JP2000313994A - Anodic oxidation treating device for cylindrical conductive supporting body - Google Patents

Anodic oxidation treating device for cylindrical conductive supporting body

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Publication number
JP2000313994A
JP2000313994A JP11119963A JP11996399A JP2000313994A JP 2000313994 A JP2000313994 A JP 2000313994A JP 11119963 A JP11119963 A JP 11119963A JP 11996399 A JP11996399 A JP 11996399A JP 2000313994 A JP2000313994 A JP 2000313994A
Authority
JP
Japan
Prior art keywords
cylindrical conductive
electrolytic
conductive support
power supply
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11119963A
Other languages
Japanese (ja)
Other versions
JP3900739B2 (en
Inventor
Hiroyuki Nishizawa
裕行 西澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP11996399A priority Critical patent/JP3900739B2/en
Publication of JP2000313994A publication Critical patent/JP2000313994A/en
Application granted granted Critical
Publication of JP3900739B2 publication Critical patent/JP3900739B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a decive for obtaining a cylindrical conductive supporting body small in unevenness in the film thickness of an anodically oxidized coating film. SOLUTION: This anodic oxidation treating device for a cylindrical conductive supporting body is the one for forming an anodically oxidized coating film on the surface of a cylindrical conductive supporting body and is provided with an electrolytic cell stored with an electrolytic treating soln., an electrolytic frame supporting a cylindrical conductive supporting body, fixing seats 5 which are disposed on the upper surface of the lower frame of the electrolytic frame and carry the lower end faces of the cylindrical conductive supporting body and a power feeding rod 10 provided almost approximately vertically to the center of the fixing seats. In such case, the upper part of a power feeding setion is provided with an insulation coating section 15.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、PPC複写機やレ
ーザービームプリンター等に使用される電子写真感光体
用支持体等の円筒状導電性支持体の下地処理としての陽
極酸化処理に用いる装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus used for anodizing treatment as a base treatment for a cylindrical conductive support such as a support for an electrophotographic photosensitive member used in a PPC copier or a laser beam printer. Things.

【0002】[0002]

【従来の技術】一般に、電子写真感光体は、アルミニウ
ム(この明細書においてアルミニウムとは、その合金を
含む意味である。)からなる円筒状導電性支持体上に光
導電層が形成されてなるものであるが、発生電荷の該支
持体へのぬけによる画像不良を防止する目的で、支持体
に下地処理として陽極酸化処理を施し、支持体表面に陽
極酸化被膜を形成することが知られている。電子写真感
光体用に限らず、一般的な陽極酸化処理において、支持
体を硫酸、しゅう酸および燐酸等の電解処理液に浸漬し
て、支持体を電極に直接接触させて給電を行うことによ
り直接給電法(特開平4−365899号公報、実公平
4−49180号公報等参照)、または直接給電法を補
うためにその直接給電と併用して電解処理液を介して給
電する間接給電法を行う併用給電方法が用いられている
(特開昭52−86938号公報、特公昭54−845
2号公報等参照)。
2. Description of the Related Art In general, an electrophotographic photosensitive member has a photoconductive layer formed on a cylindrical conductive support made of aluminum (in this specification, aluminum means an alloy thereof). However, it is known that an anodizing treatment is performed as a base treatment on the support to form an anodized film on the surface of the support for the purpose of preventing an image defect due to the generated charges penetrating the support. I have. Not only for electrophotographic photoreceptors, but in general anodic oxidation treatment, the support is immersed in an electrolytic treatment solution such as sulfuric acid, oxalic acid, phosphoric acid, etc. A direct power supply method (see Japanese Patent Application Laid-Open No. 4-365899 and Japanese Utility Model Publication No. 4-49180), or an indirect power supply method in which power is supplied through an electrolytic treatment solution in combination with the direct power supply to supplement the direct power supply method. A combined power supply method is used (JP-A-52-86938, JP-B-54-845).
No. 2).

【0003】[0003]

【発明が解決しようとする課題】本発明は、上記実状に
鑑みなされたものであり、解決しようとする課題は、次
のとおりである。 (2)複数の支持体間の陽極酸化被膜の膜厚のむらが小
さい円筒状導電性支持体を得る陽極酸化処理装置を提供
すること。
SUMMARY OF THE INVENTION The present invention has been made in view of the above situation, and the problems to be solved are as follows. (2) To provide an anodic oxidation treatment apparatus for obtaining a cylindrical conductive support having a small thickness variation of an anodic oxide film between a plurality of supports.

【0004】[0004]

【課題を解決するための手段】上記課題を解決するため
に、本願発明の要旨は、円筒状導電性支持体の表面に陽
極酸化被膜を形成するための陽極酸化処理装置であっ
て、電解処理液を収容した電解槽1と、円筒状導電性支
持体を支持する電解枠3と、該電解枠の下枠の上面に設
けられ、円筒状導電性支持体の下端面を担持するための
固定座5と、該固定座の略中央に略垂直に設けられた給
電棒10を設けてなり、給電棒10の上部に絶縁被覆部
15を設けられている円筒状導電性支持体の陽極酸化処
理装置に存する。
In order to solve the above-mentioned problems, the gist of the present invention is to provide an anodic oxidation treatment apparatus for forming an anodic oxide film on the surface of a cylindrical conductive support, comprising: An electrolytic cell 1 containing a liquid, an electrolytic frame 3 supporting a cylindrical conductive support, and a fixing member provided on an upper surface of a lower frame of the electrolytic frame for supporting a lower end surface of the cylindrical conductive support. Anodizing treatment of a cylindrical conductive support having a seat 5 and a power supply rod 10 provided substantially vertically at substantially the center of the fixed seat, and having an insulating coating 15 provided on the power supply rod 10. Exists in the device.

【0005】本発明に係る陽極酸化処理装置を図面に基
づいて詳細に説明するが、本発明はその要旨を越えない
限り、以下の例に限定されるものではない。図1は、本
発明の一実施例を示す陽極酸化処理装置の正面図、図2
は、本発明の一実施例を示す陽極酸化処理装置の側面
図、図3は、円筒状導電性支持体の固定状態を示す側面
略図、図4は、本発明の固定座の一実施例を示す図、図
5は比較例の固定座の図を、それぞれ示す。
[0005] The anodizing apparatus according to the present invention will be described in detail with reference to the drawings, but the present invention is not limited to the following examples unless it exceeds the gist. FIG. 1 is a front view of an anodizing apparatus showing one embodiment of the present invention, and FIG.
FIG. 3 is a side view of an anodizing apparatus showing an embodiment of the present invention, FIG. 3 is a schematic side view showing a fixed state of a cylindrical conductive support, and FIG. 4 is an embodiment of a fixing seat of the present invention. FIG. 5 and FIG. 5 show a fixed seat of a comparative example, respectively.

【0006】本発明に係る陽極酸化処理装置は、電解槽
1、陰極板2、電解枠3、直流電源13が設置されてな
る。電解槽1は絶縁体からなり、電解枠3によって支持
された円筒状導電性支持体4を陽極酸化処理する機能を
果たすものであり、電解液11を収容し、かつ、複数の
円筒状導電性支持体4を固定した電解枠3を電解液11
に浸漬する。直流電源13は電解槽1外に配置し、陽極
側を電解枠3に、陰極側を陰極板2に、それぞれ接続す
る。陰極板2は電解槽1内に、かつ、電解枠3に対し平
行に、適宜の間隙をおいて配置されてなり、電解枠3の
固定座5に貫通して設けた給電棒10とともに、電解液
11に給電する機能を果たす。
The anodizing apparatus according to the present invention is provided with an electrolytic cell 1, a cathode plate 2, an electrolytic frame 3, and a DC power supply 13. The electrolytic cell 1 is made of an insulator, and functions to anodize the cylindrical conductive support 4 supported by the electrolytic frame 3. The electrolytic tank 1 contains the electrolytic solution 11 and has a plurality of cylindrical conductive supports. The electrolytic frame 3 to which the support 4 is fixed is
Soak in The DC power supply 13 is arranged outside the electrolytic cell 1, and the anode side is connected to the electrolytic frame 3 and the cathode side is connected to the cathode plate 2, respectively. The cathode plate 2 is disposed in the electrolytic cell 1 and in parallel with the electrolytic frame 3 with an appropriate gap therebetween, and together with the power supply rod 10 provided through the fixing seat 5 of the electrolytic frame 3, It functions to supply power to the liquid 11.

【0007】給電棒10の上部に設けられる絶縁被覆部
15は、給電棒10と円筒状導電性支持体4の内面とが
接触し給電棒10から円筒状導電性支持体4へ直接電流
が流れることを防止する。更に該絶縁被覆部15に溝又
は電解処理液を通す部分を設けることにより、円筒状導
電性支持体4の内面における電解液11の流れをよく
し、又、給電棒10のうち、電解処理液に接している部
分16の表面積と、絶縁被覆部15に覆われている部分
の表面積の比を2対5〜8対5とすることにより、給電
棒から生じる電場が円筒状導電性支持体の一部にのみ集
中し、そのように電場が集中した部分の陽極酸化被膜が
他の部分に比べ厚くなることを防止する。
The insulating coating 15 provided on the upper portion of the power supply rod 10 makes contact between the power supply rod 10 and the inner surface of the cylindrical conductive support 4, and a current flows directly from the power supply rod 10 to the cylindrical conductive support 4. To prevent that. Further, by providing a groove or a portion through which the electrolytic treatment liquid passes through the insulating coating portion 15, the flow of the electrolytic solution 11 on the inner surface of the cylindrical conductive support 4 is improved. By setting the ratio of the surface area of the portion 16 in contact with the surface to the surface area of the portion covered by the insulating coating portion 15 to 2 to 5 to 8 to 5, the electric field generated from the power supply rod is reduced to the cylindrical conductive support. The anodic oxide film is concentrated only at a part, and the portion where the electric field is concentrated is prevented from becoming thicker than other portions.

【0008】絶縁被覆部材の材質としては、1011Ω・
cm以上の抵抗値を有するものであれば、特に限定され
るものではないが、例えば、塩化ビニル、ナイロン樹
脂、ポリエーテルイミド樹脂、テフロンが挙げられる。
これらの中で特に塩化ビニル加工性の良さ、値段の安さ
などの点で好ましい。電解枠3は直流電源13に接続さ
れ、給電棒10と電解液11に給電する機能を果たすば
かりでなく、電解枠の下方枠3′において複数本の円筒
状導電性支持体4を支持し、電解槽1内の電解液11中
に浸漬し、陽極酸化処理操作終了後には電解槽1から引
き上げる機能を果たす。電解枠3を電解槽1内に浸漬し
たり、引き上げたりする操作は、図示されていない装置
によって行うことができる。
The material of the insulating covering member is 10 11 Ω ·
The material is not particularly limited as long as it has a resistance value of not less than cm, but examples thereof include vinyl chloride, nylon resin, polyetherimide resin, and Teflon.
Among these, vinyl chloride is particularly preferable in terms of good processability and low price. The electrolytic frame 3 is connected to a DC power supply 13 and not only functions to supply power to the power supply rod 10 and the electrolytic solution 11, but also supports a plurality of cylindrical conductive supports 4 in a lower frame 3 'of the electrolytic frame. It functions to be immersed in the electrolytic solution 11 in the electrolytic cell 1 and to be pulled up from the electrolytic cell 1 after the anodizing treatment operation is completed. The operation of immersing the electrolytic frame 3 in the electrolytic cell 1 or pulling it up can be performed by a device (not shown).

【0009】ウェイトバー8はウェイトバーガイド棒1
2によってガイドするが、テフロン等の絶縁物からなる
スペーサー9によって電解枠3から絶縁した構造とす
る。給電棒10は、電解液11に給電する機能を果た
し、電解枠の下方枠3′に接続するが、本願発明の好ま
しい給電方法、即ち間接給電を行うには、固定座5とは
テフロン等の絶縁物からなるスペーサー6によって電流
が円筒状導電性支持体に直接給電されるのを防ぐのが好
ましい。給電棒10は、通常、プラチナ、酸化イリジュ
ウム等の耐蝕性の金属材料より作られたものが好まし
い。
The weight bar 8 is a weight bar guide bar 1
2, but is insulated from the electrolytic frame 3 by a spacer 9 made of an insulating material such as Teflon. The power supply rod 10 has a function of supplying power to the electrolytic solution 11 and is connected to the lower frame 3 ′ of the electrolytic frame. In order to perform the preferred power supply method of the present invention, that is, indirect power supply, the fixed seat 5 is made of Teflon or the like. It is preferable to prevent the electric current from being directly supplied to the cylindrical conductive support by the spacer 6 made of an insulating material. Generally, the power supply rod 10 is preferably made of a corrosion-resistant metal material such as platinum or iridium oxide.

【0010】円筒状導電性支持体4の下端を支持する固
定座5の構造は、図3の側面図に示す如く、支持体の下
端に嵌合する凸部を上部に有し、下端を担持する部分を
下部に有する形状であり、本願発明においては、支持体
下端を固定座5で密閉せず、円筒状導電性支持体4の内
側に電解液11が入り込める隙間を残した構造とするた
め、、図4に示す様な固定座に上方から下方へ抜ける液
抜け孔14を設ける。尚、固定座5は、本願発明の好ま
しい給電方法、即ち間接給電を行うため、それ自身テフ
ロン等の絶縁物から形成しても良いし、固定座5と電解
枠の下方枠3′との間に、テフロン等の絶縁物からなる
スペーサー6を設けて絶縁した構造としてもよい。
As shown in the side view of FIG. 3, the structure of the fixed seat 5 for supporting the lower end of the cylindrical conductive support 4 has a convex portion fitted on the lower end of the support, and the lower end carries the lower end. In the invention of the present application, the lower end of the support is not sealed with the fixed seat 5, and a structure is left inside the cylindrical conductive support 4 to leave a gap into which the electrolytic solution 11 can enter. A liquid drain hole 14 is provided in a fixed seat as shown in FIG. The fixed seat 5 may itself be formed of an insulating material such as Teflon in order to perform the preferred power supply method of the present invention, that is, indirect power feeding, or may be formed between the fixed seat 5 and the lower frame 3 ′ of the electrolytic frame. In addition, a spacer 6 made of an insulating material such as Teflon may be provided to provide an insulated structure.

【0011】次に、本発明に係る陽極酸化処理装置を使
用して、円筒状導電性支持体の陽極酸化処理をする際の
方法を説明する。先ず、電解槽1外で、電解枠の下方枠
3′の上部に配置した複数個の固定座5の上部に複数本
の円筒状導電性支持体4を嵌合する。次いで、これら円
筒状導電性支持体4の上端にワーク押さえ7を被せ、こ
のワーク押さえ7をウェイトバー8によって円筒状導電
性支持体4を固定座5側に押圧・固定する。円筒状導電
性支持体4を固定した電解枠3を電解槽1内の電解液1
1中に浸漬し、電解枠3に直流電源13を接続し、ま
た、陰極板2を電解槽1内に浸漬し、直流電源13から
通電する。電流は、電解液11を介してのみ円筒状導電
性支持体4に給電され、円筒状導電性支持体4の表面に
陽極酸化被膜が形成される。
Next, a method for anodizing a cylindrical conductive support using the anodizing apparatus according to the present invention will be described. First, outside the electrolytic cell 1, a plurality of cylindrical conductive supports 4 are fitted to upper portions of a plurality of fixing seats 5 arranged above the lower frame 3 'of the electrolytic frame. Next, a work holder 7 is put on the upper end of the cylindrical conductive support 4, and the work holder 7 is pressed and fixed to the fixed seat 5 side by the weight bar 8. The electrolytic frame 3 to which the cylindrical conductive support 4 is fixed is connected to the electrolytic solution 1 in the electrolytic cell 1.
1, a DC power supply 13 is connected to the electrolytic frame 3, and the cathode plate 2 is immersed in the electrolytic cell 1, and electricity is supplied from the DC power supply 13. An electric current is supplied to the cylindrical conductive support 4 only through the electrolytic solution 11, and an anodic oxide film is formed on the surface of the cylindrical conductive support 4.

【0012】本発明に係る円筒状導電性支持体の材質
は、アルミニウムまたはアルミニウム合金が使用でき、
具体的にはA1050、A3003、A6063等が使
用できる。また、電解液は硫酸、しゅう酸、燐酸等が使
用できるが、中でも硫酸が好ましい。硫酸を使用した場
合の陽極酸化被膜処理では、硫酸濃度は100〜300
g/lとし、電解液の温度は10〜30℃の範囲より適
宜選ぶことができる。
The material of the cylindrical conductive support according to the present invention can be aluminum or aluminum alloy.
Specifically, A1050, A3003, A6063 and the like can be used. In addition, sulfuric acid, oxalic acid, phosphoric acid and the like can be used as the electrolytic solution, and among them, sulfuric acid is preferable. In the anodic oxide film treatment using sulfuric acid, the sulfuric acid concentration is 100 to 300.
g / l, and the temperature of the electrolytic solution can be appropriately selected from the range of 10 to 30 ° C.

【0013】本発明に係る円筒状導電性支持体の陽極酸
化被膜の膜厚は、用途に応じて2〜15μmの範囲で、
電流密度、通電時間等の陽極酸化処理の条件を選び形成
させることができる。本発明に係る電子写真感光体は、
円筒状導電性支持体の外側表面に陽極酸化被膜上に少な
くとも感光層が設けられたものである。この感光層は、
通常、導電性基板上に感光体を形成する各種の手法、例
えば、蒸着する手段、または無機もしくは有機の光導電
性の顔料の分散溶液や、有機光導電性化合物の溶解液に
必要なら結着樹脂を含む塗工液を導電性基板上に塗布
し、乾燥する工程を経て感光体を製造する手段により設
けることができる。後者の塗布、乾燥の手段が連続化可
能であり、工程上有利である。
The thickness of the anodic oxide film of the cylindrical conductive support according to the present invention is in the range of 2 to 15 μm depending on the application.
Anodizing treatment conditions such as current density and conduction time can be selected and formed. The electrophotographic photoreceptor according to the present invention,
At least a photosensitive layer is provided on an anodized film on the outer surface of a cylindrical conductive support. This photosensitive layer
Usually, various methods for forming a photoreceptor on a conductive substrate, for example, means for vapor deposition, or binding to a dispersion of an inorganic or organic photoconductive pigment or a solution of an organic photoconductive compound if necessary It can be provided by means for manufacturing a photoreceptor through a process of applying a coating liquid containing a resin on a conductive substrate and drying the coating. The latter application and drying means can be made continuous, which is advantageous in the process.

【0014】この工程に適用できる感光体としては、従
来よりCdS、ZnO、TiO2 等に必要なら増感剤を
添加した樹脂分散溶液や、ポリビニルカルバソールのよ
うな有機光導電性化合物に適切な増感剤を含む溶液を塗
布したものが使用できる。また、最近では塗布系の感光
体としてフタロシアニン系化合物、ペリレン系化合物、
アゾ系化合物、キナクリドン系化合物、またはその他の
各種有機系染料や顔料の分散溶液を塗布、乾燥して、電
荷発生層を形成し、次いでピラゾリン誘導体、ヒドラゾ
ン誘導体、ジフェニルメタン誘導体、トリフェニルメタ
ン誘導体、トリフェニルアミン誘導体、オキサジアゾー
ル誘導体、ベンゾオキサゾール誘導体、スチリル染料ベ
ース誘導体等の化合物を含む樹脂溶液を塗布、乾燥して
電荷輸送層を形成したものなどが挙げられる。
As a photoreceptor applicable to this step, a resin dispersion solution in which a sensitizer is added if necessary to CdS, ZnO, TiO 2 or the like, or an organic photoconductive compound such as polyvinyl carbazole is suitable. Those coated with a solution containing a sensitizer can be used. Recently, phthalocyanine compounds, perylene compounds,
A dispersion solution of an azo compound, a quinacridone compound, or various other organic dyes and pigments is applied and dried to form a charge generation layer, and then a pyrazoline derivative, a hydrazone derivative, a diphenylmethane derivative, a triphenylmethane derivative, and a triphenylmethane derivative. Examples thereof include those in which a resin solution containing a compound such as a phenylamine derivative, an oxadiazole derivative, a benzoxazole derivative, or a styryl dye-based derivative is applied and dried to form a charge transport layer.

【0015】電荷発生層は、上記電荷発生物質を適当な
結着剤に分散させ、これを陽極酸化被膜処理した支持体
の上に塗布することによって形成できる。この時、電荷
発生層は5μm以下、好ましくは0.01〜2μmの膜
厚で形成される。電荷輸送層は、上記電荷発生層と電気
的に接続されており、電界の存在下で電荷発生層から注
入された電荷キャリアを受け取るとともに、これらの電
荷キャリアを表面まで輸送できる機能を有している。電
荷輸送層は、電荷キャリアを輸送できる限界があるの
で、必要以上に膜厚を厚くすることができない。一般的
には、5〜60μmであるが、好ましい範囲は8〜45
μmである。陽極酸化被膜と感光層の中間に、バリヤー
機能と接着機能をもつ下引層を設けることもできる。ま
た、電荷発生層、電荷輸送層を逆に積層したもの、更に
は、電荷輸送媒体中に電荷発生物質を分散したいわゆる
分散型等の感光層も設けることができる。
The charge generating layer can be formed by dispersing the above-mentioned charge generating substance in a suitable binder and applying the resultant to a support which has been subjected to an anodic oxide film treatment. At this time, the charge generation layer is formed to a thickness of 5 μm or less, preferably 0.01 to 2 μm. The charge transport layer is electrically connected to the charge generation layer, has a function of receiving charge carriers injected from the charge generation layer in the presence of an electric field and transporting these charge carriers to the surface. I have. Since the charge transport layer has a limit for transporting charge carriers, the film thickness cannot be increased more than necessary. Generally, it is 5 to 60 μm, but a preferable range is 8 to 45 μm.
μm. An undercoat layer having a barrier function and an adhesive function may be provided between the anodized film and the photosensitive layer. In addition, a layer in which a charge generation layer and a charge transport layer are stacked in reverse, and a so-called dispersion type photosensitive layer in which a charge generation substance is dispersed in a charge transport medium can be provided.

【0016】[0016]

【実施例】以下、本発明の内容および効果を実施例によ
り更に詳細に説明するが、本発明は、その要旨を越えな
い限り以下の例に限定されるものではない。 実施例1 図1において、電解槽1に電解液11として硫酸180
g/lの水溶液を収容した。電解枠の下方枠3′に給電
棒10を備えた図4に示した様に上から下方へ抜ける合
計開口面積が240mm2 の液抜き孔を設けたテフロン
製の固定座5を10個配置し、これら固定座5に円筒状
導電性支持体4を挿入し、ワーク押さえによって押圧・
固定し、図6に示す形状を有す塩化ビニル製の絶縁被覆
部15を給電棒10の上部に設けている。なお、本実施
例においては給電棒10のうち電解処理液に接している
部分16の表面積と絶縁被覆部15に覆われている部分
の表面積の比は3対5であった。18℃の電解液11に
浸し、電流密度2.0(A/dm2 )を14分間継続通
電し、間接給電法により陽極酸化被膜を形成した。その
結果、円筒状導電性支持体の陽極酸化被膜の膜厚の差は
2μmであった。
EXAMPLES Hereinafter, the contents and effects of the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist of the present invention. Example 1 In FIG. 1, sulfuric acid 180 was used as an electrolytic solution 11 in an electrolytic cell 1.
g / l of aqueous solution. As shown in FIG. 4, ten fixing seats 5 made of Teflon and provided with a drainage hole having a total opening area of 240 mm 2 and having a total opening area of 240 mm 2 are provided on the lower frame 3 ′ of the electrolytic frame with the power supply rods 10. Then, the cylindrical conductive support 4 is inserted into these fixed seats 5, and pressed by a work holder.
An insulating coating 15 made of vinyl chloride, which is fixed and has the shape shown in FIG. In this embodiment, the ratio of the surface area of the portion 16 of the power supply rod 10 in contact with the electrolytic treatment liquid to the surface area of the portion covered with the insulating coating portion 15 was 3 to 5. It was immersed in the electrolytic solution 11 at 18 ° C., and was continuously energized at a current density of 2.0 (A / dm 2 ) for 14 minutes to form an anodic oxide film by an indirect power supply method. As a result, the difference in the thickness of the anodic oxide film of the cylindrical conductive support was 2 μm.

【0017】比較例1 絶縁被覆部15をとりつけない以外は実施例1と同様に
陽極酸化被膜を形成した。その結果、円筒状導電性支持
体の陽極酸化被膜の膜厚の差は3μmであった。
Comparative Example 1 An anodic oxide film was formed in the same manner as in Example 1 except that the insulating coating 15 was not attached. As a result, the difference in the thickness of the anodic oxide film of the cylindrical conductive support was 3 μm.

【0018】[0018]

【発明の効果】上記の通り、本願発明によれば、円筒状
導電性支持体の上部と下部の陽極酸化被膜の膜厚の差
が、比較例に比べ抑えられるために、より均一な膜厚の
陽極酸化被膜を有する支持体が得られ、ひいては該支持
体を電子写真感光体用の支持体として用いた場合には、
不良品の発生率が少なく、優れた性能の感光体が得られ
ることとなる。
As described above, according to the present invention, the difference in film thickness between the upper and lower anodic oxide films of the cylindrical conductive support is suppressed as compared with the comparative example, so that a more uniform film thickness is obtained. When a support having an anodic oxide coating is obtained, and thus the support is used as a support for an electrophotographic photosensitive member,
The occurrence rate of defective products is small, and a photosensitive member having excellent performance can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を示す陽極酸化処理装置の正
面図である。
FIG. 1 is a front view of an anodizing apparatus showing one embodiment of the present invention.

【図2】本発明の一実施例を示す陽極酸化処理装置の側
面図である。
FIG. 2 is a side view of the anodizing apparatus showing one embodiment of the present invention.

【図3】円筒状導電性支持体の固定状態を示す側面略図
である。
FIG. 3 is a schematic side view showing a fixed state of a cylindrical conductive support.

【図4】本発明の固定座の一実施例を示す図である。FIG. 4 is a view showing one embodiment of a fixed seat of the present invention.

【図5】本発明の絶縁被覆部の一実施例を示す図であ
る。
FIG. 5 is a view showing one embodiment of an insulating coating portion of the present invention.

【符号の説明】[Explanation of symbols]

1 電解槽 2 陰極板 3 電解枠 3′ 電解枠の下方枠 4 円筒状導電性支持体 5 固定座 6 スペーサー 7 ワーク押さえ 8 ウェイトバー 9 スペーサー 10 給電棒 11 電解液 12 ウェイトバーガイド棒 13 直流電源 14 液抜き孔 15 絶縁被覆部 16 給電棒のうち電解処理液に接している部分 17 溝 DESCRIPTION OF SYMBOLS 1 Electrolyzer 2 Cathode plate 3 Electrolytic frame 3 'Lower frame of electrolytic frame 4 Cylindrical conductive support 5 Fixed seat 6 Spacer 7 Work holder 8 Weight bar 9 Spacer 10 Power supply rod 11 Electrolyte 12 Weight bar guide rod 13 DC power supply 14 Drainage hole 15 Insulation coating 16 Part of power supply rod in contact with electrolytic treatment liquid

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 円筒状導電性支持体の表面に陽極酸化被
膜を形成するための陽極酸化処理装置であって、電解処
理液を収容した電解槽(1)と、円筒状導電性支持体を
支持する電解枠(3)と、該電解枠の下枠の上面に設け
られ、円筒状導電性支持体の下端面を担持するための固
定座(5)と、該固定座の略中央に略垂直に設けられた
給電棒(10)を設けてなる円筒状導電性支持体の陽極
酸化処理装置において、 該給電棒の上部に、絶縁被覆部(15)を設けてなるこ
とを特徴とする円筒状導電性支持体の陽極処理装置。
An anodic oxidation treatment apparatus for forming an anodic oxide film on the surface of a cylindrical conductive support, comprising: an electrolytic tank (1) containing an electrolytic treatment solution; and a cylindrical conductive support. An electrolytic frame (3) to be supported; a fixed seat (5) provided on the upper surface of the lower frame of the electrolytic frame for supporting a lower end surface of the cylindrical conductive support; An anodizing apparatus for a cylindrical conductive support provided with a vertically provided power supply rod (10), wherein an insulating coating portion (15) is provided on the upper part of the power supply rod. For anodizing a conductive support in the form of a solid.
【請求項2】 給電棒(10)のうち、電解処理液に接
している部分(16)の表面積と、絶縁被覆部(15)
に覆われている部分の表面積の比が2対5〜8対5であ
ることを特徴とする請求項1記載の円筒状導電性支持体
の陽極処理装置。
2. A surface area of a portion (16) of the power supply rod (10) which is in contact with the electrolytic treatment liquid, and an insulating coating portion (15).
2. The anodizing apparatus for a cylindrical conductive support according to claim 1, wherein the ratio of the surface area of the portion covered by the conductive material is 2: 5 to 8: 5.
【請求項3】 絶縁被覆部(15)に溝(17)及び/
又は電解処理液を通す部分(18)があることを特徴と
する請求項1又は2記載の円筒状導電性支持体の陽極処
理装置。
3. A groove (17) and / or a groove in an insulating coating portion (15).
3. The anodizing apparatus for a cylindrical conductive support according to claim 1, further comprising a portion through which an electrolytic treatment solution is passed.
JP11996399A 1999-04-27 1999-04-27 Anodizing apparatus for cylindrical conductive support Expired - Fee Related JP3900739B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11996399A JP3900739B2 (en) 1999-04-27 1999-04-27 Anodizing apparatus for cylindrical conductive support

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11996399A JP3900739B2 (en) 1999-04-27 1999-04-27 Anodizing apparatus for cylindrical conductive support

Publications (2)

Publication Number Publication Date
JP2000313994A true JP2000313994A (en) 2000-11-14
JP3900739B2 JP3900739B2 (en) 2007-04-04

Family

ID=14774543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11996399A Expired - Fee Related JP3900739B2 (en) 1999-04-27 1999-04-27 Anodizing apparatus for cylindrical conductive support

Country Status (1)

Country Link
JP (1) JP3900739B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101172813B1 (en) 2009-12-07 2012-08-09 한국전기연구원 apparatus for tubular type high-field fabrication of anodic nanostructures
CN114197009A (en) * 2021-11-25 2022-03-18 安徽铭旋汽车零部件有限公司 Anodic oxidation device of aluminum alloy barrel
CN115125597A (en) * 2022-06-24 2022-09-30 中航飞机起落架有限责任公司 Hard anodizing device for deep hole of workpiece

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101172813B1 (en) 2009-12-07 2012-08-09 한국전기연구원 apparatus for tubular type high-field fabrication of anodic nanostructures
CN114197009A (en) * 2021-11-25 2022-03-18 安徽铭旋汽车零部件有限公司 Anodic oxidation device of aluminum alloy barrel
CN114197009B (en) * 2021-11-25 2023-08-08 安徽铭旋汽车零部件有限公司 Anodic oxidation device of aluminum alloy barrel
CN115125597A (en) * 2022-06-24 2022-09-30 中航飞机起落架有限责任公司 Hard anodizing device for deep hole of workpiece
CN115125597B (en) * 2022-06-24 2023-10-24 中航飞机起落架有限责任公司 Hard anodic oxidation device for deep hole of workpiece

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