JP2000124256A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP2000124256A
JP2000124256A JP29500598A JP29500598A JP2000124256A JP 2000124256 A JP2000124256 A JP 2000124256A JP 29500598 A JP29500598 A JP 29500598A JP 29500598 A JP29500598 A JP 29500598A JP 2000124256 A JP2000124256 A JP 2000124256A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor chip
bump
terminal portion
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29500598A
Other languages
Japanese (ja)
Other versions
JP3676590B2 (en
Inventor
Kazutaka Shibata
和孝 柴田
Shigeyuki Ueda
茂幸 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP29500598A priority Critical patent/JP3676590B2/en
Publication of JP2000124256A publication Critical patent/JP2000124256A/en
Application granted granted Critical
Publication of JP3676590B2 publication Critical patent/JP3676590B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29199Material of the matrix
    • H01L2224/2929Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • H01L2224/83851Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/0781Adhesive characteristics other than chemical being an ohmic electrical conductor
    • H01L2924/07811Extrinsic, i.e. with electrical conductive fillers

Landscapes

  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device which allows downsizing to be attained, and can be manufactured advantageously in cost. SOLUTION: In this semiconductor device 1, comprising a semiconductor chip 3 having a plurality of bump-like terminals 31, etc., formed on one surface 30, a substrate 2 having a plurality of longitudinal inner terminals 21, etc., formed on one surface 20 and a plurality of through-holes 23, and outer terminals 24 which are formed on the other surface of the substrate 2 and connected to corresponding inner terminals 21 via the through-holes 23, wherein each inner terminal 21 mutually faces the opposite bump-like terminal 31 corresponding thereto and electrically connected thereto, each outer terminal 24 is connected conductively to one end 21a of corresponding inner terminal 21 thereto and formed on a region directly below the semiconductor chip 3, and each bump-like terminal 31 is connected conductively to the other end 21b of corresponding inner terminal 21 thereto.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本願発明は、外部端子部が形
成された基板上に、外部端子部と導通するようにして半
導体チップが実装された構成の半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device having a structure in which a semiconductor chip is mounted on a substrate on which an external terminal is formed so as to be electrically connected to the external terminal.

【0002】[0002]

【従来の技術】従来より採用されている半導体装置の一
例を図7に示す。この半導体装置1では、複数の内部端
子部21,…が一面20側に形成された基板2の他面2
2側に、貫通孔23を介して内部端子部21と電気的に
導通する複数の外部端子部24,…が形成されている。
そして、この基板2の一面20上には、いわゆるフェイ
スアップ方式で半導体チップ3が実装されており、基板
2の内部端子部21と半導体チップ3の端子部(図示
略)との間がワイヤ4を介して電気的に接続されてい
る。すなわち、各外部端子部24とこれに対応する半導
体チップ3の端子部とが、ワイヤ4および内部端子部2
1と介して導通している。そして、基板2の一面20側
には、半導体チップ3やワイヤ4などを封止するように
して樹脂パッケージ5が形成されている。
2. Description of the Related Art FIG. 7 shows an example of a conventional semiconductor device. In the semiconductor device 1, the other surface 2 of the substrate 2 on which the plurality of internal terminal portions 21,.
A plurality of external terminal portions 24,... Electrically connected to the internal terminal portions 21 through the through holes 23 are formed on the second side.
The semiconductor chip 3 is mounted on one surface 20 of the substrate 2 by a so-called face-up method, and a wire 4 is provided between an internal terminal 21 of the substrate 2 and a terminal (not shown) of the semiconductor chip 3. Are electrically connected via That is, each external terminal portion 24 and the corresponding terminal portion of the semiconductor chip 3 correspond to the wire 4 and the internal terminal portion 2.
It is electrically connected to 1. A resin package 5 is formed on one surface 20 of the substrate 2 so as to seal the semiconductor chip 3 and the wires 4.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、ワイヤ
4を用いて半導体チップ3の端子部と基板2の内部端子
部21との間を接続するように構成された半導体装置1
では、以下のような不具合が生じる。
However, the semiconductor device 1 is configured to connect between the terminal portion of the semiconductor chip 3 and the internal terminal portion 21 of the substrate 2 using the wire 4.
Then, the following problems occur.

【0004】すなわち、第1に、ワイヤ4を用いて半導
体チップ3の端子部と基板2の内部端子部21との間を
接続するためには、基板2における半導体チップ3の側
方領域にワイヤボンディング領域を確保する必要があ
る。このため、ワイヤボンディング領域を確保すべく基
板2の平面視面積を半導体チップ3のそれよりも一定以
上大きくしなければならない。したがって、ワイヤ4を
用いた半導体装置1では、基板2の平面視面積を小さく
するには限界があり、半導体装置1を一定以上小型化す
ることができない。
That is, first, in order to connect between the terminal portion of the semiconductor chip 3 and the internal terminal portion 21 of the substrate 2 using the wire 4, a wire is provided in a side region of the semiconductor chip 3 on the substrate 2. It is necessary to secure a bonding area. Therefore, in order to secure a wire bonding area, the area of the substrate 2 in plan view must be larger than that of the semiconductor chip 3 by a certain amount or more. Therefore, in the semiconductor device 1 using the wires 4, there is a limit in reducing the area of the substrate 2 in a plan view, and the semiconductor device 1 cannot be made smaller than a certain size.

【0005】第2に、ワイヤ4が剥き出しのままではワ
イヤ4に外力が作用した場合に容易に断線してしまい、
また半導体チップ3の端子部形成面30には一般的に回
路素子が一体的に造り込まれていることから、樹脂パッ
ケージ5内にワイヤ4や半導体チップ3を封止するなど
してワイヤ4や回路素子を保護する必要がある。これで
は、樹脂パッケージング工程が必要となり作業効率が悪
く、コスト的にも不利である。
Second, if the wire 4 is left bare, it is easily broken when an external force acts on the wire 4.
Further, since the circuit elements are generally integrally formed on the terminal portion forming surface 30 of the semiconductor chip 3, the wires 4 and the semiconductor chip 3 are sealed in the resin package 5, for example. It is necessary to protect circuit elements. In this case, a resin packaging step is required, so that the working efficiency is poor and the cost is disadvantageous.

【0006】本願発明は、上記した事情のもとで考え出
されたものであって、小型化が達成できるとともに、コ
スト的に有利に製造できる半導体装置を提供することを
その課題としている。
The present invention has been conceived in view of the above circumstances, and it is an object of the present invention to provide a semiconductor device which can be miniaturized and which can be manufactured at a low cost.

【0007】[0007]

【発明の開示】上記の課題を解決するため、本願発明で
は、次の技術的手段を講じている。すなわち、本願発明
により提供される半導体装置は、複数のバンプ状端子部
が一面側に形成された半導体チップと、長手状とされた
複数の内部端子部が一面側に形成され、かつ複数の貫通
孔が形成された基板と、この基板の他面側に形成され、
かつ上記貫通孔を介してそれぞれが対応する上記内部端
子部と接続された外部端子部と、を備え、上記各内部端
子部とこれに対応する上記バンプ状端子部とが互いに対
向し、かつ電気的に接続された半導体装置であって、上
記各外部端子部は、これに対応する上記内部端子部の一
端部側に導通接続され、かつ上記半導体チップの直下領
域に形成されており、上記各バンプ状端子部は、これに
対応する上記内部端子部の他端部側に導通接続されてい
ることを特徴としている。なお、上記各外部端子部は、
たとえばハンダによってボール状に形成されている。
DISCLOSURE OF THE INVENTION In order to solve the above problems, the present invention employs the following technical means. That is, the semiconductor device provided by the present invention includes a semiconductor chip having a plurality of bump-shaped terminal portions formed on one surface side, a plurality of elongated internal terminal portions formed on one surface side, and a plurality of through-holes. A hole is formed on the substrate, and formed on the other surface of the substrate,
And an external terminal portion connected to the corresponding internal terminal portion via the through hole, wherein each of the internal terminal portions and the corresponding bump-shaped terminal portion face each other, and Wherein each of the external terminal portions is electrically connected to one end of the corresponding internal terminal portion, and is formed in a region immediately below the semiconductor chip. The bump-shaped terminal portion is electrically connected to the other end of the corresponding internal terminal portion. In addition, each of the above external terminals is
For example, it is formed in a ball shape by solder.

【0008】バンプ状端子部は、半導体チップの一面側
に形成されていることから、バンプ状端子部に対向して
接続される基板の内部端子部の他端部側は半導体チップ
の直下領域に位置することになる。したがって、本願発
明では、ワイヤを用いて半導体チップと内部端子部との
間を接続する構成のように、半導体チップよりも比較的
に大きな平面視面積を有する基板上に半導体チップを実
装し、基板における半導体チップの側方領域にワイヤボ
ンディング領域を確保する必要がない。また、各外部端
子部も半導体チップの直下領域に形成されていることか
ら、外部端子部に接続される内部端子部の一端部側も半
導体チップの直下領域に位置することになる。
Since the bump-shaped terminal portion is formed on one surface side of the semiconductor chip, the other end portion of the internal terminal portion of the substrate connected to the bump-shaped terminal portion is located in a region directly below the semiconductor chip. Will be located. Therefore, in the present invention, the semiconductor chip is mounted on a substrate having a larger area in plan view than the semiconductor chip, such as a configuration in which the semiconductor chip and the internal terminal portion are connected using wires, It is not necessary to secure a wire bonding area in a side area of the semiconductor chip in the above. Further, since each external terminal is also formed in the region directly below the semiconductor chip, one end of the internal terminal connected to the external terminal is also located in the region directly below the semiconductor chip.

【0009】このように、本願発明では、内部端子部お
よび外部端子部のそれぞれが半導体チップの直下領域に
位置していることから、基板の平面視面積を半導体チッ
プのそれに限りなく近づけることができる。ワイヤを用
いて半導体チップと内部端子部との間を接続する構成で
は、基板の平面視面積を小さくするのに限界があり、こ
れが半導体装置の小型化を阻害する要因の1つとなって
いたが、本願発明のように、基板の平面視面積を半導体
チップのそれに限りなく近づけることができれば、半導
体装置の小型化を実現することができる。
As described above, according to the present invention, since the internal terminal portion and the external terminal portion are located in the region directly below the semiconductor chip, the area of the substrate in plan view can be made as close as possible to that of the semiconductor chip. . In a configuration in which a semiconductor chip and an internal terminal are connected by using a wire, there is a limit in reducing a planar area of the substrate, and this is one of the factors that hinder miniaturization of a semiconductor device. If the area of the substrate in plan view can be made as close as possible to that of the semiconductor chip as in the present invention, the size of the semiconductor device can be reduced.

【0010】ところで、上記構成の半導体装置は、基板
の一面側に内部端子部を、半導体チップの一面側にバン
プ状端子部をそれぞれ予め形成しておき、これらの端子
部を互いに対向させた状態で基板上に半導体チップを実
装した後に、貫通孔内を充填するようにして外部端子部
を形成することによって製造される。この方法では、基
板上に半導体チップを実装する段階においては外部端子
部が形成されておらず、貫通孔の上部開口を内部端子部
が覆った状態とされている。このため、貫通孔の直上に
おいてバンプ状端子部が内部端子部と接続される構成と
すれば、裏面側の支持がない極めて不安定な状態とされ
た内部端子部に、バンプ状端子部を接続しなければなら
ない。これでは、内部端子部とバンプ状端子部との間の
接続性の面で問題が生じかねない。
By the way, in the semiconductor device having the above structure, an internal terminal portion is formed on one surface side of a substrate and a bump-shaped terminal portion is formed on one surface side of a semiconductor chip in advance, and these terminal portions are opposed to each other. After the semiconductor chip is mounted on the substrate by the method described above, the semiconductor device is manufactured by filling the inside of the through hole and forming the external terminal portion. In this method, no external terminal is formed at the stage of mounting the semiconductor chip on the substrate, and the internal terminal covers the upper opening of the through hole. Therefore, if the bump-shaped terminal portion is connected to the internal terminal portion directly above the through hole, the bump-shaped terminal portion is connected to the extremely unstable internal terminal portion having no support on the back side. Must. This may cause a problem in terms of the connectivity between the internal terminal and the bump-shaped terminal.

【0011】これに対して本願発明では、基板の内部端
子部の一端部側において貫通孔を介して外部端子部が接
続され、他端部側に基板のバンプ状端子部が接続されて
いる。すなわち、外部端子部とバンプ状端子部とは内部
端子部を挟んだ状態で互いに位置ずれしており、内部端
子部における貫通孔の直上領域を避けて内部端子部とバ
ンプ状端子部とが接続されている。この構成では、上記
したような接続性の問題を心配する必要はない。
On the other hand, in the present invention, an external terminal portion is connected to the internal terminal portion of the substrate via a through hole at one end side, and a bump-shaped terminal portion of the substrate is connected to the other end side. That is, the external terminal portion and the bump-shaped terminal portion are displaced from each other while sandwiching the internal terminal portion, and the internal terminal portion and the bump-shaped terminal portion are connected to each other while avoiding a region immediately above the through hole in the internal terminal portion. Have been. With this configuration, there is no need to worry about the connectivity problem described above.

【0012】また、本願発明では、ワイヤを用いずに半
導体チップの端子部(バンプ状端子部)と基板の内部端
子部との間が接続されていることから、バンプ状端子部
と内部端子部との間の断線を回避するという意味におい
て樹脂パッケージを積極的に形成する必要はない。樹脂
パッケージを形成しない場合には、作用効率的に、コス
ト的に有利に半導体装置を製造することができるように
なる。
In the present invention, since the terminal portion (bump-shaped terminal portion) of the semiconductor chip and the internal terminal portion of the substrate are connected without using wires, the bump-shaped terminal portion and the internal terminal portion are connected. It is not necessary to positively form the resin package in the sense of avoiding disconnection between the resin package. When the resin package is not formed, a semiconductor device can be manufactured efficiently and cost-effectively.

【0013】なお、半導体チップのバンプ状端子部と基
板の内部端子部との間の接続は、たとえば各バンプ状端
子部を各内部端子部に対応させて基板上に半導体チップ
を載置した状態で、バンプ状端子部と内部端子部との間
に超音波振動を供給することによって各端子部の接続部
分を合金化することによって行うことができる。もちろ
ん、ハンダなどの導体ペーストや樹脂成分内に導体成分
を分散させた構造を有する異方性導電接着剤を用いて行
ってもよいが、好ましくは異方性導電接着剤が用いられ
る。
The connection between the bump-shaped terminal portions of the semiconductor chip and the internal terminal portions of the substrate may be made, for example, in a state where the semiconductor chip is mounted on the substrate so that each bump-shaped terminal portion corresponds to each internal terminal portion. Then, by applying ultrasonic vibration between the bump-shaped terminal portion and the internal terminal portion, the connection portion of each terminal portion can be alloyed. Of course, it may be performed using a conductive paste such as solder or an anisotropic conductive adhesive having a structure in which a conductive component is dispersed in a resin component, but an anisotropic conductive adhesive is preferably used.

【0014】すなわち、本願発明の好ましい実施の形態
においては、上記半導体チップと上記基板とは、それぞ
れの一面の間に介在する上記異方性導電接着剤の樹脂成
分によって機械的に接合されているとともに、上記各バ
ンプ状端子部とこれに対応する上記内部端子部との間に
介在する上記導電成分によって電気的に接続されてい
る。
That is, in a preferred embodiment of the present invention, the semiconductor chip and the substrate are mechanically joined by a resin component of the anisotropic conductive adhesive interposed between the respective surfaces. At the same time, they are electrically connected by the conductive component interposed between each of the bump-shaped terminal portions and the corresponding internal terminal portion.

【0015】上記構成では、半導体チップと基板との間
の機械的および電気的な接続が、異方性導電接着剤のみ
によって実現されている。すなわち、上記構成の半導体
装置を製造する場合には、半導体チップを基板上に実装
する工程(機械的な接続工程)と、半導体チップと基板
との間を導通させる工程(電気的な接続工程)と、を別
工程とする必要はなく、これらの工程を1工程で行うこ
とができる。これによって作業効率の改善が図られ、コ
スト的に有利に半導体装置を提供することができるよう
になる。
In the above configuration, the mechanical and electrical connection between the semiconductor chip and the substrate is realized only by the anisotropic conductive adhesive. That is, when manufacturing the semiconductor device having the above configuration, a step of mounting a semiconductor chip on a substrate (mechanical connection step) and a step of conducting between the semiconductor chip and the substrate (electrical connection step). And need not be separate steps, and these steps can be performed in one step. As a result, work efficiency is improved, and a semiconductor device can be provided in an advantageous manner in terms of cost.

【0016】半導体チップのバンプ状端子部が形成され
た一面側には、通常各バンプ状端子部と導通する回路素
子が造り込まれていることから、半導体チップおよび基
板のそれぞれの一面の間に異方性導電接着剤の樹脂成分
が介在すれば、半導体チップの回路素子が樹脂成分によ
って保護されるといった利点が得られる。
Since a circuit element that normally conducts with each bump-shaped terminal portion is formed on one surface of the semiconductor chip on which the bump-shaped terminal portion is formed, a circuit element is formed between each surface of the semiconductor chip and the substrate. When the resin component of the anisotropic conductive adhesive is interposed, there is obtained an advantage that the circuit element of the semiconductor chip is protected by the resin component.

【0017】好ましい実施の形態においてはさらに、上
記複数の外部端子部は、上記基板の他面側における中央
部に格子状に配列形成されている。すなわち、いわゆる
BGA(ボールグリッドアレイ)と称される形態の半導
体装置においても、本願発明の技術思想を適用して上述
した効果を享受することができる。BGAは、半導体装
置を大型化するとなく半導体チップの多ピン化および微
細化に対応すべく開発されたものであるため、半導体装
置の小型化を実現可能な本願発明をBGAに適用するこ
との利点は大きい。
Further, in a preferred embodiment, the plurality of external terminal portions are arranged in a grid at a central portion on the other surface side of the substrate. That is, even in a semiconductor device in a form called a so-called BGA (ball grid array), the above-described effects can be obtained by applying the technical idea of the present invention. Since the BGA is developed to cope with the increase in the number of pins and the miniaturization of the semiconductor chip without increasing the size of the semiconductor device, the advantage of applying the present invention, which can realize the miniaturization of the semiconductor device, to the BGA. Is big.

【0018】本願発明のその他の特徴および利点は、添
付図面を参照して以下に行う詳細な説明によって、より
明らかとなろう。
[0018] Other features and advantages of the present invention will become more apparent from the detailed description given below with reference to the accompanying drawings.

【0019】[0019]

【発明の実施の形態】以下、本願発明の好ましい実施の
形態を、図面を参照して具体的に説明する。図1は、本
願発明に係る半導体装置の一例を表す全体斜視図、図2
は、図1の半導体装置を裏面側から見た全体斜視図、図
3は、図1のIII −III 線に沿う断面図、図4は、上記
半導体装置の半導体チップを裏面側から見た全体斜視
図、図5は、上記半導体装置の基板の全体斜視図、図6
は、図5の基板を裏面側から見た全体斜視図である。な
お、これらの図において、従来の半導体装置を説明する
ために参照した図面に表されていた部材および要素など
と同等なものには同一の符号を付してある。また、本実
施形態においては、図2に良く表れているように複数の
外部端子部が格子状に配列形成されたBGA(ボールグ
リッドアレイ)として構成された半導体装置について説
明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be specifically described below with reference to the drawings. FIG. 1 is an overall perspective view showing an example of a semiconductor device according to the present invention, and FIG.
1 is an overall perspective view of the semiconductor device of FIG. 1 as viewed from the back side, FIG. 3 is a cross-sectional view along the line III-III of FIG. 1, and FIG. 4 is an overall view of the semiconductor chip of the semiconductor device as viewed from the back side. FIG. 5 is an overall perspective view of the substrate of the semiconductor device, FIG.
FIG. 6 is an overall perspective view of the substrate of FIG. 5 as viewed from the back side. In these drawings, the same reference numerals are given to members and elements equivalent to those shown in the drawings referred to for describing the conventional semiconductor device. Further, in the present embodiment, a semiconductor device configured as a BGA (ball grid array) in which a plurality of external terminal portions are arranged in a grid pattern as best seen in FIG. 2 will be described.

【0020】上記半導体装置1は、図1ないし図3に示
したように、基板2上に半導体チップ3が異方性導電接
着剤5を介してフェイスダウン方式で実装された構成と
されている。異方性導電接着剤5は、樹脂成分50内に
導電成分51が分散された構成とされており、基板2お
よび半導体チップ3の一面20,30どうしが樹脂成分
50によって機械的に接続されているとともに、基板2
の一面20側に形成された内部端子部21と半導体装置
1のバンプ状端子部31との間が導電成分51を介して
導通接続されている。
As shown in FIGS. 1 to 3, the semiconductor device 1 has a configuration in which a semiconductor chip 3 is mounted on a substrate 2 in a face-down manner via an anisotropic conductive adhesive 5. . The anisotropic conductive adhesive 5 has a configuration in which a conductive component 51 is dispersed in a resin component 50, and the surfaces 20 and 30 of the substrate 2 and the semiconductor chip 3 are mechanically connected to each other by the resin component 50. And board 2
The internal terminal portion 21 formed on the one surface 20 side and the bump-shaped terminal portion 31 of the semiconductor device 1 are electrically connected via a conductive component 51.

【0021】半導体チップ3は、ICやLSIなどのベ
アチップであり、図4に示したようにその一面30の周
縁部に並ぶにようにして複数のバンプ状端子部31,…
が形成されている。これらのバンプ状端子部31は、半
導体チップ3の一面30側に一体的に造り込まれた回路
素子(図示略)に導通しており、たとえば回路素子と同
時に一体的に造り込まれた端子パッド(図示略)上に金
メッキを施すなどしてバンプ状とされている。
The semiconductor chip 3 is a bare chip such as an IC or an LSI, and has a plurality of bump-shaped terminal portions 31,... Arranged along the periphery of one surface 30 as shown in FIG.
Are formed. These bump-shaped terminal portions 31 are electrically connected to circuit elements (not shown) integrally formed on one surface 30 of the semiconductor chip 3. For example, terminal pads integrally formed at the same time as the circuit elements. It is bump-shaped by applying gold plating (not shown).

【0022】基板2は、図5および図6に示すようにポ
リイミド樹脂などの基材2aに複数の貫通孔23,…が
格子状に配列形成されているとともに、これらの貫通孔
23,…と同数の内部端子部21,…が基材2aの一面
20側に形成されている。
As shown in FIGS. 5 and 6, the substrate 2 has a plurality of through-holes 23 formed in a matrix on a base material 2a made of a polyimide resin or the like. The same number of internal terminal portions 21,... Are formed on one surface 20 of the base material 2a.

【0023】内部端子部21は、図5および図6に良く
表れているように一端部21aが貫通孔23の上部開口
を塞ぐようになされ、この一端部21aが基板2の他面
22から貫通孔23を介して臨んでいる。内部端子部2
1の他端部21bは、図5に良く表れているように半導
体チップ3のバンプ状端子部31に対応して、基板2の
一面20における周縁部に並ぶようにして設けられてい
る。なお、内部端子部21は、基材2aの一面20上に
銅箔を貼着し、あるいはスパッタリングや蒸着などの適
宜の手段によって銅被膜を形成した後に、これをエッチ
ング処理することによって形成される。
As shown in FIGS. 5 and 6, one end 21a of the internal terminal 21 closes the upper opening of the through hole 23. The one end 21a extends through the other surface 22 of the substrate 2. It faces through the hole 23. Internal terminal 2
As shown in FIG. 5, the other end 21b of the substrate 1 is provided so as to be aligned with the peripheral edge of the one surface 20 of the substrate 2 corresponding to the bump-shaped terminal 31 of the semiconductor chip 3. The internal terminal portion 21 is formed by sticking a copper foil on the one surface 20 of the base material 2a or forming a copper film by an appropriate means such as sputtering or vapor deposition and then etching the copper film. .

【0024】基板2の他面22側には、図2および図3
に良く表れているように複数の外部端子部24,…が形
成されている。これらの外部端子部24,…は、基板2
の他面22において、貫通孔23を埋めるようにして、
かつ半球状に突出するようにして格子状に配列形成され
ており、貫通孔23の配置に対応して格子状に配列形成
されている。内部端子部21は、その一端部21aにお
いて貫通孔23の上部開口を塞ぐように形成されている
ことから、外部端子部24は内部端子部21の一端部2
1aに導通していることになる。なお、外部端子部24
は、基板2の一面20側に半導体チップ3を実装した後
に、これの表裏を反転させて貫通孔23に対応させてボ
ール状とされたハンダなどを載置し、ハンダを再溶融・
固化させることによって形成される。ハンダを再溶融さ
せた場合には、溶融ハンダが貫通孔23内に充填され、
その表面張力によって溶融ハンダが半球状の形態とな
る。
2 and 3 are provided on the other surface 22 side of the substrate 2.
, A plurality of external terminal portions 24 are formed. These external terminal portions 24,.
On the other surface 22 so as to fill the through hole 23,
In addition, they are arranged in a lattice so as to protrude in a hemispherical shape, and are arranged in a lattice corresponding to the arrangement of the through holes 23. Since the internal terminal 21 is formed so as to close the upper opening of the through hole 23 at one end 21a, the external terminal 24 is connected to the one end 2 of the internal terminal 21.
That is, conduction is made to 1a. The external terminal 24
After mounting the semiconductor chip 3 on the one surface 20 side of the substrate 2, turn over the semiconductor chip 3, place a ball-shaped solder or the like corresponding to the through hole 23, and re-melt the solder.
It is formed by solidification. When the solder is re-melted, the molten solder is filled in the through holes 23,
Due to the surface tension, the molten solder has a hemispherical shape.

【0025】図3に良く表れているように、バンプ状端
子部31は、半導体チップ3の一面30側に形成されて
いることから、バンプ状端子部31に対向して接続され
る基板2の内部端子部21の他端部21bは半導体チッ
プ3の直下領域に位置している。したがって、本実施形
態では、ワイヤを用いて半導体チップ3と内部端子部2
1との間を接続する構成のように、半導体チップ3より
も比較的に大きな平面視面積を有する基板2に半導体チ
ップ3を実装し、基板2における半導体チップ3の側方
領域にワイヤボンディング領域を確保する必要がない。
また、各外部端子部24も半導体チップ3の直下領域に
位置していることから、外部端子部24に接続される内
部端子部21の一端部21aも半導体チップの直下領域
に形成されていることになる。
As shown in FIG. 3, the bump-shaped terminal 31 is formed on one surface 30 of the semiconductor chip 3. The other end 21 b of the internal terminal 21 is located in a region immediately below the semiconductor chip 3. Therefore, in the present embodiment, the semiconductor chip 3 and the internal terminal 2
1, the semiconductor chip 3 is mounted on a substrate 2 having a larger area in plan view than the semiconductor chip 3, and a wire bonding area is provided on a side region of the semiconductor chip 3 on the substrate 2. There is no need to secure.
In addition, since each external terminal 24 is also located in the region directly below the semiconductor chip 3, one end 21a of the internal terminal 21 connected to the external terminal 24 is also formed in the region directly below the semiconductor chip. become.

【0026】このように、本実施形態では、内部端子部
21および外部端子部24のそれぞれが半導体チップ3
の直下領域に形成されていることから、基板2の平面視
面積を半導体チップ3のそれに限りなく近づけることが
できる。ワイヤを用いて半導体チップ3と内部端子部2
1との間を接続する構成では、基板2の平面視面積の小
さくするのに限界があり、これが半導体装置1の小型化
を阻害する要因の1つとなっていたが、本実施形態のよ
うに、基板2の平面視面積を半導体チップ3のそれに限
りなく近づけることができれば、半導体装置1の小型化
を実現することができる。
As described above, in the present embodiment, each of the internal terminal portion 21 and the external terminal portion 24 is
, The area of the substrate 2 in plan view can be made as close as possible to that of the semiconductor chip 3. The semiconductor chip 3 and the internal terminal 2 using wires
1 has a limit in reducing the area of the substrate 2 in plan view, which is one of the factors that hinder the miniaturization of the semiconductor device 1. However, as in the present embodiment, If the area of the substrate 2 in plan view can be made as close as possible to that of the semiconductor chip 3, the size of the semiconductor device 1 can be reduced.

【0027】異方性導電接着剤5は、既述の通り樹脂成
分50内に導電成分51を分散させた構造を有している
(図3参照)。樹脂成分50としては、たとえばエポキ
シ樹脂などの熱硬化性樹脂が好適に採用され、熱硬化さ
せる前の段階においては粘液状あるいは固体状のいずれ
の形態であってもよい。導電成分51としては、図面に
表されたようなボール状であっても、また図示しないが
繊維状ないし針状であってもよい。導電成分51をボー
ル状に構成する場合には、金属ボールを導電成分51と
してもよいし、樹脂ボールにニッケルメッキや金メッキ
などを施したものを導電成分51としてもよい。
As described above, the anisotropic conductive adhesive 5 has a structure in which the conductive component 51 is dispersed in the resin component 50 (see FIG. 3). As the resin component 50, for example, a thermosetting resin such as an epoxy resin is suitably used, and may be in a viscous liquid state or a solid state before the heat curing. The conductive component 51 may have a ball shape as shown in the drawing, or a fibrous or needle shape (not shown). When the conductive component 51 is formed in a ball shape, a metal ball may be used as the conductive component 51, or a resin ball obtained by performing nickel plating, gold plating, or the like may be used as the conductive component 51.

【0028】このような異方性導電接着剤5を用いた半
導体チップ3と基板2との機械的および電気的な接続
は、次のようにして行われる。すなわち、まずヒータな
どが組み込まれて予め加熱された支持台の上に基板2を
載置し、基板2における内部端子部21が形成された領
域に、粘液状とされた異方性導電接着剤5を塗布し、あ
るいは固体状とされた異方性導電接着剤5を載置する。
そして、各バンプ状端子部31をこれに対応する内部端
子部21にそれぞれ対向させるようして異方性導電接着
剤5上に半導体チップ3を押圧する。
The mechanical and electrical connection between the semiconductor chip 3 and the substrate 2 using the anisotropic conductive adhesive 5 is performed as follows. That is, first, the substrate 2 is placed on a pre-heated support table in which a heater or the like is incorporated, and a viscous anisotropic conductive adhesive is formed in a region of the substrate 2 where the internal terminal portions 21 are formed. 5 or a solid anisotropic conductive adhesive 5 is placed.
Then, the semiconductor chip 3 is pressed onto the anisotropic conductive adhesive 5 so that each bump-shaped terminal portion 31 faces the corresponding internal terminal portion 21.

【0029】このとき、基板2が加熱されていることか
ら、異方性導電接着剤5の樹脂成分50も加熱される
が、この段階では異方性導電接着剤5の樹脂成分50が
十分に熱硬化しておらず、樹脂成分50が粘液状の場合
には粘液状態が維持され、樹脂成分50が固体状の場合
には加熱により軟化させられている。このため、異方性
導電接着剤5上に半導体チップ3を押圧した場合には、
互いに対向するバンプ状端子部31および内部端子部2
1の間に介在する樹脂成分50が圧し退けられる。すな
わち、バンプ状端子部31および内部端子部21の間に
は導電成分51が選択的に介在させられて、これらの端
子部21,31の間が電気的に接続される。一方、互い
に対向する端子部21,31以外の領域は、樹脂成分5
0内に導電成分51が分散したままであるので絶縁性が
維持される。そして、異方性導電接着剤5の樹脂成分5
0が引き続き加熱されることによって熱硬化し、このと
き熱収縮力によって基板2および半導体チップ3の一面
20,30どうしが機械的に接続される。
At this time, since the substrate 2 is heated, the resin component 50 of the anisotropic conductive adhesive 5 is also heated. When the resin component 50 is not viscous and is in a viscous liquid state, the mucous state is maintained. When the resin component 50 is in a solid state, it is softened by heating. For this reason, when the semiconductor chip 3 is pressed on the anisotropic conductive adhesive 5,
Bump-shaped terminal 31 and internal terminal 2 facing each other
1 and the resin component 50 interposed therebetween is pressed away. That is, the conductive component 51 is selectively interposed between the bump-shaped terminal portion 31 and the internal terminal portion 21, and the terminals 21 and 31 are electrically connected. On the other hand, regions other than the terminal portions 21 and 31 facing each other are the resin component 5
Since the conductive component 51 is kept dispersed in 0, the insulating property is maintained. Then, the resin component 5 of the anisotropic conductive adhesive 5
The substrate 2 and the semiconductor chip 3 are mechanically connected to each other by heat shrinkage due to the subsequent heating of the 0.

【0030】このように、異方性導電接着剤5を用いれ
ば、基板2と半導体チップ3との間の機械的および電気
的な接続が同時に実現される。すなわち、上記構成の半
導体装置1を製造する場合には、半導体チップ3を基板
2上に実装する工程(機械的な接続工程)と、半導体チ
ップ3と基板2との間を導通させる工程(電気的な接続
工程)と、を別工程とする必要はなく、これらの工程を
1工程で行うことができる。これによって作業効率の改
善が図られ、コスト的に有利に半導体装置1を提供する
ことができるようになる。
As described above, when the anisotropic conductive adhesive 5 is used, the mechanical and electrical connection between the substrate 2 and the semiconductor chip 3 is realized at the same time. That is, when manufacturing the semiconductor device 1 having the above configuration, a step of mounting the semiconductor chip 3 on the substrate 2 (mechanical connection step) and a step of conducting between the semiconductor chip 3 and the substrate 2 (electrical connection). It is not necessary to separate these steps into separate steps, and these steps can be performed in one step. As a result, the working efficiency is improved, and the semiconductor device 1 can be provided in a cost-effective manner.

【0031】また、半導体チップ3のバンプ状端子部3
1が形成された一面30側には、通常各バンプ状端子部
31と導通する回路素子が造り込まれるのは上記した通
りであるが、基板2および半導体チップ3のそれぞれの
一面20,30の間に異方性導電接着剤5の樹脂成分5
0が介在すれば、半導体チップ3の回路素子が樹脂成分
50によって保護されるといった利点が得られる。
Further, the bump-shaped terminal portion 3 of the semiconductor chip 3
As described above, a circuit element that is normally connected to each of the bump-shaped terminal portions 31 is formed on the surface 30 on which the surface 1 is formed. In between resin component 5 of anisotropic conductive adhesive 5
When 0 is interposed, there is an advantage that the circuit element of the semiconductor chip 3 is protected by the resin component 50.

【0032】さらに、本実施形態では、ワイヤを用いず
に半導体チップ3の端子部(バンプ状端子部31)と基
板2の内部端子部21との間が接続されていることか
ら、バンプ状端子部31と内部端子部21との間の断線
を回避するという意味において樹脂パッケージを積極的
に形成する必要はない。樹脂パッケージを形成しない場
合には、作用効率的に、コスト的に有利に半導体装置1
を製造することができるようになる。
Further, in this embodiment, since the terminals (bump-shaped terminal portions 31) of the semiconductor chip 3 and the internal terminal portions 21 of the substrate 2 are connected without using wires, the bump-shaped terminals are not used. It is not necessary to positively form a resin package in the sense that disconnection between the portion 31 and the internal terminal portion 21 is avoided. When the resin package is not formed, the semiconductor device 1 is advantageously operated efficiently and cost-effectively.
Can be manufactured.

【0033】ところで、基板2上に半導体チップ3を実
装する段階においては外部端子部24が形成されておら
ず、貫通孔23の上部開口を内部端子部21が覆った状
態とされている。このため、貫通孔23の直上において
バンプ状端子部31が接続される構成とすれば、裏面側
の支持がない極めて不安定な状態とされた内部端子部2
1に、バンプ状端子部31を接続しなければならない。
これでは、内部端子部21とバンプ状端子部31との間
の接続性の面で問題が生じかねない。
By the way, when the semiconductor chip 3 is mounted on the substrate 2, the external terminal portions 24 are not formed, and the internal terminal portions 21 cover the upper openings of the through holes 23. For this reason, if the bump-shaped terminal portion 31 is configured to be connected directly above the through hole 23, the internal terminal portion 2 which is in an extremely unstable state without support on the back surface side is provided.
1, the bump-shaped terminal 31 must be connected.
This may cause a problem in the connectivity between the internal terminal portion 21 and the bump-shaped terminal portion 31.

【0034】これに対して本実施形態では、基板2の内
部端子部21の一端部21aに貫通孔23を介して外部
端子部24が接続され、他端部21bに基板2のバンプ
状端子部31が接続されている。すなわち、図3に良く
表れているように外部端子部24とバンプ状端子部31
とは内部端子部21を挟んだ状態で互いに位置ずれして
おり、内部端子部21における貫通孔23の直上領域を
避けて内部端子部21とバンプ状端子部31とが接続さ
れている。この構成では、上記したような接続性の問題
を心配する必要はない。
On the other hand, in the present embodiment, the external terminal 24 is connected to one end 21a of the internal terminal 21 of the substrate 2 through the through hole 23, and the bump-like terminal of the substrate 2 is connected to the other end 21b. 31 are connected. That is, as best seen in FIG. 3, the external terminal portion 24 and the bump-shaped terminal portion 31 are formed.
Are shifted from each other with the internal terminal portion 21 interposed therebetween, and the internal terminal portion 21 and the bump-shaped terminal portion 31 are connected to each other while avoiding a region immediately above the through hole 23 in the internal terminal portion 21. With this configuration, there is no need to worry about the connectivity problem described above.

【0035】なお、半導体チップ3のバンプ状端子部3
1と基板2の内部端子部21との間の接続は、たとえば
バンプ状端子部31を内部端子部21に対応させて基板
2上に半導体チップ3を載置した状態で、バンプ状端子
部31と内部端子部21との間に超音波振動を供給する
ことによって各端子部21,31の接続部分を合金化す
ることによって行ってもよい。
The bump-shaped terminal 3 of the semiconductor chip 3
The connection between the first terminal 1 and the internal terminal portion 21 of the substrate 2 is performed, for example, in a state where the semiconductor chip 3 is mounted on the substrate 2 with the bump-shaped terminal portion 31 corresponding to the internal terminal portion 21. The connection may be made by alloying the connection portion of each of the terminal portions 21 and 31 by supplying ultrasonic vibration between the terminal portion and the internal terminal portion 21.

【0036】また、基板2の内部端子部21や外部端子
部24の数は、半導体チップ3のバンプ状端子部31の
数に規定されるものであり、バンプ状端子部31の数が
比較的に少ない場合には、必ずしも外部端子部24を格
子状に配列形成してBGAとして構成する必要はない
し、またBGA以外の半導体装置1においても本願発明
の技術思想を適用できるのはいうまでもない。
The number of the internal terminal portions 21 and the number of the external terminal portions 24 of the substrate 2 are defined by the number of the bump-shaped terminal portions 31 of the semiconductor chip 3, and the number of the bump-shaped terminal portions 31 is relatively small. When the number of the external terminals 24 is small, it is not always necessary to form the external terminal portions 24 in a grid pattern to form a BGA, and it is needless to say that the technical idea of the present invention can be applied to the semiconductor device 1 other than the BGA. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】本願発明に係る半導体装置の一例を表す全体斜
視図である。
FIG. 1 is an overall perspective view illustrating an example of a semiconductor device according to the present invention.

【図2】図1の半導体装置を裏面側から見た全体斜視図
である。
FIG. 2 is an overall perspective view of the semiconductor device of FIG. 1 as viewed from the back side.

【図3】図1のIII −III 線に沿う断面図である。FIG. 3 is a sectional view taken along line III-III in FIG.

【図4】半導体チップを裏面側から見た全体斜視図であ
る。
FIG. 4 is an overall perspective view of the semiconductor chip as viewed from the back side.

【図5】基板の全体斜視図である。FIG. 5 is an overall perspective view of a substrate.

【図6】図5の基板を裏面側から見た全体斜視図であ
る。
FIG. 6 is an overall perspective view of the substrate of FIG. 5 as viewed from the back side.

【図7】従来の半導体装置の一例を表す断面図である。FIG. 7 is a cross-sectional view illustrating an example of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 半導体装置 2 基板 3 半導体チップ 5 異方性導電接着剤 20 一面(基板の) 21 内部端子部 21a 一端部(内部端子部の) 21b 他端部(内部端子部の) 22 他面(基板の) 23 貫通孔 24 外部端子部 30 一面(半導体チップの) 50 樹脂成分 51 導電成分 Reference Signs List 1 semiconductor device 2 substrate 3 semiconductor chip 5 anisotropic conductive adhesive 20 one surface (of substrate) 21 internal terminal 21a one end (of internal terminal) 21b other end (of internal terminal) 22 other surface (of substrate) ) 23 through hole 24 external terminal part 30 one surface (of semiconductor chip) 50 resin component 51 conductive component

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 複数のバンプ状端子部が一面側に形成さ
れた半導体チップと、長手状とされた複数の内部端子部
が一面側に形成され、かつ複数の貫通孔が形成された基
板と、この基板の他面側に形成され、かつ上記貫通孔を
介してそれぞれが対応する上記内部端子部と接続された
外部端子部と、を備え、上記各内部端子部とこれに対応
する上記バンプ状端子部とが互いに対向し、かつ電気的
に接続された半導体装置であって、 上記各外部端子部は、これに対応する上記内部端子部の
一端部側に導通接続され、かつ上記半導体チップの直下
領域に形成されており、上記各バンプ状端子部は、これ
に対応する上記内部端子部の他端部側に導通接続されて
いることを特徴とする、半導体装置。
A semiconductor chip having a plurality of bump-shaped terminal portions formed on one surface side; and a substrate having a plurality of elongated internal terminal portions formed on one surface side and having a plurality of through holes formed therein. External terminal portions formed on the other surface side of the substrate and connected to the corresponding internal terminal portions via the through holes, respectively, and the internal terminal portions and the bumps corresponding thereto. A semiconductor device in which the external terminal portions face each other and are electrically connected to each other, wherein each of the external terminal portions is conductively connected to one end of the corresponding internal terminal portion, and the semiconductor chip A semiconductor device, wherein each of the bump-shaped terminal portions is electrically connected to the other end of the corresponding internal terminal portion.
【請求項2】 上記半導体チップと上記基板とは、樹脂
成分内に導体成分を分散させた構造を有する異方性導電
接着剤の上記樹脂成分がそれぞれの一面の間に介在する
ことによって機械的に接合されているとともに、上記各
バンプ状端子部とこれに対応する上記内部端子部との間
に上記導電成分が介在することによって電気的に接続さ
れている、請求項1に記載の半導体装置。
2. The semiconductor chip and the substrate are mechanically connected to each other by interposing the resin component of the anisotropic conductive adhesive having a structure in which a conductor component is dispersed in a resin component between the respective surfaces. 2. The semiconductor device according to claim 1, wherein the semiconductor component is joined to the bump-shaped terminal portions and the corresponding internal terminal portions are electrically connected to each other by interposing the conductive component. 3. .
【請求項3】 上記複数の外部端子部は、上記基板の他
面側における中央部に格子状に配列形成されている、請
求項1または2に記載の半導体装置。
3. The semiconductor device according to claim 1, wherein the plurality of external terminal portions are arranged in a grid at a central portion on the other surface side of the substrate.
【請求項4】 上記各外部端子部は、ハンダによってボ
ール状に形成されている、請求項1ないし3のいずれか
に記載の半導体装置。
4. The semiconductor device according to claim 1, wherein each of said external terminal portions is formed in a ball shape by solder.
JP29500598A 1998-10-16 1998-10-16 Semiconductor device Expired - Fee Related JP3676590B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29500598A JP3676590B2 (en) 1998-10-16 1998-10-16 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29500598A JP3676590B2 (en) 1998-10-16 1998-10-16 Semiconductor device

Publications (2)

Publication Number Publication Date
JP2000124256A true JP2000124256A (en) 2000-04-28
JP3676590B2 JP3676590B2 (en) 2005-07-27

Family

ID=17815114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29500598A Expired - Fee Related JP3676590B2 (en) 1998-10-16 1998-10-16 Semiconductor device

Country Status (1)

Country Link
JP (1) JP3676590B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002069401A1 (en) * 2001-02-28 2002-09-06 Sony Corporation Semiconductor device, its manufacturing method, and electronic apparatus
JP2003100948A (en) * 2001-09-25 2003-04-04 Texas Instr Japan Ltd Semiconductor device and manufacturing method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002069401A1 (en) * 2001-02-28 2002-09-06 Sony Corporation Semiconductor device, its manufacturing method, and electronic apparatus
JP2002261190A (en) * 2001-02-28 2002-09-13 Sony Corp Semiconductor device, method for manufacturing the same and electronic equipment
US6794739B2 (en) 2001-02-28 2004-09-21 Sony Corporation Semiconductor device, process for production thereof, and electronic equipment
KR100924510B1 (en) * 2001-02-28 2009-11-02 소니 가부시끼 가이샤 Semiconductor device, its manufacturing method, and electronic apparatus
JP2003100948A (en) * 2001-09-25 2003-04-04 Texas Instr Japan Ltd Semiconductor device and manufacturing method thereof

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