JP2000119842A - Wear resistant material and sliding member - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a member having excellent wear resistance of a sliding face by specifying each content of Ti, Cr and N. SOLUTION: By using an arc discharge type ion plating method, metallic titanium and metallic chromium are evaporated in a vacuum to be turned into an evaporated material, and this evaporated material is ionized by arc discharge, is simultaneously brought into reaction with gaseous nitrogen and is deposited on the sliding face of a base material 2 to form a TiCrN this film 20. At this time, by incorporating, by atom, 45 to 60% Ti, 14 to 32% Cr and 14 to 36% N, a three-dimensional amorphous wear resistant material thin film is obtd. Moreover, by incorporating 44 to 60% Ti, 0.4 to 5.0% Cr and 40 to 45% N, a three-dimensional crystalline wear resistant material thin film is obtd. In this way, each thin film is small in the coefficient of friction, is small in distortion in the material and exhibits durability to the sliding member.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to an abrasion-resistant material,
In particular, the present invention relates to a wear-resistant material suitable for forming a sliding surface of a sliding member such as a seal member such as a mechanical seal or a gas seal or a bearing, and a sliding member using the same.

[0002]

2. Description of the Related Art As materials for forming seal members such as mechanical seals and gas seals and sliding members such as bearings,
Conventionally, carbon, silicon carbide, cemented carbide and the like have been widely used in combinations of carbon to silicon carbide, carbon to cemented carbide and the like.

In recent years, the use conditions of sliding members have become more and more severe with the need for high speed, high pressure, and large size of fluid machines. Therefore, of the material forming the sliding member,
The problem of cracking due to thermal shock destruction or thermal fatigue, which repeatedly generates frictional heat due to sliding contact between solids, has been regarded as a problem. Also,
High-strength, high-pressure, etc. rotating equipment uses high-strength silicon carbide or cemented carbide molded products as seal members, but these are brittle and have reinforcing members such as bands to prevent breakage due to increased centrifugal force. Need.

[0004] On the other hand, as a method of preventing breakage, a base material of a sliding member, which is not high in strength such as a metal material, is formed of a non-brittle material and a sliding surface is coated with a hard thin film or the like. Methods for increasing the strength are also being studied. However, in surface modification such as carbonization and nitriding, deformation of the sliding member (base material) due to heating during the processing is large, and the strength is reduced such that a hard thin film is separated from the base material by strain. In ion implantation, the implantation depth is limited, and it is difficult to obtain a desired strength. Physical vapor deposition (PVD) or chemical vapor deposition (C
In the method of forming a hard thin film on the sliding surface by VD), a modified portion can be formed sufficiently, but the chemical vapor deposition method (C
In the case of VD), it is necessary to heat the processing section to about 400 to 1000 ° C., which causes deformation of the sliding member (base material). In the physical vapor deposition method (PVD), conventionally, in order to obtain a high-strength coating film, the substrate temperature is heated to about 300 to 500 ° C., and also in this case, the strength decreases due to deformation of the sliding member. I was

[0005]

SUMMARY OF THE INVENTION The present invention provides a wear-resistant material suitable for forming a sliding surface of a sliding member, particularly a wear-resistant material that can be formed without causing deformation of the sliding member. The purpose is to:

[0006]

In order to solve the above-mentioned problems, the present invention is a ternary material mainly composed of three elements, Ti, Cr and N, which contains 40 to 60 at% of Ti. An object of the present invention is to provide a wear-resistant material and a sliding member having a sliding surface formed of the wear-resistant material.

[0007] The wear-resistant material according to the present invention has an atomic percent of each element.
(At%), Cr is 14 to 32 at%, and N is 1
Contains 4 to 36 at%, or 0.4 to 5.
It is preferable to contain 0 at% and N at 40 to 45 at%.

As will be described later, the wear-resistant material of the present invention contains 40 to 60 at% of Ti and further contains 14% of Cr.
-32 at% and N at 14-36 at% make it amorphous or contain Ti at 40-60 at%, and further contain 0.4-5.0 at% of Cr and 40 at% of N.
By containing 45 at%, it becomes crystalline. 2 above
In both cases, the coefficient of friction is reduced and the wear resistance is significantly improved.

Further, the wear-resistant material of the present invention comprises Ti, C
It is preferable that the ratio (composition ratio) of each element of r and N satisfies the relationship of the following formula (1) or (2). As will be described later, when the relationship of the following formula (1) or (2) is satisfied, the friction coefficient is reduced and the wear resistance is significantly improved. y ≧ 1.1x−0.18 Formula (1) [amorphous] y ≦ 0.3x−0.04 Formula (2) [crystalline] (In the above formulas (1) and (2), x = [ N element ratio (at%)] / ｛[Ti element ratio (at%)] + [Cr
Element ratio (at%)]｝, y = [Cr element ratio (at
%)] / [Element ratio of Ti (at%)]. )

[0010] By forming the sliding surface with the above-mentioned wear-resistant material, a sliding member excellent in wear resistance of the sliding surface can be obtained.

In order to satisfy the above conditions, the wear-resistant material of the present invention evaporates metal titanium (Ti) and metal chromium (Cr) under vacuum to form an evaporant, and ionizes the evaporate by arc discharge. At the same time as nitrogen gas (N ₂ )
And depositing it on the sliding surface of the base material, that is, by forming a thin film using a so-called arc discharge type ion plating method. By using the arc discharge ion plating method, it is possible to obtain a wear-resistant material that satisfies the above-described desired state and has small distortion in the film.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings. FIG. 1 is a schematic view showing an example of the configuration of an ion plating apparatus for forming a TiCrN thin film made of the wear-resistant material of the present invention on a sliding surface of a substrate. TiC
The substrate 2 for forming the rN thin film is arranged and fixed to the holder 4 at the tip of the rotating shaft 3 so as to be coaxial with the rotating shaft 3. The holder 4 includes a temperature control device (not shown), and controls the temperature of the base material. Evaporation source 5a facing the base material 2
(Metal titanium) and 5b (metal chromium) are arranged, and emit titanium (Ti) vapor from the evaporation source 5a and chromium (Cr) vapor from the evaporation source 5b toward the substrate 2. The titanium vapor particles and the chromium vapor particles (6) are ionized by arc discharge generated by the ionization electrode 8. On the other hand, a nitrogen gas 9 is introduced between the evaporation sources 5a, 5b and the substrate 2, and a reaction product of the ionized titanium vapor particles and chromium vapor particles (10) reacting with the nitrogen gas is deposited on the substrate 2. And a TiCrN thin film is formed on the sliding surface.

The physical properties of the formed TiCrN thin film include the temperature of the thin film forming surface of the substrate, the bias voltage applied to the substrate, the evaporation speed from the evaporation source, the flow rate (introduction speed) of nitrogen gas, and the evaporation method of the evaporation source. , Working pressure, ionization conditions of the evaporant, etc., but these are not particularly limited.
What is necessary is just to set suitably according to the physical property of an N thin film. Preferably, the substrate temperature on the thin film forming surface (sliding surface) is 100 ° C.
Hereinafter, the bias voltage is 50 V or less, and the deposition rate is 4 ° / s.
It is better to do the following. Further, as shown in FIGS. 5, 6, and 11, the amount of surface distortion or the coefficient of friction in the horizontal direction of the thin film can be controlled by the flow rate of the nitrogen gas.

Next, the sliding member of the present invention in which the above-described TiCrN thin film is formed on the sliding surface will be described. FIG. 2 is a cross-sectional view showing a configuration of a rotary ring of a gas seal which is an example of the sliding member of the present invention. As a base material 2, a martensitic stainless steel (SUS420J2) is used, processed into a predetermined shape, quenched (980 ° C., 1 hour), and tempered (980).
At 4 ° C. for 4 hours), and the surface on which the thin film is formed has a surface roughness Ra = 0.0.
Lapping was performed so as to be 5 μm or less.

The substrate 2 is ion bombarded (cleaning conditions: RF 0.6 kW, Ar flow rate 100 ml / mi).
n, bias voltage 1 kV, high-frequency glow discharge for 15 minutes), the sliding surface was cleaned, and then set in the apparatus of FIG. , A bias voltage applied to the substrate, a flow rate (introduction speed) of nitrogen gas, a film formation speed, etc.], and a 3 μm-thick TiCrN thin film 20 was formed.

FIG. 3 shows the sliding surface (TiCrN) of the rotating ring.
FIG. 4 shows the relationship between the temperature of the thin film forming surface of the base material (substrate set temperature) and the amount of surface strain in the horizontal direction of the thin film for each bias voltage value applied to the base material. The relationship between the bias voltage value applied to the base material and the amount of surface strain in the horizontal plane of the thin film on the sliding surface of the ring (TiCrN thin film surface) is shown for each temperature of the thin film forming surface of the base material.

The amount of surface distortion is measured using a universal surface profiler (S
E-3FA Deformation amount traced from one end of the sliding surface of the rotating ring to the other end (outer end and inner end) by Kosaka Laboratory Co., Ltd. (magnification 5000 × 10 )
And the amount of change (tilt height) between both ends is calculated as the surface distortion (unit: μ).
m).

FIGS. 3 and 4 show that the temperature of the thin film forming surface of the base material and the bias voltage applied to the base material greatly affect the important surface strain in the horizontal direction of the thin film of the sliding member. It can be seen that it is indispensable to minimize the temperature of the thin film forming surface of the substrate and the bias voltage applied to the substrate to minimize the amount of distortion. Preferably, the substrate temperature on the sliding surface is 100 ° C. or less, the bias voltage is 50 V or less, and the film forming rate is 4 ° / s or less.

On the other hand, FIGS. 5 and 6 show the composition ratios of Ti, Cr, and N (Ti, Cr in the figures) which change with the change of the film forming conditions on the sliding surface (TiCrN thin film surface) of the rotating ring. ,
N indicates the element ratio of each element = at%. ) And the amount of surface strain in the horizontal direction of the thin film are shown for each nitrogen gas flow rate (introduction rate). The composition ratio of Ti, Cr, and N was calculated by performing X-ray elemental analysis on each TiCrN thin film using EPMA (X-ray microanalyzer, manufactured by JEOL Ltd.). 5 and 6 show that Ti, Cr, N
There is no correlation between the composition ratio and the surface strain in the horizontal direction of the thin film.
It can be seen that even when a film having a desired composition is obtained, the amount of surface distortion can be controlled by changing film formation conditions such as the flow rate of nitrogen gas.

Next, FIG. 7 shows the sliding surface (Ti
FIG. 6 is a diagram showing the correlation between the composition ratio of Ti, Cr, and N, which changes with the change in film forming conditions, and the crystallinity on the CrN thin film surface), and the composition ratio [element ratio of N (at%)]. / ｛[T
i element ratio (at%)] + [Cr element ratio (at
%)] And the composition ratio [Cr element ratio (at%)] / [Ti
And the element ratio (at%).
The composition ratio of Ti, Cr, and N was calculated from the measured value (element ratio) of the X-ray elemental analysis by EPMA in the same manner as described above. Table 1 shows the value of the composition ratio of each example, and TiN was used as a comparative example.
Table 2 shows the values of the composition ratios of the thin films. FIG. 8 shows the correspondence between the plot of FIG. 7 and the example of Table 1 and the crystallinity area corresponding to FIG. 9 described later. Corresponds to the reference example in Table 1.)

The crystallinity was measured using an X-ray diffractometer (X-Ray D).
iffractmeter RINT-2000 manufactured by Rigaku Denki Kogyo KK, measurement conditions: Cu-Kα ray 50k
(V × 250 mA). FIG. 9 shows an amorphous film corresponding to the correlation between the composition ratio of Ti, Cr, and N and the crystallinity [FIG. 9 (a): corresponding to area A in FIG. ], Amorphized film [FIG. 9 (b): corresponds to area B in FIG. ], Crystalline film [FIG. 9 (c): FIG.
It corresponds to the middle area C. 1] shows a typical X-ray diffraction pattern of TiCrN in [1]. The amorphous film has a broad region between the two peaks (indicated by。 and the solid circle indicates the peak of the base material), and no clear peak is observed, whereas the crystalline film has two clear peaks. Appears in Table 3 shows the correlation between the range of the element ratio (at%) of Ti, Cr, and N and the crystallinity determined from the result of the X-ray elemental analysis and the X-ray diffraction pattern.
Shown in

FIGS. 7 to 9 show that the condition for the appearance of the amorphous film and the crystalline film in the TiCrN thin film is when the relationship of the following formula (1) or (2) is satisfied. y ≧ 1.1x−0.18 Equation (1) [Range where an amorphous film appears] y ≦ 0.3x−0.04 Equation (2) [Range where a crystalline film appears] (the above equation (1), In (2), x = [element ratio of N (at%)] / ｛[element ratio of Ti (at%)] + [Cr
Element ratio (at%)]｝, y = [Cr element ratio (at
%)] / [Element ratio of Ti (at%)]. Y = 1.1x−0.18 Equation (1 ′) is shown by a solid line in FIGS. 7 and 8, and y = 0.3x−0.04 Equation (2 ′) is expressed in FIGS. Shown by dotted lines.

Further, a thrust type friction and wear tester (EFM-III-) was used for the rotating rings of Examples, Reference Examples and Comparative Examples.
E Toyo Baldwin Co., Ltd.)
The sliding surface is a fixed ring made of a ring-shaped carbon molded body having a specified surface roughness (Carbon P9867 for high-load mechanical sealing, manufactured by Pure Carbon Co.), and the surface pressure applied to the fixed ring sliding surface at room temperature and air is 5 kgf. / Cm ² by adjusting the thrust load, the peripheral speed (slip speed) 2m / s,
Assuming that the traveling distance is 7200 m, the carbon wear amount of the fixed ring,
The wear amount and friction coefficient of the TiCrN thin film of the rotating ring were measured. The amount of wear is determined by the height of the rotating ring and the fixed ring (1/1).
000 micrometers) and the surface trace state. The wear coefficient is calculated from the friction torque detected from the load cell. The results are shown in Tables 1 and 2.

Further, from Table 1, the correlation between the composition ratio of Ti, Cr, and N in the TiCrN thin film and the dry sliding property (composition ratio ([element ratio of N (at%)] / ｛[element ratio of Ti ( a
t%)] + [element ratio of Cr (at%)]} and composition ratio [T
i: Element ratio of element ratio (at%)] / [Cr element ratio (a
FIG. 10 shows the composition ratio of Ti, Cr, and N in the TiCrN thin film ([element ratio of N (at%)] /
｛[Element ratio of Ti (at%)] + [element ratio of Cr (at
%)] を) and the friction coefficient for each nitrogen gas flow rate are shown in FIG.

From the results shown in FIGS. 7 to 11 and Table 1, it can be seen that the TiCrN thin film has a small friction coefficient and shows good wear resistance in either the amorphous film or the crystalline film.

Therefore, in the above TiCrN thin film,
It can be seen that when the composition ratio of Ti, Cr, and N satisfies the relationship of the above formula (1) or (2), which becomes amorphous or crystalline, good wear resistance is exhibited. Further, from Table 3, the element ratio of Ti, Cr and N, which becomes amorphous or crystalline, contains 40 to 60 at% of Ti,
３２32 at%, 14 to 36 at% of N (amorphization), or 40 to 60 at% of Ti, 0.4 to 5.0 at% of Cr and 40 to 45 at% of N
% (Crystalline) shows good wear resistance.

In the above embodiment, a cut product of stainless steel was used as the base material. However, the present invention is not limited to this. Materials and materials such as ceramics can be appropriately selected, and the processing method can also be selected according to the material and shape of the base material.

[0028]

[Table 1]

[0029]

[Table 2]

[0030]

[Table 3]

In the above embodiment, the rotating ring of the gas seal is used as the sliding member. However, the present invention is not limited to this. The sliding member has a sliding surface, and the sliding surface is formed of the wear-resistant material of the present invention. Any member that can be used may be used. For example, the sliding surface of the stationary ring of the gas seal may be formed of the wear-resistant material of the present invention, or the sliding surface of the movable member or the stationary member of the mechanical seal or the bearing may be formed of the wear-resistant material of the present invention. May be formed. Further, the sliding surface of the slide plate that slides opposite to the slide bearing of the bearing device as shown in FIG. 12 may be made of the wear-resistant material of the present invention (in FIG. 12, reference numeral 22 denotes a sole plate, 23 is a slide plate, 24 is a piston, 25 is a shim, 26 is a bearing,
27 indicates a seal ring, 28 indicates an elastomer, and 29 indicates a baespot).

The sliding member of the present invention comprises a turbine, a blower,
It is suitably used for compressors, stirrers and the like.

In the above embodiment, carbon is used as the material for forming the sliding surface of the mating member to be combined with the sliding member of the present invention. A material used as a material can be used.

[0034]

The wear-resistant material of the present invention has a Ti content of 40 to 40%.
60 at%, Cr is 14 to 32 at%, N
14 to 36 at%, or 40 to 6 at.
0 at%, and 0.4 to 5.0 at% of Cr,
When N is contained at 40 to 45 at%, the coefficient of friction is reduced, the distortion in the material is small, and the wear resistance is significantly improved. Therefore, the sliding member having the sliding surface formed of the wear-resistant material of the present invention has excellent durability during sliding.

[Brief description of the drawings]

FIG. 1 is a schematic view showing an example of the configuration of an ion plating apparatus for forming a TiCrN thin film made of the wear-resistant material of the present invention on a sliding surface of a substrate.

FIG. 2 is a cross-sectional view showing a configuration of a rotary ring of a gas seal which is an example of the sliding member of the present invention.

FIG. 3 is a diagram showing a relationship between the temperature (set temperature) of the thin film forming surface of the substrate and the amount of surface strain in the horizontal direction of the thin film on the sliding surface of the rotating ring in FIG. 2; It is a figure shown for every voltage value.

FIG. 4 shows the relationship between the bias voltage value applied to the substrate and the amount of surface distortion in the horizontal plane of the thin film on the sliding surface of the rotating ring of FIG. 2 for each temperature of the thin film forming surface of the substrate. It is a figure

FIG. 5 is a diagram showing T on the sliding surface of the rotating ring shown in FIG. 2;
i, Cr composition ratio ([Cr element ratio (at%)] / [T
FIG. 4 is a diagram showing the relationship between the element ratio of i (at%)]) and the amount of surface strain in the horizontal direction of the thin film for each nitrogen gas flow rate (introduction rate).

FIG. 6 is a diagram illustrating a T ring on a sliding surface of the rotating ring of FIG. 2;
i, Cr, N composition ratio ([element ratio of N (at%)] /
｛[Element ratio of Ti (at%)] + [element ratio of Cr (at
%)]｝) And the relationship between the amount of surface strain in the horizontal plane direction of the thin film and the flow rate (introduction speed) of the nitrogen gas.

7 is a diagram showing a correlation between crystallinity and a composition ratio of Ti, Cr, and N, which changes with a change in film forming conditions, on a sliding surface of the rotating ring in FIG. 2; .

FIG. 8 shows the correlation between the composition ratio of Ti, Cr, and N and the crystallinity in FIG. 7 and the corresponding relationship between Examples and Reference Examples.

9A is a typical X-ray diffraction pattern of a TiCrN amorphous film, FIG. 9B is a typical X-ray diffraction pattern of a TiCrN amorphous film, and FIG. (c) is a diagram showing a typical X-ray diffraction pattern of the TiCrN crystalline film.

FIG. 10 is a view showing a sliding surface of the rotating ring of FIG. 2;
It is a figure which shows the correlation between the composition ratio of Ti, Cr, and N in a TiCrN thin film, and dry sliding property.

FIG. 11 is a diagram showing a sliding surface of the rotating ring of FIG. 2;
FIG. 4 is a diagram showing a relationship between a composition ratio of Ti, Cr, and N in a TiCrN thin film and a coefficient of friction.

FIG. 12 is a main part configuration diagram of a bearing device to which a slide plate, which is an example of the sliding member of the present invention, is applied.

[Description of Signs] 1 Arc discharge ion plating apparatus 2 Substrate 3 Rotating shaft 4 Holder 5a Evaporation source (metal titanium) 5b Evaporation source (metal chromium) 6 Vapor particles (Ti, Cr) 7 Filament 8 Ionization electrode 9 Reaction Gas (N ₂ ) 10 Ionized vapor particles (Ti, Cr) 11 DC power supply 12 Power supply 13 EB gun 14 Roughing valve 15 Main valve 16 Cryopump 17 Oil rotary pump 20 TiCrN thin film 21 Sliding surface

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[Procedure amendment]

[Submission Date] September 6, 1999 (September 9, 1999)

[Procedure amendment 1]

[Document name to be amended] Statement

[Correction target item name] Name of invention

[Correction method] Change

[Correction contents]

[Title of the Invention] Sliding member

[Procedure amendment 2]

[Document name to be amended] Statement

[Correction target item name] Claims

[Correction method] Change

[Correction contents]

[Claims]

[Procedure amendment 3]

[Document name to be amended] Statement

[Correction target item name] 0001

[Correction method] Change

[Correction contents]

[0001]

The present invention relates to a seal member such as a mechanical seal and a gas seal and a sliding member such as a bearing.

[Procedure amendment 4]

[Document name to be amended] Statement

[Correction target item name] 0005

[Correction method] Change

[Correction contents]

[0005]

DISCLOSURE OF THE INVENTION The present invention relates to abrasion resistance.
An object is to provide an excellent sliding member .

[Procedure amendment 5]

[Document name to be amended] Statement

[Correction target item name] 0006

[Correction method] Change

[Correction contents]

[0006]

In order to solve the above-mentioned problems, the sliding member according to the first aspect of the present invention is characterized in that Ti is 45 to 60%.
at%, Cr 14-32at%, N 14-36at
% Ternary amorphous wear resistant material thin film
It is characterized by becoming. The sliding member according to claim 2 is T
i is 44 to 60 at%, Cr is 0.4 to 5.0 at%,
Ternary crystalline wear resistance containing 40 to 45 at% N
It is characterized by forming a material thin film.

[Procedure amendment 6]

[Document name to be amended] Statement

[Correction target item name] 0007

[Correction method] Deleted

[Procedure amendment 7]

[Document name to be amended] Statement

[Correction target item name] 0008

[Correction method] Deleted

[Procedure amendment 8]

[Document name to be amended] Statement

[Correction target item name] 0009

[Correction method] Deleted

[Procedure amendment 9]

[Document name to be amended] Statement

[Correction target item name] 0026

[Correction method] Change

[Correction contents]

Therefore, in the above TiCrN thin film,
It can be seen that when the composition ratio of Ti, Cr, and N satisfies the relationship of the above formula (1) or (2), which becomes amorphous or crystalline, good wear resistance is exhibited. Also, from Table 3, the element ratio of Ti, Cr, and N, which becomes amorphous or crystalline, contains 45 to 60 at% of Ti and 14
３２32 at%, 14 to 36 at% N (amorphous), or 44 to 60 at% Ti, 0.4 to 5.0 at% Cr, 40 to 45 at% N
It can be seen that when contained (crystalline), good wear resistance is exhibited.

[Procedure amendment 10]

[Document name to be amended] Statement

[Correction target item name] 0034

[Correction method] Change

[Correction contents]

[0034]

The sliding member according to the present invention is made of Ti45a-60a.
t%, Cr14-32at%, N14-36at%
Ternary amorphous wear-resistant material thin film or Ti
44-60 at%, Cr 0.4-5.0 at%, N40
Ternary crystalline wear-resistant material containing up to 45 at%
Each thin film has a small coefficient of friction,
Further, since the distortion in the material is small and the wear resistance is remarkably improved , the durability during sliding is excellent.

Claims (6)

[Claims] 1. A wear-resistant material comprising a ternary material mainly composed of three elements, Ti, Cr, and N, characterized by containing 40 to 60 at% of Ti. 2. Cr is 14 to 32 at% and N is 14 to 3 at%.
The wear-resistant material according to claim 1, which contains 6 at%. 3. A Cr content of 0.4 to 5.0 at% and a N content of 40 at%.
The wear-resistant material according to claim 1, wherein the content of the wear-resistant material is about 45 at%. 4. A sliding member, wherein the sliding surface is formed of the wear-resistant material according to claim 1. 5. Evaporation of metal titanium (Ti) and metal chromium (Cr) under vacuum to produce an evaporate, ionizing the evaporate by arc discharge and simultaneously using nitrogen gas (N
5. The sliding member according to claim 4, wherein the abrasion-resistant material thin film is formed on the sliding surface by reacting with ₂ ) and depositing on the sliding surface of the base material. 6. The method of forming a wear-resistant material thin film on a sliding surface under the conditions that a substrate temperature on the sliding surface is 100 ° C. or less, a bias voltage is 50 V or less, and a film forming speed is 4 ° / s or less. The sliding member according to claim 5, wherein: