JP2000286451A5 - - Google Patents

Download PDF

Info

Publication number
JP2000286451A5
JP2000286451A5 JP2000060463A JP2000060463A JP2000286451A5 JP 2000286451 A5 JP2000286451 A5 JP 2000286451A5 JP 2000060463 A JP2000060463 A JP 2000060463A JP 2000060463 A JP2000060463 A JP 2000060463A JP 2000286451 A5 JP2000286451 A5 JP 2000286451A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000060463A
Other languages
Japanese (ja)
Other versions
JP2000286451A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2000286451A publication Critical patent/JP2000286451A/ja
Publication of JP2000286451A5 publication Critical patent/JP2000286451A5/ja
Pending legal-status Critical Current

Links

JP2000060463A 1998-11-17 2000-03-06 窒化物半導体素子 Pending JP2000286451A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP32628198 1998-11-17
JP2304999 1999-01-29
JP10-326281 1999-01-29
JP11-23049 1999-01-29

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11290999A Division JP3063757B1 (ja) 1998-11-17 1999-04-20 窒化物半導体素子

Publications (2)

Publication Number Publication Date
JP2000286451A JP2000286451A (ja) 2000-10-13
JP2000286451A5 true JP2000286451A5 (uk) 2006-06-15

Family

ID=26360340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000060463A Pending JP2000286451A (ja) 1998-11-17 2000-03-06 窒化物半導体素子

Country Status (1)

Country Link
JP (1) JP2000286451A (uk)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030053290A (ko) * 2001-12-22 2003-06-28 엘지이노텍 주식회사 질화물 반도체 소자 및 질화물 반도체 소자의 제조방법
JP5162809B2 (ja) * 2004-02-09 2013-03-13 日亜化学工業株式会社 窒化物半導体素子
TWI252599B (en) * 2004-04-27 2006-04-01 Showa Denko Kk N-type group III nitride semiconductor layered structure
JP5082444B2 (ja) * 2004-04-28 2012-11-28 三菱化学株式会社 窒化物半導体発光素子
US7339255B2 (en) * 2004-08-24 2008-03-04 Kabushiki Kaisha Toshiba Semiconductor device having bidirectionally inclined toward <1-100> and <11-20> relative to {0001} crystal planes
KR100670531B1 (ko) * 2004-08-26 2007-01-16 엘지이노텍 주식회사 질화물 반도체 발광소자 및 그 제조방법
US8053794B2 (en) 2004-08-26 2011-11-08 Lg Innotek Co., Ltd Nitride semiconductor light emitting device and fabrication method thereof
JP4853198B2 (ja) * 2005-12-02 2012-01-11 豊田合成株式会社 Iii族窒化物系化合物半導体発光素子
KR100764433B1 (ko) 2006-04-06 2007-10-05 삼성전기주식회사 질화물 반도체 소자
JP5326225B2 (ja) * 2006-05-29 2013-10-30 日亜化学工業株式会社 窒化物半導体発光素子
EP1883141B1 (de) 2006-07-27 2017-05-24 OSRAM Opto Semiconductors GmbH LD oder LED mit Übergitter-Mantelschicht
EP1883140B1 (de) * 2006-07-27 2013-02-27 OSRAM Opto Semiconductors GmbH LD oder LED mit Übergitter-Mantelschicht und Dotierungsgradienten
CN102334204B (zh) * 2010-01-06 2013-11-20 松下电器产业株式会社 氮化物系半导体发光元件及其制造方法
JP5885942B2 (ja) * 2011-05-30 2016-03-16 シャープ株式会社 窒化物半導体発光素子およびその製造方法
US8669585B1 (en) 2011-09-03 2014-03-11 Toshiba Techno Center Inc. LED that has bounding silicon-doped regions on either side of a strain release layer

Similar Documents

Publication Publication Date Title
BE2012C016I2 (uk)
AU2000236815A8 (uk)
JP2003529044A5 (uk)
JP2001077833A5 (uk)
JP2000297815A5 (uk)
JP2003518685A5 (uk)
JP2002540482A5 (uk)
JP2002539487A5 (uk)
JP2000286451A5 (uk)
JP2001232249A5 (uk)
JP2002027240A5 (uk)
JP2003508532A5 (uk)
JP2001330976A5 (uk)
CH694022C1 (uk)
JP2002064576A5 (uk)
JP2002099016A5 (uk)
JP2002145519A5 (uk)
CN3145103S (uk)
CN3139850S (uk)
CN3147660S (uk)
CN3146861S (uk)
CN3145855S (uk)
CN3145854S (uk)
CN3145472S (uk)
CN3148873S (uk)