JP2000292635A - Fluorinated polyimide resin and light waveguide using these - Google Patents

Fluorinated polyimide resin and light waveguide using these

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Publication number
JP2000292635A
JP2000292635A JP13181599A JP13181599A JP2000292635A JP 2000292635 A JP2000292635 A JP 2000292635A JP 13181599 A JP13181599 A JP 13181599A JP 13181599 A JP13181599 A JP 13181599A JP 2000292635 A JP2000292635 A JP 2000292635A
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JP
Japan
Prior art keywords
polyimide resin
bis
fluorinated
fluorinated polyimide
hexafluoropropane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13181599A
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Japanese (ja)
Inventor
Reiko Udagawa
礼子 宇田川
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Individual
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Individual
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Priority to JP13181599A priority Critical patent/JP2000292635A/en
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Abstract

PROBLEM TO BE SOLVED: To provide a fluorinated polyimide resin being excellent in heat resistance and transparency and having small coefficient of moisture absorption and coefficient of birefringence, and to provide a light waveguide having high transparency in a near infrared wave length area by copolymerizing a mixture of fluorinated naphthalene tetracarboxylic acid anhydride and 4,4'- hexafluoroisopropylidene diphthalic acid anhydride with a fluorinated aromatic diamine compound. SOLUTION: A fluorinated polyimide resin is obtained by copolymerizing a mixture of naphthalene-1,4,5,8-tetracarboxylic acid anhydride and 4,4'- hexafluoroisopropylidene diphthalic acid anhydride expressed by formula I with 2,2'-bis(4-aminophenyl) hexafluoropropane or 2,2'-bis(trifluoromethyl) benzine or 2,2'-bis[4-(4-aminophenoxy) phenyl] hexafluoropropane expressed by formula II. In the formula I, II, R1 to R12 are selected from a group composed of H, CF3, C2F5, C3F7 or C4F9.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、フッ素化ナフタレ
ンテトラカルボン酸無水物と4,4‘−ヘキサフルオロ
イソピリデンジフタル酸無水物の混合物を、2,2’−
ビス(4−アミノフェニル)ヘキサフルオロプロパンま
たは、2,2‘−ビス(トリフルオロメチル)ベンチジ
ンまたは、2,2−ビス〔4−(4−アミノフェノキ
シ)フェニル〕ヘキサフルオロプロパンと共重合してえ
られるフッ素化ポリイミド樹脂、ならびにそれらを用い
た光通信用の光導波路に関する。
BACKGROUND OF THE INVENTION The present invention relates to a process for preparing a mixture of fluorinated naphthalenetetracarboxylic anhydride and 4,4'-hexafluoroisopropylidenediphthalic anhydride with 2,2'-
Copolymerized with bis (4-aminophenyl) hexafluoropropane, 2,2'-bis (trifluoromethyl) benzidine or 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane The present invention relates to a fluorinated polyimide resin obtained and an optical waveguide for optical communication using the same.

【0002】[0002]

【従来の技術】光信号によって非常に大容量の情報を伝
送できる光通信が、従来の電気信号に替わって急速に利
用されるようになった。従来のIC製造工程およびデバ
イスの信頼性を保証するうえで、耐熱性に優れた材料が
望まれている。中でもポリイミド樹脂は耐熱性に優れて
いるので、電子材料にしばしば使用されている。St.
Clair等はC(CF基、SO基を含有する
フッ素化ポリイミド樹脂は、従来のポリイミド樹脂と比
較して光学的透明性に優れている事を報告している。
〔Polym.Mater.Sci.Eng.51,6
2(1984)〕。Beuhler等は光架橋性基を有
するフッ素化ポリイミド樹脂を用いた低損失の光導波路
の製造に成功している。〔SPIE,1849,92
(1993)〕しかし、これらの光導波路は光学的透明
性にまだ問題があるので、長距離光通信に利用される近
赤外波長領域(1.3〜1.5μm)において透明度の
高いフッ素化ポリイミド樹脂が望まれている。Jour
nal of PhotopolymerScienc
e and Technology Vol.10,N
o.1,P.31(1997)には、耐熱性、透明性に
優れ、光学損失の小さいフッ素化ポリイミド樹脂が報告
されているが、複屈折率のより小さいフッ素化ポリイミ
ド樹脂が要望されている。
2. Description of the Related Art Optical communication capable of transmitting a very large amount of information by optical signals has been rapidly used in place of conventional electric signals. In order to guarantee the reliability of the conventional IC manufacturing process and device, a material excellent in heat resistance is desired. Among them, polyimide resins are often used for electronic materials because of their excellent heat resistance. St.
Clair et al. Report that a fluorinated polyimide resin containing a C (CF 3 ) 2 group and an SO 2 group is superior in optical transparency to a conventional polyimide resin.
[Polym. Mater. Sci. Eng. 51,6
2 (1984)]. Beuhler et al. Have succeeded in producing a low-loss optical waveguide using a fluorinated polyimide resin having a photocrosslinkable group. [SPIE, 1849, 92
(1993)] However, since these optical waveguides still have a problem in optical transparency, fluorinated materials having high transparency in the near-infrared wavelength region (1.3 to 1.5 μm) used for long-distance optical communication are used. Polyimide resins are desired. Jour
nal of Photopolymer Science
e and Technology Vol. 10, N
o. 1, P. 31 (1997) reports a fluorinated polyimide resin having excellent heat resistance and transparency and a small optical loss, but a fluorinated polyimide resin having a small birefringence is demanded.

【0003】[0003]

【発明が解決しようとする課題】本発明のひとつの目的
は、可視光および近赤外線領域において、耐熱性、透明
性に優れ、吸湿率が小さく、複屈折率の小さいフッ素化
ポリイミド樹脂を提供することである。
SUMMARY OF THE INVENTION One object of the present invention is to provide a fluorinated polyimide resin having excellent heat resistance and transparency, low moisture absorption and low birefringence in the visible light and near infrared regions. That is.

【0004】本発明の更なる目的は、そのようなフッ素
化ポリイミド樹脂を用いることにより、ICの製造工程
で300゜Cの高温に耐え、光損失および複屈折率が小
さく、耐久性に優れ、製造コストが安価で、軽量であ
り、光通信に利用される近赤外波長領域での透明度の高
い光導波路を提供することである。
A further object of the present invention is to use such a fluorinated polyimide resin to withstand a high temperature of 300 ° C. in an IC manufacturing process, to reduce light loss and birefringence, and to have excellent durability. An object of the present invention is to provide an optical waveguide which is inexpensive, lightweight, and highly transparent in the near infrared wavelength region used for optical communication.

【0005】[0005]

【課題を解決するための手段】本発明者は、フッ素化ナ
フタレンテトラカルボン酸無水物と4,4’−ヘキサフ
ルオロイソプロピリデンジフタル酸無水物の混合物をフ
ッ素化芳香族ジアミン化合物と共重合することにより、
耐熱性、透明性に優れ、吸湿率および複屈折率の小さい
フッ素化ポリイミド樹脂を見出し、これらのフッ素化ポ
リイミド樹脂を用いることにより、ICの製造工程で3
00゜Cの高温に耐え、光損失および複屈折率が小さ
く、耐久性に優れ、製造コストが安価で、軽量であり、
光通信に利用される近赤外波長領域での透明度の高い光
導波路を見出し、本発明を完成するに至った。すなわち
本発明によるフッ素化ナフタレンテトラカルボン酸無水
物は、式
The inventor of the present invention copolymerizes a mixture of fluorinated naphthalenetetracarboxylic anhydride and 4,4'-hexafluoroisopropylidene diphthalic anhydride with a fluorinated aromatic diamine compound. By doing
A fluorinated polyimide resin having excellent heat resistance and transparency, a small moisture absorption and a small birefringence was found, and by using these fluorinated polyimide resins, 3
It withstands high temperature of 00 ° C, has low light loss and birefringence, has excellent durability, is inexpensive to manufacture, and lightweight.
The present inventors have found an optical waveguide having high transparency in a near-infrared wavelength region used for optical communication, and have completed the present invention. That is, the fluorinated naphthalenetetracarboxylic anhydride according to the present invention has the formula

【0006】[0006]

【化3】 (式中、R〜RはH、CF、C、C
またはCからなる群より選択され、パーフルオロ
アルキル基の数は1〜4)で表されるナフタレン−1,
4,5,8−テトラカルボン酸無水物からなる。
Embedded image (Wherein, R 1 to R 4 are H, CF 3 , C 2 F 5 , C 3 F 7
Or naphthalene-1, which is selected from the group consisting of C 4 F 9 and the number of perfluoroalkyl groups is 1 to 4)
It consists of 4,5,8-tetracarboxylic anhydride.

【0007】また、本発明によるフッ素化芳香族ジアミ
ン化合物は、式
Further, the fluorinated aromatic diamine compound according to the present invention has the formula

【化4】 (式中、R〜R12はH、CF、C、C
またはCからなる群より選択される)で表され
る2,2’−ビス(4−アミノフェニル)ヘキサフルオ
ロプロパン化合物または、2,2’−ビス(トリフルオ
ロメチル)ベンチジン、または2,2−ビス〔4−(4
−アミノフェノキシ)フェニル〕ヘキサフルオロプロパ
ンが好ましい。
Embedded image (Wherein, R 5 to R 12 are H, CF 3 , C 2 F 5 , C 3 F
2,2′-bis (4-aminophenyl) hexafluoropropane compound or 2,2′-bis (trifluoromethyl) benzidine, or a compound selected from the group consisting of 7 and C 4 F 9 ), or 2,2-bis [4- (4
-Aminophenoxy) phenyl] hexafluoropropane is preferred.

【0008】[0008]

【発明の実施の形態】本発明によるフッ素化ポリイミド
樹脂は、可視光および近赤外線領域において、耐熱性、
透明性に優れ、吸湿率および複屈折率の小さい樹脂であ
る。このようなフッ素化ポリイミド樹脂を用いることに
より、ICの製造工程で300゜Cの高温に耐え、光損
失および複屈折率が小さく、耐久性に優れ、製造コスト
が安価で、軽量であり、光通信に利用される近赤外波長
領域での透明度の高い光導波路を得ることができる。
BEST MODE FOR CARRYING OUT THE INVENTION The fluorinated polyimide resin according to the present invention has heat resistance in the visible light and near infrared regions,
It is a resin with excellent transparency and low moisture absorption and birefringence. By using such a fluorinated polyimide resin, it can withstand a high temperature of 300 ° C. in the IC manufacturing process, has low light loss and birefringence, has excellent durability, has low manufacturing cost, is lightweight, An optical waveguide having high transparency in a near-infrared wavelength region used for communication can be obtained.

【0009】本発明によるフッ素化ポリイミド樹脂とし
ては、例えば などが挙げられるが、2,6−トリフルオロメチル−ナ
フタレン−1,4,5,8−テトラカルボキシリックジ
アンハイドライドと4,4’−ヘキサフルオロイソプロ
ピリデンジフタル酸無水物の混合物と2,2’−ビス
(4−アミノフェニル)ヘキサフルオロプロパンを共重
合してえられるフッ素化ポリイミド樹脂が特に好まし
い。以下に本発明を実施例によりより具体的に説明する
が、本発明はこれらの実施例によって限定されるもので
はない。
As the fluorinated polyimide resin according to the present invention, for example, And a mixture of 2,6-trifluoromethyl-naphthalene-1,4,5,8-tetracarboxylic dianhydride and 4,4′-hexafluoroisopropylidene diphthalic anhydride with 2,2 A fluorinated polyimide resin obtained by copolymerizing '-bis (4-aminophenyl) hexafluoropropane is particularly preferred. Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.

【0010】[0010]

【実施例】実施例1 乾燥窒素雰囲気中で、2,6−トリフルオロメチル−ナ
フタレン−1,4,5,8−テトラカルボキシリックジ
アンハイドライド12.12g(30mモル)、4,
4’−ヘキサフルオロイソプロピリデンジフタル酸無水
物(東京化成製)13.32g(30mモル)をジメチ
ルアセトアミド400gに溶解させ、激しく攪拌しなが
ら20.06g(60mモル)の2,2’−ビス(4−
アミノフェニル)ヘキサフルオロプロパン(セントラル
硝子社製BIS−A−AF)を滴下し、48時間室温で
攪拌すると高粘度の溶液が得られる。このポリアミック
酸溶液を、清浄なシリコンウエハー基板上にスピン塗布
し、乾燥窒素雰囲気中で、70℃で2時間、160℃で
1時間、250℃で30分その後350℃で1時間加熱
することにより、膜厚10μmのポリイミドフィルムを
得た。赤外吸収スペクトルによれば、1740cm−1
および1790cm−1にイミド基の吸収が見られた。
ポリイミドフィルムのガラス転移温度、吸水率、熱膨張
係数および光損失の測定結果を表1に示す。また屈折率
TE(面方向屈折率)、nTM(厚さ方向屈折率)を
図1に示す。 光導波路の製造:シリコンウエハー上に下部クラッドを
形成した後、耐ドライエッチ性のシリコーン含有フォト
レジスト(日立化成社製RU−1600P)を塗布し、
UV露光と現像によってコア層のパターンを形成した。
このパターンに沿ってドライエッチによって下部クラッ
ド層にコア層を埋め込み穴を形成した。続いてコア層ポ
リイミドを埋め込んだ後コア層を平坦化し、最後に上部
クラッド層を塗布して光導波路を作製した。光導波路の
断面図を図2に示す。干渉マイクログラフを用いて、コ
ア層とクラッド層の屈折率の差を測定したところ、約
0.4%であった。 光損失:光導波路フィルムの分極による接続損失を含め
た光損失の波長との関係を図3に示す。この光導波路は
通信波長(1.3μm)において光損失が0.3dB/
cm以下であった。 耐湿性:85℃の90%RH中に400時間以上暴露し
ても光損失の変化は見られなかった。 複屈折率:セナルモント法により、光導波路の複屈折率
を測定したところ、4×10−5と非常に小さかった。
EXAMPLE 1 In a dry nitrogen atmosphere, 12.12 g (30 mmol) of 2,6-trifluoromethyl-naphthalene-1,4,5,8-tetracarboxylic dianhydride,
13.32 g (30 mmol) of 4'-hexafluoroisopropylidene diphthalic anhydride (manufactured by Tokyo Chemical Industry) is dissolved in 400 g of dimethylacetamide, and while vigorously stirring, 20.06 g (60 mmol) of 2,2'-bis (4-
(Aminophenyl) hexafluoropropane (BIS-A-AF manufactured by Central Glass Co., Ltd.) is added dropwise and stirred at room temperature for 48 hours to obtain a high-viscosity solution. This polyamic acid solution is spin-coated on a clean silicon wafer substrate, and heated in a dry nitrogen atmosphere at 70 ° C. for 2 hours, 160 ° C. for 1 hour, 250 ° C. for 30 minutes, and then at 350 ° C. for 1 hour. Thus, a polyimide film having a thickness of 10 μm was obtained. According to the infrared absorption spectrum, 1740 cm −1
And 1790 cm -1 , absorption of an imide group was observed.
Table 1 shows the measurement results of the glass transition temperature, the water absorption, the coefficient of thermal expansion, and the light loss of the polyimide film. FIG. 1 shows the refractive index n TE (refractive index in the surface direction) and n TM (refractive index in the thickness direction). Production of optical waveguide: After forming a lower clad on a silicon wafer, a dry-etch resistant silicone-containing photoresist (RU-1600P manufactured by Hitachi Chemical Co., Ltd.) is applied.
A core layer pattern was formed by UV exposure and development.
A core layer was buried in the lower cladding layer by dry etching along the pattern to form a hole. Subsequently, after embedding the core layer polyimide, the core layer was flattened, and finally, an upper clad layer was applied to produce an optical waveguide. FIG. 2 shows a cross-sectional view of the optical waveguide. The difference in refractive index between the core layer and the clad layer was measured using an interference micrograph, and was found to be about 0.4%. Optical Loss: FIG. 3 shows the relationship between the optical loss and the wavelength of the optical loss including the connection loss due to the polarization of the optical waveguide film. This optical waveguide has an optical loss of 0.3 dB / at a communication wavelength (1.3 μm).
cm or less. Moisture resistance: No change in light loss was observed even after exposure to 90% RH at 85 ° C. for 400 hours or more. Birefringence: When the birefringence of the optical waveguide was measured by the Senalmont method, it was as small as 4 × 10 −5 .

【0011】実施例2 芳香族ジアミンとして、2,2’−ビス(トリフルオロ
メチル)ベンチジンを用いた以外は実施例1と同様な方
法で共重合して、フッ素化ポリイミドフィルムを作製し
た。諸特性を表1に示す。
Example 2 A fluorinated polyimide film was prepared by copolymerization in the same manner as in Example 1 except that 2,2'-bis (trifluoromethyl) benzidine was used as the aromatic diamine. Table 1 shows various characteristics.

【0012】実施例3 芳香族ジアミンとして、2,2’−ビス〔4−(4−ア
ミノフェノキシ)フェニル〕ヘキサフルオロプロパンを
用いた以外は実施例1と同様な方法で共重合して、フッ
素化ポリイミドフィルムを作製した。諸特性を表1に示
す。
Example 3 Fluorine was copolymerized in the same manner as in Example 1 except that 2,2'-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane was used as the aromatic diamine. A polyimide film was prepared. Table 1 shows various characteristics.

【0013】比較例1 ナフタレン−1,4,5,8−テトラカルボキリックジ
アンハイドライドと2,2’−ビス(4−アミノフェニ
ル)スルホンを共重合した以外は実施例1と同様な方法
で、ポリイミドフィルムを作製した。諸特性を表1に示
す。光損失は実施例1と比較して非常に大きかった。
Comparative Example 1 In the same manner as in Example 1 except that naphthalene-1,4,5,8-tetracarboxylic dianhydride and 2,2′-bis (4-aminophenyl) sulfone were copolymerized. A polyimide film was produced. Table 1 shows various characteristics. The light loss was much higher than in Example 1.

【0014】比較例2 ベンゼン−1,2,4,5−テトラカルボキリックアン
ハイドライドと4,4’−ジアミノジフェニルエーテル
を共重合した以外は実施例1と同様な方法で、ポリイミ
ドフィルムを作製した。諸特性を表1に示す。光損失は
実施例1と比較して非常に大きかった。
Comparative Example 2 A polyimide film was prepared in the same manner as in Example 1 except that benzene-1,2,4,5-tetracarboxylic anhydride and 4,4'-diaminodiphenyl ether were copolymerized. Table 1 shows various characteristics. The light loss was much higher than in Example 1.

【0015】[0015]

【発明の効果】上述したとおり、本発明によれば可視光
および近赤外線領域において、耐熱性に優れ、吸湿率が
小さく、透明性に優れ、複屈折率の小さいフッ素化ポリ
イミド樹脂を得ることができる。本発明は、例えば光通
信に利用される近赤外波長領域において透明度が高く、
光損失の小さい光導波路に有用である。
As described above, according to the present invention, it is possible to obtain a fluorinated polyimide resin having excellent heat resistance, low moisture absorption, excellent transparency, and low birefringence in the visible light and near infrared regions. it can. The present invention has high transparency in a near infrared wavelength region used for optical communication, for example,
It is useful for optical waveguides with small optical loss.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 式 【化1】 (式中、R〜RはH、CF、C、C
またはCからなる群より選択され、パーフルオロ
アルキル基の数は1〜4)で表されるナフタレン−1,
4,5,8−テトラカルボン酸無水物と、4,4’−ヘ
キサフルオロイソプロピリデンジフタル酸無水物の混合
物を式 【化2】 (式中、R〜R12はH、CF、C、C
またはCからなる群より選択される)で表され
る2,2’−ビス(4−アミノフェニル)ヘキサフルオ
ロプロパン又は、2,2’−ビス(トリフルオロメチ
ル)ベンチジン、または2,2’−ビス〔4−(4−ア
ミノフェノキシ)フェニル〕ヘキサフルオロプロパンと
共重合してえられるフッ素化ポリイミド樹脂。
(1) Formula (1) (Wherein, R 1 to R 4 are H, CF 3 , C 2 F 5 , C 3 F 7
Or naphthalene-1, which is selected from the group consisting of C 4 F 9 and the number of perfluoroalkyl groups is 1 to 4)
A mixture of 4,5,8-tetracarboxylic anhydride and 4,4′-hexafluoroisopropylidene diphthalic anhydride is represented by the formula: (Wherein, R 5 to R 12 are H, CF 3 , C 2 F 5 , C 3 F
7 or C 4 is selected from the group consisting of F 9) represented by 2,2'-bis (4-aminophenyl) hexafluoropropane or 2,2-bis (trifluoromethyl) benzidine or 2, Fluorinated polyimide resin obtained by copolymerization with 2,2'-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane.
【請求項2】 請求項1に記載のフッ素化ポリイミド樹
脂を用いた光通信用の光導波路。
2. An optical waveguide for optical communication using the fluorinated polyimide resin according to claim 1.
JP13181599A 1999-04-02 1999-04-02 Fluorinated polyimide resin and light waveguide using these Pending JP2000292635A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7112647B2 (en) 2001-12-26 2006-09-26 Showa Denko K.K. Fluorinated polymer
CN100478719C (en) * 2003-05-19 2009-04-15 日东电工株式会社 Polymer photoconducting material
WO2013022011A1 (en) 2011-08-09 2013-02-14 三菱樹脂株式会社 Transparent laminated film
US20170309844A1 (en) * 2014-09-30 2017-10-26 Toray Industries, Inc. Substrate for display, color filter using the same and method for the production thereof, organic el element and method for the production thereof, and flexible organic el display (as amended)
US10858482B2 (en) 2015-02-12 2020-12-08 Samsung Electronics Co., Ltd. Composition of preparing poly(imide-benzoxazole) copolymer, poly(imide-benzoxazole) copolymer, article containing poly(imide-benzoxazole) copolymer, and display device including same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7112647B2 (en) 2001-12-26 2006-09-26 Showa Denko K.K. Fluorinated polymer
CN100478719C (en) * 2003-05-19 2009-04-15 日东电工株式会社 Polymer photoconducting material
WO2013022011A1 (en) 2011-08-09 2013-02-14 三菱樹脂株式会社 Transparent laminated film
US20170309844A1 (en) * 2014-09-30 2017-10-26 Toray Industries, Inc. Substrate for display, color filter using the same and method for the production thereof, organic el element and method for the production thereof, and flexible organic el display (as amended)
US10431753B2 (en) * 2014-09-30 2019-10-01 Toray Industries, Inc. Substrate for display, color filter using the same and method for the production thereof, organic EL element and method for the production thereof, and flexible organic EL display
US10858482B2 (en) 2015-02-12 2020-12-08 Samsung Electronics Co., Ltd. Composition of preparing poly(imide-benzoxazole) copolymer, poly(imide-benzoxazole) copolymer, article containing poly(imide-benzoxazole) copolymer, and display device including same

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