JP2004012758A - Method for manufacturing color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter which prevents the occurrence of peeling unevenness of a thermoplastic resin layer in peeling a temporary support of a photosensitive resin material and can shorten the time for cooling a substrate. <P>SOLUTION: The method for manufacturing the color filter includes a step of forming a laminate of a photosensitive transfer material provided with at least the thermoplastic resin layer and a photosensitive resin layer in this order on the temporary support, a step of peeling the temporary support, and an exposing/developing step of forming the color filter on the front surface of the substrate by exposing and developing, in which the difference between the tension of the temporary support just prior to peeling in the step of peeling the temporary support and the tension of the temporary support just prior to lamination exists in the range from +1.0 to -0.5 kg/100 mm. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for producing a color filter used in a liquid crystal display device, and more particularly to a method for producing a color filter by a transfer method using a photosensitive transfer material.
[0002]
[Prior art]
In general, a liquid crystal display device that displays a color image has a configuration in which a color filter is provided on one surface of two transparent substrates provided in the liquid crystal display device. The color filter has a configuration in which a layer composed of a large number of pixels is provided on a transparent substrate so as to be developed and arranged through a minute gap. The color filter may be only one color (all the same color), or may be composed of two or more colors. Further, for example, when arranging three color pixels of R (red), G (green), and B (blue), each of RGB, such as a stripe type, a mosaic type, a triangle type, and a four pixel arrangement type, is provided. The colored pixels are combined in a certain pattern to form the colored pixels.
[0003]
Various methods are known for producing such a color filter, but in recent years, a transfer method using a photosensitive resin sheet (photosensitive transfer material) can easily produce a highly accurate color filter. It is attracting attention because it can be done. For example, in a color filter manufacturing method, in this transfer method using a photosensitive resin sheet, first, a photosensitive colored resin layer (photosensitive resin layer) containing a coloring material (pigment or dye) of a predetermined color and a photosensitive resin. A predetermined number of photosensitive resin sheets (usually three sheets of R, G, and B) are manufactured by providing a photosensitive resin sheet provided on a flexible temporary support. Next, after sticking one sheet of this photosensitive resin sheet on a transparent substrate (such as a glass plate) while heating the photosensitive colored resin layer downward and using a heating roll, a temporary support And the photosensitive colored layer is transferred onto the transparent substrate.
[0004]
Next, in that state, the surface of the photosensitive colored resin layer is irradiated with light through a sheet-like photomask having pixel pattern portions opened to expose the photosensitive colored resin layer in a pattern, and then developed. By processing, a colored pixel pattern of one color is formed on the transparent substrate. Further, by using a photosensitive resin sheet having a photosensitive colored resin layer of another color on the substrate surface on which the colored pixel pattern is formed, transfer, exposure, and development are sequentially performed in the same manner, so that multicolor coloring is achieved. A pixel pattern can be formed. In recent years, in order to improve color separation between multicolored pixels such as RGB, it is common practice to provide a gap between each pixel and embed a photosensitive black resin (so-called black matrix formation). It has been broken.
In order to prevent air bubbles from being mixed during transfer, the photosensitive resin sheet is often provided with a thermoplastic resin layer as a cushion layer between the photosensitive resin layer and the temporary support.
[0005]
In producing a color filter by the transfer method as described above, usually, a photosensitive resin sheet is laminated on a transparent substrate, and then naturally cooled, and then the temporary support is peeled off. Since the natural cooling is performed until the temperature of the transparent substrate reaches about 20 to 25 ° C., it usually takes about 2 to 5 minutes. However, when the transparent substrate to which the photosensitive resin sheet is transferred in this way is cooled over time, there is a problem that the temporary support of the photosensitive transfer sheet contracts. When the temporary support is peeled off, the temporary support is peeled off when all or a part of the thermoplastic resin layer provided between the photosensitive resin layer and the temporary support is peeled off with the temporary support. Cause the so-called "unevenness of peeling of the thermoplastic resin layer" Cause Therefore, it is desirable to keep it as low as possible. The peeling unevenness of the thermoplastic resin layer is caused by the stress rupture of the thermoplastic resin layer, and if the peeling unevenness of the thermoplastic resin layer occurs, the exposure unevenness occurs at the peeling portion during pattern exposure, which adversely affects the shape of the pixel. End up.
[0006]
Further, in recent years, for the purpose of improving productivity, it is required to increase the laminating speed, and accordingly, it is necessary to shorten the substrate cooling time after laminating. However, if the transparent substrate or the like is cooled to about room temperature using a cooling plate or the like and the temporary support is peeled off, even in this case, peeling of the thermoplastic resin layer will occur, resulting in an adverse effect of shortening the substrate cooling time. End up.
[0007]
[Problems to be solved by the invention]
Therefore, the present invention provides a photosensitive resin from a laminate obtained by bringing a photosensitive resin material into close contact with the surface of a substrate in the production of a color filter by a transfer method using a photosensitive transfer material (photosensitive resin sheet). It is an object of the present invention to provide a method for producing a color filter capable of preventing occurrence of uneven peeling of a thermoplastic resin layer even when the temporary support of a material is peeled off even when the lamination speed is increased.
[0008]
[Means for Solving the Problems]
The object is achieved by the present invention described below. That is, the present invention
<1> A photosensitive transfer material in which at least a thermoplastic resin layer and a photosensitive resin layer are provided in this order on a temporary support is arranged so that the surface of the substrate is in contact with the surface of the substrate. Forming a color filter on the surface of the substrate by exposing and developing the photosensitive resin layer, and a laminate forming step for obtaining a laminate by adhering to the substrate; a peeling step for peeling the temporary support from the laminate; A difference between the tension of the temporary support immediately before peeling and the tension of the temporary support just before lamination in the peeling step is +1.0 to −0.5 kg / It is a manufacturing method of the color filter characterized by being in the range of 100 mm.
[0009]
<2> The method for producing a color filter according to <1>, wherein the peeling step holds and peels the temperature of the laminate in a range of 30 to 40 ° C.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the photosensitive transfer material and the substrate will be described first, and the color filter manufacturing method will be described in detail.
[0011]
<Photosensitive transfer material>
The photosensitive transfer material of the present invention is an image forming material in which a photosensitive resin composition layer is provided on a temporary support, and a thermoplastic resin for avoiding air bubbles during transfer on the temporary support. It is preferable to provide a layer and an intermediate layer having low oxygen permeability. Hereinafter, the photosensitive transfer material will be described.
[0012]
(Temporary support)
The temporary support for the colored photosensitive resin composition layer used in the present invention should be flexible and should not cause significant deformation, shrinkage or elongation even under pressure or pressure and heating. It is. Examples of such a support include a polyethylene terephthalate film, a triacetate cellulose film, a polystyrene film, and a polycarbonate film. A biaxially stretched polyethylene terephthalate film is particularly preferred.
[0013]
On the temporary support, it is desirable to provide a colored photosensitive resin composition layer directly or through an intermediate layer having ultraviolet ray permeability and low oxygen permeability. Furthermore, it is preferable to provide a thermoplastic resin layer for the purpose of avoiding air bubbles during transfer. In that case, it is preferable to laminate | stack in order of a temporary support body, a thermoplastic resin layer, an intermediate | middle layer, and the photosensitive resin composition layer. These layers can be produced by dissolving the material constituting the layers in an appropriate solvent, and applying and drying. At this time, when a multilayer coating is performed on a layer that has already been formed, it is necessary that the solvent does not attack the lower layer, but these solvents can be appropriately selected.
[0014]
(Thermoplastic resin)
As described above, the thermoplastic resin layer is provided for the purpose of avoiding air bubbles at the time of transfer, but the resin constituting the thermoplastic resin layer preferably has a substantial softening point of 80 ° C. or lower. Examples of alkali-soluble thermoplastic resins having a softening point of 80 ° C. or lower include saponified products of copolymers of ethylene and acrylic esters, saponified products of styrene and (meth) acrylic ester copolymers, vinyltoluene and (meth). At least one selected from a saponified product of an acrylic ester copolymer, a poly (meth) acrylic ester, a saponified product of a (meth) acrylic ester copolymer such as butyl (meth) acrylate and vinyl acetate, and the like. Although it is preferable, the organic polymer having a softening point of about 80 ° C. or less described in “Plastic Performance Handbook” (edited by the Japan Plastics Industry Federation, edited by the All Japan Plastics Molding Industry Association, published by the Industrial Research Council, issued on October 25, 1968) Among them, those soluble in an alkaline aqueous solution can also be used. Further, even in an organic polymer substance having a softening point exceeding 80 ° C., various plasticizers compatible with the polymer substance are added to the organic polymer substance so that the substantial softening point is 80 ° C. or less. It is possible to lower.
[0015]
In addition, in order to adjust the adhesive force with the temporary support in these organic polymer substances, various polymers, supercooling substances, adhesion improvers, or surface-active substances within a range where the substantial softening point does not exceed 80 ° C. It is possible to add agents, mold release agents and the like. Specific examples of preferable plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, dipeptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, and biphenyl diphenyl phosphate. The thickness of the thermoplastic resin layer is preferably 6 μm or more. The reason for this is that if the thickness of the thermoplastic resin layer is less than 6 μm, the unevenness of the base of 1 μm or more cannot be completely absorbed, and bubbles are easily generated between the base and the base during transfer. The upper limit is preferably 100 μm or less, more preferably 50 μm or less, from the viewpoint of developability and production suitability.
[0016]
(Middle layer)
The intermediate layer inhibits the photocuring reaction in the colored photosensitive resin composition layer when the colored photosensitive resin composition layer is adhered to the transparent substrate, and then the temporary support is peeled off and pattern exposure is performed. It is provided as a barrier layer for preventing diffusion of oxygen from the air and for preventing the thermoplastic resin layer and the photosensitive resin composition layer from being mixed when the three layers are laminated. For this reason, it is preferable to prevent mechanical peeling from the colored photosensitive resin composition layer and to have a high oxygen blocking ability.
[0017]
Such an intermediate layer is formed by applying a polymer solution directly on the temporary support or via a thermoplastic resin layer. Suitable polymers for use in the intermediate layer include polyvinyl ether / maleic anhydride polymers, water-soluble salts of carboxyalkyl cellulose, and water-soluble cellulose described in JP-B-46-32714 and JP-B-56-40824. Ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinylpyrrolidone, various polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, various starches and the like Water-soluble salts of the group consisting of compounds, styrene / maleic acid copolymers, and maleate resins, and combinations of two or more thereof. Particularly preferred is a combination of polyvinyl alcohol and polyvinyl pyrrolidone, and polyvinyl alcohol having a saponification rate of 80% or more is preferred.
[0018]
The content of the polymer such as polyvinyl pyrrolidone is preferably 1 to 75% by mass, more preferably 1 to 60% by mass, and still more preferably 10 to 50% by mass of the solid content of the intermediate layer. In the range of 1 to 60% by mass, sufficient adhesion with the photosensitive resin layer is obtained, and the oxygen blocking ability is not lowered. The thickness of the intermediate layer is very thin, preferably about 0.1 to 5 μm, particularly preferably 0.2 to 4 μm. When the thickness of the intermediate layer is in the range of 0.1 to 5 μm, the oxygen permeability in the intermediate layer is not too high, and it does not take too much time during development or removal of the intermediate layer.
[0019]
(Photosensitive resin layer)
As the photosensitive resin composition of the present invention, all known photosensitive resins described in, for example, JP-A-3-282404 can be used. Specifically, a photosensitive resin layer comprising a negative diazo resin and a binder, a photopolymerizable resin comprising a photopolymerizable monomer, a photopolymerization initiator and a binder, a photosensitive resin composition comprising an azide compound and a binder, cinnamic acid Type photosensitive resin composition. Among these, a photopolymerizable resin is particularly preferable.
[0020]
In addition, as the photosensitive resin composition of the present invention, those that can be developed with an alkaline aqueous solution and those that can be developed with an organic solvent are known, but can be developed with an alkaline aqueous solution from the viewpoint of preventing pollution and ensuring occupational safety. Is preferable.
[0021]
Red, green and blue pigments which are color filter constituent colors are further added to the photosensitive resin composition layer. Preferred examples thereof include Carmine 6B (C.I. 12490), phthalocyanine green (C I. 74260), phthalocyanine blue (C.I. 74160), and the like. It is preferable that content of the pigment in the colored photosensitive resin composition is 1-30 mass%. More preferably, it is 5-20 mass%. The colored photosensitive resin composition may contain an ultraviolet absorber. In this case, about 1 to 15% of solid content is added.
[0022]
The film thickness of the photosensitive resin composition layer is determined by the film thickness finally formed on the color filter, and the color of each colored layer, such as the film thickness difference in the pixel and the film thickness decrease in the heat treatment process such as post baking, etc. In consideration of the density and development suitability, the thickness of each colored layer is preferably from 0.1 to 5 μm, more preferably from 0.3 to 4 μm.
[0023]
<Substrate>
The substrate used in the present invention is preferably a transparent substrate having optical isotropy and sufficient heat resistance, such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polystyrene, polycarbonate, polyethersulfone. , Cellulose acetate, polyarylate, soda glass, borosilicate glass, quartz and the like. The surface of the light transmissive substrate may be subjected to an undercoat treatment as necessary. Furthermore, treatments such as glow discharge, corona discharge, and ultraviolet (UV) irradiation may be performed.
[0024]
The light transmissive substrate can be used in the form of a plate, a sheet or a film. Although the thickness of a board | substrate can be suitably set according to a use and material, generally 0.01-10 mm is preferable. For example, when the glass substrate is used, the thickness is preferably in the range of 0.3 to 3 mm.
[0025]
<Color filter manufacturing method>
The manufacturing method of the color filter of this invention includes a laminated body formation process, a peeling process, and an exposure / development process, and a protective layer peeling process is performed prior to the laminated body forming process as necessary. Hereinafter, the manufacturing method of the color filter of the present invention will be described with reference to FIG.
[0026]
(Protective layer peeling process)
In the laminated film 40, a photosensitive layer 40a is provided on a temporary support 40b via an auxiliary layer, an intermediate layer, etc. (not shown). Further, a protective layer 40c and a temporary support 40b are provided on the photosensitive layer 40a. An antistatic layer or the like is provided on the other surface of the film.
[0027]
The half-cut knife 42 half-cuts the laminate film 40 in accordance with the length of the glass substrate 22. In this half cut, the protective layer 40c and the photosensitive layer 40a are cut, and the temporary support 40b is not cut.
[0028]
The protective layer peeling part 43 peels the half-cut part of the protective layer 40 c that becomes the application surface to the glass substrate 22 from the laminate film 40. This peeling is performed by adhering the adhesive tape 43b drawn from the adhesive tape roll 43a to the protective layer 40c by the pressing roller 43c, and the adhesive tape 43b to which the protective layer 40c is adhered is wound around the tape take-up shaft 43d. And recovered. Further, the protective layer 40c is left without being peeled from the laminated film 40 which is located between the glass substrate 22 and the glass substrate 22.
[0029]
(Laminate formation process)
First, when a photosensitive transfer material provided with a protective layer is used, the protective layer is removed in advance in the protective layer peeling step, and the photosensitive resin layer is heated in the laminating portion 13 under pressure, if necessary. Then, the surface of the substrate to be transferred and the photosensitive resin layer are bonded and adhered so as to be in contact with each other to form a laminate.
[0030]
For the bonding, a conventionally known laminating apparatus or a vacuum laminating apparatus can be used, and an auto-cut laminator apparatus can also be used in order to increase productivity. Among the above, in the present invention, the continuous laminating and peeling apparatus shown in FIG. 1 can be most preferably used.
[0031]
The laminating unit 13 includes a laminating roller pair 35 and a backup roller 36. The laminating roller pair 35 is composed of laminating rollers 35a and 35b arranged in the vertical direction, and these laminating rollers 35a and 35b incorporate a heater. The laminating roller pair 35 sandwiches and adheres the laminate film 40 to the glass substrate 22 by sandwiching and transporting the glass substrate 22 and the laminate film 40. The backup rollers 36a and 36b are configured to rotate in contact with the laminating rollers 35a and 35b, respectively, and can suppress lamination of the laminating rollers 35a and 35b to enable lamination with a uniform force. Although the backup roller 36 is provided here, the backup roller 36 may be omitted and only the laminating rollers 35a and 35b may be used.
[0032]
As shown in FIG. 1, the laminate film supply unit 14 includes an attachment shaft 41a of a laminate film roll 41, a half-cut knife 42, a protective layer peeling unit 43, a back tension roller 45, a tension sensor 46, and the like. . The laminate film supply unit 14 peels off the protective layer 40c from the laminate film roll 41 and supplies the temporary support 40b to the laminate roller pair 35 with the photosensitive layer 40a facing upward. An edge position control mechanism (not shown) is provided in the vicinity of the mounting shaft 41a. The edge position control mechanism detects the position of the side edge of the laminate film 40 and automatically corrects the position. Thereby, alignment of the affixing width direction of the laminated body film 40 to the glass substrate 22 is performed.
[0033]
In the present invention, the difference between the tension of the temporary support just before peeling and the tension of the temporary support just before lamination in the peeling step is in the range of +1.0 to -0.5 kg / 100 mm. The tension of the temporary support immediately before the lamination refers to the tension between the suction drum 45 and the laminate roll 35. The tension of the temporary support just before laminating is to prevent the mixing of air bubbles when the photosensitive resin layer is pressure-bonded to the surface of the substrate, to prevent film wrinkling, and on the other hand, to prevent the film from stretching, In order to keep the width of the film constant, the range of 0.8 to 4.0 kg / 100 mm is preferable, and the range of 1.0 to 2.0 kg / 100 mm is particularly preferable.
[0034]
The tension of the temporary support immediately before lamination is constantly measured by the tension bar 46, and the film tension is controlled to be constant by changing the rotation speed of the suction drum 45.
[0035]
In the laminating unit 13, the substrate feeding member operates in accordance with the passage of the half-cut line. Thereby, the photosensitive layer 40a of the laminated body film 40 is affixed on the glass substrate 22 in the state in which the alignment of the glass substrate 22 and the half cut line is performed. Then, the temporary support 40 b is also sent to the downstream side in the feed direction of the laminating roller 35 with the movement of the glass substrate 22.
[0036]
(Cooling process)
The temperature of the laminate immediately after the laminate formation step is usually about 80 to 120 ° C. In the present invention, in the “cooling step” of cooling the laminate obtained by the laminate formation step, the laminate It is preferable to cool the temperature to 30-40 ° C. Here, “temperature of the laminate” in the present invention means the temperature of the substrate surface of the laminate. The cooling step is a step of cooling the laminated body in which the photosensitive resin layer and the substrate are bonded to a certain temperature (hereinafter sometimes referred to as “cooling temperature”) by the laminated body forming step, and the thermoplastic resin layer. Is performed for the purpose of curing to the extent that it can be sufficiently peeled off from the temporary support.
[0037]
The cooling unit 15 that cools the laminated body includes a cooling air blowing board 50 for uniforming the wind speed distribution and a conveying roller 51. The cooling air blowing board 50 is formed with punching holes so that the opening ratio is 8%, and clean cooling air that has passed through the HEPA filter is blown out toward the glass substrate 22. In order to efficiently cool the glass substrate 22, the cooling air is blown outward in the width direction perpendicular to the substrate feeding direction. Thereby, the temperature of the glass substrate 22 is cooled to about room temperature (30 ° C. or lower). Moreover, the time for the glass substrate 22 to pass through the cooling unit 15 is set to 1 minute or more, and the glass substrate 22 is reliably cooled.
[0038]
The thermoplastic resin interposed between the temporary support and the photosensitive resin layer because the temporary support is contracted by the cooling of the laminate film in the cooling step, while the photosensitive resin layer hardly contracts. Residual stress is generated in the layer. The residual stress is considered to be a cause of peeling unevenness of the thermoplastic resin layer in the temporary support peeling process. Therefore, in order to prevent the peeling unevenness of the thermoplastic resin layer, it is desirable to increase the tension of the temporary support to such an extent that the shrinkage of the temporary support due to the cooling can be prevented.
[0039]
The tension of the temporary support in the cooling step is preferably +1.0 to −0.5 kg / 100 mm, particularly preferably +0.5 to −0 kg / 100 mm, relative to the tension immediately before the lamination. In the present invention, the tension of the temporary support in the cooling process refers to the tension between the laminating roller 35 and the peeling roll 55, and the tension of the temporary support in the cooling process depends on the rotation speed of the laminating roller 35 and the suction conveyor. It can be controlled by the number of rotations of the roll 61.
[0040]
(Adsorption process)
In the laminate cooled in the cooling step, the temporary support is peeled off from the laminate film in the peeling step. The adsorption step refers to the cooled laminated body up to the peeling roll 55 and the substrate take-out unit 17. It refers to the process of adsorbing, holding, and conveying on an adsorbing conveyor-60.
[0041]
In the present invention, the number of rotations of the suction conveyor roll 61 regulates the tension of the temporary support in the cooling step and the tension of the temporary support just before peeling.
[0042]
(Peeling process>
Next, the peeling process which peels a temporary support body from the laminated body of the photosensitive transfer material conveyed by the said adsorption | suction process is demonstrated. In the peeling step, the temporary support 40b is peeled from one side of the laminate 40 obtained by closely contacting the surface of the substrate 22 so that the substrate surface and the photosensitive resin layer are in contact with each other. As the peeling means, the back surface of the temporary support may be caught with a suction cup or the like, or it may be wound around a peeling roll. In the present invention, the peeling from the suction conveyor 60 is possible. It is preferable to use the roll 55 in combination.
[0043]
In addition, since stress is applied to the laminated body in a direction parallel to the laminating direction, when peeling the temporary support from the laminated body, especially on a multi-sided pattern substrate having four or more chamfers, the laminated body is placed on It is also preferable that the peeling is performed obliquely or perpendicular to the laminating direction with respect to any side of the placed substrate.
[0044]
The peeling unit 16 includes a peeling roller 55 and a temporary support winding mechanism 56. The peeling portion 16 peels the temporary support 40b from the glass substrate 22, and winds the temporary support 40b around the recovery shaft 56a in a roll shape.
[0045]
Also, ion-generated clean air is blown out from the blowing port 59 in the vicinity of the peeling roller 55. By this blowing, static electricity of the temporary support 40b and the glass substrate 22 is removed. As a result, the adhesion of surrounding dust can be suppressed, and the occurrence of defects such as so-called “pixel defects” in the product can be suppressed.
[0046]
In the present invention, the difference between the tension of the temporary support just before peeling and the tension of the temporary support just before lamination in the peeling step is in the range of +1.0 to -0.5 kg / 100 mm. The tension of the temporary support immediately before peeling refers to the tension between the laminating roller 35 and the peeling roll 55. When the difference between the tension of the temporary support just before peeling and the tension of the temporary support just before lamination is less than or equal to the range of −0.5 kg / 100 mm, the occurrence of residual stress in the thermoplastic resin layer is prevented, and the thermoplastic resin layer is peeled off. Unevenness cannot be prevented, and if it is +1.0 or more, the film tension immediately before laminating is increased, which is not preferable. The difference is particularly preferably in the range of +0.5 to −0 kg / 100 mm.
[0047]
The tension of the temporary support immediately before peeling can be controlled by the rotation speed of the suction conveyor roll 61 and the rotation speed of the recovery shaft 56a of the temporary support winding mechanism. It can also be controlled by adjusting the position of the peeling roller 55. The tension of the temporary support immediately before peeling can be measured by adding a tension pickup roller between the peeling roller 55 and the take-up roller 56 because the peeling roller 55 rotates freely.
[0048]
As described above, the present invention maintains the residual tension of the thermoplastic resin layer by keeping the tension of the temporary support just before laminating, the tension of the temporary support in the cooling step, and the tension of the temporary support just before peeling in a certain range. The purpose of this is to prevent the occurrence of peeling unevenness of the thermoplastic resin layer. However, the tension of the temporary support immediately before the lamination, the tension of the temporary support in the cooling step, and the temporary support immediately before the peeling. By maintaining the tension of the support in a certain range, the positional deviation between the substrate and the photosensitive resin layer caused by the thermal contraction of the temporary support after lamination is generated in the same manner as the residual stress of the thermoplastic resin layer. Can also be prevented. As a result, lamination in a direction perpendicular to the preceding pixel is possible, which contributes to improvement in productivity.
[0049]
(Exposure and development process>
In the laminate from which the temporary support has been peeled in the peeling step, the photosensitive resin layer is exposed (exposure step) and developed (development step). A color filter is formed on the surface of the substrate.
In the exposure step, the photosensitive resin layer on the substrate surface is irradiated with light through a predetermined photomask. Thereby, the exposed portion of the photosensitive resin layer is cured. The light source used in the exposure process is selected according to the photosensitivity of the photosensitive resin layer, and a known light source such as an ultrahigh pressure mercury lamp, a xenon lamp, a carbon arc lamp, or an argon laser can be used. As described in JP-A-6-59119, an optical filter having a light transmittance of 2% or less at a wavelength of 400 nm or more may be used in combination.
[0050]
In order to prevent air from remaining in the gap between adjacent pixels during transfer of the photosensitive resin material for the second and subsequent colors, a photomask with a rectangular opening in the pixel pattern portion is chamfered. It may be used. The position and shape of the chamfer are described in Japanese Patent Laid-Open No. 10-221518.
[0051]
Subsequently, in the development step, the photosensitive resin layer on the transparent substrate is developed. Thereby, the non-exposed part (uncured part) of the photosensitive resin layer is removed, and a layer composed of a large number of minute colored pixels can be formed. As the developer for the photosensitive resin layer, a dilute aqueous solution of an alkaline substance is used, but a developer added with a small amount of an organic solvent miscible with water may also be used. Suitable alkaline substances include alkali metal hydroxides (eg, sodium hydroxide, potassium hydroxide), alkali metal carbonates (eg, sodium carbonate, potassium carbonate), alkali metal bicarbonates (eg, sodium bicarbonate). , Potassium bicarbonate), alkali metal silicates (eg, sodium silicate, potassium silicate), alkali metal metasilicates (eg, sodium metasilicate, potassium metasilicate), triethanolamine, diethanolamine, monoethanolamine, Mention may be made of morpholine, tetraalkylammonium hydroxides (for example tetramethylammonium hydroxide) and trisodium phosphate. The concentration of the alkaline substance is 0.01 to 30% by mass, and the pH is preferably 8 to 14.
[0052]
In the case of an ordinary photosensitive resin layer other than the light-shielding photosensitive black resin layer, for example, by using a developer having a relatively low pH, development by film-like detachment can be suitably performed.
[0053]
The developer can be used as a bath solution or a spray solution. To remove the uncured portion of the photosensitive resin layer in a solid form (preferably in the form of a film), a method such as rubbing with a rotating brush or a wet sponge in the developer, or spraying pressure when the developer is sprayed The method using is preferable. The temperature of the developer is usually preferably in the range of about room temperature to 40 ° C. A water washing step may be added after the development processing.
[0054]
Further, after the development step, it is preferable to perform a heat treatment in order to sufficiently cure the colored pixel layer and improve chemical resistance. The heat treatment is performed by heating the substrate having the colored pixel layer in an electric furnace, a drier, or the like, or by irradiating the colored pixel layer with an infrared lamp. Although the heating temperature and time depend on the composition of the photosensitive resin and the thickness of the colored pixel layer, generally, a temperature of about 120 to 250 ° C. and a temperature of about 10 to 300 are required to obtain sufficient solvent resistance and alkali resistance. For minutes.
[0055]
In this way, a color filter having a single color pixel layer (color pixel pattern) is obtained. Furthermore, a multicolored color filter can be obtained by repeating the above-described steps as many times as necessary by using photosensitive resin materials of other colors. The color filter may be only one color (all the same color) or may be composed of two or more colors. For example, when arranging pixels of three colors of red, green, and blue, any arrangement such as a stripe type, a mosaic type, a triangle type, and a four-pixel arrangement type may be used.
[0056]
Further, using a photosensitive black resin material (black matrix forming sheet) having a photosensitive black resin layer, the photosensitive resin material is heat-treated in the same manner as described above, and then transferred to the colored pixel layer surface of the color filter. Then, the color filter is exposed (backside exposure) from the lower surface (surface not having the pixel layer) side of the substrate, developed, and heated to provide a black resin layer so as to fill the gap between the pixels, A black matrix (light-shielding image) may be formed. Thereby, a color filter with a black matrix is obtained.
[0057]
The back exposure is generally performed by ultraviolet (UV) irradiation, and the type of light is appropriately selected according to the photosensitivity of the photosensitive black resin layer. The thickness of the black resin layer to be formed is preferably 0.5 to 3 μm. In order that the light-shielding image portion does not form protrusions and the obtained color filter exhibits good flatness, it is desirable that the black resin layer has the same thickness or less than the colored pixel layer.
[0058]
【Example】
Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.
[0059]
<Production of photosensitive transfer material>
As a temporary support, a polyethylene terephthalate (PET) film having a thickness of 75 μm is prepared, and a coating liquid composed of the following formulations H and P is applied to the PET film, and a thermoplastic resin layer and an oxygen barrier film are formed on each PET film. They were formed in this order.
[0060]
[Thermoplastic resin layer formulation H]
・ 300 parts by mass of vinyl chloride / vinyl acetate copolymer
・ 80 parts by mass of vinyl chloride-vinyl acetate-maleic acid copolymer
・ 80 parts by weight of dibutyl phthalate
In the preparation, methyl ethyl ketone was appropriately added.
[0061]
[Oxygen barrier film prescription P]
・ 200 parts by weight of polyvinyl alcohol
Water was appropriately added during the preparation.
[0062]
Thereafter, a photosensitive resin layer coating solution for forming an R (red) pixel having the following composition is applied on the oxygen barrier film of the PET film and dried to provide a photosensitive resin layer, further protecting the layer surface. Covered with film.
As described above, a thermoplastic resin layer having a dry layer thickness of 14.6 μm, an oxygen barrier film having a dry layer thickness of 1.6 μm, and a photosensitive resin layer and a protective film having a dry layer thickness of 2.0 μm are provided on the temporary support. A laminated photosensitive transfer material (a) was obtained.
[0063]
[Photosensitive resin layer coating solution R]
・ 32 parts by mass of benzyl methacrylate / methacrylic acid copolymer
・ 31 parts by mass of pentaerythritol hexaacrylate
・ 2.5 parts by mass of photopolymerization initiator
(2-Trichloromethyl-5- (p-styrylstyryl) 1,3,4-oxadiazole)
・ 12 parts by weight of UV absorber
(7- (2- (4- (3-hydroxymethylpiperidino) -6-diethylamino) triazinylamino) -3-phenylcoumarin)
・ Phenothiazine 0.1 parts by mass
・ PR254 9.6 parts by mass
In the preparation, methyl ethyl ketone was appropriately added.
[0064]
[Example 1]
The TFT which is a substrate to which the photosensitive resin layer is to be transferred by peeling the protective layer from the photosensitive transfer material (a) obtained as described above (protective layer peeling step) and exposing the exposed photosensitive resin layer surface The surface of the array substrate is pressurized (0.8 kg / cm) using a laminator (manufactured by Taisei Laminator Co., Ltd., VP-II). ² ) And laminated together by heating (130 ° C.) (laminated body forming step). The tension of the temporary support immediately before lamination was 1.2 kg / 100 mm.
[0065]
The TFT array substrate used was an amorphous silicon (a-Si) TFT described in pages 418 to 419 of “Liquid Crystal Device Handbook” published by Nikkan Kogyo Shimbun, edited by the 142th Committee of the Japan Society for the Promotion of Science. Of FIG. 6.36).
[0066]
Next, this laminate was placed on a plate 1 (set temperature: 50 ° C.) of a multi-stage cooling plate (manufactured by Hugle) for 30 seconds, and cooled until the substrate surface temperature of the laminate became 25 ° C. The tension of the temporary support in the cooling step was 1.5 kg / 100 mm.
Subsequently, after the laminated body was held on the plate 1 for 30 seconds, the temporary support was removed from the laminated body by peeling off the temporary support at the interface with the thermoplastic resin layer (peeling step). The tension of the temporary support immediately before peeling was 1.5 kg / 100 mm. Therefore, the difference between the tension of the temporary support just before peeling and the tension of the temporary support just before lamination was +0.3 kg / 100 mm.
Further, when the temporary support was peeled off while applying an ion wind to the peel part or the peripheral part between the thermoplastic resin layer and the temporary support using a static eliminator, no discharge due to charging was confirmed at the time of peeling. Further, no foreign matter was adhered to the intermediate layer surface.
[0067]
Next, exposure is performed through a predetermined photomask (light source: ultra-high pressure mercury lamp, exposure condition: 100 mj / cm ² ), Development was performed with a 0.24 mol / l sodium hydroxide aqueous solution to remove unnecessary portions, and a resist pattern was formed on the surface of the TFT array substrate (exposure / development step). The resist pattern was uniform and good.
[0068]
As described in JP-A-64-9375, the obtained TFT array with a color filter operates as a TFT array by writing a signal to each pixel capacitor through the TFT array and reading it after a predetermined time. As a result, the operation was good.
[0069]
[Example 2]
In the cooling process, the laminated body after lamination is placed on plate 1 (set temperature: 50 ° C.) of a multistage cooling plate (manufactured by Hugle) for 1 second, and then placed on plate 2 (set temperature: 35 ° C.) for 3 seconds. And cooling until the substrate surface temperature of the laminate reaches 35 ° C. (cooling step: cooling rate 20 ° C./s), and then holding the laminate on the plate 2 for 30 seconds, Except for removing the temporary support from the laminate by peeling at the interface with the thermoplastic resin layer (peeling step), the laminate forming step and the peeling step of Example 2 are performed in the same manner as in Example 1. It was. The tension of the temporary support in the cooling process was 1.4 kg / 100 mm. The tension of the temporary support immediately before peeling was 1.4 kg / 100 mm. Therefore, the difference between the tension of the temporary support just before peeling and the tension of the temporary support just before lamination was 0.2 kg / 100 mm. At this time, the occurrence of peeling unevenness in the thermoplastic resin layer was not observed.
[0070]
[Comparative Example 1]
A laminated body was formed in the same manner as in Example 1 (laminated body forming step). The tension of the temporary support immediately before lamination was 1.2 kg / 100 mm. The laminate obtained from the laminate formation step was placed on a plate 1 (set temperature: 50 ° C.) of a multi-stage cooling plate (manufactured by Hugle) for 1 second, and then placed on a plate 2 (set temperature: 35 ° C.) 3 For 2 seconds to cool (cooling step: cooling rate 20 ° C./s). The substrate surface temperature of the laminate was 35 ° C. The tension of the temporary support in the cooling step was 0 kg / 100 mm. Thereafter, the temporary support was peeled off at the interface with the thermoplastic resin layer to remove the temporary support from the laminate (comparative peeling step). The tension of the temporary support immediately before peeling was 0 kg / 100 mm. . Therefore, the difference between the tension of the temporary support just before peeling and the tension of the temporary support just before lamination was -1.2 kg / 100 mm. In Comparative Example 1, occurrence of uneven peeling of the thermoplastic resin layer was observed when the temporary support was peeled off, and uneven exposure occurred at the thermoplastic resin peeling portion during pattern exposure, and the formed resist pattern was not uniform.
[0071]
【The invention's effect】
As described above, according to the present invention, in the production of a color filter by a transfer method using a photosensitive transfer material (photosensitive resin sheet), from the laminate obtained by bringing the photosensitive resin material into close contact with the surface of the substrate. To provide a method for producing a color filter capable of preventing occurrence of uneven peeling of a thermoplastic resin layer when the temporary support (temporary support) of the photosensitive resin material is peeled off and shortening the substrate cooling time. Can do.
[Brief description of the drawings]
FIG. 1 is a schematic view showing a photosensitive transfer apparatus embodying the present invention.
[Explanation of symbols]
12 Substrate preheating section
13 Laminate section
14 Laminate film supply section
15 Cooling unit
16 Peeling part
17 Substrate take-out part
22 Glass substrate
35 Laminate Roller Pair
36 Backup Roller
40 Laminated film
40a Photosensitive layer
40b Temporary support
40c protective layer
41 Laminate film roller
42 half-cut knife
43 Protective layer peeling part
45 Back tension roll
46 Tension sensor
50 Cooling air blowing board
51 Conveying roller
55 Peeling roll
56 Temporary Support Winding Mechanism
59 Ion generating clean air outlet
60 Adsorption conveyor
61 Adsorption conveyor roll

Claims (2)

A photosensitive transfer material in which at least a thermoplastic resin layer and a photosensitive resin layer are provided in this order on a temporary support is adhered to the surface of the base so that the surface of the base and the photosensitive resin layer are in contact with each other. A laminate forming step for obtaining a laminate, a peeling step for peeling the temporary support from the laminate, and exposure and development of the photosensitive resin layer to form a color filter on the surface of the substrate. In a method for producing a color filter including a development step,
The method for producing a color filter, wherein the difference between the tension of the temporary support immediately before peeling in the peeling step and the tension of the temporary support just before lamination is in the range of +1.0 to -0.5 kg / 100 mm . The manufacturing method of the color filter of Claim 1 which the said peeling process hold | maintains the temperature of the said laminated body in the range of 30-40 degreeC, and peels.

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