JP2000343011A - Roll film working device and working method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a resist coating device and the coating method capable of performing efficient production by detecting the joint part of a roll film and preventing the contact of the joint part with a coating roller to save futile manual works. SOLUTION: This resist coating device is constituted so as to apply a resist on the roll film by a roll coater and to dry the resist coated roll film. In such a case, a sensor for detecting and discriminating a film for detecting the opening/closing of the roll coater and provided at the front and/or rear side of the joint part, where a film substrate formed by cutting the roll films are connected to each other with a film for connecting, and a means for opening and closing the roll coater on the basis of the detected and discriminated result by the sensor are provided.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a roll film substrate, for example, a film substrate for a liquid crystal display device, and a roll film, which is continuously fed, a chemical solution is applied by a coating roller, and a roll is formed after forming an electrode pattern. The present invention relates to a roll film processing apparatus and a processing method.

[0002]

2. Description of the Related Art FIG. 3 shows a conventional resist coating apparatus. The roll-shaped film substrate is sent out from the unwinding section while being pulled by the winding section, and after being washed with water, is applied by the coating roller in the application section. After drying, it is wound up. In such an apparatus, if the roll film is too long, it takes a long time to flow to the next step, so that a substrate of a fixed length is repeatedly flown while being connected and disconnected so that the film can be flown while being separated at a certain length. The roll film and the roll film are stuck together on a connecting stand with a connecting tape, and are sequentially cut off when reaching the winding portion.

During the connection operation at the unwinding section, the winding section is pulling the substrate, but during this time, the axis of the unwinding section is stopped, and the substrate is stopped on the connection table. Instead, the film is fed to the right by the dancer roller on the right of the connection stand gradually rising upward. Similarly, when the winding unit is also performing the separating operation at the winding unit, the axis of the winding unit is stopped, but the substrate is fixed upstream of the winding side base and the separating operation is performed. During this time, the substrate is sent from the unwinding side, but is sagged at the dancer portion, and after separation, fixed to a core (not shown) set on a winding shaft.

Conventionally, in such a flow, when the connecting tape reaches the position of the coating roller, the coating roller is raised above the roll film substrate surface to prevent the connecting tape from contacting the coating roller. Otherwise, the resist soaked in the bonding portion (returned portion) of the connection tape due to the contact cannot be dried in the drying unit and is wound up, so that it exudes again and stains the application surface. In addition, the adhesive of the connection tape is melted by the solvent of the resist and transferred to the coating roller to stain the coating roller. It is very troublesome to manually turn on and raise and lower the switch when the connection portion reaches the coating roller. Besides the trouble of measuring the timing at which the roll connection portion comes, there is a problem that the worker cannot leave the vicinity of the coating roller.

[0005] 2. Conventional technology related to resist film formation As a method of forming a resist film by a roll-to-roll method,
A dry film is applied, or a resist coating method using a roll coater, a bar coater, or the like is used. Among them, roll coaters are more suitable for application to large-area substrates than spinners, use less resist, have shorter tact time, and have higher productivity, so glass substrate LCDs
Are widely used not only in resist coating for electrode formation, but also in coating fields such as color filters.

In a roll coater, a method is generally used in which a resist solution is adhered to a rubber-like coating roller having a groove, and the coating roller is pressed against a substrate to transfer the resist solution from the roller surface onto the substrate. On the other hand, there is a non-contact system in which a metal coating roller is used to transfer the resist solution on the roller to the substrate without bringing the roller into contact with the substrate (for example, JP-A-10-062770). The above method has the advantages that the coating surface can be smoothed, the film thickness can be made uniform, and the coating roller such as a rubber roller does not deteriorate. Further, since the roller does not come into contact with the substrate, foreign matter and protrusion defects on the substrate do not damage the coating roller, and the foreign matter does not transfer to the coating roller and cause continuous coating defects.

In particular, a plastic film substrate has more surface projection defects than a glass substrate, and when there is a foreign substance on the substrate, the foreign substance may be transferred to a coating roller and cause a coating defect thereafter. Further, the electrode is easily scratched as compared with the glass substrate, and the electrode is easily broken. Therefore, the coating is performed with a distance (clearance) between the substrate and the coating roller using a metal non-contact type coating roller as shown in FIG.

The larger the clearance, the less defects due to foreign matter and the like, but if the clearance is too large, the resist will not wet. Once you start painting, it gets wet due to surface tension,
In particular, at the beginning of coating, the distance needs to be reduced to about 5 μm (depending on the resist viscosity and the surface properties of the coating roller), and the advantage of the non-contact method is lost. In addition, when substrates having different thicknesses are used, it is necessary to adjust the clearance amount.

3. 2. Related Art Related to Resist Coating and Drying FIG. 14 shows an example of a configuration of a resist coating and drying apparatus provided with a leveling zone conventionally used. The drying device includes a roll coater for applying a photoresist on the surface of a film substrate, and a leveling zone for performing leveling of resist (uniform film thickness) and pre-drying of the film substrate applied by the roll coater. And then dried with hot air.

In the apparatus shown in FIG. 16 without the leveling zone, the resist immediately after the application of the resist enters the hot air drying section in a state where the resist easily flows, and the substrate partially contacts the high-temperature transfer roller. At the contact portion, the resist is rapidly dried by the heat of the transport rollers, and the film thickness is increased. FIG.
As shown in FIG. 7, a portion having a thickness of about 1 mm in width and several mm in length occurs. Except for the contact site, the thickness was 2-3 μm, but the contact site had a resist film thickness of 4 μm or more. The resist remains in the contact area even after exposure and development in a later step, and a problem occurs in which a pattern remains after etching and peeling. For this reason, a leveling zone is provided, but providing this zone directly increases the length of the equipment and wastes space.

4. 2. Related Art Related to Electrode Pattern Forming Section The electrode pattern formation of a film substrate such as TAB is generally performed by a roll-to-roll method from the viewpoint of productivity. As a pattern forming method, a photolithography method is often used, and in a resist film forming and exposing step, a pattern short circuit, disconnection, or chipping defect due to dust or foreign matter is a serious problem. For this reason, the substrate is cleaned by a wet cleaning method such as cleaning liquid or ultrasonic shower cleaning, or a dry cleaning method using an ultrasonic cleaner or an adhesive rubber roller.

In the conventional pattern formation of a roll-shaped film substrate, the electrode spacing was 50 μm or more.
For D, a thickness of 10 to 30 μm is required, and removal of foreign matter is also more strictly required. Before the resist coating, cleaning with a cleaning liquid is performed. However, foreign substances such as substrate residues at the time of slitting and debris of the organic coating layer are likely to be generated and adhered to the edge of the substrate during subsequent transport. The dust at the end of the substrate becomes a source of contamination in the apparatus and the exposure photomask due to contact with the apparatus. In the dry method, the contact type using an adhesive rubber roller has the best ability to remove foreign matter, but when it comes into contact with the electrode surface or the resist surface, there is a problem of scratches and foreign matter reattachment. In particular, breakage due to scratches is likely to occur).

[0013]

[Problems to be Solved by the Invention] The present invention solves the above-mentioned problem of the prior art, detects a connection portion of a roll film, prevents the connection portion from contacting a coating roller, and reduces waste of manual work and enables efficient production of a resist coating apparatus. And an application method.

2. SUMMARY OF THE INVENTION It is an object of the present invention to solve the above two problems of the prior art and to provide a resist coating apparatus and a coating method for stabilizing the start of resist coating in a non-contact roll coater type resist coating apparatus.

3. An object of the present invention is to solve the above-mentioned problems of the prior arts and to provide a resist coating apparatus that uniformly dries the resist without providing a leveling zone after the resist coating and does not cause a partial pattern residue. .

4. The present invention provides a resist coating / removing method which removes foreign matter at the end of a roll substrate, which solves the above-mentioned problems of the prior art.
An object of the present invention is to provide an electrode pattern forming apparatus.

[0017]

According to a first aspect of the present invention, in order to solve the first problem of the prior art, a resist is applied to a roll film by a roll coater, and then the resist coated roll film is dried. In the resist coating device, a resist coating device is provided before and / or after a connection portion of a film substrate formed by connecting connection ends of film substrates formed by cutting a roll film with a connection film. Another object of the present invention is to provide a resist coating apparatus having a sensor for detecting and identifying a roll coater open / close detection film and a means for opening and closing the roll coater based on the detection and identification results of the sensor.

In the resist coating apparatus, light is projected onto the roll coater opening / closing detection film, the transmittance and / or reflectance of the roll coater opening / closing detection film is detected by a sensor, and based on the detection result, And means for controlling the opening and closing of the coating roller during the transport time from the sensor to the coating roller.

According to a second aspect of the present invention, in order to solve the second problem of the prior art, a resist is applied to a roll film,
A resist coating apparatus for drying the resist coating roll film, wherein the resist coating mechanism is a non-contact roll coater type and has a mechanism for reducing the distance between the roll film and the coating roller at the start of resist coating. A resist coating apparatus characterized by the following. As a means for reducing the distance between the roll film and the coating roller, a roll film having a concavo-convex portion for reducing the distance between the roll film and the coating roller may be used at the beginning of the application of the roll film.

A third aspect of the present invention is to apply a resist to a roll film to solve the third problem of the prior art.
Thereafter, a resist coating apparatus in which the film is transported by a transport roller and the roll film is dried by hot air, wherein a heat-resistant sheet is disposed on the transport roller near the entrance of the hot-air drying unit is provided. It is in. The heat-resistant sheet is, for example, fixed to the entrance of the hot air drying unit, disposed between several transport rollers and the film substrate,
The downstream end of the heat-resistant sheet is located between the rollers, and is arranged without being fixed.

As another embodiment for solving the third problem of the prior art, as a resist coating method, a resist is applied to a roll film, the film is transported by a transport roller, and the roll film is dried by hot air. In the device,
The resist coating device, wherein the transport roller at the inlet of the hot air drying unit is disposed at a position higher than the position of the preceding roller or the subsequent transport roller, so that the contact area of the reverse surface of the film against the transport roller is large. Is to provide.
In the resist coating apparatus, it is preferable that the transport rollers near the entrance of the hot-air drying unit have a surface coated with a heat-resistant resin. Examples of the heat-resistant resin include a fluorine resin, particularly, a polytetrafluoroethylene resin.

According to a fourth aspect of the present invention, a resist is applied to a roll film to solve the fourth problem of the prior art.
Thereafter, in the resist coating / electrode pattern forming apparatus for drying the resist coated roll film and forming an electrode pattern, a mechanism is provided for removing foreign matter at an end of the roll film before forming an electrode pattern on the roll film. Another object of the present invention is to provide a resist coating / electrode pattern forming apparatus. An example of a mechanism for removing foreign matter at the end of the roll film includes an adhesive roller that contacts only the end of the roll film. Further, it is preferable that the adhesive roller is provided with a cleaning roller for the adhesive roller which is in contact with the adhesive roller and has a higher adhesive strength. Hereinafter, the present invention will be specifically described based on examples of the present invention.

[0023]

Embodiment 1 An embodiment illustrating a technique of using a connecting film for a connecting portion of a film substrate according to the present invention is shown in Embodiment 1.

Embodiment 1 1 relating to a connection portion of a roll-shaped film processing apparatus of the present invention.
An embodiment is shown in FIG. FIG. 2 shows a connection portion of the connection film substrate in which the film substrates are connected, and a tape for detecting a connection portion is attached to the film substrate in addition to the connection tape. In FIG. 1, an optical sensor is disposed in front of the coating roller, and the transmittance of this portion is constantly measured. As shown in FIG. 2, a detection tape (closed tape, open tape) having a transmittance lower than the transmittance of the film substrate and lower than the transmittance of a portion to which the film substrate is connected is provided.

When the open tape passes through the sensor, the coating roller is separated from the substrate at a time immediately before the connection portion passes through the coating roller because the transmittance is low. The coating roller can be moved a fixed distance by an air cylinder (not shown). When the closing tape is detected, the coating is restarted by closing the coating roller after a certain period of time from when the sensor passes through the coating roller. The position of the sensor may be any position as long as it is in front of the coating roller, but is preferably a position where the tape can be manually attached at a position separated from the coating roller portion. As described above, the operator attaches the opening / closing tape, but if it is forgotten, it is located at a position away from the coating roller, so that the attaching operation is easy. In addition, the coating section and the manual operation can be separated, and the cleanness of the coating section can be increased.

The optical sensor may be either a reflection type or a transmission type, but the reflection type is difficult to adjust because the reflected light intensity changes when the substrate is slightly twisted. The transmissive optical sensor is more preferable because the transmissive optical sensor can detect the open / close tape stably with little erroneous detection of the undulation of the substrate. The sensor sets the threshold between the density of the opening and closing tape and the density at the position of the connecting tape attached to the film.

As the connection tape, a polyimide tape having heat resistance (suitable for passing through the drying section) and having a relatively high transmittance is suitable as the connection tape. Since it has both heat resistance and transmittance, it is possible to increase the density difference with the opening and closing tape, and it is easy to adjust the sensor. A green colored polyester tape was used as the detection tape.

FIG. 5 shows various forms of attaching an opening / closing tape. These forms are created by changing the timing from the position of each opening / closing tape to the position where the coating roller is actually opened / closed. When processing the film continuously, any form is acceptable,
It is desirable that the open tape be at least before the connecting portion and the closed tape be at the head of the substrate to be processed.

Hereinafter, a method of attaching the opening / closing tape will be described. In such a processing apparatus, it is necessary to place a lead film not to be processed in the apparatus at the end of the operation of the apparatus. Otherwise, at the start of processing, it takes time to pass the film from the unwinding section to the entire winding section. When processing is completed, the lead film is connected to the end of the processed film, and after processing of the processed film is completed, the lead film is separated from the lead film. When the lead film has spread from the unwinding section to the winding section, the apparatus is stopped.

When the production is resumed, a processing film is connected behind the lead film and the production is resumed. In this case, if the subsequent substrate is a lead film, an open tape will be attached to the lead film. In this case, if the leading film is a lead film, a closing tape is also attached to the lead film. However, open tape is necessary because there is a connection part. If you have both the bad and the bad. The use of reversible lead film with unnecessary opening and closing tape affects the application of the film before and after,
It is also possible that the tape peels off over time. For this reason, it is better not to attach tape to the lead film as much as possible. Therefore, the form is most suitable. By the way, it is better to change the open tape to the closed tape and the closed tape to the open tape if the open / close sensor is replaced.

Examples describing the resist film forming technique of the present invention are shown in Examples 2 to 5 below.

Embodiment 2 As shown in FIG. 6, a resist solution is transferred from a resist solution dish to a doctor roller and further transferred to a coating roller. The distance (clearance) between the coating roller and the backup roller is set so that the substrate does not contact the coating roller. The resist solution on the coating roller is applied to a film substrate running on a backup roller by surface tension. As the resist solution, a solution comprising cresol novolak resin and a diazonaphthoquinone-based photosensitive agent and using propylene glycol monomethyl ether acetate as a solvent was used after adjusting the viscosity to 10 cP. Indium tin oxide (IT)
O) Polycarbonate film with film (thickness 100μ)
m) was used. Before coating, UV / O ₃ cleaning was performed to increase the wettability of the substrate (and to increase the adhesion of the resist), and the water contact angle was set to 10 ° or less. The coating roller was made of iron or stainless steel having a smooth surface, with a large number of grooves formed in the circumferential direction, and further subjected to hard (chrome) plating. The traveling speed of the film substrate is 1m
/ Min. Examination of the dependence of the resist film thickness on the clearance and the resist viscosity revealed that the resist film thickness was less dependent on the clearance, and the substrate surface properties, the coating roller surface properties, and the resist viscosity could be determined. A film thickness of about 3 μm was obtained at a resist viscosity of 10 cP.

At the beginning of application, application starts when the coating roller (the doctor roller moves together) approaches the backup roller side. 100 ~ 4 clearance
When coating was performed while changing the thickness to 00 μm (substrate thickness plus 0 to 300 μm), 110 μm (substrate thickness plus 10 μm)
When the thickness was more than μm), the resist could not be applied.
Furthermore, when the thickness was 140 μm or more (substrate thickness + 40 μm) or more, the coating could not be performed. However, in the case where there is a projection-like defect on the substrate, once the coating is started, the coating was successfully performed in the above-mentioned clearance range due to the surface tension.

With a clearance of 160 μm (substrate thickness plus 60 μm), as shown in FIG. 7, a Kapton tape (thickness 55 μm, width 15
(mm, length: substrate width -20 mm), and application was started stably. Further, in the conventional method, since the coating cannot be applied uniformly in the width direction at the beginning of coating, an area that cannot be used for 1 m or more is formed. In this example, the resist was applied almost uniformly at about 100 mm from the start of coating, so that the use efficiency of the substrate could be improved.

Example 3 As shown in FIG. 8, when a convex surface (approximately 0.5 mm height) was applied to the head of the film substrate using a heating bar and then the film substrate was peeled off, the film was similarly stably applied. became.

Embodiment 4 FIG. 9 shows a side view of the apparatus of this embodiment. Immediately before the coating roller, a roller for pushing the substrate toward the coating roller was provided. The substrate push-up roller pushed up the back surface of the substrate only immediately after the start of coating, and was immediately separated from the substrate. As a result, similarly, the clearance was set to 110 to 300 μm.
Even when the value was changed to m, coating could be started in a stable manner.

Embodiment 5 FIG. 10 shows a side view of the apparatus of this embodiment. In a conventional apparatus, the coating roller is configured to be stopped by a stopper at a set clearance (for example, 160 μm) by leaning on the backup roller side when the head of the substrate comes. The coating roller is moved by the air cylinder 1. At this time, the doctor roller also moves integrally with the coating roller. On the other hand, in the apparatus shown in FIG. 10, the stopper is initially set to have a clearance of 100 μm (same as the substrate thickness), and the coating roller first contacts the substrate. Thereafter, the stopper is immediately pushed back by the cylinder 2 and the set clearance (for example, 160
μm). This provided a stable start of coating. Further, in all of Examples 2 to 5, the film substrates having different thicknesses of 100 to 150 μm were able to be peeled off with the clearance kept constant at 160 μm.

Examples illustrating the resist coating and drying technique of the present invention are shown in Examples 6 to 8 below.

Embodiment 6 In FIG. 11, the drying apparatus is set at 110 ° C. A polytetrafluoroethylene resin sheet (thickness: 0.5 mm) was set on a transport roller (made of SUS) at the entrance. Thus, the film substrate does not directly contact the transport roller.
Although the polytetrafluoroethylene resin sheet itself is in the hot-air drying section as in the case of the transport rollers, it becomes hot, but since the thermal conductivity is lower than that of the SUS transport rollers, heat is instantaneously transmitted to the film, but the thickness of the resist Do not increase the temperature of the contact site. The heat-resistant sheet is fixed on the polytetrafluoroethylene resin sheet at the dryer entrance as shown in FIG. 12, and the conveying roller is rotated by setting the downstream direction to a free end. be able to.

Embodiment 7 In FIG. 13, the transport rollers near the entrance are positioned higher than the positions of the rollers at all stages and the transport rollers at the succeeding stage, and the structure is adopted in which the back surface of the film contacts the entire region of the transport rollers. If the film surface uniformly contacts the roll, the resist thickness will not be uneven.

Embodiment 8 FIG. 14 is an embodiment illustrating a resist coating / drying technique using a Teflon-coated carrier shown in FIG. 15 as a transport roller near the entrance. Since the rollers have low thermal conductivity, the film thickness unevenness becomes small, and the resist film becomes more uniform.

An embodiment illustrating the formation of an electrode pattern according to the present invention is shown in Embodiment 9 below.

Embodiment 9 In FIG. 18, after the film substrate and foreign matter are neutralized by a static elimination bar, an adhesive rubber roller (HC cleaner made by Audio-Technica) is brought into contact with both surfaces of the substrate to remove the foreign matter.
On the front side of the substrate (electrode surface or resist surface), the edge of the substrate is 3 to 10 mm so that the roller does not contact the electrode formation region.
The roller is brought into contact only with the position. Here, in applying the resist, 10 mm at both ends are left as regions where no resist is applied so that the resist does not adhere to the substrate end or the back surface of the substrate. In addition, a cleaning roller is provided to remove foreign matter from the adhesive rubber roller so that foreign matter attached to the adhesive rubber roller does not adhere to the substrate again. After the contact with the roller, it is easy to be charged, so the electricity removing bar is provided again. This mechanism was arranged at each position before resist application, after resist drying, and before exposure. As a result, defects of inter-pattern leaks were reduced, and periodic cleaning work in the apparatus was reduced, thereby improving productivity.

Hereinafter, embodiments of the present invention will be described. 1. In a resist coating apparatus for applying a resist to a roll film by a roll coater and then drying the resist coating roll film, a resist coating apparatus includes:
Detecting and identifying a roll coater opening / closing detection film provided before and / or after a connection portion of a film substrate formed by connecting ends of film substrates produced by cutting a roll film with a connection film. A resist coating apparatus having means for opening and closing a roll coater based on detection and identification results of a sensor and a front sensor. 2. The light is projected onto the roll coater open / close detection film, the transmittance or the reflectance of the roll coater open / close detection film is detected by a sensor, and based on the detection result, the transfer time of the coating roller during the transport time from the sensor to the coating roller is detected. The resist coating apparatus according to the first aspect, further comprising means for controlling opening and closing. 3. The film processing apparatus according to any one of the above 1 to 2, wherein a transmission type sensor is used as the sensor, and the open tape and / or the closed tape detect that the transmittance is lower than that of the roll-shaped film substrate connection tape.

4. A resist is applied to a roll film by a roll coater, and then, in a resist coating method of drying the resist coating roll film, the connection ends of the film substrates produced by cutting the roll film are connected by a connection film. A film substrate provided with a roll coater opening / closing detection film before and / or behind a connection portion of the formed film substrate;
A resist coating method, comprising using the resist coating apparatus according to the above. 5. 4. The resist coating method according to the above 4, wherein the roll coater is opened and closed based on the identification result of the detection film. 6. The resist coating method according to the above 4 to 5, wherein a polyimide film is used as the connection tape. 7. The resist coating method according to any one of the above 4 to 6, wherein the opening / closing tapes are located at different ends of the substrate, and an opening tape is applied before the connecting portion, and a closing tape is applied at an initial position to be processed.

8. Apply resist on roll film,
Thereafter, in the resist coating apparatus for drying the resist coating roll film, the resist coating mechanism is a non-contact roll coater type, and has a mechanism for reducing the distance between the roll film and the coating roller at the beginning of resist coating. A resist coating apparatus characterized by the above-mentioned. 9. 8. The resist coating apparatus according to the above 8, further comprising a mechanism for bringing the roll film closer to the coating roller or the coating roller closer to the roll film at the start of resist application. 10. A roll film for resist coating, comprising a concavo-convex portion at the start of application of the roll film to reduce the distance between the roll film and the coating roller. 11. 10. The roll film for resist coating according to the above item 10, wherein the uneven portion is formed by attaching an adhesive tape to the back surface (or the front surface) of the substrate. 12. The roll film for resist application according to the above 10, wherein the uneven portion is formed by partially deforming the substrate and attaching an adhesive tape to the back surface (or the front surface).

13. In a resist coating method of applying a resist to a roll film and then drying the resist coating roll film, a non-contact type roll coater is used as a resist coating mechanism, and the resist coating device of the above 8 to 9 is used as a roll film. A resist coating method characterized by being used. 14． In a resist coating method of applying a resist to a roll film and then drying the resist coating roll film, a non-contact roll coater is used as a resist coating mechanism, and the roll film is formed using the above 10 to 10
12. A resist coating method, comprising using the resist coating roll film of 12.

15. In a resist coating device that applies a resist to a roll film, transports the film with a transport roller, and then dries the roll film with hot air, a heat-resistant sheet is placed on the transport roller near the entrance to the hot-air drying unit. Resist coating device. 16. 15. The resist coating apparatus according to the above 15, wherein the heat-resistant sheet is not fixed, with the downstream end of the sheet disposed between the rollers.

17. In a resist coating device that applies a resist to a roll film and then transports the film with transport rollers and dry the roll film with hot air, the transport rollers at the entrance of the hot air drying unit are located at the position of the rollers at the front and the rollers at the rear A resist coating device which is disposed at a higher position and has a structure in which a contact area of the rear surface of the film with the transport roller is large. 18. 17 wherein the heat-resistant sheet is made of heat-resistant resin.
Resist coating equipment. 19. 18. The resist coating apparatus according to the above 18, wherein the heat-resistant resin is a fluorinated resin, particularly a polytetrafluoroethylene resin.

20. A resist is applied to the roll film, and then the resist-coated roll film is dried,
In a resist coating / electrode pattern forming apparatus for forming an electrode pattern, before forming an electrode pattern on the roll film, a resist coating / electrode is provided, which is provided with a mechanism for removing foreign matter at an end of the roll film. Pattern forming device. 21. 20. The resist coating / electrode pattern forming apparatus according to 20 above, wherein the mechanism for removing the foreign matter at the end of the roll film is an adhesive roller that contacts only the end. 22. 20. The resist coating / electrode pattern forming apparatus according to any one of 20 to 21, further comprising an adhesive roller and a cleaning roller for the adhesive roller which is in contact with the adhesive roller and has a higher adhesive strength than the adhesive roller.

[0051]

[Effect] 1. Claims 1 to 3 (1) There is provided a resist coating apparatus which can be manufactured efficiently without labor for manual opening and closing. The operator attaches the opening / closing tape, but if the operator forgets it, the operator can easily attach the opening / closing tape because the opening / closing tape is located away from the coating roller. In addition, the coating section and the manual operation can be separated, and the cleanness of the coating section can be increased. (2) The reflection type sensor is difficult to adjust because the reflected light intensity changes when the substrate is slightly twisted. However, the use of the transmission type sensor minimizes erroneous detection of roll film undulation and stably opens and closes. Tape can be detected.

2. Claim 4 A stable start of coating can be obtained with a sufficient clearance, substrates with different thicknesses can be removed with the same setting, and productivity increases, and furthermore, a distance from the start of coating to uniform coating in the width direction. The present invention provides a non-contact roll coater type coating apparatus in which the substrate can be shortened and the use efficiency of the substrate is improved. 3. Claims 5-6. And a method for forming a resist which can obtain the effect of (1).

4. Claims 7 to 9 Provided is a resist coating apparatus in which a resist is uniformly dried without providing a leveling zone after resist coating, and a partial pattern is not left. 5. In a patterning apparatus for a roll-shaped film substrate, a resist coating / removing device capable of removing foreign matter without damaging an electrode surface by contacting an adhesive roller only to an end of the substrate.
An apparatus for forming an electrode pattern is provided.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a roll-shaped film substrate processing apparatus according to a first embodiment.

FIG. 2 is a diagram illustrating a connection portion of a connection film substrate according to the first embodiment.

FIG. 3 is a view showing a conventional resist coating apparatus.

FIG. 4 is a diagram showing film substrates connected by a connection tape.

FIG. 5 is a view showing various forms of attaching an opening / closing tape.

FIG. 6 is a view showing a conventional roll-shaped film processing apparatus.

FIG. 7 is a view showing a film substrate in which a Kapton tape is stuck on the back side of the first film substrate.

FIG. 8 is a view showing a film substrate having a convex surface processed at the top of the film substrate using a heating bar.

FIG. 9 is a diagram illustrating a side view of an apparatus according to a fourth embodiment in which a roller that pushes a substrate toward a coating roller is installed immediately before a coating roller.

FIG. 10 is a diagram showing a side view of an apparatus according to a fifth embodiment.

FIG. 11 is a diagram illustrating a resist coating and drying unit according to a sixth embodiment.

FIG. 12 is a view showing a state in which a polytetrafluoroethylene resin sheet is fixed at an entrance of a dryer and a downstream end is set to a free end, so that a conveying roller is rotated and easily placed.

FIG. 13 is a diagram showing a configuration in which the transport rollers near the entrance are positioned higher than the positions of all the rollers and the subsequent transport rollers, and the rear surface of the film contacts the entire area of the transport rollers.

FIG. 14 is a view showing a conventional resist coating and drying apparatus provided with a leveling zone.

FIG. 15 is a view showing a transport roller coated with Teflon.

FIG. 16 is a view showing a resist coating and drying unit in which a leveling zone is not provided.

FIG. 17 is a view showing a film substrate on which a thick film thickness portion has occurred.

FIG. 18 is a view showing a means for removing foreign substances by bringing an adhesive rubber roller into contact with both surfaces of a substrate.

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takumi Suzuki 1-3-6 Nakamagome, Ota-ku, Tokyo F-term in Ricoh Co., Ltd. (reference) 2H025 EA04 4F040 AA22 AB06 BA23 CB18 CB23 CB40 DA02 DA07 DA18 DB02 DB10 DB14 DB23 5F046 JA19 JA21

Claims (12)

[Claims] 1. A resist coating apparatus for applying a resist to a roll film by a roll coater and drying the resist-coated roll film, in front of a connection portion where a film substrate produced by cutting the roll film is connected by a connection film. A resist coating apparatus having a sensor for detecting / identifying a roll coater open / close detection film provided later and / or a means for opening / closing the roll coater based on the detection / identification result of the sensor. 2. A method for projecting light onto a roll coater opening / closing detection film, detecting the transmittance and / or reflectance of the roll coater opening / closing detection film by a sensor, and from the sensor to the coating roller based on the detection result. A resist coating device having means for controlling the opening and closing of the coating roller during the transfer time. 3. A resist coating method for applying a resist to a roll film by a roll coater and drying the resist coated roll film, wherein the resist coating apparatus according to claim 1 is used. Resist coating method. 4. A resist coating apparatus for coating a resist on a roll film and drying the resist coating roll film, wherein the resist coating mechanism is of a non-contact roll coater type, and the resist film is coated with a resist film at the beginning of the resist coating. A resist coating apparatus having a mechanism for reducing a distance between rollers. 5. A resist coating method for applying a resist to a roll film and thereafter drying the resist coating roll film, wherein the resist coating apparatus according to claim 4 is used. 6. The resist coating method according to claim 5, wherein a roll film having an uneven portion for reducing the distance between the roll film and the coating roller is used as a roll film at an application start portion. 7. A resist coating apparatus for applying a resist to a roll film, thereafter transporting the film by a transport roller, and drying the roll film by hot air,
A resist coating apparatus, wherein a heat-resistant sheet is arranged on a transport roller near an inlet of a hot-air drying unit. 8. A resist coating apparatus for applying a resist to a roll film, transporting the film by transport rollers, and drying the roll film by hot air, wherein the transport rollers at the entrance of the hot-air drying section are located before and after the transport rollers. A resist coating device having a structure in which the contact area of the rear surface of the film with the transfer roller is large. 9. The resist coating apparatus according to claim 7, wherein the transport rollers near the entrance of the hot-air drying section have a surface coated with a heat-resistant resin. 10. A resist is applied to a roll film,
Thereafter, the resist coating roll film is dried, and in a resist coating / electrode pattern forming apparatus for forming an electrode pattern, before forming an electrode pattern on the roll film, a mechanism is provided for removing foreign matter at an end of the roll film. An apparatus for applying a resist and forming an electrode pattern. 11. The resist coating / electrode pattern forming apparatus according to claim 10, wherein the mechanism for removing the foreign matter at the end of the roll film is an adhesive roller that contacts only the end. 12. The resist coating / electrode pattern forming apparatus according to claim 11, further comprising an adhesive roller and a cleaning roller for the adhesive roller which is in contact with the adhesive roller and has a higher adhesive strength than the adhesive roller.