JP2000094341A - Diamond offset grinding wheel - Google Patents

Diamond offset grinding wheel

Info

Publication number
JP2000094341A
JP2000094341A JP10268217A JP26821798A JP2000094341A JP 2000094341 A JP2000094341 A JP 2000094341A JP 10268217 A JP10268217 A JP 10268217A JP 26821798 A JP26821798 A JP 26821798A JP 2000094341 A JP2000094341 A JP 2000094341A
Authority
JP
Japan
Prior art keywords
abrasive
layer
substrate
intermediate layer
grinding wheel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10268217A
Other languages
Japanese (ja)
Inventor
Naoki Toge
直樹 峠
Shinko Ueno
真弘 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Noritake Co Ltd
Noritake Diamond Industries Co Ltd
Original Assignee
Noritake Co Ltd
Noritake Diamond Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Noritake Co Ltd, Noritake Diamond Industries Co Ltd filed Critical Noritake Co Ltd
Priority to JP10268217A priority Critical patent/JP2000094341A/en
Publication of JP2000094341A publication Critical patent/JP2000094341A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To suppress the exposure of a substrate on an outer peripheral side caused by the wear of the outer peripheral side of an abrasive material layer and maintain the sharpness by forming an intermediate layer having less content of abrasive grain and filler than the abrasive material layer between a side face of the substrate and the abrasive material layer. SOLUTION: This offset grinding wheel is constituted in such a way that an abrasive material layer 12 and an intermediate layer 13 are attached to a side face 11a of an offset type substrate 11 by a simultaneous molding method with substrate material powder. Both of the abrasive material layer 12 and the intermediate layer 13 are composed of diamond abrasive grains and GC, a chromium oxide (filler), and a phenol resin (binder). The intermediate layer 13 has less content of diamond abrasive grains and GC abrasive grains when compared with that of the abrasive material layer 12, its total content is 40 to 70%, and the content of the phenol resin is increased. Moreover, a thickness of the intermediate layer 13 is 1 to 2 mm, and a boundary face between the intermediate layer 13 and the abrasive material layer 12 is inclined by 2 to 20 degrees from the inside of a substrate toward the outside thereof in the direction in which the abrasive material layer becomes thick. It is possible to prolong the service life of the grinding wheel by providing the intermediate layer 13.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は石材、ガラスなどの
高脆性材料の表面加工に用いるダイヤモンドオフセット
研削砥石に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a diamond offset grinding wheel used for processing a surface of a highly brittle material such as stone or glass.

【0002】[0002]

【従来の技術】従来から石材、ガラスなどの高脆性材料
の表面加工用にオフセット型砥石が用いられている。オ
フセット型砥石の基本的な構造は、中央部にオフセット
部を備えた基板の側面に砥材層を形成したものである。
砥材層は、ダイヤモンドやCBN(立方晶窒化ホウ素)
などの超砥粒、炭化珪素質系砥粒(GC,C)やアルミ
ナ質系砥粒(A,WA)などの一般砥粒と、Cu粉末、
グラファイト粉末などの充填材およびフェノール樹脂な
どの結合剤からなるものが代表的なものである。
2. Description of the Related Art Conventionally, offset type grindstones have been used for surface processing of highly brittle materials such as stone and glass. The basic structure of the offset-type grindstone is such that an abrasive layer is formed on a side surface of a substrate having an offset portion in the center.
The abrasive layer is diamond or CBN (cubic boron nitride)
General abrasive grains such as super-abrasive grains such as silicon carbide-based abrasive grains (GC, C) and alumina-based abrasive grains (A, WA);
A typical one is composed of a filler such as graphite powder and a binder such as phenol resin.

【0003】オフセット型砥石は、一般的にディスクグ
ラインダーに装着して乾式状態で使用される。このオフ
セット型砥石の使用上の問題の一つとして、砥材層の偏
磨耗の問題とこれに伴う切れ味低下の問題がある。
[0003] The offset type grindstone is generally mounted on a disk grinder and used in a dry state. One of the problems in using the offset type grinding stone is the problem of uneven wear of the abrasive layer and the problem of reduced sharpness.

【0004】オフセット型砥石を手持ちのディスクグラ
インダーに装着して使用する場合、切削抵抗および電動
モータ出力の制約などから、砥石軸を傾斜させて切削す
る、いわゆるチルト加工法がとられることが多い。ま
た、曲面の加工や角部の面取り加工に用いられることが
多い。これらのチルト加工や曲面加工、面取り加工にお
いては、砥材層の外周側が内周側に比べて早く磨耗す
る。このため、内周側にはまだ砥材層が残っていなが
ら、外周側の磨耗のために砥材層がなくなり、基板が露
出して切れ味の大幅な低下による焼けが発生し、また、
砥石の寿命が短くなるという問題がある。
When an offset-type grindstone is mounted on a hand-held disc grinder and used, a so-called tilting method, in which cutting is performed by inclining a grindstone axis, is often used due to restrictions on cutting resistance and electric motor output. In addition, it is often used for processing a curved surface or chamfering a corner. In the tilting, the curved surface processing, and the chamfering, the outer peripheral side of the abrasive layer wears faster than the inner peripheral side. For this reason, while the abrasive layer still remains on the inner peripheral side, the abrasive layer disappears due to wear on the outer peripheral side, and the substrate is exposed, causing burns due to a sharp decrease in sharpness,
There is a problem that the life of the grinding wheel is shortened.

【0005】この問題に対する改良砥石として、実開昭
60−183159号公報には、基板としてレジノイド
砥石を用いたオフセット型砥石が記載されている。この
砥石によれば、レジノイド砥石部がスポンジ砥石部とと
もに磨耗するので、スポンジ砥石部をその内周部まで有
効に使用することができるとされている。
As an improved grindstone for solving this problem, Japanese Utility Model Application Laid-Open No. 60-183159 discloses an offset grindstone using a resinoid grindstone as a substrate. According to this grindstone, the resinoid grindstone portion is worn together with the sponge grindstone portion, so that the sponge grindstone portion can be effectively used up to its inner peripheral portion.

【0006】また、特公平5−2469号公報には、外
周側の砥材層の下面でかつ基板の外周部との間に補助砥
石を設けたオフセット型砥石が記載されている。この砥
石によれば、外周側の砥材層が磨耗してなくなった後で
も、補助砥石が磨耗しつくすまで砥石を使用することが
でき、砥石の寿命を伸ばすことができるとされている。
Further, Japanese Patent Publication No. 5-2469 discloses an offset type grinding wheel in which an auxiliary grinding wheel is provided between the lower surface of the abrasive layer on the outer peripheral side and the outer peripheral portion of the substrate. According to this whetstone, it is said that the whetstone can be used until the auxiliary whetstone is completely worn, even after the outer peripheral abrasive material layer is worn away, thereby extending the life of the whetstone.

【0007】また、特開平2−250775号公報に
は、砥材層の外周側の厚さを内周側より厚くし、基板の
外周側の厚さを内周側より薄くしたオフセット型砥石が
記載されている。この砥石によれば、砥石を被加工物の
加工面に対して傾斜をもって押し当てたとき、内周側か
ら外周側にかけてほぼ同じ曲率半径で湾曲し、被加工物
への当たり面が広くなり、砥材層の磨耗が少ない状態で
効率よく研削することができるとされている。
Japanese Patent Application Laid-Open No. 2-250775 discloses an offset type grinding wheel in which the thickness of the outer peripheral side of the abrasive layer is made larger than that of the inner peripheral side, and the thickness of the outer peripheral side of the substrate is made thinner than the inner peripheral side. Has been described. According to this whetstone, when the whetstone is pressed against the processing surface of the workpiece with an inclination, the whetstone is curved with almost the same radius of curvature from the inner peripheral side to the outer peripheral side, and the contact surface with the workpiece is widened, It is said that grinding can be performed efficiently with little wear of the abrasive layer.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、前記実
開昭60−183159号公報に記載のオフセット型砥
石においては、基板そのものがレジノイド砥石であるの
で、基板としての強度に問題があり、また、基板である
レジノイド砥石の研磨力をスポンジ砥石と同等になるよ
うに設定しているので、結果的にはスポンジ砥石を厚く
したのと変わらないことになる。
However, the offset type grindstone disclosed in Japanese Utility Model Laid-Open No. 60-183159 has a problem in strength as a substrate because the substrate itself is a resinoid grindstone. Since the polishing power of the resinoid grindstone is set to be equal to that of the sponge grindstone, the result is the same as the case where the sponge grindstone is thickened.

【0009】また、前記特公平5−2469号公報に記
載のオフセット型砥石に用いられている機械的強度に優
れた補助砥石は、砥材層と同様に成形収縮が小さく、基
板との収縮率の差によって大きく反ってしまう。このた
め、加工に際して砥石振れや振動が大きくなり、加工効
率が低下するという問題が発生する。
Further, the auxiliary grinding wheel having excellent mechanical strength used for the offset type grinding wheel described in Japanese Patent Publication No. 5-2469 has a small molding shrinkage like the abrasive layer, and a shrinkage ratio with the substrate. It is greatly warped by the difference. For this reason, there occurs a problem that the wobble and vibration of the grinding wheel increase during processing, and the processing efficiency decreases.

【0010】また、前記特開平2−250775号公報
に記載のオフセット型砥石は、チルト加工時において被
加工物への当たり面が広くなることによる砥材層の局部
的な磨耗の軽減効果はあるといえるが、砥材層の外周側
の厚さを内周側より厚くし、基板の外周側の厚さを内周
側より薄くして加圧成形すると、砥材層と基板との収縮
率の差によって大きく反ってしまう。このため、加工に
際して砥石振れや振動が大きくなり、加工効率が低下す
るという問題が発生する。
The offset-type grindstone disclosed in Japanese Patent Application Laid-Open No. 2-250775 has an effect of reducing local wear of the abrasive material layer due to a wider contact surface with a workpiece during tilting. However, if the thickness of the outer peripheral side of the abrasive layer is made thicker than the inner peripheral side, and the thickness of the outer peripheral side of the substrate is made thinner than the inner peripheral side, and pressure molding is performed, the shrinkage ratio between the abrasive layer and the substrate It is greatly warped by the difference. For this reason, there occurs a problem that the wobble and vibration of the grinding wheel increase during processing, and the processing efficiency decreases.

【0011】本発明が解決すべき課題は、オフセット研
削砥石において砥材層の外周側の磨耗によって生じる外
周側の基板露出を抑制し、切れ味を維持させて砥石や被
加工材の焼けを防止すること、および成形時の砥材層の
反りを防ぎ、加工時の砥石振れや振動の低減をはかるこ
とにある。
The problem to be solved by the present invention is to suppress exposure of the substrate on the outer peripheral side caused by abrasion of the outer peripheral side of the abrasive layer in the offset grinding wheel, maintain sharpness, and prevent burning of the grindstone and the workpiece. Another object of the present invention is to prevent warpage of the abrasive layer during molding and to reduce wobble and vibration during grinding.

【0012】[0012]

【課題を解決するための手段】本発明は、オフセット型
基板の側面に砥材層を形成したオフセット研削砥石にお
いて、前記基板の側面と前記砥材層との間に、前記砥材
層よりも砥粒と充填材の含有量の少ない中間層を形成し
たことを特徴とする。
According to the present invention, there is provided an offset grinding wheel having an abrasive layer formed on a side surface of an offset type substrate, wherein the abrasive layer is disposed between the side surface of the substrate and the abrasive layer. An intermediate layer having a small content of abrasive grains and filler is formed.

【0013】基板の側面と砥材層との間に中間層を形成
することにより、チルト加工や曲面加工、面取り加工を
繰り返して砥材層の外周側が内周側よりも早く磨耗して
外周部の砥材層がなくなっても、中間層が出現するため
に切れ味を維持することができる。このため、切れ味低
下に伴う被加工材と砥石の焼けは発生せず、かつ寿命の
低下もなくなる。また、中間層によって砥材層と基板の
収縮率の差を緩和できるため、砥石振れの発生を抑制す
ることができる。
By forming an intermediate layer between the side surface of the substrate and the abrasive layer, the outer periphery of the abrasive layer is worn faster than the inner periphery by repeating the tilting process, the curved surface process, and the chamfering process. Even if the abrasive material layer is not present, the sharpness can be maintained because the intermediate layer appears. Therefore, the workpiece and the grindstone are not burned due to the decrease in sharpness, and the life is not shortened. Further, since the difference in shrinkage between the abrasive layer and the substrate can be reduced by the intermediate layer, the occurrence of wobble of the grinding wheel can be suppressed.

【0014】前記中間層の砥粒と充填材の合計含有量
は、砥材層の砥粒と充填材の合計含有量の40〜70%
の範囲とするのが望ましい。中間層の砥粒と充填材の合
計含有量がこの範囲より多くても少なくても、砥材層と
基板の成形時の収縮率の差を緩和することができず、砥
石の反り防止の効果がない。すなわち、中間層の砥粒と
充填材の合計含有量が砥材層の砥粒と充填材の合計含有
量の40%より少ないと収縮が大きくなって基板の物性
と似たものとなり、70%を超えると収縮が小さくなっ
て砥材層の物性と似たものとなって、反り防止効果が小
さくなる。
The total content of the abrasive and the filler in the intermediate layer is 40 to 70% of the total content of the abrasive and the filler in the abrasive layer.
It is desirable to be within the range. Even if the total content of the abrasive grains and the filler in the intermediate layer is more or less than this range, the difference in the shrinkage rate during the molding of the abrasive layer and the substrate cannot be reduced, and the effect of preventing the warping of the grinding wheel. There is no. That is, when the total content of the abrasive grains and the filler in the intermediate layer is less than 40% of the total content of the abrasive grains and the filler in the abrasive layer, the shrinkage becomes large and becomes similar to the physical properties of the substrate. If it exceeds, the shrinkage becomes small and becomes similar to the physical properties of the abrasive material layer, and the effect of preventing warpage is reduced.

【0015】ここで、中間層と砥材層の境界面を、基板
の内周から外周に向かって砥材層が厚くなる方向に傾斜
させることができる。この傾斜は、基板の外周側を内周
側より薄くすることによって形成することができ、傾斜
角は2〜10度の範囲が望ましい。このような傾斜を設
けることによって、砥材層の外周側が早く磨耗したとき
でも、中間層に達する時期は外周側、内周側ともほぼ同
じ時期になる。
Here, the boundary surface between the intermediate layer and the abrasive layer can be inclined in a direction in which the abrasive layer becomes thicker from the inner periphery to the outer periphery of the substrate. This inclination can be formed by making the outer peripheral side of the substrate thinner than the inner peripheral side, and the inclination angle is desirably in the range of 2 to 10 degrees. By providing such an inclination, even when the outer peripheral side of the abrasive layer is quickly worn, the timing of reaching the intermediate layer is substantially the same on both the outer peripheral side and the inner peripheral side.

【0016】中間層の厚みは、砥材層の面内の磨耗のば
らつきを考慮し、かつ砥材層と基板の収縮率の差を緩和
するのに有効な厚みとして、すくなくとも1mm以上と
するのが望ましい。厚みの上限はとくに限定する必要は
ないが、砥材層の外周側と内周側の磨耗度の差からみ
て、2mmあれば十分である。
The thickness of the intermediate layer should be at least 1 mm or more as an effective thickness for taking into account the in-plane variation of the wear of the abrasive layer and reducing the difference in shrinkage between the abrasive layer and the substrate. Is desirable. The upper limit of the thickness does not need to be particularly limited, but 2 mm is sufficient if the difference in the degree of wear between the outer peripheral side and the inner peripheral side of the abrasive material layer is sufficient.

【0017】[0017]

【発明の実施の形態】図1は本発明の実施の形態である
オフセット研削砥石の平面図、図2は図1のA−A線断
面図である。
FIG. 1 is a plan view of an offset grinding wheel according to an embodiment of the present invention, and FIG. 2 is a sectional view taken along line AA of FIG.

【0018】本実施形態のオフセット研削砥石10は、
オフセット型の基板11の側面11aに、砥材層12お
よび中間層13を基板材料粉末との同時成形法によって
取り付けたものである。砥材層12および中間層13
は、周方向に15分割する溝12aと各分割された領域
をさらに8分割する溝12bと12cとにより、多数の
領域に分割されている。
The offset grinding wheel 10 of the present embodiment comprises:
An abrasive layer 12 and an intermediate layer 13 are attached to a side surface 11a of an offset type substrate 11 by a simultaneous molding method with a substrate material powder. Abrasive layer 12 and intermediate layer 13
Is divided into a large number of regions by a groove 12a which is divided into 15 in the circumferential direction and grooves 12b and 12c which further divide each divided region into eight.

【0019】砥材層12および中間層13はいずれも、
ダイヤモンド砥粒とGC、酸化クロム(充填材)、フェ
ノール樹脂(結合剤)からなっており、その配合は表1
に示す通りである。本実施形態では、中間層13は砥材
層12に比べて、ダイヤモンド砥粒とGC砥粒の含有量
が少なく、その分フェノール樹脂の含有量が多くなって
いる。これにより、中間層13は砥材層12に比して研
削性能はやや低いが、成形時の収縮率は基板と砥材層の
中間的な値となっている。
Both the abrasive layer 12 and the intermediate layer 13
It consists of diamond abrasive, GC, chromium oxide (filler), and phenolic resin (binder).
As shown in FIG. In the present embodiment, the intermediate layer 13 has a lower content of diamond abrasive grains and GC abrasive grains than the abrasive material layer 12, and has a higher phenol resin content. As a result, the intermediate layer 13 has slightly lower grinding performance than the abrasive layer 12, but the shrinkage during molding has an intermediate value between the substrate and the abrasive layer.

【0020】[0020]

【表1】 [Table 1]

【0021】このような中間層13を有することによ
り、砥石製造時における砥材層と基板との収縮率の差を
緩和して砥石の反りの発生を抑制することができ、加工
時の砥石振れや振動を防止することができる。
By having such an intermediate layer 13, the difference in shrinkage between the abrasive material layer and the substrate during the manufacture of the grinding wheel can be alleviated, and the occurrence of warpage of the grinding wheel can be suppressed. And vibration can be prevented.

【0022】基板11は、基本的な形状は従来のオフセ
ット研削砥石の基板と同様な皿型をしているが、本実施
形態においては、基板11の側面11aを外方向に向け
て下り勾配となる傾斜面として、この上に中間層13と
砥材層12を取り付けている。なお、図中の符号11b
で示す孔はオフセット切削砥石10をディスクグライン
ダーの回転軸に取り付けるための取り付け用孔である。
各部の寸法は、基板11の外径99mm、砥材層12の
基板半径方向の幅22.5mm、砥材層12の内周側端
の厚さ3.5mm、中間層の厚さ1mmである。
The substrate 11 has a dish shape similar to that of a conventional offset grinding wheel, but in the present embodiment, the side surface 11a of the substrate 11 is directed downward in a downward slope. The intermediate layer 13 and the abrasive layer 12 are mounted on the inclined surface. Note that reference numeral 11b in FIG.
The hole indicated by is a mounting hole for mounting the offset cutting grindstone 10 to the rotating shaft of the disk grinder.
The dimensions of each part are as follows: the outer diameter of the substrate 11 is 99 mm, the width of the abrasive layer 12 in the radial direction of the substrate is 22.5 mm, the thickness of the inner peripheral end of the abrasive layer 12 is 3.5 mm, and the thickness of the intermediate layer is 1 mm. .

【0023】基板11の外周部上面の傾斜角θは、本実
施形態においては5度としている。基板11の外周部上
面に傾斜を設け、中間層13の厚さは全面1mmとする
ことにより、砥材層12の外周側は内周側よりも厚くな
り、外周側と内周側とがほぼ同じ時期に消耗し終わるよ
うになる。
The inclination angle θ of the upper surface of the outer peripheral portion of the substrate 11 is 5 degrees in this embodiment. By providing a slope on the upper surface of the outer peripheral portion of the substrate 11 and making the thickness of the intermediate layer 13 1 mm over the entire surface, the outer peripheral side of the abrasive layer 12 is thicker than the inner peripheral side, and the outer peripheral side and the inner peripheral side are almost It will be exhausted at the same time.

【0024】このように砥材層12の外周側の厚さを厚
くして外周側と内周側とがほぼ同じ時期に消耗し終わる
ようにするとともに、中間層13を設けたことにより、
チルト加工や曲面加工、面取り加工を繰り返しても、従
来のように内周側にまだ砥材層が残っていながら、外周
側の磨耗のために早期に使用不能になるということがな
くなり、砥石の寿命を長くすることができる。
As described above, the thickness of the outer peripheral side of the abrasive layer 12 is increased so that the outer peripheral side and the inner peripheral side are completely consumed at substantially the same time, and the intermediate layer 13 is provided.
Even if tilting, curved surface processing, and chamfering are repeated, the abrasive layer is still left on the inner peripheral side as before, but it will not be disabled early due to wear on the outer peripheral side. Life can be extended.

【0025】なお、上記の実施形態においては、基板1
1の側面11aの内周から外周に向けて全面に傾斜を設
けたが、傾斜面は外周側のみに設けてもよく(図3の
(a)参照)、また、砥材層12の外周端面に傾斜をつ
けて被加工物の細部を加工しやすいようにすることもで
きる(図3の(b)参照)。
In the above embodiment, the substrate 1
Although the inclined surface is provided on the entire surface from the inner periphery to the outer periphery of the first side surface 11a, the inclined surface may be provided only on the outer periphery side (see FIG. 3A). It is also possible to make it easy to machine the details of the workpiece by inclining (see FIG. 3B).

【0026】〔実験例〕本発明の効果を確認するため
に、図1に示した本実施形態の砥石(発明品)と、この
砥石と同じ形状であるが中間層のない砥石(比較品)と
を用いて、下記の加工条件で加工実験を行った。
Experimental Example In order to confirm the effect of the present invention, a grindstone of the present embodiment shown in FIG. 1 (inventive product) and a grindstone having the same shape as this grindstone but without an intermediate layer (comparative product) A processing experiment was carried out under the following processing conditions using

【0027】加工条件 ・加工機 :電動ディスクグラインダー ・回転数 :12000rpm ・被加工物:天山御影石 曲面および平面Processing conditions: Processing machine: electric disk grinder ・ Rotational speed: 12000 rpm ・ Workpiece: Tenyama granite curved surface and flat surface

【0028】実験結果を表2に示す。Table 2 shows the experimental results.

【表2】 [Table 2]

【0029】表2に示すように、発明品は比較品に比べ
て側面振れ、砥材層反りともに大幅に小さく、また砥石
寿命は約1.6倍に向上した。さらに、比較品は砥材層
がなくなったときに研削能率が大きく低下し、被加工材
と砥石に焼けが発生するのに対し、発明品は砥材層が磨
耗しても研削能率を維持し、被加工材や砥石に焼けはま
ったく発生しなかった。
As shown in Table 2, the invention product had significantly smaller lateral runout and warpage of the abrasive layer than the comparative product, and the life of the grinding wheel was improved by about 1.6 times. In addition, the grinding efficiency of the comparative product is greatly reduced when the abrasive layer disappears, and the workpiece and the grindstone are scorched, whereas the invention product maintains the grinding efficiency even when the abrasive layer is worn. No scorching occurred on the workpiece or the grindstone.

【0030】[0030]

【発明の効果】本発明によって以下の効果を奏すること
ができる。
According to the present invention, the following effects can be obtained.

【0031】(1)基板の側面と砥材層との間に、砥材
層よりも砥粒と充填材の含有量の少ない中間層を形成す
ることにより、チルト加工や曲面加工、面取り加工を繰
り返しても、従来のように内周側にまだ砥材層が残って
いながら、外周側の磨耗のために早期に使用不能になる
ということがなくなり、砥石の寿命を長くすることがで
きる。
(1) By forming an intermediate layer between the side surface of the substrate and the abrasive material layer, the content of the abrasive and the filler is smaller than that of the abrasive material layer, tilting, curved surface processing, and chamfering can be performed. Even if it is repeated, the abrasive material layer is still left on the inner peripheral side as in the related art, but it is not possible to use the abrasive material at an early stage due to wear on the outer peripheral side, and the life of the grindstone can be extended.

【0032】(2)中間層を設けることにより、砥材層
と基板の成形時の収縮率の差を緩和することができ、こ
れによって砥石の振れや反りを小さくすることができ
て、使用中の振動やこれに伴う砥材層の異常な早期磨耗
を防止することができる。
(2) By providing the intermediate layer, it is possible to reduce the difference in the shrinkage ratio between the abrasive material layer and the substrate during molding, whereby the deflection and warpage of the grinding stone can be reduced, and Vibration and abnormal early abrasion of the abrasive layer caused by the vibration can be prevented.

【0033】(3)中間層を設けることにより、砥材層
が消耗しても中間層が出現して研削能率の低下を防止で
き、切れ味の低下に伴う被加工物の焼けや砥石の焼けを
防止することができ、砥石寿命を向上させることができ
る。
(3) By providing the intermediate layer, even if the abrasive layer is worn, the intermediate layer appears and can prevent a decrease in the grinding efficiency, and can prevent the burn of the workpiece or the grindstone due to the decrease of the sharpness. Can be prevented, and the life of the grinding wheel can be improved.

【0034】(4)中間層と砥材層の境界面が基板の内
周から外周に向かって砥材層が厚くなる方向に傾斜を設
けることにより、砥材層の外周側と内周側損耗をバラン
スさせ、砥石寿命の向上を図ることができる。
(4) Abrasion of the boundary between the intermediate layer and the abrasive layer in the direction in which the abrasive layer becomes thicker from the inner periphery to the outer periphery of the substrate causes wear on the outer peripheral side and the inner peripheral side of the abrasive layer. And the life of the grinding wheel can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施形態であるオフセット研削砥石
の平面図である。
FIG. 1 is a plan view of an offset grinding wheel according to an embodiment of the present invention.

【図2】 図1のA−A線断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】 砥石形状の他の例を示す断面図である。FIG. 3 is a cross-sectional view showing another example of a grindstone shape.

【符号の説明】[Explanation of symbols]

10 オフセット研削砥石 11 基板 11a 側面 11b 取り付け用孔 12 砥材層 12a〜12c 溝 13 中間層 θ 傾斜角 DESCRIPTION OF SYMBOLS 10 Offset grinding wheel 11 Substrate 11a Side surface 11b Mounting hole 12 Abrasive material layer 12a-12c Groove 13 Intermediate layer θ Tilt angle

───────────────────────────────────────────────────── フロントページの続き (72)発明者 上野 真弘 福岡県浮羽郡田主丸町大字竹野210番地 ノリタケダイヤ株式会社内 Fターム(参考) 3C063 AA02 AB05 BA02 BA21 BA24 BA33 BB02 BB21 BC03 FF03 FF09 FF11 FF23  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Masahiro Ueno 210, Takeshi, Tanushimaru-cho, Ukiha-gun, Fukuoka Prefecture Noritake Diamond Co., Ltd. F-term (reference) 3C063 AA02 AB05 BA02 BA21 BA24 BA33 BB02 BB21 BC03 FF03 FF09 FF11 FF23

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 オフセット型基板の側面に砥材層を形成
したオフセット研削砥石において、前記基板の側面と前
記砥材層との間に、前記砥材層よりも砥粒と充填材の含
有量の少ない中間層を形成したことを特徴とするダイヤ
モンドオフセット研削砥石。
1. An offset grinding wheel having an abrasive layer formed on a side surface of an offset-type substrate, wherein the content of abrasive grains and filler between the side surface of the substrate and the abrasive layer is greater than that of the abrasive layer. A diamond offset grinding wheel characterized by forming an intermediate layer with a small number of layers.
【請求項2】 前記中間層の砥粒と充填材の合計含有量
が前記砥材層の砥粒と充填材の合計含有量の40〜70
%である請求項1記載のダイヤモンドオフセット研削砥
石。
2. The total content of the abrasive grains and the filler in the intermediate layer is 40 to 70 times the total content of the abrasive grains and the filler in the abrasive layer.
%. The diamond offset grinding wheel according to claim 1, wherein
【請求項3】 前記中間層と前記砥材層の境界面が前記
基板の内周から外周に向かって前記砥材層が厚くなる方
向に傾斜している請求項1,2記載のダイヤモンドオフ
セット研削砥石。
3. The diamond offset grinding according to claim 1, wherein a boundary surface between said intermediate layer and said abrasive layer is inclined in a direction in which said abrasive layer becomes thicker from an inner periphery to an outer periphery of said substrate. Whetstone.
【請求項4】 前記境界面の傾斜角が2〜10度である
請求項3記載のダイヤモンドオフセット研削砥石。
4. The diamond offset grinding wheel according to claim 3, wherein an inclination angle of the boundary surface is 2 to 10 degrees.
【請求項5】 前記中間層の厚みが1〜2mmである請
求項1〜4記載のダイヤモンドオフセット研削砥石。
5. The diamond offset grinding wheel according to claim 1, wherein said intermediate layer has a thickness of 1 to 2 mm.
JP10268217A 1998-09-22 1998-09-22 Diamond offset grinding wheel Pending JP2000094341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10268217A JP2000094341A (en) 1998-09-22 1998-09-22 Diamond offset grinding wheel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10268217A JP2000094341A (en) 1998-09-22 1998-09-22 Diamond offset grinding wheel

Publications (1)

Publication Number Publication Date
JP2000094341A true JP2000094341A (en) 2000-04-04

Family

ID=17455551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10268217A Pending JP2000094341A (en) 1998-09-22 1998-09-22 Diamond offset grinding wheel

Country Status (1)

Country Link
JP (1) JP2000094341A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002144244A (en) * 2000-11-13 2002-05-21 Tenryu Saw Mfg Co Ltd Hat type rotating grinding tool
WO2014208690A1 (en) 2013-06-28 2014-12-31 古河電気工業株式会社 Connection structure and semiconductor device
JP2015202542A (en) * 2014-04-15 2015-11-16 株式会社ノリタケカンパニーリミテド Grindstone for lapping
CN112873070A (en) * 2021-01-21 2021-06-01 泉州众志新材料科技有限公司 Ceramic tile chamfering abrasive disc and production method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002144244A (en) * 2000-11-13 2002-05-21 Tenryu Saw Mfg Co Ltd Hat type rotating grinding tool
WO2014208690A1 (en) 2013-06-28 2014-12-31 古河電気工業株式会社 Connection structure and semiconductor device
JP2015202542A (en) * 2014-04-15 2015-11-16 株式会社ノリタケカンパニーリミテド Grindstone for lapping
CN112873070A (en) * 2021-01-21 2021-06-01 泉州众志新材料科技有限公司 Ceramic tile chamfering abrasive disc and production method thereof
CN112873070B (en) * 2021-01-21 2022-07-05 泉州众志新材料科技有限公司 Ceramic tile chamfering abrasive disc and production method thereof

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