JP2000150365A - Liquid process device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent a process liquid splashed from a substrate from re-sticking to the substrate by providing a rebound suppressor inside a process vessel for suppressing rebound of the process liquid splashed from the substrate. SOLUTION: With mesh-like rebound suppressors 54, 55, and 56 provided in triplet inside an outside vessel 51, a process liquid, or a liquid comprising a developer liquid, is suppressed from re-sticking to an LCD substrate G after rebound. The process liquid splashing from the rotating LCD substrate G reduces significantly in splash amount due to the rebound suppressors 54, 55, and 56 while its momentum significantly weakened, to reach the internal peripheral surface of the outside vessel 51. Thus, the amount of process liquid rebounding on the internal peripheral surface of the outside vessel 51 is less, with its momentum weakened. Even if the process liquid reaching the internal peripheral surface of the outside vessel 51 rebounds on the internal peripheral surface, it re-collides with the suppressors 56, 55, and 54 in this order for reduced amount and weakened momentum.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a liquid processing apparatus for supplying a processing liquid to a substrate for processing.

[0002]

2. Description of the Related Art Generally, a liquid crystal display (LC)
D) In the manufacturing process of the device, in order to form, for example, a thin film of ITO (Indium Tin Oxide) or an electrode pattern on the LCD substrate, a circuit pattern or the like is exposed on a photoresist on the surface of the LCD substrate using a photolithography technique. After that, the LCD substrate is developed.

[0005] As a developing process for an LCD substrate, a paddle method has been conventionally used. In the paddle type LCD substrate developing process, first, the LCD substrate held by the spin chuck is housed in a cup, and then the developing solution supply nozzle having a large number of developing solution discharge ports is scanned in the long side direction of the LCD substrate. As a result, a uniform liquid film of the developing solution is formed on the surface of the LCD substrate. Next, after the LCD substrate is stopped for a predetermined time, the developing solution on the LCD substrate is shaken off while rotating the LCD substrate at a high speed, and a rinsing liquid is supplied to wash the developing solution.

[0004]

However, in the prior art, since the LCD substrate is rotated when the rinsing liquid is supplied, the rotation causes a processing liquid such as a developing solution or a rinsing liquid on the LCD substrate to scatter around the LCD substrate. There was a case where the inner surface of the cup collided. In addition, since the inner peripheral surface of the conventional cup is formed to be smooth, the scattered processing liquid bounces off the inner peripheral surface of the cup, and may reattach to the LCD substrate. As a result, the re-adhered processing liquid may cause a failure in the development processing. Further, the scattered developer sometimes contaminates the atmosphere in the cup. This also applies to a resist coating apparatus that diffuses a resist solution as a processing liquid onto a substrate, and a scrubber cleaning apparatus that rotates a substrate by supplying a cleaning liquid such as pure water to the substrate.

[0005] The present invention has been made in view of the above, and an object of the present invention is to provide a novel liquid processing apparatus in which a processing liquid scattered from a substrate does not adhere to the substrate again.

[0006]

In order to achieve the above object, according to the present invention, a processing liquid is supplied onto a substrate in a processing container, and the processing liquid is supplied to the substrate by rotating the substrate. A liquid processing apparatus configured to be diffused upward or shake off from above a substrate, wherein a bounce suppressor for suppressing bounce of a processing liquid scattered from the substrate is provided inside the processing container. A liquid processing apparatus is provided.

In the liquid processing apparatus according to the first aspect,
Since the processing liquid scattered from the rotating substrate collides with the rebound suppressing body, the momentum of the processing liquid rebounding by the suppressing body is reduced. As a result, the amount of the processing liquid that reaches the substrate and adheres again is reduced. The processing liquid referred to in the present specification includes not only a developing liquid in a developing processing apparatus and a resist liquid in a resist coating apparatus but also a cleaning liquid such as pure water in a scrubber cleaning apparatus or a high-pressure jet cleaning apparatus. .

According to a second aspect of the present invention, in the liquid processing apparatus of the first aspect, the rebound suppressing member is a mesh-shaped member or a member having a large number of holes.

In the liquid processing apparatus according to the second aspect,
A portion of the processing liquid scattered from the substrate collides with the rebound suppressing member, which is a mesh-shaped member, or the rebound suppressing member, which is a member having a large number of holes, and the rest is weakened through the eyes and holes of the mesh. It reaches the inner circumference of the processing vessel. Therefore, the amount of the processing liquid reaching the inner periphery of the processing container is reduced, and the momentum at the time of arrival is reduced. As a result, rebound to the substrate can be suppressed. Further, even if the processing liquid that has reached the processing container rebounds on its inner wall, the processing liquid that has rebounded again collides with the above-described mesh-like rebound suppressing body or the rebound suppressing body having a large number of holes before reaching the substrate. I do. Therefore, also from this point, rebound to the substrate is suppressed.

According to a third aspect of the present invention, in the liquid processing apparatus according to the second aspect, the rebound suppressing member is provided in a multiplex manner.

[0011] In the liquid processing apparatus according to the third aspect,
By providing multiple rebound suppressing bodies according to the second aspect, the momentum is gradually reduced, and the amount of collision with the rebound suppressing bodies increases stepwise. Therefore, it is possible to further suppress the rebound to the substrate as compared with the second aspect.

According to a fourth aspect of the present invention, in the liquid processing apparatus according to the third aspect, an aperture ratio of the rebound suppressing member is set to be larger for the rebound suppressing member located on the substrate side. Features.

[0013] In the liquid processing apparatus according to the fourth aspect,
Since the aperture ratio is set larger for the rebound suppressing member located on the substrate side, the processing liquid scattered from the substrate is gradually reduced in its momentum, and the amount of the processing liquid colliding with the rebound suppressing member increases. Therefore, the amount of the processing liquid rebounding from the rebound suppressing body located closest to the substrate is reduced. Even if the processing liquid scattered from the substrate reaches the processing container and rebounds on the inner wall of the processing container, the processing liquid rebounds in a large amount by the rebound suppressing body itself having the smallest aperture ratio and located closer to the processing container. Become. Therefore, the amount of the processing liquid re-adhering to the substrate is smaller than in the third aspect. When the rebound suppressing member is in a mesh shape, the aperture ratio can be set large by making the eyes on the substrate side coarse.
If a large number of holes are formed in the bounce control body,
The size of the aperture ratio can be set according to the size of the hole diameter and the number of holes.

The invention according to claim 5 is the invention according to claims 1, 2,
In the liquid processing apparatus described in 3 or 4, at least the bounce suppressor located on the substrate side is formed in a waveform when viewed from the plane of the processing container.

In the liquid processing apparatus according to the fifth aspect,
A part of the processing liquid scattered from the substrate is rebounded by the rebound suppressing body, and the rebound suppressing body is formed in a waveform when viewed from a plane. Therefore, the rebound angle can be changed, and the rebound processing liquid can be suppressed from scattering toward the substrate. More specifically, by setting the angle of the waveform so that the processing liquid scattered from the substrate does not rebound in the incident direction when colliding with the rebound suppressing body,
It is possible to prevent the processing liquid from scattering toward the substrate.

The invention according to claim 6 is the invention according to claims 1, 2,
The liquid processing apparatus according to 3, 4, or 5, further comprising a cleaning device for cleaning the bounce suppressing body with a cleaning liquid.

In the liquid processing apparatus according to the sixth aspect,
The processing liquid attached to the bounce suppressor can be washed away with the cleaning liquid. Therefore, it is possible to prevent the inside of the processing container from being contaminated by the processing liquid that has adhered thereto.

[0018]

Embodiments of the present invention will be described below with reference to the accompanying drawings. 1 and 2 show the appearance of a coating and developing apparatus having the developing apparatus according to the present embodiment. FIG. 1 is a perspective view, and FIG. 2 is a plan view.

As shown in FIGS. 1 and 2, the coating and developing apparatus 1 includes a loader section 2 for loading and unloading a rectangular LCD substrate G, a first processing section 3 for processing the LCD substrate G, and a first processing section 3. A second processing unit 5 connected via a first processing unit 3 and an interface unit 4, and an LCD substrate G is exchanged between the second processing unit 5 and, for example, an exposure apparatus (not shown). And an interface unit 7 for performing the operation.

The loader section 2 is provided with a cassette mounting table 10, and the cassette mounting table 10 stores, for example, cassettes 11 for storing unprocessed LCD substrates G and a processed LCD substrate G. Cassettes 12, 12
Can be mounted in a line with the entrance of the LCD substrate G facing the first processing unit 3 side. Further, the loader unit 2 is provided with a sub-transport device 13 capable of transporting the LCD substrate G.

The sub-transport device 13 is provided with a direction (Y direction) along the transport rail 13a and an LCD in each of the cassettes 11 and 12.
It is movable in the storage direction (Z direction) of the substrate G, and θ
It is configured to be rotatable in any direction.

In the first processing section 3, various processing apparatuses for performing a predetermined processing on the LCD substrate G are disposed on both sides of the transfer rail 16 of the main transfer apparatus 15. That is,
On one side of the transport rail 16, a scrubber cleaning device 17 for cleaning the LCD substrate G taken out of each of the cassettes 11, 11 and a developing device 18 for performing a developing process on the LCD substrate G are arranged side by side. On the other side of the transport rail 16, an ultraviolet ozone cleaning device 19, cooling devices 20 and 21 for cooling the LCD substrate G, and a heating device 22 for heating the LCD substrate G are arranged in multiple stages. .
The loading and unloading of the LCD substrate G to and from these various processing apparatuses is performed by a transfer arm 15a provided in the main transfer device 15. The interface unit 4 formed between the first processing unit 3 and a second processing unit 5 described later is provided with a transfer table 23 on which the LCD substrate G can be mounted.

The second processing unit 5 includes a coating / peripheral removing device 2 on one side of the main transporting device 25 across the transporting rail 26.
7 is disposed, and on the other side of the transfer rail 26,
Hydrophobizing device 28 for performing hydrophobizing treatment on LCD substrate G
, A cooling processing device 29 for cooling the LCD substrate G, and heating processing devices 30 and 30 are arranged in multiple stages. In addition,
The main transfer device 25 is provided with a transfer arm 25a for loading and unloading the LCD substrate G to and from various processing devices belonging to the second processing unit 5.

The interface unit 7 includes an LCD substrate G
Cassettes 31, 31 for temporarily storing and waiting
A transfer table 32 on which the LCD substrate G can be placed, cassettes 31, 31, a transfer table 32, and an exposure device (not shown)
And a sub-transport device 33 capable of transporting the LCD substrate G.

The coating and developing apparatus 1 is configured as described above. Next, the developing device 18 incorporated in the coating and developing device 1 will be described. FIG. 3 is a schematic plan view of the developing device 18, and FIG. 4 is a sectional view thereof.

The developing device 18 comprises a spin chuck 3 for holding the LCD substrate G horizontally in a casing 18a.
5, a developing solution supply nozzle 36 for supplying a developing solution to the LCD substrate G held by the spin chuck 35, and a rinsing solution such as deionized water or pure water on the surface of the LCD substrate G after supplying the developing solution. A rinsing liquid supply nozzle 37 for supply;
A spin chuck 35 and a cup 38 as a processing container arranged so as to surround the LCD substrate G are provided.

An air suction unit (not shown) is provided on the top surface of the spin chuck 35. The suction of the air supply unit (not shown) causes the spin chuck 35 to move to the LCD.
The rear surface of the substrate G is adsorbed and placed horizontally. Further, the lower surface of the spin chuck 35 is attached to the upper surface of a column 40 connected to an elevating and rotating mechanism 39 provided below the cup 38, and the spin chuck 35 is moved up and down by the operation of the elevating and rotating mechanism 39. And it is comprised so that rotation is possible.

The developer supply nozzle 36 is arranged above the cup 38, and a developer supply tube 41 for supplying a developer is connected to the inside thereof. On the lower surface of the developing solution supply nozzle 36, the developing solution discharge ports 42 are provided in a state of being densely arranged in the longitudinal direction, so that the developing solution does not have a gap from the discharge ports 42 to the LCD substrate G. In this state, the film is discharged in a film form. A bracket 43 is connected to one end of the developer supply nozzle 36, and the bracket 43 is engaged with a ball screw shaft 45 rotated by a motor 44. Therefore, the developer supply nozzle 36 is movable by the motor 44 in the long side direction of the LCD substrate G.

The rinsing liquid supply nozzle 37 is disposed above the cup 38, and a rinsing liquid supply tube 46 is connected to the upper part thereof.
7 are provided. Then, the rinsing liquid supply nozzle 37
Is movable along the long side direction of the LCD substrate G by a driving mechanism (not shown).

The cup 38 has a shape with an open top surface, a lower container portion 48 on the bottom surface, a container base 49 arranged to surround the outer periphery of the lower container portion 48, and an LCD held by the spin chuck 35. The inner container 50 has an inclined surface 50a that is inclined upward on the back side of the substrate G, and an outer container 51 disposed on the outer peripheral side of the inner container 50.
The outer container 51 is formed so as to be able to move up and down by lifting means (not shown). The developer and the rinsing liquid scattered inside the cup 38 are drained from a drain pipe 52 connected to the bottom surface on the lowermost side of the container base 49, and the atmosphere in the cup 38 is changed to an exhaust pipe 53 connected to the container lower part 48. It is designed to be exhausted from.

Further, between the LCD substrate G and the outer container 51, anti-bounce members 54, 55 and 56 are provided in order from the inside. These bounce restraints 54, 55,
As shown in FIG. 5, reference numerals 56 are formed in a mesh shape, and the meshes are finer in this order. That is,
The aperture ratio is the largest for the innermost bounce suppressor 54, and then decreases in the order of the bounce suppressors 55 and 56.

Appropriate supporting members (not shown) serving also as spacers are provided between the rebound suppressing bodies 54 and 55, between the rebound suppressing bodies 55 and 56, and between the outer container 51 and the rebound suppressing body 56, respectively. Are sandwiched, and the rebound suppressing body 54,
55, between the bounce suppressing bodies 55, 56, the outer container 51
An air gap is formed between the bounce control body 56 and the bounce control body 56.

The shape of the bounce suppressors 54, 55, 56 may be a single substantially annular member along the inner peripheral surface of the outer container 51, or may be appropriately divided into arcs to form a module. You may attach it.

The developing apparatus 18 according to the embodiment of the present invention is configured as described above. Next, the operation and effect of the developing device 18 will be described.

When the cassette 11 containing the unprocessed LCD substrate G is mounted on the cassette mounting table 10, the sub-transport device 13 takes out one LCD substrate G, and
Is transferred to the main transport device 15. The main carrier 15 will be
The LCD substrate G is sequentially conveyed to the ultraviolet ozone cleaning device 19 and the scrubber cleaning device 17. The LCD substrate G is subjected to predetermined processing by these devices, and then conveyed to the transfer table 23.

The LCD substrate G transferred to the transfer table 23 is transferred by the main transfer device 25 to the hydrophobic treatment device 28,
The wafers are sequentially transported to the cooling processing device 29, the coating / peripheral portion removing device 27, and the heating processing device 30, and after being subjected to predetermined processing by these processing devices, are transported to the transfer table 32.
The LCD substrate G transferred to the transfer table 32 is transferred to an exposure device (not shown) by the sub-transfer device 33 and exposed. The LCD substrate G after the exposure processing is transferred again to the transfer table 32 by the sub-transport device 33.

Thereafter, the LCD substrate G is sequentially transferred from the transfer table 32 to the heating processing device 30 and the cooling processing device 29 by the main transfer device 25, and is transferred to the transfer table 23 after being heat-treated by these processing devices. It is. Then, the LCD substrate G is transferred from the transfer table 23 to the developing device 18 by the main transfer device 15 and is transferred to the spin chuck 35 raised by the transfer arm 15a and is held by suction.

Thereafter, the LCD substrate G is accommodated in the cup 38 by lowering the spin chuck 35. Then, the developer supply nozzle 36 scans along the long side direction of the LCD substrate G while supplying the developer from one edge to the other edge of the LCD substrate G. With this, LCD
A liquid film of the developing solution having a uniform thickness is formed on the surface of the substrate G.

Thereafter, the surface of the LCD substrate G on which the uniform liquid film has been formed is stopped for a predetermined time to develop the surface of the LCD substrate G. Then, the LCD substrate G after the development is rotated to shake off the developing solution on the LCD substrate G, and the rinsing liquid supply nozzle 3 is supplied to the rotating LCD substrate G.
A rinsing liquid is supplied from 7 to wash away the developer adhering to the surface of the LCD substrate G.

In the present embodiment, as shown in FIG.
4, 55, 56 are provided in three layers,
That is, the liquid containing the developer component is scattered and rebounds, and LC
Reattachment to the D substrate G is suppressed.

That is, the processing liquid scattered from the rotating LCD substrate G first reaches the rebound suppressing member 54 on the spin chuck 35 side. Then, a part of the scattered processing liquid collides with the rebound suppressing member 54, flows down the rebound suppressing member 54, and the rest passes as it is. Therefore, the amount of the processing liquid that scatters after passing through the rebound suppressing member 54 is smaller than the amount at the beginning. In addition, due to this collision, the processing liquid that has passed through the rebound suppressing member 54 has a weaker momentum.

The processing liquid that has passed through the bounce suppressor 54 is
Next, it reaches the rebound suppressing member 55. Also in the rebound suppressing body 55, as in the case of the rebound suppressing body 54, the amount of the processing liquid that passes through the rebound suppressing body 55 and scatters due to the scattered processing liquid colliding with the rebound suppressing body 55. And the scattered momentum is reduced. In this case, since the bounce suppressing body 55 is finer than the bounce suppressing body 54, the bounce suppressing body 55
The amount of the processing liquid that is reduced by the collision with the liquid is greater than that in the case of the bounce suppressor 54, and the momentum is further reduced.

The processing liquid that has passed through the bounce suppressor 55 is
Next, it reaches the rebound suppressing member 56. And also in this bounce suppressing body 56, the bounce suppressing bodies 54 and 55
As in the case of, the amount of the scattered processing solution is further reduced,
And the momentum is even weaker. And the bounce suppressing body 5
6 has a finer eye than the rebound suppressing body 55, the amount of the processing liquid that is reduced due to the collision with the rebound suppressing body 56 is larger than that of the rebound suppressing body 55, and the momentum is further reduced.

In this way, the processing liquid scattered from the rotating LCD substrate G is applied to these bounce suppressors 54, 55, 56.
As a result, the amount of scatter is greatly reduced, and the momentum reaches the inner peripheral surface of the outer container 51 in a state where the momentum is extremely weakened. Therefore, the amount of the processing liquid that rebounds on the inner peripheral surface of the outer container 51 decreases, and the momentum also decreases. Further, even if the processing liquid that has reached the inner peripheral surface of the outer container 51 rebounds on the inner peripheral surface, the processing liquid again collides in the order of the bounce suppressors 56, 55, and 54, so that the amount thereof further decreases, and The momentum also weakens. Therefore, it is possible to effectively prevent the processing liquid splashed on the inner peripheral surface of the outer container 51 from re-adhering to the LCD substrate G.

Since the bounce suppressor 54 having the coarsest aperture, that is, the largest aperture ratio, is disposed on the LCD substrate G side, the processing liquid scattered from the LCD substrate G easily passes through the bounce suppressor 54, The amount of the processing liquid that rebounds from the rebound suppressing body 54 itself is extremely small. Therefore, it is possible to effectively suppress the processing liquid rebounded by the rebound suppressing body 54 from re-adhering to the LCD substrate G.

On the other hand, since the bounce suppressor 56 having the finest eye, that is, having the smallest aperture ratio, is disposed on the outer container 51 side, the processing liquid bounced on the inner peripheral surface of the outer container 51 is prevented from splashing. The collision amount increases, and it becomes difficult to pass through the rebound suppressing body 56. And outer container 5
Even if the processing liquid that has rebounded on the inner peripheral surface of 1 passes through the rebound suppressing body 56, the momentum is greatly reduced. Therefore, also from this point, it is possible to effectively suppress the processing liquid that has rebounded on the inner peripheral surface of the outer container 51 from re-adhering to the LCD substrate G.

As described above, in the present embodiment, the processing liquid scattered from the rotating LCD substrate G can be effectively prevented from re-adhering to the LCD substrate G.
Accordingly, development defects due to the re-adhesion can be suppressed. In addition, the scattered processing liquid is prevented from splashing.
Since the momentum gradually decreases each time the light passes through 4, 55 and 56, contamination of the atmosphere in the cup 38 can be effectively prevented.

Further, these bounce suppressors 54, 5
It is more preferable to provide a cleaning device (not shown) for supplying a cleaning liquid such as pure water or thinner to the 5, 56. According to such a configuration, the processing liquid attached to the bounce suppressors 54, 55, and 56 can be washed away, so that contamination of the cup 38 due to the attached processing liquid can be effectively prevented.

After the supply of the developing solution and the rinsing liquid is completed, the LCD substrate G is raised by the elevating / lowering rotating mechanism 39, and the LCD substrate G is transferred to the transfer arm 15a which has entered the developing device 18. . Thereafter, the transfer arm 15a that has received the LCD substrate G retreats from the developing device 18, and the LCD substrate G is carried out of the developing device 18.

The LCD substrate G carried out of the developing device 18 is successively transported to the heating device 22 and the cooling device 20 for heat treatment. Thereafter, the LCD substrate G is transported to the loader unit 2 and transferred to the sub-transport device 13. Then, the sub-transport device 13 stores the LCD substrate G in the cassettes 12, 12, thereby completing a series of coating and developing processes on the LCD substrate G.

In the above embodiment, the mesh-like rebound suppressing members 54, 55, and 56 have been described. However, in the present invention, a large number of holes as shown in FIG. The anti-bounce members 60, 61, 62 are placed in the outer container 5
You may make it provide in triple inside 1. In this case, the diameter of the holes provided in the rebound suppressing members 60, 61, and 62 may be gradually reduced from the LCD substrate G side to the outer container 51 side. That is, it is preferable that the aperture ratio be reduced in the order of the bounce suppressors 60, 61, and 62. With this configuration, the diameter of the holes of the rebound suppressing members 60, 61, and 62 corresponds to the roughness of the mesh of the rebound suppressing members 54, 55, and 56 described in the previous embodiment. The same effect as in the case is obtained.

Further, as shown in FIG. 8, it is more preferable that the rebound suppressing member 65 located on the LCD substrate G side is formed in a waveform when viewed from the plane of the cup 38. According to such a configuration, even if a part of the processing liquid scattered from the LCD substrate G is rebounded by the rebound suppressing body 65, the rebound suppressing body 65 is formed in a waveform, so that as shown in FIG.
The angle at which the treatment liquid rebounds can be changed. That is, the processing liquid that rebounds at the rebound suppressing body 65 does not rebound in the incident direction, and can be prevented from scattering toward the LCD substrate. As a result, it is possible to further suppress the scattered processing liquid from re-adhering to the LCD substrate G.

If not only the bounce suppressors 65 located on the LCD substrate G side but also the other bounce suppressors 61 and 62 are formed in a waveform, these bounce suppressors 6 are formed.
The angle at which the processing liquid rebounds can be changed between 1 and 62, and it is possible to further suppress the scattered processing liquid from re-adhering to the LCD substrate G. Of course, the mesh-like bounce restraints 54, 55, 56 are also
When formed in a waveform when viewed from the plane of the cup 38, the same effect as in the case of the above-described rebound suppressing members 65, 61, and 62 is produced.

In the above embodiment, the example in which the bounce suppressors 54, 55, and 56 are tripled has been described. However, the present invention is not limited to such triples, but is possible. For example, the rebound suppressing body may be formed in five or six layers. In addition, even if single or double, rebound can be suppressed more than before. Further, in the first embodiment, the development processing device 18 has been described as an example. However, the present invention is not limited to the development processing device 18, and the scrubber cleaning device 17 for rotating the LCD substrate G and the coating / peripheral removal. Device 2
7 can also be applied.

Although an LCD substrate has been described as an example of a substrate to be used, the present invention is applicable to a semiconductor wafer, a CD substrate, and the like in addition to the LCD substrate G.

[0056]

According to the first to sixth aspects of the present invention, it is possible to suppress the processing liquid scattered from the substrate from re-adhering to the substrate, and to suppress the occurrence of defective liquid processing on the substrate. It becomes possible.

In particular, according to the third aspect of the present invention, it is possible to further suppress the re-adhesion of the processing liquid to the substrate by the multiple bounce-reducing members.

In particular, in the invention according to the fourth aspect, the processing liquid scattered from the substrate is reattached to the substrate.
It can be more reliably suppressed.

In particular, according to the fifth aspect of the present invention, even if the processing liquid scattered from the substrate rebounds by the rebound suppressing member, the repelled processing liquid can be prevented from being scattered toward the substrate.

In particular, according to the invention of claim 6, it is possible to prevent contamination of the processing vessel due to the processing liquid attached to the bounce suppressing member.

[Brief description of the drawings]

FIG. 1 is a perspective view showing the appearance of a coating and developing apparatus having a developing apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view of the coating and developing apparatus of FIG. 1;

FIG. 3 is a schematic plan view of a developing apparatus according to the embodiment of the present invention.

FIG. 4 is a cross-sectional view of the developing device of FIG.

FIG. 5 is a perspective view showing the arrangement and configuration of a bounce suppressor provided in the developing device of FIG. 3;

FIG. 6 is an explanatory view showing a state in which a processing liquid is scattered from an LCD substrate on the bounce suppressor of FIG. 5;

FIG. 7 is a perspective view showing another example of the bounce suppressing body of FIG. 5;

FIG. 8 is a plan view of a rebound suppressing body formed in a waveform.

FIG. 9 is an explanatory view showing a state in which the processing liquid scatters from the LCD substrate to the bounce suppressor of FIG. 8;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Coating / developing apparatus 18 Developing apparatus 38 Cup 51 Outer container 54, 55, 56 Anti-bounce body G LCD substrate

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H025 AB16 AB17 FA15 2H096 AA25 AA27 GA33 4G075 AA13 AA24 CA57 EB01 ED01 ED13 EE12 FA02 FA03 FA06 5F046 CD01 CD03 CD06 LA06 LA18

Claims (6)

[Claims] 1. A processing liquid is supplied onto a substrate in a processing container,
A liquid processing apparatus configured to spread the processing liquid on the substrate or shake off the processing liquid from the substrate by rotating the substrate, and suppresses rebound of the processing liquid scattered from the substrate inside the processing container. A liquid treatment device, comprising a bounce suppressor for performing the treatment. 2. The liquid processing apparatus according to claim 1, wherein the bounce suppressing member is a mesh-shaped member or a member having a plurality of holes formed therein. 3. The liquid processing apparatus according to claim 2, wherein the bounce suppressors are provided in a multiplex manner. 4. An aperture ratio of the bounce suppressor is:
4. The liquid processing apparatus according to claim 3, wherein the bounce suppressor located on the substrate side is set larger. 5. The liquid processing apparatus according to claim 1, wherein the bounce suppressor located at least on the substrate side is formed in a waveform when viewed from the plane of the processing container. 6. The cleaning device according to claim 1, further comprising a cleaning device for cleaning the bounce suppressing member with a cleaning liquid.
Or the liquid processing apparatus according to 5.