JP2000171792A - Manufacture of reflection substrate for reflective liquid crystal display device - Google Patents

Manufacture of reflection substrate for reflective liquid crystal display device

Info

Publication number
JP2000171792A
JP2000171792A JP10363823A JP36382398A JP2000171792A JP 2000171792 A JP2000171792 A JP 2000171792A JP 10363823 A JP10363823 A JP 10363823A JP 36382398 A JP36382398 A JP 36382398A JP 2000171792 A JP2000171792 A JP 2000171792A
Authority
JP
Japan
Prior art keywords
substrate
light
internal stress
cured product
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10363823A
Other languages
Japanese (ja)
Inventor
Mitsuharu Tanabe
光治 田邊
Kenjiro Ishii
健次郎 石井
Akinari Tsuji
明成 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsumura Printing Co Ltd
Original Assignee
Mitsumura Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsumura Printing Co Ltd filed Critical Mitsumura Printing Co Ltd
Priority to JP10363823A priority Critical patent/JP2000171792A/en
Publication of JP2000171792A publication Critical patent/JP2000171792A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To form a base film for a reflection plate with an excellent projecting and recessing shape on a surface of a hardened matter by applying a resin material which hardens by light, heat or both of them on a substrate and controlling the internal stress. SOLUTION: A resin material 2, prepared by mixing photo- and thermosetting acrylic resin and carbon of 50% based on the resin component, is spin coated on a glass substrate 1 and is exposed from the arrowed direction with a light filter 3 and developed (a). After the development, although surface hardening with light occurs, the inside is not hardened and the surface remains flat (b). After sintering, on the surface of the carbon mixed resin material 2, a shrinking shape resulting from the internal stress due to hardening of the previously unhardened inside appears and projecting and recessing parts are formed on the surface corresponding to the bigger internal energy. As a consequence of deposition of aluminum on the substrate 1, a diffusion substrate with an excellent projecting and recessing shape M is formed on the surface of the hardened matter 2a (c).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、反射用下地膜の形
成に好適する反射型液晶表示装置の反射基板製造法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a reflective substrate of a reflective liquid crystal display device suitable for forming a reflective base film.

【0002】[0002]

【従来の技術】近年、パーソナルコンピューターの普及
は目覚ましく、とりわけバックライトを省き軽量化した
反射型液晶ディスプレイは、その需要が増加する傾向に
ある。反射型の場合、光を効率よくパネル内に取り込み
散乱させることが重要な課題となる。通常は、1)鏡面
の反射膜と散乱フィルムの組み合わせにより反射特性を
持たせる方法、2)基板を研磨等で粗面状態にし、フッ
酸で処理することで反射板とする方法、3)パターニン
グ特性を持たせた有機膜上にアルミニウム若しくはアル
ミニウム合金等の金属薄膜をスパッタや蒸着法により形
成する方法、などが知られている。
2. Description of the Related Art In recent years, the spread of personal computers has been remarkable, and in particular, the demand for a reflective liquid crystal display having a reduced weight by eliminating a backlight tends to increase. In the case of the reflection type, it is important to efficiently capture and scatter light into the panel. Usually, 1) a method of giving reflection characteristics by a combination of a mirror reflection film and a scattering film, 2) a method of making a substrate a rough surface by polishing or the like, and treating it with hydrofluoric acid to form a reflection plate, 3) patterning There is known a method of forming a metal thin film such as aluminum or an aluminum alloy on an organic film having characteristics by sputtering or vapor deposition.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、1)の
方法では、鏡面からの反射を散乱フィルムで制御しなけ
ればならず、画像のボケを起こしたり、光の有効利用が
困難である、といった不具合がある。また、2)の方法
は、基板の表面状態の微妙な変化等の影響で再現性が低
い、という問題がある。
However, in the method 1), the reflection from the mirror surface must be controlled by a scattering film, which causes blurring of an image and difficulty in effective use of light. There is. In addition, the method 2) has a problem that reproducibility is low due to subtle changes in the surface state of the substrate.

【0004】現状では、上記3)の反射板形成法が有力
となりつつある。更に、この反射板に、コンタクトホー
ル等により電極を設け、高開口率化を図るとともに、従
来対向基板においたカラーフィルターを反射板上に形成
することで視差や明るさの改善が考慮されている。しか
しながら金属薄膜形成前の反射板用下地膜の形成は、そ
の再現性が困難で、未だ有効な作製法が得られていな
い。
At present, the method 3) for forming a reflection plate is becoming effective. Furthermore, this reflector is provided with an electrode through a contact hole or the like to increase the aperture ratio, and improvement in parallax and brightness is considered by forming a color filter on a conventional counter substrate on the reflector. . However, the formation of the reflector base film before the formation of the metal thin film is difficult to reproduce, and an effective manufacturing method has not yet been obtained.

【0005】[0005]

【課題を解決するための手段】そこで本発明は、下地膜
の形成に関し、基板上に、光,熱,若しくはその両方に
よって硬化する樹脂材料を用い、その内部応力を制御し
て硬化物の表面に良好な凹凸形状を形成することを技術
手段とする。
Accordingly, the present invention relates to the formation of a base film, using a resin material which is cured by light, heat, or both on a substrate and controlling the internal stress thereof to form a surface of the cured product. The technical means is to form a good uneven shape on the surface.

【0006】上記手段は、熱によって内部応力を制御し
硬化物の表面に凹凸形状を形成することである。
The above means is to form an uneven shape on the surface of a cured product by controlling internal stress by heat.

【0007】また上記手段は、光によって内部応力を制
御し硬化物の表面に凹凸形状を形成するようにしてもよ
い。
The above means may control the internal stress by light to form an uneven shape on the surface of the cured product.

【0008】さらに上記手段は、光,熱若しくは、熱ー
光,光ー熱の順に発生する内部応力を制御して硬化物の
表面に凹凸形状を形成することである。
Further, the above means is to form an uneven shape on the surface of the cured product by controlling the internal stress generated in the order of light, heat or heat-light, light-heat.

【0009】而して上記手段では、内部応力を選択的に
制御して硬化物の表面に凹凸形状を形成することもでき
る。
According to the above-mentioned means, it is also possible to form an uneven shape on the surface of the cured product by selectively controlling the internal stress.

【0010】また本発明は、基板上に、光の回折を利用
して反射膜表面に凹凸形状を形成することを手段として
いる。
Further, the present invention is characterized in that an uneven shape is formed on the surface of a reflective film by utilizing light diffraction on a substrate.

【0011】この手段では、基板裏面より露光を行うこ
とで発生する光の回折を利用することが好ましい
In this means, it is preferable to use diffraction of light generated by performing exposure from the back surface of the substrate.

【0012】[0012]

【発明の実施の形態】本発明は、下地膜用材料中の溶剤
量、若しくは光及び熱等の硬化条件の一部、若しくは全
てにおいて、その従来の材料の持つ成膜製造条件を変更
するか、或いは材料中に、内部応力を調整する添加物を
充填することで、成膜状態時に所望の表面状態を持たせ
る。この際添加物は、材料の内部応力を調整できる物で
あれば有機,無機を問わない。添加物としては、シリ
カ,カーボン,有機樹脂,マイカ,タルク等があり、そ
れらを適宜選択する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention relates to a method for changing the film forming manufacturing conditions of a conventional material for a part or all of the amount of a solvent in a material for a base film or curing conditions such as light and heat. Alternatively, the material is filled with an additive for adjusting the internal stress, so that a desired surface state is obtained during the film formation state. At this time, the additive may be organic or inorganic as long as it can adjust the internal stress of the material. Examples of the additives include silica, carbon, organic resin, mica, talc and the like, and these are appropriately selected.

【0013】反射基板に、光,若しくは熱により硬化す
る材料をあらかじめ塗布しておき、ある一定のスリット
を持つマスクを介して露光を行う。その際塗布は、基板
に一定の膜厚が得られるものであれば、その方法は問わ
ない。またマスクは、光の回折が得られるスリット若し
くは障害物が施されていれば、その形、材質は問わな
い。この形態で露光を行うと、スリット若しくは障害物
により光は回折し、硬化物表面にその回折痕が現われ
る。
A material that is cured by light or heat is applied to the reflection substrate in advance, and exposure is performed through a mask having a certain slit. At this time, the method of application is not limited as long as a constant film thickness can be obtained on the substrate. The shape and material of the mask are not limited as long as the mask is provided with slits or obstacles for obtaining light diffraction. When exposure is performed in this mode, light is diffracted by slits or obstacles, and diffraction marks appear on the surface of the cured product.

【0014】回折痕は、スリットの数や形により制御で
きる。そのため所望の表面形状が得られる。この場合、
ブラックマトリクス用原版は、多数のスリットを持ち、
光の回折が全面で発生する。この回折痕が、着色材料の
硬化時に表面に発現する。この場合通常は、回折方向が
ある一定の方向性を持つため硬化物の表面には、縦筋若
しくは横筋のどちらか一方しか現われないのが普通であ
る(フレネル若しくはフラウンフォーファー回折等)。
しかしながら、この光の進行方向及び位相に対して、あ
らかじめ光散乱させることで、光のスリット通過後の回
折が一定ではなくなり、縦筋と横筋の混在した表面形状
が得られる。
The diffraction marks can be controlled by the number and shape of the slits. Therefore, a desired surface shape can be obtained. in this case,
The master for black matrix has many slits,
Light diffraction occurs over the entire surface. These diffraction marks appear on the surface when the coloring material is cured. In this case, since the diffraction direction usually has a certain direction, only one of a vertical streak and a horizontal streak usually appears on the surface of the cured product (Fresnel or Fraunhofer diffraction or the like).
However, by diffusing light in advance with respect to the traveling direction and phase of the light, the diffraction of the light after passing through the slit is not constant, and a surface shape in which vertical and horizontal streaks are mixed can be obtained.

【0015】(実施例1) 図1を参照して本発明の実施例1を説明すると、通
常、カラーフィルター保護膜として使用されている光熱
透明硬化型アクリル樹脂とその樹脂成分に対しカーボン
を50%添加混合した樹脂材料2をガラス基板1上にス
ピン塗布を行い光フィルター3を用いて矢印の方向より
露光し現像を行った(図1の(イ)参照)。膜厚は、塗
布時に1.5μmに調整した。現像後、光における表面
硬化が発生するが内部は未硬化であり、表面状態は平坦
となっている(図1の(ロ)参照)ものゝ、焼成後、カ
ーボン混入樹脂材料2のほうの表面に、未硬化であった
内部が硬化して内部応力における収縮形状が発現し、内
部エネルギーの大きい分だけ表面に凹凸が形成された。
この基板1に対してアルミニウムの蒸着を行った結果、
硬化物2aの表面に、良好な凹凸形状Mを有する拡散基
板が形成された(図1の(ハ)参照)。この時表面段差
は、約0.5μmだった。
(Example 1) Referring to FIG. 1, Example 1 of the present invention will be described. Normally, 50% of carbon is added to a photothermally transparent curable acrylic resin used as a color filter protective film and its resin component. The resin material 2 mixed with the addition of 2% was spin-coated on the glass substrate 1 and exposed to light in the direction of the arrow using the optical filter 3 for development (see FIG. 1A). The film thickness was adjusted to 1.5 μm at the time of coating. After development, surface curing by light occurs, but the inside is uncured and the surface state is flat (see (b) in FIG. 1). After the firing, the surface of the carbon-mixed resin material 2 At the same time, the uncured interior was cured and a contracted shape due to internal stress was developed, and irregularities were formed on the surface due to the large internal energy.
As a result of performing aluminum deposition on the substrate 1,
A diffusion substrate having a good uneven shape M was formed on the surface of the cured product 2a (see FIG. 1C). At this time, the surface step was about 0.5 μm.

【0016】 次に上記と同様成膜を行い、膜厚の
みを2μmにした。この時表面段差が1.4μmにな
り、且つ表面の形状に変化が起きた。この基板上に、ア
ルミニウムを蒸着して、と同様に良好な拡散板を得
た。
Next, film formation was performed in the same manner as described above, and only the film thickness was reduced to 2 μm. At this time, the surface step became 1.4 μm and the surface shape changed. Aluminum was vapor-deposited on this substrate to obtain a good diffusion plate in the same manner as described above.

【0017】 と同じ透明樹脂に、カーボンとは異
なる顔料を混合しと同様に露光,現像,焼成を行っ
た。焼成後、表面状態を観察すると、カーボンの混入樹
脂とは異なった形状が発現した。この基板上に、アルミ
ニウムを蒸着して、,と同様に、良好な拡散板を得
た。この結果、この製法において、膜厚と添加物を適宜
選択することで、表面形状と段差の調整が可能であるこ
とが判明した。
Exposure, development and baking were carried out in the same manner as described above, except that a pigment different from carbon was mixed with the same transparent resin as described above. When the surface state was observed after firing, a shape different from that of the resin mixed with carbon was developed. Aluminum was vapor-deposited on this substrate to obtain a good diffusion plate in the same manner as in (1). As a result, it has been found that in this production method, the surface shape and the level difference can be adjusted by appropriately selecting the film thickness and the additive.

【0018】(実施例2)図2を参照して、内部応力を
選択的に制御する実施例2を説明すると、ガラス基板1
1上に、実施例1と同じ樹脂材料12をスピン塗布し、
光フィルター13とブラックマトリクス用原版を反転さ
せた原版14を用い、矢印の方向より露光、焼成を行っ
た(図2の(イ)参照)。この時の膜厚及び露光量、焼
成時間は、実施例1と全く同じにした。焼成後、表面を
観察すると、光の当たった部分には凸部Tが発生し未露
光部分には発生していなかった(図2の(ロ)参照)。
この製法によって、ブラックマトリクスに仕切られた各
画素内に凹凸がある表面形状が得られた。この基板に対
してアルミニウムの蒸着を行った結果、良好な拡散版が
得られた。
(Embodiment 2) Referring to FIG. 2, an embodiment 2 for selectively controlling internal stress will be described.
1 is spin-coated with the same resin material 12 as in Example 1,
Using the optical filter 13 and the original plate 14 obtained by inverting the black matrix original plate, exposure and baking were performed in the direction of the arrow (see FIG. 2A). At this time, the film thickness, exposure amount, and baking time were exactly the same as in Example 1. Observation of the surface after baking revealed that the projections T occurred in the portions that were exposed to light and did not occur in the unexposed portions (see (b) of FIG. 2).
By this manufacturing method, a surface shape having irregularities in each pixel partitioned by the black matrix was obtained. As a result of depositing aluminum on the substrate, a favorable diffusion plate was obtained.

【0019】[0019]

【発明の効果】本発明は以上のような実施形態であり、
以下に記述するような特有の効果を発揮する。
The present invention is the embodiment as described above,
It has the following specific effects.

【0020】樹脂の内部応力の制御をすることで、表面
形状及び表面粗さを任意に、然も簡易に変えられ、良好
な反射基板用下地が得られる。
By controlling the internal stress of the resin, the surface shape and surface roughness can be arbitrarily and easily changed, and a good base for a reflective substrate can be obtained.

【0021】その製造方法も、熱,光,光と熱等の組
み合わせが可能である。個々の材料の内部応力を添加
物により制御できるため選択できる材料の種類が豊富で
あり多種多様な反射基板用下地の作製が可能である。
The manufacturing method can be a combination of heat, light, light and heat, and the like. Since the internal stress of each material can be controlled by an additive, the types of materials that can be selected are abundant, and a wide variety of base materials for a reflective substrate can be manufactured.

【0022】光の回折を利用することで、表面形状及び
表面粗さを任意に、然も簡易に変えられ、良好な反射基
板用下地が得られる。
By utilizing the diffraction of light, the surface shape and surface roughness can be arbitrarily and easily changed, and a good base for a reflective substrate can be obtained.

【0023】また光を回折させる際に、光の強度若しく
は回折用の障害物(スリットなど)の数や形状、及び基
板までの距離を変化させることで、多くの表面形状及び
粗さが得られるため、多種多様な反射基板用下地の作製
が可能となる。
When diffracting light, many surface shapes and roughness can be obtained by changing the intensity of light, the number and shape of obstacles (slits and the like) for diffraction, and the distance to the substrate. Therefore, it is possible to produce a variety of base materials for a reflective substrate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1の説明図であって、(イ)は露光時、
(ロ)は光硬化時、(ハ)は焼成後の状態を示す。
FIGS. 1A and 1B are explanatory diagrams of Embodiment 1, wherein FIG.
(B) shows the state during light curing, and (c) shows the state after firing.

【図2】実施例2の説明図であって、(イ)は露光時、
(ロ)は完成時の状態を示す。
FIGS. 2A and 2B are explanatory diagrams of Embodiment 2, wherein FIG.
(B) shows the state at the time of completion.

【符号の説明】[Explanation of symbols]

1,11 基板 2,12 樹脂材料 2a 硬化物 3,13 光フィルター 14 原版 M 凹凸形状 1,11 substrate 2,12 resin material 2a cured product 3,13 optical filter 14 original M

───────────────────────────────────────────────────── フロントページの続き (72)発明者 辻 明成 大田原市紫塚1−12−32 猪瀬レジデンス A−202 Fターム(参考) 2H042 BA03 BA15 BA20 2H091 FA14Z FA19Z FA31Z FB02 FB08 FB12 FB13 FC02 FC10 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Akinari Tsuji 1-12-32 Shizuka, Otawara-shi Inose Residence A-202 F-term (reference) 2H042 BA03 BA15 BA20 2H091 FA14Z FA19Z FA31Z FB02 FB08 FB12 FB13 FC02 FC10

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 基板上に、光,熱,若しくはその両方に
よって硬化する樹脂材料を用い、その内部応力を制御し
て硬化物の表面に凹凸形状を形成する反射型液晶表示装
置の反射基板製造法。
1. A method of manufacturing a reflective substrate for a reflective liquid crystal display device, wherein a resin material that is cured by light, heat, or both is used on a substrate, and the internal stress is controlled to form an uneven shape on the surface of the cured product. Law.
【請求項2】 熱によって内部応力を制御し硬化物の表
面に凹凸形状を形成する請求項1記載の反射型液晶表示
装置の反射基板製造法。
2. The method according to claim 1, wherein the internal stress is controlled by heat to form an uneven shape on the surface of the cured product.
【請求項3】 光によって内部応力を制御し硬化物の表
面に凹凸形状を形成する請求項1記載の反射型液晶表示
装置の反射基板製造法。
3. The method according to claim 1, wherein the unevenness is formed on the surface of the cured product by controlling the internal stress by light.
【請求項4】 光,熱若しくは、熱ー光,光ー熱の順に
発生する内部応力を制御して硬化物の表面に凹凸形状を
形成する請求項1記載の反射型液晶表示装置の反射基板
製造法。
4. The reflection substrate of a reflection type liquid crystal display device according to claim 1, wherein the unevenness is formed on the surface of the cured product by controlling the internal stress generated in the order of light, heat or heat-light, light-heat. Manufacturing method.
【請求項5】 内部応力を選択的に制御して硬化物の表
面に凹凸形状を形成する請求項1記載の反射型液晶表示
装置の反射基板製造法。
5. The method according to claim 1, wherein the unevenness is formed on the surface of the cured product by selectively controlling the internal stress.
【請求項6】 基板上に、光の回折を利用して硬化物表
面に凹凸形状を形成する反射型液晶表示装置の反射基板
製造法。
6. A method for manufacturing a reflective substrate of a reflective liquid crystal display device, wherein an uneven shape is formed on the surface of a cured product by utilizing light diffraction on the substrate.
【請求項7】 基板裏面より露光を行うことで発生する
光の回折を利用して硬化物表面に凹凸形状を形成する請
求項6記載の反射型液晶表示装置の反射基板製造法。
7. The method of manufacturing a reflective substrate for a reflective liquid crystal display device according to claim 6, wherein an uneven shape is formed on the surface of the cured product using diffraction of light generated by performing exposure from the back surface of the substrate.
JP10363823A 1998-12-07 1998-12-07 Manufacture of reflection substrate for reflective liquid crystal display device Pending JP2000171792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10363823A JP2000171792A (en) 1998-12-07 1998-12-07 Manufacture of reflection substrate for reflective liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10363823A JP2000171792A (en) 1998-12-07 1998-12-07 Manufacture of reflection substrate for reflective liquid crystal display device

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6882394B2 (en) 2002-05-30 2005-04-19 Fujitsu-Display Technologies Corporation Reflective liquid crystal display including a step of applying charged particles on the organic resin and film method of manufacturing
US6897921B2 (en) 2000-10-13 2005-05-24 Kyodo Printing Co., Ltd. Method of manufacturing electrode base member and reflecting member for liquid crystal display device
JP2007034316A (en) * 2006-08-24 2007-02-08 Sharp Corp Substrate for reflection type liquid crystal display and reflection type liquid crystal display using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6897921B2 (en) 2000-10-13 2005-05-24 Kyodo Printing Co., Ltd. Method of manufacturing electrode base member and reflecting member for liquid crystal display device
US6882394B2 (en) 2002-05-30 2005-04-19 Fujitsu-Display Technologies Corporation Reflective liquid crystal display including a step of applying charged particles on the organic resin and film method of manufacturing
US7692740B2 (en) 2002-05-30 2010-04-06 Sharp Kabushiki Kaisha Liquid crystal display having a reflective electrode formed on an organic resin film
JP2007034316A (en) * 2006-08-24 2007-02-08 Sharp Corp Substrate for reflection type liquid crystal display and reflection type liquid crystal display using the same
JP4492814B2 (en) * 2006-08-24 2010-06-30 シャープ株式会社 Reflective liquid crystal display device substrate and reflective liquid crystal display device using the same

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