JP2000096190A - Stock for shadow mask, free from striped irregularity at etching, and its manufacture - Google Patents

Stock for shadow mask, free from striped irregularity at etching, and its manufacture

Info

Publication number
JP2000096190A
JP2000096190A JP10266046A JP26604698A JP2000096190A JP 2000096190 A JP2000096190 A JP 2000096190A JP 10266046 A JP10266046 A JP 10266046A JP 26604698 A JP26604698 A JP 26604698A JP 2000096190 A JP2000096190 A JP 2000096190A
Authority
JP
Japan
Prior art keywords
weight
shadow mask
concentration
etching
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10266046A
Other languages
Japanese (ja)
Inventor
Hisao Iwamoto
久雄 岩本
Takahiro Fujii
孝浩 藤井
Hiroshi Morikawa
広 森川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Priority to JP10266046A priority Critical patent/JP2000096190A/en
Publication of JP2000096190A publication Critical patent/JP2000096190A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an Fe-Ni alloy stock for shadow mask, causing no striped irregularity at the time of etching. SOLUTION: The stock is a <=0.3 mm-thick sheet of an Fe-Ni alloy having a composition consisting of, by weight, 30-50% Ni, 0.01-1.0% Cr, <=0.015% C, <=0.2% Si, <=0.5% Mn, <=0.02% Al, <=0.0040% B, and the balance Fe with inevitable impurities. Further, the range of fluctuation in the Ni concentration in a sheet-thickness direction in the cross section perpendicular to the rolling direction of the sheet is regulated to <=1.0 wt.%. This stock can be manufactured by carrying out continuous casting without performing electromagnetic stirring.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は多数の電子ビーム通
過孔をエッチングで穿孔したとき、すじむらが発生しな
いシャドウマスク用素材に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material for a shadow mask which does not cause stripes when a large number of electron beam passage holes are formed by etching.

【0002】[0002]

【従来の技術】カラーテレビ用ブラウン管やOA機器の
ディスプレイ等の受像管には、多数の電子ビーム通過孔
が形成されたシャドウマスクが組み込まれている。電子
銃から放出された電子ビームは、特定のビーム通過孔を
通過し、各色調に応じてそれぞれの蛍光部にビームスポ
ットを投影する。
2. Description of the Related Art A picture tube such as a cathode ray tube for a color television or a display of an office automation apparatus incorporates a shadow mask having a large number of electron beam passage holes formed therein. The electron beam emitted from the electron gun passes through a specific beam passage hole, and projects a beam spot on each fluorescent part according to each color tone.

【0003】シャドウマスク用素材としては、正確な電
子ビーム通過孔が形成されるようにエッチング性に優れ
ていることが要求され、従来から低炭素Alキルド鋼が
使用されている。しかし、シャドウマスクは、電子ビー
ムの衝突によって加熱され、熱膨張する。このときの熱
膨張が大きいと、電子ビーム通過孔の位置が変位し、電
子ビームが所定の蛍光面に当たらなくなるドーミング現
象が発生する。
[0003] As a material for a shadow mask, it is required to have excellent etching properties so that an accurate electron beam passage hole is formed, and a low carbon Al-killed steel has been conventionally used. However, the shadow mask is heated by the collision of the electron beam and thermally expands. If the thermal expansion at this time is large, the position of the electron beam passage hole is displaced, and a doming phenomenon occurs in which the electron beam does not hit a predetermined phosphor screen.

【0004】ドーミング現象はカラーテレビ,ディスプ
レイ等の高精度化・高輝度化に伴い大きな問題となって
いる。ドーミング現象は、低熱膨張特性をもった素材の
使用によって抑制されることから、低炭素Alキルド鋼
より高価でエッチング性にも多少劣るが、熱膨張率の小
さいFe−Ni系合金がシャドウマスク用素材として使
用されるようになってきている。
[0004] The doming phenomenon has become a major problem as color televisions, displays and the like have become more accurate and brighter. Since the doming phenomenon is suppressed by the use of a material having low thermal expansion characteristics, it is more expensive and slightly inferior to etching than low carbon Al-killed steel, but an Fe-Ni alloy having a low thermal expansion coefficient is used for shadow masks. It is being used as a material.

【0005】しかし、Fe−Ni系合金には、エッチン
グ後のシャドウマスクに「すじむら」が発生するという
欠点がある。すじむらは、外観的に帯状あるいは筋状に
見えるエッチングむらであり、ブラウン管の品位を低下
させるとして大きな問題となる。
[0005] However, the Fe-Ni-based alloy has a drawback that "streaks" occur in the shadow mask after etching. The stripe unevenness is etching unevenness that looks like a band or a streak in appearance, and is a serious problem as it degrades the quality of a cathode ray tube.

【0006】このすじむらを解消するため、Fe−Ni
系合金を改質する方策が種々提案されている。例えば特
開昭60−56053号公報では、すじむらの原因がN
iの成分偏析にあり、偏析部と母材部との間におけるエ
ッチング性の差に起因してすじむらが発生するとの前提
でNiの成分偏析率を規制することにより、すじむらの
発生を抑制することを紹介している。すなわち、Niが
紐状に濃化した偏析部が素材中に存在するとして、紐状
偏析物の容積率および長さを規制し、かつ偏析を10%
以下に規制している。
In order to eliminate this unevenness, Fe—Ni
Various measures for modifying a system alloy have been proposed. For example, in Japanese Unexamined Patent Publication No. 60-56053, the cause of the stripe irregularity is N
In the component segregation of i, by controlling the Ni component segregation rate on the premise that the unevenness occurs due to the etching property difference between the segregated portion and the base material portion, the occurrence of the unevenness is suppressed. It is introduced to do. That is, assuming that a segregated portion in which Ni is concentrated in a string shape is present in the material, the volume ratio and length of the string-like segregated material are regulated and segregation is reduced by 10%.
It is regulated as follows.

【0007】特開昭60−128253号公報では、1
ヒートまたは2ヒート以上で断面減少率40%以上の鍛
造を鋳塊に施すNi偏析の解消方法を紹介している。特
開平2−54743号公報では、C,Si,Mn,Cr
等の不純物元素の成分偏析および鋳造時に生じる特定方
位を持つ柱状組織の残存がすじむらの主原因であると
し、等軸晶率が規制された連鋳スラブを950℃または
1100℃以上の温度に1時間以上保持することにより
すじむらを防止する方法を提案している。
In Japanese Patent Application Laid-Open No. Sho 60-128253, 1
This paper introduces a method for eliminating Ni segregation, in which forging of the ingot with a cross-section reduction rate of 40% or more with heat or two or more heats is performed. JP-A-2-54743 discloses that C, Si, Mn, Cr
It is assumed that the segregation of impurity elements such as impurity elements and the columnar structure having a specific orientation that occurs during casting are the main causes of streaking unevenness. A method has been proposed to prevent streaking by holding the film for one hour or more.

【0008】特開平1−252725号公報でも、すじ
むらの支配的原因が成分偏析にあるとし、スラブまたは
熱延コイルを特定条件下で均質化処理することによりす
じむらを軽減する方法を紹介している。具体的には、鋳
片中のNi濃度範囲に対する薄板製品中のNi濃度範囲
の減少率をNiの偏析レベルとし、この数値が0.7以
下であると実用上で問題ない程度まですじむらが抑制さ
れるとしている。
Japanese Patent Application Laid-Open No. 1-252725 also discloses that a dominant cause of line unevenness is component segregation, and introduces a method of reducing line unevenness by homogenizing a slab or a hot-rolled coil under specific conditions. ing. Specifically, the rate of reduction of the Ni concentration range in the thin plate product with respect to the Ni concentration range in the slab is defined as the Ni segregation level. They say they will be suppressed.

【0009】[0009]

【発明が解決しようとする課題】以上に掲げたように、
Niまたはその他の元素の成分偏析がすじむらの原因と
し、成分偏析を解消するための鋳造方法、熱間加工方
法、均質化熱処理が検討されている。しかしながら、最
近のカラーテレビの大型化,マルチメディア化の動きに
おいて従来よりも小さい孔径の電子ビーム通過孔を高密
度で穿孔し、かつ孔と孔との間のピッチも細かくしたシ
ャドウマスクが要求されるようになってきている。これ
に対し従来提案されている方法で製造される素材では、
すじむらが十分に解消されていないのが現状である。本
発明の目的はこのような実状に即し、エッチング時にす
じむらが発生しないシャドウマスク用Fe−Ni合金素
材を提供することにある。
SUMMARY OF THE INVENTION As stated above,
Casting, hot working, and homogenizing heat treatment for eliminating component segregation are considered as causes of line unevenness due to component segregation of Ni or other elements. However, with the recent movement of color televisions to be larger and more multimedia, a shadow mask is required which has a high density of electron beam passage holes with a smaller diameter than the conventional one and a fine pitch between the holes. It is becoming. On the other hand, in the materials manufactured by the conventionally proposed method,
The current situation is that streaking has not been sufficiently eliminated. An object of the present invention is to provide an Fe-Ni alloy material for a shadow mask which does not cause line unevenness at the time of etching in accordance with such a situation.

【0010】[0010]

【課題を解決するための手段】上記目的は、Ni:30
〜50重量%,Cr:0.01〜1.0重量%,C:
0.015重量%以下,Si:0.2重量%以下,M
n:0.5重量%以下,Al:0.02重量%以下及び
B:0.0040重量%以下を含み、その他不可避的不
純物および残部FeよりなるFe−Ni系合金の板厚
0.3mm以下の板材であって、その板材の圧延方向に
垂直な断面における板厚方向のNi濃度の変動幅が1.
0重量%以下である、エッチング時にすじむらが発生し
ないシャドウマスク用素材によって達成される。
The object of the present invention is to provide Ni: 30
To 50% by weight, Cr: 0.01 to 1.0% by weight, C:
0.015% by weight or less, Si: 0.2% by weight or less, M
n: not more than 0.5% by weight, Al: not more than 0.02% by weight and B: not more than 0.0040% by weight, and 0.3 mm or less in thickness of Fe-Ni-based alloy composed of other unavoidable impurities and the balance of Fe Wherein the fluctuation range of the Ni concentration in the thickness direction in the cross section perpendicular to the rolling direction of the plate material is 1.
This is achieved by using a shadow mask material that is not more than 0% by weight and does not cause line unevenness during etching.

【0011】また、上記素材を製造するにあたり、電磁
攪拌を行わずに連続鋳造する方法を提供する。
[0011] In addition, the present invention provides a method of continuously casting without performing electromagnetic stirring in producing the above-mentioned material.

【0012】[0012]

【発明の実施の形態】本発明者らはすじむらの解消策を
検討するに当たり、Fe−Ni系合金素材に発生したす
じむらの発生形態と成分偏析との関係について調査し
た。すじむらが発生したシャドウマスクを詳細に観察し
た結果、すじむらが発生していない場合と比べて、穿孔
部エッチング面に凹凸が多いことを確認した。そこで圧
延方向に垂直な板断面のNiの分布状態をX線マイクロ
アナライザーにより分析した結果、穿孔部の凹部に対応
した位置にNi欠乏域が層状に分布していることを突き
止めた。図1にその様子を模式的に示す。このような板
厚方向のNiの濃度変動に対応してエッチング速度に差
を生じるため、形成される穿孔部表面に微小な凹凸を生
じる。この結果、孔形状および孔径が不均一となりすじ
むらが発生する。
BEST MODE FOR CARRYING OUT THE INVENTION The present inventors examined the relationship between the form of occurrence of stripe unevenness in a Fe-Ni-based alloy material and the segregation of components in examining measures for eliminating the stripe unevenness. As a result of closely observing the shadow mask in which the stripes were generated, it was confirmed that the etched surface of the perforated portion had more irregularities than in the case where the stripes were not generated. Then, as a result of analyzing the distribution state of Ni in the cross section of the plate perpendicular to the rolling direction using an X-ray microanalyzer, it was found that a Ni-deficient region was distributed in a layer at a position corresponding to the concave portion of the perforated portion. FIG. 1 schematically shows this state. Since a difference occurs in the etching rate in response to such a change in the Ni concentration in the thickness direction, minute irregularities are generated on the surface of the formed hole. As a result, the hole shape and the hole diameter become non-uniform, which causes stripe unevenness.

【0013】このNiの偏析は鋳造時のデンドライト樹
間に生じるミクロ偏析であり、以降の工程における圧延
加工および熱処理を経ても解消されずに残存したもので
ある。また更に、連続鋳造においては、電磁攪拌を行う
ことにより一般にホワイトバンドと呼ばれる「マクロ
的」な成分偏析が生じる。一般に連続鋳造においては中
心偏析を防止するため、あるいはさらに鋳造組織を等軸
晶にすることを目的として電磁攪拌を行う。シャドウマ
スク用材に用いられるNiが36重量%程度のFe−N
i系合金の凝固では、晶出し始めの結晶はNiの濃度が
低く、一方溶鋼中にはNi成分が濃化してゆく。しかし
連続鋳造時に電磁攪拌を行うと、水冷モールド壁から成
長した凝固シェルのデンドライト結晶間のNi濃化溶鋼
が溶鋼流動によって洗い出されるため、電磁攪拌の影響
を受ける領域は他の部分よりもNi濃度が低い、一般に
ホワイトバンドと呼ばれるマクロ的な偏析となる。偏析
の程度は電磁攪拌条件、鋼種等により異なるが、例えば
Fe−36%Ni合金の電磁攪拌電流は1200Aでは
図4に示すように、約0.5%程度のNiの負偏析とな
る。これは前述のミクロ偏析よりも大きな濃度変動であ
り、以降の工程中における圧延、焼鈍によっても容易に
解消せず最終製品に残存する。ホワイトバンドの発生領
域は電磁攪拌装置の位置やスラブの冷却条件によって異
なるが、一般にスラブ表面から数十mm内側に、数十m
mの幅で現れる。発明者らは、このホワイトバンドが製
品に残存する程度により、シャドウマスク穿孔部のエッ
チング面に凹凸が生じ、この結果すじむらの程度の品位
が大きく異なることを見出した。
[0013] The segregation of Ni is micro segregation occurring between dendrite trees during casting, and remains without being eliminated even after rolling and heat treatment in the subsequent steps. Furthermore, in continuous casting, “macroscopic” component segregation generally called a white band occurs by performing electromagnetic stirring. Generally, in continuous casting, electromagnetic stirring is performed for the purpose of preventing center segregation, or for the purpose of making the cast structure equiaxed. Fe-N of about 36% by weight of Ni used for a shadow mask material
In the solidification of an i-based alloy, the crystal at the start of crystallization has a low Ni concentration, while the Ni component is concentrated in the molten steel. However, when electromagnetic stirring is performed during continuous casting, the Ni-enriched molten steel between the dendrite crystals of the solidified shell grown from the water-cooled mold wall is washed out by the molten steel flow, so that the area affected by the electromagnetic stirring is more Ni than the other parts. Macroscopic segregation with a low concentration, generally called a white band. Although the degree of segregation varies depending on the electromagnetic stirring conditions, steel type, and the like, for example, the electromagnetic stirring current of a Fe-36% Ni alloy becomes about 0.5% negatively segregated with Ni at about 1200 A as shown in FIG. This is a concentration fluctuation larger than the above-mentioned micro-segregation, and is not easily eliminated by rolling and annealing during the subsequent steps and remains in the final product. The generation area of the white band varies depending on the position of the electromagnetic stirrer and the cooling condition of the slab, but is generally several tens mm inward from the slab surface.
Appears with a width of m. The inventors have found that depending on the extent to which the white band remains in the product, unevenness occurs on the etched surface of the shadow mask perforated portion, and as a result, the quality of the level of the unevenness greatly differs.

【0014】そこで本発明者らは、鋳造時に生じる成分
偏析を、以降の工程において解消する方法について種々
検討するとともに、それぞれの方策により得られた素材
の成分偏析の残存程度とエッチング後のすじむら程度と
の関係を調査した。その結果、素材の圧延方向に垂直な
断面をX線マイクロアナライザーにより分析したとき、
板厚方向のNi濃度の変動幅が1.0%以下の場合に、
すじむらがほとんど発生していないことを見出した。こ
こでNiの濃度の変動幅とは図2に示すように、Ni濃
度の最大値と最小値の差と定義する。また、素材を連続
鋳造により製造する場合には、電磁攪拌を行わないこと
によりホワイトバンドの発生を抑制すれば、製品でのN
iの濃度の変動幅が1.0重量%となり、すじむらの発
生を防止することができることを見出した。
The inventors of the present invention have studied various methods for eliminating component segregation occurring during casting in the subsequent steps, and have examined the degree of residual component segregation of the raw material obtained by each method and the streak unevenness after etching. The relationship with degree was investigated. As a result, when a cross section perpendicular to the rolling direction of the material was analyzed by an X-ray microanalyzer,
When the fluctuation width of the Ni concentration in the thickness direction is 1.0% or less,
It was found that there was almost no line unevenness. Here, the fluctuation range of the Ni concentration is defined as the difference between the maximum value and the minimum value of the Ni concentration as shown in FIG. In addition, when the material is manufactured by continuous casting, if the generation of white bands is suppressed by not performing electromagnetic stirring, the N
It has been found that the fluctuation range of the concentration of i is 1.0% by weight, and the occurrence of stripe unevenness can be prevented.

【0015】なお、Ni濃度の変動幅は次の方法によっ
てX線マイクロアナライザーにより測定される。素材の
圧延方向に垂直な断面内における、板厚を一辺の長さと
する正方形の領域について、プローブ径1μm、測定間
隔1μmでNiの定量マッピング分析を行う。得られた
各測定点の定量分析値(重量%)を板幅方向にはその平
均値を代表値とすることにより、板厚方向の濃度変動ラ
インに変換する。このライン内の最大値と最小値の差を
Ni濃度の変動幅とする。
The fluctuation range of the Ni concentration is measured by an X-ray microanalyzer according to the following method. In a cross section perpendicular to the rolling direction of the material, a quantitative mapping analysis of Ni is performed at a probe diameter of 1 μm and a measurement interval of 1 μm in a square area having a plate thickness of one side. The obtained quantitative analysis value (% by weight) at each measurement point is converted into a density fluctuation line in the thickness direction by setting the average value in the width direction as a representative value. The difference between the maximum value and the minimum value in this line is defined as the fluctuation range of the Ni concentration.

【0016】以下に、本発明が提供する素材における合
金成分について説明する。 Ni:30〜50重量% Fe−Ni系合金の熱膨張係数を低く維持する上で重要
な合金元素であり、熱膨張係数を低く維持するため30
重量%以上、50%以下にNi含有量を規制する必要が
ある。
Hereinafter, the alloy components in the raw material provided by the present invention will be described. Ni: 30 to 50% by weight Ni is an important alloy element for maintaining a low coefficient of thermal expansion of the Fe-Ni alloy.
It is necessary to regulate the Ni content to not less than 50% by weight and not more than 50% by weight.

【0017】Cr:0.01〜1.0重量% Fe−Ni系合金のエッチング速度を増大させるために
有効な合金元素であり、0.01重量%以上の含有量で
Cr添加の作用が顕著になる。しかし、1.0重量%を
越える多量のCrが含まれると、Fe−Ni系合金の熱
膨張係数が大きくなる。
Cr: 0.01 to 1.0% by weight Cr is an effective alloying element for increasing the etching rate of an Fe-Ni alloy. When the content is 0.01% by weight or more, the effect of adding Cr is remarkable. become. However, when a large amount of Cr exceeding 1.0% by weight is contained, the thermal expansion coefficient of the Fe—Ni-based alloy increases.

【0018】C:0.015重量%以下 素材中に炭化物を形成し、エッチング性を損なう有害元
素である。そのため本発明ではC含有量の上限を0.0
15重量%に規制した。
C: 0.015% by weight or less C is a harmful element which forms carbides in the material and impairs the etching property. Therefore, in the present invention, the upper limit of the C content is set to 0.0
It was regulated to 15% by weight.

【0019】Si:0.2重量%以下 脱酸剤として添加される元素であるが、熱膨張係数を大
きくし、エッチング性や黒化膜性を劣化させる傾向を示
す。そこで、本発明においてはSi含有量の上限を0.
2重量%に規制した。
Si: 0.2% by weight or less Si is an element added as a deoxidizing agent, but tends to increase the thermal expansion coefficient and deteriorate the etching property and the blackening film property. Therefore, in the present invention, the upper limit of the Si content is set to 0.1.
It was regulated to 2% by weight.

【0020】Mn:0.5重量%以下 脱酸剤として有効な元素であるが、熱膨張係数を大きく
する作用をもつ。そのため、Mn含有量は、上限を0.
5重量%に規制した。
Mn: 0.5% by weight or less Mn is an element effective as a deoxidizing agent, but has an effect of increasing the coefficient of thermal expansion. Therefore, the Mn content has an upper limit of 0.1.
Regulated to 5% by weight.

【0021】Al:0.02重量%以下 脱酸剤として有効な元素であるが、表面疵の発生等によ
って表面品質を劣化させるため、Al含有量の上限を
0.02重量%に規制した。
Al: 0.02% by weight or less Although it is an element effective as a deoxidizing agent, the upper limit of the Al content is restricted to 0.02% by weight in order to deteriorate the surface quality due to generation of surface flaws and the like.

【0022】B:0.004重量%以下 エッチング速度を増加させる有効な成分である。しか
し、0.0040重量%を越える含有量では、軟化焼鈍
後に焼鈍むらが発生しやすくなり、黒化膜の生成むらを
助長させる。そのため、B含有量の上限を0.0040
重量%に規制した。
B: 0.004% by weight or less B is an effective component for increasing the etching rate. However, when the content exceeds 0.0040% by weight, unevenness in annealing tends to occur after softening annealing, which promotes unevenness in formation of a blackened film. Therefore, the upper limit of the B content is 0.0040.
It was restricted to wt%.

【0023】本発明が対象とするFe−Ni合金におい
ては、その他の不可避的成分としてS,P,O,Nなど
がある。これらの不可避的成分が合金中に含まれる量は
それぞれ0.010重量%以下であり、この程度の含有
量であればシャドウマスク用素材としての性能に悪影響
を及ぼさない。
In the Fe—Ni alloy to which the present invention is applied, there are S, P, O, N, and the like as other inevitable components. The amount of each of these unavoidable components contained in the alloy is not more than 0.010% by weight, and such an amount does not adversely affect the performance as a material for a shadow mask.

【0024】板厚0.3mmの素材の圧延方向に垂直な
断面における、板厚方向のNi濃度の変動幅が1.0重
量%以下を超える場合にはエッチング後にすじむらが発
生する。このため、これを1.0重量%以下に規制す
る。
If the fluctuation width of the Ni concentration in the cross section perpendicular to the rolling direction of a material having a thickness of 0.3 mm in the thickness direction exceeds 1.0% by weight or less, stripes occur after etching. For this reason, it is regulated to 1.0% by weight or less.

【0025】[0025]

【実施例】表1に示した組成を持つFe−Ni系合金を
4チャージ溶製し、各チャージとも連続鋳造時の電磁攪
拌をそれぞれ有り、無しとしたスラブ(10トン)を製
造した。
EXAMPLE Four slabs (10 tons) of Fe--Ni alloys having the compositions shown in Table 1 were produced by melting, and each charge was provided with and without electromagnetic stirring during continuous casting.

【0026】[0026]

【表1】 [Table 1]

【0027】表2に示す条件により、熱延前の均熱を1
150℃で施した後、熱間圧延により板厚6mmとし
た。さらに1000℃の焼鈍と冷間圧延を数回繰り返
し、最終的に板厚0.25mmの冷延鋼帯を得た。各冷
延鋼帯にフォトレジストによりパターンを印刷したの
ち、比重51ボーメ、温度60℃の塩化第二鉄液でスプ
レーエッチングしてシャドウマスクを作成し、それらの
すじむら発生状況を観察した。このとき、すじむらが全
く観察されなかったものを最高レベルのA、すじむらが
ほとんど見られず、これ以上であれば高品位シャドウマ
スク用として使用可能なものをレベルB、比較的多数の
すじむらが観察されたものをレベルC、明瞭な多数のす
じむらが現れたものを最低レベルDとする4段階で、す
じむら発生状況を評価した。また、冷延鋼帯から切り出
した試験片の素材の圧延方向に垂直な断面を研磨して鏡
面仕上げとし、X線マイクロアナライザーにより定量マ
ッピング分析を行い、板厚方向のNi濃度の変動幅を測
定した。その値をすじむらレベルと併せて表2に示す。
電磁攪拌の施された素材(比較例5〜8)に対し、電磁
攪拌を施されていない素材(1〜4)ではNiの濃度差
が1.0%以下に低減され、すじむらレベルもBレベル
以上に向上している。
Under the conditions shown in Table 2, the soaking temperature before hot rolling was 1
After applying at 150 ° C., the thickness was reduced to 6 mm by hot rolling. Further, annealing at 1000 ° C. and cold rolling were repeated several times to finally obtain a cold-rolled steel strip having a thickness of 0.25 mm. After printing a pattern on each cold-rolled steel strip with a photoresist, a shadow mask was prepared by spray etching with a ferric chloride solution having a specific gravity of 51 Baume and a temperature of 60 ° C., and the occurrence of streaks was observed. At this time, those having no streaking observed were at the highest level A, and those having almost no streaks were observed. The level of occurrence of line unevenness was evaluated in four stages, where the level where unevenness was observed was level C and the level where a large number of clear unevenness appeared was the lowest level D. In addition, the cross section perpendicular to the rolling direction of the test piece cut from the cold-rolled steel strip was polished to a mirror finish, and quantitative mapping analysis was performed with an X-ray microanalyzer to measure the fluctuation range of the Ni concentration in the thickness direction. did. The values are shown in Table 2 together with the line unevenness level.
In contrast to the material subjected to electromagnetic stirring (Comparative Examples 5 to 8), the difference in Ni concentration was reduced to 1.0% or less in the materials (1 to 4) not subjected to electromagnetic stirring, and the line unevenness level was reduced to B. It has improved to a level or higher.

【0028】[0028]

【表2】 [Table 2]

【0029】図3にはNi濃度の変動幅とすじむらレベ
ルの関係を示す。図3から、Ni濃度の変動幅とすじむ
らレベルとの間に強い相関があることがわかる。すなわ
ち、Ni濃度の変動幅が1.0%以下となる本発明例1
〜4では、エッチング後のすじむらレベルがB以上であ
り、高品位が要求されるシャドウマスクに最適な素材と
して使用される。他方、比較例5〜8のようにNiの濃
度差が1.0%を超えると、すじむらレベルがCまたは
Dとなり、高品位シャドウマスクとしては不適当であっ
た。
FIG. 3 shows the relationship between the fluctuation range of the Ni concentration and the level of the stripe unevenness. FIG. 3 shows that there is a strong correlation between the fluctuation range of the Ni concentration and the line unevenness level. That is, Example 1 of the present invention in which the fluctuation range of the Ni concentration is 1.0% or less.
In Nos. To 4, the level of the stripe unevenness after etching is B or more, and is used as an optimal material for a shadow mask requiring high quality. On the other hand, when the concentration difference of Ni exceeds 1.0% as in Comparative Examples 5 to 8, the level of streaking becomes C or D, which is unsuitable as a high-quality shadow mask.

【0030】参考のため、連続鋳造時の電気攪拌の有無
によるスラブ断面内厚さ方向のNi濃度分布の測定例を
図4,図5に示しておく。図4は表2の試験番号6の例
(比較例)、図5は同試験番号2の例(発明例)であ
る。
For reference, FIGS. 4 and 5 show examples of the measurement of the Ni concentration distribution in the thickness direction in the cross section of the slab depending on the presence or absence of electric stirring during continuous casting. 4 shows an example of Test No. 6 in Table 2 (Comparative Example), and FIG. 5 shows an example of Test No. 2 (Inventive Example).

【0031】[0031]

【発明の効果】以上に説明したように、本発明のシャド
ウマスク用素材は圧延方向に垂直な断面におけるNi濃
度の変動幅を1.0重量%以下と規制しているので、多
数の電子ビーム通過孔をフォトエッチングで穿孔する際
にすじむらの発生がないエッチング面が得られる。その
ため高精細な画像品位が要求されるカラーテレビのブラ
ウン管用シャドウマスクの素材として使用される。
As described above, since the shadow mask material of the present invention regulates the fluctuation range of the Ni concentration in the cross section perpendicular to the rolling direction to 1.0% by weight or less, a large number of electron beams are formed. An etched surface free from streaking when a through hole is formed by photoetching can be obtained. Therefore, it is used as a material for a shadow mask for a cathode ray tube of a color television, which requires high definition image quality.

【図面の簡単な説明】[Brief description of the drawings]

【図1】素材エッチング後のシャドウマスク断面におけ
るNi欠乏域の分布を模式的に示した部分斜視図。
FIG. 1 is a partial perspective view schematically showing a distribution of a Ni deficient region in a cross section of a shadow mask after material etching.

【図2】素材の圧延方向に垂直な断面における板厚方向
のNi濃度の変動幅の概念を表した図。
FIG. 2 is a view showing a concept of a fluctuation width of a Ni concentration in a sheet thickness direction in a cross section perpendicular to a rolling direction of a material.

【図3】Ni濃度の変動幅とすじむらレベルとの関係を
示したグラフ。
FIG. 3 is a graph showing the relationship between the fluctuation range of the Ni concentration and the level of the stripe unevenness.

【図4】連続鋳造で電磁攪拌を行った場合の、スラブ厚
み方向のNi濃度分布の一例を示したグラフ。
FIG. 4 is a graph showing an example of a Ni concentration distribution in a slab thickness direction when electromagnetic stirring is performed in continuous casting.

【図5】連続鋳造で電磁攪拌を行わなかった場合の、ス
ラブ厚み方向のNi濃度分布の一例を示したグラフ。
FIG. 5 is a graph showing an example of a Ni concentration distribution in a slab thickness direction when electromagnetic stirring is not performed in continuous casting.

【符号の説明】[Explanation of symbols]

1 圧延方向に垂直な断面 2 圧延方向 3 エッチング穿孔部 4 Ni欠乏域 5 素材の圧延方向に垂直な断面 6 素材の表面 7 定量マッピング分析範囲 8 板厚方向のNi濃度変動 9 Ni濃度の最大値 10 Ni濃度の最小値 11 Ni濃度の変動幅 DESCRIPTION OF SYMBOLS 1 Section perpendicular to rolling direction 2 Rolling direction 3 Etching perforated part 4 Ni deficiency area 5 Section perpendicular to rolling direction of material 6 Surface of material 7 Quantitative mapping analysis range 8 Ni concentration fluctuation in thickness direction 9 Maximum value of Ni concentration 10 Minimum value of Ni concentration 11 Fluctuation width of Ni concentration

───────────────────────────────────────────────────── フロントページの続き (72)発明者 森川 広 山口県新南陽市野村南町4976番地 日新製 鋼株式会社技術研究所内 Fターム(参考) 5C027 HH02 HH11 5C031 EE05 EH04 EH08  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Hiroshi Morikawa 4976 Nomura Minami-cho, Shinnanyo-shi, Yamaguchi Prefecture F-term in Nissin Steel Engineering Laboratory (reference)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 Ni:30〜50重量%,Cr:0.0
1〜1.0重量%,C:0.015重量%以下,Si:
0.2重量%以下,Mn:0.5重量%以下,Al:
0.02重量%以下及びB:0.0040重量%以下を
含み、その他不可避的不純物および残部FeよりなるF
e−Ni系合金の板厚0.3mm以下の板材であって、
その板材の圧延方向に垂直な断面における板厚方向のN
i濃度の変動幅が1.0重量%以下である、エッチング
時にすじむらが発生しないシャドウマスク用素材。
1. Ni: 30 to 50% by weight, Cr: 0.0
1 to 1.0% by weight, C: 0.015% by weight or less, Si:
0.2% by weight or less, Mn: 0.5% by weight or less, Al:
0.02% by weight or less and B: 0.0040% by weight or less, and other unavoidable impurities and the balance of Fe
An e-Ni-based alloy having a plate thickness of 0.3 mm or less,
N in the sheet thickness direction in a cross section perpendicular to the rolling direction of the sheet material
A material for a shadow mask in which the fluctuation range of the i-concentration is 1.0% by weight or less and no streaking occurs during etching.
【請求項2】 素材を製造するにあたり、電磁攪拌を行
わずに連続鋳造する、請求項1に記載のシャドウマスク
用素材の製造方法。
2. The method for producing a material for a shadow mask according to claim 1, wherein the material is continuously cast without performing electromagnetic stirring.
JP10266046A 1998-09-21 1998-09-21 Stock for shadow mask, free from striped irregularity at etching, and its manufacture Pending JP2000096190A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10266046A JP2000096190A (en) 1998-09-21 1998-09-21 Stock for shadow mask, free from striped irregularity at etching, and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10266046A JP2000096190A (en) 1998-09-21 1998-09-21 Stock for shadow mask, free from striped irregularity at etching, and its manufacture

Publications (1)

Publication Number Publication Date
JP2000096190A true JP2000096190A (en) 2000-04-04

Family

ID=17425652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10266046A Pending JP2000096190A (en) 1998-09-21 1998-09-21 Stock for shadow mask, free from striped irregularity at etching, and its manufacture

Country Status (1)

Country Link
JP (1) JP2000096190A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000072995A1 (en) * 1999-05-27 2000-12-07 Toyo Kohan Co., Ltd. Casting slab for shadow mask, method for heat treatment therof and material for shadow mask
JP2004124263A (en) * 2004-01-13 2004-04-22 Nippon Yakin Kogyo Co Ltd Fe-ni alloy material having excellent rust resistance

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000072995A1 (en) * 1999-05-27 2000-12-07 Toyo Kohan Co., Ltd. Casting slab for shadow mask, method for heat treatment therof and material for shadow mask
JP2004124263A (en) * 2004-01-13 2004-04-22 Nippon Yakin Kogyo Co Ltd Fe-ni alloy material having excellent rust resistance
JP4643147B2 (en) * 2004-01-13 2011-03-02 日本冶金工業株式会社 Fe-Ni alloy material with excellent rust resistance

Similar Documents

Publication Publication Date Title
WO2000077269A1 (en) Fe-Ni BASED MATERIAL FOR SHADOW MASK
US20010047839A1 (en) Fe-Ni alloy shadow mask blank with excellent etch perforation properties and method for manufacturing the same
JP2000096190A (en) Stock for shadow mask, free from striped irregularity at etching, and its manufacture
JPH09143625A (en) Iron-nickel alloy stock for shadow mask
JP3327903B2 (en) Fe-Ni shadow mask material
JP3615300B2 (en) Method for producing shadow mask material without uneven stripes
JPS6364514B2 (en)
JP3623620B2 (en) Etching property evaluation method for shadow mask material and shadow mask material that does not cause streak unevenness after etching
JP3781836B2 (en) Shadow mask material that does not cause uneven stripes during etching
JP3509643B2 (en) Low thermal expansion alloy steel slab excellent in etchability after thinning and method for producing the same
JPH1180839A (en) Production of low thermal expansion alloy thin sheet for electronic parts excellent in effect of suppressing unevenness in stripe
JPH09209088A (en) Stock for shadow mask, free from striped irregularity, and its production
JPH10259453A (en) Base stock for shadow mask free from generation of unevenness in stripe at the time of etching
JPH09272922A (en) Manufacture of stock for shadow mask
JPH06279946A (en) Shadow mask material having excellent etching property, its intermediate material, its production, production of shadow mask, and cathode ray tube
JP2001140043A (en) Fe-Ni SERIES ALLOY HOT ROLLED SHEET FOR SHADOW MASK AND METHOD FOR PRODUCING Fe-Ni SERIES ALLOY SHEET FOR SHADOW MASK
JP2000001721A (en) Production of base stock for shadow mask restraining generation of linear unevenness
JPH0738297B2 (en) Amber alloy original plate for shed mask
JP2799166B2 (en) Manufacturing method of shadow mask
JPH09209089A (en) Stock for shadow mask, free from striped irregularity, and its production
JPH108213A (en) Iron-nickel sheet for shadow mask, excellent in striped irregularity characteristic, and its production
JP2793544B2 (en) Shadow mask, color picture tube using the same, method of producing original amber alloy plate for shadow mask, and method of producing this shadow mask
JPH0778270B2 (en) Method for producing Fe-Ni based alloy excellent in streak unevenness suppressing effect during etching
JPH10306349A (en) Low thermal expansion alloy sheet for electronic parts, excellent in etching characteristic
JP3327902B2 (en) Fe-Ni shadow mask material

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050916

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070820

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070828

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20071218