JP2000243676A - Control of semiconductor manufacturing apparatus and the semiconductor manufacturing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of controlling a semiconductor device manufacturing apparatus and the semiconductor device manufacturing apparatus that minimizes deviation of reset timing, without interrupting the fetch processing the measured value from a process controller during the process for setting the preset value to the process controller. SOLUTION: In the method of controlling this semiconductor device manufacturing apparatus, an input/output controller 8 interrupts the process to fetch the measured value from the process controller upon reception of an interrupt request 101 for interrupting the input process, unit controllers 7a to 7c discriminate the change of input setting value. When the input setting value is changed, the setting changed requests 105, 107 are output, and when there is no change in the input setting value, the setting value non-change request 106 is output. Thereby, the setting value change requests 105, 107 are output to the corresponding process controller, and when as many change requests 105 to 107 are input as the process controllers from the unit controllers 7a to 7c, the input/output controller 8 restarts the process to fetch the measured value.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for controlling a semiconductor manufacturing apparatus and a semiconductor manufacturing apparatus.

[0002]

2. Description of the Related Art Semiconductor manufacturing apparatuses include, for example, respective manufacturing apparatuses corresponding to wafer processing steps, such as a dry etching apparatus, a thin film forming apparatus, and a doping apparatus. A dry etching apparatus as a semiconductor manufacturing apparatus includes a mass flow controller as a gas flow rate control apparatus for automatically supplying a semiconductor manufacturing gas (hereinafter abbreviated as a gas) and a pressure controller for controlling the pressure of a reaction chamber. And various other units. This dry etching apparatus controls the flow rates of different gases with a plurality of (for example, three) mass flow controllers to supply them to the reaction chamber, and generates plasma inside the reaction chamber whose pressure is controlled by a pressure controller. The surface treatment is performed on a wafer placed on an electrode inside the reaction chamber.

In recent years, various units, such as a mass flow controller and a pressure controller, which constitute this dry etching apparatus have been significantly improved in function. Accordingly, input / output control through serial communication with a controller of the apparatus main body is increasing. On the other hand, in order to reduce wiring, it is also necessary to connect serial wiring of many units in series to one serial port, and to control the input / output of each unit using the ID (identification information) in the message. Is coming.

Here, a dry etching apparatus as a conventional semiconductor manufacturing apparatus will be described below as a specific example. As shown in FIG. 3, a conventional dry etching apparatus controls a physical quantity (flow rate) of a controlled object (gas) for manufacturing a semiconductor so that the physical quantity (flow rate) becomes a set value and obtains a measured value obtained by measuring an actual gas flow rate. Output process control units 1a, 1
b, 1c (three mass flow controllers), a storage unit 2 for storing a value to be set in each process control unit 1a to 1c for each step of the process, and a time for continuing the step, and a storage unit 2 for storing the values. A sequence control unit 3 for outputting the set values in a timed manner, and each process control unit 1
unit control units 4a, 4 corresponding one-to-one to
b, 4c and an input / output control unit 5 for controlling input / output between the device and the unit. Each process control unit 1
a to 1c and the input / output control unit 5 are connected by one serial cable, the process control units 1a to 1c share a serial port, and the unit control units 4a to 4c share the input / output control unit 5. are doing.

In this dry etching apparatus, the flow of processing up to setting the set value in each of the process controllers 1a to 1c is as follows. First, the sequence control unit 3
Retrieves the next set value from the storage unit 2 when the step is switched, and outputs the retrieved set value to the corresponding unit control units 4a to 4c. Each of the unit control units 4 a to 4 c analyzes the setting contents and outputs a new setting value to the input / output control unit 5. The input / output control unit 5 converts the input from the unit control units 4a to 4c and outputs them to the corresponding process control units 1a to 1c, and transmits the set values to the process control units 1a to 1c.

On the other hand, in order to monitor whether or not the flow rates of the respective gases are correctly controlled by the respective process control sections 1a to 1c, the input / output control section 5 performs measurement by actually measuring the flow rates of the controlled gases. The values are always taken at regular intervals. As described above, the input / output control unit 5 performs these processes in the order in which the setting command for setting the set value to each of the process control units 1a to 1c and the command for taking in the measured value from each of the process control units 1a to 1c are generated. ing.

Here, the process of setting the set value and the process of taking in the measured value in the input / output control unit 5 will be specifically described. As shown in FIG. 4, the input / output control unit 5 performs a measurement value acquisition process 310 for acquiring a measurement value obtained by measuring the flow rate of the gas controlled by the process control unit 1a from the process control unit 1a until, for example, time t1. Running at time t
From 1 to time t2, a measurement value acquisition process 311 for acquiring from the process control unit 1b a measurement value obtained by measuring the flow rate of the gas controlled by the process control unit 1b.

If it is assumed that a step change occurs at a certain time between time t1 and time t2, the sequence control unit 3 retrieves the next set value from the storage unit 2 and stores the retrieved set value in each of the corresponding unit control units. Part 4a-
4c is executed. The sequence control unit 3 sends a setting instruction 301 to the unit control unit 4a.
Is output. The unit control unit 4a analyzes the setting contents of the setting command 301, and when it determines that the new setting value based on the setting command 301 is different from the previous setting value and has changed, the unit control unit 4a inputs the setting command 304 relating to the new setting value. A set value change process 307 to be output to the output control unit 5 is executed. It is assumed that the setting instruction 304 is output, for example, at time t2.

The input / output control unit 5 starts the process control units 1a to 1 at the time (time t2) when the process 311 for taking in the measured values from the process control unit 1b, which is the process being executed, ends.
The process of taking in the measured value from c is interrupted by the process 311 of taking in the measured value from the process control unit 1b, and the process of taking in the measured value from the remaining process control unit 1c 313.
, And execution of the setting process 312 for setting a new set value in the process control unit 1a is started.

When the setting command 302 from the sequence control unit 3 is input to the unit control unit 4b during the execution of the setting process 312 in the input / output control unit 5, the unit control unit 4b
Analyzes the setting contents of the setting instruction 302, for example,
If it is determined that the new set value based on the set command 302 is the same as the previous set value and there is no change, the input / output control unit 5
The setting value change processing 308 that does not output the setting request to the setting value is executed.

Subsequently, when the setting command 303 from the sequence control unit 3 is input to the unit control unit 4c during the execution of the setting process 312 in the input / output control unit 5, the unit control unit 4c sets The setting contents of the command 303 are analyzed, and when it is determined that the new setting value based on the setting command 303 is different from the previous setting value and is changed, a setting request 305 relating to the new setting value is output to the input / output control unit 5. The setting value change processing 309 is executed.

However, before the setting request 305 from the unit processing unit 4c for some reason, the taking process 313 that takes in the measured value from the process control unit 1c, which is a continuation of the above taking process, is restarted first. In the setting process 314 of the process control unit 1c,
3 will be executed after completion. Therefore, the setting process for each of the process controllers 1a to 1c is not performed continuously, and a setting timing shift occurs.

The input / output control unit 5 executes a measurement value acquisition process 315 for acquiring a measurement value from the process control unit 1a after the setting process 314 of the process control unit 1c, and executes the process after the execution of the measurement value acquisition process 315. Control unit 1b
The measurement value acquisition process 316 for acquiring the measurement value from is executed.

[0014]

In many cases, in a semiconductor manufacturing process, it is necessary to precisely control a control factor such as a flow rate of a reaction gas or a high-frequency power with respect to time. Process control unit 1
The setting process for a to 1c needs to be performed at an accurate timing.

However, in a conventional semiconductor manufacturing apparatus,
Since these processes are performed in the order in which a setting command for setting a set value to each of the process control units 1a to 1c and a take-in command for taking in a measured value from each of the process control units 1a to 1c are performed, the control of the semiconductor manufacturing apparatus is performed. There is a problem that it is difficult to maintain the real-time property by the method. The present invention relates to a method of controlling a semiconductor manufacturing apparatus and a method of controlling a semiconductor manufacturing apparatus, which minimizes a shift in setting timing without interrupting a process of acquiring a measured value from a process control unit during a setting process of setting a set value in each process control unit. It is intended to provide a device.

[0016]

According to a control method of a semiconductor manufacturing apparatus of the present invention, when an input processing interruption request is received, an input / output control means interrupts a measured value fetching process from a process control means, and the input setting is interrupted. The unit control means determines whether or not there is a change in the value. If there is a change, a request to change the set value is output. If there is no change, a request to change the set value is output. When the change request is output to the control means and the change request from the unit control means is inputted by the number of the process control means, the input / output control means restarts the measurement value acquisition processing.

Further, the semiconductor manufacturing apparatus of the present invention includes a plurality of process control means for controlling a physical quantity of a controlled object for manufacturing a semiconductor to a designated set value and measuring and outputting the physical quantity; Storage means for storing a set value instructed by the user, a duration for continuing the set value, and the number of the process control means, and a sequence control for outputting a setting request for continuing the set value from the storage means for the duration. Means, when a setting request is input from the sequence control means, it is determined whether or not the setting value has been changed. If the setting value has been changed, a setting value change request is output. Upon receiving an input processing interruption request from the unit control means for outputting a change request and the input control processing from the sequence control means, the measurement value acquisition processing from the process control means is interrupted, and Input / output control means for outputting a set value change request to the corresponding process control means, and resuming the measured value taking process when a change request from the unit control means is inputted by the number of the process control means. Things.

According to the present invention, it is possible to minimize the deviation of the setting timing without interrupting the process of taking the measured value from the process control unit during the setting process of setting the set value in each process control unit.

[0019]

According to the first aspect of the present invention, a controlled value for outputting a set value from a unit control means to a plurality of process control means via an input / output control means to manufacture a semiconductor. Controlling the target physical quantity to this set value, when manufacturing a semiconductor by controlling to output the measured value of the physical quantity measured by the plurality of process control means to the unit control means via the input / output control means, When receiving the input processing interruption request, the input / output control means interrupts the measurement value acquisition processing from the process control means, and determines whether or not the input set value has been changed by the unit control means, and when there is a change, Outputs a set value change request, outputs a set value non-change request when there is no change, outputs the set value change request to the corresponding process control means, and outputs a change request from the unit control means. The input / output control means is a method of controlling the semiconductor manufacturing apparatus which resumes the measurement value acquisition processing when the number of inputs is equal to the number of the process control means. The deviation of the set timing can be minimized without interrupting the process of taking in the measured value from the process control unit during the process.

According to a second aspect of the present invention, there are provided a plurality of process control means for controlling a physical quantity to be controlled for manufacturing a semiconductor to a designated set value and measuring and outputting the physical quantity; A storage unit for storing a set value instructed to the control unit, a duration for continuing the set value, and the number of the process control units, and a setting request for continuing the set value from the storage unit for the duration. When a setting request is input from the sequence control means and the sequence control means, it is determined whether or not the setting value has been changed.If the setting value has been changed, a setting value change request is output. Upon receiving an input processing interruption request from the unit control means for outputting a setting non-change request and the sequence control means, the measurement value acquisition processing from the process control means is interrupted, and Input / output control means for outputting a set value change request to the corresponding process control means, and resuming the measured value taking process when a change request from the unit control means is inputted by the number of the process control means. This is a semiconductor manufacturing apparatus, and the setting timing deviation can be minimized without interrupting the process of taking in the measured value from the process control unit during the setting process of setting the set value in each process control unit.

According to a third aspect of the present invention, a plurality of process control means having a mechanism for controlling a physical quantity to a commanded value and measuring an actual physical quantity at the same time, and to be set in the process control means. Storage means for storing a value, a time for continuing the set value, and the number of the process control means;
A sequence control unit that outputs a setting request so that the set value stored for the time stored in the storage unit continues, and a one-to-one correspondence with the process control unit, and inputs a setting request from the sequence control unit. Unit control means for determining whether the set value has been changed, outputting a set value change request if the set value has been changed, and outputting a set value non-change request if the set value has not been changed; and If the means receives an input processing interruption request from the sequence control means before issuing an output request to the unit control means, the measurement value acquisition processing from the process control means is interrupted, and the set value change request is received from the unit control means. Is output to the process control means, and the number of the process control means stored in the storage means is equal to the number of the process control means from the unit control means. A semiconductor manufacturing apparatus having input / output control means for resuming input processing when a change request is input, wherein measurement from the process control unit is performed during a setting process of setting a set value in each process control unit. The deviation of the set timing can be minimized without interrupting the value fetching process.

Hereinafter, a method for controlling a semiconductor manufacturing apparatus and a semiconductor manufacturing apparatus according to the present invention will be described based on specific embodiments. Here, a case where a semiconductor manufacturing apparatus is a dry etching apparatus as a specific example will be described. (Embodiment) A dry etching apparatus according to an embodiment of the present invention controls a physical quantity (flow rate) of a controlled object (gas) for manufacturing a semiconductor to a designated set value and measures and outputs the flow rate. Process control units 1a to 1c (for example, three mass flow controllers) as process control means, set values instructed to the process control units 1a to 1c, a duration for continuing the set values, and process control units 1a to 1c. Storage unit 6 as storage means for storing the number of 1c
And a sequence control unit 3 as a sequence control unit for outputting a setting request from the storage unit 6 to continue the setting value for the duration thereof, and when a setting request from the sequence control unit 3 is input, the setting value is changed. Unit control units 7a to 7c as unit control means for judging presence / absence, outputting a set value change request if the set value is changed, and outputting a set non-change request if the set value is not changed; and a sequence control unit In response to the input processing interruption request from the control unit 3, the measurement value acquisition processing from the process control units 1a to 1c is interrupted, the set value change request is output to the corresponding process control units 1a to 1c, and the process control units 1a to 1c are output. Provided with an input / output control unit 8 as input / output control means for restarting the measurement value acquisition process when the number of change requests from the unit control units 7a to 7c is inputted by the number of 1c. A.

The process control units 1a to 1c have individual IDs for distinguishing each of them. The sequence control unit 3 corresponds to, for example, software for executing a recipe inside the device controller.
The above-described recipe is composed of a plurality of steps, and each step is data in which set values such as the time of the step and gas flow rate / pressure are written.

The unit control units 7a to 7c correspond, for example, to the process control units 1a to 1c one by one. When a setting request is input from the sequence control unit 3, the unit control units 7a to 7c determine whether a set value has been changed, and If there is a change in the value, the set value change request is output with an ID. If there is no change in the set value, the request is output with the ID added, and the process control units 1a to 1
The measured value (actual flow rate) from c is taken in and monitored for deviation from the set value.

The input / output control unit 8 includes unit control units 7a to 7a.
7c, upon receiving a setting request, generates a command character string based on the ID and the setting value, and outputs it to the serial port.
A process for outputting a character string of a command for capturing an actual flow rate to a serial port and converting a character string of a response from the process control units 1a to 1c into flow rate data is performed by polling. Here, the processing operation of the input / output control unit 8 of the dry etching apparatus will be specifically described. The process control unit 1
It is assumed that a setting different from the current setting value is performed for a and 1c, and the process control unit 1b does not change the setting value.

As shown in FIG. 2, the input / output control unit 8 executes, for example, a measurement value acquisition process 112 for acquiring a measurement value from the process control unit 1a until time T1, and a measurement value from the process control unit 1b. A measurement value acquisition process 113 for acquiring a value is executed. Assuming that a step change occurs at a certain time before time T1, the sequence control unit 3 generates an interruption command 101 for interrupting the measurement value acquisition process as an input process interruption request, and outputs it to the input / output control unit 8. The next set value is fetched from the storage unit 6, and the fetched set value is stored in each of the corresponding unit control units 7a to 7a.
Execute the setting change processing 108 to be output to c.

Specifically, when the recipe being executed is switched to a new step in the sequence control section 3, the setting parameters of that step are analyzed. For example,
If the setting of the gas flow rate is included, the input / output control unit 8 is instructed to interrupt the acquisition of the actual flow rate from the process control units 1a to 1c. The input / output control unit 8 outputs the suspend instruction 1
When receiving 01, the measurement value acquisition processing that is performed at regular intervals is temporarily stopped. (The polling of the actual flow rate acquisition is interrupted.) Specifically, the input / output control unit 8 executes the interruption instruction 1 during the execution of the measurement value acquisition processing 113 from the process control unit 1b.
01, the process of taking in the measured values from the process control units 1a to 1c at the time (time T1) when the process 113 for taking in the measured values from the process control unit 1b is completed. Processing 1 to capture values
The process is interrupted by 13 and the process 116 for taking in the measured values from the remaining process control unit 1c is postponed, and the process for taking in the measured values is temporarily stopped.

Subsequently, the sequence control unit 3 fetches the next set value from the output storage unit 2 as in the prior art, and sets the set requests 102 to 104 as the fetched set values to the corresponding unit control units 7a to 7c. Output to In each of the unit controllers 7a to 7c, when there is a setting request 102 to 104, a setting value change process 109 to 111 for analyzing the setting value.
Execute If it is determined that the new setting value is different from the current setting value, the setting value change request including the new setting value is output with an ID as in the conventional case. Here, since the setting requests 102 and 104 are different from the current setting values, the setting requests 105 and 107 as the setting value change requests are set.
Is output to the input / output control unit 8.

On the other hand, when it is determined that the new set value is the same as the current set value, conventionally, nothing is output in order to reduce the processing of the setting request output device and the setting processing time. Although the semiconductor manufacturing apparatus is configured not to perform the setting process, the setting process is not performed in the semiconductor manufacturing apparatus according to the present embodiment. The ID is added to the output and output to the input / output control unit 8.

As described above, for the input / output control unit 8,
Some output is performed from all the unit controllers 7a to 7c. From the time point (time T1), the input / output control unit 8 starts execution of the setting process 114 for setting a new set value according to the setting request 105 in the process control unit 1a. The input / output control unit 8 sets a new setting value according to the setting request 107 to the process control unit 1c from the time when the setting process 114 ends (time T2).
Start running.

The input / output control unit 8 includes unit control units 7a to 7a to
7c, the number of inputs of the setting value change requests 105 and 107 and the setting non-change notification 106 are counted, and the count numbers are stored in the storage unit 2 in the process control units 1a to 1a.
When it is detected that the number c has reached the number c, the setting process 105 to the process control units 1 a to 1 c
It resumes from the point when the output of 107 is completed. (The polling of the actual flow rate acquisition is restarted.) Specifically, the input / output control unit 5 sets the execution of the measurement value acquisition process 116 from the process control unit 1c postponed by the interruption instruction 101 to the setting process 115. It starts from the end point (time T3).

The input / output control unit 8 executes a measurement value acquisition process 117 for acquiring a measurement value from the process control unit 1a after executing the measurement value acquisition process 116 from the process control unit 1c. After the execution of step 117, a measurement value acquisition process 118 for acquiring measurement values from the process control unit 1b is executed. With this configuration, it is possible to prevent the process of taking in the measured value from the process control unit from interrupting during the setting process of setting the set value in each of the process control units 1a to 1c. Can be minimized, the setting process can be performed at an accurate timing, and the setting process can be performed in real time.

In this embodiment, a specific example of the semiconductor manufacturing apparatus has been described as, for example, a dry etching apparatus. However, the semiconductor manufacturing apparatus of the present embodiment is not limited to the dry etching apparatus. The same effect can be obtained even when a semiconductor manufacturing apparatus for manufacturing a semiconductor other than a dry etching apparatus such as a semiconductor device and a doping apparatus is used.

[0034]

As described above, according to the method of controlling a semiconductor manufacturing apparatus of the present invention, a semiconductor device is manufactured by outputting a set value from a unit control means to a plurality of process control means via an input / output control means. Controlling the physical quantity of the controlled object to this set value and controlling the output of the measured value of the physical quantity measured by the plurality of process control means to the unit control means via the input / output control means to manufacture a semiconductor. Upon receiving the input processing interruption request, the input / output control means interrupts the measurement value acquisition processing from the process control means, and the unit control means determines whether or not the input set value has been changed, and the change is determined. If there is, a set value change request is output, and if there is no change, a set value non-change request is output, and the set value change request is output to the corresponding process control means, and the unit control procedure is performed. When the number of change requests from the process control unit is input, the input / output control unit restarts the measurement value acquisition process, thereby setting the process value in each process control unit during the setting process. It is possible to prevent interruption of the process of taking measurement values from the control unit, minimize the deviation of setting timing, perform setting processing at accurate timing, and have real-time setting processing. Can be made.

According to the semiconductor manufacturing apparatus of the present invention,
A plurality of process control means for controlling a physical quantity to be controlled for manufacturing a semiconductor to a designated set value and measuring and outputting the physical quantity; a set value designated to the process control means and a continuation of the set value Storage means for storing the time and the number of the process control means, a sequence control means for outputting a setting request for continuing the set value from the storage means for the duration thereof, and a setting request from the sequence control means being input. Unit control means for determining whether or not the set value has been changed, outputting a set value change request if the set value has been changed, and outputting a set no change request if the set value has not been changed; and the sequence control When the input processing interruption request is received from the means, the measurement value acquisition processing from the process control means is interrupted, and the set value change request is sent to the corresponding process control means. And input / output control means for resuming the measurement value acquisition process when the number of change requests from the unit control means is inputted by the number of the process control means, thereby controlling the semiconductor manufacturing apparatus of the present invention. The method can be realized.

[Brief description of the drawings]

FIG. 1 is a block diagram showing a configuration of a semiconductor manufacturing apparatus according to an embodiment of the present invention.

FIG. 2 is an explanatory diagram showing processing timing of the semiconductor manufacturing apparatus of the embodiment.

FIG. 3 is a block diagram showing a configuration of a conventional semiconductor manufacturing apparatus.

FIG. 4 is an explanatory diagram showing processing timing of a conventional semiconductor manufacturing apparatus.

[Explanation of symbols]

 6 storage unit 7a to 7c unit control unit 8 input / output control unit

Claims (3)

[Claims] 1. A set value from a unit control means is output to a plurality of process control means via an input / output control means to control a physical quantity of a controlled object for manufacturing a semiconductor to the set value. When manufacturing a semiconductor by controlling to output a measured value of a physical quantity measured by a process control means to the unit control means via the input / output control means, when an input processing interruption request is received, the input / output control means The measurement value acquisition process from the process control unit is interrupted, and the presence or absence of a change in the input set value is determined by the unit control unit.If there is a change, a set value change request is output. A set value non-change request is output, the set value change request is output to the corresponding process control means, and the change requests from the unit control means are input by the number of the process control means. When the output control unit controlling method of resuming a semiconductor manufacturing apparatus taking process the measured values. 2. A plurality of process control means for controlling a physical quantity to be controlled for manufacturing a semiconductor to a designated set value and measuring and outputting the physical quantity; a set value designated to the process control means; A storage unit for storing a duration for which the value is continued and the number of the process control units; a sequence control unit for outputting a setting request for continuing the set value from the storage unit for the duration; and Unit control means for determining whether a set value has been changed when a set request has been input, outputting a set value change request if the set value has been changed, and outputting a set no change request if the set value has not been changed Receiving an input processing interruption request from the sequence control means, interrupting the measurement value acquisition processing from the process control means, and And an input / output control unit that outputs the measured value to the process control unit and restarts the measured value acquisition process when a change request from the unit control unit is input by the number of the process control units. 3. A plurality of process control means having a mechanism for controlling a physical quantity to a commanded value and simultaneously measuring an actual physical quantity, a value to be set in the process control means, a time for continuing the set value, and Storage means for storing the number of the process control means; sequence control means for outputting a setting request so that the set value stored for the time stored in the storage means continues; and one-to-one with the process control means. Correspondingly, a setting request from the sequence control means is input to determine the presence or absence of a change in the set value. If there is a change in the set value, a request to change the set value is output. A unit control means for outputting a non-change request; and an input processing interruption request from the sequence control means before the sequence control means issues an output request to the unit control means. Interrupting the measurement value acquisition process from the process control means, outputting a set value corresponding to a set value change request from the unit control means to the process control means, and storing the process control stored in the storage means. A semiconductor manufacturing apparatus comprising: input / output control means for restarting input processing when change requests from the unit control means are input by the number of means.