insulating vanish obtained thereby and multilayer print circuit board by using the insulating vanish
JP3932635B2 (en) * 1997-12-04 2007-06-20 日立化成工業株式会社 Insulating varnish and multilayer printed wiring board using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7294660B2 (en) 2002-06-14 2007-11-13 Asahi Denka Co., Ltd. Epoxy resin composition
KR100980555B1 (en) * 2002-06-14 2010-09-06 가부시키가이샤 아데카 Epoxy resin composition

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