JP2000227659A5 - - Google Patents
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- Publication number
- JP2000227659A5 JP2000227659A5 JP1999030209A JP3020999A JP2000227659A5 JP 2000227659 A5 JP2000227659 A5 JP 2000227659A5 JP 1999030209 A JP1999030209 A JP 1999030209A JP 3020999 A JP3020999 A JP 3020999A JP 2000227659 A5 JP2000227659 A5 JP 2000227659A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alicyclic hydrocarbon
- hydrocarbon group
- positive photoresist
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000002723 alicyclic group Chemical group 0.000 claims 7
- 125000004432 carbon atoms Chemical group C* 0.000 claims 5
- 229920002120 photoresistant polymer Polymers 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- -1 alicyclic hydrocarbons Chemical class 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N sulfonic acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03020999A JP3912761B2 (ja) | 1999-02-08 | 1999-02-08 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
US09/456,827 US6576392B1 (en) | 1996-12-07 | 1999-12-06 | Positive photoresist composition |
KR1019990055067A KR100610165B1 (ko) | 1998-12-07 | 1999-12-06 | 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03020999A JP3912761B2 (ja) | 1999-02-08 | 1999-02-08 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000227659A JP2000227659A (ja) | 2000-08-15 |
JP2000227659A5 true JP2000227659A5 (US06780888-20040824-C00057.png) | 2005-07-07 |
JP3912761B2 JP3912761B2 (ja) | 2007-05-09 |
Family
ID=12297353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP03020999A Expired - Lifetime JP3912761B2 (ja) | 1996-12-07 | 1999-02-08 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3912761B2 (US06780888-20040824-C00057.png) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001030739A1 (fr) * | 1999-10-27 | 2001-05-03 | Daicel Chemical Industries, Ltd. | Procede de production de (meth)acrylates d'adamantyle |
JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
JP2002156750A (ja) * | 2000-11-20 | 2002-05-31 | Sumitomo Chem Co Ltd | 化学増幅型ポジ型レジスト組成物 |
JP5162293B2 (ja) * | 2008-03-21 | 2013-03-13 | 富士フイルム株式会社 | 電子線、x線又はeuv光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
JP4966796B2 (ja) * | 2007-09-21 | 2012-07-04 | 富士フイルム株式会社 | ポジ型レジスト組成物、該ポジ型レジスト組成物を用いたパターン形成方法及び該ポジ型レジスト組成物に用いられる化合物 |
TWI481961B (zh) * | 2007-08-10 | 2015-04-21 | Fujifilm Corp | 正型光阻組成物及使用該組成物之圖案形成方法 |
JP5548427B2 (ja) | 2009-10-30 | 2014-07-16 | 富士フイルム株式会社 | 組成物、レジスト膜、パターン形成方法、及びインクジェット記録方法 |
US9223208B2 (en) | 2011-12-29 | 2015-12-29 | Fujifilm Corporation | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
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1999
- 1999-02-08 JP JP03020999A patent/JP3912761B2/ja not_active Expired - Lifetime