JP2000315835A5 - - Google Patents
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- Publication number
- JP2000315835A5 JP2000315835A5 JP1999122612A JP12261299A JP2000315835A5 JP 2000315835 A5 JP2000315835 A5 JP 2000315835A5 JP 1999122612 A JP1999122612 A JP 1999122612A JP 12261299 A JP12261299 A JP 12261299A JP 2000315835 A5 JP2000315835 A5 JP 2000315835A5
- Authority
- JP
- Japan
- Prior art keywords
- opening
- electrode layer
- laser
- light emitting
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12261299A JP4438024B2 (ja) | 1999-04-28 | 1999-04-28 | 半導体レーザ装置の検査方法 |
| US09/536,644 US6553047B1 (en) | 1999-04-28 | 2000-03-28 | Semiconductor laser device with an inspection window, and an inspection method therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12261299A JP4438024B2 (ja) | 1999-04-28 | 1999-04-28 | 半導体レーザ装置の検査方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000315835A JP2000315835A (ja) | 2000-11-14 |
| JP2000315835A5 true JP2000315835A5 (enExample) | 2009-09-10 |
| JP4438024B2 JP4438024B2 (ja) | 2010-03-24 |
Family
ID=14840269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12261299A Expired - Fee Related JP4438024B2 (ja) | 1999-04-28 | 1999-04-28 | 半導体レーザ装置の検査方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6553047B1 (enExample) |
| JP (1) | JP4438024B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119362143B (zh) * | 2024-12-20 | 2025-04-11 | 苏州长光华芯光电技术股份有限公司 | 半导体发光结构及其制备方法和测试方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2768672B2 (ja) * | 1987-09-30 | 1998-06-25 | 株式会社日立製作所 | 面発光半導体レーザ |
| JPH11274566A (ja) * | 1998-03-26 | 1999-10-08 | Canon Inc | 発光素子、その製造方法 |
| JP3522114B2 (ja) * | 1998-07-21 | 2004-04-26 | 株式会社村田製作所 | 半導体発光素子及びその製造方法、並びにZnO膜の形成方法 |
-
1999
- 1999-04-28 JP JP12261299A patent/JP4438024B2/ja not_active Expired - Fee Related
-
2000
- 2000-03-28 US US09/536,644 patent/US6553047B1/en not_active Expired - Fee Related
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