JP2000336244A - Liquid sealing resin composition and semiconductor device using the composition - Google Patents

Liquid sealing resin composition and semiconductor device using the composition

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Publication number
JP2000336244A
JP2000336244A JP11145758A JP14575899A JP2000336244A JP 2000336244 A JP2000336244 A JP 2000336244A JP 11145758 A JP11145758 A JP 11145758A JP 14575899 A JP14575899 A JP 14575899A JP 2000336244 A JP2000336244 A JP 2000336244A
Authority
JP
Japan
Prior art keywords
resin composition
liquid
liquid sealing
sealing resin
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11145758A
Other languages
Japanese (ja)
Inventor
Yuji Sakamoto
有史 坂本
Masahiro Wada
雅浩 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP11145758A priority Critical patent/JP2000336244A/en
Publication of JP2000336244A publication Critical patent/JP2000336244A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a liquid sealing resin composition for sealing semiconductor elements, etc., which does not deteriorate its pot life, is cured within a shorter time compared to the conventional resin composition and provides a reliability comparable to that of the conventional resin systems, and a reliable semiconductor device having a high productivity. SOLUTION: A liquid sealing resin composition comprises (A) a liquid epoxy resin having two or more epoxy groups in average, (B) an aromatic amine hardener which is in the liquid state at an ordinary temperature, (C) an imidazole having a hydroxy group and (D) silica. Preferably, the aromatic amine hardener is an alkylated diaminodiphenylmethane. A semiconductor device is prepared by sealing a semiconductor element using the above-mentioned liquid sealing resin composition.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体の封止に用
いられる液状封止樹脂組成物及び半導体装置に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid sealing resin composition used for sealing a semiconductor and a semiconductor device.

【0002】[0002]

【従来の技術】近年半導体チップの大型化、パッケージ
の多ピン化、多様化に伴い周辺材料である樹脂材料に対
する信頼性の要求は年々厳しいものとなってきている。
従来はリードフレームに半導体チップを接着しモールド
樹脂で封止したパッケージが主流であったが、多ピン化
の限界からボールグリッドアレイ(BGA)の様なパッ
ケージがかなり増えてきている。
2. Description of the Related Art In recent years, as semiconductor chips have become larger, packages have more pins, and diversification, the demand for reliability of resin materials as peripheral materials has been stricter year by year.
Conventionally, a package in which a semiconductor chip is bonded to a lead frame and sealed with a mold resin has been mainstream. However, a package such as a ball grid array (BGA) has been considerably increased due to the limit of increasing the number of pins.

【0003】BGAはモールド樹脂又は液状樹脂により
封止される。BGAは、基板、ソルダーレジスト、金、
ニッケル等のメッキ部分から構成されているためそれら
に対する接着性が重要である。また表面実装方式でマザ
ーボードと接合するため耐半田クラック性が必要であ
る。更に信頼性の一環として温度サイクル試験(T/C試
験)があり、パッケージには高い信頼性が要求される。
[0003] The BGA is sealed with a molding resin or a liquid resin. BGA is for substrate, solder resist, gold,
Since it is composed of a plated portion of nickel or the like, its adhesion to them is important. In addition, solder crack resistance is required for bonding to a motherboard by a surface mounting method. Furthermore, there is a temperature cycle test (T / C test) as a part of reliability, and high reliability is required for the package.

【0004】これらの要求を満たす材料として液状エポ
キシ樹脂/アルキル置換芳香族ジアミン系の液状封止樹
脂組成物が提案されている。(特開平07-341580,07-341
582)この材料は、基板、金属、ソルダーレジスト等と
の密着性が優れ、更に耐半田リフロー性、耐T/Cクラッ
ク性に優れ、高信頼性パッケージを可能としている。
As a material satisfying these requirements, a liquid epoxy resin / alkyl-substituted aromatic diamine-based liquid sealing resin composition has been proposed. (JP-A-07-341580, 07-341
582) This material has excellent adhesion to substrates, metals, solder resists, etc., and also has excellent solder reflow resistance and T / C crack resistance, enabling highly reliable packages.

【0005】しかし、上記の樹脂系は硬化時間が長く
(例えば、150℃、3時間)、パッケージ生産性とい
う観点からは問題であった。硬化におけるゲル化時間が
長いためフィラーの沈降が起こり、硬化物表面に樹脂成
分の多い層ができ、T/C試験において厳しい条件では、
硬化物表面の線膨張係数の増加に伴う表面クラックの発
生が起こることもあった。また硬化時間を短くするため
に、硬化促進剤の添加が考えられ、その例としてはフェ
ノール類が挙げられるが、可使時間が短くなりすぎ、極
端に作業性が悪くなる等の欠点があった。
However, the above-mentioned resin system has a long curing time (for example, 150 ° C., 3 hours), and is problematic from the viewpoint of package productivity. Filler sedimentation occurs due to the long gelation time during curing, and a layer containing a large amount of resin components is formed on the surface of the cured product. Under severe conditions in the T / C test,
In some cases, surface cracks were generated with an increase in the coefficient of linear expansion of the surface of the cured product. Further, in order to shorten the curing time, addition of a curing accelerator may be considered, and examples thereof include phenols, but there are drawbacks such as the pot life is too short and the workability is extremely deteriorated. .

【0006】[0006]

【発明が解決しようとする課題】半導体素子等を封止す
る液状封止樹脂組成物において、可使時間を損なわず
に、従来に比べ短時間に硬化が可能であり、且つ信頼性
も従来樹脂系と同じ特性を有する液状封止樹脂組成物を
提供する。
SUMMARY OF THE INVENTION In a liquid sealing resin composition for sealing a semiconductor element or the like, the resin can be cured in a shorter time than before without impairing the pot life and the reliability of the conventional resin can be improved. A liquid sealing resin composition having the same properties as the system is provided.

【0007】[0007]

【課題を解決するための手段】そこで本発明者らは、従
来のこのような問題を解決するために鋭意検討を重ねて
きた結果、液状エポキシ樹脂、常温で液体である芳香族
アミン系硬化剤に水酸基を有するイミダゾールを添加す
ることにより、可使時間を損なわずに、従来に比べ短時
間に硬化が可能であり、且つ信頼性も従来樹脂系と同じ
特性を有することを見出し、本発明を完成させるに至っ
たものである。
The inventors of the present invention have conducted intensive studies in order to solve the conventional problems as described above. As a result, liquid epoxy resins and aromatic amine-based curing agents which are liquid at ordinary temperature have been developed. By adding imidazole having a hydroxyl group to the above, it has been found that curing can be performed in a shorter time than before without impairing the pot life, and that the reliability has the same properties as those of the conventional resin system. It has been completed.

【0008】つまり、(A)平均エポキシ基が2以上の
液状エポキシ樹脂、(B)常温で液体である芳香族アミ
ン系硬化剤、(C)水酸基を有するイミダゾール類、
(D)シリカからなる液状封止樹脂組成物である。更に
好ましい形態としては、該芳香族アミン系硬化剤がアル
キル化ジアミノジフェニルメタンであり、該液状エポキ
シ樹脂の50重量%以上が、25℃における粘度が10
PA・s以下のエポキシ樹脂であり、液状エポキシ樹脂と芳
香族アミン系硬化剤との配合モル比が、1.1〜1.3
の範囲で液状エポキシ樹脂の方が多く配合されている液
状封止樹脂組成物である。また、半導体素子が上記の液
状封止樹脂組成物を用いて封止された半導体装置であ
る。
That is, (A) a liquid epoxy resin having an average epoxy group of 2 or more, (B) an aromatic amine-based curing agent which is liquid at ordinary temperature, (C) an imidazole having a hydroxyl group,
(D) A liquid sealing resin composition comprising silica. In a more preferred embodiment, the aromatic amine-based curing agent is an alkylated diaminodiphenylmethane, and at least 50% by weight of the liquid epoxy resin has a viscosity at 25 ° C of 10%.
An epoxy resin of PA · s or less, wherein the mixing molar ratio of the liquid epoxy resin and the aromatic amine-based curing agent is 1.1 to 1.3.
The liquid sealing resin composition contains a larger amount of the liquid epoxy resin in the range described above. Further, the present invention is a semiconductor device in which a semiconductor element is sealed using the above liquid sealing resin composition.

【0009】[0009]

【発明の実施の態様】本発明に用いられる(A)液状エ
ポキシ樹脂は、一分子当たりエポキシ基を平均二個以上
有するものであり、その成分の50重量%以上は、25
℃における粘度が10PA・s以下のエポキシ樹脂であるこ
とが好ましい。エポキシ樹脂成分の50重量%以上が低
粘度の液状エポキシでないと組成物の粘度が高くなり、
パッケージ中を液状封止材料で流入封止する際、気泡を
巻き込んだり、コーナー端部への充填不良が発生し易く
なり信頼性低下につながるので好ましくない。
BEST MODE FOR CARRYING OUT THE INVENTION The liquid epoxy resin (A) used in the present invention has an average of two or more epoxy groups per molecule, and 50% by weight or more of the component is 25% by weight.
It is preferable that the epoxy resin has a viscosity at 10 ° C. of 10 PA · s or less. Unless 50% by weight or more of the epoxy resin component is a low-viscosity liquid epoxy, the viscosity of the composition increases,
When the inside of the package is sealed with a liquid sealing material, bubbles are entangled and poor filling of corner ends is apt to occur, leading to a reduction in reliability, which is not preferable.

【0010】ここでエポキシ樹脂の粘度測定方法は、2
5℃において東機産業(株)・製E型粘度計で測定する。
この要件を満足するエポキシ樹脂であれば、特に限定さ
れるものではないが、具体例をあげると、ビスフェノー
ルAジグリシジルエーテル型エポキシ、ビスフェノール
Fジグリシジルエーテル型エポキシ、ビスフェノールS
ジグリシジルエーテル型エポキシ、3,3',5,5'-テトラメ
チル4,4'-ジヒドロキシビフェニルジグリシジルエーテ
ル型エポキシ、4,4'-ジヒドロキシビフェニルジグリシ
ジルエーテル型エポキシ、1,6-ジヒドロキシビフェニル
ジグリシジルエーテル型エポキシ、フェノールノボラッ
ク型エポキシ、臭素型クレゾールノボラック型エポキ
シ、ビスフェノールDジグリシジルエーテル型エポキ
シ、1,6ナフタレンジオールのグリシジルエーテル、ア
ミノフェノール類のトリグリシジルエーテル等がある。
これらは単独又は混合して用いても差し支えない。ま
た、信頼性の優れた液状封止材料を得るために、エポキ
シ樹脂のNa+、Cl-等のイオン性不純物はできるだけ少な
いものが好ましい。
The method for measuring the viscosity of the epoxy resin is as follows.
It is measured at 5 ° C. with an E-type viscometer manufactured by Toki Sangyo Co., Ltd.
There is no particular limitation as long as the epoxy resin satisfies these requirements, but specific examples include bisphenol A diglycidyl ether type epoxy, bisphenol F diglycidyl ether type epoxy, and bisphenol S
Diglycidyl ether epoxy, 3,3 ', 5,5'-tetramethyl 4,4'-dihydroxybiphenyl diglycidyl ether epoxy, 4,4'-dihydroxybiphenyl diglycidyl ether epoxy, 1,6-dihydroxybiphenyl There are diglycidyl ether type epoxy, phenol novolak type epoxy, bromine type cresol novolak type epoxy, bisphenol D diglycidyl ether type epoxy, glycidyl ether of 1,6 naphthalene diol, triglycidyl ether of aminophenols and the like.
These may be used alone or as a mixture. Further, in order to obtain a liquid sealing material having excellent reliability, it is preferable that the ionic impurities such as Na + and Cl of the epoxy resin are as small as possible.

【0011】本発明に用いられる(B)芳香族アミン系
硬化剤は、常温で液状のものであり、好ましくはアルキ
ル化ジアミノジフェニルメタンである。芳香環を有さな
いアミン類は耐熱性に乏しく、零度以下の雰囲気下でも
反応性に富むため保存性に劣るという致命的な欠点を有
し本発明に適さない。アルキル化ジアミノジフェニルメ
タンは入手が容易であり、性状として常温で液状であ
り、冷凍保存時でも結晶化しないため好ましい。その例
としては、エチル化ジアミノジフェニルメタン、メチル
化ジアミノジフェニルメタン等をあげることが出来る。
また、信頼性の優れた液状封止材料を得るために、アミ
ン系硬化剤のNa+、Cl-等のイオン性不純物はできるだけ
少ないものが好ましい。芳香族アミン系硬化剤は液状エ
ポキシ樹脂との組み合わせによって、非常に流動性が良
い材料を提供することができる。無圧下でパッケージ内
に流入し硬化させても、気泡が残らず、ボイド・未充填
など流動性の不具合も発生しにくい。
The aromatic amine curing agent (B) used in the present invention is a liquid at room temperature, and is preferably an alkylated diaminodiphenylmethane. Amines having no aromatic ring are poor in heat resistance and have a fatal drawback of poor storage stability because they are highly reactive even in an atmosphere of zero degree or less, and are not suitable for the present invention. Alkylated diaminodiphenylmethane is preferable because it is easily available, is liquid at room temperature as a property, and does not crystallize even during frozen storage. Examples thereof include ethylated diaminodiphenylmethane, methylated diaminodiphenylmethane and the like.
In addition, in order to obtain a liquid sealing material having excellent reliability, it is preferable that ionic impurities such as Na + and Cl of an amine-based curing agent are as small as possible. The aromatic amine-based curing agent can provide a material having very good fluidity in combination with the liquid epoxy resin. Even when flowing into the package under no pressure and curing, no air bubbles remain, and problems with fluidity such as voids and unfilling hardly occur.

【0012】主剤であるエポキシ樹脂と、硬化剤である
芳香族アミン系硬化剤との配合モル比は0.9〜1.5が望ま
しい。0.9未満の場合は、過剰に未反応のアミノ基が残
存することとなり、耐湿性の低下・信頼性の低下に繋が
る。逆に1.5を越えると硬化が不十分となり、信頼性の
低下に繋がる。 更に好ましくは上記配合比において1.1
〜1.3であり、エポキシ樹脂が過剰であることである。
これは、イミダゾールが硬化温度にて単独にエポキシ樹
脂と反応するためである。
The compounding molar ratio of the epoxy resin as the main component and the aromatic amine-based curing agent as the curing agent is preferably 0.9 to 1.5. When it is less than 0.9, an unreacted amino group remains excessively, which leads to a decrease in moisture resistance and a decrease in reliability. Conversely, if it exceeds 1.5, curing will be insufficient, leading to a decrease in reliability. More preferably in the above mixing ratio 1.1
1.31.3, which means that the epoxy resin is excessive.
This is because imidazole reacts alone with the epoxy resin at the curing temperature.

【0013】(C)水酸基を有するイミダゾールとして
は、例えば、2−フェニル−4,5−ジヒドロキシメチ
ルイミダゾール、2−フェニル−4−メチル−5−ヒド
ロキシメチルイミダゾール等をあげることができる。
(C) Examples of the imidazole having a hydroxyl group include 2-phenyl-4,5-dihydroxymethylimidazole and 2-phenyl-4-methyl-5-hydroxymethylimidazole.

【0014】(D)シリカとしては、例えば、結晶シリ
カ、溶融シリカ等が用いられる。形状は一般に球状、破
砕状、フレーク状等があるが、充填材をより多く添加す
ることにより線膨張係数の低減化が図られ、その効果を
あげるためには球状の無機充填材が最も良い。添加量
は、最終硬化物に対し、60wt%〜90wt%が望ましい。60
wt%未満だと、硬化物の線膨張係数が大きくなり、硬化
後のパッケージへの応力蓄積やT/C試験での樹脂クラッ
クを起こす恐れがある。一方、90wt%を越えると結果と
して得られる液状封止樹脂組成物の粘度が高くなり過
ぎ、実用レベルではないため好ましくない。
As the silica (D), for example, crystalline silica, fused silica and the like are used. The shape generally has a spherical shape, a crushed shape, a flake shape, etc., but the linear expansion coefficient can be reduced by adding more filler, and a spherical inorganic filler is best for improving the effect. The addition amount is desirably 60 wt% to 90 wt% based on the final cured product. 60
When the content is less than wt%, the coefficient of linear expansion of the cured product becomes large, and there is a possibility that the resin may accumulate in the package after curing and crack in the T / C test. On the other hand, if it exceeds 90% by weight, the viscosity of the resulting liquid encapsulating resin composition becomes too high, which is not a practical level.

【0015】また充填材の粒度分布を調整することによ
り粘度等の流動特性を最大限に引き出す事が可能であ
る。一般に分布範囲の広い粒度分布をもつ充填材ほど、
大きな粒径をもつ充填材ほど粘度が低くなる傾向がある
ことが知られている。しかし、低粘度化を目的に例えば
50μm以上の大きな粒径だけを揃えた充填材は、確実に
粘度は低くなるものの、硬化中に比重の比較的重い充填
材が沈み、硬化物の上下で組成比率の異なる、いわゆる
フィラー沈降が発生する。また、粒径の大きな充填材を
使うデメリットとして、狭い隙間に流入しないという点
が挙げられる。PPGA型パッケージに代表されるよう
に、多ピン化省スペース化のパッケージの傾向にあっ
て、一例としてワイヤー・ワイヤー間のピッチが最近狭
くなってきている。このような傾向にあり無圧下で液状
封止材料を流入し、ボイド・未充填など流動性の不具合
がないよう成形するために、充填材の粒径を小さくしな
ければならない。しかし粒径を小さくすることによって
流動性が損なわれる不具合も多くなる。
The flow characteristics such as viscosity can be maximized by adjusting the particle size distribution of the filler. In general, fillers with a broad particle size distribution,
It is known that a filler having a larger particle size tends to have a lower viscosity. However, for the purpose of lowering the viscosity, for example,
Fillers that have only a large particle size of 50 μm or more have a lower viscosity, but a relatively heavy filler sinks during curing, causing so-called filler sedimentation, in which the composition ratio differs between the top and bottom of the cured product. I do. A disadvantage of using a filler having a large particle size is that it does not flow into a narrow gap. As represented by a PPGA type package, there is a tendency for packages to be multi-pin and space-saving, and as an example, the pitch between wires has recently become narrower. In order to allow the liquid sealing material to flow under no pressure and to be formed without any fluidity defects such as voids and unfilled, the particle size of the filler must be reduced. However, when the particle size is reduced, the problem that the fluidity is impaired increases.

【0017】そこで充填材の平均粒径を3〜10μmと、
従来の液状封止材料のそれより小さくし、かつ粒径30μ
m 以上のものが全充填材成分中の25重量%以下と粒径
を小さくすることにより、流動性も損なわない。また1
μm以下のものが全充填材成分中6〜45重量%と、微粒
の充填材を適量入れ、粒度分布を調整することで、硬化
時に微粒の充填材が沈みやすい充填材の沈降を抑えるこ
とができる。
Therefore, the average particle diameter of the filler is 3 to 10 μm,
Smaller than that of conventional liquid encapsulation materials, and particle size 30μ
The flowability is not impaired by reducing the particle size to 25% by weight or less in the total filler component of those having m or more. Also one
By setting the particle size distribution to 6-45% by weight of the total filler component and the appropriate amount of fine particles, and adjusting the particle size distribution, it is possible to suppress the sedimentation of the filler, which tends to sink during curing. it can.

【0018】本発明の液状封止樹脂組成物には、前記の
必須成分の他に必要に応じて、希釈剤、顔料、カップリ
ング剤、難燃剤、レベリング剤、消泡剤等の添加物を用
いても差し支えない。液状封止材料は、各成分、添加物
等を3本ロールにて分散混練し、真空下で脱泡処理して
製造する。本発明の液状封止樹脂組成物は従来の樹脂と
比較して短時間で硬化が可能であるため、各種の半導体
素子をこの樹脂を用いて封止すると生産性のよい半導体
装置を生産することができる。更にこの樹脂の特性は従
来の樹脂と同じであるため、従来と同様の信頼性の高い
半導体装置を製造することができる。半導体装置の製造
方法は従来の公知の方法を使用できる。
The liquid sealing resin composition of the present invention may further contain, if necessary, additives such as a diluent, a pigment, a coupling agent, a flame retardant, a leveling agent, and an antifoaming agent, in addition to the above essential components. You can use it. The liquid sealing material is manufactured by dispersing and kneading each component, additive, and the like with three rolls, and performing a defoaming treatment under vacuum. Since the liquid encapsulating resin composition of the present invention can be cured in a shorter time than conventional resins, it is possible to produce a semiconductor device with good productivity by sealing various semiconductor elements using this resin. Can be. Further, since the characteristics of this resin are the same as those of the conventional resin, a highly reliable semiconductor device similar to the conventional one can be manufactured. As a method for manufacturing a semiconductor device, a conventionally known method can be used.

【0019】[0019]

【実施例】以下本発明を以下に示す実施例及び比較例で
説明する。 <実施例1>ビスフェノールF型エポキシ樹脂(当量17
0、3.0Pa・s @25C)100重量部、アルキル化ジアミノジフ
ェニルメタンとしてエチル化ジアミノジフェニルメタン
(カヤハ―ト゛A-A、日本化薬社製、当量65)38重量部、イミ
ダゾール類として2−フェニル−4,5−ジヒドロキシ
メチルイミダゾール1.2重量部、低応力成分としてエポ
キシ化ポリブタジエンゴム5重量部、密着性助剤として
γ-グリシジルトリメトキシシラン6重量部、平均粒径
6μm、最大粒径50μmの球状シリカ350重量部、
希釈剤として、ブチルセロソルブアセテート5重量部、
カーボンブラック1重量部を秤量し、上記の原材料を3
本ロールにて、分散混練し真空下脱泡処理をして液状封
止材料を得た。次に、得られた液状封止樹脂組成物を用
いて以下の試験を行った。
The present invention will be described below with reference to the following examples and comparative examples. <Example 1> Bisphenol F type epoxy resin (equivalent weight 17
0, 3.0 Pa · s @ 25C) 100 parts by weight, ethylated diaminodiphenylmethane (Kayahart AA, Nippon Kayaku Co., equivalent 65) as alkylated diaminodiphenylmethane, 38 parts by weight, 2-phenyl-4 as imidazoles 1.2 parts by weight of 5-dihydroxymethylimidazole, 5 parts by weight of epoxidized polybutadiene rubber as a low stress component, 6 parts by weight of γ-glycidyltrimethoxysilane as an adhesion aid, 350 parts by weight of spherical silica having an average particle diameter of 6 μm and a maximum particle diameter of 50 μm Department,
5 parts by weight of butyl cellosolve acetate as a diluent,
Weigh 1 part by weight of carbon black, and add 3 parts
With this roll, the mixture was dispersed and kneaded and subjected to a defoaming treatment under vacuum to obtain a liquid sealing material. Next, the following tests were performed using the obtained liquid sealing resin composition.

【0020】1)粘度;E型粘度計(@25C)にて、2.5rpm
で測定したものを値とした。 2)保存性;25℃にて樹脂を保存し上記測定条件で2
4時間後の粘度を測定しその変化率を調べた。 3)ゲルタイム;170℃のホットプレートに0.5ccの
液状封止樹脂組成物を滴下し、スハ゜チュラで攪拌して糸引き
が切れるところでゲルタイムとした。 4)接着性;ソルダーレジスト(太陽インキ社製、PSR4
000AUS05/CA-40AUS2)が塗布されたガラス−エポキシ
基板に液状封止樹脂組成物を塗布し、上から6x6mmのチ
ップをマウントし、150℃、1時間硬化させ、200℃
のホットプレートに載置しタ゛イシェア―強度を測定した。
1) Viscosity: 2.5 rpm using an E-type viscometer (@ 25C)
The value measured in was used as a value. 2) Storage property: The resin was stored at 25 ° C.
After 4 hours, the viscosity was measured and the rate of change was examined. 3) Gel time; 0.5 cc of the liquid sealing resin composition was dropped on a hot plate at 170 ° C. and stirred with a stapler to obtain a gel time where the stringing was broken. 4) Adhesion; solder resist (manufactured by Taiyo Ink, PSR4
000AUS05 / CA-40AUS2) The liquid sealing resin composition is applied to the glass-epoxy substrate coated with, and a 6x6 mm chip is mounted from above, cured at 150 ° C for 1 hour, and then cured at 200 ° C.
The sample was placed on a hot plate, and the shear shear strength was measured.

【0021】5)信頼性−1、2;BT基板製の15mm角
のシリコンチップがマウントされたBGA基板に液状封
止樹脂組成物を塗布し(キャヒ゛ティサイス゛:25mmx25mmx1mm
t)、150℃、1時間硬化させ、テストピースを作製
した。次に、以下の処理を行い超音波探傷機(以下、S
ATという)にて、半導体チップとプリント基板界面と
の剥離、クラックの有無を確認した。 PCT処理(1
25℃/2.3atm)を196時間処理した後、又はT/
C処理(−65℃/30分←→150℃/30分)100
0サイクルを施して、それぞれの試験においてSATに
て半導体チップとプリント基板界面との剥離、クラック
の有無を確認した。試験に用いたサンプル数はそれぞれ
10個である。
5) Reliability-1, 2; A liquid sealing resin composition is applied to a BGA substrate on which a 15 mm square silicon chip made of a BT substrate is mounted (cavity size: 25 mm × 25 mm × 1 mm).
t), cured at 150 ° C. for 1 hour to prepare a test piece. Next, the following processing is performed to perform an ultrasonic flaw detector (hereinafter, S
AT), the presence or absence of peeling and cracking between the semiconductor chip and the printed board interface was confirmed. PCT processing (1
25 ° C./2.3 atm) for 196 hours or T /
C treatment (-65 ℃ / 30min ← → 150 ℃ / 30min) 100
0 cycles were performed, and in each test, the presence or absence of peeling and cracking between the semiconductor chip and the printed board interface was confirmed by SAT. The number of samples used for the test is 10 each.

【0022】6)信頼性−3;上記の信頼性1で作製し
たテストピース10個を30℃、60%RHの湿度処理
を施したのち、IRリフロー(最大温度240℃)に2
回処理した後、SATにて剥離、クラックの有無を確認
した。 7)フィラー沈降;上記条件で硬化させ、厚み1mm硬化
物を作製し断面を電子顕微鏡でフィラー沈降性を調べ
た。測定は、樹脂成分の多い層とフィラーが存在する層
の濃淡の違いからその境界と硬化物表面までの距離を測
定した値を用いた。
6) Reliability-3: Ten test pieces manufactured in reliability 1 described above were subjected to a humidity treatment at 30 ° C. and 60% RH, and then subjected to IR reflow (maximum temperature 240 ° C.).
After the treatment, the presence or absence of peeling and cracking was confirmed by SAT. 7) Filler sedimentation: The composition was cured under the above conditions to prepare a cured product having a thickness of 1 mm, and the section was examined for filler sedimentation by an electron microscope. For the measurement, a value obtained by measuring the distance from the boundary between the layer having a large amount of the resin component and the layer containing the filler to the boundary thereof and the surface of the cured product was used.

【0023】<実施例2>実施例1のイミダゾール類
を、2−フェニル−4−メチル−5−ヒドロキシメチル
イミダゾールとした以外は実施例1と同様にして液状封
止樹脂組成物を得た。次に、得られた液状封止樹脂組成
物を用いて実施例1と同様の試験を行った。
Example 2 A liquid sealing resin composition was obtained in the same manner as in Example 1 except that the imidazoles of Example 1 were changed to 2-phenyl-4-methyl-5-hydroxymethylimidazole. Next, the same test as in Example 1 was performed using the obtained liquid sealing resin composition.

【0024】<比較例1>実施例1のイミダゾール類を
除いた以外は実施例1と同様にして液状封止樹脂組成物
を得た。次に、得られた液状封止樹脂組成物を用いて実
施例1と同様の試験を行った。 <比較例2>実施例1のイミダゾール類の代わりにビス
フェノールAを2重量部とした以外は実施例1と同様に
して液状封止樹脂組成物を得た。次に、得られた液状封
止樹脂組成物を用いて実施例1と同様の試験を行った。 <比較例3>実施例1のイミダゾール類の代わりに2-
フェニル4-メチルイミダゾールを0.5重量部とした
以外は実施例1と同様にして液状封止樹脂組成物を得
た。次に、得られた液状封止樹脂組成物を用いて実施例
1と同様の試験を行った。
Comparative Example 1 A liquid encapsulating resin composition was obtained in the same manner as in Example 1 except that the imidazoles of Example 1 were omitted. Next, the same test as in Example 1 was performed using the obtained liquid sealing resin composition. <Comparative Example 2> A liquid sealing resin composition was obtained in the same manner as in Example 1 except that bisphenol A was used in an amount of 2 parts by weight instead of the imidazoles of Example 1. Next, the same test as in Example 1 was performed using the obtained liquid sealing resin composition. <Comparative Example 3> Instead of the imidazoles of Example 1, 2-
A liquid sealing resin composition was obtained in the same manner as in Example 1 except that phenyl 4-methylimidazole was used in an amount of 0.5 part by weight. Next, the same test as in Example 1 was performed using the obtained liquid sealing resin composition.

【0025】測定した結果を表1に示す。Table 1 shows the measurement results.

【表1】 [Table 1]

【0026】[0026]

【発明の効果】本発明の液状封止樹脂組成物は、保存性
を維持しつつ硬化時間を短縮する事ができ、信頼性に関
してもフィラー沈降を起こさないため特にT/C試験にお
いて大きな改善をはかることができる。また、この様な
液状封止樹脂組成物を用いて、半導体素子を封止する
と、生産性が高くかつ信頼性の大きい半導体装置を得る
ことが出来る。
The liquid encapsulating resin composition of the present invention can shorten the curing time while maintaining the storage stability, and does not cause filler sedimentation in terms of reliability. Can be measured. When a semiconductor element is sealed using such a liquid sealing resin composition, a semiconductor device with high productivity and high reliability can be obtained.

フロントページの続き Fターム(参考) 4J002 CD031 CD041 CD051 CD061 CD111 CD121 CD131 DJ018 EN036 EU117 FA018 FA088 FD018 FD146 FD157 GJ02 GQ01 4J036 AA01 AC01 AD01 AD04 AD07 AD08 AD20 AF01 AF06 AF08 AF10 DA05 DC02 DC03 DC10 DC41 DC43 FA05 JA07 4M109 AA01 BA04 CA05 EA02 EB02 EB04 EB06 EB07 EB08 EB09 EB13 EB18 EC14 EC20 Continued on the front page F-term (reference) 4J002 CD031 CD041 CD051 CD061 CD111 CD121 CD131 DJ018 EN036 EU117 FA018 FA088 FD018 FD146 FD157 GJ02 GQ01 4J036 AA01 AC01 AD01 AD04 AD07 AD08 AD20 AF01 AF06 AF08 AF10 DA05 DC04 DC43 DC10 DC04 CA05 EA02 EB02 EB04 EB06 EB07 EB08 EB09 EB13 EB18 EC14 EC20

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 (A)平均エポキシ基が2以上の液状エ
ポキシ樹脂、(B)常温で液体である芳香族アミン系硬
化剤、(C)水酸基を有するイミダゾール類、(D)シ
リカからなることを特徴とする液状封止樹脂組成物。
1. An epoxy resin composition comprising: (A) a liquid epoxy resin having an average epoxy group of 2 or more; (B) an aromatic amine-based curing agent which is liquid at room temperature; (C) an imidazole having a hydroxyl group; and (D) silica. The liquid sealing resin composition characterized by the above-mentioned.
【請求項2】 該芳香族アミン系硬化剤がアルキル化ジ
アミノジフェニルメタンである請求項1記載の液状封止
樹脂組成物。
2. The liquid sealing resin composition according to claim 1, wherein the aromatic amine curing agent is an alkylated diaminodiphenylmethane.
【請求項3】 該液状エポキシ樹脂の50重量%以上
が、25℃における粘度が10PA・s以下の液状エポキシ
樹脂である請求項1記載の液状封止樹脂組成物。
3. The liquid sealing resin composition according to claim 1, wherein 50% by weight or more of the liquid epoxy resin is a liquid epoxy resin having a viscosity at 25 ° C. of 10 PA · s or less.
【請求項4】 該液状エポキシ樹脂と該芳香族アミン系
硬化剤との配合モル比が、1.1〜1.3の範囲で該液
状エポキシ樹脂の方が多く配合されている請求項1記載
の液状封止樹脂組成物。
4. The liquid epoxy resin according to claim 1, wherein the molar ratio of the liquid epoxy resin to the aromatic amine-based curing agent is in the range of 1.1 to 1.3. Liquid sealing resin composition.
【請求項5】 半導体素子を請求項1記載の液状封止樹
脂組成物を用いて封止された半導体装置。
5. A semiconductor device in which a semiconductor element is sealed using the liquid sealing resin composition according to claim 1.
JP11145758A 1999-05-26 1999-05-26 Liquid sealing resin composition and semiconductor device using the composition Pending JP2000336244A (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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JP2000336244A true JP2000336244A (en) 2000-12-05

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Country Link
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Cited By (7)

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Publication number Priority date Publication date Assignee Title
JP2006143837A (en) * 2004-11-18 2006-06-08 Sumitomo Bakelite Co Ltd Liquid sealing resin composition for semiconductor and semiconductor device using the composition
JP2006199886A (en) * 2005-01-24 2006-08-03 Sumitomo Bakelite Co Ltd Liquid sealing resin composition
WO2007066763A1 (en) * 2005-12-08 2007-06-14 Hitachi Chemical Co., Ltd. Liquid resin composition for electronic element and electronic element device
JP2007182560A (en) * 2005-12-08 2007-07-19 Hitachi Chem Co Ltd Liquid resin composition for electronic component and electronic component device using the same
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JP4496932B2 (en) * 2004-11-18 2010-07-07 住友ベークライト株式会社 Liquid encapsulating resin composition for semiconductor and semiconductor device using the same
JP2006143837A (en) * 2004-11-18 2006-06-08 Sumitomo Bakelite Co Ltd Liquid sealing resin composition for semiconductor and semiconductor device using the composition
JP2006199886A (en) * 2005-01-24 2006-08-03 Sumitomo Bakelite Co Ltd Liquid sealing resin composition
KR101044132B1 (en) 2005-12-08 2011-06-24 히다치 가세고교 가부시끼가이샤 Liquid resin composition for electronic element and electronic element device
JP2007182562A (en) * 2005-12-08 2007-07-19 Hitachi Chem Co Ltd Liquid resin composition for electronic element and electronic element device
JP2007182560A (en) * 2005-12-08 2007-07-19 Hitachi Chem Co Ltd Liquid resin composition for electronic component and electronic component device using the same
WO2007066763A1 (en) * 2005-12-08 2007-06-14 Hitachi Chemical Co., Ltd. Liquid resin composition for electronic element and electronic element device
US7981977B2 (en) 2005-12-08 2011-07-19 Hitachi Chemical Co., Ltd. Sealant for electronics of epoxy resin, aromatic amine, accelerator and inorganic filler
JP2013064152A (en) * 2005-12-08 2013-04-11 Hitachi Chemical Co Ltd Liquid resin composition for electronic component, and electronic component device using the same
KR20140031135A (en) * 2012-09-03 2014-03-12 아지노모토 가부시키가이샤 Cured product, laminate, printed circuit board, and semiconductor device
JP2014062230A (en) * 2012-09-03 2014-04-10 Ajinomoto Co Inc Cured body, laminate, printed circuit board and semiconductor device
JP2018104717A (en) * 2012-09-03 2018-07-05 味の素株式会社 Cured body, laminate, printed wiring board and semiconductor device
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