JP2504550Y2 - Single crystal pulling device - Google Patents

Single crystal pulling device

Info

Publication number
JP2504550Y2
JP2504550Y2 JP11280491U JP11280491U JP2504550Y2 JP 2504550 Y2 JP2504550 Y2 JP 2504550Y2 JP 11280491 U JP11280491 U JP 11280491U JP 11280491 U JP11280491 U JP 11280491U JP 2504550 Y2 JP2504550 Y2 JP 2504550Y2
Authority
JP
Japan
Prior art keywords
crucible
pulling
single crystal
pedestal
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11280491U
Other languages
Japanese (ja)
Other versions
JPH0556963U (en
Inventor
黒坂昇栄
新倉啓史
今井正人
Original Assignee
コマツ電子金属株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コマツ電子金属株式会社 filed Critical コマツ電子金属株式会社
Priority to JP11280491U priority Critical patent/JP2504550Y2/en
Publication of JPH0556963U publication Critical patent/JPH0556963U/en
Application granted granted Critical
Publication of JP2504550Y2 publication Critical patent/JP2504550Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】本考案は、引上げ法とくにチョク
ラルスキー法(以下CZ法という)による単結晶の製造
装置においてるつぼを支えてこれを上下動させるペデス
タルの任意高さに、原料融液落下に備えた受皿を設けた
ものに関する。
BACKGROUND OF THE INVENTION The present invention relates to a raw material melt at an arbitrary height of a pedestal for supporting a crucible and moving it up and down in an apparatus for producing a single crystal by a pulling method, especially the Czochralski method (hereinafter referred to as CZ method). The present invention relates to a device provided with a saucer for falling.

【0002】[0002]

【従来の技術】近年、半導体デバイスの始発材料となる
半導体ウエハに対して、集積回路製作上の面積効率の点
からますます直径の大きなものが要求されつつある。通
常、半導体ウエハは引上げ法によって育成した単結晶イ
ンゴットから切り出されるが、太径の単結晶製造のため
には、当然原料をるつぼ内に大量にチャージしなければ
ならない。したがって、これを加熱溶解するためのヒー
タパワーや、引上げに要する時間等はますます増大して
きている。引上げ装置の炉内部品はそれだけ長時間、過
酷な熱的雰囲気に曝され、とりわけ原料融液を保持する
石英るつぼに受けるダメージは大きい。その結果、変形
が生じたり、偏心による融液面振動が発生したり、ある
いはるつぼ上端部が中心に向かって倒れ、付着していた
アモルファス等が融液中に落下して単結晶化を阻害した
りする。とくに、製造工程後半ではるつぼが上昇してお
り、ヒータとの距離が大きくなっていること、融液量が
減少して石英るつぼの放熱面積が増加していることなど
から、成長温度を維持するためにヒータパワーを増大さ
せるが、これは石英るつぼの前記のような劣化に一層の
拍車をかけることになる。石英るつぼは、従来より1回
こどに交換しなければならない程劣化が激しく、したが
って上記のような過酷な状況下にあると引上げ途中でも
破損する確率は高くなる。石英るつぼに含まれる細かな
気泡は、1000℃以上の高温のシリコン融液との接触によ
り膨張してるつぼ破損の一原因を作り出す。石英るつぼ
に亀裂が生じたりすると、原料融液が滲みだすが、石英
るつぼを収容する黒鉛るつぼは多孔質なため、滲みだし
を留めることはできない。こうして次第に炉内部品の損
傷が進行する。
2. Description of the Related Art In recent years, semiconductor wafers, which are starting materials for semiconductor devices, are increasingly required to have a larger diameter in terms of area efficiency in manufacturing integrated circuits. Usually, a semiconductor wafer is cut out from a single crystal ingot grown by a pulling method, but naturally, a large amount of raw material must be charged in a crucible in order to manufacture a large diameter single crystal. Therefore, the heater power for heating and melting this, the time required for pulling, etc. are increasing more and more. The in-furnace parts of the pulling device are exposed to a harsh thermal atmosphere for a long time, and the quartz crucible holding the raw material melt is particularly damaged. As a result, deformation occurs, melt surface vibration occurs due to eccentricity, or the upper end of the crucible falls toward the center, and the adhering amorphous materials fall into the melt and inhibit single crystallization. Or In particular, in the latter half of the manufacturing process, the crucible is raised, the distance from the heater is increased, and the amount of melt is decreased to increase the heat dissipation area of the quartz crucible. Therefore, the growth temperature is maintained. Therefore, the heater power is increased, which further accelerates the above-described deterioration of the quartz crucible. The quartz crucible is so severely deteriorated that it must be replaced once for a child, and therefore, under the severe conditions as described above, the probability of breakage is high even during pulling. The fine air bubbles contained in the quartz crucible expand due to contact with the silicon melt at a temperature of 1000 ° C or higher, which causes the crucible to break. When the quartz crucible is cracked, the raw material melt exudes, but since the graphite crucible that accommodates the quartz crucible is porous, the exudation cannot be stopped. In this way, damage to the parts inside the furnace gradually progresses.

【0003】こうした現象と併せてまた、劣化に起因す
る振動等での融液のるつぼからの漏れにより、炉内部品
の損傷も起きる。
In addition to such a phenomenon, leakage of the melt from the crucible due to vibration or the like due to deterioration also causes damage to parts inside the furnace.

【0004】従来は、このように次第に大型化する引上
げ装置に対して、融液漏れに対する安全性の確保は必ず
しも充分ではなかった。
Conventionally, it is not always sufficient to secure the safety against melt leakage in the pulling device which is gradually increased in size.

【0005】[0005]

【考案が解決しようとする課題】本考案は、前記のよう
に大型化しつつある単結晶引上装置の融液漏れに対する
安全性を確保することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to secure safety against melt leakage of a single crystal pulling apparatus which is becoming larger in size as described above.

【0006】[0006]

【課題を解決するための手段】本考案は、原料を充填す
る石英るつぼと、石英るつぼを収容して保護する黒鉛る
つぼと、黒鉛るつぼ底部に一体的に固定して支持するる
つぼ受けと、るつぼ受けを底部から支え上下可動なペデ
スタルと、これらの周囲にあってるつぼ内の原料を加熱
溶融するヒータと、ヒータと引上げ装置本体のチャンバ
側壁間に設けられヒータからの輻射熱をしゃへいする断
熱筒と、さらにるつぼ中心上方にあって、るつぼ内の溶
融原料より先端に把持した種結晶を原料融液に浸漬して
徐々に引上げることにより単結晶を引上げる引上げ軸と
を備えた単結晶引上げ装置において、前記ペデスタルの
軸がその中心部を摺動可能に貫通する受皿と、この受皿
を底部より受け支持するストッパとをペデスタルの任意
高さに設けたことを特徴としている。
SUMMARY OF THE INVENTION The present invention is directed to a quartz crucible filled with a raw material, a graphite crucible for accommodating and protecting the quartz crucible, a crucible receiver integrally fixed and supported on the bottom of the graphite crucible, and a crucible. A pedestal that supports the receiver from the bottom and can move up and down, a heater that heats and melts the raw materials in the crucible surrounding them, and an insulating cylinder that is provided between the heater and the chamber side wall of the pulling device body to shield the radiant heat from the heater , A single crystal pulling device provided above the center of the crucible and having a pulling shaft for pulling the single crystal by immersing a seed crystal held at the tip of the molten raw material in the crucible into the raw material melt and gradually pulling it up In the above, the pedestal shaft is slidably pierced through its central portion, and a stopper for receiving and supporting the pedestal from the bottom is provided at an arbitrary height of the pedestal. It is characterized.

【0007】[0007]

【作用】すなわち、本考案を図面を用いて説明すれば、
図1に示すように、CZ単結晶引上装置1の石英るつぼ
2及び黒鉛るつぼ3を底部より支えるるつぼ受け4に連
接するペデスタル5の一定高さにストッパ6が設けられ
ている。さらにストッパ上方には、ペデスタル5を同心
的にとり囲む、受皿7が、ペデスタルに対して摺動可能
に取り付けられている。単結晶8の引上げ初期は、るつ
ぼは下降しており図3の状態にある。したがって、受皿
7は、引上装置のチャンバ底部にある融液受け12の上
に載置された状態になっている。引上げが進み次第にる
つぼが上昇してくるとやがてストッパ6が、受皿7を押
し上げるつぼの上昇にともなって受皿も一定距離を保っ
て上昇する。もし受皿がペデスタルに固定されている
と、引き上げ初期に要求されるるつぼの下降位置が確保
されず不具合を生ずるためこうした構成を採る。従来こ
のような空間部にヒータを取り付けたものはあるが(特
開平2−192486号参照)、るつぼ受けに接触した
構成はとり難いので一定距離を隔てて設けることになる
が、そうするとるつぼ昇降のためのストロークは限られ
てしまう。逆にるつぼから遠く隔てて設けても同様にス
トロークは限定される。受皿の高さは、ストッパを支え
るための孔を高さ方向に複数個所穿っておけば、融液の
充填量や装置状態に応じて最も適するよう設定できる。
The operation of the present invention will be described with reference to the drawings.
As shown in FIG. 1, a stopper 6 is provided at a constant height of a pedestal 5 which is connected to a crucible receiver 4 which supports a quartz crucible 2 and a graphite crucible 3 of a CZ single crystal pulling apparatus 1 from the bottom. Furthermore, above the stopper, a pan 7 concentrically surrounding the pedestal 5 is slidably attached to the pedestal. In the initial stage of pulling the single crystal 8, the crucible is descending and is in the state of FIG. Therefore, the receiving tray 7 is placed on the melt receiving tray 12 at the bottom of the chamber of the pulling apparatus. When the crucible rises as the pulling progresses, the stopper 6 eventually raises the crucible that pushes up the tray 7, and the tray also rises while maintaining a certain distance. If the tray is fixed to the pedestal, the crucible lowering position required at the initial stage of pulling up cannot be ensured, which causes a problem. Conventionally, there is a heater attached to such a space portion (see Japanese Patent Laid-Open No. 192486/1990), but it is difficult to take a structure in contact with the crucible receiver, so it is necessary to provide them at a certain distance. The stroke for this is limited. Conversely, the stroke is similarly limited even if it is provided far away from the crucible. The height of the tray can be set to be most suitable depending on the amount of melt to be filled and the state of the apparatus by forming a plurality of holes for supporting the stopper in the height direction.

【0008】なお、ストッパは図2に示したようにスト
ッパの元にねじを切り、これをペデスタルの軸に設けた
ねじ孔にねじ込むようにしておけば良い。ストッパの材
質としては、耐熱性の高いカーボンが使用できる。また
受皿は、融液を吸収しやすいようなカーボン繊維または
多孔質のカーボンを用いることができる。
As shown in FIG. 2, the stopper may be threaded at the base of the stopper and screwed into a screw hole formed in the shaft of the pedestal. As the material of the stopper, carbon having high heat resistance can be used. Further, the receiving tray may be made of carbon fiber or porous carbon that easily absorbs the melt.

【0009】[0009]

【実施例1】図1に示した本考案の一実施例である単結
晶引上装置を用いてシリコン単結晶の育成を行なった。
Example 1 A silicon single crystal was grown using the single crystal pulling apparatus shown in FIG. 1 which is an example of the present invention.

【0010】石英るつぼ8に原料シリコンを充填し、ヒ
ータ9に通電して原料シリコンを溶融した。種結晶10
を融液に浸漬して徐々に引上げ常法どおりシリコン単結
晶を育成した。得られた単結晶の物性は、従来のものと
遜色なく、受皿を設けたことによる悪影響は観察されな
かった。
The raw material silicon was filled in the quartz crucible 8 and the heater 9 was energized to melt the raw material silicon. Seed crystal 10
Was immersed in the melt and gradually pulled up to grow a silicon single crystal in the usual manner. The physical properties of the obtained single crystal were comparable to those of the conventional one, and no adverse effect due to the provision of the saucer was observed.

【0011】[0011]

【効果】本考案によれば、振動や事故による融液の漏れ
に対し受けの容量が増大するから、安全性が向上する。
さらに、受皿がペデスタルに対して摺動可能に構成さ
れ、るつぼ上昇と共にこの受皿をストッパが支え上げる
構成のため、結晶育成時に必要な充分なストロークを確
保でき、ペデスタル高さ方向にストッパ装着用の孔を複
数設ければ、受皿の設置を最適な任意高さに選ぶことが
できる。
[Effect] According to the present invention, the capacity of the receiver is increased against the leakage of the melt due to vibration or accident, so that the safety is improved.
Furthermore, the saucer is slidable with respect to the pedestal, and the stopper supports the saucer as the crucible rises, so a sufficient stroke necessary for crystal growth can be secured, and the stopper can be mounted in the pedestal height direction. If a plurality of holes are provided, the saucer can be installed at an optimum arbitrary height.

【0012】さらにまた、本考案の単結晶製造装置は、
従来装置の大掛かりな改造によらないので、適用しやす
い。
Furthermore, the single crystal production apparatus of the present invention is
It is easy to apply because it does not require extensive modification of conventional equipment.

【0013】また、この受皿内に断熱材を装填すれば、
保温効果がでるから、ヒータへの供給電力も節減され、
るつぼへの底部からの熱輻射をさえぎって保護する効果
も期待できる。
If a heat insulating material is loaded in the saucer,
Since the heat retention effect is obtained, the power supplied to the heater is also saved,
The effect of blocking the heat radiation from the bottom to the crucible and protecting it can be expected.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案の一実施例を示す単結晶製造装置の断面
図。
FIG. 1 is a sectional view of a single crystal manufacturing apparatus showing an embodiment of the present invention.

【図2】本考案の単結晶製造装置に用いられる構成部品
の一実施例の部分斜視図。
FIG. 2 is a partial perspective view of an example of components used in the single crystal production apparatus of the present invention.

【符号の説明】[Explanation of symbols]

1 引上装置 2 石英るつぼ 3 黒鉛るつぼ 4 るつぼ受け 5 ペデスタル 6 ストッパ 7 受皿 8 単結晶 9 ヒータ 10 種結晶 11 ねじ孔 12 融液受け 1 Pulling device 2 Quartz crucible 3 Graphite crucible 4 Crucible receiver 5 Pedestal 6 Stopper 7 Saucepan 8 Single crystal 9 Heater 10 Seed crystal 11 Screw hole 12 Melt receiver

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of utility model registration request] 【請求項1】原料を充填する石英るつぼと、石英るつぼ
を収容して保護する黒鉛るつぼと、黒鉛るつぼ底部に一
体的に固定して支持するるつぼ受けと、るつぼ受けを底
部から支え昇降可能なペデスタルと、これらの周囲にあ
ってるつぼ内の原料を加熱溶融するヒータと、ヒータと
引上げ装置本体のチャンバ側壁間に設けられヒータから
の輻射熱をしゃへいする断熱筒と、さらにるつぼ中心上
方にあって、るつぼ内の溶融原料より先端に把持した種
結晶を原料融液に浸漬して徐々に引上げることにより単
結晶を引上げる引上げ軸とを備えた単結晶引上げ装置に
おいて、中心部を前記ペデスタルの軸が摺動可能に貫通
する受皿と、この受皿を受けて支持するストッパとをペ
デスタルの任意高さに設けたことを特徴とする単結晶引
上げ装置。
1. A quartz crucible filled with a raw material, a graphite crucible for accommodating and protecting the quartz crucible, a crucible receiver for integrally fixing and supporting the bottom of the graphite crucible, and a crucible receiver supported from the bottom and capable of moving up and down. The pedestal, a heater that heats and melts the raw materials in the crucible around these, a heat insulation tube that is provided between the heater and the chamber side wall of the pulling device body to shield radiant heat from the heater, and further above the center of the crucible. , A single crystal pulling device having a pulling shaft for pulling a single crystal by immersing a seed crystal grasped at the tip from a molten raw material in a crucible into a raw material melt and gradually pulling it up, and a central portion of the pedestal A single crystal pulling apparatus, wherein a saucer through which a shaft slidably passes and a stopper that receives and supports the saucer are provided at an arbitrary height of a pedestal.
JP11280491U 1991-12-27 1991-12-27 Single crystal pulling device Expired - Lifetime JP2504550Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11280491U JP2504550Y2 (en) 1991-12-27 1991-12-27 Single crystal pulling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11280491U JP2504550Y2 (en) 1991-12-27 1991-12-27 Single crystal pulling device

Publications (2)

Publication Number Publication Date
JPH0556963U JPH0556963U (en) 1993-07-30
JP2504550Y2 true JP2504550Y2 (en) 1996-07-10

Family

ID=14595949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11280491U Expired - Lifetime JP2504550Y2 (en) 1991-12-27 1991-12-27 Single crystal pulling device

Country Status (1)

Country Link
JP (1) JP2504550Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9422635B2 (en) 2011-02-07 2016-08-23 Shin-Etsu Handotai Co., Ltd. Single crystal production apparatus and single crystal production method having pedestal with grooves

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5573790B2 (en) * 2011-07-13 2014-08-20 信越半導体株式会社 Single crystal growth equipment
CN108517554B (en) * 2018-06-13 2024-03-19 江苏星特亮科技有限公司 Crucible device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9422635B2 (en) 2011-02-07 2016-08-23 Shin-Etsu Handotai Co., Ltd. Single crystal production apparatus and single crystal production method having pedestal with grooves

Also Published As

Publication number Publication date
JPH0556963U (en) 1993-07-30

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