JP2000332384A - Transfer sheet and pattern forming method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To realize a transfer sheet capable of forming a high-definition electrode position and a pattern forming method for forming an electrode pattern easily at a high precision. SOLUTION: A transfer layer 3 containing at least an inorganic component containing a conductive powder and glass frit and an organic component containing a baking and removable photosensitive resin composition is peelably formed on one surface of a base film 2, at least one of ultraviolet absorbents and coloring agents is contained in either the transfer layer or the base film to form a transfer sheet, the transfer layer of the transfer sheet is compression- bonded to a substrate and exposed with desired pattern from the base film side, the base film is peeled off, and it is developed and baked to remove the organic component, thereby forming an electrode pattern.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a transfer sheet and a pattern forming method for forming an electrode pattern with high accuracy.

[0002]

2. Description of the Related Art In recent years, plasma display panels (P
It is required that the formation of an electrode pattern in DP) or the like can be performed with higher accuracy and at a low manufacturing cost. Conventionally, formation of an electrode pattern in a PDP is performed by:
It has been performed by a printing method or the like in which a predetermined pattern is formed by a printing method such as screen printing or offset printing using a pattern forming paste containing a conductive powder, and dried and fired.

[0003] However, the above printing method is expected to simplify the process and reduce the manufacturing cost. However, the screen printing method has a limitation in printing accuracy due to elongation of a mesh material constituting a screen printing plate. There is a problem that meshes are formed in the formed pattern or bleeding of the pattern occurs, and the surface condition of the pattern is poor. Further, in the offset printing method, as the number of printings increases, the pattern forming paste is not completely transferred to the substrate but remains on the blanket, and the layer thickness and the accuracy of the pattern are reduced. Therefore, it is necessary to replace the blanket at any time to prevent the blanket residue of the paste and to maintain the pattern accuracy, and there has been a problem that the operation is extremely complicated.

[0004]

In order to solve such a problem, a transfer layer is provided on a base film by using a photosensitive resin composition for forming an electrode pattern or the like so as to be peelable. There is a method of forming an electrode pattern and the like by thermally transferring a transfer layer to a transfer target body using a transfer sheet and then firing.

However, the transfer layer thermally transferred to the transfer object contains more organic binder components such as a resin and a plasticizer for imparting transferability than the film formed by the above-described printing method, so that dust is generated. It is easy to adhere, and once dust adheres, it is difficult to remove it by air blow or the like, which has hindered improvement in manufacturing yield.

[0006] Therefore, after the transfer layer of the transfer sheet is pressed against the object to be transferred, the base film is not peeled off, the transfer layer is exposed through the base film, and then the base film is peeled off and developed. Then, it is conceivable to form an electrode pattern by firing. However, the above-mentioned transfer layer exhibits a property of easily reflecting irradiated light due to the action of the contained metal fine powder. The scattered light generated by the reflection on the transfer layer travels along the interface between the base film and the transfer layer, but since there is almost no oxygen here, the capture of radicals by oxygen does not occur,
Therefore, the reaction of the transfer layer due to the scattered light proceeds. Therefore, the line width of the formed electrode pattern is increased, and it is difficult to form a highly accurate electrode pattern.

The present invention has been made in view of the above circumstances, and a transfer sheet capable of forming a high-definition electrode pattern, and a pattern forming method for easily forming an electrode pattern with high accuracy. The purpose is to provide.

[0008]

In order to achieve the above object, a transfer sheet of the present invention comprises a base film,
A transfer layer provided releasably on one surface of the base film, wherein the transfer layer comprises an inorganic component containing a conductive powder and a glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. And at least one of the transfer layer and the base film contains at least one of an ultraviolet absorber and a colorant.

The transfer sheet of the present invention is configured so that the transfer layer contains a polymerization terminator.

[0010] The transfer sheet of the present invention comprises a base film, a light absorbing layer provided on one surface of the base film, and a transfer layer releasably formed on the light absorbing layer. The absorbing layer contains at least one of an ultraviolet absorber and a coloring agent, and the transfer layer contains at least an inorganic component containing a conductive powder, a glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. Configuration.

[0011] The transfer sheet of the present invention comprises a base film, a baking-removable light-absorbing layer releasably provided on one surface of the base film, and a transfer layer formed on the light-absorbing layer. The light absorbing layer contains at least one of an ultraviolet absorber and a coloring agent, and the transfer layer contains an inorganic component containing conductive powder and glass frit and an organic component containing a photosensitive resin composition that can be removed by firing. Are contained at least.

Further, the transfer sheet of the present invention is configured such that at least one of the transfer layer and the base film contains at least one of an ultraviolet absorber and a colorant.

Further, the transfer sheet of the present invention is configured such that the transfer layer contains a polymerization terminator.

Further, the transfer sheet of the present invention has a structure in which a light-absorbing back layer containing at least one of an ultraviolet absorber and a colorant is provided on the other surface of the base film.

In the pattern forming method of the present invention, the transfer layer is pressed on a substrate using the above-described transfer sheet, the transfer layer is exposed in a desired pattern from the base film side, and then the base film is peeled. And developed and baked to remove organic components.

Further, according to the pattern forming method of the present invention, the transfer layer is pressure-bonded on a substrate using the above-described transfer sheet, and the light absorbing layer containing at least one of an ultraviolet absorber and a coloring agent from the base film side. The transfer layer was exposed in a desired pattern through a film, and then the base film was peeled off, developed, and baked to remove organic components.

In the present invention as described above, light irradiated on the transfer sheet from the base film side passes through the base film and reaches the transfer layer, but the transfer sheet such as a transfer layer containing conductive powder. The scattered light reflected inside is absorbed by the ultraviolet absorber and colorant contained in the transfer sheet, so it is prevented from diffusing out of the irradiation site along the interface between the base film and the transfer layer Is done.

[0018]

Embodiments of the present invention will be described below with reference to the drawings. First Embodiment Figure 1 of a transfer sheet is a schematic sectional view showing an embodiment of a transfer sheet of the present invention. In FIG. 1, a transfer sheet 1 includes a base film 2, a transfer layer 3 provided releasably on the base film 2, and a protective film 4 provided releasably on the transfer layer 3. I have. The transfer layer 3 contains at least an inorganic component containing a conductive powder and a glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. At least one of the base film 2 and the transfer layer 3 contains at least one of an ultraviolet absorber and a colorant. Further, the transfer layer 3 may include a polymerization terminator.

Such a transfer sheet 1 may be in the form of a sheet or a long sheet. In the case of the long sheet, the transfer sheet 1 can be in the form of a roll wound around a core. The core used is ABS resin to prevent generation of dust and paper dust,
A core formed of a vinyl chloride resin, bakelite, or the like, a paper tube impregnated with the resin, or the like is preferable.

Next, the configuration of the transfer sheet 1 will be described. (Base Film) The base film 2 constituting the transfer sheet 1 is stable with respect to the ink composition when forming the transfer layer 3 and has transparency to light used for exposing the transfer layer 3. In addition, a material that is flexible and does not significantly deform under tension or pressure is used.

As a material to be used, first, a resin film can be used. Specific examples of the resin film include a polyethylene film, an ethylene-vinyl acetate copolymer film, an ethylene-vinyl alcohol copolymer film, a polypropylene film, a polystyrene film, a polymethacrylate film, a polyvinyl chloride film, a polyvinyl alcohol film, and a polyvinyl film. Butyral film, nylon film, polyetherketone film, polyphenylene sulfide film, polysulfone film, polyethersulfone film, polytetrafluoroethylene-perfluoroalkylvinyl ether film, polyvinyl fluoride film, tetrafluoroethylene-ethylene film, tetrafluoroethylene -Hexafluoropropylene film, polychlorotrifluoroethylene Down film, polyvinylidene fluoride film, polyethylene terephthalate film, 1,4-polycyclohexylenedimethylene terephthalate film, polyethylene naphthalate film, a polyester film, a cellulose triacetate film, polycarbonate film,
Polyurethane film, polyimide film, polyetherimide film, film in which filler is blended with these resin materials, uniaxially or biaxially stretched film using these resin materials, flow direction using these resin materials A biaxially stretched film with a higher stretching ratio in the width direction, a biaxially stretched film with a higher stretching ratio in the flow direction than the width direction using these resin materials, and a film of the same or different type among these films Examples thereof include a combined film and a composite film formed by co-extruding the same or different resins selected from the raw material resins used for these films. Further, those obtained by treating the above resin film, for example, silicon-treated polyethylene terephthalate, corona-treated polyethylene terephthalate, silicon-treated polypropylene, corona-treated polypropylene, and the like may be used.

When a film containing at least one of an ultraviolet absorber and a colorant is used as the base film 2, a resin film formed by adding an ultraviolet absorber or a colorant to the above resin and forming a film is used. Can be.

Examples of the ultraviolet absorber used include conventionally known ultraviolet absorbers, such as azo dyes, salicylic acid dyes, aminoketone dyes, xanthene dyes, benzoate dyes, quinoline dyes, and anthraquinone dyes. Dyes, benzophenone dyes, diphenyl cyanoacrylate dyes, triazine dyes, p-aminobenzoic acid dyes, benzotriazole dyes, nickel thiocarbamate compounds, etc. One or two or more can be used. As the colorant, one or more kinds of conventionally known black pigments, black dyes, red pigments, red dyes, yellow pigments, yellow dyes and the like can be used.

The content of the ultraviolet absorber and the coloring agent in the base film 2 can be set in the range of 0.01 to 20% by weight, preferably 0.05 to 10% by weight.

The thickness of the base film 2 as described above is
It can be set in the range of 4 to 400 μm, preferably 10 to 150 μm.

(Transfer Layer) The transfer layer 3 comprises a base film containing an ink composition containing at least an inorganic component containing conductive powder and glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. 2 is formed by applying and drying by known coating means such as direct gravure coating method, gravure reverse coating method, reverse roll coating method, slide die coating method, slit die coating method, comma coating method and slit reverse coating method. be able to.

When the transfer layer 3 contains at least one of an ultraviolet absorber, a colorant, and a polymerization terminator, an ink composition containing the ultraviolet absorber, a colorant, and a polymerization terminator Can be formed by coating and drying.

As the ultraviolet absorber to be used, among the conventionally known ultraviolet absorbers, those which do not volatilize and decompose by firing and do not leave carbides in the film after firing, and include, for example, azo-based ones. Dyes, salicylic acid dyes, aminoketone dyes, xanthene dyes, benzoate dyes, quinoline dyes, anthraquinone dyes, benzophenone dyes, diphenylcyanoacrylate dyes,
Those that absorb light of 300 to 450 nm, such as a triazine dye, a p-aminobenzoic acid dye, a benzotriazole dye, and a nickel thiocarbamate compound, may be used, and one or more of these may be used.

As the coloring agent, conventionally known fire-resistant black pigments, red pigments, yellow pigments and the like can be used.

Further, the polymerization terminator is one of the conventionally known polymerization terminators which does not volatilize and decompose upon firing and does not leave carbides in the fired film. , A thiol-based compound, a nitro group-containing compound, a nickel thiocarbamate compound, or the like.

An ultraviolet absorber, a coloring agent,
The content of the polymerization terminator can be set in the range of 0.01 to 10% by weight, preferably 0.05 to 3% by weight.

(1) Inorganic component As the conductive powder, Au powder, Ag powder, Cu powder,
One or two of Ni powder, Al powder, Ag-Pd powder, etc.
More than one species can be used. The shape of the conductive powder may be various shapes such as a sphere, a plate, a lump, a cone, and a rod, but a spherical conductive powder having good dispersibility without cohesion is preferable. Average particle size is 0.05 to 10 μm
Is preferable. The content ratio of the conductive powder to the glass frit in the transfer layer 3 is such that the glass frit is 2 to 20 parts by weight, preferably 2 to 100 parts by weight of the conductive powder.
１５15 parts by weight.

For example, the glass frit has a softening temperature of 350 to 650 ° C. and a thermal expansion coefficient α ₃₀₀ of 60.
A glass frit having a ^{density of 10-7 to} 100 ^10-7 / ° C can be used. Softening temperature of glass frit is 6
If the temperature exceeds 50 ° C., it is necessary to increase the firing temperature. For example, if the heat resistance of the pattern formation target is low, thermal deformation occurs in the firing step, which is not preferable. On the other hand, if the softening temperature of the glass frit is lower than 350 ° C., the glass frit is fused before the organic components are completely decomposed, volatilized and removed by baking, which is not preferable because voids are easily formed. Furthermore, the thermal expansion coefficient α ₃₀₀ of the glass frit is 60
If it is less than × 10 ⁻⁷ / ° C. or more than 100 × 10 ⁻⁷ / ° C., the difference from the coefficient of thermal expansion of the pattern-formed body may become too large, which may cause distortion and the like. The average particle size of such a glass frit is 0.1.
A range of 1 to 10 μm is preferred. Examples of such a glass frit include Bi ₂ O ₃ , ZnO or PbO.
Can be used.

The transfer layer 3 is made of an inorganic powder such as aluminum oxide, boron oxide, silica, titanium oxide, magnesium oxide, calcium oxide, strontium oxide, barium oxide, calcium carbonate, etc., and 100 parts by weight of glass frit. To 30 parts by weight or less. Such an inorganic powder preferably has an average particle size in the range of 0.1 to 10 μm, and functions as an aggregate to prevent the pattern from being cast at the time of firing and to control the reflectance. .

(2) Organic Component The photosensitive resin composition contained in the transfer layer 3 that can be removed by firing contains at least a polymer, a monomer, and an initiator. Does not leave carbide in the film. As the polymer, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate,
n-propyl acrylate, n-propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, tert-butyl acrylate, tert-butyl methacrylate, n-pentyl acrylate, n-pentyl Methacrylate, n-hexyl acrylate, n-hexyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, n-octyl acrylate, n-octyl methacrylate, n-decyl acrylate, n-decyl methacrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, Hydroxypropyl acrylate, hydroxypropyl methacrylate, Styrene, alpha-methyl styrene,
One or more of N-vinyl-2-pyrrolidone, acrylic acid, methacrylic acid, dimer of acrylic acid (for example, M-5600 manufactured by Toagosei Co., Ltd.), 2-methacryloyloxyethyl succinate, succinic acid 2 -Acryloyloxyethyl, 2-methacryloyloxyethyl phthalate, 2-acryloyloxyethyl phthalate, 2-methacryloyloxyethyl hexahydrophthalate, 2-acryloyloxyethyl hexahydrophthalate, itaconic acid, crotonic acid, maleic acid, Examples thereof include polymers or copolymers of one or more of fumaric acid, vinyl acetic acid, and acid anhydrides thereof, and carboxyl group-containing cellulose derivatives.

Further, there may be mentioned, for example, polymers obtained by adding an ethylenically unsaturated compound having a glycidyl group or a hydroxyl group to the above-mentioned copolymer, but the invention is not limited thereto.

The molecular weight of the above polymer is from 5,000 to
300,000, preferably 30,000 to 150,0
00 range. Further, other polymers such as a methacrylate polymer, a polyvinyl alcohol derivative, an N-methyl-2-pyrrolidone polymer, a cellulose derivative, and a styrene polymer can be mixed with the above-mentioned polymer.

As the reactive monomer constituting the photosensitive resin composition, a compound having at least one polymerizable carbon-carbon unsaturated bond can be used. Specifically, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxyethylene glycol acrylate, cyclohexyl acrylate, dicyclopentanyl acrylate, 2-ethylhexyl acrylate, glycerol acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl Acrylate, isobonyl acrylate, isodexyl acrylate, isooctyl acrylate, lauryl acrylate, 2-methoxyethyl acrylate, methoxyethylene glycol acrylate,
Phenoxyethyl acrylate, stearyl acrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,5-pentanediol diacrylate, 1,6-hexanediol diacrylate, 1,3
-Propanediol acrylate, 1,4-cyclohexanediol diacrylate, 2,2-dimethylolpropane diacrylate, glycerol diacrylate,
Tripropylene glycol diacrylate, glycerol triacrylate, trimethylolpropane triacrylate, polyoxyethylated trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, ethylene oxide modified pentaerythritol triacrylate, ethylene oxide modified pentaerythritol tetra Acrylate, propylene oxide-modified pentaerythritol triacrylate, propylene oxide-modified pentaerythritol tetraacrylate, triethylene glycol diacrylate, polyoxypropyltrimethylolpropane triacrylate, butylene glycol diacrylate, 1,2,4-butanetriol triacrylate , 2,2,4-trimethyl-1,3
-Pentanediol diacrylate, diallyl fumarate, 1,10-decanediol dimethyl acrylate,
Pentaerythritol hexaacrylate, and the above acrylate changed to methacrylate, γ-
Methacryloxypropyltrimethoxysilane, 1-vinyl-2-pyrrolidone, and the like. The reactive monomers described above can be used as one kind or a mixture of two or more kinds, or as a mixture with other compounds.

As photopolymerization initiators constituting the photosensitive resin composition, benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamine) benzophenone,
α-amino acetophenone, 4,4-dichlorobenzophenone, 4-benzoyl-4-methyldiphenylketone, dibenzylketone, fluorenone, 2,2-diethoxyacetophonone, 2,2-dimethoxy-2-phenylacetophenone, -Hydroxy-2-methylpropiophenone, p-tert-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-
Chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyldimethylketal, benzylmethoxyethylacetal, benzoinmethylether, benzoinbutylether, anthraquinone, 2-tert-butylanthraquinone, 2-amylanthraquinone, β-chloranthraquinone, anthrone, benzantrone , Dibenzsuberone, methyleneanthrone, 4-azidobenzylacetophenone, 2,6
-Bis (p-azidobenzylidene) cyclohexane,
2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadione-2- (o-methoxycarbonyl) oxime, 1-phenyl-propanedione-2- (o-ethoxy Carbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, 1-phenyl-3-ethoxy-propanetrione-2- (o-benzoyl) oxime, Michler's ketone, 2-methyl-
[4- (methylthio) phenyl] -2-morpholino-
1-propane, 2-benzyl-2-dimethylamino-1
-(4-morpholinophenyl) -butanone-1, naphthalenesulfonyl chloride, quinoline sulfonyl chloride, n-phenylthioacridone, 4,4-azobisisobutyronitrile, diphenyl disulfide, benzothiazole disulfide, triphenylphosphine,
Examples include a combination of a photoreducing dye such as camphorquinone, carbon tetrabromide, tribromophenylsulfone, benzoin peroxide, eosin, and methylene blue and a reducing agent such as ascorbic acid and triethanolamine. One or more agents can be used.

The content of the photosensitive resin composition in the transfer layer 3 is set in the range of 3 to 50 parts by weight, preferably 5 to 30 parts by weight, based on 100 parts by weight of the above-mentioned inorganic component. it can. When the content of the photosensitive resin composition is less than 3 parts by weight, the shape retention of the transfer layer 3 is low, and in particular, there is a problem in the storability and handleability in a roll state. In the case of cutting (slitting) in the shape of, inorganic components are generated as dust, which may hinder plasma display panel production. On the other hand, if the content of the photosensitive resin composition exceeds 50 parts by weight, the organic components cannot be completely removed by firing, and carbides remain in the film after firing, which is not preferable because the quality deteriorates.

Further, in the above-mentioned photosensitive resin composition, a sensitizer, a chain transfer agent, a leveling agent, a dispersant, a transferability imparting agent, a stabilizer, an antifoaming agent, a thickener, An inhibitor, a release agent and the like can be contained as necessary.

The transferability-imparting agent is added for the purpose of improving the transferability and the fluidity of the ink composition. Examples thereof include dimethyl phthalate, dibutyl phthalate and di-n.
Normal alkyl phthalates such as octyl phthalate, phthalic acid esters such as di-2-ethylhexyl phthalate, diisodecyl phthalate, butyl benzyl phthalate, diisononyl phthalate, ethyl phthalyl ethyl glycolate and butyl phthalyl butyl glycolate; tri-2 -Ethylhexyl trimellitate, tri-
trimellitate such as n-alkyl trimellitate, triisononyl trimellitate, triisodecyl trimellitate, dimethyl adipate, dibutyl adipate, di-2-ethylhexyl adipate, diisodecyl adipate, dibutyl diglycol adipate, di- 2
-Ethylhexyl acetate, dimethyl sebacate, dibutyl sebacate, di-2-ethylhexyl sebacate, di-2-ethylhexyl malate, acetyl-tri- (2-ethylhexyl) citrate, acetyl-tri-n-butyl citrate, Aliphatic dibasic acid esters such as acetyl tributyl citrate, polyethylene glycol benzoate, triethylene glycol di- (2
-Ethylhexoate), glycol derivatives such as polyglycol ether, glycerin derivatives such as glycerol triacetate and glycerol diacetyl monolaurate, polyesters comprising sebacic acid, adipic acid, azelaic acid, phthalic acid, etc., having a molecular weight of 300 to 3000 Low molecular weight polyether, the same low molecular weight poly-α-styrene, the same low molecular weight polystyrene, trimethyl phosphate, triethyl phosphate, tributyl phosphate, tri-2-ethylhexyl phosphate, tributoxyethyl phosphate, triphenyl phosphate,
Orthophosphates such as tricresyl phosphate, trixylenyl phosphate, cresyl diphenyl phosphate, xyenyl diphenyl phosphate, 2-ethylhexyl diphenyl phosphate, ricinoleates such as methyl acetyl ricinoleate, poly-1,3
-Polyester / epoxidized esters such as butanediol adipate and epoxidized soybean oil; and acetates such as glycerin triacetate and 2-ethylhexyl acetate.

The dispersant and the anti-settling agent are intended to improve the dispersibility and anti-settling property of the inorganic powder, and include, for example, phosphate ester type, silicone type, castor oil ester type and various types. Surfactants and the like, examples of the antifoaming agent include silicone-based, acrylic-based, various surfactants and the like, and examples of the release agent include silicone-based, fluorine oil-based, paraffin-based, and fatty acid-based , Fatty acid ester type, castor oil type, wax type, compound type and the like, and as the leveling agent, for example, fluorine type, silicone type, various surfactants and the like,
Each can be added in an appropriate amount.

Examples of the solvent used together with the photosensitive resin composition for forming the transfer layer 3 include alcohols such as methanol, ethanol, n-propanol, isopropanol, ethylene glycol and propylene glycol, α- and β-. Terpene such as terpineol, etc., ketones such as acetone, methyl ethyl ketone, cyclohexanone, N-methyl-2-pyrrolidone, diethyl ketone, 2-heptanone and 4-heptanone, and aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene , Cellosolve, methyl cellosolve, ethyl cellosolve, carbitol, methyl carbitol, ethyl carbitol, butyl carbitol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene Glycol ethers such as glycol monomethyl ether, dipropylene glycol monoethyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, ethyl acetate, butyl acetate, cellosolve acetate,
Ethyl cellosolve acetate, butyl cellosolve acetate, carbitol acetate, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 2-methoxyethyl acetate, cyclohexyl acetate, 2-hexyl acetate
Acetates such as ethoxyethyl acetate and 3-methoxybutyl acetate, diethylene glycol dialkyl ether, dipropylene glycol dialkyl ether, ethyl 3-ethoxypropionate, methyl benzoate, N, N-dimethylacetamide, N, N-dimethylformamide and the like Is mentioned.

The thickness of the transfer layer 3 containing the above-mentioned inorganic component and organic component and, if necessary, at least one of an ultraviolet absorber, a coloring agent and a polymerization terminator, is 5 to 20.
μm, preferably in the range of 5 to 15 μm.

(Protective Film) The protective film 4 constituting the transfer sheet 1 can be made of a material which is flexible and does not undergo significant deformation due to tension or pressure. Specifically, polyethylene film, ethylene-vinyl acetate copolymer film, ethylene-vinyl alcohol copolymer film, polypropylene film, polystyrene film, polymethacrylic acid film, polyvinyl chloride film, polyvinyl alcohol film, polyvinyl butyral film, Nylon film, polyetheretherketone film, polysulfone film, polyethersulfone film, polytetrafluoroethylene-perfluoroalkylvinylether film, polyvinyl fluoride film, tetrafluoroethylene-ethylene film, tetrafluoroethylene-hexafluoropropylene film, Polychlorotrifluoroethylene film, polyvinylidene fluoride film, poly Chi terephthalate film, polyethylene naphthalate film, a polyester film, a cellulose triacetate film, polycarbonate film,
Polyurethane film, polyimide film, polyetherimide film, film in which filler is blended with these resin materials, uniaxially or biaxially stretched film using these resin materials, flow direction using these resin materials A biaxially stretched film with a higher stretching ratio in the width direction, a biaxially stretched film with a higher stretching ratio in the flow direction than the width direction using these resin materials, and a film of the same or different type among these films Examples thereof include a combined film and a composite film formed by co-extruding the same or different resins selected from the raw material resins used for these films. Among these films, it is particularly preferable to use a biaxially stretched polyester film. Further, those obtained by treating the above resin film, for example, silicon-treated polyethylene terephthalate, corona-treated polyethylene terephthalate, melamine-treated polyethylene terephthalate, corona-treated polyethylene, corona-treated polypropylene, silicon-treated polypropylene, and the like may be used.

The thickness of the protective film 4 is 4
４００400 μm, preferably 6-150 μm.

When the transfer sheet 1 of the present invention having such a protective film 4 is used, it can be subjected to a transfer step after the protective film 4 is peeled off. Incidentally, the transfer sheet of the present invention may not be provided with a protective film.

Second Embodiment of Transfer Sheet FIG. 2 is a schematic sectional view showing another embodiment of the transfer sheet of the present invention. In FIG. 2, a transfer sheet 11 includes a base film 12, a light absorbing layer 15 provided on the base film 12, a transfer layer 13 formed on the light absorbing layer 15 so as to be peelable, and a transfer layer 11. 13 and a protective film 14 provided releasably. The light absorbing layer 15 includes at least one of an ultraviolet absorber and a coloring agent.
A layer containing seeds. Further, the transfer layer 13 contains at least an inorganic component containing a conductive powder and a glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. Further, in the transfer sheet 11, the base film 12
At least one of the transfer layer 13 and the transfer layer 13 may be a layer containing at least one of an ultraviolet absorber and a colorant, and the transfer layer 13 may contain a polymerization terminator.

The transfer sheet 11 may be in the form of a sheet or a long sheet similarly to the transfer sheet 1 described above. In the case of the long sheet, the transfer sheet 11 may be formed in a roll shape wound around a core. Can be.

Next, the structure of the transfer sheet 11 will be described. The base film 12, the transfer layer 13 and the protective film 14 constituting the transfer sheet 11 are the base film 2 and the transfer layer 3 constituting the transfer sheet 1 described above.
And it is the same as that of the protective film 4, and the description here is omitted.

(Light Absorbing Layer) The light absorbing layer 15 is a layer containing at least one of an ultraviolet absorber and a coloring agent.
The material forming the light absorbing layer 15 is a material that is stable with respect to the ink composition when the transfer layer 13 is formed, and is fixed to the base film 12 so that the transfer layer 13 can be peeled off.

The organic components that can be used in the light absorbing layer 15 include acrylate resins, methacrylate resins,
Resins such as cellulose resin, ester resin, urethane resin, ether resin, phenol resin, and epoxy resin can be used. Also, as other organic components, a plasticizer,
Stabilizers, defoamers, leveling agents and the like can be used.

The UV absorber and the colorant used for the light absorbing layer 15 are the same as the UV absorber and the colorant that can be used for the base film 2 of the transfer sheet 1 described above. Can be appropriately selected according to the conditions.

The light absorbing layer 15 is formed by applying an ink composition containing the above-described resin, at least one of an ultraviolet absorber and a coloring agent onto the base film 12 by a direct gravure coating method, a gravure reverse coating method,
It can be formed by coating and drying by a known coating means such as a reverse roll coating method, a slide die coating method, a slit die coating method, a comma coating method, and a slit reverse coating method.

The transfer sheet 11 of the present invention described above can be subjected to a transfer step after the protective film 14 is peeled off and removed. However, the transfer sheet of the present invention does not have a protective film. Good.

Third Embodiment of Transfer Sheet FIG. 3 is a schematic sectional view showing another embodiment of the transfer sheet of the present invention. 3, a transfer sheet 21 includes a base film 22, a light absorbing layer 25 provided on the base film 12 so as to be peelable, a transfer layer 23 laminated on the light absorbing layer 25, and a transfer layer. And a protective film 24 provided releasably on the reference numeral 23. The light absorbing layer 25 includes at least one of an ultraviolet absorber and a coloring agent.
It is a baking-removable layer containing seeds. Also, the transfer layer 2
3 contains at least an inorganic component containing a conductive powder and a glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. Further, in the transfer sheet 21, at least one of the base film 22 and the transfer layer 23 may be a layer containing at least one of an ultraviolet absorber and a colorant, and the transfer layer 23 includes a polymerization terminator. May be included.

The transfer sheet 21 may be in the form of a sheet or a long sheet, similarly to the transfer sheet 1 described above. In the case of the long sheet, the transfer sheet 21 may be formed in a roll shape wound around a core. Can be.

Next, the configuration of the transfer sheet 21 will be described. The base film 22, the transfer layer 23 and the protective film 24 constituting the transfer sheet 21 are the base film 2 and the transfer layer 3 constituting the transfer sheet 1 described above.
And it is the same as that of the protective film 4, and the description here is omitted.

(Light Absorbing Layer) The light absorbing layer 25 is a layer containing at least one of an ultraviolet absorber and a coloring agent and can be removed by firing. The material forming the light absorbing layer 25 is the transfer layer 23. A material that is stable with respect to the ink composition at the time of printing, has a degree of adhesion that can be peeled off to the base film 22, and has a sufficient adhesive strength to the transfer layer 23 is used.

The organic components that can be used in the light absorbing layer 25 include acrylate resins, methacrylate resins,
Resins such as cellulose resin, ester resin, urethane resin and ether resin can be used. Further, as other organic components, a plasticizer, a stabilizer, an antifoaming agent, a leveling agent and the like can be used.

The ultraviolet absorbing agent and the coloring agent used for the light absorbing layer 25 include the ultraviolet absorbing agent and the coloring agent that can be used for the above-described transfer layer 3 of the transfer sheet 1, and depending on the light source used for exposure. It can be selected as appropriate.

The light absorbing layer 25 is formed by coating the base film 22 with an ink composition containing the resin capable of being removed by burning and at least one of an ultraviolet absorber and a colorant by a direct gravure coating method or a gravure reverse coating method. Method, reverse roll coating method, slide die coating method, slit die coating method,
It can be formed by coating and drying by known coating means such as a comma coating method and a slit reverse coating method.

The transfer sheet 21 of the present invention described above can be subjected to a transfer step after the protective film 24 has been peeled off and removed. However, the transfer sheet of the present invention may have no protective film. Good.

Fourth Embodiment of Transfer Sheet FIG. 4 is a schematic sectional view showing another embodiment of the transfer sheet of the present invention. In FIG. 4, a transfer sheet 31 includes a base film 32, a transfer layer 33 formed releasably on the base film 32, a protective film 34 provided releasably on the transfer layer 33, and a base film 32. And a light-absorbing back layer 36 formed on the other surface of the light-emitting device. The light absorbing back layer 36 is a layer containing at least one of an ultraviolet absorber and a coloring agent. Further, the transfer layer 33 includes an inorganic component including a conductive powder and glass frit,
At least an organic component containing a photosensitive resin composition that can be removed by baking. Furthermore, in the transfer sheet 31, at least one of the base film 32 and the transfer layer 33 is
It may be a layer containing at least one of an ultraviolet absorber and a coloring agent, and the transfer layer 33 may contain a polymerization terminator.

The transfer sheet 31 may be in the form of a sheet or a long sheet, similarly to the transfer sheet 1 described above. In the case of the long sheet, the transfer sheet 31 may be in the form of a roll wound around a core. Can be.

The base film 32, the transfer layer 33 and the protective film 34 constituting the transfer sheet 31 are the same as the base film 2, the transfer layer 3 and the protective film 4 constituting the transfer sheet 1 described above. And the description is omitted here.

The light-absorbing back layer 36 constituting the transfer sheet 31 has a light intensity applied to expose the transfer layer 33 and an intensity sufficient to expose the transfer layer 33. This is to reduce the intensity to such a degree that exposure outside the irradiation site due to scattered light generated by internal reflection can be prevented.
The light-absorbing back layer 36 is formed by a known method using an ink composition containing at least one of a resin, an ultraviolet absorber, and a colorant as described in the description of the light-absorbing layer 15 constituting the transfer sheet 11 described above. Can be formed by applying and drying with the above-mentioned application means.

The above-described transfer sheet 31 of the present invention can be subjected to a transfer step after peeling and removing the protective film 34. However, even if the transfer sheet of the present invention is not provided with a protective film, Good. Also, the transfer sheet 3
A light absorbing layer similar to the above-described light absorbing layer 15 may be provided between the base film 32 and the transfer layer 33, and the transfer layer 33 may be peelable from the light absorbing layer.
A light absorbing layer similar to the above light absorbing layer 25 may be provided on the base film 32 of the transfer sheet 31 so as to be peelable, and the transfer layer 33 may be laminated on the light absorbing layer.

First Embodiment of Pattern Forming Method Next, a pattern forming method of the present invention will be described by taking an example of forming an electrode pattern of a plasma display panel (PDP).

Here, before describing the electrode pattern formation, an AC type PDP will be described. Fig. 5 shows AC type P
FIG. 2 is a schematic configuration diagram showing a DP, showing a state in which a front plate and a back plate are separated. In FIG. 5, the PDP 51 has a front plate 61 and a rear plate 71 arranged in parallel and facing each other, and a barrier 76 is formed on the front side of the rear plate 71 so as to stand upright. The front plate 61 and the back plate 71 are held at regular intervals by the barrier 76. The front plate 61 has a front glass substrate 62, and composite electrodes composed of a sustain electrode 63, which is a transparent electrode, and a bus electrode 64, which is a metal electrode, are formed in parallel on the back side of the front glass substrate 62. , A dielectric layer 65 is formed, and an MgO layer 66 is further formed thereon. The back plate 71 has a back glass substrate 72. On the front side of the back glass substrate 72, an address electrode 74 is located between barriers 76 so as to be orthogonal to the composite electrode via a base layer 73. Are formed in parallel with each other, a dielectric layer 75 is formed so as to cover them, and a phosphor layer 77 is provided so as to cover the wall surface of the barrier 76 and the bottom surface of the cell. In this AC type PDP, the front glass substrate 6
By applying a predetermined voltage from an AC power source between the composite electrodes on the upper electrode 2 to form an electric field, discharge occurs in each cell as a display element defined by the front glass substrate 62, the rear glass substrate 72, and the barrier 76. Is performed. Then, the phosphor layer 77 is caused to emit light by the ultraviolet light generated by the discharge, and the light transmitted through the front glass substrate 62 is visually recognized by the observer.

In the AC type PDP shown in FIG. 5, the address electrodes 74 and the like are provided on the rear glass substrate 72 with the base layer 73 interposed therebetween, but the base layer 73 may not be formed. .

Next, the formation of the address electrodes 74 on the back plate 71 of the PDP will be described. FIG. 6 is a process chart for explaining the pattern formation of the address electrodes 74 using the above-described transfer sheet 1 of the present invention. In this case, the transfer layer 3 of the transfer sheet 1 contains a negative photosensitive resin composition as a photosensitive resin composition that can be removed by firing.

In FIG. 6, first, the transfer sheet 1 is placed on a back glass substrate 72 provided with a base layer 73 (or directly on the back glass substrate 72 provided with no base layer 73).
(See FIG. 6A). This transfer layer 3
When heating is required in the pressure bonding of the
, Or by using a pressure roll.

Next, the transfer layer 3 is exposed from the base film 2 side through a photomask M for an electrode pattern (FIG. 6B). In the pattern forming method of the present invention, the light irradiated through the photomask M passes through the base film 2 and reaches the transfer layer 3, but the scattered light reflected by the transfer layer 3 is generated by the transfer layer 3. 3 is absorbed by an ultraviolet absorber or a coloring agent contained in the base film 2 or is absorbed by an ultraviolet absorber or a coloring agent contained in the base film 2. Diffusion along the interface and out of the irradiated site is prevented. Also,
When the transfer layer 3 contains a polymerization terminator, the polymerization reaction of the photosensitive resin composition of the transfer layer 3 by the polymerization terminator at a light amount of about the scattered light even if the scattered light is diffused out of the irradiation site. Is suppressed. Therefore, even when the transfer layer 3 is exposed from the base film 2 while the base film 2 is left without being peeled, high-definition exposure faithful to the exposure pattern can be performed. Also, the base film 2 existing at the time of exposure
Suppresses radical scavenging by external oxygen, so that the time required for exposure can be significantly reduced as compared with exposure in a state where the base film is peeled off.

Further, in the pattern forming method of the present invention,
Since the exposure is performed while leaving the base film 2 without peeling in this way, dust is prevented from directly adhering to the highly adhesive transfer layer 3 during the above-described pressing step and the exposure step. In addition, dust adhering to the base film 2 can be easily removed by air blow or the like, thereby preventing defects due to dust adhering and preventing dust and dirt from adhering to the photomask M used at the time of exposure. In the exposure, the photomask M may be in close contact with the base film 2 or may be provided with a predetermined gap as shown in the illustrated example.

Next, the base film 2 is peeled off, and the transfer layer 3 is developed to form a pattern 3 ′ made of a conductive photosensitive resin layer on the underlayer 73 (FIG. 6).
(C)) Then, firing is performed to remove the organic components of the pattern 3 ′, thereby forming the address electrode pattern 74 (FIG. 6D).

In the above-described example, the transfer sheet of the present invention as shown in FIG. 1 is used, but any of the transfer sheets 11, 21 and 31 shown in FIGS. An electrode pattern can be formed by a similar operation.

Second Embodiment of Pattern Forming Method FIG. 7 is a process chart for explaining the pattern formation of the address electrodes 74 using the above-described transfer sheet 1 of the present invention. In this case, the transfer layer 3 of the transfer sheet 1 contains a negative photosensitive resin composition as a photosensitive resin composition that can be removed by firing.

In FIG. 7, first, the transfer layer 3 side of the transfer sheet 1 is pressure-bonded to the back glass substrate 72 provided with the base layer 73 (FIG. 7A). If heating is required for the pressure bonding of the transfer layer 3, the back glass substrate 72 may be heated or heated by a pressure roll.

Next, a light-absorbing film 41 and a photomask M for an electrode pattern are provided on the base film 2.
The transfer layer 3 is exposed from the base film 2 side (FIG. 7).
(B)). The light-absorbing film 41 is sufficient for exposing the transfer layer 3 to the intensity of the irradiated light.
This is for weakening to the extent that exposure outside the irradiation site due to scattered light generated by internal reflection is suppressed. Such a light absorbing film 41 can be formed by forming a film using a thermoplastic resin containing an ultraviolet absorber or a coloring agent. Resin materials that can be used, UV absorbers,
Examples of the coloring agent and the like include the materials described in the description of the base film 2 of the transfer sheet 1 described above. The thickness of the light-absorbing film 41 and the amounts of the ultraviolet absorber and the coloring agent contained therein can be appropriately set in consideration of the light source used for exposure, the photosensitive resin composition contained in the transfer layer 3, and the like. .

In the above-described exposure, the light irradiated through the photomask M passes through the light-absorbing film 41 and the base film 2 and reaches the transfer layer 3, and is scattered by the transfer layer 3 by reflection. Occurs, the scattered light does not expose the transfer layer 3 outside the irradiation site. Further, similarly to the above-described pattern forming method, the scattered light is prevented from diffusing out of the irradiation site along the interface between the base film 2 and the transfer layer 3. In addition, since the base film 2 existing at the time of exposure suppresses radical scavenging by external oxygen, the time required for exposure can be significantly reduced as compared with exposure in a state where the base film is peeled off.

Further, in the pattern forming method of the present invention,
Similarly to the above-described pattern forming method, it is possible to prevent the generation of defects due to the adhesion of dust and to prevent the adhesion of dust and dirt to the photomask M used at the time of exposure.

In the exposure, the photomask M may be in close contact with the light-absorbing film 41, or may be provided with a predetermined gap as in the illustrated example.

Next, the base film 2 is peeled off, and the transfer layer 3 is developed to form a pattern 3 ′ made of a conductive photosensitive resin layer on the underlayer 73 (FIG. 7).
(C)) Thereafter, firing is performed to remove the organic components of the pattern 3 ′, thereby forming the address electrode pattern 74 (FIG. 7D).

In the above-described example, the transfer sheet of the present invention as shown in FIG. 1 is used. However, even when the transfer sheets 11 and 21 shown in FIGS. An electrode pattern can be formed.

[0087]

Next, the present invention will be described in more detail with reference to examples.

Example 1 (1) Preparation of Material (Base Film) A 25 μm thick base film was used.
m polyethylene terephthalate film (Toray Industries, Inc.)
T-60) was prepared.

(Ink Composition for Forming Transfer Layer) As the ink composition A for forming the transfer layer, a photosensitive resin composition having the following composition containing an ultraviolet absorber was prepared. Transfer Layer Forming Ink Composition A / Silver powder (spherical, average particle size 1 μm): 95 parts by weight Glass frit: 5 parts by weight (main components: Bi ₂ O ₃ , SiO ₂ , B ₂ O ₃ (alkali-free) (Average particle size = 1 μm, coefficient of thermal expansion = 78 × 10 ⁻⁷ / ° C., softening point = 500 ° C.) n-butyl methacrylate / 2-hydroxypropyl methacrylate / methacrylic acid copolymer (glycidyl methacrylate added) (molecular weight = 8) 10,000, acid value = 110 mgKOH / g) 13 parts by weight Ethylene oxide-modified trimethylolpropane triacrylate 10 parts by weight Photopolymerization initiator (Irgacure 369 manufactured by Ciba-Geigy Co., Ltd.) 1.5 parts by weight 3-methoxybutyl acetate … 20 parts by weight ・ UV absorber… 0.3 parts by weight (Antigen NBC manufactured by Sumitomo Chemical Co., Ltd.)

As the ink composition B for forming the transfer layer, a photosensitive resin composition having the following composition and containing no ultraviolet absorber was prepared. Transfer layer forming ink composition B / Silver powder (spherical, average particle diameter 1 μm): 95 parts by weight Glass frit: 5 parts by weight (main components: Bi ₂ O ₃ , SiO ₂ , B ₂ O ₃ (alkali-free)) (Average particle size = 1 μm, coefficient of thermal expansion = 78 × 10 ⁻⁷ / ° C., softening point = 500 ° C.) n-butyl methacrylate / 2-hydroxypropyl methacrylate / methacrylic acid copolymer (glycidyl methacrylate added) (molecular weight = 8) 10,000, acid value = 110 mgKOH / g) 13 parts by weight Pentaerythritol tri / tetraacrylate 10 parts by weight Photopolymerization initiator (Irgacure 369 manufactured by Ciba Geigy) 1.5 parts by weight 3-methoxybutyl acetate 20 Parts by weight

(Ink Composition for Light Absorbing Layer) As an ink composition for forming a light absorbing layer, a photosensitive resin composition having the following composition containing an ultraviolet absorbent was prepared. Ink composition for forming light absorbing layer · Polymethyl methacrylate ··· 100 parts by weight · Ultraviolet absorber ··· 3 parts by weight (Biosoap 580 manufactured by Kyodo Yakuhin Co., Ltd.) · Methyl ethyl ketone ··· 50 parts by weight · Toluene ··· 50 parts by weight

(2) Preparation of Transfer Sheet Each of the above materials was used in combination as shown in Table 1 below.
A transfer sheet (sample 1) consisting of the following two layer constitutions I and II
To 3). Layer structure I: Base film / transfer layer / protective film (peeled between base film and transfer layer) Layer structure II: Base film / light absorbing layer / transfer layer / protective film (peeled between base film and light absorbing layer)

The transfer layer (10 μm thick) on the base film
The formation of m) was performed by applying the ink composition for forming a transfer layer by a blade coating method and drying (100 ° C., 10 minutes).

The formation of the light absorbing layer (thickness: 5 μm) on the base film is performed by applying the ink composition for forming the light absorbing layer by a blade coating method and drying (80 ° C., 5 minutes).
It was done by doing.

Further, as the protective film, a silicon-treated polyethylene terephthalate film (Tosero Corporation)
SP-PET-03-25-C) was provided on the transfer layer by lamination.

(3) Formation of Electrode Pattern Next, each of the transfer sheets (samples 1 to 3) was slit to a predetermined width, the protective film was peeled off, and then the substrate was heated to 60 ° C. on a glass substrate. Laminator A manufactured by
It was press-bonded with a hot roll at 60 ° C. using L-700. Next, after cooling to room temperature, a negative pattern mask of the electrodes of the plasma display panel (opening line width 120 μm)
UV light (light source: ultra high pressure mercury lamp)
0 mJ / cm ² ) to expose the transfer layer.

Next, the base film was peeled off, and the transfer layer was transferred to a glass substrate. In this transfer step, when the transfer sheet having the layer structure I is used, only the transfer layer is transferred onto the glass substrate. When the transfer sheet having the layer structure II is used, the transfer layer and the light absorbing layer are connected to the glass substrate. Transcribed above.

Next, development was performed using a 0.5% aqueous sodium carbonate solution to obtain a predetermined pattern. Thereafter, the glass substrate was fired at 550 ° C. to form an electrode pattern.

The thickness and line width of the thus formed electrode pattern were measured and are shown in Table 1 below.

[0100]

[Table 1] As shown in Table 1, the transfer sheet of the present invention (Sample 1,
It was confirmed that the electrode pattern formed by using 2) had a uniform thickness and a uniform line width, and was formed with high accuracy.

On the other hand, the electrode pattern formed by using the comparative transfer sheet (sample 3) had a thick pattern and was poor in linearity.

[Example 2] Using the transfer sheet (sample 1) of the present invention prepared in Example 1, the irradiation amount of ultraviolet rays was set to 50 mJ / cm ² while the base film was left without being peeled off.
Then, the transfer layer was exposed, and an electrode pattern was formed in the same manner as in Example 1. The formed electrode pattern has a thickness of 4 ±
The pattern was 1 μm, the line width was 100 ± 5 μm, and the pattern was uniform and high precision.

As a comparison, the transfer sheet (sample 1) of the present invention prepared in Example 1 was used, the protective film was peeled off, and the glass sheet heated at 60 ° C. was manufactured by Asahi Kasei Corporation. Using a laminator AL-700, pressure bonding was performed with a hot roll at 60 ° C. Next, after cooling to room temperature, the base film was peeled off and the transfer layer was transferred to a glass substrate.

Next, the transfer layer was exposed by irradiating ultraviolet rays (light source: ultra-high pressure mercury lamp) at various doses through a negative pattern mask (opening line width: 120 μm) of the electrodes of the plasma display panel. .

Next, development was performed using a 0.5% aqueous sodium carbonate solution to obtain a predetermined pattern. Thereafter, the glass substrate was fired at 550 ° C. to form an electrode pattern.

As a result of measuring the thickness and line width of the comparative electrode pattern formed as described above, the same thickness and line width as in the case where the transfer layer was exposed with the base film left unpeeled according to the present invention were obtained. In order to form an electrode pattern having a uniform width, a dose of 250 mJ / cm ² was required. From this, according to the pattern forming method of the present invention,
It was confirmed that the time required for exposure can be significantly reduced.

[0107]

As described above in detail, according to the present invention, the transfer sheet transmits the light irradiated from the base film side and reaches the transfer layer. Scattered light generated by reflection inside the transfer sheet of
Since it is absorbed by an ultraviolet absorber or a colorant contained in the transfer sheet, the scattered light is prevented from diffusing out of the irradiation site along the interface between the base film and other layers,
This enables high-definition exposure that is faithful to the exposure pattern even when the transfer layer of the transfer sheet is pressed against the substrate and the transfer layer is exposed from the base film while the base film is not peeled off. In addition, since the base film present at the time of exposure suppresses radical scavenging by external oxygen, the time required for exposure can be greatly reduced, and at the same time, the transfer layer, which has conventionally occurred between the transfer process and the exposure process, Prevents dust from adhering, prevents the occurrence of defects caused by dust, and prevents dust and dirt from adhering to the photomask used at the time of exposure, greatly improving process control and efficiency, and enhancing high-definition electrode patterns. It can be formed with precision.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing one embodiment of a transfer sheet of the present invention.

FIG. 2 is a schematic sectional view showing another embodiment of the transfer sheet of the present invention.

FIG. 3 is a schematic sectional view showing another embodiment of the transfer sheet of the present invention.

FIG. 4 is a schematic sectional view showing another embodiment of the transfer sheet of the present invention.

FIG. 5 is a schematic configuration diagram illustrating an example of a plasma display panel.

FIG. 6 is a process chart for explaining an embodiment of the pattern forming method of the present invention.

FIG. 7 is a process chart for explaining another embodiment of the pattern forming method of the present invention.

[Explanation of symbols]

 1, 11, 21, 31 ... Transfer sheet 2, 12, 22, 32 ... Base film 3, 13, 23, 33 ... Transfer layer 4, 14, 24, 34 ... Protective film 15, 25 ... Light absorption layer 36 ... Light Absorbing back layer 41 Light absorbing film 51 Plasma display panel 61 Front plate 71 Back plate 74 Address electrode

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Yozo Kosaka 1-1-1, Ichigaya-Kaga-cho, Shinjuku-ku, Tokyo F-term in Dai Nippon Printing Co., Ltd. (reference) 5C028 FF16 HH14 5C040 FA01 GA03 GB02 GG09 JA19 KA09 KA16 MA22 MA23 MA24 MA26 5E343 AA26 BB25 BB72 BB73 EE42 EE52 ER32 GG08

Claims (9)

[Claims] 1. A base film, and a transfer layer releasably provided on one surface of the base film, wherein the transfer layer is made of an inorganic component including conductive powder and glass frit, and a photosensitive material which can be removed by firing. A transfer sheet comprising at least an organic component containing a conductive resin composition, and at least one of the transfer layer and the base film contains at least one of an ultraviolet absorber and a colorant. 2. The transfer sheet according to claim 1, wherein the transfer layer contains a polymerization terminator. 3. A base film, a light absorbing layer provided on one surface of the base film, and a transfer layer releasably formed on the light absorbing layer, wherein the light absorbing layer absorbs ultraviolet light. The transfer layer contains at least one of a coloring agent and a coloring agent, and the transfer layer contains at least an inorganic component containing a conductive powder and a glass frit and an organic component containing a photosensitive resin composition that can be removed by firing. Transfer sheet. 4. A light absorbing device comprising: a base film; a light-absorbing layer removable on one surface of the base film, the transferable layer formed on the light-absorbing layer; The layer contains at least one of an ultraviolet absorber and a coloring agent, and the transfer layer contains at least an inorganic component containing a conductive powder, a glass frit, and an organic component containing a photosensitive resin composition that can be removed by firing. A transfer sheet, characterized in that: 5. The transfer sheet according to claim 3, wherein at least one of the transfer layer and the base film contains at least one of an ultraviolet absorber and a colorant. 6. The transfer sheet according to claim 3, wherein the transfer layer contains a polymerization terminator. 7. The base film according to claim 1, further comprising a light absorbing backing layer containing at least one of an ultraviolet absorber and a colorant on the other surface. Transfer sheet. 8. The transfer sheet according to any one of claims 1 to 7, wherein the transfer layer is pressed on a substrate, and the transfer layer is exposed in a desired pattern from a base film side. A pattern forming method, wherein the base film is peeled off, developed, and baked to remove organic components. 9. The transfer sheet according to claim 1, wherein the transfer layer is pressed on a substrate, and contains at least one of an ultraviolet absorber and a colorant from the base film side. A pattern forming method, comprising: exposing the transfer layer in a desired pattern through a light-absorbing film, and then peeling and developing the base film and baking to remove organic components.