JP2000284493A - Exposure device and reticle used for it - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance a throughput as high as possible even when a high- resolution pattern and a low-resolution pattern coexist. SOLUTION: This device is provided with a stage 40 for placing a substrate on which the pattern is transferred, an exposure optical system 1 having a light source 2, a collimator lens 0 changing light beams radiated from the light source 2 to the parallel light beams, an enlargement and reduction lens system 6 enlarging or reducing the light beams from the lens 4, a driving part 58 driving one out of the stage 40, the optical system 1 in a horizontal direction, a driving control part 56 controlling the position of the.stage 40 or the optical system 1 driven by the driving part 58, a substrate position detection part 50 detecting the position of the substrate placed on the stage 40, and an exposure control part 52 transferring the pattern of a reticle inserted in the optical path of the optical system 1 by controlling the position of the reticle and the lens system 6 based on the output of the detection part 50 and on the exposure data of the substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus, and is particularly used for manufacturing a liquid crystal display.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have attracted attention as flat panel displays that achieve light weight and low power consumption. Among these, active matrix type liquid crystal display devices have features such as thinness, light weight, low-voltage driving, and easy colorization, and are recently used for persol computers, warpros, and portable information terminals. .

A thin film transistor (hereinafter referred to as a TFT (Thin Film Transistor)) is used as a switching element in a pixel portion of the active matrix liquid crystal display device.
tor)) have high display quality and low power consumption, and are being actively developed.

There are two types of TFTs, an amorphous silicon TFT using amorphous silicon and a polysilicon TFT using polysilicon. Polysilicon TFT
Has a mobility of 10 to 1 more than an amorphous silicon TFT.
There is an advantage that it is about 00 times higher. For this reason, the polysilicon TFT is optimal as a pixel switching element. Also, in recent years, the polysilicon TFT has been used as a component of a peripheral driving circuit, and as a result,
The pixel portion 320 and the peripheral driving circuit 330 as shown in FIG.
A liquid crystal display device 300 integrated with a pixel portion and a driving circuit, in which a and 330b are formed on the same substrate 301, has been actively developed.

Generally, when manufacturing a liquid crystal display device, an exposure device for transferring a circuit pattern necessary for controlling the liquid crystal onto a glass substrate is used. This exposure apparatus
An exposure optical system for transferring a fine pattern onto a substrate,
It is composed of an alignment system for positioning the mask and the substrate with high accuracy, and an automatic transport system for automatically transporting the mask and the substrate.

[0006]

In the above-described liquid crystal display device 300 with the integrated pixel portion and drive circuit, the pixel portion 32
Since the 0 and the terminal section 340 are relatively simple circuit patterns, it is possible to use a low-resolution (eg, about 2 μm) exposure optical system to increase the exposure area per shot. On the other hand, the peripheral driving circuits 330a and 330b
Is a relatively complicated circuit pattern, but a low-resolution exposure optical system is currently used. However, the control unit 35
The memory (not shown) and the logic circuit (not shown) which are expected to be provided on the same substrate in the future and have a high resolution (for example, 0.6 μm
), And the exposure area per shot is small. In the future, if the TFT is miniaturized, the driving circuits 330a and 330b also need to have high resolution.

For this reason, when the pixel section 320 and the terminal section 340 are also exposed using a high-resolution exposure apparatus, there is a problem that the exposure area per shot is small and the throughput is low. For example, when the substrate size is 550 mm × 6
When the length is 50 mm, the throughput is about eight minutes per sheet.

In order to improve the throughput, it is conceivable to use a low-resolution exposure apparatus and a high-resolution exposure apparatus. However, the time required for mounting and positioning the substrate on the stage of each exposure apparatus is different. However, there is a problem that the throughput is still low.

SUMMARY OF THE INVENTION The present invention has been made in consideration of the above circumstances, and has as its object to provide an exposure apparatus having as high a throughput as possible even when high-resolution and low-resolution patterns are mixed.

[0010]

A first aspect of an exposure apparatus according to the present invention is a stage on which a substrate on which a pattern is to be transferred is mounted, a light source, and light emitted from the light source is converted into parallel light. An exposure optical system having a collimator lens, an enlargement / reduction lens system for enlarging or reducing light from the collimator lens, a drive unit for driving one of the stage and the exposure optical system in a horizontal direction, and the drive unit A drive control unit for controlling the position of the stage or the exposure optical system driven by, a substrate position detection unit for detecting a position of a substrate mounted on the stage, an output of the substrate position detection unit, and Based on the exposure data of the substrate, the position of the reticle inserted into the optical path of the exposure optical system and the enlargement / reduction lens system are controlled so that the reticle pattern is Characterized by comprising a an exposure control unit for transferring the substrate.

It is preferable that the exposure control section controls the enlargement / reduction lens system according to a reticle pattern.

In the reticle, a first pattern for a first resolution and a second pattern for a second resolution higher than the first resolution are designed according to the second resolution. It is preferable that they are formed on the same substrate.

The exposure control section sends a command signal to the drive control section when performing the exposure, and the drive control section transmits the command signal to the drive section when the command signal is not received from the exposure control section. Controlling the driving unit to move the stage or the exposure optical system in the horizontal direction when the command signal is received from the exposure control unit. Is preferred.

It is preferable that the reticle is provided between the collimator lens and the enlargement / reduction lens system.

In a second aspect of the exposure apparatus according to the present invention, a stage on which a substrate on which a pattern is transferred is placed, a first light source, and light emitted from the first light source is converted into parallel light. A first optical system having a first collimator lens for converting, and a first enlargement / reduction lens system for enlarging or reducing light from the first collimator lens;
, A second collimator lens that converts light emitted from the second light source into parallel light, and a second enlargement / reduction lens system that enlarges or reduces the light from the second collimator lens. An exposure optical system comprising: a second optical system; a projection unit configured to project light from each of the first and second optical systems onto the substrate mounted on the stage; And a drive unit for driving one of the exposure optical systems in the horizontal direction, a drive control unit for controlling the position of the stage or the exposure optical system driven by the drive unit, and a substrate mounted on the stage A substrate position detecting unit for detecting the position of the first position and the first position based on an output of the substrate position detecting unit and exposure data of the substrate.
And controlling the positions of the first and second reticles inserted into the optical path of the second optical system, respectively, and controlling the first and second magnifying / reducing lens systems. An exposure control unit for transferring a reticle pattern onto the substrate.

The optical axis of the first optical system and the second optical system
The optical axis of the optical system is configured to be parallel before entering the substrate, and the projection unit includes a first mirror that reflects light from the first optical system, and a second optical system that reflects the light from the first optical system. A second mirror that reflects light from the system and transmits light from the first mirror may be provided.

The projection section has a mirror which is provided so as to be rotatable and reflects light from the first and second optical systems, and a rotation position of the mirror is determined by the exposure control section. May be configured to be controlled.

The projection unit has a first mirror that reflects light from the first optical system and a second mirror that reflects light from the second optical system. It may be configured as follows.

The first and second mirrors may be configured to be fixed.

The first and second mirrors are provided so as to be movable in the horizontal direction, and the positions of the first and second mirrors are controlled by the exposure controller. Is also good.

Incidentally, the projection section may be configured to have a prism.

The first and second optical systems may have different resolutions.

The exposure control unit sends a command signal to the drive control unit when performing exposure, and the drive control unit sends the command signal to the drive unit when no command signal is received from the exposure control unit. Controlling the stage or the exposure optical system to be stopped at a reference position, and controlling the drive unit to move the stage or the exposure optical system in the horizontal direction when the command signal is received from the exposure control unit. May be configured.

It is preferable that the exposure controller controls so that when one of the first and second optical systems is operating, the operation of the other optical system is stopped.

In a third aspect of the exposure apparatus according to the present invention, a first light source, a first collimator lens for converting light emitted from the first light source into parallel light, and the first collimator lens A first exposure optical system arranged at a first position, a second light source, and a second light source, which is radiated from the second light source. A second collimator lens for converting light into parallel light, and a second enlargement / reduction lens system for enlarging or reducing light from the second collimator lens; A second exposure optical system having a resolution higher than that of the first exposure optical system, first and second stages on which a substrate onto which a pattern is to be transferred is placed,
And a stage drive unit for driving the second stage, and a drive control unit for controlling the stage drive unit so that the first and second stages are stopped at reference positions of the first and second exposure optical systems. And a substrate position detection unit provided on one of the first and second exposure optical systems for the exposure optical system and detecting a position of a substrate placed on a stage of the one exposure optical system; Controlling the positions of first and second reticles inserted into the optical paths of the first and second exposure optical systems, respectively, based on the output of the substrate position detector and the exposure data of the substrate. An exposure control unit for controlling first and second enlargement / reduction lens systems to transfer the patterns of the first and second reticle onto the substrate.

The difference between the stop position of the stage provided on the first exposure optical system side and stopped near the first exposure optical system and the reference position of the first exposure optical system. A first stage position detector for detecting, a stop position of a stage provided on the side of the second exposure optical system, and stopped near the second exposure optical system, and a second exposure optical system. A second stage position detecting unit for detecting a difference from the reference position of the first stage and the second stage.
It is preferable to control the first and second stages based on the output of the stage position detecting section.

It is preferable that the exposure control section controls the enlargement / reduction lens system according to the patterns of the first and second reticles.

The first reticle is provided between the first collimator lens and the first enlargement / reduction lens system, and the second reticle is provided between the second collimator lens and the second collimator lens. Is preferably provided between the zoom lens and the zoom lens system.

The reticle used in the exposure apparatus according to the present invention includes a first pattern for a first resolution and a second pattern for a second resolution higher than the first resolution. It is characterized by being formed on the same substrate with a design rule adapted to the resolution of 2.

[0030]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of an exposure apparatus according to the present invention will be described with reference to the drawings.

(First Embodiment) FIG. 1 shows a configuration of an exposure apparatus according to a first embodiment of the present invention. The exposure apparatus according to this embodiment includes an exposure optical system 1, a stage 40, a substrate position detection unit 50, an exposure control unit 52, an exposure data storage unit 54, a drive control unit 56, and a stage drive unit 58. Have.

The exposure optical system 1 includes a light source 2, a collimator lens 4, and an enlargement / reduction lens system 6. The light emitted from the light source 2 is collimated by the collimator lens 4 and sent to the reticle 200. This parallel light is converted by the reticle 200 into a pattern image. The pattern image is enlarged or reduced by the enlargement / reduction lens system 6 and projected onto a glass substrate 80 placed on the stage 40. FIG. 16 shows an example of the configuration of the enlargement / reduction lens system 6. FIG. 16A shows a configuration example of a magnifying lens system, and FIG. 16B shows a configuration example of a reduction lens system.

A glass substrate 80 on which a pattern is to be transferred is mounted on the stage 40. This glass substrate 80
For example, as shown in FIG. 2, an alignment mark 85 for position detection is provided around the periphery. On the glass substrate 80 shown in FIG. 2, for example, six array substrates 100 of the liquid crystal display device shown in FIG. 3 are formed. The array substrate 100 shown in FIG. 3 has a pixel portion 1 on a transparent glass substrate 110.
20, drive circuits 131 to 134, a terminal unit 140, a control unit 150, a logic unit 152, and memories 153 and 154.

Glass substrate 8 placed on stage 40
0 is relative to the stage 40.
Detected by 0. The relative position is detected based on the position detection of the alignment mark 85 shown in FIG. 2, and the detection of the alignment mark 85 is performed using, for example, an image processing technique.

The exposure data storage unit 54 stores relative position data (alignment data) of the substrate detected by the substrate position detection unit 50, position data of one shot, patterns of the reticle 200, and information on the positions of these patterns. Data necessary for performing the exposure and expansion / contraction data of the substrate 80 are also stored.

The exposure control section 52 controls the position of the reticle of the exposure optical system 1 and the enlargement / reduction lens system 6 based on the data stored in the exposure data storage section 54, and sends a command signal to the drive control section 56. The stage 40 moves so as to move the stage 40 in the horizontal direction from the reference position by a direction and a distance according to the command signal.

In the exposure apparatus of the present embodiment, the array substrate 100 of the liquid crystal display to which the pattern is transferred is the same as that shown in FIG.
When the pixel unit 120 and the terminal unit 140 are exposed at low resolution, the driving circuits 131 to 1
34, control unit 151, logic unit 152, and memory 15
3,154 are exposed at high resolution. At this time, as shown in FIG. 4, reticle 200 has patterns 220 and 240 corresponding to pixel portion 120 and terminal portion 140, respectively.
Are formed, and the driving circuits 131 to 134,
Control unit 151, logic unit 152, and memory 153, 1
54 respectively correspond to the patterns 231 to 234, 251,
252, 253 and 254 are formed. These patterns 220, 240, 231-234, 251-24
5 is created according to the design rule for high resolution. Then, the pattern 220 corresponding to the pixel portion and the terminal portion,
240 is formed by reducing (for example, reducing to 1/10),
Other patterns 231-234, 251-254 (1x)
Are formed at the same magnification.

For this reason, the pixel section 120 and the terminal section 14
When the pattern transfer of the reticle 2 is performed, the exposure controller 52 controls the reticle 2 so that these pattern images are obtained.
The position of 00 is controlled, and the enlargement / reduction lens system 6 is controlled to operate as an enlargement lens system. Further, the driving circuits 131 to 134, the control unit 151, the logic unit 1
When the pattern transfer of the memory 52 and the memories 153 and 154 is performed, the position of the reticle 200 is controlled by the exposure control unit 52 so that these pattern images can be obtained. It is controlled to operate as a system.

Returning to FIG. 1, the description will be continued. The stage driving unit 58 drives the stage 40 to move in the horizontal direction. When not receiving the command signal from the exposure control unit 52, the drive control unit 56 controls the stage drive unit 58 to position the stage 40 at the reference position. When a command signal is received from the exposure control unit 52, the stage driving unit 58 is controlled so that the stage 40 moves in the horizontal direction based on the command signal.

Next, the operation of the present embodiment will be described. First, the stage controller 58 is controlled by the drive controller 56 to stop the stage 40 at the reference position. Subsequently, after placing the glass substrate on the stage 40, the relative position of the glass substrate 80 on the stage 40 is detected by the substrate position detector 50. This detection data (alignment data)
Are stored in the exposure data storage unit 54 via the exposure control unit 52. The exposure control unit 52 controls the exposure optical system 1 based on the alignment data and the exposure data stored in the exposure data storage unit 54. A low-resolution pattern, for example, the pixel unit 120 and the terminal unit 14 shown in FIG.
0 is transferred, the reticle 2 shown in FIG.
The exposure control unit 5 is selected so that the pattern 220 or the pattern 240 in the pattern No. 00 is selected and these pattern images are obtained.
2 controls the position of the reticle 200 and controls the enlargement / reduction lens system 6 to operate as an enlargement lens. Thus, the pattern image is projected and transferred onto the glass substrate 80. The transfer of the pattern image is performed for each pattern, for example, the pattern 220.
By collective transfer or divided transfer using a mask or the like. At the time of division transfer, care should be taken so that misalignment does not occur.

A high-resolution pattern, for example, the driving circuits 131 to 134, the control unit 151, and the logic unit 15 shown in FIG.
2 and the patterns of the memories 152 and 153 are transferred, the corresponding patterns 231 to 234 and 251 to 254 in the reticle 200 shown in FIG. 4 are selected, and the exposure is performed so that the selected pattern image is obtained. Control unit 5
2, the position of the reticle 200 is controlled, and the enlargement / reduction lens system 6 is controlled to operate as a 1 × lens. At this time, the transfer of the pattern image is performed by collectively transferring each pattern, for example, the pattern 231, or by dividing and transferring using a mask or the like.

When a low-resolution or high-resolution pattern is transferred, the exposure control unit 52 sends a signal to the drive control unit 5 based on the exposure data and the same alignment data.
A command signal is sent to the stage 6, and the stage 40 is moved in the horizontal direction so that the pattern image is properly transferred onto the glass substrate 80 placed on the stage 40.

As described above, according to the exposure apparatus of the present embodiment, the same alignment data is used when transferring a low-resolution pattern and a high-resolution pattern. Only one data measurement is required, and the throughput can be improved.

Further, in this embodiment, since the high-resolution pattern and the low-resolution pattern are formed according to the same design rule in one reticle 200, the reticle 200 can be easily manufactured. There is.

In the above embodiment, the patterns 220 and 240 on the reticle 200 corresponding to the pixel section 120 and the terminal section 140 shown in FIG. 3 are reduced, and the pattern 231 corresponding to the drive circuit 131 and the like are reduced. Although the reticle is formed at the same size, it is also possible to use a reticle in which the patterns 220 and 240 are formed at the same size and the pattern 231 and the like are formed in an enlarged manner. In this case, when exposing the pixel unit 120 and the terminal unit 140, the enlargement / reduction lens system 6 operates as a 1 × lens, and when exposing the drive unit 131 and the like, the enlargement / reduction lens system 6 Is controlled by the exposure control unit 52 to operate as. The reticle in this case is also formed according to the high resolution design rule.

(Second Embodiment) FIG. 5 shows the configuration of an exposure apparatus according to a second embodiment of the present invention. The exposure apparatus of the second embodiment has a configuration in which the exposure optical system 1 of the exposure apparatus of the first embodiment shown in FIG. 1 is replaced with an exposure optical system 1A.

The exposure optical system 1A includes a low-resolution exposure optical system 10, a high-resolution exposure optical system 20, and a half mirror 1
8 and a mirror 28. The low-resolution exposure optical system 10 includes a light source 12, a collimator lens 14, and an enlargement / reduction lens system 16. The high-resolution exposure optical system 20 includes a light source 22, a collimator lens 24, and an enlargement / reduction lens system 26. The low-resolution exposure optical system 10 uses a reticle 201 on which a low-resolution pattern is formed, and the high-resolution exposure optical system 20 uses a reticle 202 on which a high-resolution pattern is formed.

In the present embodiment, when the array substrate 100 of the liquid crystal display device to which the pattern is to be transferred has, for example, the configuration shown in FIG. 3, the reticle 201 has the configuration shown in FIG.
As shown in FIG. 7, patterns 220 and 240 corresponding to the pixel portion 120 and the terminal portion 140 are formed. The reticle 202 has patterns 231a and 231 corresponding to the driving circuit 131 as shown in FIG.
1b and patterns 232a, 232a,
232b, patterns 233 and 234 corresponding to the driving circuits 133 and 134, and patterns 25 corresponding to the control unit 151, the logic unit 152, and the memories 153 and 154, respectively.
1, 252, 253 and 254 are formed. The patterns 220 and 240 formed on the reticle 201 are the same as the patterns 231a,.
It is manufactured with the same design rules as.

Referring back to FIG. Light emitted from the light source 12 is collimated by the collimator lens 14 and sent to the reticle 201. This collimated light is incident on reticle 201
Is converted into a pattern image. The pattern image is enlarged or reduced by the enlargement / reduction lens system 16, reflected by the half mirror 18, and
The image is projected onto the glass substrate 80 placed thereon. on the other hand,
Light emitted from the light source 22 is collimated by the collimator lens 24 and sent to the reticle 202. The parallel light is converted by the reticle 202 into a pattern image.
The pattern image is enlarged or reduced by an enlargement / reduction lens system 26 and reflected by a mirror 28.
The reflected pattern image passes through the half mirror 18 and is projected on a glass substrate 80 placed on the stage 40.

In this embodiment, the exposure control unit 5
Reference numeral 2 denotes a control of the positions of the reticle 201 and the reticle 202 based on the data stored in the exposure data storage unit, as in the first embodiment, and an enlargement / reduction lens system 1.
6 and 26, and sends a command signal to the drive control section 56 to move the stage 40 from the reference position in the horizontal direction by a direction and a distance corresponding to the command signal. Further, it operates such that one of the low-resolution exposure optical system 10 and the high-resolution exposure optical system 20 is turned on and the other is turned off. For example, one of the light source 12 and the light source 22 is turned on and the other is turned off.
Or a light-blocking mask (not shown) is inserted into the optical path of the exposure optical system to be turned off, and the light is blocked.

It goes without saying that the second embodiment also has the same effects as the first embodiment.

In the second embodiment, the optical axis of the high-resolution exposure optical system 20 is provided above and parallel to the optical axis of the low-resolution exposure optical system 10. You may comprise so that it may be provided so that it may become parallel.

(Third Embodiment) FIG. 7 shows the arrangement of an exposure apparatus according to a third embodiment of the present invention. The exposure apparatus according to the third embodiment has a configuration in which the exposure optical system 1A of the exposure apparatus according to the second embodiment shown in FIG. 5 is replaced with an exposure optical system 1B.

The exposure optical system 1B is different from the exposure optical system 1A in that the optical axis of the low-resolution exposure optical system 10 and the optical axis of the high-resolution exposure optical system 20 are on the same straight line. In place of the mirror 28, there is provided a mirror 19 configured to be rotatable about an axis perpendicular to the optical axis and the plane of FIG. The rotation of the mirror 19 is controlled by the exposure control unit 52, and reflects light from the exposure optical system 1A or the exposure optical diameter 1B depending on the rotation position of the mirror 19.

Needless to say, the third embodiment has the same effect as the second embodiment. In the third embodiment, the configuration is such that the optical axis of the low-resolution exposure optical system 10 and the optical axis of the high-resolution exposure optical system 20 are in a plane parallel to the glass substrate 80 located on the stage 40. The mirror 19 may be configured to be rotatable around an axis passing through the intersection of the optical axes and perpendicular to the plane.

(Fourth Embodiment) FIG. 8 shows the arrangement of an exposure apparatus according to a fourth embodiment of the present invention. The exposure apparatus of this embodiment has a configuration in which the exposure optical system 1B of the exposure apparatus of the third embodiment shown in FIG. 7 is replaced with an exposure optical system 1C.

The exposure optical system 1C has a configuration in which the mirror 19 of the exposure optical system 1B is not rotated and a mirror 29 is newly provided. Mirror 19 and mirror 2
Reference numeral 9 is configured to be movable in a direction perpendicular to the paper surface. The movement of the pattern image (light) emitted from the low-resolution exposure optical system 10 is reflected by the mirror 19, and the movement of the pattern image (light) emitted from the high-resolution exposure optical system 20 is reflected by the mirror 29. The control of the positions of the mirror 19 and the mirror 29 is performed based on the data stored in the exposure data storage unit 54.

It goes without saying that the fourth embodiment also has the same effects as the third embodiment.

(Fifth Embodiment) FIG. 9 shows the arrangement of an exposure apparatus according to a fifth embodiment of the present invention. The exposure apparatus of this embodiment has a configuration in which the exposure optical system 1C of the exposure apparatus of the fourth embodiment shown in FIG. 8 is replaced with an exposure optical system 1D.

The exposure optical system 1D has a configuration in which the mirrors 19 and 29 of the exposure optical system 1C are replaced with prisms 30. For this reason, in the present embodiment, the glass substrate 80 placed on the stage 40 of the pattern image of the low-resolution exposure optical system 10 and the pattern image of the high-resolution exposure optical system 20 is used.
Although the upper projection position is different, by outputting a command signal from the exposure control unit 52 to the drive control unit 56, it is possible to compensate for horizontal movement of the stage 40.

It goes without saying that the fifth embodiment also has the same effect as the fourth embodiment.

(Sixth Embodiment) FIG. 10 shows the configuration of an exposure apparatus according to a sixth embodiment of the present invention. The exposure apparatus of the sixth embodiment has a configuration in which the exposure optical system 1D of the exposure apparatus of the fifth embodiment shown in FIG. 9 is replaced with an exposure optical system 1E.

The exposure optical system 1E has a configuration in which the prism 30 of the exposure optical system 1D is replaced by fixed mirrors 19 and 29. Light from the low-resolution exposure optical system 10 is reflected by the mirror 19 and is directed to the glass substrate 80. High resolution exposure optical system 2
The light from 0 is reflected by the mirror 29 and directed to the glass substrate 80.

The exposure controller 52 of the sixth embodiment operates in the same manner as the exposure controller of the fifth embodiment.

It goes without saying that the sixth embodiment has the same effect as the fifth embodiment.

In the fifth and sixth embodiments, the reticles 201 and 202 are respectively disposed between the collimator lens and the enlargement / reduction lens system. However, for example, as shown in FIG. The lens system may be provided after the mirror (or prism), and may be provided between the mirror and the enlargement / reduction lens system.

In the first to sixth embodiments, a stage position detector (not shown) for detecting a deviation of the stage 40 from the reference position is provided, and based on the output of the stage position detector. The drive control unit 56 may be configured to control the stage drive unit 58.

(Seventh Embodiment) FIG. 12 shows the arrangement of an exposure apparatus according to a seventh embodiment of the present invention. The exposure apparatus according to this embodiment includes a low-resolution exposure optical system 10,
A high-resolution exposure optical system 20, stages 41 and 42, a substrate position detection unit 50, an exposure control unit 52, an exposure data storage unit 54, stage position detection units 55 and 57, a stage drive unit 58, And a control unit 56.

The low-resolution exposure optical system 10 is provided at a predetermined position and has, for example, the same configuration as the low-resolution optical system 10 of the second embodiment, and is used for exposing a low-resolution circuit pattern. Used. The high-resolution exposure optical system 20
The position is different from the low-resolution exposure optical system 10, and is provided at a position shifted by 180 degrees from the low-resolution exposure optical system 10 when the stage driving unit 58 is the center in FIG. 12, for example, in the second embodiment. It has the same configuration as the high-resolution optical system 20, and is used for exposing a high-resolution circuit pattern. For example, the array substrate 100 of the liquid crystal display device shown in FIG.
In, the pixel section 120 and the terminal section 140 are exposed by the low-resolution exposure optical system 10, and the driving circuits 131 to 13
4, control unit 151, logic unit 152, memories 153, 15
4 is exposed by the high-resolution exposure optical system 20.

Each of the stages 41 and 42 has a stage driving unit 5 on which a glass substrate 80 on which a pattern is to be transferred is placed.
8, and is driven so as to stop at a reference position of each exposure optical system. The stages 41 and 42 are configured so as to be able to move in parallel in a horizontal direction (in the drawing, a direction parallel to the paper surface) by a predetermined distance.

The substrate position detecting section 50 is provided near the low-resolution exposure optical system 10, and is mounted on the stage 41 or the stage 42 stopped at the reference position 10a of the low-resolution exposure optical system. The position of the substrate 80 with respect to the stage is detected. This position detection is performed on the glass substrate 80 shown in FIG. The detection of the alignment mark 85 is performed using, for example, an image processing technique. Note that six array substrates 100 of the liquid crystal display device shown in FIG. 3 are formed on the glass substrate 80 shown in FIG.

The exposure data storage unit 54 stores data necessary for performing exposure, such as substrate position data (alignment data) and one-shot position data detected by the substrate position detecting unit 50, and the substrate 80. Is also stored.

The exposure control section 52 controls the low-resolution exposure optical system 1 based on the data stored in the exposure data storage section 54.
In addition to controlling the position of the reticle 0 and the reticle of the high-resolution exposure optical system 20, a command signal is sent to the drive control section 56 to operate the respective stages 41 and 42 for minute movement in the horizontal direction. The reticle is provided between the collimator lens and the enlargement / reduction lens system, for example, as in the second embodiment.

The exposure control unit controls the enlargement / reduction lens system according to the reticle pattern as in the second embodiment.

The stage position detectors 55 and 57 detect the difference between the reference positions 10a and 20a of the low-resolution exposure optical system 10 and the high-resolution exposure optical system 204 and the stop position of the stage, respectively.

When the drive control unit 56 does not receive the command signal from the exposure control unit 52, the drive control unit 56
Based on the detection results of 5, 57, the stage driving unit 5 stops each stage at the reference positions 10a, 20a of the low-resolution exposure optical system 10 and the high-resolution exposure optical system 20.
8 is controlled. When a command signal from the exposure control unit 52 is received, the stages 41, 42 are detected based on the command signal and the detection outputs of the stage position detecting units 55, 57.
Stage driving unit 58 so as to slightly move
Control.

Next, the operation of the present embodiment will be described. First, the stage controller 58 is controlled by the drive controller 56 to stop the stage 41 at the reference position 10a of the low-resolution exposure optical system 10. Subsequently, after placing the glass substrate 80 on the stage 41, the position of the glass substrate 80 on the stage 41 is detected by the substrate position detector 55. This detection data (alignment data) is stored in the exposure data storage unit 54 via the exposure control unit 52. The exposure control unit 52 controls the low-resolution exposure optical system 10 based on the alignment data and the exposure data stored in the exposure data storage unit 54, so that the low-resolution circuit pattern is transferred onto the glass substrate 80. You.

When the transfer of the low-resolution circuit pattern is completed, the drive control unit 56 controls the stage 41 via the stage drive unit 58 so as to stop at the reference position 20 a of the high-resolution exposure optical system 20. At this time, the stage 42 is stopped at the reference position 10a of the low-resolution exposure optical system 10 by the drive control unit 56 via the stage drive unit 58.
Is controlled by

Next, the high-resolution exposure optical system 20 is controlled by the exposure control unit 52 based on the alignment data and the exposure data of the glass substrate 80 placed on the stage 41 stored in the exposure data storage unit 54. And
The high-resolution circuit pattern is transferred onto the glass substrate 80 on the stage 41. Thereafter, the glass substrate 80 is removed from the stage 41.

On the other hand, after a glass substrate 80 on which a low-resolution circuit pattern is to be transferred is placed on the stage 42, the position of the glass substrate 80 on the stage 42 is detected by the substrate position detector 50. The detected data (alignment data) is stored in the exposure data storage unit 54 via the exposure control unit 52 as described above. The low-resolution exposure optical system 10 is controlled by the exposure control section 52 based on the alignment data and the exposure data, and the low-resolution circuit pattern is
0.

When the transfer of the low-resolution circuit pattern is completed, the stage 42 is driven to stop at the reference position 20a of the high-resolution exposure optical system 20, and the stage 41 is driven.
Is driven to stop at the reference position 10a of the low-resolution exposure optical system 10. Thereafter, a new glass substrate 80 on which a circuit pattern is to be transferred is placed on the stage 41, and a low-resolution circuit pattern is transferred in the same manner as described above, and a high-resolution circuit The pattern is transferred. The glass substrate 80 onto which the high-resolution circuit pattern has been transferred is removed from the stage 42. Thereafter, the above is repeated.

In the exposure apparatus of this embodiment, a low-resolution exposure optical system 10 and a reference position 10
a stage when stopped at a, for example, stage 41
Relative positional relationship between the high-resolution exposure optical system 20 and the stage 41 stopped at the reference position 10a of the optical system 20 or in a predetermined relationship. Therefore, if the position of the substrate 80 on the stage (for example, the stage 41) is detected by the substrate position detecting unit 50 on the low-resolution exposure optical system 10 side,
The detected alignment data is stored in the stage 4
1 rotates and moves to the reference position 2 of the high-resolution exposure optical system 20.
When it is located at 0a, it can be used as alignment data of the substrate on the stage 41.
Therefore, it is not necessary to measure the alignment data again in the high-resolution exposure optical system 20, and the throughput can be improved.

Further, the improvement in the throughput
It is possible to miniaturize the TFT constituting the driving circuit and the like without lowering the throughput than before. As a result, the board area per unit function is reduced, so that resources can be saved and power consumption can be reduced.

In the above embodiment, the area of one shot in the low-resolution exposure optical system 10 is larger than the area of one shot in the high-resolution exposure optical system 20, and the depth of focus in the low-resolution exposure optical system 10 is high. It is deeper than that of the exposure optical system 20.

Further, in the above embodiment, the substrate position detecting section 50 is provided on the low resolution exposure optical system 10 side, but may be provided on the high resolution exposure optical system 20 side.

In the above embodiment, the two stages 41 and 42 are configured to rotate and move between the two exposure optical systems. However, the two stages 41 and 42 are configured to move in parallel as shown in FIG. May be. Moreover, you may comprise so that parallel movement and rotation movement may be combined.

In the second to seventh embodiments, the low-resolution exposure optical system 10 shown in FIG.
The patterns 220 and 240 of the reticle 201 shown in FIG.
Is reduced to 1/10, for example, the first
As in the case of the first embodiment, the enlargement / reduction lens system 16 of the low-resolution exposure optical system 10 operates as a magnifying lens with a magnification of 10 times. The reduction lens system 16 is controlled to operate as a 1 × lens. High-resolution exposure optical system 20
The pattern of the reticle 202 used, for example, FIG.
Enlargement according to the patterns 231a to 254 shown in FIG.
The reduction lens system 26 is controlled to operate. In addition,
Once the reticle is determined, the operations of the lenses 16, 26 are fixed.

In the first to seventh embodiments, the numerical aperture of the lens of each exposure optical system is preferably selected according to the shot area.

In the above-described embodiment, when performing exposure at the same magnification, a reticle may be arranged close to the substrate 80 and exposure may be performed.

In the first to sixth embodiments, the stage 40 is configured to move. However, the exposure optical system may be configured to be movable with respect to the stage. In this case, for example, in the first embodiment shown in FIG. 1, the stage driving unit 58 and the driving control unit 56
Are an exposure system drive unit 58A and a drive control unit 56A, respectively, as shown in FIG. The exposure system drive unit 58A moves the exposure optical system in the horizontal direction, and the drive control unit 56A controls the exposure optical system to stop at the reference position via the exposure system drive unit 58A.

[0091]

As described above, according to the present invention, the throughput can be improved as much as possible even when high-resolution and low-resolution patterns are mixed.

[Brief description of the drawings]

FIG. 1 is a block diagram showing a configuration of a first embodiment of an exposure apparatus according to the present invention.

FIG. 2 is a diagram showing a relationship between a glass substrate and an alignment mark used in the exposure apparatus of the present invention.

FIG. 3 is a schematic diagram showing a circuit arrangement of an array substrate of a liquid crystal display device exposed by the exposure apparatus of the present invention.

FIG. 4 is a schematic view showing a configuration of a reticle used to form the array substrate shown in FIG.

FIG. 5 is a block diagram showing a configuration of an exposure apparatus according to a second embodiment of the present invention.

FIG. 6 is a schematic diagram showing a configuration of a reticle used in the exposure apparatus of the present invention.

FIG. 7 is a block diagram showing a configuration of an exposure apparatus according to a third embodiment of the present invention.

FIG. 8 is a block diagram showing a configuration of an exposure apparatus according to a fourth embodiment of the present invention.

FIG. 9 is a block diagram showing a configuration of an exposure apparatus according to a fifth embodiment of the present invention.

FIG. 10 is a block diagram showing a configuration of an exposure apparatus according to a sixth embodiment of the present invention.

FIG. 11 is a block diagram showing a configuration of a modification of the sixth embodiment.

FIG. 12 is a block diagram showing a configuration of an exposure apparatus according to a seventh embodiment of the present invention.

FIG. 13 is a block diagram showing a configuration of a modification of the exposure apparatus according to the seventh embodiment.

FIG. 14 is a block diagram showing a configuration of a modified example of the exposure apparatus of the first embodiment.

FIG. 15 is a schematic diagram showing a circuit arrangement of an array substrate of a liquid crystal display device integrated with a pixel portion and a driving circuit.

FIG. 16 is a diagram illustrating an example of a configuration of an enlargement / reduction lens system.

[Explanation of symbols]

1,1A-1F Exposure optical system 2,12 Light source 4,14,24 Collimator lens 6,16,26 Magnification / reduction lens system 10 Low resolution exposure optical system 18 Half mirror 19,28,29 Mirror 20 High resolution exposure optical system Reference Signs List 30 prism 40 stage 50 substrate position detection unit 52 exposure control unit 54 exposure data storage unit 56 drive control unit 58 stage drive unit 80, 110 glass substrate 85 alignment mark 100 array substrate of liquid crystal display device 120 pixel units 131 to 134 drive circuit 140 Terminal unit 151 Control unit 152 Logic unit 153, 154 Memory 200 Reticle 201 Reticle (for low resolution) 202 Reticle (for high resolution) 220, 240, 231-234, 240, 251-2
54 patterns

Continued on the front page (72) Inventor Kazuo Yudasaka 3-5-5 Yamato, Suwa-shi, Nagano Seiko Epson Corporation (72) Inventor Mitsutoshi Miyasaka 3-5-35 Yamato, Suwa-shi, Suwa, Nagano Seiko -Within Epson Corporation (72) Inventor Yojiro Matsueda 3-5-5 Yamato, Suwa City, Nagano Prefecture Seiko-Within Epson Corporation (72) Kiyofumi Kitawada 3-5-5 Yamato, Suwa City, Nagano Prefecture Seiko Epson Corporation (72) Inventor Taku Hiraiwa 3-5-5 Yamato, Suwa-shi, Nagano F-term (reference) in Seiko Epson Corporation 2H095 BA12 BB02 BE03 2H097 AA11 AB07 GB01 JA02 KA13 KA18 KA29 LA12 5F046 AA25 BA03 CB02 CB05 CB07 CB10 CB12 CB17 CB25 CC01 CC02 CC03 CC05 DA06 DA07 DA12 DA13 DB05 DD06 EB01 FA10

Claims (20)

[Claims] 1. A stage on which a substrate on which a pattern is transferred is mounted, a light source, a collimator lens for converting light emitted from the light source into parallel light, and an enlargement for enlarging or reducing the light from the collimator lens. An exposure optical system having a reduction lens system; a drive unit for driving one of the stage and the exposure optical system in the horizontal direction; and controlling a position of the stage or the exposure optical system driven by the drive unit. A drive control unit, a substrate position detection unit that detects a position of a substrate placed on the stage, and an output path of the substrate position detection unit and exposure data of the substrate, based on an exposure path of the exposure optical system. An exposure control unit that controls the position of the reticle to be inserted and the enlargement / reduction lens system to transfer the reticle pattern onto the substrate. And to the exposure device. 2. An exposure apparatus according to claim 1, wherein said exposure control section controls said enlargement / reduction lens system according to a reticle pattern. 3. The reticle according to claim 1, wherein a first pattern for a first resolution and a second pattern for a second resolution higher than the first resolution conform to a design rule adapted to the second resolution. 3. The exposure apparatus according to claim 1, wherein the exposure apparatus is formed on the same substrate. 4. The exposure control section sends a command signal to the drive control section when performing exposure, and the drive control section, when not receiving the command signal from the exposure control section, Controlling the driving unit to move the stage or the exposure optical system in the horizontal direction when the command signal is received from the exposure control unit. 4. The exposure apparatus according to claim 1, wherein the exposure is performed. 5. A stage on which a substrate on which a pattern is to be transferred is mounted, a first light source, a first collimator lens for converting light emitted from the first light source into parallel light, and a first collimator lens. A first optical system having a first enlarging / reducing lens system for enlarging or reducing light from the collimator lens, a second light source, and a second light source for converting light emitted from the second light source into parallel light. A second optical system having a second collimator lens, a second enlargement / reduction lens system for enlarging or reducing light from the second collimator lens, and a second optical system having a first optical system and a second optical system. A projection unit for projecting light onto the substrate mounted on the stage; an exposure optical system comprising: a drive unit for driving one of the stage and the exposure optical system in a horizontal direction; and the drive unit Driven by the A drive control unit that controls the position of a stage or the exposure optical system, a substrate position detection unit that detects the position of a substrate placed on the stage, and an output of the substrate position detection unit and exposure data of the substrate. Controlling the positions of the first and second reticles respectively inserted into the optical paths of the first and second optical systems, and controlling the first and second enlargement / reduction lens systems based on the An exposure apparatus, comprising: an exposure controller configured to transfer patterns of first and second reticles onto the substrate. 6. An optical axis of said first optical system and an optical axis of said second optical system are configured to be parallel before incidence on said substrate, and said projection unit comprises said first optical system. A first mirror that reflects light from the system, and a second mirror that reflects light from the second optical system and transmits light from the first mirror.
6. The exposure apparatus according to claim 5, further comprising a mirror. 7. The exposure unit includes a mirror provided to be rotatable and reflecting light from the first and second optical systems. The exposure apparatus according to claim 5, wherein the exposure apparatus is controlled by: 8. The projection unit has a first mirror that reflects light from the first optical system, and a second mirror that reflects light from the second optical system. The exposure apparatus according to claim 5, wherein: 9. An exposure apparatus according to claim 8, wherein said first and second mirrors are fixed. 10. The first and second mirrors are provided so as to be movable in a horizontal direction, and the first and second mirrors are provided.
9. The exposure apparatus according to claim 8, wherein the position of the mirror is controlled by the exposure control unit. 11. An exposure apparatus according to claim 5, wherein said projection section has a prism. 12. The exposure apparatus according to claim 5, wherein the first and second optical systems have different resolutions. 13. The exposure control section sends a command signal to the drive control section when performing exposure, and the drive control section, when not receiving a command signal from the exposure control section, Controlling the driving unit to move the stage or the exposure optical system in a horizontal direction when the command signal is received from the exposure control unit. 13. The exposure apparatus according to claim 5, wherein the exposure is performed. 14. The exposure control section controls so that when one of the first and second optical systems is operating, the operation of the other optical system is stopped. An exposure apparatus according to any one of claims 5 to 13. 15. A first light source, a first collimator lens for converting light emitted from the first light source into parallel light, and a first collimator for expanding or reducing light from the first collimator lens. A first exposure optical system having an enlargement / reduction lens system and arranged at a first position, a second light source, and a second collimator for converting light emitted from the second light source into parallel light A lens, and a second enlargement / reduction lens system for enlarging or reducing light from the second collimator lens. And the first and second exposure optical systems, and the first and second
A stage driving unit that drives the first and second stages; and a stage driving unit that stops the first and second stages at reference positions of the first and second exposure optical systems. A drive control unit for controlling a unit, provided on one of the first and second exposure optical systems on the side of the exposure optical system, and controlling the position of a substrate mounted on the stage of the one exposure optical system. A substrate position detecting section to be detected, and first and second reticles respectively inserted into optical paths of the first and second exposure optical systems based on an output of the substrate position detecting section and exposure data of the substrate. And an exposure control unit for controlling the position of the first and second enlargement / reduction lens systems and transferring the patterns of the first and second reticle onto the substrate. Exposure equipment Place. 16. A difference between a stop position of a stage provided on the side of the first exposure optical system and stopped near the first exposure optical system and a reference position of the first exposure optical system. A first stage position detection unit for detecting, a stop position of a stage provided on the side of the second exposure optical system and stopped near the second exposure optical system, and a second exposure optical system. A second stage position detecting unit for detecting a difference from the reference position of the first and second stages, wherein the drive control unit is configured to control the first and second stages based on outputs of the first and second stage position detecting units. 16. The exposure apparatus according to claim 15, wherein the control is performed. 17. An exposure apparatus according to claim 5, wherein said exposure control section controls said enlargement / reduction lens system according to the patterns of said first and second reticles. . 18. An exposure apparatus according to claim 1, wherein said reticle is provided between said collimator lens and said enlargement / reduction lens system. 19. The first reticle is provided between the first collimator lens and the first enlargement / reduction lens system, and the second reticle is provided between the second collimator lens and the second collimator lens. The exposure apparatus according to any one of claims 5 to 17, wherein the exposure apparatus is provided between a zoom lens system and a zoom lens system. 20. A first pattern for a first resolution and a second pattern for a second resolution higher than the first resolution are formed on the same substrate according to a design rule adapted to the second resolution. A reticle formed on the reticle.