JP2000233989A - Heater fitting structure for single crystal pulling-up device - Google Patents

Heater fitting structure for single crystal pulling-up device

Info

Publication number
JP2000233989A
JP2000233989A JP11032192A JP3219299A JP2000233989A JP 2000233989 A JP2000233989 A JP 2000233989A JP 11032192 A JP11032192 A JP 11032192A JP 3219299 A JP3219299 A JP 3219299A JP 2000233989 A JP2000233989 A JP 2000233989A
Authority
JP
Japan
Prior art keywords
intermediate electrode
electrode
heater
seat part
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11032192A
Other languages
Japanese (ja)
Other versions
JP3709492B2 (en
Inventor
Norimasa Naito
宣正 内藤
Koji Maeda
浩二 前田
Masayoshi Takemura
正義 竹村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Silicon Corp
Original Assignee
Mitsubishi Materials Silicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Silicon Corp filed Critical Mitsubishi Materials Silicon Corp
Priority to JP03219299A priority Critical patent/JP3709492B2/en
Publication of JP2000233989A publication Critical patent/JP2000233989A/en
Application granted granted Critical
Publication of JP3709492B2 publication Critical patent/JP3709492B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To prevent any increase in current density and any discharge from being caused between the seat part and intermediate electrode and also to prevent any damage to the seat part and intermediate electrode from being caused, even when a nut used for fastening intermediate electrode and the seat part loosens by inhibiting decrease in contact area with respect to a heater seat part and a heater intermediate electrode in contact with each other, from being caused, in a heater fitting structure for a single crystal pulling-up device. SOLUTION: In the pulling-up device, a heater 16 is placed in a chamber 13 so as to encircle a crucible for receiving semiconductor melt. As for this structure, the heater 16 is provided with a plurality of leg parts 31 each of which is formed so as to project toward a bottom wall 13a of the chamber 13, and also a seat part 41 formed at the lower end of each of the leg parts 31 so as to horizontally extend, wherein: a male screw part 24b for an intermediate electrode 24, which is formed so as to project from the upper surface of the intermediate electrode 24, is inserted into a hole of the seat part 41 through it and a nut 28 is subjected to screw fitting to the male screw part 24b; the lower end of the intermediate electrode 24 is fitted to the bottom wall 13a of the chamber 13 through a lower electrode 26 and an insulating sleeve 27; thereby the seat part 41 is electrically connected to the lower electrode 26 through the intermediate electrode 24; and further, the upper surface of the intermediate electrode 24 is brought into contact with at least such an area of the lower surface of the seat part, as to contain a point at which a center line G of the corresponding one of the leg parts 31 intersects the lower surface of the seat part 41.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、るつぼに貯留され
た半導体融液から半導体単結晶を引上げる単結晶引上げ
装置に関し、特に上記るつぼを加熱するためのヒータの
取付構造に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single crystal pulling apparatus for pulling a semiconductor single crystal from a semiconductor melt stored in a crucible, and more particularly to a heater mounting structure for heating the crucible.

【0002】[0002]

【従来の技術】従来、この種の取付構造として、チャン
バ内で半導体融液を貯留するるつぼを囲むようにヒータ
が設けられ、このヒータにグラファイト製の一対の中間
電極が接続され、更に冷却水通路を有する一対の下部電
極が上記一対の中間電極にそれぞれ結合された単結晶引
上装置におけるヒーター電極構造が開示されている(特
開平10−87393号)。この電極構造では、下部電
極が上面に凹円錐面が形成され周面に雄ねじが形成され
た大径部と、大径部の下端に連設された小径部と、小径
部内から大径部内にかけて形成され冷却水が通過可能な
冷却水通路とを有する。また中間電極は下面が上記凹円
錐面に相応する凸円錐面に形成された大径部と、大径部
の上端に連設された中径部と、中径部の上端に連設され
ヒータの脚部下端の着座部の貫通孔に挿通しかつナット
を螺合可能な小径ねじ部とを有する。更に中間電極の大
径部にはナット部材が嵌入され、このナット部材の上端
部内周には中間電極の大径部の肩部に係止可能な着座部
が設けられる。
2. Description of the Related Art Conventionally, as this type of mounting structure, a heater is provided so as to surround a crucible for storing a semiconductor melt in a chamber, and a pair of graphite intermediate electrodes is connected to the heater, and cooling water is further provided. A heater electrode structure in a single crystal pulling apparatus in which a pair of lower electrodes having passages are respectively coupled to the pair of intermediate electrodes is disclosed (Japanese Patent Laid-Open No. Hei 10-87393). In this electrode structure, the lower electrode has a large-diameter portion in which a concave conical surface is formed on the upper surface and a male screw is formed on the peripheral surface, a small-diameter portion continuously provided at the lower end of the large-diameter portion, and from the small-diameter portion to the large-diameter portion. And a cooling water passage formed and through which cooling water can pass. The intermediate electrode has a large-diameter portion whose lower surface is formed in a convex conical surface corresponding to the concave conical surface, a medium-diameter portion connected to the upper end of the large-diameter portion, and a heater connected to the upper end of the medium-diameter portion. And a small-diameter screw portion that can be inserted into a through hole of a seating portion at the lower end of the leg portion and screwed with a nut. Further, a nut member is fitted into the large-diameter portion of the intermediate electrode, and a seating portion is provided on the inner periphery of the upper end of the nut member so as to be able to be engaged with the shoulder of the large-diameter portion of the intermediate electrode.

【0003】このように構成されたヒータの取付手順を
説明する。先ず中間電極の大径部にナット部材を嵌入し
た状態で中間電極を下部電極に載せ、ナット部材を下部
電極の大径部の雄ねじに螺合する。これによりナット部
材の着座部にて中間電極の大径部が下部電極の大径部に
圧接され、凸円錐面が凹円錐面に密着して中間電極が下
部電極に結合される。次に中間電極の小径ねじ部にヒー
タの着座部の貫通孔を嵌入し、小径ねじ部の貫通孔から
上方に突出した部分にナットが螺合される。
A procedure for mounting the heater having the above-described structure will be described. First, the intermediate electrode is placed on the lower electrode in a state where the nut member is fitted into the large diameter portion of the intermediate electrode, and the nut member is screwed into the male screw of the large diameter portion of the lower electrode. As a result, the large-diameter portion of the intermediate electrode is pressed against the large-diameter portion of the lower electrode at the seating portion of the nut member, so that the convex conical surface is in close contact with the concave conical surface and the intermediate electrode is coupled to the lower electrode. Next, the through-hole of the seating portion of the heater is fitted into the small-diameter screw portion of the intermediate electrode, and the nut is screwed into a portion projecting upward from the through-hole of the small-diameter screw portion.

【0004】このように構成されたヒーター電極構造で
は、ヒータの径方向への熱膨張やヒータの振動等に起因
して、ナット部材が熱応力により破損する場合があるけ
れども、中間電極及び下部電極の結合部は損傷しない。
即ち、ナット部材が破損しても、下部電極から中間電極
への電流供給は、互いに一様に接触した接触面(凸円錐
面及び凹円錐面)を介して行われるので、局部的に電流
が集中せず、冷却水通路内の冷却水の温度が過度に上昇
することはない。この結果、冷却水通路の上部に水蒸気
による空間が発生せず、中間電極及び下部電極の結合部
は冷却水通路を通る冷却水により効率的に冷却されるの
で、上記結合部が損傷することはない。
In the heater electrode structure configured as described above, the nut member may be damaged by thermal stress due to thermal expansion of the heater in the radial direction, vibration of the heater, and the like. Joints are not damaged.
That is, even if the nut member is broken, the current supply from the lower electrode to the intermediate electrode is performed through the contact surfaces (the convex conical surface and the concave conical surface) that are in uniform contact with each other, so that the current is locally supplied. Without concentration, the temperature of the cooling water in the cooling water passage does not rise excessively. As a result, no space due to water vapor is generated in the upper part of the cooling water passage, and the joint between the intermediate electrode and the lower electrode is efficiently cooled by the cooling water passing through the cooling water passage, so that the joint is not damaged. Absent.

【0005】[0005]

【発明が解決しようとする課題】上記従来の特開平10
−87393号公報に示された単結晶引上におけるヒー
ター電極構造では、中間電極の中径部上面はヒータの着
座部下面より小さいため、着座部は中径部から張り出
し、その先端にヒータの脚部が位置する構造、即ち着座
部の張り出した先端にヒータの重量が作用する片持ち梁
構造となる。このため、熱応力に起因して中間電極の小
径ねじ部に螺合されたナットが弛むと、上記着座部の大
部分が中径部上面から浮き上がり、着座部下面と中径部
上面との接触面積が極めて小さくなって電流密度が極め
て大きくなるとともに、浮き上がった着座部と中径部と
の間で放電が発生し、これらの部材を損傷するおそれが
あった。本発明の目的は、ナットが弛んでもヒータの着
座部と中間電極との接触面積の減少を阻止することによ
り、着座部及び中間電極間の電流密度の増大及び放電の
発生を防止し、着座部及び中間電極の損傷を防止するこ
とができる、単結晶引上げ装置のヒータ取付構造を提供
することにある。
The above-mentioned conventional Japanese Patent Application Laid-Open No.
In the heater electrode structure for pulling a single crystal disclosed in JP-A-87393, the upper surface of the middle diameter portion of the intermediate electrode is smaller than the lower surface of the seating portion of the heater. The structure in which the portion is located, that is, a cantilever structure in which the weight of the heater acts on the protruding tip of the seating portion. For this reason, when the nut screwed into the small-diameter screw portion of the intermediate electrode is loosened due to thermal stress, most of the seating portion rises from the upper surface of the medium-diameter portion, and the contact between the lower surface of the seating portion and the upper surface of the medium-diameter portion is reduced. The area becomes extremely small, the current density becomes extremely large, and a discharge occurs between the raised seat portion and the middle diameter portion, which may damage these members. An object of the present invention is to prevent a decrease in the contact area between the seating portion of the heater and the intermediate electrode even when the nut is loosened, thereby preventing an increase in current density between the seating portion and the intermediate electrode and the occurrence of electric discharge. Another object of the present invention is to provide a heater mounting structure for a single crystal pulling apparatus that can prevent damage to an intermediate electrode.

【0006】[0006]

【課題を解決するための手段】請求項1に係る発明は、
図1及び図4に示すように、チャンバ13内で半導体融
液14を貯留するるつぼ12を囲むようにヒータ16が
設けられ、ヒータ16に複数の脚部31,33がチャン
バ13の底壁13aに向って突設され、脚部31,33
の下端に着座部41,43が水平方向に延びて設けら
れ、中間電極24の上面から突設された中間電極用雄ね
じ部24bが着座部41,43に挿通されてこの中間電
極用雄ねじ部24aにナット28が螺合され、中間電極
24の下端が下部電極26及び絶縁スリーブ27を介し
てチャンバ13の底壁13aに取付けられ、着座部4
1,43が中間電極24を介して下部電極26に電気的
に接続された単結晶引上げ装置のヒータ取付構造の改良
である。その特徴ある構成は、中間電極24の上面が着
座部41,43の下面のうち少なくとも脚部31,33
の中心線Gを含む部分を受けるように構成されたところ
にある。この請求項1に記載された単結晶引上げ装置の
ヒータ取付構造では、ヒータ16への通電及びその停止
を繰返すと、ヒータ16の着座部41,43や中間電極
用雄ねじ部24a等が熱膨張及び熱収縮を繰返し、熱応
力によりナット28が弛む場合がある。このとき着座部
41,43は撓まず、着座部41,43の下面と中間電
極24の上面との接触面積は減少しないので、着座部4
1,43及び中間電極24間を流れる電流密度は増大せ
ず、かつ着座部41,43と中間電極24との間で放電
が発生することもない。
The invention according to claim 1 is
As shown in FIGS. 1 and 4, a heater 16 is provided so as to surround a crucible 12 for storing a semiconductor melt 14 in a chamber 13, and a plurality of legs 31 and 33 are attached to the bottom wall 13 a of the chamber 13. And the legs 31, 33
Seats 41 and 43 are provided at the lower end of the intermediate electrode 24 so as to extend in the horizontal direction. A male screw 24b for the intermediate electrode projecting from the upper surface of the intermediate electrode 24 is inserted through the seats 41 and 43 to form the male screw 24a for the intermediate electrode. , A lower end of the intermediate electrode 24 is attached to the bottom wall 13 a of the chamber 13 via the lower electrode 26 and the insulating sleeve 27,
Reference numerals 1 and 43 denote improvements in the heater mounting structure of the single crystal pulling apparatus electrically connected to the lower electrode 26 via the intermediate electrode 24. The characteristic configuration is that the upper surface of the intermediate electrode 24 is at least the leg portions 31, 33 of the lower surfaces of the seating portions 41, 43.
Are arranged so as to receive the portion including the center line G. In the heater mounting structure of the single crystal pulling apparatus according to the present invention, when the energization and the stop of the heater 16 are repeated, the seating portions 41 and 43 of the heater 16 and the male screw portion 24a for the intermediate electrode are thermally expanded. The heat shrinkage is repeated, and the nut 28 may be loosened due to the thermal stress. At this time, the seating portions 41 and 43 do not bend, and the contact area between the lower surfaces of the seating portions 41 and 43 and the upper surface of the intermediate electrode 24 does not decrease.
The current density flowing between the first electrode 43 and the intermediate electrode 24 does not increase, and no discharge occurs between the seating portions 41 43 and the intermediate electrode 24.

【0007】請求項2に係る発明は、請求項1に係る発
明であって、更に図1に示すように、下部電極26の上
面が中間電極24の下面のうち少なくとも脚部31,3
3の中心線Gを含む部分を受け、かつ絶縁スリーブ27
の上面が下部電極26の下面のうち脚部31,33の中
心線Gを含む部分を受けるように構成されたことを特徴
とする。この請求項2に記載された単結晶引上げ装置の
ヒータ取付構造では、下部電極26及び絶縁スリーブ2
7が中間電極24を安定した状態で支持することができ
る。
The invention according to claim 2 is the invention according to claim 1, wherein the upper surface of the lower electrode 26 has at least the legs 31, 3 of the lower surface of the intermediate electrode 24, as shown in FIG.
3 and a portion including the center line G, and the insulating sleeve 27
Is configured to receive a portion of the lower surface of the lower electrode 26 that includes the center line G of the legs 31, 33. In the heater mounting structure of the single crystal pulling apparatus according to the second aspect, the lower electrode 26 and the insulating sleeve 2
7 can support the intermediate electrode 24 in a stable state.

【0008】請求項3に係る発明は、請求項1又は2に
係る発明であって、更に図6に示すように、中間電極8
4の上面が着座部41の下面全体を受け、下部電極86
の上面が中間電極84の下面全体を受け、かつ絶縁スリ
ーブ87の上面が下部電極86の下面全体を受けるよう
に構成されたことを特徴とする。この請求項3に記載さ
れた単結晶引上げ装置のヒータ取付構造では、下部電極
86及び絶縁スリーブ87が中間電極84を上記請求項
2より更に安定した状態で支持することができる。
[0008] The invention according to claim 3 is the invention according to claim 1 or 2, and further as shown in FIG.
4 receives the entire lower surface of the seating portion 41 and the lower electrode 86.
The upper surface of the lower electrode 86 receives the entire lower surface of the intermediate electrode 84 and the upper surface of the insulating sleeve 87 receives the entire lower surface of the lower electrode 86. In the heater mounting structure of the single crystal pulling apparatus according to the third aspect, the lower electrode 86 and the insulating sleeve 87 can support the intermediate electrode 84 in a more stable state than in the second aspect.

【0009】[0009]

【発明の実施の形態】次に本発明の第1の実施の形態を
図面に基づいて説明する。図5に示すように、単結晶引
上げ装置10はシリコン単結晶11をチョクラルスキー
法(CZ法)により引上げる装置である。この装置10
は気密容器であるチャンバ13と、このチャンバ13内
に設けられシリコン融液14を貯留する石英るつぼ12
と、石英るつぼ12を囲むように設置され石英るつぼ1
2内の原料15(シリコン多結晶体)を加熱・融解して
シリコン融液14にするヒータ16とを備える。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a first embodiment of the present invention will be described with reference to the drawings. As shown in FIG. 5, a single crystal pulling apparatus 10 is an apparatus for pulling a silicon single crystal 11 by the Czochralski method (CZ method). This device 10
Is a chamber 13 which is an airtight container, and a quartz crucible 12 provided in the chamber 13 for storing a silicon melt 14.
And a quartz crucible 1 installed so as to surround the quartz crucible 12.
And a heater 16 for heating and melting the raw material 15 (silicon polycrystal) in 2 to form a silicon melt 14.

【0010】石英るつぼ12は石英により略半球状に形
成される。チャンバ13の中央下部にはシャフト19が
立設され、このシャフト19の上端には石英るつぼ12
を収容するサセプタ20が設けられる。また石英るつぼ
12はシコリン融液14の液面を常に一定レベルに保つ
ようにシャフト19を介して昇降可能に構成される。一
方、石英つぼ12の上方かつ石英るつぼ12の軸線上に
はこの軸線を中心に回転可能にかつ昇降可能に構成され
たワイヤケーブル21が吊下げられ、このワイヤケーブ
ル21の下端にはシリコン融液14に浸してシリコン単
結晶11を引上げるための種結晶22が取付けられる。
The quartz crucible 12 is formed in a substantially hemispherical shape using quartz. A shaft 19 is erected at the lower center of the chamber 13, and a quartz crucible 12 is provided at the upper end of the shaft 19.
Is provided. The quartz crucible 12 is configured to be able to move up and down via a shaft 19 so that the liquid level of the liquid melt 14 is always kept at a constant level. On the other hand, above the quartz crucible 12 and on the axis of the quartz crucible 12, a wire cable 21 rotatable around the axis and vertically movable is hung. A seed crystal 22 for pulling the silicon single crystal 11 by immersion in 14 is attached.

【0011】ヒータ16は図3及び図4に示すように、
略円筒状に形成されたヒータ本体23と、このヒータ本
体23の下端に等間隔に突設された4本の第1〜第4脚
部31〜34と、これらの脚部31〜34の下端に水平
方向にそれぞれ延びて設けられた4つの第1〜第4着座
部41〜44とを有する。ヒータ本体23には上縁及び
下縁から交互に切り込んで下方及び上方にそれぞれ延び
る複数のスリット23aが形成され、第1〜第4着座部
41〜44はヒータ本体23の半径方向内向きに突設さ
れる。また第1〜第4着座部41〜44には通孔41a
〜44aがそれぞれ形成される。この実施の形態では互
いに対向する第1着座部41と第3着座部43とに直流
電圧が印加され、これにより図3の実線矢印で示すよう
に電流が流れるように構成される。第1着座部41と第
3着座部43のチャンバ13の底壁13aへの取付構造
は同一であるので、代表して第1着座部41の取付構造
を示し、第3着座部43の取付構造は省略する。なお、
第2及び第4着座部42,44は図示しないが電気絶縁
部材を介してチャンバ13の底壁13aに取付けられ
る。
The heater 16 is, as shown in FIGS.
A heater body 23 formed in a substantially cylindrical shape, four first to fourth legs 31 to 34 projecting from the lower end of the heater body 23 at equal intervals, and lower ends of these legs 31 to 34 And four first to fourth seating portions 41 to 44 provided to extend in the horizontal direction, respectively. The heater main body 23 is formed with a plurality of slits 23a that are alternately cut from the upper edge and the lower edge and extend downward and upward, respectively. The first to fourth seating portions 41 to 44 project inward in the radial direction of the heater main body 23. Is established. The first to fourth seats 41 to 44 have through holes 41a.
To 44a are respectively formed. In this embodiment, a DC voltage is applied to the first seating portion 41 and the third seating portion 43 which are opposed to each other, so that a current flows as indicated by a solid arrow in FIG. Since the mounting structure of the first seat portion 41 and the third seat portion 43 to the bottom wall 13a of the chamber 13 is the same, the mounting structure of the first seat portion 41 is shown as a representative, and the mounting structure of the third seat portion 43 is shown. Is omitted. In addition,
The second and fourth seats 42, 44 are attached to the bottom wall 13a of the chamber 13 via an electrically insulating member (not shown).

【0012】第1着座部41は図1及び図2に示すよう
に、中間電極24,下部電極26及び絶縁スリーブ27
を介してチャンバ13の底壁13aに取付けられる。中
間電極24は導電率が比較的高く、耐熱性に優れ、かつ
結晶汚染のおそれが少ないグラファイトにより円柱状に
形成される。中間電極24の下面中央には孔中心線が中
間電極24の軸線に一致するねじ孔24aが形成され、
中間電極24の上面中央には中間電極用雄ねじ部24b
が上方に向って突設される。この中間電極用雄ねじ部2
4bに第1着座部41の通孔41aを嵌入したときに、
中間電極24の上面が第1着座部41の下面のうち少な
くとも第1脚部31の中心線G(第1脚部31の重心を
通る鉛直線)を含む部分を受けるように構成される。ま
た中間電極用雄ねじ部24bにはナット28が螺合可能
に構成される。
As shown in FIGS. 1 and 2, the first seating portion 41 includes an intermediate electrode 24, a lower electrode 26, and an insulating sleeve 27.
Is attached to the bottom wall 13a of the chamber 13 through the hole. The intermediate electrode 24 is formed in a columnar shape from graphite having relatively high conductivity, excellent heat resistance, and less likely to cause crystal contamination. At the center of the lower surface of the intermediate electrode 24, a screw hole 24a whose center line coincides with the axis of the intermediate electrode 24 is formed.
In the center of the upper surface of the intermediate electrode 24, a male screw portion 24b for the intermediate electrode
Are protruded upward. Male thread 2 for this intermediate electrode
When the through hole 41a of the first seat portion 41 is fitted into 4b,
The upper surface of the intermediate electrode 24 is configured to receive a portion of the lower surface of the first seating portion 41 that includes at least the center line G of the first leg 31 (a vertical line passing through the center of gravity of the first leg 31). A nut 28 is configured to be screwed into the male screw portion 24b for the intermediate electrode.

【0013】下部電極26は導電率が比較的高い銅,銅
合金,ステンレス鋼等により形成され、円板状に形成さ
れた大径部26aと、この大径部26aの下面中央に下
方に向って突設された小径部26bと、大径部26aの
上面中央に上方に向って突設された下部電極用雄ねじ部
26cとを有する。下部電極用雄ねじ部26cには中間
電極24のねじ孔24aを螺合可能に構成される。また
下部電極26内には小径部26b及び大径部26aを通
って下部電極用雄ねじ部26cの上端近傍まで達する冷
却水通路26dが形成され、この冷却水通路26dには
冷却水が通るように構成される。
The lower electrode 26 is formed of copper, copper alloy, stainless steel, or the like having a relatively high conductivity, and has a large-diameter portion 26a formed in a disc shape and a downwardly directed center of the lower surface of the large-diameter portion 26a. And a lower electrode male screw portion 26c projecting upward at the center of the upper surface of the large diameter portion 26a. The screw hole 24a of the intermediate electrode 24 can be screwed into the male screw portion 26c for the lower electrode. Further, a cooling water passage 26d is formed in the lower electrode 26 through the small diameter portion 26b and the large diameter portion 26a and reaches near the upper end of the male screw portion 26c for the lower electrode. Be composed.

【0014】絶縁スリーブ27は電気絶縁材料により形
成され、フランジ部27aと、このフランジ部27aの
下面に下方に向って突設された筒部27bとを有する。
筒部27bはチャンバ13の底壁13aに形成された透
孔13bに挿通可能に構成され、絶縁スリーブ27には
下部電極26の小径部26bが挿通可能に構成される。
また下部電極26の大径部26aの上面は中間電極24
の下面のうち少なくとも第1脚部31の中心線Gを含む
部分を受け、かつ絶縁スリーブ27のフランジ部27a
の上面は下部電極26の大径部26aの下面のうち少な
くとも第1脚部31の中心線Gを含む部分を受けるよう
に構成される。この実施の形態では、大径部26aの外
径は中間電極24の外径と同一に形成され、フランジ部
27aの外径は大径部26aの外径と同一に形成され
る。即ち、大径部26aの上面は中間電極24の下面全
体を受け、かつフランジ部27aの上面は大径部26a
の下面全体を受けるように構成される。なお、中間電極
24の外周面及び大径部26a又は小径部26bの外周
面には図示しないがスパナ掛け部をそれぞれ形成するこ
とが好ましい。
The insulating sleeve 27 is formed of an electrically insulating material, and has a flange portion 27a and a cylindrical portion 27b projecting downward from the lower surface of the flange portion 27a.
The cylindrical portion 27b is configured to be able to be inserted into a through hole 13b formed in the bottom wall 13a of the chamber 13, and the insulating sleeve 27 is configured so that the small diameter portion 26b of the lower electrode 26 can be inserted.
The upper surface of the large diameter portion 26a of the lower electrode 26 is
Receiving at least a portion of the lower surface of the first leg portion 31 including the center line G, and a flange portion 27a of the insulating sleeve 27.
Is configured to receive at least a portion of the lower surface of the large-diameter portion 26a of the lower electrode 26 that includes the center line G of the first leg 31. In this embodiment, the outer diameter of the large diameter portion 26a is formed to be the same as the outer diameter of the intermediate electrode 24, and the outer diameter of the flange portion 27a is formed to be the same as the outer diameter of the large diameter portion 26a. That is, the upper surface of the large diameter portion 26a receives the entire lower surface of the intermediate electrode 24, and the upper surface of the flange portion 27a is
Is configured to receive the entire lower surface. Although not shown, it is preferable to form a wrench on the outer peripheral surface of the intermediate electrode 24 and the outer peripheral surface of the large diameter portion 26a or the small diameter portion 26b.

【0015】このように構成されたヒータの取付手順を
図1に基づいて説明する。予めチャンバ13の底壁13
aの透孔13bに絶縁スリーブ27の筒部27bを挿通
しておく。先ず下部電極26の下部電極用雄ねじ部26
cに中間電極24のねじ孔24aを螺合し、この状態で
下部電極26の小径部26bを絶縁スリーブ27に挿通
する。次に中間電極24の中間電極用雄ねじ部24bに
ヒータ16の第1着座部41の通孔41aを嵌入し、通
孔41aから上方に突出した中間電極用雄ねじ部24b
にナット28を螺合する。これにより第1着座部41が
中間電極24,下部電極26及び絶縁スリーブ27を介
してチャンバ13の底壁13aに取付けられるので、第
1着座部41が中間電極24を介して下部電極26に電
気的に接続されるとともに、下部電極26が絶縁スリー
ブ27によりチャンバ13の底壁13aと電気的に絶縁
される。
The procedure for mounting the heater thus constructed will be described with reference to FIG. The bottom wall 13 of the chamber 13
The cylindrical portion 27b of the insulating sleeve 27 is inserted through the through hole 13b of a. First, a lower electrode male screw portion 26 of the lower electrode 26
The screw hole 24a of the intermediate electrode 24 is screwed into c, and the small diameter portion 26b of the lower electrode 26 is inserted through the insulating sleeve 27 in this state. Next, the through hole 41a of the first seating portion 41 of the heater 16 is fitted into the intermediate electrode male screw portion 24b of the intermediate electrode 24, and the intermediate electrode male screw portion 24b projecting upward from the through hole 41a.
Screw 28. As a result, the first seating portion 41 is attached to the bottom wall 13a of the chamber 13 via the intermediate electrode 24, the lower electrode 26, and the insulating sleeve 27, so that the first seating portion 41 is electrically connected to the lower electrode 26 via the intermediate electrode 24. And the lower electrode 26 is electrically insulated from the bottom wall 13 a of the chamber 13 by the insulating sleeve 27.

【0016】このように構成されたヒータ取付構造で
は、ヒータ16への通電及びその停止を繰返すと、ヒー
タ16の第1着座部41や中間電極用雄ねじ部24b等
が熱膨張及び熱収縮を繰返し、熱応力によりナット28
が弛む場合がある。しかし、中間電極24の上面がヒー
タ16の第1着座部41のうち少なくとも第1脚部31
の中心線Gを含む部分を受けるので、第1着座部41は
撓まず、第1着座部41の下面と中間電極24の上面と
の接触面積は減少しない。この結果、第1着座部41か
ら中間電極24に流れる電流密度は増大せず、かつ第1
着座部41と中間電極24との間で放電が発生すること
もないので、第1着座部41及び中間電極24が損傷す
ることはない。また下部電極26の大径部26a及び絶
縁スリーブ27のフランジ部27aが中間電極24と同
一外径を有するので、大径部26a及びフランジ部27
aが中間電極24を安定した状態で支持することができ
る。
In the heater mounting structure configured as described above, when the energization and stop of the heater 16 are repeated, the first seating portion 41 of the heater 16 and the male screw portion 24b for the intermediate electrode repeatedly undergo thermal expansion and thermal contraction. Nut 28 due to thermal stress
May loosen. However, the upper surface of the intermediate electrode 24 is at least the first leg 31 of the first seating portion 41 of the heater 16.
, The first seat portion 41 does not bend, and the contact area between the lower surface of the first seat portion 41 and the upper surface of the intermediate electrode 24 does not decrease. As a result, the current density flowing from the first seat portion 41 to the intermediate electrode 24 does not increase, and the first current
Since no discharge occurs between the seat 41 and the intermediate electrode 24, the first seat 41 and the intermediate electrode 24 are not damaged. Since the large diameter portion 26a of the lower electrode 26 and the flange portion 27a of the insulating sleeve 27 have the same outer diameter as the intermediate electrode 24, the large diameter portion 26a and the flange portion 27
a can support the intermediate electrode 24 in a stable state.

【0017】図6及び図7は本発明の第2の実施の形態
を示す。図6及び図7において図1及び図2と同一符号
は同一部品を示す。この実施の形態では、中間電極84
の上面が第1着座部41の下面全体を受け、下部電極8
6の上面が中間電極84の下面全体を受け、絶縁スリー
ブ87の上面が下部電極86の下面全体を受け、更に中
間電極用雄ねじ部24bがねじ孔24aとともに中間電
極84の軸線に一致するように構成される。即ち、中間
電極84,下部電極86の大径部86a及び絶縁スリー
ブ27のフランジ部27aの外径は第1の実施の形態の
中間電極,下部電極の大径部及び絶縁スリーブのフラン
ジ部の外径より大きく形成される。また上記大径部86
a及びフランジ部87aの外径は中間電極84の外径と
同一に形成される。
FIGS. 6 and 7 show a second embodiment of the present invention. 6 and 7, the same reference numerals as those in FIGS. 1 and 2 indicate the same parts. In this embodiment, the intermediate electrode 84
Receives the entire lower surface of the first seating portion 41 and the lower electrode 8
6, the upper surface of the intermediate electrode 84 receives the entire lower surface of the intermediate electrode 84, the upper surface of the insulating sleeve 87 receives the entire lower surface of the lower electrode 86, and the intermediate electrode male screw portion 24b coincides with the axis of the intermediate electrode 84 together with the screw hole 24a. Be composed. That is, the outer diameters of the large-diameter portion 86a of the intermediate electrode 84, the lower electrode 86, and the flange portion 27a of the insulating sleeve 27 are outside the large-diameter portion of the first embodiment, the large-diameter portion of the lower electrode, and the flange portion of the insulating sleeve. It is formed larger than the diameter. The large diameter portion 86
a and the outer diameter of the flange portion 87 a are formed to be the same as the outer diameter of the intermediate electrode 84.

【0018】このように構成されたヒータ取付構造で
は、中間電極84の上面が第1着座部41の下面全体を
受けるので、第1の実施の形態より更に安定した状態で
支持することができ、ナット28が弛んでも第1着座部
41は全く撓まない。また中間電極84及び下部電極8
6の大径部86aの外径を第1の実施の形態より大きく
したので、第1着座部41下面及び中間電極84上面の
接触面積のみならず、中間電極84上面及び大径部86
a上面の接触面積も第1の実施の形態より大きくなり、
第1着座部41から中間電極84を介して大径部86a
に流れる電流密度が第1の実施の形態より低下する。こ
の結果、第1着座部41と中間電極84との間で放電が
発生することはなく、第1着座部41及び中間電極84
が損傷することはない。上記以外のヒータの取付手順及
びヒータ取付構造の動作は第1の実施の形態と略同様で
あるので、繰返しの説明を省略する。
In the heater mounting structure configured as described above, since the upper surface of the intermediate electrode 84 receives the entire lower surface of the first seating portion 41, the heater can be supported in a more stable state than in the first embodiment. Even if the nut 28 is loosened, the first seat portion 41 is not bent at all. Further, the intermediate electrode 84 and the lower electrode 8
6, the outer diameter of the large diameter portion 86a is larger than that of the first embodiment, so that not only the contact area between the lower surface of the first seating portion 41 and the upper surface of the intermediate electrode 84, but also the upper surface of the intermediate electrode 84 and the large diameter portion 86
a The contact area of the upper surface is also larger than that of the first embodiment,
Large diameter portion 86a from first seating portion 41 via intermediate electrode 84
Of the current flowing through the first embodiment is lower than that of the first embodiment. As a result, no discharge is generated between the first seating portion 41 and the intermediate electrode 84, and the first seating portion 41 and the intermediate electrode 84 are not discharged.
Will not be damaged. Except for the above, the procedure for mounting the heater and the operation of the heater mounting structure are substantially the same as those in the first embodiment, and therefore, the description thereof will not be repeated.

【0019】なお、上記第1及び第2の実施の形態で
は、半導体単結晶としてシリコン単結晶を挙げたが、ガ
リウムヒ素単結晶又はその他の半導体単結晶でもよい。
また、上記第1及び第2の実施の形態では、単結晶引上
げ装置としてCZ法による引上げ装置を挙げたが、融液
に磁界を印加して融液の対流を抑制する連続チャージ型
磁界印加チョクラルスキー法(CMCZ法)による引上
げ装置,磁界印加を行わない連続チャージ型チョクラル
スキー法(CCZ法)による引上げ装置或いはその他の
引上げ装置でもよい。また、上記第1及び第2の実施の
形態では、第1〜第4着座部をヒータ本体の半径方向内
向きに突設したが、第1〜第4着座部をヒータ本体の半
径方向外向きに突設してもよい。また、上記第1及び第
2の実施の形態では、ヒータ本体の下端に4本の脚部を
突設したが、2本,3本又は5本以上の脚部を突設して
もよい。更に、上記第1及び第2の実施の形態では、中
間電極を円柱状に形成し、下部電極の大径部を円板状に
形成したが、中間電極を多角柱状に形成し、下部電極の
大径部を多角板状に形成してもよい。この場合、中間電
極及び大径部の外周面にスパナ掛け部を形成する必要が
なくなる。
In the first and second embodiments, a silicon single crystal is used as a semiconductor single crystal, but a gallium arsenide single crystal or another semiconductor single crystal may be used.
In the first and second embodiments, the pulling apparatus using the CZ method is described as the single crystal pulling apparatus. However, a continuous charge type magnetic field application choke that applies a magnetic field to the melt to suppress convection of the melt. A pulling device by the Ralski method (CMCZ method), a pulling device by a continuous charge type Czochralski method (CCZ method) without applying a magnetic field, or another pulling device may be used. Further, in the first and second embodiments, the first to fourth seats are provided to project inward in the radial direction of the heater main body. However, the first to fourth seats are directed outward in the radial direction of the heater main body. May be protruded. In the first and second embodiments, four legs are protruded from the lower end of the heater main body. However, two, three, five or more legs may be protruded. Further, in the first and second embodiments, the intermediate electrode is formed in a columnar shape, and the large-diameter portion of the lower electrode is formed in a disk shape. However, the intermediate electrode is formed in a polygonal column shape, and the lower electrode is formed. The large diameter portion may be formed in a polygonal plate shape. In this case, it is not necessary to form a spanner hook on the outer peripheral surface of the intermediate electrode and the large diameter portion.

【0020】[0020]

【発明の効果】以上述べたように、本発明によれば、中
間電極の上面に突設された中間電極用雄ねじ部をヒータ
の着座部に挿通してこの中間電極用雄ねじ部にナットを
螺合し、中間電極の下端を下部電極及び絶縁スリーブを
介してチャンバの底壁に取付け、着座部を中間電極を介
して下部電極に電気的に接続し、更に中間電極の上面が
着座部の下面のうち少なくとも脚部の中心線を含む部分
を受けるように構成したので、熱応力によりナットが弛
んでも着座部は撓まず、着座部の下面と中間電極の上面
との接触面積は減少しない。この結果、着座部及び中間
電極間を流れる電流密度は増大せず、かつ着座部と中間
電極との間で放電が発生しないので、着座部及び中間電
極の損傷を防止することができる。
As described above, according to the present invention, the male screw portion for the intermediate electrode projecting from the upper surface of the intermediate electrode is inserted into the seat of the heater, and the nut is screwed into the male screw portion for the intermediate electrode. The lower end of the intermediate electrode is attached to the bottom wall of the chamber via the lower electrode and the insulating sleeve, the seat is electrically connected to the lower electrode via the intermediate electrode, and the upper surface of the intermediate electrode is the lower surface of the seat. Is configured to receive at least a portion including the center line of the leg, the seat does not bend even if the nut is loosened due to thermal stress, and the contact area between the lower surface of the seat and the upper surface of the intermediate electrode does not decrease. As a result, the current density flowing between the seating portion and the intermediate electrode does not increase, and no discharge occurs between the seating portion and the intermediate electrode, so that the seating portion and the intermediate electrode can be prevented from being damaged.

【0021】また下部電極の上面が中間電極の下面のう
ち少なくとも脚部の中心線を含む部分を受け、かつ絶縁
スリーブの上面が下部電極の下面のうち脚部の中心線を
含む部分を受けるように構成すれば、下部電極及び絶縁
スリーブが中間電極を安定した状態で支持することがで
きる。更に中間電極の上面が着座部の下面全体を受け、
下部電極の上面が中間電極の下面全体を受け、かつ絶縁
スリーブの上面が下部電極の下面全体を受けるように構
成すれば、下部電極及び絶縁スリーブが中間電極を上記
より更に安定した状態で支持することができる。
The upper surface of the lower electrode receives at least a portion of the lower surface of the intermediate electrode that includes the center line of the leg, and the upper surface of the insulating sleeve receives the portion of the lower surface of the lower electrode that includes the center line of the leg. With this configuration, the lower electrode and the insulating sleeve can support the intermediate electrode in a stable state. Furthermore, the upper surface of the intermediate electrode receives the entire lower surface of the seat,
If the upper surface of the lower electrode receives the entire lower surface of the intermediate electrode and the upper surface of the insulating sleeve receives the entire lower surface of the lower electrode, the lower electrode and the insulating sleeve support the intermediate electrode in a more stable state than described above. be able to.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明第1実施形態の中間電極及び下部電極を
含む図3のA部拡大断面図。
FIG. 1 is an enlarged sectional view of a portion A in FIG. 3 including an intermediate electrode and a lower electrode according to a first embodiment of the present invention.

【図2】図1のB−B線断面図。FIG. 2 is a sectional view taken along line BB of FIG. 1;

【図3】そのヒータの側面図。FIG. 3 is a side view of the heater.

【図4】そのヒータの平面図。FIG. 4 is a plan view of the heater.

【図5】そのヒータを含む単結晶引上げ装置の要部断面
図。
FIG. 5 is a sectional view of a main part of a single crystal pulling apparatus including the heater.

【図6】本発明の第2実施形態を示す図1に対応する断
面図。
FIG. 6 is a sectional view showing a second embodiment of the present invention and corresponding to FIG. 1;

【図7】図6のC−C線断面図。FIG. 7 is a sectional view taken along line CC of FIG. 6;

【符号の説明】[Explanation of symbols]

10 単結晶引上げ装置 12 石英るつぼ(るつぼ) 13 チャンバ 13a 底壁 14 シリコン融液(半導体融液) 16 ヒータ 24,84 中間電極 24b 中間電極用雄ねじ部 26,86 下部電極 27,87 絶縁スリーブ 28 ナット 31 第1脚部 33 第3脚部 41 第1着座部 43 第3着座部 G 第1脚部の中心線 DESCRIPTION OF SYMBOLS 10 Single crystal pulling apparatus 12 Quartz crucible (crucible) 13 Chamber 13a Bottom wall 14 Silicon melt (semiconductor melt) 16 Heater 24,84 Intermediate electrode 24b Male screw part for intermediate electrode 26,86 Lower electrode 27,87 Insulation sleeve 28 Nut 31 first leg portion 33 third leg portion 41 first seat portion 43 third seat portion G center line of first leg portion

───────────────────────────────────────────────────── フロントページの続き (72)発明者 竹村 正義 東京都千代田区大手町1丁目5番1号 三 菱マテリアルシリコン株式会社内 Fターム(参考) 4G077 AA02 BA04 BE46 CF10 EG18 EJ02 PE27  ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Masayoshi Takemura 1-5-1, Otemachi, Chiyoda-ku, Tokyo F-term in Mitsubishi Materials Silicon Co., Ltd. 4G077 AA02 BA04 BE46 CF10 EG18 EJ02 PE27

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 チャンバ(13)内で半導体融液(14)を貯留
するるつぼ(12)を囲むようにヒータ(16)が設けられ、前
記ヒータ(16)に複数の脚部(31,33)が前記チャンバ(13)
の底壁(13a)に向って突設され、前記脚部(31,33)の下端
に着座部(41,43)が水平方向に延びて設けられ、中間電
極(24)の上面から突設された中間電極用雄ねじ部(24b)
が前記着座部(41,43)に挿通されてこの中間電極用雄ね
じ部(24b)にナット(28)が螺合され、前記中間電極(24)
の下端が下部電極(26)及び絶縁スリーブ(27)を介して前
記チャンバ(13)の底壁(13a)に取付けられ、前記着座部
(41,43)が前記中間電極(24)を介して前記下部電極(26)
に電気的に接続された単結晶引上げ装置のヒータ取付構
造において、 前記中間電極(24)の上面が前記着座部(41,43)の下面の
うち少なくとも前記脚部(31,33)の中心線(G)を含む部分
を受けるように構成されたことを特徴とする単結晶引上
げ装置のヒータ取付構造。
A heater (16) is provided so as to surround a crucible (12) for storing a semiconductor melt (14) in a chamber (13), and the heater (16) has a plurality of legs (31, 33). ) Is the chamber (13)
The seats (41, 43) are provided at the lower ends of the legs (31, 33) so as to extend in the horizontal direction, and project from the upper surface of the intermediate electrode (24). Male thread for intermediate electrode (24b)
Is inserted through the seating portion (41, 43), a nut (28) is screwed into the male screw portion (24b) for the intermediate electrode, and the intermediate electrode (24)
Is attached to the bottom wall (13a) of the chamber (13) via a lower electrode (26) and an insulating sleeve (27).
(41, 43) is the lower electrode (26) via the intermediate electrode (24)
In the heater mounting structure of the single crystal pulling device electrically connected to, the upper surface of the intermediate electrode (24) is at least the center line of the leg (31, 33) of the lower surface of the seat (41, 43). A heater mounting structure for a single crystal pulling apparatus configured to receive a portion including (G).
【請求項2】 下部電極(26)の上面が中間電極(24)の下
面のうち少なくとも脚部(31,33)の中心線(G)を含む部分
を受け、かつ絶縁スリーブ(27)の上面が前記下部電極(2
6)の下面のうち前記脚部(31,33)の中心線(G)を含む部分
を受けるように構成された請求項1記載の単結晶引上げ
装置のヒータ取付構造。
2. The upper surface of the lower electrode (26) receives at least a portion of the lower surface of the intermediate electrode (24) including the center line (G) of the leg (31, 33), and the upper surface of the insulating sleeve (27). Is the lower electrode (2
The heater mounting structure for a single crystal pulling apparatus according to claim 1, wherein the lower surface of (6) is configured to receive a portion including a center line (G) of the leg portion (31, 33).
【請求項3】 中間電極(84)の上面が着座部(41)の下面
全体を受け、下部電極(86)の上面が前記中間電極(84)の
下面全体を受け、かつ絶縁スリーブ(87)の上面が前記下
部電極(86)の下面全体を受けるように構成された請求項
1又は2記載の単結晶引上げ装置のヒータ取付構造。
3. The upper surface of the intermediate electrode (84) receives the entire lower surface of the seat (41), the upper surface of the lower electrode (86) receives the entire lower surface of the intermediate electrode (84), and the insulating sleeve (87). 3. A heater mounting structure for a single crystal pulling apparatus according to claim 1, wherein an upper surface of the heater is configured to receive an entire lower surface of the lower electrode.
JP03219299A 1999-02-10 1999-02-10 Heater mounting structure of single crystal pulling device Expired - Lifetime JP3709492B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005179099A (en) * 2003-12-17 2005-07-07 Komatsu Electronic Metals Co Ltd Heater device for producing single crystal semiconductor
JP2009198162A (en) * 2008-02-21 2009-09-03 Green Energy Technology Inc Electrode anchoring structure in crystal-growing furnace
KR101064963B1 (en) 2009-11-23 2011-09-15 (주)에스테크 Electrode fixing structure for ingot growing apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103160919B (en) * 2013-03-09 2016-01-27 青海铸玛蓝宝石晶体有限公司 Heating electrode in a kind of kyropoulos production unit of sapphire crystal

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005179099A (en) * 2003-12-17 2005-07-07 Komatsu Electronic Metals Co Ltd Heater device for producing single crystal semiconductor
JP4497913B2 (en) * 2003-12-17 2010-07-07 Sumco Techxiv株式会社 Heater device for single crystal semiconductor manufacturing
JP2009198162A (en) * 2008-02-21 2009-09-03 Green Energy Technology Inc Electrode anchoring structure in crystal-growing furnace
KR101064963B1 (en) 2009-11-23 2011-09-15 (주)에스테크 Electrode fixing structure for ingot growing apparatus

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