JP2000137330A - Mask fixing tool for aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a mask fixing tool for aligner that a member to be exposed and a mask can be closely brought into contact with each other by a pressing force being uniform as a whole without partially concentrating stress. SOLUTION: A mask placing surface 23 where a window 21 for exposure by ultra-violet rays is formed at the center thereof is formed on the substrate 2 of the mask fixing tool 1 for aligner. A bag filled with a gel agent 5 constituted so that a flexible bag main body 52 is filled with a gel agent 53 is fitted to the back surface of an opening and closing cover 3 supported by the substrate 2 through a hinge pin 24 so that it can be opened and closed. When the glass mask 7 is placed on the placing surface 23 and the cover 3 is clamped and fixed by a clamp mechanism 6 on a condition that a glass wafer 8 being the member to be exposed is superposed on the mask 7, the wafer 8 is pressed to the mask 7 with the force being uniform as a whole by the bag 5 and the stress is not concentrated.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask fixing device of an exposure apparatus used for tightly fixing a mask to a member to be exposed at the time of exposure performed in manufacturing a polarizing hologram element or the like.

[0002]

2. Description of the Related Art In a polarizing hologram element, for example, a birefringent deposited film composed of a polydiacetylene alignment film is formed on the surface of a glass wafer, and a mask in which a lattice-like mask pattern is formed on the deposited film is used. It can be manufactured by irradiating an ultraviolet ray through the glass.

The exposure apparatus used for this ultraviolet exposure is provided with a mask fixture for accurately positioning a mask with respect to a glass wafer and clamping the mask in a superposed state. This mask fixture has a metal wafer receiving base having a wafer receiving surface formed thereon, and a clamper for clamping a glass wafer and a mask. The mask mounted on the mask mounting surface is pressed against the glass wafer placed on the wafer receiving table and fixed with a clamper, so that the mask is superposed with the glass wafer being accurately positioned.

[0004]

Here, if the wafer receiving surface has a slight unevenness, the glass wafer is distorted along the unevenness, so that the glass wafer and the mask cannot be completely adhered. In addition, stress may be concentrated on a slight convex portion formed on the wafer receiving surface, and interference fringes may be formed on the wafer. When exposure is performed in this state, there is a problem that a blurred portion occurs in the exposure pattern.

[0005] Further, even if the flatness of the wafer receiving surface is increased, there is a limit in the processing accuracy, so that the above-mentioned adverse effects cannot be completely eliminated.

SUMMARY OF THE INVENTION In view of the above, it is an object of the present invention to provide an exposure method capable of adhering a member to be exposed and a mask with uniform pressure as a whole without causing partial stress concentration on the member to be exposed. It is to propose a mask fixing device of the apparatus.

[0007]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention relates to a mask fixing device of an exposure apparatus used for closely fixing a mask to a member to be exposed, wherein the member to be exposed can be pressed against the mask. It has a flexible bag, and the flexible bag is filled with a fluid.

In the present invention, since the member to be exposed is pressed against the mask by the flexible bag filled with the fluid, the entire surface of the member to be exposed is pressed against the mask with a uniform force by the principle of Pascal. For this reason, the member to be exposed can be brought into close contact with the mask. In addition, since partial stress concentration does not occur on the exposed member, no interference fringes are generated on the exposed member. Therefore, it is possible to prevent the occurrence of defocus in the exposure pattern formed on the exposed member.

Here, if the fluid is a gel-like substance,
The shape of the flexible bag is easier to maintain than other liquids. Further, since there is no change in volume unlike gas, a strong pressing force can be exhibited.

Further, if the surface of the flexible bag is made black, the ultraviolet light is absorbed, so that it is possible to prevent the ultraviolet light from being diffusely reflected by the flexible bag during exposure.

Further, if the flexible bag is made of polytetrafluoroethyne rubber having high UV resistance, the durability of the flexible bag can be improved.

A mask fixture of an exposure apparatus having such features is provided with a substrate having a window for exposure and a mask mounting surface formed so as to surround the window, and is openably and closably attached to the substrate. The open / close lid, the flexible bag attached to the surface of the open / close lid on the substrate side, the mask placed on the mask placement surface, and the exposed member superimposed on the mask; And a clamp mechanism for fastening and fixing the opening / closing lid to the substrate while being sandwiched between the flexible bags.

[0013]

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a mask fixing device of an exposure apparatus to which the present invention is applied.

FIG. 1A is a plan view showing a mask fixture of the exposure apparatus according to the present invention, and FIG. 1B is a plan view of the mask fixture of the exposure apparatus shown in FIG. It is sectional drawing which shows the cut part.

Referring to these drawings, a mask fixing device 1 of an exposure apparatus is provided with a rectangular metal substrate 2 and a metal metal attached to the substrate 2 so as to be openable and closable around hinge pins 4. An opening / closing lid 3 and a flexible gel-filled bag 5 attached to the back surface (substrate side surface) of the opening / closing lid 3
And a clamp mechanism 6 for clamping and fixing the gel-filled bag 5 with the opening / closing lid 3 closed.

A square through-hole is formed at the center of the substrate 2 as a window 21 for UV exposure, and a square frame-shaped mask mounting surface 23 is provided on the four sides of the window 21 at a position one step lower than the substrate surface 22. Are formed. The front, rear, left and right inner peripheral side surfaces 23F, 23B, 23L, 2 of the mask mounting surface 23
3R functions as a guide surface for positioning the glass mask 7 and the glass wafer 8, which is a member to be exposed.

At the left and right corners of the front inner peripheral surface 23F of the mask mounting surface 23, mask holders 26 and 27 are detachably attached by screws, respectively.
Along the inner peripheral surface 23B on the rear side of the mask guide surface 23L,
A mask holder 28 extending over 23R is also detachably attached by a screw. The glass mask 7 placed on the mask mounting surface 23 is fixed to the mask mounting surface 23 by mask holders 26 and 27 and a mask holder 28.

The opening / closing lid 3 has a back surface (a surface on the side of the substrate 2).
A circular recess 32, which is slightly larger than the glass wafer, is formed in 31. A flexible gel-filled bag 5 is attached to the recess 31 in such a manner that its thickness is about half of that of the glass wafer. A pin hole 33 through which a hinge pin 4 attached to the substrate 2 is rotatably penetrated is formed on one side of the opening / closing lid 3, and the opening / closing lid 3 can be opened / closed around this. It is.

One support leg 35 is formed on the surface 34 of the opening / closing lid 3 at the center of the side where the pin hole 33 is formed, and also at both corners of the opposite side of the substrate 2 respectively. Support legs 36 and 37 are formed. These support legs 35-
37 extends perpendicularly from the surface 34 and the surface of the substrate 2.

On the other hand, the clamp mechanism 6 for fastening and fixing the opening / closing lid 3 to the substrate 2 side is provided with the opening / closing lid 3 of the fixture 1.
Is formed at an edge portion on the opposite side to the center of rotation. The clamp mechanism 6 is formed on the side of the opening / closing lid 3 with a bolt 61 having a lower end pivotally attached to the substrate 2 so as to be pivotable in the vertical direction, a flanged nut 62 that can be screwed into the bolt 61. And a bolt insertion groove 63.

The bolt insertion groove 63 is formed in a portion obtained by extending the central portion of the side portion of the opening / closing lid 3 in a trapezoidal shape. It is. Therefore, bolt 6
In the state in which the bolt insertion groove 63 is vertically set, the bolt insertion groove 63 is penetrated as shown in FIG.
When the flanged nut 62 is screwed into the tip of the bolt projecting from the opening, the cover 3 can be fastened and fixed to the substrate 2 side. Loosen the flange wide nut 62 until the bolt 61 can be turned, and turn the bolt 61 out of the bolt insertion groove 63 to remove the lid 3.
Can be opened and closed freely.

Here, the clamp mechanism 6 of the opening / closing lid 3
A fastening force adjusting screw 65 is screwed into the vicinity of the position. The adjusting screw 65 is provided on the open / close lid back surface 31 at the end on the substrate side.
And hits the substrate surface 22. Therefore,
By twisting the adjusting screw 65, the mask mounting surface 23 on the substrate side and the substrate-side surface 51 of the flexible gel-filled bag 5 attached to the opening / closing lid side in a state where the opening / closing lid 3 is closed.
You can adjust the interval. In other words, the mask mounting surface 23
It is possible to adjust the fastening force for bringing the glass mask 7 sandwiched between the gel filling bag 5 and the glass wafer 8 as the exposed member into close contact.

Next, the flexible gel-filled bag 5 is made of a bag body 52 made of a flexible material that can be expanded into a flat disk shape, and a gel 53 filled in the bag body 52. And In this example, the surface of the bag body 52 is black so as not to reflect the ultraviolet light for exposure. In addition, polytetrafluoroethylene rubber is employed as the material of the bag body 52.

The operation of fastening and fixing the mask and the member to be exposed by the mask fixture 1 of the exposure apparatus having this configuration will be described.

First, as shown in FIGS. 2A and 2B,
With the opening / closing lid 3 opened, the square glass mask 7 on which the lattice-shaped mask pattern 71 is formed is mounted on the mask mounting surface 23 of the substrate 2. The glass mask 7 includes front, rear, left and right inner peripheral side surfaces 23F, 23B, 23 of the mask mounting surface 23.
Positioning is performed accurately using L and 23R as guide surfaces. The glass mask 7 placed on the mask mounting surface 23 is fixed by mask holders 26 and 27 and a mask holder 28.

Next, as shown in FIGS. 2C and 2D,
A glass mask 8 is placed on the glass mask 7 so that the surface to be exposed contacts the glass mask 7. Next, the glass wafer 8 is positioned by pressing the orificer 81 of the glass wafer 8 against the inner surface 28a of the mask retainer 28 attached along the rear inner peripheral surface 23B of the mask mounting surface 23.

Next, the cover 3 is closed, and the cover 3 is fastened and fixed by the clamp mechanism 6. As a result, the gel filling bag 5 attached to the opening / closing lid 3 is pressed against the glass wafer 8, so that the glass wafer 8 and the glass mask 7
It is sandwiched between the gel-like filling bag 5 and the mask mounting surface 23 and adheres to each other.

Next, as shown in FIG.
Is turned upside down, and the window 21 formed in the substrate 2 is turned upward. The mask fixture 1 is supported by the support legs 35 to 37 projecting from the surface 34 of the opening / closing lid 3 and the surface of the substrate 2 so that the mask mounting surface 23 is substantially horizontal.

An ultraviolet lamp 9 is disposed above the mask fixture 1 of the exposure apparatus, and when the glass mask 7 is irradiated with ultraviolet rays through the window 21, the glass wafer 8 is formed based on the mask pattern formed on the glass mask 7. The exposure pattern is transferred to the surface to be exposed.

Finally, the fastening of the opening / closing lid 3 by the clamp mechanism 6 is released, the opening / closing lid 3 is opened, and the glass wafer 8 is removed from the glass mask 7 using tweezers or the like.

As described above, in the mask fixing tool 1 of the exposure apparatus of the present embodiment, the glass wafer 8 is pressed against the glass mask 7 by the gel filling bag 5 composed of the flexible bag 52 filled with the gel agent 53. I have. Therefore, the entire surface of the glass wafer 8 can be pressed with a uniform force. Therefore, the glass wafer 8 can be brought into close contact with the glass mask 7. Also, since partial stress concentration does not occur,
No interference fringes occur on the glass wafer 8. Therefore, it is possible to prevent the exposure pattern formed on the glass wafer 8 from being out of focus.

Further, since the gel agent 53 is used as a fluid for filling the flexible bag main body 52, the shape of the flexible bag main body 52 can be easily maintained as compared with other liquids. Also,
Since there is no volume change unlike gas, a strong pressing force can be exerted.

Further, since the surface of the bag body 52 of the gel-filled bag 5 is colored black to absorb ultraviolet rays, it is possible to prevent the ultraviolet rays from being diffusely reflected by the gel-filled bag 5 during exposure. Moreover, in this example, the bag body 52 of the gel-filled bag 5
Is formed of polytetrafluoroethylene rubber having a high resistance to ultraviolet light, so that the gel-filled bag 5 has high durability.

Further, the mask fixture 1 of the exposure apparatus of this embodiment
Since the operation is simpler than that of the conventional exposure apparatus, workability can be improved.

(Modification of Mask Fixture) In the present invention, the fluid filled in the gel filling bag 5 is not limited to the gel 53 but may be another liquid or gas. Further, the material of the gel-filled bag 5 is not limited to polytetrafluoroethylene rubber, and any material having resistance to ultraviolet light may be used.

[0036]

As described above, in the mask fixing device of the exposure apparatus of the present invention, the member to be exposed is pressed against the mask by using the flexible bag filled with the fluid. The entire surface can be pressed against the mask with a uniform force. Therefore, since the member to be exposed can be brought into close contact with the mask, it is possible to prevent the occurrence of defocus in the exposure pattern formed on the member to be exposed.

Further, since a gel agent is used as a fluid to be filled in the flexible bag main body, the shape of the flexible bag main body is easily maintained as compared with other liquids. Further, since there is no change in volume unlike gas, a strong pressing force can be exhibited.

Further, since the surface of the bag body is colored black so as to absorb ultraviolet rays, the ultraviolet rays do not reflect irregularly on the bag surface during exposure.

Further, since the bag body is made of polytetrafluoroethylene rubber having high resistance to ultraviolet rays, the durability of the bag body is high.

[Brief description of the drawings]

FIG. 1A is a plan view showing a mask fixture of an exposure apparatus according to the present invention, and FIG. 1B is a cross-sectional view taken along a line II ′ in FIG. 1A.

FIGS. 2A to 2D are explanatory views showing an operation of attaching a mask and a member to be exposed to the fixture shown in FIG. 1;

FIG. 3 is an explanatory view showing a state in which ultraviolet light exposure is performed using the fixture shown in FIG. 1;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Mask fixing device of exposure apparatus 2 Substrate 3 Opening / closing lid 4 Hinge pin 5 Gel filling bag (flexible bag) 6 Clamp mechanism 7 Glass wafer (exposed member) 8 Glass mask 21 Exposure window 23 Mask mounting surface 32 Substrate side surface of opening / closing lid 52 Bag body 53 Gel agent

Claims (5)

[Claims] 1. A mask fixing device of an exposure apparatus used for tightly fixing a mask to a member to be exposed, comprising: a flexible bag capable of pressing the member to be exposed to a mask;
A mask fixture for an exposure apparatus, wherein the flexible bag is filled with a fluid. 2. The mask fixing tool according to claim 1, wherein the fluid is a gel-like substance. 3. The mask fixing device according to claim 1, wherein the surface of the flexible bag is black. 4. The mask fixing device of an exposure apparatus according to claim 1, wherein the flexible bag is formed of polytetrafluoroethyne rubber. 5. The substrate according to claim 1, wherein the substrate includes an exposure window and a mask mounting surface formed so as to surround the window, and the substrate can be opened and closed. An opening / closing lid attached to the opening / closing lid, the flexible bag attached to the surface of the opening / closing lid on the substrate side, the mask placed on the mask mounting surface, and the exposed member superimposed on the mask; A mask fixture for an exposure apparatus, comprising: a clamp mechanism for fastening and fixing the opening / closing lid to the substrate while being sandwiched between a mounting surface and the flexible bag.