JP2000306234A - Washing method of hard substrate for magnetic recording medium - Google Patents

Washing method of hard substrate for magnetic recording medium

Info

Publication number
JP2000306234A
JP2000306234A JP11114488A JP11448899A JP2000306234A JP 2000306234 A JP2000306234 A JP 2000306234A JP 11114488 A JP11114488 A JP 11114488A JP 11448899 A JP11448899 A JP 11448899A JP 2000306234 A JP2000306234 A JP 2000306234A
Authority
JP
Japan
Prior art keywords
substrate
cleaning
hard
recording medium
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11114488A
Other languages
Japanese (ja)
Inventor
Koji Tamura
孝司 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP11114488A priority Critical patent/JP2000306234A/en
Publication of JP2000306234A publication Critical patent/JP2000306234A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To realize a washing method of a hard substrate in order to obtain such a magnetic recording medium that a <= several tens of Å low flying height of a head at a surface of the hard substrate for the magnetic recording medium is realized. SOLUTION: A low frequency ultrasonic wave washing step is incorporated in a washing method of a hard substrate having a texture formed on a surface of a Ni-P film formed on a hard member plate. For example, a washing method wherein the surface of the substrate is scrubbing washed, ultrasonically washed by a 20-50 kHz low frequency ultrasonic wave in an alkaline detergent solution, successively washed with warm pure water, a pure water and an ultra pure water in this order and finally dryed by using IPA vapor is applied.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、基板部材として
硬質ガラス板,各種セラミック板などの非磁性の硬質部
材を用いた硬質基板を使用する磁気記録媒体の製造にお
ける硬質基板の洗浄方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a hard substrate in the manufacture of a magnetic recording medium using a hard substrate using a non-magnetic hard member such as a hard glass plate or various ceramic plates as a substrate member.

【0002】[0002]

【従来の技術】コンピュータなどの情報処理装置の情報
記憶装置として用いられるハードディスクドライブ(以
下、HDDと称する)は、心臓部となる磁気記録媒体
(以下、単に媒体とも称する)と、それに対向配置され
た磁気ヘッドとを備えてなり、磁気ヘッドを介して媒体
への情報信号の書き込みあるいは媒体に書き込まれてい
る情報信号の読み取りが行われる。
2. Description of the Related Art A hard disk drive (hereinafter, referred to as an HDD) used as an information storage device of an information processing apparatus such as a computer is provided with a magnetic recording medium (hereinafter, also simply referred to as a medium) serving as a heart, and disposed opposite to the magnetic recording medium. A magnetic head for writing an information signal on a medium or reading an information signal written on the medium via the magnetic head.

【0003】HDDにおいては、通常、CSS方式が採
られており、情報信号の書き込み,読み取りが行われる
駆動時には、磁気ヘッドは高速回転する媒体上を媒体の
回転で生じる空気流により僅かに浮上走行し、駆動停止
時には停止している媒体表面に接触停止しており、駆動
の開始時および中止時には磁気ヘッドは媒体表面と過渡
的に接触摺動する。情報信号の書き込み,読み取りが良
好に行われるためには、媒体表面は平滑で磁気ヘッドの
安定,円滑な浮上走行が妨げられるような異常突起がな
く、かつ、磁気ヘッドの接触摺動が円滑に行われるよう
に適度に微細に粗面化されていることが必要である。媒
体への情報信号の記録密度は媒体の磁性層とその上を浮
上走行する磁気ヘッドとの距離(以下、単にヘッド浮上
量と称する)に大きく依存し、この量が小さい程記録密
度は大きくなる。
In the HDD, the CSS method is usually employed. When driving to write and read an information signal, the magnetic head slightly floats on the medium rotating at high speed due to the air flow generated by the rotation of the medium. However, when the drive is stopped, the magnetic head is brought into contact with the surface of the medium that has been stopped, and when the drive is started and stopped, the magnetic head is brought into transient contact with the medium surface and slides. In order for information signals to be written and read satisfactorily, the medium surface is smooth and free from abnormal protrusions that hinder the stable and smooth flying of the magnetic head, and the contact sliding of the magnetic head is smooth. It must be reasonably fine and rough to be performed. The recording density of an information signal on a medium largely depends on the distance between a magnetic layer of the medium and a magnetic head flying above the medium (hereinafter simply referred to as a head flying height), and the smaller the amount, the higher the recording density. .

【0004】媒体は、一般に、ディスク状非磁性部材板
上に、無電解めっき法,スパッタリング法などでNi−
P膜が形成され、その表面に鏡面加工が施された後、円
周方向に沿って微細な凹凸を形成するテクスチャー加工
が施されて作製された非磁性基板上に、スパッタ法,C
VD法などにより、Cr合金などの非磁性金属からなる
下地層,Co合金などからなる磁性層,カーボンなどか
らなる保護層が順次形成され、さらに、その上に液体潤
滑剤を塗布した潤滑層が形成されてなる。
[0004] A medium is generally formed on a disk-shaped non-magnetic member plate by electroless plating, sputtering or the like.
After a P film is formed, the surface thereof is mirror-finished, and then a textured process for forming fine irregularities along the circumferential direction is performed.
An underlayer made of a non-magnetic metal such as a Cr alloy, a magnetic layer made of a Co alloy, and a protective layer made of carbon are sequentially formed by a VD method or the like, and a lubricating layer coated with a liquid lubricant is further formed thereon. Be formed.

【0005】近年、HDDの記録密度を増大させること
への要望を充たすためにヘッド浮上量は益々小さくな
り、数十Åオーダーにまでなってきている。このような
小さいヘッド浮上量を実現するためには媒体表面ができ
るだけ平坦であると同時に、磁気ヘッドの走行を妨げる
ような異常突起がないことが重要となる。異常突起の生
じる要因は種々考えられ対策が採られてきたが、特に最
近、基板のテクスチャー加工時に生じる研磨渣や砥粒残
渣などの付着物のうち、基板の洗浄工程において除去し
きれなかった付着物がヘッドの安定浮上走行を妨げる異
常突起が生じる大きな要因として取り上げられるように
なってきた。
[0005] In recent years, the head flying height has been increasingly reduced to the order of several tens of thousands in order to satisfy the demand for increasing the recording density of HDDs. In order to realize such a small head flying height, it is important that the medium surface is as flat as possible and that there are no abnormal protrusions that hinder the running of the magnetic head. Various causes of abnormal projections have been considered and measures have been taken.However, recently, among the deposits such as polishing residue and abrasive residue generated during the texturing of the substrate, they cannot be completely removed in the substrate cleaning process. Kimono has come to be taken up as a major cause of abnormal projections that hinder the stable floating flight of the head.

【0006】従来、基板の非磁性部材板としては安価で
入手し易いアルミニウム系合金からなる板が用いられて
きた。そうして、基板の洗浄方法としては、アルカリ洗
剤への浸漬方式,ブラシを用いたスクラブ方式などが検
討,実施されてきた。なかでも、付着物の除去にはスク
ラブ方式,例えばスポンジブラシに洗浄剤をしみこませ
これで基板表面を擦り洗いする方法が効果があるとされ
てきたが、使用されるブラシ,例えばスポンジブラシ自
体が軟らかいため、充分に満足できるレベルまでには除
去できず、また、硬い部材のブラシでスクラブを行うと
基板表面を傷つけてテクスチャーを乱してしまうという
問題が生じていた。
Conventionally, a plate made of an aluminum-based alloy which is inexpensive and easily available has been used as a non-magnetic member plate of a substrate. As a method of cleaning the substrate, a method of dipping in an alkaline detergent, a scrub method using a brush, and the like have been studied and implemented. Above all, scrubbing, for example, a method of soaking a sponge brush with a cleaning agent to scrub the substrate surface has been said to be effective, but the brush used, for example, the sponge brush itself, has been considered effective. Since it is soft, it cannot be removed to a sufficiently satisfactory level, and when scrubbing with a brush made of a hard member, the substrate surface is damaged and the texture is disturbed.

【0007】最近、基板の洗浄方法に超音波洗浄を採り
入れることが検討されてきている。通常の超音波洗浄に
用いられている28kHz〜50kHzの低周波の超音
波を用いると強力なキャビテーション効果により生じる
衝撃作用により非常に大きな洗浄効果が得られるが、媒
体用基板においては基板部材として軟質のアルミニウム
系合金板が用いられているために機械的ダメージを受け
て基板表面形状が荒れて問題となる。そこで、洗浄に用
いる超音波の周波数について検討が進められ、例えば、
特開平4−212716号公報には、波長200kHz
〜1600kHzと比較的高周波の超音波を用いること
により基板の表面粗度が変わるようなダメージを与える
ことなく大きな洗浄効果が得られることが開示されてい
る。
Recently, it has been studied to employ ultrasonic cleaning as a method of cleaning a substrate. When a low frequency ultrasonic wave of 28 kHz to 50 kHz used in normal ultrasonic cleaning is used, a very large cleaning effect can be obtained by an impact action caused by a strong cavitation effect. Since the aluminum-based alloy plate is used, it is mechanically damaged and the surface shape of the substrate becomes rough, which is a problem. Therefore, the frequency of ultrasonic waves used for cleaning has been studied, for example,
Japanese Patent Application Laid-Open No. 4-212716 discloses that the wavelength is 200 kHz.
It is disclosed that a large cleaning effect can be obtained by using ultrasonic waves having a relatively high frequency of up to 1600 kHz without damaging the surface roughness of the substrate.

【0008】また、近年、コンピュータの小型化,高性
能化により用途が拡大し、持ち運び可能なノートパソコ
ンが普及してきたことなどにより媒体の耐衝撃性が従来
より必要となり、また、HDDの高記録密度化,高速化
への要望が強く、そのために高速回転においても媒体の
面振れを無くすことが要求されてきた。これらの要求に
対応するため、硬質で平坦な部材板として結晶化ガラ
ス,化学強化ガラス,各種セラミックの板などの硬質部
材が使用されるようになってきた。
In recent years, the use of computers has been expanded due to the miniaturization and high performance of computers, and portable notebook computers have become widespread. There is a strong demand for higher density and higher speed, and therefore, it has been required to eliminate surface runout of the medium even at high speed rotation. In order to meet these demands, hard members such as crystallized glass, chemically strengthened glass, and various ceramic plates have been used as hard and flat member plates.

【0009】[0009]

【発明が解決しようとする課題】硬質基板を用いること
により機械的強度,面振れの面では性能が大幅に向上す
るが、上述のような比較的周波数の高い超音波を用いる
超音波洗浄工程を含む洗浄方法では基板表面の付着物を
充分には除去できず、最近市場で要求される高記録密度
に対応できる低ヘッド浮上量を実現するためには、残存
する僅かの付着物残渣が無視できなくなってきた。
The use of a hard substrate greatly improves the performance in terms of mechanical strength and runout. However, the above-described ultrasonic cleaning step using an ultrasonic wave having a relatively high frequency is required. With the cleaning method that includes, it is not possible to sufficiently remove the deposits on the substrate surface, and in order to achieve a low head flying height that can respond to the high recording density required in the market recently, the remaining small deposits can be ignored. Is gone.

【0010】この発明は、上述の点に鑑みてなされたも
のであって、非磁性基板として硬質基板を用いる媒体の
製造に際して、基板を充分に清浄化できる洗浄方法を提
供することを目的とする。
The present invention has been made in view of the above points, and has as its object to provide a cleaning method capable of sufficiently cleaning a substrate using a hard substrate as a nonmagnetic substrate. .

【0011】[0011]

【課題を解決するための手段】上記の課題は、この発明
によれば、硬質基板を用いる媒体の製造に際して、硬質
部材板上にNi−P膜を形成しその表面に凹凸を形成す
るためのテクスチャー加工を施して作製した媒体用硬質
基板の洗浄において、液中で低周波超音波を用いて前記
基体表面を超音波洗浄する工程を含む洗浄方法を適用す
ることによって解決される。
According to the present invention, there is provided, according to the present invention, a method for forming a Ni-P film on a hard member plate and forming irregularities on the surface thereof when manufacturing a medium using a hard substrate. The problem is solved by applying a cleaning method including a step of ultrasonically cleaning the surface of the substrate using low-frequency ultrasonic waves in a liquid in cleaning a medium hard substrate produced by performing texture processing.

【0012】基板表面に低周波の超音波を照射すること
により強力なキャビテーション効果により生じた衝撃力
で、基板表面の強固な付着物を効果的に除去することが
可能となり、比較的高周波の超音波を用いて超音波洗浄
を行った場合よりもはるかに高い清浄度が得られる。し
かも、硬質部材板を用いた硬質基板においては、このよ
うな低周波超音波洗浄によってもNi−P膜を形成され
た基板表面はほとんど機械的ダメージを受けることな
く、基板表面に形成された凹凸のテクスチャーはほとん
ど乱れることがないことが確認された。
By irradiating the substrate surface with low-frequency ultrasonic waves, it is possible to effectively remove solid deposits on the substrate surface by an impact force generated by a strong cavitation effect. Much higher cleanliness is obtained than when ultrasonic cleaning is performed using sound waves. Moreover, in the case of a hard substrate using a hard member plate, the surface of the substrate on which the Ni-P film is formed is hardly mechanically damaged even by such low-frequency ultrasonic cleaning, and the irregularities formed on the substrate surface are hardly damaged. It was confirmed that the texture of was hardly disturbed.

【0013】超音波としては、キャビテーション効果の
大きい周波数20kHzないし50kHzの超音波を用
いると好適である。また、液としては純水などでもよい
が、アルカリ洗剤溶液を用いると好適である。
As the ultrasonic wave, it is preferable to use an ultrasonic wave having a frequency of 20 kHz to 50 kHz having a large cavitation effect. Further, the liquid may be pure water or the like, but it is preferable to use an alkaline detergent solution.

【0014】[0014]

【発明の実施の形態】図1は、この発明に係わる媒体の
模式的断面図で、硬質部材板1aの上にNi−P膜1b
が形成されその表面にテクスチャー加工が施された硬質
基板1の上にCr合金の下地層2,Co合金の磁性層
3,カーボン系の保護層4,液体潤滑剤を塗布した潤滑
層5が順次形成された構成のものである。
FIG. 1 is a schematic sectional view of a medium according to the present invention, in which a Ni-P film 1b is formed on a hard member plate 1a.
Is formed on a hard substrate 1 having a textured surface, a Cr alloy base layer 2, a Co alloy magnetic layer 3, a carbon-based protective layer 4, and a lubricating layer 5 coated with a liquid lubricant. It is of the formed configuration.

【0015】硬質部材板1aとしては、結晶化ガラス,
化学強化ガラス,各種セラミックの板などの硬質部材が
用いられる。硬質部材板1aの表面を平滑に加工した
後、その表面に無電解めっき法またはスパッタ法でNi
−P膜1bを形成し、その表面にテクスチャー加工を施
して微細な凹凸を形成して硬質基板1とする。
As the hard member plate 1a, crystallized glass,
Hard members such as chemically strengthened glass and various ceramic plates are used. After smoothing the surface of the hard member plate 1a, Ni surface is formed on the surface by electroless plating or sputtering.
The P substrate 1b is formed, and its surface is subjected to texture processing to form fine irregularities, thereby forming the hard substrate 1.

【0016】この硬質基板1を洗浄して表面の付着物を
除去し清浄にする。図2は、この発明に係わる基板の洗
浄の一例の洗浄工程図で、硬質基板表面に、洗剤あるい
は水などを含むスポンジブラシで擦り洗いをする通常の
スクラブ方式の洗浄を施した後、アルカリ洗剤,あるい
は純水などの槽に浸漬し低周波の超音波を用いてこの発
明による超音波洗浄を施す。この超音波洗浄により強固
な付着物も除去される。続いて、通常行われる温純水浸
漬,純水浸漬,超純水シャワー,の各洗浄工程を行った
後、IPAベーパーによる乾燥を行う。
The hard substrate 1 is cleaned to remove extraneous matter on the surface and to clean the substrate. FIG. 2 is a cleaning process diagram of an example of substrate cleaning according to the present invention, in which a hard substrate surface is subjected to a normal scrub-type cleaning by rubbing with a sponge brush containing a detergent or water and then an alkaline detergent. Or, it is immersed in a bath of pure water or the like and subjected to ultrasonic cleaning according to the present invention using low-frequency ultrasonic waves. This ultrasonic cleaning also removes strong deposits. Subsequently, after performing each of the usual cleaning steps of warm pure water immersion, pure water immersion, and ultrapure water shower, drying with IPA vapor is performed.

【0017】このような洗浄工程を施された硬質基板1
上に、スパッタ法,CVD法などで、Cr合金からなる
下地層2,Co系合金からなる磁性層3,カーボン系の
保護層4を順次形成し、その上に塗布法で液体潤滑剤を
塗布して潤滑層5を形成することにより、市場要求を充
たす低ヘッド浮上量が実現できる媒体が得られる。
The hard substrate 1 having been subjected to such a cleaning step
An underlayer made of a Cr alloy, a magnetic layer made of a Co-based alloy, and a carbon-based protective layer 4 are sequentially formed thereon by a sputtering method, a CVD method, or the like, and a liquid lubricant is applied thereon by a coating method. By forming the lubrication layer 5 in this manner, a medium that can realize a low head flying height that satisfies the market requirements is obtained.

【0018】[0018]

【実施例】次に、この発明の具体的な実施例について説
明する。 実施例1 硬質部材板として2.5インチ媒体用ディスク状強化ガ
ラス板(内径10mm,外形65mm)を用い、その表
面に無電解めっき法でNi−P膜を形成し、Ni−P膜
表面に円周方向に凹凸を形成するためダイヤモンドの砥
粒を用いてテクスチャー加工を施して表面粗さが中心線
平均粗さRa で約1nmの非磁性の硬質基板を作製し
た。
Next, specific embodiments of the present invention will be described. Example 1 A 2.5-inch disk-shaped tempered glass plate for media (inner diameter 10 mm, outer diameter 65 mm) was used as a hard member plate, and a Ni-P film was formed on the surface by electroless plating, and a Ni-P film was formed on the surface. Texture processing was performed using diamond abrasive grains in order to form irregularities in the circumferential direction, thereby producing a non-magnetic hard substrate having a surface roughness of about 1 nm with a center line average roughness Ra.

【0019】この硬質基板表面に、テクスチャー加工後
の研磨渣や砥粒残渣などの付着物を除去し清浄にするた
めの洗浄を行う。まず、アルカリ洗剤を含んだスポンジ
ブラシで基板表面を擦り洗いするスクラブ方式の洗浄を
施す。続いて、アルカリ洗剤槽に浸漬して周波数28k
Hz,出力600Wの超音波を用いる超音波洗浄を3分
間行う。続いて、45℃の温純水に2分間浸漬し,常温
純水に2分間浸漬し,超純水シャワーを行い、最後にI
PAベーパーに約1分間曝して基板表面を乾燥させて実
施例1の基板とする。基板表面には、低周波の超音波に
よる機械的ダメージは認められなかった。
On the surface of the hard substrate, cleaning is performed to remove adhering substances such as polishing residue and abrasive residue after texture processing and to clean the surface. First, scrub cleaning is performed by rubbing the substrate surface with a sponge brush containing an alkaline detergent. Then, immersed in an alkaline detergent tank and
Ultrasonic cleaning using ultrasonic waves of 600 Hz and output of 600 W is performed for 3 minutes. Subsequently, it is immersed in warm pure water of 45 ° C. for 2 minutes, immersed in normal temperature pure water for 2 minutes, showered with ultrapure water, and finally
The substrate surface was dried by exposing it to PA vapor for about 1 minute to obtain a substrate of Example 1. No mechanical damage was observed on the substrate surface due to low frequency ultrasonic waves.

【0020】実施例2 実施例1において、基板洗浄時のアルカリ洗剤槽浸漬超
音波洗浄に用いる超音波の周波数を39kHzに変えた
こと以外は、実施例1と同様にして実施例2の基板とす
る。実施例1の基板と同様に、基板表面に低周波の超音
波による機械的ダメージは認められなかった。
Example 2 A substrate was prepared in the same manner as in Example 1 except that the frequency of the ultrasonic wave used for immersion in the alkaline detergent bath during the cleaning of the substrate was changed to 39 kHz. I do. Similar to the substrate of Example 1, no mechanical damage was observed on the substrate surface due to low-frequency ultrasonic waves.

【0021】比較例1 実施例1において、基板洗浄時のアルカリ洗剤浸漬にお
いて超音波洗浄を行わず、単なる浸漬洗浄としたこと以
外は、実施例1と同様にして比較例1の基板とする。
Comparative Example 1 A substrate of Comparative Example 1 was prepared in the same manner as in Example 1, except that ultrasonic cleaning was not performed in the alkaline detergent immersion at the time of cleaning the substrate, and mere immersion cleaning was performed.

【0022】比較例2 実施例1において、基板洗浄時のアルカリ洗剤槽浸漬超
音波洗浄に用いる超音波を周波数750kHz,出力1
75Wの超音波に変えたこと以外は、実施例1と同様に
して比較例2の基板とする。この場合も、実施例1,2
と同様に基板表面には超音波による機械的ダメージは認
められなかった。
COMPARATIVE EXAMPLE 2 In Example 1, the ultrasonic wave used for the ultrasonic cleaning at the frequency of 750 kHz and the output of 1 was immersed in the alkaline detergent bath for cleaning the substrate.
A substrate of Comparative Example 2 was made in the same manner as in Example 1 except that the ultrasonic wave was changed to 75 W. Also in this case, Embodiments 1 and 2
Similarly, no mechanical damage was observed on the substrate surface due to ultrasonic waves.

【0023】上述のようにして得られた洗浄工程の異な
る4種の基板各10枚について、基板一表面に残存して
いる表面平均径約0.5μm以上の大きさの付着物の個
数を外観検査装置(日立電子エンジニアリング(株)
製;RS−1350)を用いて調べた。その結果を図3
のグラフ図に示す。
For each of the ten substrates of the four types obtained in the above-described different washing steps, the number of adhering substances having a surface average diameter of about 0.5 μm or more remaining on one surface of the substrate is determined by the appearance. Inspection equipment (Hitachi Electronics Engineering Co., Ltd.)
(RS-1350). The result is shown in FIG.
Is shown in the graph of FIG.

【0024】図3に見られるように、比較例1の基板に
比して実施例1,実施例2の基板は付着物数が極めて少
なく、アルカリ洗剤槽浸漬洗浄時低周波超音波により超
音波洗浄を付加した効果は明らかである。また、周波数
750kHzの超音波による超音波洗浄を施した比較例
2の基板は、超音波洗浄を施さなかった比較例1の基板
に比して付着物数は減少しているが、実施例1,実施例
2の基板よりは付着物数がはるかに多い。低周波を用い
た超音波洗浄が付着物の除去に有効であることが明らか
である。
As can be seen from FIG. 3, the substrates of Examples 1 and 2 had a very small number of deposits as compared with the substrate of Comparative Example 1, and the ultrasonic waves were applied by low-frequency ultrasonic waves during immersion cleaning in an alkaline detergent bath. The effect of adding washing is clear. In addition, the substrate of Comparative Example 2 which was subjected to ultrasonic cleaning with ultrasonic waves having a frequency of 750 kHz had a smaller number of deposits than the substrate of Comparative Example 1 which was not subjected to ultrasonic cleaning. The number of deposits is much larger than that of the substrate of the second embodiment. It is clear that ultrasonic cleaning using a low frequency is effective for removing deposits.

【0025】上述のような洗浄工程を施した実施例1,
2の各基板表面に、スパッタ法で、Cr合金下地層,C
o合金磁性層,カーボン保護層を順次形成し、その上に
液体潤滑剤を塗布して潤滑層を形成して媒体を作製した
ところ、市場要求を十分に充たす低ヘッド浮上量を達成
することができた。
Example 1 in which the above-described cleaning process was performed
2 on the surface of each substrate by sputtering,
o When a magnetic layer and a carbon protective layer are sequentially formed and a liquid lubricant is applied thereon to form a lubricating layer to produce a medium, it is possible to achieve a low head flying height that sufficiently satisfies the market requirements. did it.

【0026】[0026]

【発明の効果】この発明によれば、硬質部材板上にNi
−P膜を形成しその表面に凹凸を形成するためのテクス
チャー加工を行って作製した磁気記録媒体用硬質基板の
洗浄方法において、液中で低周波の超音波を用いて前記
基板表面を超音波洗浄する工程を含む洗浄方法とする。
低周波の超音波を用いて洗浄することにより、強固な付
着物も除去することができ、このような硬質基板を用い
ることにより、市場要求に対応できる低ヘッド浮上量の
磁気記録媒体を得ることが可能となる。
According to the present invention, Ni can be deposited on the hard member plate.
In a method of cleaning a hard substrate for a magnetic recording medium manufactured by performing a texturing process for forming a P film and forming irregularities on the surface thereof, an ultrasonic wave of low frequency is applied to the surface of the substrate in a liquid. The cleaning method includes a cleaning step.
By cleaning using low frequency ultrasonic waves, strong deposits can also be removed, and by using such a hard substrate, a magnetic recording medium with a low head flying height that can respond to market requirements can be obtained. Becomes possible.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明に係わる媒体の一例の模式的断面図FIG. 1 is a schematic sectional view of an example of a medium according to the present invention.

【図2】この発明に係わる基板洗浄の一例の洗浄工程図FIG. 2 is a diagram illustrating a cleaning process of an example of substrate cleaning according to the present invention.

【図3】基板洗浄における超音波洗浄の有無および用い
た超音波周波数と洗浄後の付着物数との関係を示す線図
FIG. 3 is a diagram showing the relationship between the presence or absence of ultrasonic cleaning in substrate cleaning, the ultrasonic frequency used, and the number of adhered substances after cleaning;

【符号の説明】[Explanation of symbols]

1 硬質基板 1a 硬質部材板 1b Ni−P膜 2 下地層 3 磁性層 4 保護層 5 潤滑層 DESCRIPTION OF SYMBOLS 1 Hard substrate 1a Hard member plate 1b Ni-P film 2 Underlayer 3 Magnetic layer 4 Protective layer 5 Lubrication layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】硬質部材板上にNi−P膜を形成しその表
面に凹凸を形成するためのテクスチャー加工を行った磁
気記録媒体用硬質基板の洗浄方法において、液中で低周
波超音波を用いて前記基板表面を超音波洗浄する工程を
含むことを特徴とする磁気記録媒体用硬質基板の洗浄方
法。
In a method for cleaning a hard substrate for a magnetic recording medium, a Ni-P film is formed on a hard member plate and a texture process for forming irregularities on the surface is performed. Cleaning a hard substrate for a magnetic recording medium, comprising a step of ultrasonically cleaning the surface of the substrate using the substrate.
【請求項2】波長20kHzないし50kHzの低周波
超音波を用いて超音波洗浄を行うことを特徴とする請求
項1記載の磁気記録媒体用硬質基板の洗浄方法。
2. The method for cleaning a hard substrate for a magnetic recording medium according to claim 1, wherein ultrasonic cleaning is performed using low-frequency ultrasonic waves having a wavelength of 20 kHz to 50 kHz.
【請求項3】アルカリ洗剤溶液中で超音波洗浄すること
を特徴とする請求項1または2記載の磁気記録媒体用硬
質基板の洗浄方法。
3. The method for cleaning a hard substrate for a magnetic recording medium according to claim 1, wherein ultrasonic cleaning is performed in an alkaline detergent solution.
【請求項4】硬質部材板が硬質ガラスからなることを特
徴とする請求項1ないし3のいずれかに記載の磁気記録
媒体用硬質基板の洗浄方法。
4. The method for cleaning a hard substrate for a magnetic recording medium according to claim 1, wherein the hard member plate is made of hard glass.
JP11114488A 1999-04-22 1999-04-22 Washing method of hard substrate for magnetic recording medium Pending JP2000306234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11114488A JP2000306234A (en) 1999-04-22 1999-04-22 Washing method of hard substrate for magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11114488A JP2000306234A (en) 1999-04-22 1999-04-22 Washing method of hard substrate for magnetic recording medium

Publications (1)

Publication Number Publication Date
JP2000306234A true JP2000306234A (en) 2000-11-02

Family

ID=14639018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11114488A Pending JP2000306234A (en) 1999-04-22 1999-04-22 Washing method of hard substrate for magnetic recording medium

Country Status (1)

Country Link
JP (1) JP2000306234A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002352422A (en) * 2001-05-25 2002-12-06 Nippon Sheet Glass Co Ltd Glass substrate for information recording medium and method for manufacturing the same
JP2007229614A (en) * 2006-02-28 2007-09-13 Fujitsu Ltd Washing apparatus, washing method, and production method of product
JP2009020964A (en) * 2007-07-12 2009-01-29 Fuji Electric Device Technology Co Ltd Method for creaning magnetic recording medium substrate and method for manufacturing magnetic recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002352422A (en) * 2001-05-25 2002-12-06 Nippon Sheet Glass Co Ltd Glass substrate for information recording medium and method for manufacturing the same
JP2007229614A (en) * 2006-02-28 2007-09-13 Fujitsu Ltd Washing apparatus, washing method, and production method of product
JP2009020964A (en) * 2007-07-12 2009-01-29 Fuji Electric Device Technology Co Ltd Method for creaning magnetic recording medium substrate and method for manufacturing magnetic recording medium

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