JP2000269120A - パターン評価方法及びパターン形成方法 - Google Patents

パターン評価方法及びパターン形成方法

Info

Publication number
JP2000269120A
JP2000269120A JP11074046A JP7404699A JP2000269120A JP 2000269120 A JP2000269120 A JP 2000269120A JP 11074046 A JP11074046 A JP 11074046A JP 7404699 A JP7404699 A JP 7404699A JP 2000269120 A JP2000269120 A JP 2000269120A
Authority
JP
Japan
Prior art keywords
pattern
device pattern
monitor
intensity
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11074046A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000269120A5 (enExample
Inventor
Kei Hayazaki
圭 早崎
Shinichi Ito
信一 伊藤
Bunro Komatsu
文朗 小松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP11074046A priority Critical patent/JP2000269120A/ja
Priority to TW89103474A priority patent/TW449779B/zh
Priority to US09/527,526 priority patent/US6187488B1/en
Publication of JP2000269120A publication Critical patent/JP2000269120A/ja
Publication of JP2000269120A5 publication Critical patent/JP2000269120A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11074046A 1999-03-18 1999-03-18 パターン評価方法及びパターン形成方法 Pending JP2000269120A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11074046A JP2000269120A (ja) 1999-03-18 1999-03-18 パターン評価方法及びパターン形成方法
TW89103474A TW449779B (en) 1999-03-18 2000-02-29 Evaluation method of pattern and forming method of pattern
US09/527,526 US6187488B1 (en) 1999-03-18 2000-03-16 Pattern estimating method and pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11074046A JP2000269120A (ja) 1999-03-18 1999-03-18 パターン評価方法及びパターン形成方法

Publications (2)

Publication Number Publication Date
JP2000269120A true JP2000269120A (ja) 2000-09-29
JP2000269120A5 JP2000269120A5 (enExample) 2005-09-02

Family

ID=13535857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11074046A Pending JP2000269120A (ja) 1999-03-18 1999-03-18 パターン評価方法及びパターン形成方法

Country Status (2)

Country Link
JP (1) JP2000269120A (enExample)
TW (1) TW449779B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7364839B2 (en) 2002-07-24 2008-04-29 Kabushiki Kaisha Toshiba Method for forming a pattern and substrate-processing apparatus
JP2008244497A (ja) * 2008-06-06 2008-10-09 Fujitsu Ltd 半導体装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006006562A1 (ja) 2004-07-12 2006-01-19 Nikon Corporation 露光条件の決定方法、露光方法、露光装置、及びデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7364839B2 (en) 2002-07-24 2008-04-29 Kabushiki Kaisha Toshiba Method for forming a pattern and substrate-processing apparatus
JP2008244497A (ja) * 2008-06-06 2008-10-09 Fujitsu Ltd 半導体装置

Also Published As

Publication number Publication date
TW449779B (en) 2001-08-11

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