JPH07181473A - Color filter for liquid crystal display and its production - Google Patents

Abstract

PURPOSE:To provide a color filter for a high-quality liquid crystal display having good light shieldability in a black matrix, good pattern accuracy and high flattening rate even if a black photosensitive resin is used for the black matrix. CONSTITUTION:The black matrix 27 which segments respective pixels is formed on a transparent substrate 20. The region parts segmented by this black matrix 27 are filled up with transparent block layers 24 of nearly the same thickness as the thickness of the black matrix 27. Black matrix holding layers 28 of a substantially uniform thickness are formed on the transparent substrate 20 by these transparent block layers 24 and the black matrix 27. Colored layers 29 having a substantially uniform thickness are arranged according to the arrangement patterns of the transparent block layers 24 on these black matrix holding layers 28.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter used in a liquid crystal display and its manufacturing method.

[0002]

2. Description of the Related Art A color liquid crystal display generally has a transparent glass substrate 3 carrying a split transparent electrode 2 on one side of a liquid crystal layer 1 and a polarizing plate 4, as shown in FIG. A transparent glass substrate on the other side of the liquid crystal layer 1 in which a red, green and blue colored layer 6 in which each pixel is divided by a black matrix 5, a flattening film 7 and a common transparent electrode 8 are carried in a laminated state. 9 and a polarizing plate 10 are configured to be irradiated with white light from a backlight (not shown) disposed on the polarizing plate 4 side, and screen display is performed by the transmitted light.

In the color filter of the liquid crystal display, as described above, the purpose is to improve the contrast at the pattern boundary of the colored layer 6 arranged on the glass substrate 9 in the three-color pixel pattern of red, green and blue. A black matrix 5 which is a light shielding layer is formed. Conventionally, the black matrix is formed of a metal thin film such as Al or Cr. In the case of a metal thin film, the black matrix exhibits a sufficient light-shielding performance with a thin film structure having a film thickness of about 0.2 to 0.4 μm, but its manufacturing cost is high and formation by photolithography is desired. There is.

Since the color filter also plays a role of carrying an electrode for controlling the liquid crystal together with the counter substrate, unless it is flat, the distance between the two electrodes sandwiching the liquid crystal becomes uneven depending on the unevenness of the electrode. This causes deterioration of display quality and also causes cracks in the transparent electrode (ITO). In view of such a situation, in a color filter with a black matrix having a thin film structure, filter pixels are formed in each area defined by the black matrix, and a pattern forming material is embedded in a gap between the filter pixels to flatten the color filter. Japanese Patent Laid-Open No. Sho 62
No. 254103. In this case, the thickness of the black matrix is about 0.5 μm, the transmittance is about 10%, and the thickness of each filter pixel is about 1 to 2 μm.

[0005]

The light-shielding performance of the black matrix in the color filter is preferably 3% or less. On the other hand, the black matrix in the above-mentioned color filter has a light transmittance of about 10%, and the light-shielding performance is insufficient. The above film thickness is required.

As described above, when the thickness of the black matrix becomes approximately the same as that of the filter pixel, as shown in FIG. 6, the colored layer greatly rises in the black matrix portion according to the layer thickness of the black matrix. In this case, in this case, JP-A-62-254103
The technique disclosed in Japanese Patent Publication cannot cope with flattening.

Further, conventionally, the size of the filter pixel is defined by a black matrix. Therefore, when the black matrix is made of a black photosensitive resin, the material is required to have high resolution. On the other hand, the black photosensitive resin contains a large amount of pigment as a colorant in order to make the light-shielding property a problem, so the scattered light is larger than that of the transparent photosensitive resin, and the pattern is a mask during exposure. The width tends to be wider than the width, and in particular, as the film thickness increases, the spread increases.

Further, in the black matrix using the black photosensitive resin, if the film thickness is increased in order to obtain a sufficient light-shielding property, the pattern width becomes wider, and the area of the filter pixel region becomes narrower accordingly, and the display screen becomes dark. Become. An object of the present invention is to provide a high-quality color filter for a liquid crystal display, which has a good light-shielding property in the black matrix, a high pattern accuracy, and a high degree of flatness even when a black photosensitive resin is used in the black matrix, and the color thereof. It is to provide a method for manufacturing a filter.

[0009]

In order to achieve the above object, in the color filter for liquid crystal display according to the present invention, a black matrix for partitioning each pixel is formed on a transparent substrate, and a region partitioned by the black matrix is formed. The part is filled with a transparent partition layer having substantially the same thickness as the black matrix, and the transparent partition layer and the black matrix form a black matrix retaining layer having a substantially uniform layer thickness on the transparent substrate, A coloring layer having a substantially uniform layer thickness is arranged on the black matrix holding layer according to the arrangement pattern of the transparent partition layer, or a coloring substance of each color is arranged on the transparent substrate according to a predetermined pattern. A black matrix in which a colored layer having a substantially uniform layer thickness is formed and each pixel is partitioned on the colored layer. Are formed in correspondence with the pattern of the colored layer, and the area portion partitioned by the black matrix is filled with a transparent partition layer having substantially the same thickness as the black matrix. The black matrix retaining layer having a substantially uniform layer thickness is formed on the colored layer.

In order to achieve the above-mentioned object, the method of manufacturing a color filter for a liquid crystal display according to the present invention is characterized in that a transparent photosensitive resin is preliminarily set in each area defined by the black matrix while leaving a black matrix arrangement gap on the transparent substrate. A transparent partition layer is formed by, and a black matrix made of a black photosensitive resin is embedded in a black matrix arrangement gap of the transparent partition layer to have a film thickness almost equal to that of the transparent partition layer, and the black matrix is formed on the transparent partition layer. A colored layer is formed of a colored photosensitive resin of each color for each divided area, or a colored layer is formed of a colored photosensitive resin of each color on a transparent substrate according to a predetermined pattern, and a black matrix arrangement gap is formed on the colored layer. A transparent photosensitive resin is preliminarily set in each area defined by the remaining black matrix. To form a more transparent partition layer is characterized by forming embedding a black matrix to the black matrix arrangement gap of the transparent partition layers by black photosensitive resin to substantially the same thickness as the transparent section layer.

An example of a procedure for producing a color filter according to the present invention will be described below with reference to FIG. First, as shown in (a), the transparent photosensitive resin 2 is formed on the glass substrate 20.
1 is applied by spin coating or the like. Next, ultraviolet exposure is performed using an exposure mask 22 having an opening pattern opposite to that of the black matrix exposure mask 26, and development is performed to divide by a black matrix arrangement gap 23 as shown in (b). The transparent partition layer 24 is obtained.

Next, as shown in (c), a black photosensitive resin 25 is applied onto the glass substrate 20 on which the transparent partition layer 24 is formed, and exposure for a black matrix having openings in a black matrix shape is performed. Ultraviolet light exposure is performed using the mask 26, and the black matrix 27 is formed without any gap in the black matrix arrangement gap 23 of the transparent partition layer 24 by development. At this time, for example, the transparent partition layer 24
Layer thickness is 1.00 μm, and the black matrix 27 is also desired to be set to the same thickness, the black photosensitive resin 25 is applied to a thickness of 1.25 μm, and the exposure amount is adjusted so that the residual film rate is 80%. By doing so, it becomes possible to form the black matrix 27 in the flat surface.

Here, the residual film rate is defined as follows. Residual film rate: (formed pattern film thickness / applied film thickness) x
100 (%) For example, if the initial coating film thickness is 1.00 μm and the pattern film thickness obtained after exposure and development is 0.80 μm, the residual film ratio is 80%. The residual film rate can be reduced by reducing the exposure amount. This is because when the amount of exposure is small, the degree of crosslinking of the photosensitive resin is reduced, so that the exposed portion is also dissolved by development. By adjusting the residual film ratio, it is possible to form the black matrix 27 having the same thickness as the transparent partition layer 24.

As a result, as shown in (d),
A black matrix retaining layer 28 having a substantially uniform layer thickness is formed by the transparent partition layer 24 and the black matrix 27 on the glass substrate 20. In addition, the reduction of the residual film rate may be caused by, for example, reducing the exposure amount, by changing the solubility of the developing solution by, for example, using a developing solution having a high liquid temperature or using a developing solution having a high concentration. It is also possible to raise it.

Thereafter, the black matrix holding layer 28
A red colored photosensitive resin is applied on the top using a spin coater, a roll coater, or the like, and UV exposure is performed through a predetermined exposure mask to form red filter pixels R according to the arrangement pattern of the transparent partition layer 24. Similarly, green and blue colored photosensitive resins are used to form green filter pixels G and blue filter pixels B, and the aggregates thereof are substantially uniform as shown in (e). A colored layer 29 having a layer thickness is obtained on the black matrix retaining layer 28.

Thereafter, as shown in FIGS. 2 and 3, a flattening film 30 and a transparent electrode 31 are formed to complete one component panel of the liquid crystal display. Further, an example of a procedure for producing another color filter according to the present invention will be described below with reference to FIG. Note that, in FIG. 4, portions corresponding to those in FIG. 1 are denoted by the same reference numerals as those in FIG.

First, a red colored photosensitive resin is applied on the glass substrate 20 by using a spin coater, a roll coater or the like, and UV exposure is performed through a predetermined exposure mask to form red filter pixels R. Similarly, green and blue colored photosensitive resins are used to form green filter pixels G and blue filter pixels B, and the aggregates thereof are substantially uniform as shown in (a). A colored layer 29 having a layer thickness is obtained on the glass substrate 20.

Next, as shown in (b), the transparent photosensitive resin 21 is applied onto the colored layer 29 by spin coating or the like. Next, ultraviolet exposure is performed using an exposure mask 22 having an opening pattern opposite to that of the black matrix exposure mask 26, and development is performed to divide by a black matrix arrangement gap 23 as shown in (c). The transparent partition layer 24 is obtained.

Next, as shown in (d), the black photosensitive resin 2 is formed on the colored layer 29 having the transparent partition layer 24 laminated thereon.
5 is applied and UV exposure is performed using a black matrix exposure mask 26 having openings in a black matrix form, and a black matrix 27 is formed without gaps in the black matrix arrangement gaps 23 of the transparent partition layer 24 by development.

Also in this case, for example, if the transparent partition layer 24 has a layer thickness of 1.00 μm and the black matrix 27 is also desired to have the same thickness, the black photosensitive resin 25 is set to 1.25.
It is possible to form the black matrix 27 in a flat surface by applying the coating so as to have a thickness of μm and adjusting the exposure amount so that the residual film rate is 80%. As a result, as shown in (e), the black matrix retaining layer 28 having a substantially uniform layer thickness of the transparent partition layer 24 and the black matrix 27 is formed on the coloring layer 29.

After that, as shown in FIG. 5, a flattening film 30 and a transparent electrode 31 are formed to complete one component panel of the liquid crystal display. The transparent photosensitive resin forming the transparent partition layer 24 and the colored photosensitive resin forming the colored layer 29 preferably have the same base material. If it is the same material, it has good wettability,
This is because overcoating and adhesion between patterns are good.

In this technical means, a transparent photosensitive resin,
As a photosensitive resin component that constitutes a part of the colored photosensitive resin,
A water-soluble photosensitive resin having a photosensitive group, an oil-soluble photosensitive resin having a photosensitive group, a mixture of a binder resin and a photocrosslinking agent, or a mixture of a binder resin, a monomer or an oligomer and a polymerization initiator can be used. And as the water-soluble photosensitive resin having a photosensitive group, polyvinyl alcohol /
As the stilbazolium resin and the like, and as the oil-soluble photosensitive resin having a photosensitive group, a photocrosslinking photosensitive resin such as cinnamic acid resin can be applied.

As the binder resin, gelatin, casein, glue, carboxymethyl hydroxyethyl cellulose, hydroxyethyl cellulose, methyl cellulose, polyvinyl alcohol, polyvinyl pyrrolidone, polyvinyl methyl ether, polyacrylic acid, polyacrylamide, polydimethylacrylamide, polyethylene glycol, polyethylene. Imine, butyral resin, styrene-maleic acid copolymer, acrylic resin,
Acrylic acid, methacrylic acid, 2
-Hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, dimethylaminopropyl acrylate, dimethylaminopropyl methacrylate, dimethylaminopropyl methacrylamide, methacrylamide, methoxymethyl acrylamide, etc. can be used. As the photo-crosslinking agent used by mixing with this binder resin, dichromate, chromate,
Diazo resin, bisazide compound and the like can be applied.

As the monomer or oligomer used by mixing with the above-mentioned binder resin, acrylic acid,
Methacrylic acid, 2-hydroxyethyl acrylate, 2
-Hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, various other acrylic acid esters and methacrylic acid esters, vinyl acetate, acrylamide, methacrylamide, polyethylene glycol diacrylate, styrene, vinyl acetate, etc. can be used, and the above-mentioned polymerization initiators can be used. As, azobisisobutyl nitrile, benzoin alkyl ether, thioacridone,
Benzyl, benzophenone, anthraquinone, benzanthrone / triethanolamine, methylene blue / benzenesulfinate and the like can be applied.

Further, as a colorant used in the colored photosensitive resin, a phthalocyanine pigment, a quinacridone pigment, a dioxazine pigment, an azo lake pigment, an insoluble azo pigment, a condensed azo pigment, a perrin pigment, an isoindolinone pigment. Pigments such as anthraquinone pigments, perinone pigments, thioindico pigments, and carbon black can be used.

To disperse the pigment in the resin, it is possible to disperse the pigment by a ball mill, a side mill or the like, or by colliding at high pressure through an orifice or the like. Further, when it is difficult to directly disperse the pigment, it may be dispersed in polyvinyl alcohol, a surfactant or the like to prepare a colored paste before mixing with the photosensitive resin and then mixed with the photosensitive resin. A known glass substrate can be used as the transparent substrate, and a transparent synthetic resin or the like may be used.

[0027]

[Operation] Since the area defined by the black matrix is filled with a transparent partition layer having almost the same thickness as the black matrix, the transparent matrix layer and the black matrix have a substantially uniform layer thickness of the black matrix. A layer is formed.

Since the black matrix, that is, the black pattern is formed in the black matrix arrangement gaps of the transparent partition layer without any clearance, even if the black matrix (black pattern) has a large film thickness, its line width depends on the transparent partition layer. It is possible to obtain a highly accurate black matrix that is controlled and does not spread the line width.

[0029]

EXAMPLES Examples of the present invention will be described in detail below. First, the components of each constituent material will be described. (1) Transparent photosensitive resin 2-hydroxyethyl methacrylate 80 wt%, diethylaminopropyl methacrylamide 4 wt%, methacrylamide 2 wt%, methoxymethyl acrylamide 1
4 wt% was polymerized, and a diazo resin (Syncoat Giken: D-013) was mixed as a photocrosslinking agent so as to be 15 wt% with respect to the solid content of the above polymer to obtain a transparent photosensitive resin.
This transparent photosensitive resin can be used as both the transparent partition layer and the binder resin of the colored photosensitive resin.

(2) Coloring paste When the total solid content of the coloring paste is 100 wt%, red: permanent red as a red pigment is 60 in solid content.
wt%, green: chlorinated cyanine green as a green pigment at 60 wt% in solid content, blue: destabilized cyanine blue as a blue pigment and a 2: 1 mixture of dioxazine violet at 60 wt% in solid content
%, Black: copper phthalocyanine 4.5, isoindoline 4.0,
A mixture of dioxazine violet 1.5 and carbon black 1.5 at a solid content of 70 wt%.

With respect to each of the above red, green and blue color pigments, polyvinyl alcohol is 20 wt% in solid content and polyethylene glycol monooleyl ether is 20 wt% in solid content.
A sanding mill or a ball mill was used to disperse the mixture so that the above ratio was obtained to prepare a colored paste. With respect to the above black pigment, polyvinyl alcohol is 15 wt% in solid content, and polyethylene glycol monooleyl ether is 1 in solid content.
A sand mill and a ball mill were used to disperse the mixture so that the ratio was 5 wt% to prepare a colored paste.

(3) Colored Photosensitive Resin The colored photosensitive resin was prepared by mixing the transparent photosensitive resin of (1) and the colored paste of (2). The red, green, and blue colored photosensitive resins were prepared by mixing the transparent photosensitive resin and the colored paste so that the pigment solid content was 60 wt%. The black photosensitive resin was prepared by mixing the transparent photosensitive resin and the black paste so that the pigment solid content was 65 wt%.

Each colored photosensitive resin is 10 μm, 5
A colored photosensitive resin was obtained by sequentially performing filtration several times with a filter having a thickness of 1 μm. As the developing solution, an aqueous solution of alkylnaphthalene sulfonic acid 1.0% and malic acid 1.0 was used.

Example 1 A transparent resin of (1) was applied onto a glass substrate at a spin coater of 500 rpm at 1.0.
0 μm was applied. After drying on a hot plate at 60 ° C. for 3 minutes, a mask having an opening pattern opposite to that of the black matrix exposure mask (for stripe pattern: opening 90 × 300 μm;
Exposure at 15 mJ / cm ² through a space of 0.0 μm), development is immersed for 2 minutes, and then sprayed to obtain a film thickness of 1.
A transparent partition layer having a pattern opposite to that of the 00 μm black matrix was obtained. The line width is 30.0 μm in the area other than the transparent partition layer, that is, in the black matrix arrangement gap
The glass surface is exposed with a black matrix groove shape.

Then, the black photosensitive resin (3) was applied to the above surface by a spin coater at 400 rpm for 1.25 μm.
400 mJ / cm so that the residual film rate becomes 80% through a mask (30.0 μm line) having openings in a black matrix shape so that the film thickness becomes m.
² exposure, line width 30.0 μm with a film thickness of 1.00 μm without any gap in the black matrix arrangement gap of the transparent partition layer
Black pattern was formed. As a result, a black matrix pattern having no variation in line width was obtained. Further, the transparent partition layer and the black pattern had the same film thickness, and a flat surface was formed. The transmittance of the black matrix was in the range of 400 to 700 nm and exhibited a sufficient light-shielding property of 2% or less.

Thereafter, (3) the red colored photosensitive resin was applied onto the black matrix retaining layer consisting of the transparent partition layer and the black matrix described above using a spin coater 55.
Apply at 0 rpm to 0.80 μm, dry at 60 ° C. for 3 minutes, then expose (red: 150 mJ / cm ² ) through a mask having an opening of 116 × 326 μm at a predetermined position, develop (immersion 2 minutes After spraying, and drying at 100 ° C. for 5 minutes, a red pattern (red filter pixel) was provided on the transparent partition layer so as to overlap the black matrix. After that, in the same manner, green and blue (green: 700 rpm, 200 m)
J / cm ² , blue: 600 rpm, 100 mJ / cm ² )
A pattern (green and blue filter pixels) was formed in place. The film thickness was the same for each color, and a color filter pattern (coloring layer) of 0.80 μm was obtained. A polyimide-based resin flattening film (PSI-G4630, manufactured by Chisso Corp.) was coated on the filter pattern by 1.00 μm, and the flatness was measured by a contact step meter after heating and curing at 180 ° C. for 20 minutes. Good flatness with a difference of 0.02 μm was obtained.

Example 2 The red colored photosensitive resin (3) was applied onto a glass substrate at 550 rpm using a spin coater.
, 0.80 μm, dried at 60 ° C. for 3 minutes, exposed (red: 150 mJ / cm ² ) through a mask having an opening of 116 × 326 μm at a predetermined position, and developed (immersion 2
Min., Sprayed) and dried at 100 ° C. for 5 minutes, and then a red pattern (red filter pixel) was provided on the transparent partition layer so as to overlap the black matrix. After that, similarly, green and blue (green: 700 rpm, 200 mJ / c)
m ² , blue: 600 rpm, 100 mJ / cm ² ) pattern was formed at a predetermined position. The film thickness is the same for each color,
A color filter pattern (colored layer) of 0.80 μm was obtained.

Subsequently, the transparent resin (1) was applied onto the colored layer by a spin coater at 500 rpm at 1.00 μm. After drying on a hot plate at 60 ° C. for 3 minutes, a mask having an opening pattern opposite to that of the exposure mask for black matrix (for stripe pattern: opening 90 × 30)
0 μm, the adjacent pattern is 30.0 μm in both top and bottom
15 mJ / cm < ² >, the development was performed for 2 minutes, and then spraying was performed to obtain a transparent partition layer having a pattern opposite to that of the black matrix having a film thickness of 1.00 [mu] m. The portion other than the transparent partition layer, that is, the black matrix arrangement gap has a black matrix groove shape with a line width of 30.0 μm.

Next, the black photosensitive resin (3) was applied to the above surface by a spin coater at 400 rpm for 1.25 μm.
400 mJ / cm so that the residual film rate becomes 80% through a mask (30.0 μm line) having openings in a black matrix shape so that the film thickness becomes m.
² exposure, line width 30.0 μm with a film thickness of 1.00 μm without any gap in the black matrix arrangement gap of the transparent partition layer
Black pattern was formed. As a result, a black matrix pattern having no variation in line width was obtained. Further, the transparent partition layer and the black pattern had the same film thickness, and a flat surface was formed.

The transmittance of the black matrix is 400-
In the range of 700 nm, a sufficient light-shielding property of 2% or less was exhibited. A polyimide-based resin flattening film (PSI-G4630, manufactured by Chisso Corporation) was formed on the filter pattern by 1.00.
As a result of measuring the flatness with a contact type profilometer after coating with μm and heating and curing at 180 ° C. for 20 minutes, good flatness with a height difference of 0.02 μm was obtained.

Comparative Example 1 A black photosensitive resin was directly coated on a glass substrate and exposed through a mask having openings in a black matrix form, and a black matrix pattern having a thickness of 1.00 μm was obtained after development. The obtained pattern had a wide lower portion, a line width of 30.5 to 31.0 μm, a narrow opening, and was dark as a whole.

After that, as in the example, the red, blue, and green colored photosensitive resins were used to provide an overlap with the black matrix, and they were arranged on the surface with a film thickness of 0.80 μm, respectively.
A color filter pattern was obtained. Polyimide resin flattening film (Chisso Corporation: PS) on the filter pattern
I-G4630) was coated at 1.00 μm, and the flatness was measured by a contact type step meter after heat curing, and as a result, the height difference was 0.
It became as large as 20 μm.

[Comparative Example 2] Red, blue and green colored photosensitive resins were used on a glass substrate in the same manner as in the example, and the film thickness was 0.
An 80 μm color filter pattern was obtained. Subsequently, a black photosensitive resin is applied on the surface and exposed through a mask having openings in a black matrix shape, and after development, 1.0
A 0 μm thick black matrix pattern was obtained. The obtained pattern has a spread lower portion and a line width of 30.5 to 31.
It was 0 μm, the opening was narrow, and it became dark as a whole.

A flattening film of polyimide resin (PSI-G4630, manufactured by Chisso Corp.) was coated on the above filter pattern by 1.00 μm, and the flatness was measured by a contact type step meter after heat curing. It increased to 0.22 μm.

[0045]

As described above, according to the color filter for a liquid crystal display according to the present invention, even if a black photosensitive resin is used for the black matrix, a good film-thickness can be obtained with a large film thickness and the transparency is high. A high degree of flatness is obtained by introducing a partition layer. Further, since the black matrix is formed in the black matrix arrangement gap of the transparent partition layer without any gap, even if the thickness of the black matrix is thick, the line width growth thereof is restricted by the transparent partition layer and the line width does not widen. It becomes possible to obtain a highly accurate black matrix, and a color filter with a high pattern accuracy can be obtained.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a manufacturing process of a color filter for a liquid crystal display according to the present invention.

FIG. 2 is a cross-sectional view showing one component panel of a liquid crystal display including a color filter according to the present invention.

FIG. 3 is a plan view showing one component panel of a liquid crystal display including a color filter according to the present invention.

FIG. 4 is a cross-sectional view showing a process of manufacturing another color filter for a liquid crystal display according to the present invention.

FIG. 5 is a cross-sectional view showing one component panel of a liquid crystal display including another color filter according to the present invention.

FIG. 6 is a sectional view showing a conventional example of a color filter having a thick black matrix.

FIG. 7 is a cross-sectional view showing a general configuration of a liquid crystal display for color display.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Liquid crystal layer 2 Divided transparent electrode 3 Transparent glass substrate 4 Polarizing plate 5 Black matrix 6 Coloring layer 7 Flattening film 8 Common transparent electrode 9 Transparent glass substrate 10 Polarizing plate 20 Glass substrate 23 Black matrix arrangement gap 24 Transparent partition layer 27 Black Matrix 28 Black matrix holding layer 29 Coloring layer 30 Flattening film 31 Transparent electrode

Claims (4)

[Claims] 1. A black matrix for partitioning each pixel is formed on a transparent substrate, and an area portion partitioned by the black matrix is filled with a transparent partition layer having substantially the same thickness as that of the black matrix. A black matrix retaining layer having a substantially uniform layer thickness is formed on the transparent substrate by the black matrix, and a colored layer having a substantially uniform layer thickness is formed on the black matrix retaining layer. A color filter for a liquid crystal display, which is arranged according to the arrangement pattern of. 2. A coloring material of each color is arranged on a transparent substrate according to a predetermined pattern to form a coloring layer having a substantially uniform layer thickness, and a black matrix for partitioning each pixel is formed on the coloring layer. A region parted by the black matrix is formed so as to correspond to the pattern of the colored layer, and is filled with a transparent partition layer having substantially the same thickness as that of the black matrix. A color filter for a liquid crystal display, characterized in that a black matrix retaining layer having a substantially uniform layer thickness is formed on the. 3. A transparent partition layer is previously formed from a transparent photosensitive resin in each region partitioned by the black matrix while leaving a black matrix placement gap on the transparent substrate, and a black photosensitive resin is placed in the black matrix placement gap of the transparent partition layer. Is formed by embedding a black matrix according to the above in a film thickness substantially the same as that of the transparent partition layer, and a colored layer is formed on the transparent partition layer by a colored photosensitive resin of each color for each region partitioned by the black matrix. Method for manufacturing color filter for liquid crystal display. 4. A colored layer is formed of a colored photosensitive resin of each color on a transparent substrate according to a predetermined pattern, and a transparent photosensitive resin is preliminarily formed in each area defined by the black matrix leaving a black matrix arrangement gap on the colored layer. A transparent partition layer is formed by, and a black matrix made of a black photosensitive resin is embedded in a black matrix arrangement gap of the transparent partition layer to have a film thickness substantially the same as that of the transparent partition layer. Production method.