JP2000114223A - Method and device for treating substrate surface - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment method and device for treating the surfaces of plural substrates which are changed in position from a horizontal state to a vertical state, and are put in a processing tank at optimum pitches for processing, independently of the pitches of the substrates received in a transfer cassette. SOLUTION: A transfer cassette receiving substrates to be processed at prescribed pitches is placed on a transfer bed 12, and a loader substrate transfer robot 13 transfers the substrates to an empty cassette which receives the substrates at optimum pitches and placed on a transfer bed 14. Then, a processing cassette is erected and cleaned and dried in processing tanks 21a to 21g along a predetermined transfer path and then is mode to fell on its side again and placed on a transfer bed 31. An unloader substrate transfer robot 32 transfers the substrate to the empty transfer cassette on a transfer bed 33 transferred from the transfer bed 12, and then the transfer cassette is carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate surface treatment for performing a surface treatment such as cleaning on a glass substrate for a liquid crystal display, a reticle, a mask, a semiconductor wafer or the like (hereinafter these are simply referred to as "substrate"). The present invention relates to an apparatus, and more particularly, to a substrate surface treatment method and a substrate surface treatment apparatus for performing a surface treatment on a plurality of substrates stored in a cassette.

[0002]

2. Description of the Related Art A substrate manufacturing process includes a plurality of surface treatments such as photoresist coating, pattern baking, development, etching, cleaning, and peeling, and each of these surface treatments is performed by an individual surface treatment device (eg, , An exposure apparatus for pattern printing, a cleaning apparatus for cleaning, etc.).

[0003] Each surface treatment is a so-called single-wafer treatment in which one substrate is treated one by one according to the type of the surface treatment. There is a so-called batch processing in which processing is performed simultaneously, and each surface processing apparatus is configured according to the processing method.

[0004] As a conventional surface treatment apparatus for performing a predetermined surface treatment in a state where a plurality of substrates are housed in a cassette, for example, Japanese Utility Model Application Laid-Open Publication No. HEI 9-207, proposed by the present applicant.
There are those disclosed in Japanese Patent Publication No. 1-80934.

[0005] This apparatus comprises a cassette for exclusive use for carrying and transporting a plurality of substrates between another surface treating apparatus and the present surface treating apparatus, and a plurality of substrates for accommodating a plurality of substrates in the present surface treating apparatus. A cassette dedicated to processing for surface treatment is provided, and a plurality of substrates before surface treatment, which are housed in the cassette dedicated to transport and transferred in, are transferred from the cassette dedicated to transport to the cassette dedicated to processing. The surface treatment of each substrate is performed for each processing-dedicated cassette, and when the surface treatment is completed, each substrate is transferred from the processing-dedicated cassette to the transfer-dedicated cassette, and the transfer-dedicated cassette is unloaded.

[0006]

However, the prior art having such a structure has the following problems. That is, in the conventional apparatus, the pitch between a plurality of substrates accommodated in a cassette dedicated to processing is set to be the same as the pitch between a plurality of substrates accommodated in a cassette dedicated to transport. There are inconveniences.

When a plurality of substrates are stored in a cassette dedicated to processing and these substrates are collectively subjected to surface processing, the surface processing is performed in order to reduce the processing space of the surface processing section and the exclusive space of the apparatus. It is preferable that the pitch between the substrates is as small as possible within a range where the effect is not reduced.
Therefore, it is desirable that the processing-dedicated cassette be configured so that each substrate is stored at an optimum pitch in the processing-dedicated cassette.

However, the storage pitch of the cassette dedicated to transport is not always the same as the optimum pitch of the cassette dedicated to processing. Therefore, the storage pitch of the cassette dedicated to processing as in the conventional apparatus is changed to the cassette dedicated to transport. In the configuration that depends on the storage pitch, the surface treatment cannot be performed with the optimum pitch between the substrates. As a result, for example, if the storage pitch of the transfer-only cassette is larger than the optimum pitch of the processing-only cassette, the occupied area of the entire apparatus becomes larger, while the storage pitch of the transfer-only cassette becomes larger. If the pitch is smaller than the optimal pitch of the cassette, the surface treatment effect may be reduced, for example.

Furthermore, considering that the optimum pitch varies depending on the type of surface treatment, the type and size of the substrate, etc., in the configuration of the conventional apparatus, the entire surface treatment performed in the substrate manufacturing process or almost all surface treatments are performed. In the treatment, the surface is not treated at the optimum pitch. At this time, it is not permissible for quality control to reduce the processing effect of each surface treatment. As a result, the pitch of all cassettes is set according to the surface treatment that requires the widest substrate storage pitch. Not only that, the size of each surface treatment tank also increases, which causes a problem that the area occupied by the entire substrate surface treatment apparatus increases.

In the conventional apparatus, the transport means of the surface treatment section transports the cassette dedicated to the treatment in one direction (one-dimensionally), and the processing tanks constituting the surface treatment section are arranged one-dimensionally. Since the apparatus is provided, the apparatus becomes horizontally long, and the floor area utilization efficiency is deteriorated. In addition, for example, the maintenance area of each processing tank must be provided along each processing tank, and the apparatus becomes large as a whole. There are also problems.

Further, in the conventional apparatus, a storage shelf for temporarily storing a cassette dedicated to transport or a cassette dedicated to processing is provided,
A predetermined cassette is stored in or taken out of the storage shelf depending on the progress of processing. However, such a configuration complicates the processing procedure and requires a complicated mechanism for storing and removing a predetermined cassette from the storage shelf.

The present invention has been made in view of such circumstances, and a substrate surface treatment method and a substrate treatment method capable of performing a surface treatment at an optimum pitch without depending on a storage pitch of a cassette dedicated to conveyance. A main object of the present invention is to provide a substrate surface treatment apparatus. In addition, the posture of a plurality of substrates in a horizontal state is changed so as to stand upright in front of the treatment tank, and the plurality of substrates that have been changed to the standing posture are treated in the treatment tank. It is a main object of the present invention to provide a substrate surface treatment method and a substrate surface treatment apparatus capable of performing a surface treatment of a substrate in an upright posture by placing the substrate in a standing posture.

It is another object of the present invention to provide a compact device for achieving the above-mentioned main object.

[0014]

The present invention has the following configuration in order to achieve the above object. That is, the invention according to claim 1 is a substrate surface treatment method for performing surface treatment on a plurality of substrates in a treatment tank containing a cleaning liquid, wherein the plurality of substrates are extracted from a transport cassette in a horizontal state. In front of the processing tank, the posture of the substrate is changed so as to be upright, the pitch is different from the pitch of the transfer cassette, and the plurality of substrates that are changed to the upright position and have a different pitch from the transfer cassette are A method for treating a surface of a substrate, comprising: immersing the substrate in the treatment tank;

According to a second aspect of the present invention, there is provided a substrate surface treatment apparatus for performing a surface treatment of immersing a plurality of substrates contained in a cassette in a cleaning liquid, wherein the plurality of substrates accommodated at a predetermined pitch. A transfer cassette transfer unit for mounting a transfer cassette loaded in a rollover state in which
A processing cassette transfer unit for mounting a processing cassette in which a plurality of substrates are stored at a different pitch from the transfer cassette; and a transfer cassette between the transfer cassette and the processing cassette. A substrate transfer unit that takes out a plurality of stored substrates and transfers the substrates so that the substrates are stored at a storage pitch of the processing cassette that is different from the transfer cassette; A posture changing robot for changing a substrate taken out of the transport cassette from a rollover state to an upright state by means, and a processing tank containing the cleaning liquid, and a surface processing unit for immersing a plurality of substrates in the cleaning liquid And a surface treatment transport unit that transports the processing cassette containing substrates from the processing cassette transfer unit to the surface processing unit. A substrate surface treatment apparatus.

According to a third aspect of the present invention, in the substrate surface treating apparatus according to the second aspect, the transfer cassette transfer unit includes a transfer cassette loader transfer unit and a transfer cassette unloader transfer. The processing cassette transfer unit is configured by a processing cassette loader transfer unit and a processing cassette unloader transfer unit,
The substrate transfer unit transfers the plurality of substrates before surface treatment stored in the transfer cassette of the transfer cassette loader transfer unit at the storage pitch of the processing cassette to the processing cassette loader transfer unit. A loader unit substrate transfer unit that transfers the substrate to an empty processing cassette, and a plurality of surface-processed substrates stored in the processing cassette of the processing cassette unloader transfer unit, and a storage pitch of the transfer cassette. Wherein the transfer cassette unloader transfer unit transfers to an empty transfer cassette and an unloader substrate transfer unit, and the surface processing transfer unit transfers the substrate by the loader unit substrate transfer unit. The processing cassette, in which a plurality of substrates before surface processing are stored, is transferred from the processing cassette loader transfer unit via the surface processing unit to the processing cassette. Toanroda those configured to convey the transfer station.

According to a fourth aspect of the present invention, in the substrate surface treating apparatus according to the third aspect, between the outside of the substrate surface treating apparatus and the transfer cassette transfer unit,
A transfer cassette transfer unit that transfers the transfer cassette in which a plurality of substrates are stored is provided, and the transfer cassette transfer unit includes an outside of the substrate surface treatment apparatus and the transfer cassette loader transfer unit. Between a transfer cassette loader transfer unit that transfers a transfer cassette in which a plurality of substrates before surface treatment are stored, and a transfer cassette unloader transfer unit that is outside the substrate surface processing apparatus and the transfer cassette unloader transfer unit. And a transfer cassette unloader transfer section for transferring a transfer cassette containing a plurality of substrates subjected to surface treatment.

According to a fifth aspect of the present invention, in the substrate surface treating apparatus of the second aspect, the surface treating transport means has a transport path whose transport direction is turned halfway, and Along the transfer path, the transfer cassette loader transfer unit, the transfer cassette loader transfer unit, the loader unit substrate transfer unit, the processing cassette loader transfer unit, the surface processing unit, and the processing cassette An unloader transfer section, the unloader section substrate transfer means, the transfer cassette unloader transfer section, and the transfer cassette unloader transfer section are provided.

According to a fifth aspect of the present invention, in the substrate surface treating apparatus according to any one of the third to fifth aspects, the transfer cassette loader transfer section and the transfer cassette unloader transfer are performed. A transfer cassette buffer unit for holding an empty transfer cassette on standby, and transferring the empty transfer cassette after the transfer of substrates by the loader unit substrate transfer unit is completed. A transport cassette transport means for transporting the transport cassette loader from the transport cassette loader transfer section to the transport cassette unloader transfer section via the transport cassette buffer section.

According to a seventh aspect of the present invention, in the substrate surface treating apparatus according to any one of the third to fifth aspects, the processing cassette loader transfer section and the processing cassette unloader transfer are transferred. And a processing cassette buffer unit for holding an empty processing cassette on standby, and the empty processing cassette after the substrate transfer by the unloader unit substrate transfer unit is completed. And a processing cassette transfer means for transferring the processing cassette unloader transfer unit to the processing cassette loader transfer unit via the processing cassette buffer unit.

According to an eighth aspect of the present invention, in the substrate surface treating apparatus according to the sixth aspect, a transport cassette cleaning unit for cleaning the transport cassette is attached to the transport cassette buffer unit. And transferring the empty transfer cassette to the transfer cassette unloader transfer unit while transferring the empty transfer cassette from the transfer cassette loader transfer unit to the transfer cassette unloader transfer unit. It is configured to be cleaned in the section.

According to a ninth aspect of the present invention, in the substrate surface treating apparatus according to the seventh aspect, a processing cassette cleaning section for cleaning the processing cassette is attached to the processing cassette buffer section. Then, while the processing cassette transport means transports an empty processing cassette from the processing cassette unloader transfer unit to the processing cassette loader transfer unit, the empty processing cassette is washed with the processing cassette. It is configured to be cleaned in the section.

[0023]

The operation of the first aspect of the invention is as follows. The attitude of the plurality of horizontal substrates extracted from the transport cassette is changed so as to rise up before the processing tank, and the pitch is changed to a pitch different from the pitch of the transport cassette. A plurality of substrates having a different pitch from that of the cassette are placed in the processing bath, and the surface treatment of the substrates immersed in the cleaning liquid is performed in an upright posture.

According to the second aspect of the present invention, the substrate transfer means takes out a plurality of substrates before surface treatment from the transfer cassette carried into the transfer cassette transfer section, and performs processing. To the empty processing cassette of the processing cassette transfer unit at the storage pitch of the processing cassette,
Transfer each substrate. The posture changing robot changes the substrate taken out of the transport cassette by the substrate transfer means from a rolled state to a standing state. Then, the surface treatment transport means converts the plurality of substrates before the surface treatment into the standing posture, and converts the treatment cassettes stored at the optimal pitch for the surface treatment into the treatment cassette transfer unit. From to the surface treatment unit. At this time, the surface processing unit performs the surface processing on the plurality of substrates stored in the processing cassette.

As described above, the substrate transfer means transfers the substrates in accordance with the respective storage pitches of the transfer cassette and the processing cassette, and performs the surface treatment without depending on the storage pitch of the transfer cassette. On the other hand, a plurality of substrates can be stored in a processing cassette at an optimum pitch to perform surface treatment. In addition, although the transport cassette is carried in a rollover state in which the substrates to be stored are horizontal, during the surface treatment of immersion in the cleaning liquid, the substrates can be changed to a standing state to perform the surface treatment.

According to the third aspect of the present invention, the transfer of the substrate before the surface treatment from the transfer cassette to the processing cassette and the transfer of the surface-treated substrate from the processing cassette to the transfer cassette are performed. Transfer is performed independently.

According to the fourth aspect of the present invention, the transfer cassette transferring section transfers the transfer cassette, in which a plurality of substrates before surface processing are stored at a predetermined storage pitch, to the substrate surface processing apparatus. It is carried into the transfer cassette transfer unit from outside, and a transfer cassette in which a plurality of surface-treated substrates are stored at a predetermined pitch is transferred out of the transfer device from the transfer cassette transfer unit. . At this time, the loading of the transport cassette storing the unprocessed substrates and the unloading of the transport cassette storing the processed substrates are performed independently.

According to the fifth aspect of the present invention, the conveying means for surface treatment folds the conveying direction in the middle of the conveying path, and each part and each means are arranged along the conveying path. Therefore, a compact device having a reduced length in the lateral direction can be obtained.

According to the sixth aspect of the present invention, the transfer for holding the empty transfer cassette on standby between the transfer cassette loader transfer unit and the transfer cassette unloader transfer unit. A cassette buffer unit is provided, and the transfer cassette transfer unit transfers the empty transfer cassette after the transfer and the substrate transfer are completed from the transfer cassette loader transfer unit via the transfer cassette buffer unit to the transfer cassette unloader. Transfer to the transfer unit. In parallel with the transfer of the empty transfer cassette, surface treatment of each substrate stored in the processing cassette is performed, and the surface-treated substrate is transferred to the transfer cassette unloader transfer unit. It is transferred to a cassette and carried out. That is, since the transport cassette used at the time of loading can be used as the transport cassette at the time of unloading, the transport cassette can be used efficiently. If there is a difference between the transport time of the empty transport cassette and the processing time of the surface treatment, the empty transport cassette can be made to stand by in the transport cassette buffer unit.

According to the seventh aspect of the present invention, a processing cassette for holding an empty processing cassette on standby between the processing cassette loader transfer section and the processing cassette unloader transfer section. A cassette buffer unit is provided, and the processing cassette transfer unit transfers the empty processing cassette after transferring the surface-treated substrate to the transfer cassette in the processing cassette unloader transfer unit. Then, the sheet is conveyed from the section to the processing cassette loader transfer section via the processing cassette buffer section. That is, the processing cassette used in the apparatus can be used cyclically, and the processing cassette can be used efficiently. In addition, a surplus empty processing cassette can be kept waiting in the processing cassette buffer unit.

According to the eighth aspect of the present invention, a transport cassette washing section for cleaning the transport cassette is attached to the transport cassette buffer section, and the transport cassette transport means is an empty transport cassette. The empty transfer cassette is cleaned by the transfer cassette cleaning unit while the transfer cassette is transferred from the transfer cassette loader transfer unit to the transfer cassette unloader transfer unit. And the transfer cassette does not stain the processed substrate.

According to the ninth aspect of the present invention, a processing cassette cleaning unit for cleaning the processing cassette is attached to the processing cassette buffer unit, and the processing cassette transport means is an empty processing cassette. The empty processing cassette is cleaned by the processing cassette cleaning section while the processing cassette is transferred from the processing cassette unloader transfer section to the processing cassette loader transfer section. Can be carried out in a state of being stored in a cassette for use.

[0033]

An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view showing the appearance of a substrate surface treatment apparatus according to a first embodiment of the present invention, FIG. 2 is a plan view showing the configuration inside the apparatus of the first embodiment, and FIG. FIG. 4 is a diagram showing a configuration of a processing cassette. In the first embodiment and each of the following embodiments, a description will be given of a cleaning apparatus for a rectangular glass substrate (hereinafter simply referred to as “substrate”) for a liquid crystal display as an example.

As shown in FIGS. 1 and 2, the apparatus of this embodiment is roughly divided into a loader section 1, a surface treatment section 2, an unloader section 3, a piping / maintenance area 4, a transport cassette buffer section 5, And a cassette buffer unit 6. Each of these parts 1 to 6, as shown in FIG.
It is sealed in the housing, and the inside is kept in a highly clean atmosphere.

Before describing the configuration of each part, the configuration of the transport cassette 7 and the processing cassette 8 used in the apparatus of this embodiment will be described with reference to FIGS.

The transfer cassette 7 transports the substrate W before processing from the previous process of the apparatus of the embodiment to the apparatus of the embodiment, and processes the substrate W from the apparatus of the embodiment to the post-process of the apparatus of the embodiment. This is a cassette used to transport the substrates W, and is configured to store a plurality of substrates W, with the storage pitch of each substrate W being p1.

Specifically, as shown in FIGS. 3 (a) and 3 (b), two plate-like members 71 and 72 are provided with four side portions each.
This is a configuration in which a total of ten rod-shaped holding members 73 of two books and two bottoms are laid horizontally. As shown in FIG. 3C, each holding member 73 stores each substrate W at a storage pitch p1 (for example, 14
The groove is engraved inward so as to store the groove at a distance of 16 mm.

The processing cassette 8 is used for accommodating a plurality of substrates W when the surface treatment (cleaning process) of the apparatus is performed on the plurality of substrates W in the apparatus of the present embodiment. It is a cassette, and the storage pitch of each substrate W is p2
It is configured to store a plurality of substrates W.

More specifically, as shown in FIGS. 4A and 4B, two plate-like members 81 and 82 are each
In this configuration, a total of ten rod-shaped holding members 83 of two books and two bottoms are laid horizontally. On the upper part of each plate-shaped member 81, 82, a surface treatment robot 23 of the surface treatment unit 2 described later,
Projections 84 are provided for hooking hooks and hangers 24 and 25. In addition, as shown in FIG. 4C, each holding member 83 stores each substrate W at a storage pitch p.
The groove is cut inward so as to be stored at 2 (for example, 8.5 mm to 10 mm). This storage pitch p2
When the cleaning process is performed on a plurality of substrates W by the surface processing unit 2, the distance between the substrates W is determined based on the type and size of the substrate W to be processed within a range where the cleaning effect is not reduced. The pitch is determined in advance so as to be the minimum pitch (optimal pitch).

That is, this embodiment shows a case where the storage pitch p1 of the transport cassette is larger than the storage pitch p2 of the processing cassette (p1> p2). Although FIGS. 3 and 4 illustrate that ten substrates W are stored in each of the cassettes 7 and 8, respectively, the number of substrates W stored in each of the cassettes 7 and 8 is reduced to ten. It is not limited.

Next, the configuration of each of the units 1 to 6 of the present embodiment will be described according to the operation of the present embodiment. First, the configuration of the loader unit 1 will be described with reference to FIGS. 1, 2, and 5 to 7. FIG. 5 is a diagram showing a schematic configuration in the vicinity of the loader unit / unloader unit, FIG. 6 is a diagram showing a configuration of a loader unit substrate transfer robot, and FIG. 7 is a diagram for explaining a substrate transfer procedure. It is.

First, the transport cassette 7 storing a plurality of substrates W at the storage pitch p1 before being subjected to the cleaning process in the apparatus of the present embodiment is transported by a transport device (not shown) from the previous process of the present embodiment. , Entrance 1 shown in FIG. 1 and FIG.
Is placed on the mounting table 12 of the transport cassette 7 from the above. At this time, the transport cassette 7 is loaded onto the mounting table 12 such that the substrates W to be stored are turned sideways so as to be horizontal, and the bottom faces the loading port 11 side. That is, the mounting table 12
In this state, each substrate W stored in the transfer cassette 7 loaded and placed in the transfer port 11 can be extracted in a horizontal state from the side opposite to the transfer port 11.

A shutter (not shown) is provided at the carry-in port 11 in order to maintain a high-purity atmosphere in the apparatus. The shutter is opened only when the transport cassette 7 is carried in. The shutter is closed. In addition, the mounting table 12 is composed of two “U” -shaped convex portions provided on the upper portion of the table 1a in FIG. The opening grooves 1b between the convex portions will be described later.

The carry-in port 11 corresponds to a transfer cassette loader transfer section in the present invention, and the mounting table 12 corresponds to a transfer cassette loader transfer section in the present invention. Further, the carry-in port 11 and the carry-out port 34 of the unloader unit 3 described later also correspond to the transfer cassette transfer unit in the present invention, and the mounting table 12 and the mount table 33 of the unloader unit 3 described below It also corresponds to a transfer cassette transfer unit.

A loader unit substrate transfer robot 13 is disposed on the opposite side of the loading entrance 12 with the loading table 12 therebetween, and on the opposite side of the loader unit substrate transfer robot 13 with the loader unit substrate transfer robot 13 therebetween. The mounting table 14 is arranged. In addition,
The mounting table 14 has the same configuration as the mounting table 12, and is provided on the table 1c in FIG.

When the transfer cassette 7 is loaded and placed on the mounting table 12, an empty processing cassette 8 in which no substrate W is stored is placed on the mounting table 14, and the upper part of the processing cassette 8 is placed on the mounting table 12.
The substrate W is placed on its side so that the substrate W can be inserted horizontally. Then, the unprocessed substrate W stored in the transfer cassette 7 mounted on the mounting table 12 is transferred to the processing cassette 8 mounted on the mounting table 14 by the loader unit substrate transfer robot 13. .

The loader substrate transfer robot 13
Corresponds to the loader unit substrate transfer means in the present invention,
The mounting table 14 corresponds to a processing cassette loader transfer unit in the present invention. The loader unit substrate transfer robot 13 and the unloader unit substrate transfer robot 32 of the unloader unit 3 described below also correspond to a substrate transfer unit in the present invention, and the mounting table 14 and the mounting table of the unloader unit 3 described later. Reference numeral 31 also corresponds to the processing cassette transfer section in the present invention.

Here, the loader unit substrate transfer robot 13
Will be described with reference to FIG. In the loader unit substrate transfer robot 13, a base 132 is provided with a shaft 132 that is extendable and contractible in the Z direction and is rotatable, and the base end of the first arm 133 is rotated above the shaft 132. The base end of the second arm 134 is rotatably attached to the distal end of the first arm 133, and the base end of the substrate mounting portion 135 is rotatable at the distal end of the second arm 134. It is a configuration attached to. The substrate mounting portion 135 is provided with holes (not shown) for vacuum-sucking the lower surface of the substrate W. The holes are formed by the arms 134 and 133, the shaft 132, and the base 13
1 is connected to a vacuum pump (not shown) through a pipe provided inside. When the base end of the first arm 133 is rotated in a predetermined direction (for example, clockwise, the Ha direction in FIG. 6), the base end of the second arm 134 is rotated in the opposite direction (counterclockwise, FIG. 6 in the Hb direction).
At this time, the base end of the substrate mounting portion 135 is
34 is opposite to the direction of rotation of the base end (clockwise, H in FIG. 6).
It is configured to be rotated in synchronization with (c direction).
As a result, the arms 133 and 134 expand and contract, and the substrate mounting portion 135 can be inserted into and removed from the cassettes 7 and 8.

Next, a procedure for transferring the substrate W will be described with reference to FIG. First, the shaft 132 is extended or contracted so that the substrate platform 135 can be inserted below the substrate W1 stored in the lowermost stage of the transport cassette 7.
5 is adjusted, and as shown in FIGS. 2 and 5, the tip of the substrate mounting portion 135 faces the direction of the transfer cassette 7 and the arms 133 and 134 are contracted (folded). , The base ends of the first arm 133, the second arm 134, and the substrate mounting portion 135 are rotated in synchronization with the directions of Ha, Hb, and Hc, respectively, so that the arms 133 and 134 are extended, and the substrate mounting portion is rotated. 135 is inserted below the substrate W1 stored in the lowermost stage of the transport cassette 7. And the axis 132
Is extended in the Z direction by a small amount, and the substrate mounting portion 135 is raised to abut against the lower surface of the substrate W1, and the substrate W1 is vacuum-sucked to the substrate mounting portion 135. In this state, the first arm 13
3. By rotating the respective base ends of the second arm 134 and the substrate mounting portion 135 in a direction opposite to the above-described rotation direction, the arms 133 and 134 are contracted, and the substrate mounting portion on which the substrate W1 is sucked. The mounting portion 135 is removed from the transport cassette 7, and the substrate W1 is removed from the transport cassette 7.

Next, the shaft 132 is
By rotating by 0 °, the tip of the substrate mounting portion 135 is turned to the processing cassette 8 side. Further, the height of the substrate mounting portion 135 is adjusted so that the shaft 132 is contracted in the Z direction and the extracted substrate W1 can be stored in the lowermost stage of the processing cassette 8.
The height of the substrate mounting portion 135 is adjusted by adjusting the storage pitch p1 of the transport cassette 7 and the storage pitch p of the processing cassette 8.
This is done to absorb the difference from 2. Then, in the same manner as described above, the substrate mounting portion 135 having sucked the substrate W1 is inserted into the processing cassette 8, the substrate W1 is inserted into the lowermost stage of the processing cassette 8, and the suction of the substrate W1 is released. 132
Is contracted by a small amount in the Z direction, the substrate mounting portion 135 is lowered, and the substrate mounting portion 135 is pulled out of the processing cassette 8 so that the substrate W1 and the substrate mounting portion 135 are not rubbed.

Next, the shaft 132 is
By rotating the shaft 132 by 0 °, the shaft 132 is extended in the Z direction, and the substrate mounting portion 135 can be inserted below the substrate W2 stored in the second stage from the bottom of the transport cassette 7 so that the substrate mounting portion 135 can be inserted.
Adjust the height of the. Then, as described above, the substrate W2
From the transfer cassette 7, and the extracted substrate W2
Is stored in the second stage from the bottom of the processing cassette 8. Since then
Similarly, all the substrates W1 to W stored in the transfer cassette 7 are
10 are stored in the processing cassette 8 in that order, and all the substrates W are transferred.

In the above procedure, the substrates W are transferred in order from the lowermost substrate W1 to the uppermost substrate W10.
The transfer of the substrates W may be performed in order from the uppermost substrate W10 to the lowermost substrate W1.

When the transfer of the substrates W is completed, the empty transfer cassette 7 is transferred to the mounting table 33 of the unloader unit 3 via the transfer cassette buffer unit 5 as described later. On the other hand, the processing cassette 8 in which a plurality of substrates W before processing are stored is carried into the surface processing unit 2 described later.

Next, the structure of the surface treatment unit 2 will be described with reference to FIGS.
This will be described with reference to FIGS. FIG. 8 is a diagram illustrating a configuration of a posture changing robot and a surface processing robot that transports a processing cassette in the Y direction. FIG. 9 is a diagram illustrating a configuration of a surface processing robot that transports the processing cassette in the X direction. .

As shown by the dashed line in FIG. 2, a plurality (seven in the figure) of processing tanks 21a to 21g are arranged in the surface processing section 2 along a "U" -shaped transport path. Have been. In each of the processing tanks 21a to 21g, a plurality of substrates W stored in the processing cassette 8 are washed with various cleaning liquids or dried. The surface treatment unit 2 includes a posture changing robot 22 that raises the processing cassette 8 placed on the mounting table 14 of the loader unit 1 in a sideways state, and a posture changing robot 22 that moves the processing cassette 8 in the standing state from the posture changing robot 22. Receiving, transporting the processing cassette 8 along the above-described transport path, and inserting the processing cassette 8 into each of the processing tanks 21a to 21g to perform cleaning or drying, and surface treatment robots 23, 24, and 25; Surface treatment robot 25
And a posture changing robot 26 that receives the processing cassette 8 in an upright state from the side and turns it over, and mounts it on the mounting table 31 of the unloader unit 3.

The posture changing robots 22 and 26 and the surface treatment robots 23, 24 and 25 correspond to the surface treatment transfer means in the present invention.

Here, the configurations of the posture changing robots 22, 26 and the surface treatment robots 23, 24, 25 will be described with reference to FIGS. First, the posture changing robots 22 and 26
Will be described with reference to FIG. Although FIG. 8 shows the posture changing robot 22, the posture changing robot 26 has the same configuration as the posture changing robot 22,
Here, the configuration of the posture changing robot 22 will be described as an example.

The posture changing robot 22 has a rail 221a.
An elevating member 223 is erected on a pedestal 222 that is reciprocally movable in the Y direction by a screw shaft 221c rotated by a motor 221b, and is moved in a Z direction by a guide shaft 224a and a screw shaft 224c rotated by a motor 224b. The drive unit 225 is attached to the elevating member 223 so as to be able to move up and down, and the base ends of the two support arms 226 that can be opened and closed are attached to the side of the drive unit 225 to hold the processing cassette 8.
7 is attached to the tip of the support arm 226 so as to be rotatable with respect to the support arm 226. The opening and closing of the support arm 226 is performed in synchronism with the expansion and contraction of a rod of an air cylinder (not shown) provided inside the drive unit 225, and the rotation of the chuck 227 is performed by a motor (not shown) provided inside the drive unit 225. Is transmitted and transmitted by a pulley 228a and a belt 228b provided on the support arm 226. A rail 221a is provided between the vicinity of the mounting table 14 and the front of the first processing tank 21a so that the pedestal 222 (the entire posture changing robot 22) can move in the Y direction.
And a screw shaft 221c are laid.

Further, regarding the posture changing robot 26,
The rail 221 a and the screw shaft 221 are moved so as to be movable between the last processing tank 21 g and the mounting table 31 of the unloader section 3.
c is laid.

Next, the surface treatment robots 23, 24, 25
Will be described with reference to FIG. 8 and FIG. Although the surface treatment robot 23 is shown in FIG. 8, the surface treatment robot 25 has the same configuration as the surface treatment robot 23.

First, as shown in FIG. 8, the surface treatment robot 23 is guided by a rail 231a, connected to a conveyor 231b driven by a motor (not shown), and moved to a movable member 232 which can reciprocate in the Y direction. Shaft 233a,
An elevating member 234 that can move up and down in the Z direction is attached by a screw shaft 233c that is rotated by a motor 233b, and a driving unit 235 is attached to the tip of the elevating member 234.
In this configuration, an openable / closable hook 237 is attached to a tip end of a rotation shaft 236 extending in the X direction from the drive unit 235. The opening and closing of the hook 237 is performed by rotating the rotating shaft 236 in synchronization with the rotation of a motor (not shown) provided in the driving unit 235. Further, a position where the posture changing robot 22 receives the processing cassette 8 in a state of holding the processing cassette 8 in an upright state in the vicinity of the first processing tank 21a, and a surface processing robot 24 described later.
Moving member 232 (entire surface processing robot 23) between the position (PP1 in FIG. 2) for transferring processing cassette 8 to
231a, conveyor 231b so that
Is laid.

As shown in FIG. 9, the surface treatment robot 24 has the same structure as that of the surface treatment robot 23 except that a hanger 238 is attached to a rotating shaft 236 extending in the Y direction in place of the hook 237 of the surface treatment robot 23 so as to be openable and closable. The configuration is the same as that of the processing robot 23. The surface treatment robot 24 is located between a position where the processing cassette 8 is received from the surface treatment robot 23 (PP1 in FIG. 2) and a position where the processing cassette 8 is delivered to the surface treatment robot 25 (PP2 in FIG. 2). 231a and a conveyor 231b are laid so that can be moved.

The surface treatment robot 25 has the same configuration as the surface treatment robot 23, and
2, a position for receiving the processing cassette 8 (PP in FIG. 2).
2) and the processing cassette 8 near the last processing tank 21g.
231a and the conveyor 2 so that it can be moved between the position where it is delivered to the posture changing robot 26 in the upright state.
31b is laid.

Next, the operation of the posture changing robot 22, the surface treatment robots 23, 24 and 25, and the posture changing robot 26 will be described with reference to FIGS. First, as shown in FIG. 5, the posture changing robot 22 moves the pedestal 222 to the end of the rail 221 a and the screw shaft 221 c on the mounting table 14 side so that the side part of the processing cassette 8 in the overturned state can be held. The chuck 227 is rotated, the support arm 226 is opened, and the drive unit 225 is lowered. And the chuck 227
With the side of the processing cassette 8 placed on the mounting table 14 held therebetween, the support arm 226 is closed and the side of the processing cassette 8 is held. Next, the drive unit 225 is raised, and the nipped processing cassette 8 is lifted above the mounting table 14.
In this state, the chuck 227 is rotated by 90 °, and the processing cassette 8 is erected with the upper part thereof facing upward. The processing cassette 8 is lifted above the mounting table 14 when the processing cassette 8 is rotated.
This is to avoid interference with others. Then, as shown in FIG. 8, the first processing tank 2 of the rail 221a and the screw shaft 221c is formed.
The pedestal 222 is moved to the end on the 1a side, and the erecting processing cassette 8 is transferred to the surface processing robot 23.

Next, the surface treatment robot 23
31a, the conveyor 231b is moved to the end of the posture changing robot 22 side, the hook 237 is closed, and the elevating member 234 is moved.
Is lowered in the Z direction to lower the hook 237. Next, the hook 237 is opened, the elevating member 234 is raised in the Z direction, and the protrusion 84 on the upper part of the processing cassette 8 in the upright state held by the posture changing robot 22 is hooked.
Stop by hooking at 7. And posture change robot 2
2 opens the support arm 226 and releases the holding of the processing cassette 8. When the holding of the processing cassette 8 is released,
The surface treatment robot 23 raises the elevating member 234 in the Z direction, and hooks the processing cassette 8 with the hook 237 to lift it. Thus, the delivery of the processing cassette 8 from the posture changing robot 22 to the surface processing robot 23 is completed. When the transfer of the processing cassette 8 is completed, the posture changing robot 22 moves in the direction of the mounting table 14 in order to perform the next posture changing process of the processing cassette 8. On the other hand, the surface treatment robot 23 moves the moving member 232 in the direction of the processing tank 21a, and moves the processing cassette 8 to the processing tank 21a.
conveyed above a and stopped. And the elevating member 23
4 is lowered in the Z direction so that the processing cassette 8 is
a.

A predetermined cleaning liquid is contained in the processing tank 21a, and a plurality of substrates W stored in the processing cassette 8 are immersed in the cleaning liquid together with the processing cassette 8, and are cleaned by overflowing. Is done. At this time, if the pitch between the substrates W is too small, the cleaning liquid is difficult to flow between the substrates W, so that the cleaning effect is reduced. On the other hand, if the pitch between the substrates W is too large, the volume of the processing tank 21a becomes large. Therefore, the size of the entire apparatus is increased and the amount of the cleaning liquid used is increased, so that the running cost is increased. However, in the present embodiment, the storage pitch of the processing cassette 8 is set to the pitch (optimum pitch) p2 at which the pitch between the substrates W is minimized within a range where the cleaning effect is not reduced. Thus, the volume of the processing tank 21a can be reduced, the size of the apparatus can be reduced, the amount of the cleaning liquid used can be reduced, and the running cost can be reduced. The same can be said for the other processing tanks 21a to 21g.

When the processing cassette 8 is immersed in the processing tank 21a for a predetermined time, and the cleaning in the processing tank 21a is completed, the surface processing robot 23 raises the elevating member 234 in the Z direction and moves the processing cassette 8 to the Z direction. Withdrawn from the processing tank 21a, the moving member 232 is moved in the direction of the processing tank 21b,
The processing cassette 8 is transported above the processing tank 21b and stopped. Then, the elevating member 234 is lowered in the Z direction, the processing cassette 8 is inserted into the processing tank 21b, and cleaning is performed in the processing tank 21b. When the cleaning process is completed, cleaning is performed in the processing tank 21c in the same manner as described above, and then the processing cassette 8 is transported to the transfer position PP1 of the processing cassette 8 (see FIG. 2) and placed on the table 2a. . Then, the surface treatment robot 23 moves the elevating member 2
34 is lowered in the Z direction, the hook 237 is closed, the lifting member 234 is raised in the Z direction, the hook 237 is disengaged from the protrusion 84 on the upper portion of the processing cassette 8, and the surface processing of the next processing cassette 8 is performed. For this purpose, it is retracted from the transfer position PP1.

Next, the surface treatment robot 24 moves to the transfer position PP1, opens the hanger 238, lowers the elevating member 234 in the Z direction, then closes the hanger 238, and moves on the table 2a at the transfer position PP1. The protrusion 84 at the upper part of the processing cassette 8 placed on the hanger 2
The lifting cassette 234 is lifted in the Z direction to lift the processing cassette 8. Then, the processing cassette 8 is transported to the next transfer position PP2 (see FIG. 2), the hanger 228 is removed, and the processing cassette 8 is placed there.
Is placed.

Next, the surface treatment robot 25 hooks the protrusion 84 on the upper part of the processing cassette 8 placed on the table 2a at the transfer position PP2 with the hook 237,
The processing cassette 8 is lifted, and the cleaning processing in the processing tanks 21d to 22f and the drying processing in the processing tank 21g are sequentially performed.
Posture changing robot 2 waiting near processing tank 21g
The processing cassette 8 in the upright state is delivered to 6. The transfer of the processing cassette 8 is performed by the processing cassette 8 from the posture changing robot 22 to the surface processing robot 23.
Is performed in the reverse order of the delivery procedure. Then, the posture changing robot 26 that has received the processing cassette 8 containing the processed substrate W,
The posture of the processing cassette 8 is changed from the standing state to the rollover state, and is conveyed to the mounting table 31 of the unloader unit 3, and the processing cassette 8 in the rollover state is mounted thereon.

In this manner, by folding back the transport path of the processing cassette 8 in a “U” shape, the apparatus becomes horizontally long like the conventional apparatus in which the processing tanks are arranged one-dimensionally and continuously. In addition, the area utilization efficiency is improved, and a piping / maintenance area 4 described later can be provided centrally in the center of the apparatus, so that the apparatus can be designed compact. Further, since the loader unit 1 and the unloader unit 3 described later can be adjacent to each other, the transport cassette buffer unit 5 and the processing cassette buffer unit 6 described later can be provided without increasing the size of the apparatus.

Next, the structure of the unloader section 3 will be described with reference to FIGS.
This will be described with reference to FIG. The unloader section 3 includes a mounting table 31 on which the processing cassette 8 is mounted in a rollover state, an unloader substrate transfer robot 32, a mounting table 33 on which an empty transfer cassette 7 is mounted in a rollover state, and a transfer cassette 7. And a carry-out port 34 for carrying out the outside of the apparatus. Mounting table 3
1. Unloader part substrate transfer robot 32, mounting table 3
3. The loading / unloading port 34 has the same configuration as the mounting table 14, the loader unit substrate transfer robot 13, the mounting table 12, and the loading port 11 of the loader unit 1;

Next, the operation of the unloader section 3 will be described.
In the unloader unit 3, the processed substrate W stored in the processing cassette 8 mounted on the mounting table 31 is transferred to the mounting table by the unloader substrate transfer robot 32 by the posture changing robot 26 of the surface processing unit 2. The transfer is made to an empty transfer cassette 7 placed on the transfer cassette 33. The empty transfer cassette 7 is transferred through the transfer cassette buffer unit 5 described later after the transfer of the substrate W in the loader unit 1 is completed. The transfer of the processed substrate W from the processing cassette 8 to the transfer cassette 7 is performed by extracting the substrate W stored in the processing cassette 8 at the storage pitch p2 and transferring the extracted substrate W to the transfer cassette 7. The substrate is stored at the storage pitch p1. The difference in the storage pitch is caused by the difference between the substrate mounting portion 135 when the substrate W is extracted from the processing cassette 8 as in the transfer operation of the substrate W in the loader unit 1. The height can be absorbed by adjusting the height and the height of the substrate mounting portion 135 when the substrate W is inserted into the transport cassette 7.

When the transfer of the substrate W is completed, the empty processing cassette 8 is transferred to the mounting table 14 of the loader unit 1 through the processing cassette buffer unit 6 described later. On the other hand, the transfer cassette 7 in which a plurality of processed substrates W are stored
Is transported out of the apparatus through a carry-out port 34 by a transport device (not shown), and transported to a subsequent process of the apparatus of this embodiment.
The carry-out port 34 is also provided with a shutter (not shown) that can be opened and closed similarly to the carry-in port 11 of the loader unit 1. The shutter is opened only when the product is carried out of the device.

As described above, the loader unit 1 and the unloader unit 3
And the transfer cassette 7 is loaded.
The transfer of the substrate W from the processing cassette 8 to the processing cassette 8, the transfer of the substrate W from the processing cassette 8 to the transfer cassette 7, and the unloading of the transfer cassette 7 can be performed independently. For example, as in a seventh embodiment device described later,
While the transfer of the substrate W from the transfer cassette 7 to the processing cassette 8 is performed, there is no inconvenience such as waiting for the transfer of the substrate W from the processing cassette 8 to the transfer cassette 7. An apparatus without waiting for processing can be realized.

The mounting table 31 of the unloader section 3
Is a processing cassette unloader transfer unit of the present invention, the unloader substrate transfer robot 32 is an unloader substrate transfer unit of the present invention, and the mounting table 33 is
In the transfer cassette unloader transfer unit in the present invention,
The carry-out port 34 corresponds to a transfer cassette unloader transfer section in the present invention.

Next, the configuration of the piping / maintenance area 4 will be described with reference to FIGS. The pipe / maintenance area 4 is provided with pipes for supplying a cleaning liquid to the processing tank 21a of the surface processing unit 2, pipes for discharging the drained liquid after cleaning, and the like, and an operator performs maintenance. As shown in FIG. 2, the area is provided between the center of the surface treatment unit 2 and the loader unit 1 and the unloader unit 3. The entry and exit of the worker into the piping / maintenance area 4 is performed from the passage 41 in FIG. By the way, in the case of a horizontally long apparatus in which the respective processing tanks are arranged one-dimensionally continuously like the conventional apparatus, the piping and maintenance area must be provided along the longitudinal direction of the apparatus, and the piping and maintenance area is not provided. Although the area occupied by the apparatus increases as a result, the transport path of the surface treatment unit 2 is configured to be folded into a “U” shape in the present embodiment. It can be provided centrally in the apparatus, and the piping / maintenance area 4 can be made smaller and the apparatus can be made smaller.

Next, the structure of the transport cassette buffer unit 5 will be described with reference to FIGS. 1, 2, 5, and 10. FIG. FIG.
0 is a view showing the configuration of the transfer cassette transfer robot.

In the transport cassette buffer section 5, between the loading table 12 of the loader section 1 and the loading table 33 of the unloader section 3, seven loading tables 51 for loading the transport cassette 7 are continuously provided. Is provided. The configuration of the mounting table 51 is the same as that of the mounting table 12, and is provided on the table 1a in FIG. The mounting table 12, each mounting table 51, the mounting table 3
At the center of 3, an opening groove 1b is provided in communication.
Further, below the table 1a, a transfer cassette transfer robot 52 for transferring the transfer cassette 7 from the mounting table 12 to the mounting table 33 via the mounting tables 51 is provided.

Here, the transfer cassette transfer robot 52
Will be described with reference to FIGS. 5 and 10. FIG. An air cylinder 523 is attached to a pedestal portion 522 which is guided by a rail 521a, is connected to a conveyor 521c driven by a motor 521b, and can reciprocate in the X direction.
The cassette mounting portion 524 that moves up and down in the Z direction due to expansion and contraction of the rod 523a of the third
3a. The cassette mounting section 524 includes a cassette mounting table 525 that supports the bottom of the transport cassette 7 and a side support section 526 that supports the side of the transport cassette 7. Air cylinder 5
When the rod 523a of the cassette 23 is retracted,
4 is retracted beneath the table 1a. On the other hand, when the rod 523a of the air cylinder 523 is extended, the cassette mounting portion 524 is projected from the opening groove 1b onto the table 1a. The transfer of the transfer cassette 7 is performed by the air cylinder 523.
Is extended, the bottom of the transport cassette 7 is supported by the cassette mounting portion 524 and lifted from the mounting table 12, the pedestal portion 522 is moved in the X direction, and the transport cassette 7 is moved to the predetermined mounting table 51. , 33, and the rod 523a of the air cylinder 523 is contracted to place the transport cassette 7 on the mounting tables 51, 34. At this time, the rod 5 of the air cylinder 523
Since 23a moves along the opening groove 1b, the rod 523a of the air cylinder 523 does not interfere with the table 1a.

Next, the operation of the transport cassette buffer unit 5 will be described. When the transfer of the substrate W from the transfer cassette 7 mounted on the mounting table 12 of the loader unit 1 to the processing cassette 8 mounted on the mounting table 14 is completed,
The transfer cassette transfer robot 52 raises the cassette mount 524 from below the mounting table 12, lifts the empty transfer cassette 7 above the mounting table 12, moves in the X direction, and moves the transfer cassette 7. To the mounting table 33 of the unloader section 3.
Move in the direction. Then, the transport cassette 7 is mounted on the predetermined mounting tables 33 and 51 on which the transport cassette 7 is not mounted. At this time, if the transport cassette 7 is not mounted on the mounting table 33, the transported empty transport cassette 7 is mounted on the mounting table 33. If the transport cassette 7 is mounted on the mounting table 33, the transported empty transport cassette 7 is mounted on the mounting table 51 on which the transport cassette 7 is not mounted, and the transport cassette 7 is mounted. To wait. At this time, the mounting table 51 is used so that the transfer cassette 7 is put on standby on the side of the mounting table 33. Further, when the transport cassette 7 is on standby on the mounting table 51 and the transport cassette 7 mounted on the mounting table 33 is stored with the processed substrate W and carried out, the transport cassette 7 The transfer robot 52 is mounted on the mounting table 51.
The transport cassette 7 placed on the mounting table 33 is sequentially fed in the direction of the mounting table 33. Thereby, the transport cassettes 7 waiting on the mounting table 51 are moved to the mounting tables 51 adjacent to the mounting table 33, respectively, and the transport cassettes 7 mounted on the mounting table 51 adjacent to the mounting table 33 are mounted. It is mounted on the mounting table 33. In order to know the usage status of the mounting tables 33 and 51, for example, a sensor (not shown) for detecting the transport cassette 7 mounted on each of the mounting tables 33 and 51 is provided.

As described above, by providing the mounting table 51 for holding the transport cassette 7 on standby, after the transport cassette 7 is loaded into the apparatus (the empty transport cassette 7 becomes empty). Even when there is a difference between the time required for mounting on the mounting table 33 and the time required for surface processing in the surface processing unit 2, an empty transport cassette 7 can be stored. In addition, the processing cassette 8 after the surface processing in the surface processing unit 2 is completed is mounted on the mounting table 31 of the unloader unit 3.
When the empty transfer cassette 7 is placed on the
The processed substrates W can be transferred without having to wait for the processing cassette 8 mounted on the mounting table 31 of the unloader unit 3. In addition, since the transport cassette 7 is used as the transport cassette 7 for unloading the loaded transport cassette 7, the transport entrance 11 can be dedicated to loading the transport cassette 7 and the transport outlet 34 can be dedicated to transporting the transport cassette 7. . Although seven mounting tables 51 are provided in the present embodiment, the number of mounting tables 51 is not limited to seven.

The mounting table 51 corresponds to a transport cassette buffer unit in the present invention, and the transport cassette transport robot 52 corresponds to a transport cassette transport unit in the present invention.

Next, the configuration of the processing cassette buffer section 6 will be described with reference to FIGS. 1, 2 and 5. Similarly to the transport cassette buffer unit 5, the processing cassette buffer unit 6 has seven loading units for loading the processing cassette 8 between the mounting table 14 of the loader unit 1 and the mounting table 31 of the unloader unit 3. The table 61 is continuously provided on the table 1c.
c, from the mounting table 31 via each mounting table 61, the mounting table 1
4, a processing cassette transport robot 62 for transporting an empty processing cassette 8 is provided. This mounting table 6
1. The processing cassette transport robot 62 has the same configuration as the mounting table 51 and the transport cassette transport robot 52 of the transport cassette buffer unit 5 described above, and a detailed description thereof will be omitted. The mounting table 14, each mounting table 6
1. An opening groove 1d provided in communication with the center of the mounting table 31 is a passage for moving the processing cassette transport robot 62 in the X direction. The mounting table 61 corresponds to a processing cassette buffer unit in the present invention, and the processing cassette transport robot 62 corresponds to a processing cassette transport unit in the present invention.

Next, the operation of the processing cassette buffer unit 6 will be described. The mounting table 3 of the above-described unloader section 3
When the transfer of the substrate W from the processing cassette 8 mounted on the mounting table 1 to the transfer cassette 7 mounted on the mounting table 33 is completed, the processing cassette transport robot 62 loads the empty processing cassette 8 with a loader. The processing unit 8 is moved in the direction of the mounting table 14 of the unit 1 so that the predetermined mounting table 14 on which the processing cassette 8 is not mounted,
The processing cassette 8 is placed on 61. In the processing cassette buffer section 6, similarly to the transport cassette buffer section 5, the processing cassette 8 is packed on the mounting table 14 side in accordance with the use situation of the mounting tables 12 and 62.
When the processing cassette 8 mounted on the mounting table 14 is conveyed to the surface processing unit 2 and the mounting table 14 becomes empty,
The processing cassette transport robot 62 sequentially feeds the processing cassette 8 mounted on the mounting table 61 in the direction of the mounting table 14.

As described above, by providing the mounting table 61 for holding the processing cassette 8 on standby, when the transport cassette 7 is loaded into the apparatus and mounted on the mounting table 12, an empty processing Since the transfer cassette 8 can be mounted on the mounting table 14, the transfer of the substrate W before processing is performed without having to wait the transfer cassette 7 mounted on the mounting table 12 of the loader unit 1. be able to. Further, since the processing cassette 8 can be cyclically used in the apparatus and the processing cassette 8 is not taken out of the apparatus, the processing cassette 8 is not contaminated outside the apparatus, and the processing cassette 8 is not contaminated.
From the substrate W can be reduced. In addition,
In this embodiment, seven mounting tables 61 are provided.
The number of 1 is not limited to seven.

The provision of the processing cassette buffer section 6 and the transfer cassette buffer section 5 allows the transfer cassette 7 to be carried into the apparatus, the transfer of the substrate W before processing, and the surface processing section. By performing the surface treatment in step 2 and transferring the processed substrate W to the transfer cassette 7, a series of processing for unloading the transfer cassette 7 from the apparatus can be smoothly performed.

In the above embodiment, the case where the storage pitch of the transfer cassette 7 is larger than the optimum pitch of the present embodiment has been described. However, the storage pitch of the transfer cassette 7 is larger than the optimum pitch of the present embodiment. The present embodiment can be similarly applied to a small case. When the storage pitch of the transfer cassette 7 is smaller than the optimum pitch of the present embodiment, the substrate W is transferred to the processing cassette 8 having the same storage pitch as the storage pitch of the transfer cassette 7, and the pitch is converted to the optimum pitch. If the surface treatment is performed without performing the above, the effect of the surface treatment is reduced. However, in this embodiment, such inconvenience can be solved.

In the above-described embodiment and each of the following embodiments, the loader board transfer robot 13 and the unloader board transfer robot 32 are configured as articulated robots as shown in FIG. For example, the loader unit substrate transfer robot 13 and the unloader unit substrate transfer robot 32 may be configured by a robot 100 as shown in FIG.

The robot 100 has a base 101 on which Z
Elevating and rotating shaft 102 that is vertically movable and rotatable
And the arm support 103 is attached to the elevating / lowering rotating shaft 102, and the telescopic arm 10 is attached to the arm support 103.
4 and a holding member 1 for vacuum-sucking the substrate W
05 is attached to the distal end and the proximal end of the arm 104. By the expansion and contraction of the arm 104 and the vacuum suction of the holding member 105, the substrate W is inserted and removed from each of the cassettes 7 and 8, and the adjustment of the position (height) of inserting and removing the substrate W from each of the cassettes 7 and 8 is performed. This is performed by moving the moving shaft 102 up and down.

Next, the structure of the second embodiment of the present invention will be described with reference to FIGS. FIG. 12 is a plan view showing the configuration near the loader unit / unloader unit of the second embodiment, and FIG. 13 is a diagram showing the configuration of a cleaning robot.

As shown in FIG. 12, the apparatus of the second embodiment is different from the apparatus of the first embodiment in that
A mechanism for cleaning the empty transfer cassette 7;
The processing cassette buffer unit 6 is provided with a mechanism for cleaning an empty processing cassette 8. Since the other configuration is the same as that of the above-described first embodiment, the detailed description is omitted here.

First, a mechanism for cleaning an empty transport cassette 7 provided in the transport cassette buffer unit 5 will be described. This mechanism includes a cleaning robot 53 provided on the side of the central mounting table 51 and a cleaning tank 54 for cleaning the transport cassette 7. The cleaning robot 53 and the cleaning tank 54 correspond to a transport cassette cleaning unit in the present invention.

As shown in FIG. 13, the cleaning robot 53 has a vertically movable and vertically rotatable rotating member 531 mounted on a base 532 and a distal end of the vertically rotating member 531. A drive unit 533 is attached to the hanger 5.
This is a configuration in which 35 is attached. Opening and closing of the hanger 535 is performed by rotating the rotating shaft 534 in the opposite direction by the forward and reverse rotation of a motor (not shown) provided in the driving unit 533.

In the present embodiment, first, the substrate W
The empty transfer cassette 7 for which the transfer has been completed is transferred to and mounted on the central mounting table 51 by the transfer cassette transfer robot 52. Next, the cleaning robot 53 includes the hanger 53.
5 is positioned above the transport cassette 7, the hanger 535 is opened, the elevating and lowering member 531 is lowered in the Z direction to lower the hanger 535, the hanger 535 is closed, and the plate above the transport cassette 7 is closed. It holds the side end of the shaped member 71. Then, the lift cassette 531 is raised in the Z direction to lift the transport cassette 7. Next, the elevating / lowering rotating member 531 is rotated by 90 °, the transport cassette 7 is moved above the cleaning tank 54, and the elevating / lowering rotating member 531 is lowered in the Z direction. And the transfer cassette 7 is washed. When the cleaning is completed, the elevating / lowering rotating member 531 is raised in the Z direction, the transport cassette 7 is taken out of the cleaning tank 54, and thereafter, the empty transport cassette 7 that has been cleaned in the reverse order to that described above is loaded. It is mounted on the mounting table 51. Thereafter, similarly to the first embodiment described above, the transport cassette transport robot 52 transports the cleaned empty transport cassette 7 to the predetermined mounting tables 34, 51.

As described above, the transfer cassette buffer unit 5 cleans the empty transfer cassette 7, so that the unloader unit 3 transfers the processed substrate W to the transfer cassette 7 after cleaning. Therefore, the inconvenience that the processed substrate W is stained with the stain attached to the transport cassette 7 is reduced. In particular, when applied to a cleaning apparatus as in the present embodiment, recontamination of the substrate W after cleaning can be prevented.

The mechanism for cleaning the empty processing cassette 8 provided in the processing cassette buffer unit 6 is the same as the cleaning robot 53 provided on the side of the central mounting table 61. A cleaning robot 63 having the above configuration and a cleaning tank 64 for cleaning the processing cassette 8 are provided. The cleaning of the empty processing cassette 8 is performed in the same procedure as that for cleaning the empty transport cassette 7 described above. The cleaning robot 63 and the cleaning tank 64 correspond to a processing cassette cleaning section in the present invention.

As described above, the processing cassette buffer unit 6 cleans the empty processing cassette 8, so that the loader unit 1 transfers the substrate W before processing to the processing cassette 8 after cleaning. Therefore, the inconvenience of soiling the substrate W before processing with the dirt attached to the processing cassette 8 is reduced.

Next, the structure of the third embodiment of the present invention will be described with reference to FIG. FIG. 14 is a plan view showing the configuration of the device of the third embodiment.

The third embodiment is characterized in that the transport cassette buffer unit 5 and the processing cassette buffer unit 6 are removed from the first embodiment. Since the other configuration is the same as that of the above-described first embodiment, the detailed description is omitted here.

In the case of the third embodiment, in the loader section 1, the transfer cassette 7 containing the substrate before processing is loaded from the loading port 11, and the substrate W before processing is transferred to the processing cassette 8. Is completed, the empty transfer cassette 7 is carried out of the carry-in port 11, and the empty processing cassette 8 is carried into the mounting table 14 of the loader unit 1 from the carry-in port 15 having the same configuration as the carry-in port 11. Will be.

In the unloader section 3, an empty transfer cassette 7 is loaded from the transfer port 34, and the processing cassette 8
After the transfer of the processed substrate W to the empty transfer cassette 7 is completed, the transfer cassette 7 is unloaded from the discharge port 34, and the processed substrate W is transferred from the processing cassette 8 to the transfer cassette 7. After the transfer of W is completed, the empty processing cassette 8 is carried out from the carry-out port 35 having the same configuration as the carry-out port 34.

Even with such a configuration, effects other than the effects provided by the provision of the transport cassette buffer unit 5 and the processing cassette buffer unit 6 in the first embodiment described above can be obtained. That is, the transport cassette 8
The main object of the present invention, in which a plurality of substrates W can be stored in the processing cassette 8 at the optimum pitch and subjected to surface treatment, without depending on the storage pitch of the processing cassette 8, can be achieved. Also in the example, since the transport path of the surface treatment unit 2 is folded back into a “U” shape, the apparatus can be made compact and the like. Furthermore, a loader unit and an unloader unit are provided, and transfer of the substrate W from the transfer cassette 7 to the processing cassette 8 and transfer of the substrate W from the processing cassette 8 to the transfer cassette 7 are independent. Therefore, while the transfer of the substrate W from the transfer cassette 7 to the processing cassette 8 is performed, the transfer of the substrate W from the processing cassette 8 to the transfer cassette 7 is inconvenient. Absent.

In the configuration of this embodiment, the transport cassette 7 used in the loader unit 1 and the transport cassette 7 used in the unloader unit 3 do not need to have the same configuration. Therefore, the transport cassette 7 used in the loader unit 1
Since the transfer cassette 7 having a storage pitch (for example, p3) different from the storage pitch (for example, p1) can be used in the unloader section 3, the configuration of the surface treatment apparatus in the pre-process of the present device and the post-process of this device can be used. The transport cassettes 7 having different storage pitches can be used depending on the configuration of the surface treatment device and the like.

By the way, in the above-described first embodiment,
Although the transport cassette buffer unit 5 and the processing cassette buffer unit 6 are provided, only one of them may be provided. At this time, for example, if the apparatus has only the transport cassette buffer unit 5, the empty processing cassette 8 can be carried in and out of the apparatus as in the third embodiment described above. Cassette buffer section 6
In the case of an apparatus having only the above, the transfer of the transfer cassette 7 into and out of the apparatus may be configured as in the third embodiment described above.

Similarly, in the apparatus of the second embodiment described above, the cleaning mechanism for the transport cassette buffer section 5 and the empty transport cassette 7, the cleaning mechanism for the processing cassette buffer section 6 and the cleaning mechanism for the empty processing cassette 8, The cleaning mechanism may include only the transport cassette buffer unit 5 and the cleaning mechanism for the empty transport cassette 7, or the processing cassette buffer unit 6 and the cleaning mechanism for the empty processing cassette 8. It may be a configuration provided with only one.

Next, the structure of a device according to a fourth embodiment of the present invention will be described with reference to FIG. FIG. 15 is a plan view showing the configuration of the fourth embodiment.

In the apparatus of the fourth embodiment, as in the third embodiment described above, the transport path is not folded back into a “U” shape by the surface treatment section 2 and the transport path is formed one-dimensionally. Vessel 21
a to 21g, a surface treatment robot 22, and the like are arranged along the transport path. The parts denoted by the same reference numerals as those in FIG. 14 have the same configuration as that of the above-described third embodiment, so that the detailed description is omitted here.

Even with such a configuration, of the effects of the third embodiment described above, effects other than those obtained by folding the transport path of the surface treatment section 2 into a “U” shape (the present invention) Main purpose).

Next, the structure of a fifth embodiment of the present invention will be described with reference to FIG. FIG. 16 is a plan view showing the configuration of the fifth embodiment.

The fifth embodiment is characterized in that a transport cassette buffer unit 5 and a processing cassette buffer unit 6 are added to the fourth embodiment unit. 2 and FIG. 15 have the same configuration as those of the above-described first and fourth embodiments, so that detailed description is omitted here.

In the fifth embodiment, the transport cassette buffer unit 5 and the processing cassette buffer unit 6 are formed in a "U" shape due to the structure of the apparatus. Therefore, in the transport cassette buffer unit 5, first, the first transport cassette transport robot 52a (the same configuration as the transport cassette transport robot 52 in FIG.
2c, 62a, 62b, and 62c), the empty transfer cassette 7 is transferred from the mounting table 12 to the mounting table 51a, and the second transfer cassette transfer robot 52b transfers the mounting cassette 51 from the mounting table 51a through the mounting table 51. The empty transfer cassette 7 is transferred to the transfer cassette 51b, and a third transfer cassette transfer robot 52c is transferred.
And the empty transfer cassette 7 is transferred from the mounting table 51b to the mounting table 33.
Are transported.

In the processing cassette buffer section 6,
First, the empty processing cassette 8 is transported from the mounting table 31 to the mounting table 61a by the first processing cassette transport robot 62a, and is loaded from the mounting table 61a via the mounting table 61 by the second processing cassette transport robot 62b. The empty processing cassette 8 is transported to the mounting table 61b, and the empty processing cassette 8 is transported from the mounting table 61b to the mounting table 14 by the third processing cassette transport robot 62c.

Even with such a configuration, of the effects of the first embodiment, the effects other than those obtained by folding the transport path of the surface treatment section 2 into a “U” shape (the present invention) Main purpose).

In the fifth embodiment, only one of the transport cassette buffer unit 5 and the processing cassette buffer unit 6 may be provided.

Next, the structure of a device according to a sixth embodiment of the present invention will be described with reference to FIG. FIG. 17 is a plan view showing the configuration of the device of the sixth embodiment.

The apparatus of the sixth embodiment is different from the apparatus of the fifth embodiment in that a mechanism for cleaning the empty transport cassette 7 in the transport cassette buffer unit 5 and a processing cassette buffer unit 6 are provided. A mechanism for cleaning the empty processing cassette 8 is additionally provided.
In addition, the part shown with the same code | symbol as FIG. 2, FIG. 12, FIG.
Since the configuration is the same as that of the second and fifth embodiments described above, the detailed description is omitted here.

Even with such a configuration, of the effects of the second embodiment, effects other than those obtained by folding the transport path of the surface treatment unit 2 into a “U” shape (the present invention) Main purpose).

In the apparatus of the sixth embodiment, only the cleaning mechanism for the transport cassette buffer unit 5 and the transport cassette 7 may be provided, or the processing cassette buffer unit 6 and the processing cassette buffer unit may be provided. 8 may be provided.

Next, the structure of a device according to a seventh embodiment of the present invention will be described with reference to FIG. FIG. 18 is a plan view showing the configuration of the device of the seventh embodiment.

The apparatus of the seventh embodiment is different from the apparatus of FIG.
Transfer of the substrate W before the process from the process cassette 8 to the process cassette 8;
The transfer of the processed substrate W from the processing cassette 8 to the transfer cassette 7 is performed by one substrate transfer robot 110. The substrate transfer robot 110 has the same configuration as the loader unit substrate transfer robot 13 shown in FIG. 6 (or FIG. 12). FIG.
Reference numerals 111 and 112 in FIG. 8 denote a mounting table on which the transfer cassette 7 is mounted when the substrate W is transferred and a mounting table on which the processing cassette 8 is mounted when the substrate W is transferred. Has the same configuration as the mounting table 12. Further, reference numeral 113 denotes a loading / unloading port for loading and unloading the transport cassette 7, and has the same configuration as the loading / unloading port 11 of each embodiment described above. In addition, a transfer robot 116 (the same configuration as the transfer cassette transfer robot 52 in FIG. 11) for transferring the processing cassette 8 between the mounting table 112 and the mounting tables 114 and 115 is provided. The other parts indicated by the reference numerals in FIG. 18 have the same configuration as the above-described embodiments.

The substrate transfer robot 110 is a substrate transfer unit of the present invention, the mounting table 111 is a transfer cassette transfer unit of the present invention, and the mounting table 112 is a processing cassette transfer unit of the present invention. At the entrance 11
Numeral 3 corresponds to a transfer cassette transfer section in the present invention.

The operation of the present embodiment is as follows.
Is loaded from the loading / unloading port 113 and placed on the mounting table 111 in a rollover state. At this time, the empty processing cassette 8 is mounted on the mounting table 112 in a sideways state. In this state, the substrate transfer robot 1
Reference numeral 10 transfers the substrate W before processing from the transport cassette 7 to the processing cassette 8. The processing cassette 8 for which the transfer of the substrate W has been completed is transferred from the mounting table 112 to the mounting table 114 by the transfer robot 116.

When the mounting table 112 is empty, the processing cassette 8 (containing the processed substrate W) waiting on the mounting table 115 is moved by the transfer robot 116 to the mounting table 115.
To the mounting table 112. Then, the processed substrate W is transferred from the processing cassette 8 to the transfer cassette 7 by the substrate transfer robot 110, and the transfer cassette 7 in which the processed substrate W is stored is loaded into the loading / unloading port 1.
13 is carried out.

On the other hand, the mounting table 1 is
Processing cassette 8 transported from 12 to mounting table 114
Is erected by the posture changing robot 22. Then, the processing cassette 8 is transported while cleaning and drying the substrates W stored in the processing cassette 8 standing up by the surface processing robots 23, 24, and 25 in the processing tanks 21a to 21g. You. The processing cassette 8 in which the substrate W after the cleaning and the drying processing is stored is turned over by the posture changing robot 26, is mounted on the mounting table 115, and stands by. At this time, the processing cassette 8 is placed on the mounting table 112.
Is mounted, and the transfer of the newly-transferred substrate W before processing is completed, the processing is terminated, and the mounting table 112 waits until it becomes empty. When the mounting table 112 is empty, the processing cassette 8 storing the processed substrate W waiting on the mounting table 115.
Is transferred from the mounting table 115 to the mounting table 112 by the transfer robot 116, and is transferred by the substrate transfer robot 110.
Transfer of the processed substrate W from the processing cassette 8 to the transport cassette 7 is performed, and the transport cassette 7 in which the processed substrate W is stored is carried out from the loading / unloading port 113. The empty processing cassette 8 after the transfer is used for transferring the substrate W before processing stored in the transport cassette 7 to be carried in next.

According to the seventh embodiment, a plurality of substrates W can be stored in the processing cassette 8 at an optimum pitch and surface treatment can be performed without depending on at least the storage pitch of the transport cassette 8. The main object of the invention can be achieved.

In each of the above embodiments, the case where the surface treatment is performed on a rectangular glass substrate for a liquid crystal display is described as an example. For example, the case where the surface treatment is performed on a substrate such as a semiconductor wafer, a mask, a reticle, or the like. The present invention can be similarly applied to the present invention.

[0127]

As is clear from the above description, according to the first aspect of the present invention, the surface treatment can be performed at an optimum pitch without depending on the storage pitch of the transport cassette. The surface treatment part can be made as small as possible without reducing the surface treatment effect of each substrate, the size of the equipment can be reduced, and the posture is changed so that a plurality of horizontal substrates can be erected in front of the treatment tank. Then, the plurality of substrates that have been changed to the upright posture can be placed in a processing tank to perform surface treatment in the upright posture.

According to the second aspect of the present invention, a plurality of substrates can be stored in a processing cassette at an optimum pitch and surface treatment can be performed without depending on the storage pitch of a transfer cassette. Because it is possible, the surface treatment unit can be made as small as possible without reducing the surface treatment effect of each substrate, and the apparatus can be downsized. The substrate taken in and transferred to the transfer cassette transfer unit, and the substrate taken out of the transfer cassette in the overturned state, the posture is changed so that a plurality of substrates in a horizontal state are erected in front of the processing tank, The plurality of substrates that have been changed to the upright posture can be placed in a processing tank to perform surface treatment in the upright posture.

Further, since the surface treatment of a plurality of substrates is carried out in a processing cassette, the throughput of the treatment is improved as compared with the case of every-wafer treatment. The substrate inside can be prevented from being damaged.

Further, since the transfer cassette and the processing cassette are used, the transfer cassette which is not contaminated outside the apparatus is not put in the surface treatment section, so that the contamination in the surface treatment section can be reduced.

According to the third aspect of the present invention, the transfer of the substrate before processing from the transfer cassette to the processing cassette and the transfer of the processed substrate from the processing cassette to the transfer cassette are performed. Are performed independently of each other, so that the transfer of the substrate before the surface treatment and the transfer of the substrate after the surface treatment do not conflict with each other. Thus, the processing throughput can be improved.

According to the fourth aspect of the present invention, the loading of the transport cassette storing the unprocessed substrates and the unloading of the transport cassette storing the processed substrates are performed independently. Therefore, the loading and unloading of the transport cassette do not conflict with each other, so that a series of processing can be executed without wasteful processing waiting, and the processing throughput can be increased.

According to the fifth aspect of the present invention, the transporting means for surface treatment folds the transport direction in the middle of the transport path, and each part and each means are arranged along the transport path. Therefore, it is possible to realize a device having a floor area with a reduced length in the lateral direction and a good use efficiency of the floor area, and a piping and maintenance area can be provided at the center of the device, so that the device can be made compact. it can.

According to the sixth aspect of the present invention, since the transport cassette buffer section and the transport cassette transport means for transporting the empty transport cassette are provided, the transport cassette used at the time of loading is unloaded. Can be used as a transfer cassette, and the transfer cassette can be used efficiently. If there is a difference between the transport time of the empty transport cassette and the processing time of the surface treatment, the empty transport cassette can be made to wait in the transport cassette buffer unit.

According to the seventh aspect of the present invention, since the processing cassette buffer section and the processing cassette transport means for transporting an empty processing cassette are provided, the processing cassette used in the apparatus can be used. The processing cassette can be used cyclically, the processing cassette can be used efficiently, and the processing cassette is not taken out of the apparatus. Pollution can be reduced. Further, when an excess empty processing cassette occurs, for example, when the timing at which an empty processing cassette is transported to the processing cassette loader unit is shifted from the timing at which the transport cassette is loaded into the transport cassette loader unit. Can store an excess empty processing cassette in a processing cassette buffer unit.

According to the eighth aspect of the present invention, since the empty transfer cassette is cleaned by the transfer cassette cleaning section attached to the transfer cassette buffer section, the substrate having been subjected to the surface treatment can be cleaned. It can be stored in the transport cassette after cleaning, and even if the transport cassette is dirty when it is loaded into the device, the dirt does not adhere to the processed substrate, and the Contamination of the substrate can be reduced.

According to the ninth aspect of the present invention, the empty processing cassette is cleaned by the processing cassette cleaning section attached to the processing cassette buffer section. This can be performed in a state of being accommodated in the processing cassette, and the contamination of the substrate from the processing cassette can be further reduced.

[Brief description of the drawings]

FIG. 1 is a perspective view showing the appearance of a substrate surface treatment apparatus according to a first embodiment of the present invention.

FIG. 2 is a plan view showing a configuration inside the apparatus of the first embodiment.

FIG. 3 is a diagram illustrating a configuration of a transport cassette.

FIG. 4 is a diagram showing a configuration of a processing cassette.

FIG. 5 is a diagram showing a schematic configuration near a loader section / unloader section.

FIG. 6 is a diagram illustrating a configuration of a loader unit substrate transfer robot.

FIG. 7 is a diagram for explaining a substrate transfer procedure.

FIG. 8 is a diagram illustrating a configuration of a posture changing robot and a configuration of a surface processing robot that transports a processing cassette in a Y direction.

FIG. 9 is a diagram illustrating a configuration of a surface treatment robot that transports a processing cassette in an X direction.

FIG. 10 is a diagram illustrating a configuration of a transfer cassette transfer robot.

FIG. 11 is a diagram showing a configuration of a modification of the substrate transfer robot.

FIG. 12 is a plan view showing a configuration in the vicinity of a loader unit and an unloader unit of the second embodiment.

FIG. 13 is a diagram showing a configuration of a cleaning robot.

FIG. 14 is a plan view showing the configuration of the device of the third embodiment.

FIG. 15 is a plan view showing the configuration of the device of the fourth embodiment.

FIG. 16 is a plan view showing the configuration of the fifth embodiment device.

FIG. 17 is a plan view showing the configuration of the device of the sixth embodiment.

FIG. 18 is a plan view showing the configuration of the device of the seventh embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Loader part 2 ... Surface treatment part 3 ... Unloader part 5 ... Transport cassette buffer part 6 ... Processing cassette buffer part 7 ... Transport cassette 8 ... Processing cassette 11 ... Carry-in port 12, 14, 31, 33, 51 , 61 Mounting table 13 ロ ー ダ Loader section substrate transfer robot 21 a to 21 g Processing tanks 22, 26 姿勢 Posture changing robot 23, 24, 25 表面 Surface treatment robot 32 ア ン Unloader section substrate transfer robot 34 搬 Unloading port 52 搬 送 Transport Cassette transfer robot 62… Processing cassette transfer robot 53, 63… Cleaning tank 54, 64… Cleaning robot

Claims (9)

[Claims] 1. A substrate surface treatment method for performing surface treatment on a plurality of substrates in a treatment tank containing a cleaning liquid, wherein the plurality of substrates in a horizontal state extracted from a transfer cassette are processed. In front of the tank, the posture is changed so as to be erect, and the pitch is different from the pitch of the transfer cassette, and a plurality of substrates that are changed to the upright posture and have a different pitch from the transfer cassette are put into the processing tank. A substrate surface treatment method comprising immersing the substrate in the cleaning liquid. 2. A substrate surface treatment apparatus for performing surface treatment of immersing a plurality of substrates accommodated in a cassette in a cleaning liquid, wherein the plurality of substrates accommodated at a predetermined pitch are carried in a horizontal rollover state. A transfer cassette transfer section for mounting the transfer cassette, a processing cassette transfer section for mounting a processing cassette in which a plurality of substrates are stored at a pitch different from that of the transfer cassette; Between the processing cassette and the processing cassette, a plurality of substrates stored in the transfer cassette are taken out and stored at the processing cassette storage pitch different from the transfer cassette pitch. Substrate transfer means for transferring a substrate; and a posture changing robot for converting the substrate taken out of the transport cassette by the substrate transfer means from a rolled state to an upright state. A surface treatment section in which a processing tank containing the cleaning liquid is disposed, and a plurality of substrates are immersed in the cleaning liquid; and the processing in which the substrates are stored from the processing cassette transfer section to the surface processing section. A substrate surface treatment apparatus, comprising: a surface treatment conveyance unit that conveys a cassette. 3. The processing surface transfer apparatus according to claim 2, wherein the transfer cassette transfer unit includes a transfer cassette loader transfer unit and a transfer cassette unloader transfer unit. The transfer unit includes a processing cassette loader transfer unit and a processing cassette unloader transfer unit, and the substrate transfer unit performs surface treatment stored in the transfer cassette of the transfer cassette loader transfer unit. A loader unit substrate transfer unit for transferring a plurality of previous substrates to an empty processing cassette of the processing cassette loader transfer unit at a storage pitch of the processing cassette; and a processing cassette unloader transfer unit The plurality of surface-treated substrates stored in the processing cassette of (1) are emptied by the transfer cassette unloader transfer unit at the storage pitch of the transfer cassette. An unloader unit substrate transfer unit for transferring to a transfer cassette, wherein the surface processing transfer unit stores a plurality of substrates before surface processing by transferring the substrate by the loader unit substrate transfer unit. A substrate surface treatment apparatus, wherein a processing cassette is transported from the processing cassette loader transfer unit to the processing cassette unloader transfer unit via the surface processing unit. 4. The substrate surface treatment apparatus according to claim 3, wherein a plurality of substrates are accommodated between the outside of the substrate surface treatment apparatus and the transfer cassette transfer unit. A transfer cassette transfer unit for performing transfer is provided, and the transfer cassette transfer unit is configured to transfer a plurality of substrates before surface processing between the outside of the substrate surface treatment apparatus and the transfer cassette loader transfer unit. A plurality of surface-treated substrates are stored between a transfer cassette loader transfer unit that transfers the stored transfer cassette and the transfer cassette unloader transfer unit outside the substrate surface processing apparatus and the transfer cassette unloader transfer unit. And a transfer cassette unloader transfer section for transferring the transfer cassette. 5. The substrate surface treatment apparatus according to claim 4, wherein the surface treatment transport means has a transport path in which a transport direction is turned halfway, and along the transport path, Cassette loader transfer section, transfer cassette loader transfer section, loader section substrate transfer section, processing cassette loader transfer section, surface processing section, processing cassette unloader transfer section, unloader section substrate transfer A substrate surface treatment apparatus, comprising: a transfer unit, the transfer cassette unloader transfer unit, and the transfer cassette unloader transfer unit. 6. The substrate surface treatment apparatus according to claim 3, wherein an empty transfer device is provided between the transfer cassette loader transfer unit and the transfer cassette unloader transfer unit. A transfer cassette buffer unit for holding the cassette is provided, and an empty transfer cassette after the transfer of substrates by the loader unit substrate transfer unit is completed is transferred from the transfer cassette loader transfer unit. A substrate surface treatment apparatus, further comprising a transfer cassette transfer unit that transfers the transfer cassette unloader transfer unit via the transfer cassette buffer unit. 7. The substrate surface treatment apparatus according to claim 3, wherein an empty processing unit is provided between the processing cassette loader transfer unit and the processing cassette unloader transfer unit. A processing cassette buffer unit for holding the cassette is provided, and an empty processing cassette after the substrate transfer by the unloader unit substrate transfer unit is completed is removed from the processing cassette unloader transfer unit. A substrate surface processing apparatus, further comprising a processing cassette transport unit that transports the processing cassette loader to the processing cassette loader transfer unit via the processing cassette buffer unit. 8. The substrate surface treatment apparatus according to claim 6, wherein a transfer cassette cleaning unit for cleaning the transfer cassette is attached to the transfer cassette buffer unit, and the transfer cassette transfer unit is empty. While transferring the transfer cassette from the transfer cassette loader transfer unit to the transfer cassette unloader transfer unit, the empty transfer cassette is cleaned by the transfer cassette cleaning unit. Characteristic substrate surface treatment equipment. 9. The substrate surface processing apparatus according to claim 7, wherein a processing cassette cleaning unit for cleaning the processing cassette is attached to the processing cassette buffer unit, and the processing cassette transport unit is empty. While transporting the processing cassette from the processing cassette unloader transfer unit to the processing cassette loader transfer unit, the empty processing cassette is cleaned by the processing cassette cleaning unit. Characteristic substrate surface treatment equipment.