JPH10197716A - Production of color filter for liquid crystal - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain an inexpensive color filter which satisfies suitability for ink jet in addition to heat resistance, resistance to solvents, and resolution performance, and in which process is shortened by forming the layer of a specified silicone compound on a light shielding part, and arraying a specified coloring material on a light transmission part by an ink jet method. SOLUTION: The layer of the silicone compound whose surface energy is >=5.0 dyne/cm, and <=43.0 dyne/cm is formed on the light shielding part on the light transmissive base plate on which the light shielding part is formed, then the specified coloring material is arrayed on the light transmission part by the ink jet method. In this case, both ink of dyestuff and ink of pigment can be used as the ink to be used for coloring. Since the coloring material used in the ink jet uniformly extends on the surface of the light transmission part, and the adjacent light transmission part is partitioned by the light shielding part having the layer of the silicone including material; the scattering of the individual coloring material to the adjacent light transmission part, that is, color mixture is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter of a color liquid crystal display used in a color television, a personal computer, a pachinko game console, etc., and more particularly to a method of manufacturing a liquid crystal color filter using an ink jet recording technique. About.

[0002] The present invention also relates to a liquid crystal color filter manufactured using an ink jet recording technique and a liquid crystal panel provided with the color filter.

[0003]

2. Description of the Related Art In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, has been increasing. However, cost reduction is required for further widespread use. In particular, there is an increasing demand for cost reduction of color filters, which have a large proportion in cost.

Conventionally, various color filter manufacturing methods have been tried to satisfy the above requirements while satisfying the required characteristics of the color filters, but a method that satisfies all the required characteristics has not yet been established. . The respective methods will be described below.

[0005] The first method most frequently used is a dyeing method. In the dyeing method, first, a water-soluble polymer material, which is a material for dyeing, is formed on a glass substrate, and this is patterned into a desired shape by a photographic process. Then, the obtained pattern is immersed in a dyeing bath. Get a colored pattern. This is repeated three times to form R, G, B color filters.

[0006] The second method is a pigment dispersion method, which is recently replacing the dyeing method. In this method, first, a photosensitive resin layer in which a pigment is dispersed is formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. In addition, this step 3
The process is repeated twice to form R, G, and B color filter layers.

As a third method, there is an electrodeposition method. In this method, first, a transparent electrode is patterned on a substrate, and a pigment,
The first color is electrodeposited by dipping in an electrodeposition coating solution containing a resin and an electrolytic solution. This process is repeated three times to form R, G, B color filter layers, and finally firing.

A fourth method is to form a colored layer by dispersing a pigment in a thermosetting resin, repeating printing three times to separately apply R, G, and B, and then thermosetting the resin. Things. In either method, a protective layer is generally formed on the colored layer.

The common features of these methods are R,
In order to color the three colors G and B, it is necessary to repeat the same process using different coloring materials three times, which increases the cost. In addition, there is a problem that the yield decreases as the number of steps increases. Further, in the electrodeposition method, since the pattern that can be formed is limited, it is difficult to apply the current technology to a TFT. Further, the printing method is not suitable for forming a fine-pitch pattern due to poor resolution.

[0010]

In order to make up for these drawbacks, a method of manufacturing a color filter using ink jet is disclosed in Japanese Patent Application Laid-Open No. S59-5959.
Japanese Patent Application Laid-Open No. 63-75205, in which a bank is provided to prevent color mixing
JP-A-235901 and JP-A-1-217302 in which a light-shielding portion is formed with a black dye have been proposed, but are still insufficient.

An object of the present invention is to provide a method for manufacturing an inexpensive color filter which satisfies required characteristics such as heat resistance, solvent resistance, and resolution, satisfies ink jet suitability, and further has a reduced number of steps. An object of the present invention is to provide a highly reliable color filter manufactured by this method. In particular, it is an object of the present invention to provide a method of manufacturing a highly reliable liquid crystal color filter for preventing color mixing when arranging a coloring material by discharging ink using an ink jet.

[0012]

This object can be achieved by the following procedure. That is, the present invention provides: The surface energy is not less than 5.0 dyne / cm and 43.0 dyn on the light transmitting substrate on which the light shielding portion is formed.
A method for producing a liquid crystal color filter, comprising: forming a layer of a silicon compound having a thickness of e / cm or less on a light-shielding portion, and then arranging a predetermined coloring material on the light-transmitting portion by an inkjet method. 2. The silicon compound layer is characterized by containing a compound having a siloxane structure or a polysiloxane structure in a main chain or a side chain or a mixture of these compounds with an epoxy-based / acryl-based / amide-based resin, or a photosensitive silicon compound. 2. The method for manufacturing a liquid crystal color filter according to the above item 1. 3. 2. The method for manufacturing a liquid crystal color filter according to the above item 1, wherein the silicon compound layer contains a photocurable silicon compound. 4. 2. The method for producing a color filter for liquid crystal according to the item 1, wherein the silicon compound layer is provided with an ink absorbing function. 5. 2. The method for producing a liquid crystal color filter according to the above item 1, wherein the silicon compound layer imparts electrical insulation between the light shielding portion and the liquid crystal driving electrode. 6. 6. The method for producing a liquid crystal color filter according to the item 5, wherein all or a part of the liquid crystal driving electrode is disposed on a substrate on which the coloring material is arranged. 7. 2. A color filter for liquid crystal manufactured by the method according to the above 1. 8. A substrate having the color filter according to the item 7,
A liquid crystal panel having a substrate opposed thereto and a liquid crystal compound sealed between the two substrates. It is.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.

FIG. 1 shows an example of a method of manufacturing a liquid crystal color filter according to the present invention, and also shows an example of a configuration of a liquid crystal color filter according to the present invention.
In the present invention, a glass substrate is generally used as the substrate 2. However, the substrate 2 is not limited to a glass substrate as long as it has necessary properties such as transparency and mechanical strength as a liquid crystal color filter. FIG. 1A is a sectional view of a substrate in which a black matrix 1 is formed on a glass substrate. First, a silicon compound is applied on the substrate on which the black matrix is formed,
Baking is performed (FIG. 1B).

Here, the formed silicon compound layer 3
Does not necessarily have to have a flat surface as shown in FIG. However, the surface energy of this layer is 5.0 dy
It is necessary to use a polymer compound having a ne / cm or more and 43.0 dyne / cm or less.

Silicon compounds suitable for such requirements include γ-glycidoxypropyldimethoxysilane,
γ-glycidoxypropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ- (2-aminomethyl) aminopropyltrimethoxysilane, γ- (2-aminoethyl) aminopropylmethyldimethoxysilane,
γ-methacryloxypropyltrimethoxysilane, N-
β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane hydrochloride, γ-mercaptopropyltrimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltriacetoxysilane, tetramethoxysilane, dimethyl -Dimethoxysilane, trimethylmethoxysilane, hexamethyldisilazane, γ-anilinopropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane,
1 such as γ-mercaptopropylmethyldimethoxysilane
Species or mixtures of several are used. Alternatively, a high molecular compound such as an epoxy-based resin, an acrylic-based resin, or an amide-based resin may be mixed for appropriately adjusting the siloxane content and controlling the water repellency. Further, a silicone resin or polysiloxane in which the siloxane content is appropriately adjusted in the main chain or side chain is used.

Furthermore, it is also desirable to mix a fine particle filler such as SiO ₂ in the above mixture to improve the mechanical strength, further prevent the ink from spreading, and improve the ink absorbency.

Further, as the photo-curable compound, a positive photosensitive silicon compound in which a light-irradiated portion is solubilized is also used. Examples of the positive photosensitive silicon compound include an additive system such as a system obtained by adding a naphthoquinonediazide ester to an alkali-soluble siloxane or silsesquioxane, or a system obtained by adding a naphthoquinonediazide ester to a silicon-modified novolak resin; Modified acrylic resin, polysilane, or the like can be used. For forming the photosensitive silicon compound layer, a coating method such as spin coating, roll coating, bar coating, spray coating, dip coating and the like can be used, and there is no particular limitation.

After the formation of the silicon compound layer, the light shielding portion is patterned by an exposure and development process (FIG. 1).
(C)). As the photomask 4 at the time of exposure, a photomask having an opening for exposing a portion other than the light-shielding portion is used. At this time, it is desirable to use a mask having a pattern wider than the light transmitting portion, considering that it is necessary to project a large amount of ink in order to prevent color loss of the ink.

After the exposure, development is performed to remove the silicon compound layer in the exposed portion, which is mainly the light transmitting portion. For the development, a known method, for example, a method in which a silicon compound is dissolved in an alkaline aqueous solution and then rinsed with pure water can be used.

Next, R, R
Each color of G and B is colored (FIG. 1D), and ink drying is performed as necessary. As the ink used for coloring, both a dye-based ink and a pigment-based ink can be used. The coloring material used in the ink jet is usually from 30 dyne / cm to 50 dyne / cm.
Since it has a surface tension of dyne / cm, it spreads uniformly on the surface of the light-transmitting portion, and furthermore, the adjacent light-transmitting portion is defined as having a surface energy of 5.0 dyne / cm or more.
Since it is separated by a light-shielding portion having a silicon-containing material layer of 3.0 dyne / cm or less, scattering of individual coloring materials to an adjacent light transmitting portion, that is, color mixing can be prevented. Further, for the purpose of improving the fixability of the ink, an ink-absorbing resin layer may be provided in advance on the colored portion.

As the ink-absorbing resin, polyvinyl alcohol, polyvinylpyrrolidone, cellulose derivatives such as hydroxypropylcellulose, water-soluble acrylic resin, and the like are preferably used. The resin is formed in a colored portion in a matrix or on the entire surface of the substrate. be able to. Furthermore, as an ink jet, a bubble jet type using an electrothermal converter as an energy generating element, a piezo jet type using a piezoelectric element, or the like can be used.
The coloring area and the coloring pattern can be set arbitrarily.

Next, a protective layer 6 is formed if necessary (FIG. 1 (f)). As the protective layer, a photocurable type, a thermosetting type or a photocurable type resin material, an inorganic film formed by vapor deposition, sputtering, or the like can be used, and has transparency when used as a color filter. Any material that can withstand the ITO forming process, the alignment film forming process, and the like can be used.

FIG. 2 shows a cross section of a TFT color liquid crystal panel incorporating a color filter according to the present invention. The mode is not limited to this example.

A color liquid crystal panel is generally formed by combining a color filter substrate and a counter substrate and enclosing a liquid crystal compound. TFTs (not shown) and transparent pixel electrodes are formed in a matrix inside one substrate of the liquid crystal panel. In addition, a color filter in which RGB color materials are arranged at a position facing the pixel electrode is provided inside the other substrate, and a transparent counter electrode is formed thereon. Further, an alignment film is formed in the plane of both substrates, and rubbing the alignment film allows liquid crystal molecules to be aligned in a certain direction.

A polarizing plate is adhered to the outside of each glass substrate, and the liquid crystal compound is filled in the gap (about 2 to 5 μm) between these glass substrates. As a backlight, a combination of a fluorescent lamp (not shown) and a scattering plate (not shown) is generally used, and display is performed by making a liquid crystal compound function as an optical shutter for changing the transmittance of backlight. .

[0027]

The present invention will be described below in detail with reference to examples.

Example 1 As a silicon compound material, a methanol solution having a composition of γ-glycidoxypropyltrimethoxysilane 30% by weight tetramethoxysilane 10% by weight methyltrimethoxysilane 10% by weight dimethyldimethoxysilane 10% by weight A 20% by weight methanol solution of a photocurable acrylic resin (YK-7, manufactured by Nippon Kayaku Co., Ltd.) is mixed in the same amount, and the mixture is mixed with fine particles of SiO ₂ (Nip Seal manufactured by Nippon Silica Industry Co., Ltd.). 5% by weight
Disperse and prepare so that Next, the above material was coated on a glass substrate on which a black matrix was formed to a thickness of 2 μm.
And prebaked at 110 ° C. for 3 hours. Next, through a photomask having a light shielding portion narrower than the width of the black matrix,
Pattern exposure was performed at an exposure amount of mJ / cm ² , and development was performed to form a pattern on the black matrix. At this time, the surface energy of the light shielding portion is 10 dyne
/ Cm. Next, after the R, G, and B matrix patterns are colored with a pigment ink (surface energy 30 dyn / cm) using an inkjet recording apparatus, 90
The ink was dried at a temperature of 5 ° C. for 5 minutes. Further, as a protective layer, a two-part type thermosetting resin SS-7625 (manufactured by JSR)
Is roll-coated so as to have a film thickness of 1 μm.
Heat cured for hours to cure.

When the thus prepared color filter for liquid crystal was observed with an optical microscope, no color mixture was observed.

Example 2 On a glass substrate on which a black matrix was formed, a positive-type photosensitive silicon compound whose light-irradiated portion was solubilized was spin-coated so as to have a thickness of 5 μm, and heated at 90 ° C. for 30 minutes. Then, pattern exposure was performed from the back surface of the substrate at an exposure amount of 150 mJ / cm ² , and development was performed to form a silicon compound pattern on the black matrix.

Thereafter, the same operation as in the first embodiment is performed.
A silicon compound layer was formed on the light-shielding portion so that the film thickness became 5 μm. At this time, the surface energy of the light-shielding portion was 43 dyne / cm. Next, the pigment ink (surface energy 50 d
yn / cm), the R, G, and B matrix patterns were colored, and the ink was dried at 90 ° C. for 5 minutes.
Further, a two-component thermosetting resin SS-762 is used as a protective layer.
5 (manufactured by JSR Corporation) was roll-coated so as to have a film thickness of 1 μm, and was cured by heat treatment at 230 ° C. for 1 hour. When the thus prepared color filter for liquid crystal was observed with an optical microscope, no color mixture was observed.

Example 3 On a glass substrate having a black matrix formed thereon, a silicon compound pattern was formed on the black matrix in the same manner as in Example 2. At this time, the silicon resin (SR2410 resin manufactured by Toray Silicone Co., Ltd.) has a thickness of 4 μm.
m by spin coating. At this time,
The surface energy of the light-shielding portion was 5 dyne / cm. Next, R, G, and R were obtained using a pigment ink (surface energy 35 dyn / cm) using an inkjet recording apparatus.
After coloring the matrix pattern B, the ink was dried at 90 ° C. for 5 minutes. Further, a two-part thermosetting resin SS-7625 (manufactured by JSR Corporation) having a thickness of 1 μm is used as a protective layer.
m, and cured by heat treatment at 230 ° C. for 1 hour. When the thus prepared color filter for liquid crystal was observed with an optical microscope, no color mixture was observed.

Example 4 On a glass substrate on which a black matrix was formed, a positive photosensitive silicon compound in which a light irradiation part was solubilized
A silicon mixture to which 15% by weight of aminopropyltriethoxysilane is added is spin-coated so as to have a film thickness of 2 μm, heated at 90 ° C. for 30 minutes, and 3 mJ / m from the back surface of the substrate.
Pattern exposure was performed at an exposure amount of cm ² and development processing was performed to form a silicon compound pattern on the light-shielded portion. At this time, the surface energy of the light shielding portion is 20 dyne /
cm.

Next, the R, G and B matrix patterns were colored with a pigment ink (surface energy 40 dyn / cm) using an ink jet recording apparatus,
For 5 minutes to dry the ink. Further, as a protective layer, a two-component thermosetting resin SS-7625 (manufactured by JSR Corporation) was roll-coated so as to have a film thickness of 1 μm, and cured by heat treatment at 230 ° C. for 1 hour. When the thus prepared color filter for liquid crystal was observed with an optical microscope, no color mixture was observed.

Example 5 A mixture composed of an ink water-absorbent resin composition composed of hydroxypropylcellulose and methylolamine and tetraethoxysilane was spin-coated on a glass substrate having a black matrix formed thereon to a thickness of 1 μm.
Heating was performed at 90 ° C. for 10 minutes to form an ink-absorbing resin layer. Subsequently, dimethylpolysilane was applied to a thickness of 0.5
It was spin-coated to a thickness of μm and prebaked at 90 ° C. for 20 minutes. Next, through a photomask having a light shielding portion narrower than the width of the black matrix, 300
Pattern exposure was performed at an exposure amount of mJ / cm ² and development processing was performed to form a silicon compound pattern on a black matrix. At this time, the surface energy of the light shielding portion is
It was 15 dyne / cm.

Next, the R, G and B matrix patterns were colored with a pigment ink (surface energy 38 dyn / cm) using an ink jet recording apparatus.
For 5 minutes to dry the ink. Further, as a protective layer, a two-component thermosetting resin SS-7625 (manufactured by JSR Corporation) was roll-coated so as to have a film thickness of 1 μm, and cured by heat treatment at 230 ° C. for 1 hour. When the thus prepared color filter for liquid crystal was observed with an optical microscope, no color mixture was observed.

Example 6 On a glass substrate having a black matrix formed thereon, 30% by weight of γ-glycidoxypropyltrimethoxysilane prepared in advance 10% by weight of tetramethoxysilane 10% by weight of methyltrimethoxysilane 10% by weight of dimethyldimethoxysilane 10 Spin-coated with a methanol solution having a mixing ratio of
Baking is performed at 0 ° C. for 1 hour to form an electrically insulating silicon compound layer. At this time, the surface energy of the light-shielding portion was 8 dyne / cm.

Next, the R, G, and B matrix patterns were colored with a pigment ink using an ink jet recording apparatus, and the ink was dried at 90 ° C. for 5 minutes. Next, an ITO liquid crystal driving electrode was formed by a sputtering method. The light-shielding portion of the liquid crystal color filter thus formed and the liquid crystal driving electrode were kept electrically insulative, and when observed by an optical microscope, no color mixture was observed.

Comparative Example 1 On a glass substrate on which a black matrix was formed, R, G,
After coloring the matrix pattern B, the ink was dried at 90 ° C. for 5 minutes. Further, a two-part type thermosetting resin SS-7625 (manufactured by JSR) as a protective layer is 1 μm thick.
Then, it was subjected to a heat treatment at 230 ° C. for 1 hour to be cured. Since the surface on which the coloring material is colored is the substrate glass surface, the surface energy is usually about 100 dy.
Ne / cm or more.

When the thus prepared color filter for liquid crystal was observed with an optical microscope, mixed colors were observed.

[0041]

By employing the method for manufacturing a color filter for liquid crystal according to the present invention, a highly reliable color filter for liquid crystal without color mixing can be manufactured at low cost.

[Brief description of the drawings]

FIG. 1 is a process chart showing an example of a method for manufacturing a liquid crystal color filter according to the present invention.

FIG. 2 is a sectional view of an example of a liquid crystal panel incorporating a color filter according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Black matrix 2 Substrate 3 Silicon compound layer 4 Photomask 5 Inkjet head 6 Protective layer

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Koji Kono 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (72) Inventor Toshiaki Yoshikawa 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inside the corporation

Claims (8)

[Claims] A surface energy of 5.0 dyne / cm or more is formed on a light-transmitting substrate on which a light-shielding portion is formed.
A method of manufacturing a liquid crystal color filter, comprising: forming a silicon compound layer having a density of 3.0 dyne / cm or less on the light-shielding portion, and then arranging a predetermined coloring material on the light-transmitting portion by an inkjet method. 2. A compound in which the silicon compound layer has a siloxane structure or a polysiloxane structure in a main chain or a side chain, or a mixture of these compounds with an epoxy-based, acrylic-based, or amide-based resin, or a photosensitive silicon compound. The method for producing a liquid crystal color filter according to claim 1, comprising: 3. The method according to claim 1, wherein the silicon compound layer contains a photocurable silicon compound. 4. The method for producing a color filter for a liquid crystal according to claim 1, wherein an ink-absorbing function is imparted to the silicon compound layer. 5. The method for producing a liquid crystal color filter according to claim 1, wherein the silicon compound layer imparts electrical insulation between the light shielding portion and the liquid crystal driving electrode. 6. The method for producing a liquid crystal color filter according to claim 5, wherein all or a part of the liquid crystal driving electrode is disposed on a substrate on which the coloring material is arranged. 7. A liquid crystal color filter produced by the method according to claim 1. 8. A liquid crystal panel comprising a substrate having the color filter according to claim 7 and a substrate facing the substrate, wherein a liquid crystal compound is sealed between the two substrates.