JP2000180811A - Defective pixel correcting method for liquid crystal display panel - Google Patents
Defective pixel correcting method for liquid crystal display panelInfo
- Publication number
- JP2000180811A JP2000180811A JP37581098A JP37581098A JP2000180811A JP 2000180811 A JP2000180811 A JP 2000180811A JP 37581098 A JP37581098 A JP 37581098A JP 37581098 A JP37581098 A JP 37581098A JP 2000180811 A JP2000180811 A JP 2000180811A
- Authority
- JP
- Japan
- Prior art keywords
- defective pixel
- irradiation
- laser beam
- liquid crystal
- display panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は液晶表示パネルの
欠陥画素修正方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defective pixel correction method for a liquid crystal display panel.
【０００２】[0002]
【従来の技術】例えば、スイッチング素子として薄膜ト
ランジスタを備えたアクティブマトリクス型の液晶表示
パネルでは、薄膜トランジスタの製造欠陥等により、そ
れに対応する画素電極に駆動電圧が印加されない場合、
ノーマリホワイト方式であると、当該画素電極に対応す
る画素が常時輝点となり、画質が低下してしまう。そこ
で、従来では、このような欠陥画素を修正している。2. Description of the Related Art For example, in an active matrix type liquid crystal display panel having thin film transistors as switching elements, if a drive voltage is not applied to a pixel electrode corresponding to the thin film transistor due to a manufacturing defect of the thin film transistor.
In the normally white method, the pixel corresponding to the pixel electrode always becomes a bright spot, degrading the image quality. Therefore, conventionally, such defective pixels are corrected.
【０００３】次に、従来の欠陥画素修正方法の一例につ
いて説明するに、まず、図８（Ａ）を参照して、液晶表
示パネルの構造について簡単に説明する。この液晶表示
パネルは一対のガラス基板１、２を備えている。一方の
ガラス基板１の下面にはＩＴＯからなる画素電極３及び
薄膜トランジスタ４がマトリクス状に設けられ、その下
面には配向膜５が設けられている。他方のガラス基板２
の上面にはブラックマスク６、カラーフィルタ７、ＩＴ
Ｏからなる共通電極８及び配向膜９が設けられている。
そして、両ガラス基板１、２は図示しないシール材を介
して互いに貼り合わされ、その間には液晶１０が封入さ
れている。[0003] Next, to explain an example of a conventional defective pixel correction method, first, the structure of a liquid crystal display panel will be briefly explained with reference to FIG. 8(A). This liquid crystal display panel has a pair of glass substrates 1 and 2 . Pixel electrodes 3 made of ITO and thin film transistors 4 are provided in a matrix on the lower surface of one glass substrate 1, and an alignment film 5 is provided on the lower surface. the other glass substrate 2
Black mask 6, color filter 7, IT
A common electrode 8 made of O and an alignment film 9 are provided.
Both glass substrates 1 and 2 are attached to each other via a sealing material (not shown), and a liquid crystal 10 is enclosed between them.
【０００４】さて、この液晶表示パネルのある薄膜トラ
ンジスタ４に製造欠陥がある場合には、図８（Ｂ）にお
いて矢印で示すように、それに対応する画素電極３の部
分のほぼ中央部に第１のレーザビームを照射して、当該
画素電極３の部分における液晶１０中に気泡１１を発生
させ、次に、当該画素電極３の部分に第２のレーザビー
ムを１箇所または複数箇所照射して、当該画素電極３及
びその下の配向膜５を物理的に破壊する。これにより生
じた破壊物は気泡１１内に留められる。この後、気泡１
１は消滅する。そして、当該破壊領域における液晶１０
が常時垂直方向または水平方向に配向され、当該破壊領
域における画素が常時黒表示となる。かくして、欠陥画
素が修正される。If the thin film transistor 4 in the liquid crystal display panel has a manufacturing defect, as indicated by the arrow in FIG. A laser beam is irradiated to generate bubbles 11 in the liquid crystal 10 in the portion of the pixel electrode 3, and then the pixel electrode 3 is irradiated with a second laser beam at one or a plurality of locations to irradiate the pixel electrode 3. The pixel electrode 3 and the underlying alignment film 5 are physically destroyed. Destruction caused by this is confined within the bubble 11 . After this, bubble 1
1 disappears. Then, the liquid crystal 10 in the destruction region
are always vertically or horizontally oriented, and the pixels in the destroyed region always display black. Thus, defective pixels are corrected.
【０００５】[0005]
【発明が解決しようとする課題】ところで、従来のこの
ような欠陥画素修正方法において、第２のレーザビーム
を照射しても欠陥の程度により黒表示になりきれず輝点
として視認される場合ある。このため、第２のレーザビ
ームの照射をビーム径を小さくして連続的に照射するこ
とにより修正の精度を向上する検討がなされている。こ
の方法は、例えば、図９において矢印で示すように、欠
陥画素１２（ここでいう画素とは、１の画素電極３のう
ちブラックマスク６によって覆われていない部分によっ
て構成される画素のことをいう。）に対して、まず、欠
陥画素１２の右下隅の白丸印で示す照射開始点から左方
向に連続して照射し、次いで上側に所定のピッチずれた
位置において左側から右方向に連続して照射し、次いで
上側に所定のピッチずれた位置において右側から左方向
に連続して照射し、以下このような照射を繰り返して、
欠陥画素１２の右上隅の黒丸印で示す照射終了点におい
て照射を終了している。この欠陥画素修正方法では、欠
陥画素１２全体をほぼ満遍なく照射しているので、欠陥
画素１２の修正が十分であると思われるが、それでも十
分でなく、光漏れがやや発生することが分かった。これ
は、後で説明する実験結果から、照射ラインが不連続で
あり、特に欠陥画素１２の周辺部を十分に照射していな
いことに起因すると思われる。この発明の課題は、光漏
れをより一層減少することができるように、欠陥画素を
修正することである。By the way, in such a conventional method for repairing defective pixels, even if the second laser beam is irradiated, there are cases where black display cannot be achieved due to the degree of the defect and is visually recognized as a bright spot. . For this reason, studies have been made to improve the accuracy of repair by continuously irradiating the second laser beam with a smaller beam diameter. In this method, for example, a defective pixel 12 (here, a pixel is a pixel constituted by a portion of one pixel electrode 3 that is not covered by the black mask 6), as indicated by an arrow in FIG. ), the irradiation is continued leftward from the irradiation start point indicated by the white circle in the lower right corner of the defective pixel 12, and then continuously leftward to rightward at a position shifted upward by a predetermined pitch. and then continuously irradiate from the right side to the left at positions shifted upward by a predetermined pitch, and then repeat such irradiation,
Irradiation is terminated at the irradiation end point indicated by the black circle in the upper right corner of the defective pixel 12 . In this defective pixel repair method, since the entire defective pixel 12 is illuminated almost evenly, it is thought that the defective pixel 12 is sufficiently repaired. From the results of an experiment to be described later, this is thought to be due to the fact that the irradiation lines are discontinuous, and in particular the periphery of the defective pixel 12 is not sufficiently irradiated. An object of the present invention is to repair defective pixels so that light leakage can be reduced even further.
【０００６】[0006]
【課題を解決するための手段】この発明は、一対の基板
間に液晶が封入された液晶表示パネルの欠陥画素の部分
にレーザビームを照射して前記欠陥画素の部分を物理的
に破壊し、これにより前記欠陥画素を修正する液晶表示
パネルの欠陥画素修正方法において、前記レーザビーム
を少なくとも前記欠陥画素の周辺部に沿ってそのほぼ全
周に照射するようにしたものである。この発明によれ
ば、レーザビームを少なくとも欠陥画素の周辺部に沿っ
てそのほぼ全周に照射しているので、当該欠陥画素を常
時黒表示としたとき、光漏れをより一層減少することが
できる。According to the present invention, a defective pixel portion of a liquid crystal display panel in which liquid crystal is sealed between a pair of substrates is irradiated with a laser beam to physically destroy the defective pixel portion, Thus, in the defective pixel correction method for a liquid crystal display panel for repairing the defective pixel, the laser beam is irradiated at least along the peripheral portion of the defective pixel to substantially the entire circumference thereof. According to the present invention, since the laser beam is irradiated at least along the peripheral portion of the defective pixel to substantially the entire periphery, light leakage can be further reduced when the defective pixel is always displayed in black. .
【０００７】[0007]
【発明の実施の形態】図１〜図６はそれぞれこの発明の
液晶表示パネルの欠陥画素修正方法の第１〜第６の例に
おける第２のレーザビームの照射パターンを示したもの
である。なお、いずれの例においても、欠陥画素１２の
部分における液晶中に気泡を発生されるための第１のレ
ーザビームのビームサイズは１０〜３０μｍφ（望まし
くは２０μｍφ）とし、エネルギ密度は１０〜３０Ｊ／
ｃｍ2（望ましくは２０Ｊ／ｃｍ2）であり、欠陥画素
１２の部分における画素電極及び配向膜を物理的に破壊
するための第２のレーザビームのビームサイズは１〜４
μｍφ（望ましくは２〜３μｍφ）とし、エネルギ密度
は７０〜１００Ｊ／ｃｍ2である。また、第２のレーザ
ビームは、２０Ｈｚの矩形波とし、照射時の走査速度
は、前回の照射領域と次の照射領域とが、僅かに重複す
る程度の速度、換言すれば、照射領域が丁度連続する程
度の速度とした。1 to 6 show irradiation patterns of the second laser beam in the first to sixth examples of the defective pixel correction method of the liquid crystal display panel of the present invention, respectively. In any of the examples, the beam size of the first laser beam for generating bubbles in the liquid crystal at the defective pixel 12 is 10-30 μmφ (preferably 20 μmφ), and the energy density is 10-30 J//.
cm 2 (preferably 20 J/cm 2 ), and the beam size of the second laser beam for physically destroying the pixel electrode and alignment film in the portion of the defective pixel 12 is 1-4.
The diameter is μmφ (preferably 2 to 3 μmφ), and the energy density is 70 to 100 J/cm 2 . The second laser beam is a rectangular wave of 20 Hz, and the scanning speed at the time of irradiation is such that the previous irradiation region and the next irradiation region slightly overlap, in other words, the irradiation region is exactly the same. The speed was such that it was continuous.
【０００８】さて、図１に示す第１の例における第２の
レーザビームの照射パターンでは、まず、欠陥画素１２
の右下隅の白丸印で示す照射開始点から欠陥画素１２の
周辺部に沿って時計方向にほぼ一周連続して照射した。
この場合の照射ラインａは欠陥画素１２のエッジ部から
ｔ＝７．５μｍ離れた位置とした。次に、欠陥画素１２
の右下隅から左方向に連続して照射し、次いで上側に所
定のピッチずれた位置において左側から右方向に連続し
て照射し、次いで上側に所定のピッチずれた位置におい
て右側から左方向に連続して照射し、以下このような照
射を繰り返して、欠陥画素１２の右上隅の黒丸印で示す
照射終了点において照射を終了した。この場合のピッチ
Ｐは２０μｍとした。Now, in the irradiation pattern of the second laser beam in the first example shown in FIG.
From the irradiation start point indicated by the white circle mark in the lower right corner of , irradiation was continued clockwise along the peripheral portion of the defective pixel 12 for almost one round.
In this case, the irradiation line a was positioned at a distance of t=7.5 μm from the edge of the defective pixel 12 . Next, the defective pixel 12
Continuous irradiation from the lower right corner to the left, then continuous irradiation from the left to the right at a position shifted upward by a predetermined pitch, and then continuous irradiation from the right to the left at a position shifted upward by a predetermined pitch Then, such irradiation was repeated until the irradiation end point indicated by the black circle in the upper right corner of the defective pixel 12 was reached. The pitch P in this case was set to 20 μm.
【０００９】次に、図２に示す第２の例における第２の
レーザビームの照射パターンでは、図１に示す場合と逆
とした。すなわち、まず、欠陥画素１２の右上隅の白丸
印で示す照射開始点から左方向に連続して照射し、次い
で下側に所定のピッチずれた位置において左側から右方
向に連続して照射し、次いで下側に所定のピッチずれた
位置において右側から左方向に連続して照射し、以下こ
のような照射を繰り返して、欠陥画素１２の右下隅まで
照射した。この場合のピッチＰは２０μｍとした。次
に、欠陥画素１２の右下隅から欠陥画素１２の周辺部に
沿って反時計方向にほぼ一周連続して照射し、欠陥画素
１２の右下隅の黒丸印で示す照射終了点において照射を
終了した。この場合の照射ラインａは欠陥画素１２のエ
ッジ部からｔ＝７．５μｍ離れた位置とした。Next, in the second example shown in FIG. 2, the irradiation pattern of the second laser beam is opposite to that shown in FIG. That is, first, irradiation is continuously performed leftward from the irradiation start point indicated by the white circle in the upper right corner of the defective pixel 12, and then irradiation is performed continuously from the left side to the right direction at a position shifted downward by a predetermined pitch, Next, irradiation was continuously performed from the right side to the left direction at positions shifted downward by a predetermined pitch, and such irradiation was repeated until the lower right corner of the defective pixel 12 was irradiated. The pitch P in this case was set to 20 μm. Next, the irradiation was continued from the lower right corner of the defective pixel 12 along the peripheral portion of the defective pixel 12 in a counterclockwise direction for almost one round, and the irradiation was terminated at the irradiation end point indicated by the black circle mark at the lower right corner of the defective pixel 12 . . In this case, the irradiation line a was positioned at a distance of t=7.5 μm from the edge of the defective pixel 12 .
【００１０】次に、図３に示す第３の例における第２の
レーザビームの照射パターンでは、まず、図２に示す場
合と同様の照射を行った。次に、欠陥画素１２の右下隅
から上方向に連続して照射し、次いで左側に所定のピッ
チずれた位置において上側から下方向に連続して照射
し、次いで左側に所定のピッチずれた位置において下側
から上方向に連続して照射し、以下このような照射を繰
り返して、欠陥画素１２の左上隅の黒丸印で示す照射終
了点において照射を終了した。この場合のピッチＰも２
０μｍとした。Next, in the irradiation pattern of the second laser beam in the third example shown in FIG. 3, the same irradiation as shown in FIG. 2 was first performed. Next, irradiation is continuously performed upward from the lower right corner of the defective pixel 12, then continuous irradiation is performed downward from the upper side at a position shifted to the left by a predetermined pitch, and then to the left at a position shifted by a predetermined pitch. Irradiation was continuously performed from the bottom to the top, and such irradiation was repeated until the irradiation ended at the irradiation end point indicated by the black circle in the upper left corner of the defective pixel 12 . The pitch P in this case is also 2
0 μm.
【００１１】次に、図４に示す第４の例における第２の
レーザビームの照射パターンでは、欠陥画素１２の右下
隅の白丸印で示す照射開始点から欠陥画素１２の中央部
よりもやや下側の黒丸印で示す照射終了点まで、欠陥画
素１２の周辺部に沿うほぼ全周及びその内側の領域を時
計方向で内側に向かって角渦巻状に連続して照射した。
この場合の欠陥画素１２の周辺部に沿う照射ラインａは
欠陥画素１２のエッジ部からｔ＝７．５μｍ離れた位置
とした。また、この照射ラインａの内側におけるピッチ
Ｐは１４μｍとした。Next, in the irradiation pattern of the second laser beam in the fourth example shown in FIG. Nearly the entire periphery along the peripheral portion of the defective pixel 12 and the inner region thereof were continuously irradiated in an angular spiral shape toward the inside in the clockwise direction until the irradiation end point indicated by the black circle mark on the left side.
In this case, the irradiation line a along the peripheral portion of the defective pixel 12 was positioned at a distance of t=7.5 μm from the edge portion of the defective pixel 12 . Also, the pitch P inside the irradiation line a was set to 14 μm.
【００１２】次に、図５に示す第５の例における第２の
レーザビームの照射パターンでは、欠陥画素１２の中心
部よりもやや右下側の白丸印で示す照射開始点から欠陥
画素１２の中心部よりもやや左下側の黒丸印で示す照射
終了点まで、欠陥画素１２の周辺部に沿うほぼ全周及び
その内側の領域を所謂一筆書き状に且つどこにおいても
交差しないように満遍なく照射した。この場合の欠陥画
素１２の周辺部に沿う照射ラインａは欠陥画素１２のエ
ッジ部からｔ＝７．５μｍ離れた位置とした。また、こ
の照射ラインａの内側におけるピッチＰは２０μｍとし
た。Next, in the irradiation pattern of the second laser beam in the fifth example shown in FIG. Nearly the entire circumference along the peripheral portion of the defective pixel 12 and the area inside thereof were evenly irradiated in a so-called unicursal shape and without crossing anywhere, until the irradiation end point indicated by the black circle mark slightly lower left than the center portion. . In this case, the irradiation line a along the peripheral portion of the defective pixel 12 was positioned at a distance of t=7.5 μm from the edge portion of the defective pixel 12 . Also, the pitch P inside the irradiation line a was set to 20 μm.
【００１３】次に、図６に示す第６の例における第２の
レーザビームの照射パターンでは、欠陥画素１２の中央
部よりもやや下側の白丸印で示す照射開始点から欠陥画
素１２の中心部の黒丸印で示す照射終了点まで、欠陥画
素１２の周辺部に沿うほぼ全周及びその内側の領域を所
謂一筆書き状に且つ交差したり重合したりして満遍なく
照射した。この場合の欠陥画素１２の周辺部に沿う照射
ラインａは欠陥画素１２のエッジ部からｔ＝１０μｍ離
れた位置とした。また、この照射ラインａの内側におけ
るピッチＰは２０μｍとした。Next, in the irradiation pattern of the second laser beam in the sixth example shown in FIG. Nearly the entire periphery along the peripheral portion of the defective pixel 12 and the area inside thereof were evenly irradiated in a so-called unicursal manner, intersecting and overlapping, until the irradiation end point indicated by the black circle in the part. In this case, the irradiation line a along the peripheral portion of the defective pixel 12 was positioned at a distance of t=10 μm from the edge portion of the defective pixel 12 . Also, the pitch P inside the irradiation line a was set to 20 μm.
【００１４】なお、図９に示す従来の第２のレーザビー
ムの照射パターンの場合には、図１に示す第１の例にお
ける第２のレーザビームの照射パターンのうち、欠陥画
素１２の周辺部における照射ラインａを照射しない場合
と同じ照射パターンである。以下、この図９に示す照射
パターンを従来例における第２のレーザビームの照射パ
ターンという。In the case of the conventional second laser beam irradiation pattern shown in FIG. 9, in the second laser beam irradiation pattern in the first example shown in FIG. This irradiation pattern is the same as that in the case where the irradiation line a in 1 is not irradiated. Hereinafter, the irradiation pattern shown in FIG. 9 will be referred to as a second laser beam irradiation pattern in the conventional example.
【００１５】そして、第１〜第６の例及び従来例におけ
る第２のレーザビームの照射をそれぞれ複数回ずつ行
い、各Ｙ値を調べたところ、図７に示す結果が得られ
た。この図において、第５の例の変形例とは、図５に示
す第５の例における第２のレーザビームの照射パターン
のうち、黒丸印で示す照射終了点においてのみエネルギ
密度を適宜に下げた場合の例である。白三角印は各例に
おける平均値を示す。Then, irradiation of the second laser beam in each of the first to sixth examples and the conventional example was repeated a plurality of times, and each Y value was examined, and the results shown in FIG. 7 were obtained. In this figure, the modified example of the fifth example means that the energy density is appropriately lowered only at the irradiation end point indicated by the black circle in the irradiation pattern of the second laser beam in the fifth example shown in FIG. This is an example of the case. A white triangle indicates the average value in each example.
【００１６】図７から明らかなように、従来例の場合に
は、Ｙ値がすべて０．０７以上でその平均値は０．０９
程度であり、光漏れがやや大きい。これに対し、第１の
例、第３〜第６の例及び第５の例の変形例の場合には、
Ｙ値がすべて０．０７以下である。第２の例の場合に
は、Ｙ値が０．０７よりもやや大きいものもあるが、そ
の平均値は０．０６よりも小さい。したがって、第１〜
第６の例及び第５の例の変形例の共通点である、第２の
レーザビームを欠陥画素１２の周辺部に沿ってそのほぼ
全周に照射すると、光漏れをより一層減少することがで
きる。As is clear from FIG. 7, in the case of the conventional example, all the Y values are 0.07 or more and the average value is 0.09.
It is a degree, and light leakage is a little large. On the other hand, in the case of the first example, the third to sixth examples, and the modified example of the fifth example,
All Y values are 0.07 or less. In the second example, some Y values are slightly larger than 0.07, but the average value is smaller than 0.06. Therefore, the first
Light leakage can be further reduced by irradiating almost the entire circumference of the defective pixel 12 along the periphery of the defective pixel 12 with the second laser beam, which is common to the modified examples of the sixth and fifth examples. can.
【００１７】ところで、第１〜第６の例のうち第５の例
のＹ値の平均値が０．０５程度で最も小さい。したがっ
て、第１〜第６の例のうち第５の例が最も望ましい。そ
こで、第５の例を第１〜第４及び第６の例と比較してみ
ると、第２のレーザビームの照射開始点及び照射終了点
が欠陥画素１２のほぼ中央部であること、第２のレーザ
ビームの照射点が照射開始点から照射終了点までライン
状に連続していること、第２のレーザビームの照射ライ
ンがどこにおいても交差していないことが挙げられる。By the way, among the first to sixth examples, the fifth example has the smallest average Y value of about 0.05. Therefore, the fifth example is the most desirable among the first to sixth examples. Therefore, when comparing the fifth example with the first to fourth and sixth examples, the irradiation start point and the irradiation end point of the second laser beam are substantially at the center of the defective pixel 12, The irradiation points of the two laser beams are linearly continuous from the irradiation start point to the irradiation end point, and the irradiation lines of the second laser beam do not intersect anywhere.
【００１８】そこで、図１に示す第１の例の場合には、
一部について説明すると、欠陥画素１２の右下隅から左
方向に連続して照射した後、上方向にピッチＰの分だけ
連続して照射するようにしてもよい。また、図２に示す
第２の例の場合には、これも一部について説明すると、
欠陥画素１２の右上隅の白丸印で示す照射開始点からか
ら左方向に連続して照射した後、下方向にピッチＰの分
だけ連続して照射するようにしてもよい。さらに、図３
に示す第３の例の場合には、これも一部について説明す
ると、欠陥画素１２の周辺部に沿って照射した後、連続
して列方向の最も右側の照射ラインを照射し、次いで第
１行目の照射ラインの一部を重合して照射するようにし
てもよい。なお、ここで、第５の例の変形例の場合に
は、Ｙ値の平均値が０．０５よりも小さい。したがっ
て、第５の例の変形例の場合には、第５の例よりも望ま
しい。Therefore, in the case of the first example shown in FIG.
To explain a part of it, after continuously irradiating leftward from the lower right corner of the defective pixel 12, it may be possible to irradiate upward by the pitch P continuously. Also, in the case of the second example shown in FIG.
After continuously irradiating leftward from the irradiation start point indicated by the white circle in the upper right corner of the defective pixel 12, irradiation may be continued downward by the pitch P. FIG. Furthermore, Figure 3
In the case of the third example shown in FIG. 3, this is also partially explained. A part of the irradiation line of the row may be superimposed and irradiated. Here, in the case of the modified example of the fifth example, the average value of the Y values is smaller than 0.05. Therefore, the modification of the fifth example is preferable to the fifth example.
【００１９】なお、上記実施形態において、第２のレー
ザビームの照射速度は、前回の照射領域に対して、次の
照射領域が半分程度重合する程度にしたり、前回の照射
領域と次の照射領域とが離間する程度の速度としてもよ
い。また、１回のレーザ照射で欠陥画素の周辺部に沿っ
てそのほぼ全周に照射するようにしてもよい。In the above embodiment, the irradiation speed of the second laser beam is set so that the next irradiation region overlaps the previous irradiation region by about half, or the previous irradiation region and the next irradiation region overlap each other. It is good also as a speed of the grade which separates from. Alternatively, the laser may be irradiated almost all around along the periphery of the defective pixel in one laser irradiation.
【００２０】[0020]
【発明の効果】以上説明したように、この発明によれ
ば、レーザビームを少なくとも欠陥画素の周辺部に沿っ
てそのほぼ全周に照射しているので、当該欠陥画素を常
時黒表示としたとき、光漏れをより一層減少することが
でき、ひいては画質をより一層向上することができる。As described above, according to the present invention, since the laser beam is irradiated at least along the peripheral portion of the defective pixel, substantially all of the periphery thereof, when the defective pixel is always displayed in black, , the light leakage can be further reduced, and thus the image quality can be further improved.
【図１】この発明の液晶表示パネルの欠陥画素修正方法
の第１の例における第２のレーザビームの照射パターン
を示す図。FIG. 1 is a diagram showing an irradiation pattern of a second laser beam in a first example of a defective pixel correction method for a liquid crystal display panel according to the present invention;
【図２】第２の例における第２のレーザビームの照射パ
ターンを示す図。FIG. 2 is a diagram showing an irradiation pattern of a second laser beam in a second example;
【図３】第３の例における第２のレーザビームの照射パ
ターンを示す図。FIG. 3 is a diagram showing an irradiation pattern of a second laser beam in a third example;
【図４】第４の例における第２のレーザビームの照射パ
ターンを示す図。FIG. 4 is a diagram showing an irradiation pattern of a second laser beam in a fourth example;
【図５】第５の例における第２のレーザビームの照射パ
ターンを示す図。FIG. 5 is a diagram showing an irradiation pattern of a second laser beam in a fifth example;
【図６】第６の例における第２のレーザビームの照射パ
ターンを示す図。FIG. 6 is a diagram showing an irradiation pattern of a second laser beam in a sixth example;
【図７】第１〜第６の例、第５の例の変形例及び従来例
における第２のレーザビームの照射とＹ値との関係を示
す図。FIG. 7 is a diagram showing the relationship between the irradiation of the second laser beam and the Y value in the first to sixth examples, the modified example of the fifth example, and the conventional example;
【図８】（Ａ）は液晶表示パネルの一例の一部の断面
図、（Ｂ）は第１のレーザビームの照射により液晶中に
気泡を発生させた状態を示す（Ａ）同様の断面図。8A is a cross-sectional view of part of an example of a liquid crystal display panel, and FIG. 8B is a cross-sectional view similar to FIG. .
【図９】従来の第２のレーザビームの照射パターンを示
す図。FIG. 9 is a diagram showing a conventional irradiation pattern of a second laser beam;
１２ 欠陥画素 12 defective pixels
───────────────────────────────────────────────────── フロントページの続き (72)発明者 森田 英裕 東京都八王子市石川町2951番地の５ カシ オ計算機株式会社八王子研究所内 Ｆターム(参考） 2H088 FA15 HA08 MA20 2H092 MA46 NA01 NA30 ──────────────────────────────────────────────────── ──── continuation of the front page (72) Inventor Hidehiro Morita 2951-5, Ishikawa-cho, Hachioji-shi, Tokyo Computer Co., Ltd. Hachioji Laboratory F term (reference) 2H088 FA15 HA08 MA20 2H092 MA46 NA01 NA30
Claims (5)
示パネルの欠陥画素の部分にレーザビームを照射して前
記欠陥画素の部分を物理的に破壊し、これにより前記欠
陥画素を修正する液晶表示パネルの欠陥画素修正方法に
おいて、前記レーザビームを少なくとも前記欠陥画素の
周辺部に沿ってそのほぼ全周に照射することを特徴とす
る液晶表示パネルの欠陥画素修正方法。1. A defective pixel portion of a liquid crystal display panel in which liquid crystal is sealed between a pair of substrates is irradiated with a laser beam to physically destroy the defective pixel portion, thereby repairing the defective pixel. A defective pixel repairing method for a liquid crystal display panel, comprising: irradiating at least the peripheral portion of the defective pixel with the laser beam substantially all around the defective pixel.
ザビームは、前記欠陥画素の部分に気泡を発生させる第
１の照射工程と、照射点を変えながら前記欠陥画素の周
辺部に沿って照射する第２の照射工程とを有することを
特徴とする液晶表示パネルの欠陥画素修正方法。2. In the invention according to claim 1, the laser beam is applied in a first irradiation step of generating bubbles in the portion of the defective pixel, and is irradiated along the peripheral portion of the defective pixel while changing the irradiation point. A defective pixel correction method for a liquid crystal display panel, characterized by comprising: a second irradiation step.
の照射工程におけるレーザビームの照射開始点及び照射
終了点が前記欠陥画素の部分のほぼ中央部であることを
特徴とする液晶表示パネルの欠陥画素修正方法。3. The invention according to claim 2, wherein the second
2. A method for repairing a defective pixel in a liquid crystal display panel, wherein the irradiation start point and the irradiation end point of the laser beam in the irradiation step of 1) are substantially at the center of the portion of the defective pixel.
の照射工程におけるレーザビームの照射点が照射開始点
から照射終了点までライン状に連続していることを特徴
とする液晶表示パネルの欠陥画素修正方法。4. The invention according to claim 3, wherein the second
2. A method for repairing defective pixels of a liquid crystal display panel, wherein the irradiation point of the laser beam in the irradiation step of 1 is continuous in a line form from the irradiation start point to the irradiation end point.
の照射工程におけるレーザビームの照射ラインがどこに
おいても交差していないことを特徴とする液晶表示パネ
ルの欠陥画素修正方法。5. The invention according to claim 4, wherein the second
3. A method for repairing defective pixels in a liquid crystal display panel, wherein the irradiation lines of the laser beam in the irradiation step of 1 do not intersect anywhere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP37581098A JP3793866B2 (en) | 1998-12-18 | 1998-12-18 | Method for correcting defective pixels in liquid crystal display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP37581098A JP3793866B2 (en) | 1998-12-18 | 1998-12-18 | Method for correcting defective pixels in liquid crystal display panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000180811A true JP2000180811A (en) | 2000-06-30 |
| JP3793866B2 JP3793866B2 (en) | 2006-07-05 |
Family
ID=18506102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP37581098A Expired - Fee Related JP3793866B2 (en) | 1998-12-18 | 1998-12-18 | Method for correcting defective pixels in liquid crystal display panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3793866B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002341349A (en) * | 2001-05-16 | 2002-11-27 | Toshiba Corp | Liquid crystal display device and its manufacturing method |
| KR100582625B1 (en) | 2003-01-21 | 2006-05-23 | 산요덴키가부시키가이샤 | Laser repair method of electro luminescence display device |
| WO2010140443A1 (en) * | 2009-06-04 | 2010-12-09 | シャープ株式会社 | Method for manufacturing liquid crystal panel, liquid crystal panel, and repairing device |
| KR101104558B1 (en) | 2005-10-18 | 2012-01-11 | 사천홍시현시기건유한공사 | Method for laser repair |
| JP2013156356A (en) * | 2012-01-27 | 2013-08-15 | Mitsubishi Electric Corp | Darkening method and darkening device of bright point defect in liquid crystal display device |
-
1998
- 1998-12-18 JP JP37581098A patent/JP3793866B2/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002341349A (en) * | 2001-05-16 | 2002-11-27 | Toshiba Corp | Liquid crystal display device and its manufacturing method |
| JP4660011B2 (en) * | 2001-05-16 | 2011-03-30 | 東芝モバイルディスプレイ株式会社 | Liquid crystal display device and manufacturing method thereof |
| KR100582625B1 (en) | 2003-01-21 | 2006-05-23 | 산요덴키가부시키가이샤 | Laser repair method of electro luminescence display device |
| KR101104558B1 (en) | 2005-10-18 | 2012-01-11 | 사천홍시현시기건유한공사 | Method for laser repair |
| WO2010140443A1 (en) * | 2009-06-04 | 2010-12-09 | シャープ株式会社 | Method for manufacturing liquid crystal panel, liquid crystal panel, and repairing device |
| CN102460280A (en) * | 2009-06-04 | 2012-05-16 | 夏普株式会社 | Method for manufacturing liquid crystal panel, liquid crystal panel, and repairing device |
| JP5328912B2 (en) * | 2009-06-04 | 2013-10-30 | シャープ株式会社 | Liquid crystal panel manufacturing method, liquid crystal panel and repair device |
| US8773634B2 (en) | 2009-06-04 | 2014-07-08 | Sharp Kabushiki Kaisha | Method for producing liquid crystal panel, liquid crystal panel, and repair apparatus |
| JP2013156356A (en) * | 2012-01-27 | 2013-08-15 | Mitsubishi Electric Corp | Darkening method and darkening device of bright point defect in liquid crystal display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3793866B2 (en) | 2006-07-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101060472B1 (en) | Defective cell repair method of LCD panel | |
| CN103777404B (en) | Liquid crystal display device | |
| KR101117982B1 (en) | Liquid Crystal Display Device And Method For Repairing Bright Spot Of The Same | |
| JPH0321928A (en) | Production of active liquid crystal panel | |
| WO2016185643A1 (en) | Display panel | |
| US6822701B1 (en) | Liquid crystal display apparatus | |
| JP2000180811A (en) | Defective pixel correcting method for liquid crystal display panel | |
| US5991002A (en) | Method for correcting a defect in a liquid crystal panel | |
| JP2006133739A (en) | Method of manufacturing liquid crystal display device | |
| JP2005292833A (en) | Liquid crystal display device and manufacturing method therefor | |
| JP2005017486A (en) | Correction method of color filter for liquid crystal display device | |
| JP2006091672A (en) | Defect pixel correcting method for liquid crystal display, and liquid crystal display | |
| KR20030027710A (en) | Raster defect correction method for liquid crystal display device and raster defect correction device for the same | |
| KR102368452B1 (en) | Display apparatus, and method and apparatus for manufacturing the same | |
| TWI305848B (en) | Method for making a bright spot pixel vanished and liquid crystal module | |
| KR100830738B1 (en) | Thin film transistor lcd | |
| JP2016194624A (en) | Liquid crystal panel, liquid crystal display, and method of correcting defect in luminous point of the same | |
| JP4660011B2 (en) | Liquid crystal display device and manufacturing method thereof | |
| JP2007219309A (en) | Liquid crystal display device and method for manufacturing the same | |
| JPH0389320A (en) | Production of spacer for liquid crystal panel | |
| JPH04301672A (en) | Image display device | |
| JP2000081639A (en) | Liquid crystal display device | |
| JPH08146370A (en) | Method for correcting defect of liquid crystal display device | |
| JP3433603B2 (en) | Display device defect repair method | |
| JP2005352209A (en) | Liquid crystal display and its manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20051104 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051115 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051222 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20060202 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20060222 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060314 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060327 |
|
| R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090421 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100421 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110421 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120421 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120421 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130421 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130421 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140421 Year of fee payment: 8 |
|
| LAPS | Cancellation because of no payment of annual fees |