JP2000095923A - Sealing epoxy resin composition and semiconductor device - Google Patents

Sealing epoxy resin composition and semiconductor device

Info

Publication number
JP2000095923A
JP2000095923A JP10268442A JP26844298A JP2000095923A JP 2000095923 A JP2000095923 A JP 2000095923A JP 10268442 A JP10268442 A JP 10268442A JP 26844298 A JP26844298 A JP 26844298A JP 2000095923 A JP2000095923 A JP 2000095923A
Authority
JP
Japan
Prior art keywords
epoxy resin
sealing
resin
ionic surfactant
sealing resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10268442A
Other languages
Japanese (ja)
Inventor
Takayuki Ichikawa
貴之 市川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP10268442A priority Critical patent/JP2000095923A/en
Publication of JP2000095923A publication Critical patent/JP2000095923A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a sealing epoxy resin composition which can give a cured product having resistance to buildup of electrostatic charges and excellent reliability of humidity resistance by incorporating an epoxy resin with a curing agent, an inorganic filler, and an ionic surfactant. SOLUTION: This composition is prepared by forming 0.01-1 pt.wt., per 100 pts.wt. sealing resin, a layer of an ionic surfactant on the surface of each particle of a resin composition containing 0.1-10 equivalents, per equivalent of the epoxy resin, of a curing agent such as an epoxy resin or a phenol novolac resin; 60-95 pts.wt., per 100 pts.wt. sealing resin, inorganic filler such as crystalline silica or alumina; and, optionally, a cure accelerator, a flame retardant, a colorant, an ion trapping agent, a coupling agent, etc. The epoxy resin used is an o-cresol novolac epoxy resin or a bisphenol A epoxy resin each having at least two epoxy groups in the molecule. The ionic surfactant used is an anionic one, a cationic one, an amphoteric one, or a mixture thereof.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置、及び
その製造に使用される封止用エポキシ樹脂組成物に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device and a sealing epoxy resin composition used for manufacturing the same.

【0002】[0002]

【従来の技術】半導体装置等の電子部品の封止方法とし
て、エポキシ樹脂組成物を用いてトランスファー成形に
より封止する方法が汎用されている。このトランスファ
ー成形に用いる封止用エポキシ樹脂組成物(以下封止樹
脂と記す)としては、エポキシ樹脂、硬化剤及び無機充
填材等を配合した後、ロール又は押し出し機等で加熱し
ながら混練し、その混練物をシート状に伸ばして冷却し
た後、粉砕したり、混練物を線状に押し出して冷却しな
がら切断して形成した封止樹脂の粉砕物を用いる方法
や、この粉砕物を所定の重量又は体積計量した後、円柱
状の穴があいた金型に挿入し、加圧することによって内
部の空気を抜きながら円柱状に成形して形成したタブレ
ット状の封止樹脂を用いる方法が行われている。
2. Description of the Related Art As a method of sealing electronic parts such as semiconductor devices, a method of sealing by transfer molding using an epoxy resin composition is widely used. As an epoxy resin composition for sealing used in this transfer molding (hereinafter referred to as a sealing resin), after mixing an epoxy resin, a curing agent, an inorganic filler, and the like, kneading while heating with a roll or an extruder, The kneaded material is stretched into a sheet and cooled, and then pulverized, or a method using a sealing resin pulverized material formed by extruding the kneaded material linearly and cutting it while cooling, or a method in which the pulverized material is subjected to a predetermined method After weighing or measuring the volume, a method is used in which a tablet-shaped sealing resin is inserted into a mold having a cylindrical hole, and formed into a cylindrical shape while evacuating the internal air by applying pressure. I have.

【0003】そして、トランスファー成形を行う際に
は、半導体チップを搭載したリードフレームを金型に装
着した後、封止樹脂の粉砕物又はタブレット状の封止樹
脂を金型に備えたポット内に供給し、加熱して溶融させ
た後、プランジャーで加圧して、金型内のキャビティー
に封止樹脂を移送し、更に加熱することにより封止樹脂
を硬化させることにより、封止が行われている。
In transfer molding, a lead frame on which a semiconductor chip is mounted is mounted on a mold, and then a pulverized sealing resin or a tablet-like sealing resin is placed in a pot provided in the mold. After supplying, heating and melting, the sealing resin is transferred to the cavity in the mold by pressurizing with a plunger, and the sealing resin is cured by further heating, whereby the sealing is performed. Have been done.

【0004】なお、封止樹脂の粉砕物を製造する際や、
粉砕物をポット内に供給する際や、粉砕物をタブレット
形成用金型に移送する際等に、粉砕物が、粉砕物同士又
は配管等と擦れ、摩擦によって帯電してしまい、粉砕物
の製造装置等に付着しやすいという問題や、配管等の詰
まりを引き起こす場合があるという問題があった。ま
た、このような帯電した封止樹脂を用いてトランスファ
ー成型を行った場合、封止樹脂が配管等に付着して所定
の量供給されにくくなり、得られる半導体装置の表面や
内部に未充填部が形成される場合があるという問題があ
った。
[0004] When manufacturing a crushed product of a sealing resin,
When the crushed material is supplied into the pot or when the crushed material is transferred to the tablet forming mold, the crushed material rubs against each other or a pipe or the like, and is charged by friction, thereby producing the crushed material. There is a problem that it easily adheres to devices and the like, and a problem that clogging of piping and the like may occur. In addition, when transfer molding is performed using such a charged sealing resin, the sealing resin adheres to a pipe or the like and becomes difficult to be supplied in a predetermined amount. However, there is a problem in that may be formed.

【0005】なお、トランスファー成形で封止をすると
きに、封止樹脂がキャビティー内に充分に充填されるよ
うに、封止樹脂にポリエチレングリコール脂肪酸エステ
ル、ソルビタン脂肪酸エステル、脂肪酸モノグリセリド
等の界面活性剤を配合することにより、金型との濡れ性
等を改良することが検討されている。しかし、このよう
なポリエチレングリコール脂肪酸エステル、ソルビタン
脂肪酸エステル、脂肪酸モノグリセリド等の界面活性剤
を配合した封止樹脂の場合も、粉砕物が帯電しやすく、
製造装置等に付着しやすいという問題や、配管等の詰ま
りを引き起こす場合があるという問題があった。
When the sealing is performed by transfer molding, the sealing resin is filled with a surfactant such as polyethylene glycol fatty acid ester, sorbitan fatty acid ester or fatty acid monoglyceride so that the sealing resin is sufficiently filled in the cavity. It has been studied to improve the wettability with a mold by adding an agent. However, even in the case of a sealing resin containing a surfactant such as polyethylene glycol fatty acid ester, sorbitan fatty acid ester, or fatty acid monoglyceride, the pulverized material is easily charged,
There is a problem that it easily adheres to a manufacturing apparatus and the like, and a problem that a pipe and the like may be clogged.

【0006】なお、この対策として、封止樹脂に帯電防
止剤を配合することにより、静電気の発生を抑えること
が考えられている。しかし、一般的な帯電防止剤の場
合、得られる封止品の耐湿信頼性を低下させる恐れがあ
り、使用することは困難であった。そのため、エポキシ
樹脂、硬化剤及び無機充填材を含有する封止樹脂であっ
て、帯電しにくい封止樹脂が望まれている。
As a countermeasure, it has been considered to suppress generation of static electricity by adding an antistatic agent to the sealing resin. However, in the case of a general antistatic agent, there is a possibility that the moisture resistance reliability of the obtained sealed product may be reduced, and it has been difficult to use it. Therefore, a sealing resin containing an epoxy resin, a curing agent, and an inorganic filler, which is hardly charged, is desired.

【0007】[0007]

【発明が解決しようとする課題】本発明は、上記問題点
を改善するために成されたもので、その目的とするとこ
ろは、エポキシ樹脂、硬化剤及び無機充填材を含有する
封止樹脂(封止用エポキシ樹脂組成物)であって、帯電
しにくく、かつ、耐湿信頼性が優れた封止樹脂を提供す
ることにある。また、表面や内部に未充填部が形成され
にくい半導体装置を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a sealing resin containing an epoxy resin, a curing agent and an inorganic filler. (Epoxy resin composition for sealing), which is to provide a sealing resin which is hardly charged and has excellent moisture resistance reliability. Another object of the present invention is to provide a semiconductor device in which an unfilled portion is less likely to be formed on the surface or inside.

【0008】[0008]

【課題を解決するための手段】本発明の請求項1に係る
封止樹脂は、エポキシ樹脂、硬化剤、無機充填材及びイ
オン系界面活性剤を含有する粉粒状の封止樹脂である。
The sealing resin according to claim 1 of the present invention is a powdery sealing resin containing an epoxy resin, a curing agent, an inorganic filler and an ionic surfactant.

【0009】本発明の請求項2に係る封止樹脂は、イオ
ン系界面活性剤の層が、エポキシ樹脂、硬化剤及び無機
充填材を含有する粉粒体の表面に形成されている封止樹
脂である。
A sealing resin according to a second aspect of the present invention is a sealing resin in which a layer of an ionic surfactant is formed on the surface of a granular material containing an epoxy resin, a curing agent and an inorganic filler. It is.

【0010】本発明の請求項3に係る半導体装置は、請
求項1又は請求項2記載の封止用エポキシ樹脂組成物を
用いて、半導体チップを封止してなる。
A semiconductor device according to a third aspect of the present invention is obtained by encapsulating a semiconductor chip using the epoxy resin composition for encapsulation according to the first or second aspect.

【0011】[0011]

【発明の実施の形態】本発明に係る封止樹脂は、少なく
ともエポキシ樹脂、硬化剤、無機充填材、及び、イオン
系界面活性剤を含有してなる粉粒状の封止樹脂である。
イオン系界面活性剤を含有していることが重要であり、
含有していない場合は、封止樹脂が帯電しやすくなっ
て、製造装置等に付着しやすいという問題や、配管等の
詰まりを引き起こす場合があるという問題や、耐湿信頼
性が低下するという問題が生じやすくなる。
BEST MODE FOR CARRYING OUT THE INVENTION The sealing resin according to the present invention is a powdery sealing resin containing at least an epoxy resin, a curing agent, an inorganic filler, and an ionic surfactant.
It is important to contain an ionic surfactant,
If not contained, the sealing resin is likely to be charged and easily adhered to a manufacturing apparatus, etc., a problem that a pipe may be clogged, and a problem that moisture resistance reliability is reduced. It is easy to occur.

【0012】このイオン系界面活性剤としては、アルキ
ルホスフェート塩、スルホン酸塩等のアニオン系界面活
性剤や、第1アミン塩、第3アミン、第4級アンモニウ
ム塩、ピリジン誘導体等のカチオン系界面活性剤や、カ
ルボン酸誘導体、イミダゾリン誘導体、ベタイン塩、ア
ラニン塩等の両性系界面活性剤が挙げられ、単独で用い
ても、2種以上を併用しても良い。
Examples of the ionic surfactant include anionic surfactants such as alkyl phosphate salts and sulfonates, and cationic surfactants such as primary amine salts, tertiary amines, quaternary ammonium salts, and pyridine derivatives. Examples include an activator, an amphoteric surfactant such as a carboxylic acid derivative, an imidazoline derivative, a betaine salt, and an alanine salt. These may be used alone or in combination of two or more.

【0013】イオン系界面活性剤の配合量としては、封
止樹脂100重量部に対して、0.01〜1重量部配合
していることが好ましい。0.01重量部未満の場合
は、帯電を防止する効果が小さく、1重量部を越える場
合は、イオン系界面活性剤に含まれるイオン性の不純物
によって、得られる封止品(半導体装置等)の耐湿信頼
性が低下する場合がある。なお、界面活性剤としては、
イオン系界面活性剤のみを配合していることに限定する
ものではなく、必要に応じて非イオン系界面活性剤をも
配合してもよい。
The amount of the ionic surfactant is preferably 0.01 to 1 part by weight based on 100 parts by weight of the sealing resin. When the amount is less than 0.01 part by weight, the effect of preventing electrification is small. When the amount exceeds 1 part by weight, a sealed product obtained by ionic impurities contained in the ionic surfactant (semiconductor device, etc.) In some cases, the moisture resistance reliability may decrease. In addition, as a surfactant,
It is not limited that only an ionic surfactant is blended, and a nonionic surfactant may be blended if necessary.

【0014】本発明で用いるエポキシ樹脂としては、分
子内にエポキシ基を2個以上有するエポキシ樹脂を含有
していれば特に限定するものではなく、例えばオルソク
レゾールノボラック型エポキシ樹脂、ビスフェノールA
型エポキシ樹脂、ビフェニル型エポキシ樹脂、線状脂肪
族エポキシ樹脂、脂環式エポキシ樹脂、複素環式エポキ
シ樹脂等が挙げられ、これらを単独で用いても、2種類
以上を併用してもよい。
The epoxy resin used in the present invention is not particularly limited as long as it contains an epoxy resin having two or more epoxy groups in a molecule. For example, an ortho-cresol novolak type epoxy resin, bisphenol A
Type epoxy resin, biphenyl type epoxy resin, linear aliphatic epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin and the like. These may be used alone or in combination of two or more.

【0015】本発明で用いる硬化剤としては、エポキシ
樹脂と反応して硬化させるものであれば特に限定するも
のではなく、例えばフェノールノボラック樹脂、クレゾ
ールノボラック樹脂、モノまたはジヒドロキシナフタレ
ンノボラック樹脂、及びこれらの樹脂の誘導体、フェノ
ールアラルキル、ナフトールアラルキル、ジシクロペン
タジエンとフェノールの共重合体等のフェノール系硬化
剤や、アミン系硬化剤や、酸無水物等が挙げられる。上
記硬化剤は、単独で用いても、2種類以上を併用しても
よい。なお、硬化剤の配合量としては、エポキシ樹脂に
対して、当量比で0.1〜10の範囲で一般に配合され
る。
The curing agent used in the present invention is not particularly limited as long as it reacts with an epoxy resin and cures. For example, a phenol novolak resin, a cresol novolak resin, a mono- or dihydroxynaphthalene novolak resin, Phenolic curing agents such as resin derivatives, phenol aralkyl, naphthol aralkyl, and copolymers of dicyclopentadiene and phenol, amine curing agents, and acid anhydrides. The above curing agents may be used alone or in combination of two or more. In addition, as for the compounding quantity of a hardening | curing agent, it is mix | blended generally in the range of 0.1-10 in equivalent ratio with respect to an epoxy resin.

【0016】本発明で用いる無機充填材としては特に限
定するものではなく、例えば結晶シリカ、溶融シリカ、
アルミナ、マグネシア、チタニア、炭酸カルシウム、炭
酸マグネシウム、窒化ケイ素、タルク、ケイ酸カルシウ
ム等が挙げられる。上記無機充填材は、単独で用いて
も、2種類以上を併用してもよい。なお、無機充填材と
して結晶シリカ又は溶融シリカ等のシリカを用いた場
合、得られる封止品の線膨張係数が小さくなり好まし
い。なお、無機充填材の配合量としては、特に限定する
ものではないが、封止樹脂100重量部中に、60〜9
5重量部含有すると好ましい。60重量部未満の場合、
得られる封止品の吸湿量が増加し、吸湿耐熱性が低下す
る場合があり、95重量部を越える場合、封止樹脂の粘
度が高くなり、封止する際の成形性が低下する場合があ
る。
The inorganic filler used in the present invention is not particularly limited. Examples thereof include crystalline silica, fused silica,
Examples include alumina, magnesia, titania, calcium carbonate, magnesium carbonate, silicon nitride, talc, calcium silicate, and the like. The inorganic filler may be used alone or in combination of two or more. In addition, when silica, such as crystalline silica or fused silica, is used as the inorganic filler, the coefficient of linear expansion of the obtained sealed product is preferably small. The amount of the inorganic filler is not particularly limited, but may be 60 to 9 parts by weight in 100 parts by weight of the sealing resin.
It is preferable to contain 5 parts by weight. If less than 60 parts by weight,
The amount of moisture absorption of the obtained sealed product may increase, and the moisture absorption heat resistance may decrease. If it exceeds 95 parts by weight, the viscosity of the sealing resin increases, and the moldability during sealing may decrease. is there.

【0017】本発明の封止樹脂には、必要に応じて、硬
化促進剤、離型剤、難燃剤、着色剤、低応力化剤、イオ
ントラップ剤及びカップリング剤等を含有することもで
きる。硬化促進剤としては例えば、1,8−ジアザ−ビ
シクロ(5,4,0)ウンデセン−7、トリエチレンジ
アミン、ベンジルジメチルアミン等の三級アミン化合
物、2−メチルイミダゾール、2−エチル−4−メチル
イミダゾール、2−フェニルイミダゾール、2−フェニ
ル−4−メチルイミダゾール等のイミダゾール化合物、
トリフェニルホスフィン、トリブチルホスフィン等の有
機ホスフィン化合物等が挙げられる。
The sealing resin of the present invention may contain a curing accelerator, a release agent, a flame retardant, a coloring agent, a stress reducing agent, an ion trapping agent, a coupling agent, and the like, if necessary. . Examples of the curing accelerator include tertiary amine compounds such as 1,8-diaza-bicyclo (5,4,0) undecene-7, triethylenediamine, benzyldimethylamine, 2-methylimidazole, and 2-ethyl-4-methyl. Imidazole compounds such as imidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole,
Organic phosphine compounds such as triphenylphosphine and tributylphosphine are exemplified.

【0018】離型剤としては例えば、ステアリン酸、モ
ンタン酸、パルミチン酸、オレイン酸、リノール酸等の
脂肪酸、その脂肪酸のカルシウム塩、マグネシウム塩、
アルミニウム塩、亜鉛塩等の塩、その脂肪酸のアミド、
リン酸エステル、ポリエチレン、ビスアマイド、カルボ
キシル基含有ポリオレフィン及び天然カルナバ等が挙げ
られる。難燃剤としては例えば、三酸化アンチモン、ハ
ロゲン化合物、リン化合物等が挙げられる。着色剤とし
ては例えば、カーボンブラック、酸化チタン等が挙げら
れる。低応力化剤としては例えば、シリコーンゲル、シ
リコーンゴム、シリコーンオイル等が挙げられる。これ
らの硬化促進剤等は、2種類以上を併用することもでき
る。
Examples of the release agent include fatty acids such as stearic acid, montanic acid, palmitic acid, oleic acid and linoleic acid, and calcium and magnesium salts of the fatty acids.
Aluminum salts, salts such as zinc salts, amides of their fatty acids,
Examples include phosphate esters, polyethylene, bisamides, carboxyl group-containing polyolefins, and natural carnauba. Examples of the flame retardant include antimony trioxide, halogen compounds, phosphorus compounds and the like. Examples of the coloring agent include carbon black and titanium oxide. Examples of the low stress agent include silicone gel, silicone rubber, silicone oil and the like. Two or more of these curing accelerators can be used in combination.

【0019】本発明の封止樹脂は、均一に混合され、混
練された後、粉粒状に形成されていることが好ましい。
その方法としては例えば、エポキシ樹脂、硬化剤、無機
充填材及びイオン系界面活性剤等を配合した後、ミキサ
ー、ブレンダー等で均一に混合し、次いでロール、ニー
ダー等を用いて加熱しながら混練し、その混練物をシー
ト状に伸ばして冷却した後、粉砕する方法や、上記混練
物を線状に押し出して冷却しながら切断して形成する方
法等が挙げられる。
It is preferable that the sealing resin of the present invention is uniformly mixed, kneaded, and formed into a powder.
As the method, for example, after blending an epoxy resin, a curing agent, an inorganic filler, an ionic surfactant, and the like, uniformly mix with a mixer, a blender, and the like, and then knead while heating using a roll, a kneader, or the like. A method in which the kneaded material is stretched into a sheet and cooled, and then pulverized, or a method in which the kneaded material is extruded into a linear shape and cut while cooling to form the mixture.

【0020】なお、配合するイオン系界面活性剤のう
ち、一部又は全部を、上記混練時には配合せずに混練し
た後、同様に粉粒体を形成し、次いでイオン系界面活性
剤を添加してミキサー、ブレンダー等で混合することに
より、粉粒体の表面にイオン系界面活性剤の層を形成す
るようにすると、混練時にイオン系界面活性剤を全部配
合して混練する場合と比較して、少ない量のイオン系界
面活性剤で、帯電を防止することが可能になるため、得
られる封止品の信頼性が特に優れ好ましい。
It is to be noted that, after kneading a part or all of the ionic surfactant to be compounded without mixing during the above-mentioned kneading, a powder is similarly formed, and then the ionic surfactant is added. Mixing with a mixer, blender, etc., to form a layer of the ionic surfactant on the surface of the powdery granules, compared to the case of mixing and kneading all the ionic surfactants during kneading Since it is possible to prevent charging with a small amount of an ionic surfactant, the reliability of the obtained sealed product is particularly excellent and preferable.

【0021】そして、上記で得られた封止樹脂を用いて
トランスファー成形等を行い、リードフレームに搭載さ
れた半導体チップや、有機系基板に搭載された半導体チ
ップや、半導体チップ単独のもの等を封止すると、表面
や内部に未充填部が形成されにくい半導体装置(本発明
の請求項3に係る半導体装置)が得られる。これは、用
いる封止樹脂が、帯電量の少ない封止樹脂のため、配管
等に付着して所定の量供給されにくくなることが発生し
にくくなっており、キャビティーに確実に充填されるた
め、表面や内部に未充填部が形成されにくくなる。
Then, transfer molding or the like is performed using the sealing resin obtained as described above, and a semiconductor chip mounted on a lead frame, a semiconductor chip mounted on an organic substrate, or a semiconductor chip alone is used. By sealing, a semiconductor device (a semiconductor device according to claim 3 of the present invention) in which an unfilled portion is unlikely to be formed on the surface or inside is obtained. This is because the sealing resin to be used is a sealing resin having a small charge amount, so that it is difficult for the sealing resin to adhere to a pipe or the like and become difficult to be supplied in a predetermined amount, and to be surely filled in the cavity. It is difficult to form an unfilled portion on the surface or inside.

【0022】なお、帯電しにくい封止樹脂を用いて製造
しているため、得られる半導体装置も帯電量は少なくな
り、使用するとき等に半導体装置に付着するバリ、ほこ
り、金属粉等の量が減少する。そのため、信頼性の優れ
た半導体装置になるという効果も得られる。なお、成形
する方法としては上記封止樹脂を用いること以外は特に
限定するものではなく、一般の方法で成形が可能であ
る。
Since the semiconductor device is manufactured using a sealing resin which is difficult to be charged, the obtained semiconductor device also has a small charge amount, and the amount of burrs, dust, metal powder and the like adhered to the semiconductor device when used. Decrease. Therefore, an effect that the semiconductor device has excellent reliability can be obtained. The molding method is not particularly limited except that the sealing resin is used, and molding can be performed by a general method.

【0023】[0023]

【実施例】(実施例1〜6、比較例1)封止樹脂の原料
として、下記のエポキシ樹脂2種類、硬化剤、硬化促進
剤、離型剤、難燃剤、無機充填材及びイオン系界面活性
剤3種類を用いた。 ・エポキシ樹脂1:オルソクレゾールノボラック型エポ
キシ樹脂[住友化学(株)製、商品名ESCN195X
L]と、 ・エポキシ樹脂2:ブロム化エポキシ樹脂[住友化学
(株)製、商品名ESB400]と、 ・硬化剤:フェノールノボラック樹脂[群栄化学(株)
製、商品名PSM6200OH]と、 ・硬化促進剤:トリフェニルホスフィン[北興化学工業
(株)製]と、 ・離型剤:天然カルナバワックスと、 ・難燃剤:三酸化アンチモンと、 ・無機充填剤:溶融シリカ[龍森社製、商品名3K]
と、 ・イオン系界面活性剤1:カチオン系[花王社製、商品
名エレクトロストリッパーQN]と、 ・イオン系界面活性剤2:アニオン系[日本油脂社製、
商品名エレガンA−2000SG]と、 ・イオン系界面活性剤3:両性系[花王社製、商品名エ
レクトロストリッパーAC]。
Examples (Examples 1 to 6, Comparative Example 1) The following two types of epoxy resins, curing agents, curing accelerators, release agents, flame retardants, inorganic fillers, and ionic interfaces were used as raw materials for the sealing resin. Three activators were used. -Epoxy resin 1: ortho-cresol novolak type epoxy resin [manufactured by Sumitomo Chemical Co., Ltd., trade name ESCN195X]
L], ・ Epoxy resin 2: brominated epoxy resin [manufactured by Sumitomo Chemical Co., Ltd., trade name ESB400]; ・ Curing agent: phenol novolak resin [Gunei Chemical Co., Ltd.]
・ Accelerator: Triphenylphosphine [manufactured by Hokko Chemical Industry Co., Ltd.] ・ Release agent: Natural carnauba wax ・ Flame retardant: Antimony trioxide ・ Inorganic filler : Fused silica [Tatsumori, 3K]
・ Ionic surfactant 1: Cationic [Electron stripper QN manufactured by Kao Corporation] ・ Ionic surfactant 2: Anionic [Nippon Oil & Fat Co., Ltd.
Elegan A-2000SG (trade name); Ionic surfactant 3: amphoteric surfactant (trade name: Electrostripper AC, manufactured by Kao Corporation).

【0024】そして、実施例1〜3及び比較例1は、上
記の各原料を表1に示す重量比で配合してブレンダーで
30分混合した後、温度85℃に加熱したニーダーを用
いて、混練溶融させて押し出し、冷却した後、粉砕機で
所定の粒度に粉砕して、粉粒状の封止樹脂を得た。ま
た、実施例4〜6は、上記の各原料のうち、イオン系界
面活性剤を除く原料を、表1に示す重量比で配合してブ
レンダーで30分混合した後、温度85℃に加熱したニ
ーダーを用いて、混練溶融させて押し出し、冷却した
後、粉砕機で所定の粒度に粉砕して、粉粒体を形成し、
次いでこの粉粒体をヘンシェルミキサーに投入した後、
イオン系界面活性剤を表1に示す重量比で添加して混合
することにより、粉粒体の表面にイオン系界面活性剤の
層を形成した粉粒状の封止樹脂を得た。
In Examples 1 to 3 and Comparative Example 1, each of the above-mentioned raw materials was blended at a weight ratio shown in Table 1, mixed with a blender for 30 minutes, and then heated using a kneader heated to 85 ° C. After kneading, melting, extruding, and cooling, the mixture was pulverized to a predetermined particle size by a pulverizer to obtain a granular sealing resin. In Examples 4 to 6, among the above-mentioned raw materials, the raw materials except for the ionic surfactant were blended at a weight ratio shown in Table 1, mixed in a blender for 30 minutes, and then heated to a temperature of 85 ° C. Using a kneader, knead and melted and extruded, after cooling, pulverized to a predetermined particle size with a pulverizer to form powder and granules,
Next, after putting this powder into a Henschel mixer,
By adding and mixing the ionic surfactant at the weight ratio shown in Table 1, a powdery and granular sealing resin having a layer of the ionic surfactant formed on the surface of the granular material was obtained.

【0025】[0025]

【表1】 [Table 1]

【0026】(評価、結果)各実施例及び比較例1で得
られた封止樹脂の帯電性と、各実施例及び比較例1で得
られた封止樹脂を用いて作製した評価用サンプルの耐湿
信頼性を測定した。
(Evaluation and Results) The chargeability of the sealing resin obtained in each of the examples and comparative examples 1 and the evaluation samples prepared using the sealing resin obtained in each of the examples and comparative example 1 were evaluated. The humidity resistance reliability was measured.

【0027】帯電性は、得られた封止樹脂をナイロンチ
ューブ(12φ,3m)のホースを用いて1.5kgf/cm
2のエアー圧にて空輸した後、静電気測定器(回転セク
ター型電位計、商品名スタチロンM)にて評価した。
The chargeability of the obtained sealing resin was 1.5 kgf / cm using a nylon tube (12 φ, 3 m) hose.
After air transportation at an air pressure of 2 , evaluation was performed using a static electricity meter (rotating sector type electrometer, product name: Statilon M).

【0028】耐湿信頼性は、幅10μm厚み1μmのア
ルミニウム配線を形成したテスト素子を搭載した42ア
ロイリードフレームを間に挟んで、16DIP型評価用
サンプルを、トランスファー成形機を用いて、温度17
5℃、加圧時間90秒の条件で成形した後、175℃で
6時間、後硬化して、評価用サンプルを作製した。次い
で、評価用サンプル10個に対して2気圧/121℃の
条件のPCT処理を行い、1000時間後のアルミニウ
ム配線の断線不良発生数を求めた。
The moisture resistance reliability was measured using a transfer molding machine at a temperature of 17 ° C. using a transfer molding machine with a 42 alloy lead frame on which a test element on which an aluminum wiring having a width of 10 μm and a thickness of 1 μm was formed was interposed.
After molding under the conditions of 5 ° C. and a pressurization time of 90 seconds, post-curing was performed at 175 ° C. for 6 hours to prepare a sample for evaluation. Next, PCT treatment was performed on 10 evaluation samples under the condition of 2 atm / 121 ° C., and the number of disconnection failures of the aluminum wiring after 1000 hours was determined.

【0029】その結果は、表1に示したように、各実施
例は、比較例1と比べて帯電しにくいことが確認され
た。また、各実施例は、界面活性剤を含有しない比較例
1と耐湿信頼性は同等であり、耐湿信頼性が優れている
ことが確認された。また、イオン系界面活性剤を封止樹
脂100重量部に対し、0.01〜1重量部含有する実
施例1〜4及び実施例6は、実施例5と比べて耐湿信頼
性が特に優れていることが確認された。
As a result, as shown in Table 1, it was confirmed that each example was less likely to be charged as compared with Comparative Example 1. Further, in each example, the moisture resistance reliability was equivalent to that of Comparative Example 1 containing no surfactant, and it was confirmed that the moisture resistance reliability was excellent. Examples 1 to 4 and Example 6, which contain 0.01 to 1 part by weight of the ionic surfactant with respect to 100 parts by weight of the sealing resin, have particularly excellent moisture resistance reliability as compared with Example 5. It was confirmed that.

【0030】[0030]

【発明の効果】本発明に係る封止樹脂(封止材用エポキ
シ樹脂組成物)は、イオン系界面活性剤を含有するた
め、帯電しにくく、かつ、信頼性が優れた封止樹脂とな
る。
The sealing resin (epoxy resin composition for a sealing material) according to the present invention contains an ionic surfactant, so that it is difficult to be charged and has excellent reliability. .

【0031】本発明の請求項2に係る封止用エポキシ樹
脂組成物は、少ない量のイオン系界面活性剤で、帯電を
防止することが可能になる。
The epoxy resin composition for sealing according to the second aspect of the present invention can prevent charging with a small amount of an ionic surfactant.

【0032】本発明の請求項3に係る半導体装置は、イ
オン系界面活性剤を含有する封止樹脂を用いて製造して
いるため、表面や内部に未充填部が形成されにくい半導
体装置となる。
Since the semiconductor device according to the third aspect of the present invention is manufactured using a sealing resin containing an ionic surfactant, the semiconductor device is unlikely to have an unfilled portion on the surface or inside. .

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J002 CC03X CC05X CD01W CD02W CD03W CD05W CD06W CD11W CD13W DE076 DE136 DE146 DE236 DJ006 DJ016 DJ046 EF007 EG007 EH007 EN007 EN117 EN137 EU047 EU117 EV257 EW047 FD016 FD14X FD317 GJ02 GQ05 HA09 4M109 AA01 BA01 CA21 EA02 EB02 EB04 EB06 EB07 EB08 EB09 EB12 EB19 EC01 EC07  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4J002 CC03X CC05X CD01W CD02W CD03W CD05W CD06W CD11W CD13W DE076 DE136 DE146 DE236 DJ006 DJ016 DJ046 EF007 EG007 EH007 EN007 EN117 EN137 EU047 EU117 EV257 EW047 FD016 FD14X FD317 HA01A02A 05A EB02 EB04 EB06 EB07 EB08 EB09 EB12 EB19 EC01 EC07

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂、硬化剤、無機充填材及び
イオン系界面活性剤を含有することを特徴とする粉粒状
封止用エポキシ樹脂組成物。
1. A powdery and granular sealing epoxy resin composition comprising an epoxy resin, a curing agent, an inorganic filler and an ionic surfactant.
【請求項2】 イオン系界面活性剤の層が、エポキシ樹
脂、硬化剤及び無機充填材を含有する粉粒体の表面に形
成されていることを特徴とする封止用エポキシ樹脂組成
物。
2. An epoxy resin composition for sealing, characterized in that a layer of an ionic surfactant is formed on the surface of a granular material containing an epoxy resin, a curing agent and an inorganic filler.
【請求項3】 請求項1又は請求項2記載の封止用エポ
キシ樹脂組成物を用いて、半導体チップを封止してなる
半導体装置。
3. A semiconductor device in which a semiconductor chip is sealed using the epoxy resin composition for sealing according to claim 1.
JP10268442A 1998-09-22 1998-09-22 Sealing epoxy resin composition and semiconductor device Pending JP2000095923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10268442A JP2000095923A (en) 1998-09-22 1998-09-22 Sealing epoxy resin composition and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10268442A JP2000095923A (en) 1998-09-22 1998-09-22 Sealing epoxy resin composition and semiconductor device

Publications (1)

Publication Number Publication Date
JP2000095923A true JP2000095923A (en) 2000-04-04

Family

ID=17458569

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10268442A Pending JP2000095923A (en) 1998-09-22 1998-09-22 Sealing epoxy resin composition and semiconductor device

Country Status (1)

Country Link
JP (1) JP2000095923A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113563836A (en) * 2021-08-09 2021-10-29 深圳先进电子材料国际创新研究院 Epoxy resin composition, underfill and preparation method and application thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11310710A (en) * 1997-03-27 1999-11-09 Sumitomo Bakelite Co Ltd Thermosetting resin composition and semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11310710A (en) * 1997-03-27 1999-11-09 Sumitomo Bakelite Co Ltd Thermosetting resin composition and semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113563836A (en) * 2021-08-09 2021-10-29 深圳先进电子材料国际创新研究院 Epoxy resin composition, underfill and preparation method and application thereof

Similar Documents

Publication Publication Date Title
JP2000095923A (en) Sealing epoxy resin composition and semiconductor device
KR20130064000A (en) Epoxy resin composition for electronic parts encapsulation and electronic parts-equipped device using the same
JP2622110B2 (en) Semiconductor device
JP2000103938A (en) Epoxy resin composition for sealing and semiconductor device
JPH10182940A (en) Epoxy resin composition for sealing material and semiconductor device produced by using the composition
JP3132403B2 (en) Manufacturing method of granular semiconductor sealing material
JP3591377B2 (en) Epoxy resin composition and semiconductor device
JP2000129139A (en) Production of granular semiconductor sealing material and granular semiconductor sealing material
JP3109399B2 (en) Epoxy resin composition for TAB sealing and TAB device
JP2002309067A (en) Epoxy resin composition for sealing and semiconductor device
JP2002201288A (en) Process for preparing semiconductor-sealing epoxy resin composition
JPH1140587A (en) Resin tablet for semiconductor sealing semiconductor device and manufacture of resin tablet for semiconductor sealing
JP2001189407A (en) Manufacturing method for surface-treated inorganic filler, epoxy resin composition for sealing semiconductor, and semiconductor device
JP2018203839A (en) Epoxy resin composition for encapsulation, manufacturing method of epoxy resin composition for encapsulation, and manufacturing method of semiconductor device
JP4289314B2 (en) Epoxy resin composition and semiconductor device.
JP3134782B2 (en) Granular semiconductor sealing material, method for manufacturing the same, and semiconductor device using the material
KR100414202B1 (en) Epoxy resin composition for encapsulating semiconductor device
JP3132404B2 (en) Manufacturing method of granular semiconductor sealing material
JP2003277475A (en) Epoxy resin composition for sealing semiconductor and semiconductor device
JP2005051030A (en) Sealing material and semiconductor device
JPH10182947A (en) Epoxy resin composition for sealing and semiconductor device using the same
JPH1135799A (en) Tablet of resin for sealing semiconductor, semiconductor device and production of tablet of resin for sealing semiconductor
JP2000159978A (en) Epoxy resin composition for sealing semiconductor and semiconductor device using the same
JPH10287795A (en) Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith
JP2001039709A (en) Silica powder and resin composition

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20051130

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20051206

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060328