JPH1049868A - Cleaning method for substrate for magnetic disk - Google Patents
Cleaning method for substrate for magnetic diskInfo
- Publication number
- JPH1049868A JPH1049868A JP8207069A JP20706996A JPH1049868A JP H1049868 A JPH1049868 A JP H1049868A JP 8207069 A JP8207069 A JP 8207069A JP 20706996 A JP20706996 A JP 20706996A JP H1049868 A JPH1049868 A JP H1049868A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- substrate
- scrub
- magnetic disk
- rinsing water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 64
- 239000000758 substrate Substances 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 6
- 239000011354 acetal resin Substances 0.000 claims description 6
- 229920006324 polyoxymethylene Polymers 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 6
- 239000008237 rinsing water Substances 0.000 abstract description 17
- 230000000694 effects Effects 0.000 abstract description 7
- 238000003825 pressing Methods 0.000 abstract description 6
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000126 substance Substances 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 238000001035 drying Methods 0.000 description 6
- 239000000428 dust Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000005201 scrubbing Methods 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は磁気ディスク用基板
の洗浄方法に係り、特に、テキスチャー加工後の磁気デ
ィスク用基板のスクラブ洗浄を効率的に行う方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a magnetic disk substrate, and more particularly to a method for efficiently performing scrub cleaning of a magnetic disk substrate after texture processing.
【０００２】[0002]
【従来の技術】コンピュータ等の外部記憶装置として用
いられる磁気ディスクとしては、一般に、アルミニウム
合金基板にアルマイト処理やＮｉ−Ｐメッキ等の非磁性
メッキ処理を施した後に、Ｃｒ等の下地層を形成し、次
いでＣｏ系合金の磁性層を形成し、更に炭素質の保護層
を形成されたものが使用されている。2. Description of the Related Art Generally, a magnetic disk used as an external storage device of a computer or the like is formed by subjecting an aluminum alloy substrate to a non-magnetic plating treatment such as alumite treatment or Ni-P plating and then forming an underlayer such as Cr. Then, a magnetic layer of a Co-based alloy is formed, and a carbonaceous protective layer is further formed.
【０００３】近年、このような磁気ディスクについては
高密度化が図られ、それに伴ない、磁気ディスクと磁気
ヘッドとの間隔、即ち浮上量は益々小さくなり、最近で
は０．１５μｍ以下が要求されている。このように磁気
ヘッドの浮上量が著しく小さいため、磁気ディスク面に
突起があるとヘッドクラッシュを招き、ディスク表面を
傷つけることがある。また、ヘッドクラッシュに至らな
いような微小な突起でも情報の読み書きの際の種々のエ
ラーの原因となり易い。このため、磁気ディスクの製造
においては、基板へのゴミ等の異物（パーティクル）付
着による表面欠陥を低減するために基板の洗浄処理が重
要となっている。In recent years, the density of such magnetic disks has been increased, and as a result, the distance between the magnetic disk and the magnetic head, that is, the flying height, has become smaller and smaller. I have. As described above, since the flying height of the magnetic head is extremely small, if there is a projection on the magnetic disk surface, a head crash may be caused, and the disk surface may be damaged. Further, even a minute protrusion that does not lead to a head crash tends to cause various errors when reading and writing information. For this reason, in the manufacture of magnetic disks, cleaning of the substrate is important in order to reduce surface defects due to adhesion of foreign substances (particles) such as dust to the substrate.
【０００４】一方、磁気ディスクは大容量化、高密度化
と並行して小型化も進められており、スピンドル回転用
のモーター等も益々小さくなっている。このため、モー
ターのトルクが不足し、磁気ヘッドが磁気ディスク面に
固着したまま浮上しないという現象が生じ易い。この磁
気ヘッドの固着を、磁気ヘッドと磁気ディスク表面との
接触を小さくすることにより防止する手段として、磁気
ディスクの基板表面に微細な溝を形成する、テクスチャ
ー加工と称する表面加工を施す処理が行われている。On the other hand, the size of magnetic disks has been reduced in parallel with the increase in capacity and density, and motors for rotating spindles and the like have become smaller. For this reason, a phenomenon in which the torque of the motor is insufficient and the magnetic head does not fly while being fixed to the magnetic disk surface is likely to occur. As means for preventing the sticking of the magnetic head by reducing the contact between the magnetic head and the surface of the magnetic disk, a process of forming a fine groove on the substrate surface of the magnetic disk and performing surface processing called texture processing is performed. Have been done.
【０００５】従って、従来、磁気ディスクの製造に当っ
ては、前述のメッキ処理を施した基板は、テクスチャー
加工後、テキスチャー加工時に基板表面に付着した有機
物や微小なゴミを除去するために、スクラブ洗浄及び超
音波洗浄等の洗浄が行われ、次いで乾燥後、下地層、磁
性層及び保護層の成膜工程に供される。[0005] Therefore, conventionally, in the production of a magnetic disk, a substrate subjected to the above-mentioned plating treatment is subjected to scrubbing to remove organic substances and fine dust adhering to the substrate surface during texturing after texturing. Washing such as washing and ultrasonic washing is performed, and then, after drying, the film is subjected to a step of forming an underlayer, a magnetic layer, and a protective layer.
【０００６】具体的には、図２に示す如く、テキスチャ
ー加工後、スクラブ洗浄（前スクラブ洗浄）を行い、そ
の後、基板を洗浄水中にて超音波洗浄し、再度スクラブ
洗浄（後スクラブ洗浄）を行った後、超音波を照射する
メガシャワー後、スピンドライ乾燥が行われる。Specifically, as shown in FIG. 2, after texture processing, scrub cleaning (pre-scrub cleaning) is performed, then the substrate is ultrasonically cleaned in cleaning water, and scrub cleaning (post-scrub cleaning) is performed again. After performing, after mega shower which irradiates an ultrasonic wave, spin dry is performed.
【０００７】スクラブ洗浄は、図１に示すように、基板
１の両側に配置したロール状のスクラブ２に配管３から
洗浄水を供給しつつスクラブ２を回転させ、これを回転
する基板１に押し付けて基板１の両表面を擦り洗浄した
後、ノズル４からリンス水を基板１に向けてシャワーす
ることで実施されている。In the scrub cleaning, as shown in FIG. 1, the scrub 2 is rotated while supplying cleaning water from a pipe 3 to a roll-shaped scrub 2 disposed on both sides of the substrate 1, and the scrub 2 is pressed against the rotating substrate 1. After rubbing and cleaning both surfaces of the substrate 1, rinsing water is showered from the nozzle 4 toward the substrate 1.
【０００８】従来、スクラブ２としてはウレタンスポン
ジが用いられ、一般に、次のような条件で洗浄が行われ
ている。Conventionally, a urethane sponge has been used as the scrub 2, and cleaning is generally performed under the following conditions.
【０００９】基板回転数：８０ｒｐｍ スクラブ回転数：７５０ｒｐｍ スクラブの基板への押圧力：１００ｇ／ｃｍ2 洗浄水量：０．７５リットル／ｍｉｎ（基板の１表面当
り） スクラブによる擦り洗浄時間：４ｓｅｃ リンス水量：１．７５リットル／ｍｉｎ（基板の１表面
当り） リンス水シャワー時間：２ｓｅｃThe number of rotations of the substrate: 80 rpm The number of rotations of the scrub: 750 rpm The pressing force of the scrub on the substrate: 100 g / cm 2 The amount of cleaning water: 0.75 liter / min (per one surface of the substrate) The time of scrubbing by scrubbing: The amount of rinsing water: 4 sec 1.75 l / min (per surface of substrate) Rinse water shower time: 2 sec
【００１０】[0010]
【発明が解決しようとする課題】前述の如く、磁気ディ
スクの高密度化に伴い、基板表面の欠陥を低減するため
に、基板表面のゴミ等の異物は極力少なくすることが必
要とされる。As described above, as the density of a magnetic disk increases, it is necessary to reduce foreign matter such as dust on the substrate surface as much as possible in order to reduce defects on the substrate surface.
【００１１】しかしながら、従来、テキスチャー加工
後、図２に示すような一連の洗浄、乾燥工程を経て得ら
れる基板は、１表面当りゴミ等の異物が１０〜２０個付
着しており、十分に清浄であるとは言えない。However, conventionally, a substrate obtained through a series of washing and drying steps as shown in FIG. 2 after the texturing process has 10 to 20 foreign substances such as dust per one surface, and is sufficiently clean. It cannot be said that.
【００１２】本発明は上記従来の問題点を解決し、テキ
スチャー加工後の基板のスクラブ洗浄で基板表面を高度
に清浄化することができる磁気ディスク用基板の洗浄方
法を提供することを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned conventional problems and to provide a method of cleaning a substrate for a magnetic disk which can highly clean the substrate surface by scrub cleaning of the substrate after the texture processing. .
【００１３】[0013]
【課題を解決するための手段】本発明の磁気ディスク用
基板の洗浄方法は、磁気ディスク用基板に回転するスク
ラブを押し付けて洗浄し、リンス水をシャワーする磁気
ディスク用基板の洗浄方法において、ポリビニルアセタ
ール系樹脂よりなるスクラブを用いて、スクラブ回転数
１４００〜１６００ｒｐｍ，リンス水量２リットル／ｍ
ｉｎ以上、リンス水シャワー時間１０〜３０ｓｅｃで洗
浄することを特徴とする。According to a method of cleaning a magnetic disk substrate of the present invention, a method of cleaning a magnetic disk substrate by pressing a rotating scrub against a magnetic disk substrate and showering rinse water is provided. Using a scrub made of an acetal resin, a scrub rotation speed of 1400 to 1600 rpm, and a rinse water amount of 2 liter / m
The cleaning is characterized by washing with a rinse water shower time of 10 to 30 seconds or more.
【００１４】なお、本発明において、リンス水量は基板
の１表面当りの水量を示す。In the present invention, the amount of rinsing water indicates the amount of water per one surface of the substrate.
【００１５】本発明によれば、従来のウレタン製スクラ
ブをポリビニルアセタール系樹脂製スクラブに代えるこ
とで、洗浄後の異物付着個数を約１／２〜１／３に低減
できる。また、スクラブ回転数を従来の７５０ｒｐｍか
ら１５００±１００ｒｐｍとすること、リンス水量を従
来の１．７リットル／ｍｉｎから２リットル／ｍｉｎ以
上とすること、及びリンス水シャワー時間を従来の２ｓ
ｅｃから１０〜３０ｓｅｃとすることにより、各々、洗
浄後の異物付着個数を大幅に低減することができ、本発
明では、これらのスクラブ洗浄条件の最適化により、著
しく良好な洗浄効果を得ることができる。According to the present invention, the number of foreign substances adhered after cleaning can be reduced to about 1/2 to 1/3 by replacing the conventional urethane scrub with a polyvinyl acetal resin scrub. Further, the scrub rotation speed is set to 1500 ± 100 rpm from the conventional 750 rpm, the amount of rinsing water is set to 2 liter / min or more from the conventional 1.7 liter / min, and the rinsing water shower time is set to 2 s of the conventional
By setting the time from ec to 10 to 30 seconds, the number of adhered foreign substances after the cleaning can be greatly reduced. In the present invention, by optimizing the scrub cleaning conditions, a remarkably good cleaning effect can be obtained. it can.
【００１６】[0016]
【発明の実施の形態】以下に本発明の実施の形態を説明
する。Embodiments of the present invention will be described below.
【００１７】本発明においては、スクラブ洗浄用スクラ
ブとして、ポリビニルアセタール系樹脂（ポリビニルホ
ルマールを含む広義のポリビニルアセタール樹脂）製ス
クラブを用い、スクラブ回転数１４００〜１６００ｒｐ
ｍで洗浄を行う。このスクラブ回転数が１４００ｒｐｍ
未満でも１６００ｒｐｍを超えても洗浄後の異物残存量
が多くなる。In the present invention, a scrub made of polyvinyl acetal resin (polyvinyl acetal resin in a broad sense including polyvinyl formal) is used as a scrub for scrub cleaning, and the scrub rotation speed is 1400 to 1600 rpm.
Wash with m. This scrub rotation speed is 1400 rpm
If it is less than 1600 rpm or more than 1600 rpm, the amount of foreign matter remaining after cleaning increases.
【００１８】本発明において、リンス水量は２リットル
／ｍｉｎ以上とする。このリンス水量が２リットル／ｍ
ｉｎ未満では、十分な洗浄効果が得られない。リンス水
量は過度に多くても洗浄効果の向上効果に大差はなく、
徒に使用水量が増え好ましくない。一般に、リンス水量
は２〜３リットル／ｍｉｎとするのが好ましい。In the present invention, the amount of rinsing water is 2 liter / min or more. This rinse water volume is 2 liters / m
If it is less than "in", a sufficient cleaning effect cannot be obtained. Even if the amount of rinse water is excessively large, there is no significant difference in the effect of improving the cleaning effect,
However, the amount of water used is undesirably increased. Generally, it is preferable that the amount of rinsing water is 2-3 liters / min.
【００１９】また、リンス水シャワー時間は１０〜３０
秒とする。このリンス水シャワー時間が１０秒未満では
十分な洗浄効果が得られない。リンス水シャワー時間が
３０秒を超えてもリンス工程時間が徒に長くなり、ま
た、リンス水量が大量になり、洗浄効率が悪くなる。こ
のため、リンス水シャワー時間は１０〜３０秒とする。The rinsing water shower time is 10-30.
Seconds. If the rinsing water shower time is less than 10 seconds, a sufficient cleaning effect cannot be obtained. Even if the rinsing water shower time exceeds 30 seconds, the rinsing step time is unnecessarily long, and the amount of rinsing water is large, resulting in poor cleaning efficiency. For this reason, the rinse water shower time is set to 10 to 30 seconds.
【００２０】本発明において、スクラブ材質、スクラブ
回転数、リンス水量及びリンス水シャワー時間を上記の
ものとすること以外は、通常のスクラブ洗浄条件を採用
することができ、その他のスクラブ洗浄条件は、例えば
次のような値を採用するのが好ましい。In the present invention, ordinary scrub cleaning conditions can be adopted except that the scrub material, the scrub rotation speed, the amount of rinse water and the rinse water shower time are as described above. For example, it is preferable to adopt the following values.
【００２１】基板回転数：６０〜１００ｒｐｍ スクラブの基板への押圧力：１００〜２００ｇ／ｃｍ2 洗浄水量：０．７５〜１．５リットル／ｍｉｎ スクラブによる擦り洗浄時間：４〜１０ｓｅｃ また、本発明において、スクラブ洗浄以外の洗浄及び乾
燥条件についても特に制限はなく常法に従って実施する
ことができる。Number of rotations of the substrate: 60 to 100 rpm Pressing force of the scrub on the substrate: 100 to 200 g / cm 2 Cleaning water amount: 0.75 to 1.5 L / min Scrub cleaning time by scrub: 4 to 10 sec In the above, washing and drying conditions other than the scrub washing are not particularly limited, and can be carried out according to a conventional method.
【００２２】なお、スクラブ洗浄は、一般に、図２に示
す如く、超音波洗浄の前と後に実施される。本発明に係
る特定のスクラブ材質、スクラブ回転数、リンス水量及
びリンス水シャワー時間を採用するスクラブ洗浄は、前
スクラブ洗浄及び後スクラブ洗浄のうちの両方であって
もいずれか一方であっても良いが、少なくとも、微小な
ゴミの除去に特に有効と考えられる後スクラブ洗浄につ
いて、本発明に係るスクラブ洗浄条件を採用するのが好
適である。The scrub cleaning is generally performed before and after the ultrasonic cleaning as shown in FIG. Scrub cleaning employing the specific scrub material, scrub rotation speed, rinse water amount and rinse water shower time according to the present invention may be both or either one of pre-scrub cleaning and post-scrub cleaning. However, it is preferable to adopt the scrub cleaning conditions according to the present invention at least for post-scrub cleaning which is considered to be particularly effective for removing minute dust.
【００２３】[0023]
【実施例】以下に実施例及び比較例を挙げて本発明をよ
り具体的に説明する。The present invention will be described more specifically below with reference to examples and comparative examples.
【００２４】実施例１ 図２に示す如く、テキスチャー加工後の磁気ディスク用
基板を、下記条件で前スクラブ洗浄、超音波洗浄、後ス
クラブ洗浄及びメガシャワーした後、スピンドライし、
得られた基板の１表面当りの異物付着個数（サンプル１
０個の平均値）を調べ、結果を表１に示した。Example 1 As shown in FIG. 2, the magnetic disk substrate after the texture processing was subjected to pre-scrub cleaning, ultrasonic cleaning, post-scrub cleaning and mega shower under the following conditions, and then spin-dried.
The number of foreign substances adhering to one surface of the obtained substrate (sample 1
(Average value of 0) was examined, and the results are shown in Table 1.
【００２５】前スクラブ洗浄 スクラブ材質：ウレタン 基板回転数：８０ｒｐｍ スクラブ回転数：７５０ｒｐｍ スクラブの基板への押圧力：１５０ｇ／ｃｍ2 洗浄水量：０．７５リットル／ｍｉｎ スクラブによる擦り洗浄時間：４ｓｅｃ リンス水量：１．５リットル／ｍｉｎ リンス水シャワー時間：６ｓｅｃ超音波洗浄 洗浄時間：１５０ｓｅｃ後スクラブ洗浄 スクラブ材質：ポリビニルアセタール系樹脂（鐘紡社製
「ベルクリン」） 基板回転数：８０ｒｐｍ スクラブ回転数：１５００ｒｐｍ スクラブの基板への押圧力：１５０ｇ／ｃｍ2 洗浄水量：０．７５リットル／ｍｉｎ スクラブによる擦り洗浄時間：４ｓｅｃ リンス水量：２リットル／ｍｉｎ リンス水シャワー時間：１０ｓｅｃメガシャワー シャワー時間：８ｓｅｃスピンドライ 乾燥時間：８ｓｅｃ 実施例２，３、比較例１〜８ 後スクラブ洗浄の洗浄条件を表１に示すものとしたこと
以外は実施例１と同様にしてテキスチャー加工後の磁気
ディスク用基板の洗浄及び乾燥を行い、得られた基板の
１表面当りの異物付着個数を調べ、結果を表１に示し
た。 Pre-scrub cleaning Scrub material: urethane substrate rotation speed: 80 rpm scrub rotation speed: 750 rpm pressing force of scrub on substrate: 150 g / cm 2 cleaning water amount: 0.75 liter / min scrub cleaning time by scrub: 4 seconds rinse water amount : 1.5 liter / min Rinse water shower time: 6 sec Ultrasonic cleaning time: Scrub cleaning after 150 sec Scrub material: Polyvinyl acetal resin ("Berlin" manufactured by Kanebo Co.) Substrate rotation speed: 80 rpm Scrub rotation speed: 1500 rpm Pressing force on substrate: 150 g / cm 2 Cleaning water amount: 0.75 L / min Scrub cleaning time with scrub: 4 sec Rinse water amount: 2 L / min Rinse water shower time: 10 sec Mega shower shower time: 8 sec Spin dry Drying time: 8 sec Examples 2 and 3 and Comparative Examples 1 to 8 Cleaning of the magnetic disk substrate after texture processing and the same procedure as in Example 1 except that the cleaning conditions for the post-scrub cleaning were as shown in Table 1. After drying, the number of adhered foreign substances on one surface of the obtained substrate was examined. The results are shown in Table 1.
【００２６】[0026]
【表１】 [Table 1]
【００２７】表１より明らかなように、本発明のスクラ
ブ洗浄条件を採用することにより、著しく良好な洗浄結
果を得ることができる。As is clear from Table 1, remarkably good cleaning results can be obtained by employing the scrub cleaning conditions of the present invention.
【００２８】[0028]
【発明の効果】以上詳述した通り、本発明の磁気ディス
ク用基板の洗浄方法によれば、テキスチャー加工により
基板表面に付着したゴミ等の異物を効率的に洗浄除去す
ることができ、異物付着量の著しく少ない磁気ディスク
用基板を得ることができる。As described in detail above, according to the method for cleaning a magnetic disk substrate of the present invention, foreign substances such as dust adhered to the substrate surface by texture processing can be efficiently removed by cleaning. A very small amount of magnetic disk substrate can be obtained.
【００２９】従って、本発明に従ってスクラブ洗浄した
基板を用いることにより、欠陥のない高品質の磁気ディ
スクを歩留り良く製造することが可能となる。Therefore, the use of the scrub-cleaned substrate according to the present invention makes it possible to manufacture high-quality magnetic disks free of defects with a high yield.
【図１】スクラブ洗浄の実施方法を示す斜視図である。FIG. 1 is a perspective view showing a method of performing scrub cleaning.
【図２】テキスチャー加工後の洗浄、乾燥工程を示す工
程図である。FIG. 2 is a process diagram showing a washing and drying process after texture processing.
１ 基板 ２ スクラブ ３ 配管 ４ ノズル 1 substrate 2 scrub 3 piping 4 nozzle
Claims (1)
を押し付けて洗浄し、リンス水をシャワーする磁気ディ
スク用基板の洗浄方法において、 ポリビニルアセタール系樹脂よりなるスクラブを用い
て、スクラブ回転数１４００〜１６００ｒｐｍ，リンス
水量２リットル／ｍｉｎ以上、リンス水シャワー時間１
０〜３０ｓｅｃで洗浄することを特徴とする磁気ディス
ク用基板の洗浄方法。1. A method for cleaning a magnetic disk substrate, in which a rotating scrub is pressed against a magnetic disk substrate and rinsed with water, wherein a scrub made of polyvinyl acetal resin is used, and a scrub rotation speed of 1400 to 1600 rpm is used. , Rinse water amount 2 liter / min or more, rinse water shower time 1
A method for cleaning a substrate for a magnetic disk, wherein the cleaning is performed in 0 to 30 seconds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8207069A JPH1049868A (en) | 1996-08-06 | 1996-08-06 | Cleaning method for substrate for magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8207069A JPH1049868A (en) | 1996-08-06 | 1996-08-06 | Cleaning method for substrate for magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1049868A true JPH1049868A (en) | 1998-02-20 |
Family
ID=16533692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8207069A Pending JPH1049868A (en) | 1996-08-06 | 1996-08-06 | Cleaning method for substrate for magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1049868A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018535172A (en) * | 2015-10-02 | 2018-11-29 | コーニング インコーポレイテッド | Removable glass surface treatment and method for reducing particle adhesion |
| CN109037106A (en) * | 2013-10-03 | 2018-12-18 | 株式会社荏原制作所 | Base plate cleaning device |
-
1996
- 1996-08-06 JP JP8207069A patent/JPH1049868A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109037106A (en) * | 2013-10-03 | 2018-12-18 | 株式会社荏原制作所 | Base plate cleaning device |
| JP2018535172A (en) * | 2015-10-02 | 2018-11-29 | コーニング インコーポレイテッド | Removable glass surface treatment and method for reducing particle adhesion |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20060130874A1 (en) | Oblique burnish/wipe mechanism for hard drive disk like media | |
| JP3567971B2 (en) | Cleaning liquid and cleaning method for glass substrate | |
| JP2007197235A (en) | Manufacturing method of glass substrate for magnetic disk, glass substrate for magnetic disk, and manufacturing method of magnetic disk | |
| JP2007098485A (en) | Glass substrate for magnetic record medium and manufacturing method of magnetic disk | |
| JP2000185927A (en) | Polishing method and apparatus therefor, and glass substrate for magnetic recording medium, and magnetic recording medium | |
| JP3693441B2 (en) | Manufacturing method of recording medium | |
| JPH1049868A (en) | Cleaning method for substrate for magnetic disk | |
| US7070703B2 (en) | Process for producing glass disk substrates for magnetically recordable data storage disks | |
| JP2003228824A (en) | Cleaning method for magnetic disk glass substrate | |
| WO2014148421A1 (en) | Method for producing glass substrate for information recording medium | |
| JPH0125137B2 (en) | ||
| JP5042103B2 (en) | Manufacturing method of magnetic disk | |
| JP2000218517A (en) | Manufacturing method and device for electronic parts | |
| JP3791774B2 (en) | Substrate cleaning method, magnetic recording medium, and manufacturing method of magnetic recording medium | |
| JP3431232B2 (en) | Manufacturing method of magnetic recording medium | |
| JP2002025049A (en) | Method for manufacturing information recording medium | |
| JP2000306234A (en) | Washing method of hard substrate for magnetic recording medium | |
| JP2550231B2 (en) | Method of manufacturing magnetic recording medium | |
| JP3261161B2 (en) | Method of manufacturing thin-film magnetic disk | |
| JP2003067918A (en) | Cleaning disk, scrub cleaning method using the cleaning disk, and manufacturing method of substrate for information recording medium | |
| JP2008176860A (en) | Storage method of brush, cleaning method of substrate for magnetic recording medium, and method for manufacturing magnetic recording medium | |
| JPH11232642A (en) | Manufacture for magnetic disk | |
| JP2007102844A (en) | Cleaning method of glass substrate for magnetic disk, glass substrate for magnetic disk and manufacturing method of magnetic disk | |
| JP2009283056A (en) | Disk processing method | |
| JPH09288820A (en) | Magnetic recording medium and production of substrate for magnetic recording medium |