JP2000091400A - Wafer storage cassette - Google Patents
Wafer storage cassetteInfo
- Publication number
- JP2000091400A JP2000091400A JP25409098A JP25409098A JP2000091400A JP 2000091400 A JP2000091400 A JP 2000091400A JP 25409098 A JP25409098 A JP 25409098A JP 25409098 A JP25409098 A JP 25409098A JP 2000091400 A JP2000091400 A JP 2000091400A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- cassette
- support
- wafers
- storage cassette
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 21
- 230000005484 gravity Effects 0.000 claims abstract description 6
- 230000037431 insertion Effects 0.000 claims abstract description 5
- 238000003780 insertion Methods 0.000 claims abstract description 5
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 abstract description 80
- 238000005336 cracking Methods 0.000 abstract description 5
- 238000004140 cleaning Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、特に薄いウェーハ
を収容するのに適したウェーハ収容カセットに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer storage cassette particularly suitable for storing thin wafers.
【0002】[0002]
【従来の技術】ウェーハを収容するためのカセットA
は、従来図5に示すように側方に開口するボックス状本
体の対向側面に、複数の受け溝Bが所定の間隔をあけて
上下方向に設けられ、この受け溝BにウェーハCを挿入
し支持することにより複数枚のウェーハCを収容できる
ようにしてある。2. Description of the Related Art Cassette A for accommodating wafers
Conventionally, as shown in FIG. 5, a plurality of receiving grooves B are provided at predetermined intervals on the opposite side surface of a box-shaped main body that opens laterally, and a wafer C is inserted into the receiving grooves B. By supporting, a plurality of wafers C can be accommodated.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記従
来のカセットAによると、受け溝BによりウェーハCの
外周部の対向位置を支持する構造であるから、標準厚さ
の小径ウェーハCを収容する場合には別段問題はない
が、薄く研削加工した大径ウェーハを収容する場合には
問題が生じる。即ち、比較的薄い大径のウェーハを収容
すると、自重により中央部が大きくたわみ受け溝Bから
外れ易くなるばかりか、ウェーハ同士が接触して割れや
損傷等が発生するからである。However, since the conventional cassette A has a structure in which the receiving groove B supports the opposed position of the outer peripheral portion of the wafer C, a small-diameter wafer C having a standard thickness is accommodated. Although there is no particular problem, there is a problem when a large-diameter wafer that has been thinly ground is accommodated. That is, when a relatively thin large-diameter wafer is accommodated, not only does the center portion easily become largely disengaged from the deflection receiving groove B due to its own weight, but also the wafers come into contact with each other to cause cracking or damage.
【0004】本発明は、このような従来の問題を解決す
るためになされ、比較的薄い大径のウェーハを収容して
も中央部がたわまずに安定良く支持できると共に、ウェ
ーハ同士の接触による割れや損傷等を未然に防止できる
ようにしたウェーハ収容カセットを提供することを目的
とする。An object of the present invention is to solve such a conventional problem. Even when a relatively thin large-diameter wafer is accommodated, the center portion can be supported stably without bending, and the wafer can be supported by contact between the wafers. It is an object of the present invention to provide a wafer storage cassette capable of preventing cracking, damage, and the like.
【0005】[0005]
【課題を解決するための手段】この目的を達成するため
の具体的手段として、本発明は、ウェーハを収容するウ
ェーハ収容カセットであって、このウェーハ収容カセッ
トは、ウェーハを搬出入する開口部と、ウェーハを支持
する支持部とから構成されており、前記支持部はウェー
ハの外周部と重心とを含む面で支持するように構成され
ているウェーハ収容カセットを要旨とする。又、このウ
ェーハ収容カセットにおいて、前記支持部には、ウェー
ハを搬出入するウェーハ搬出入手段のウェーハ保持部が
挿入できる保持部挿入領域が形成されていること、前記
ウェーハは半導体ウェーハであり、比較的薄い半導体ウ
ェーハが収容されること、比較的薄いとは、300μm
以下であること、を特徴とするものである。As a specific means for attaining this object, the present invention relates to a wafer accommodating cassette for accommodating a wafer, the wafer accommodating cassette having an opening for carrying in and out the wafer. And a supporting portion for supporting the wafer, wherein the supporting portion is a wafer accommodating cassette configured to be supported on a surface including an outer peripheral portion of the wafer and a center of gravity. Further, in this wafer accommodating cassette, the support portion has a holding portion insertion area into which a wafer holding portion of a wafer carrying-in / out means for carrying in / out a wafer can be inserted, and the wafer is a semiconductor wafer. 300 μm means that an extremely thin semiconductor wafer is contained
It is characterized by the following.
【0006】[0006]
【発明の実施の形態】以下、本発明の実施の形態を添付
図面に基づいて詳説する。図1は、本発明に係るウェー
ハ収容カセットの一例を示すもので、ほぼ円盤状の上板
1及び下板2と、これらの外縁部に対向させて立設した
側板3、3と、この側板3、3の中間位置の外縁部に立
設した一対のストッパ部材4、4とで開口部5aを有す
るカセット本体5が構成され、且つこのカセット本体5
の内部にウェーハを支持する支持部5bが形成されてい
る。Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 shows an example of a wafer accommodating cassette according to the present invention, in which a substantially disk-shaped upper plate 1 and lower plate 2, side plates 3 and 3 erected to face their outer edges, and this side plate A cassette main body 5 having an opening 5a is constituted by a pair of stopper members 4 and 4 erected at an outer edge portion at an intermediate position between the cassette main body 3 and the cassette main body 5.
A supporting portion 5b for supporting a wafer is formed inside the substrate.
【0007】6は前記支持部5bを構成する支持板であ
り、ウェーハの外周部と重心とを含む面で支持する支持
領域6aと、図3に示すウェーハ搬出入手段7のウェー
ハ保持部7eの先端部を挿入し得る一対の保持部挿入領
域6bとが形成されている。Reference numeral 6 denotes a support plate constituting the support portion 5b. A support region 6a for supporting the outer peripheral portion of the wafer and a plane including the center of gravity, and a support plate 6a for the wafer holding portion 7e of the wafer loading / unloading means 7 shown in FIG. A pair of holding part insertion areas 6b into which the tip part can be inserted is formed.
【0008】この支持板6は、前記カセット本体5の開
口部5aから挿入し、図2のように側板3、3の内側面
に設けた受け溝3a、3aに両側部を受止させ、ストッ
パ部材4、4の内側面に設けた受け溝4a、4aに先端
円弧部を受止させることで取り付けることができる。こ
のような取付要領で複数枚の支持板6をカセット本体5
内に装着して前記支持部5bが構成される。The support plate 6 is inserted from the opening 5a of the cassette body 5, and both sides are received in receiving grooves 3a, 3a provided on the inner side surfaces of the side plates 3, 3, as shown in FIG. The members 4, 4 can be attached by receiving the arc portions at the distal ends in the receiving grooves 4a, 4a provided on the inner surfaces of the members 4, 4, respectively. In this manner, a plurality of support plates 6 are attached to the cassette body 5.
The support portion 5b is configured by being mounted inside the device.
【0009】本発明に係るウェーハ収容カセットは上記
のように構成され、例えば図5に示すような研削装置D
において従来のカセットAに代えて使用される。このカ
セット5の対向位置には従来のカセットA′が載置さ
れ、内部には被研削物である大径の半導体ウェーハ(研
削前であるから比較的厚手のもの)が収容されている。The wafer accommodating cassette according to the present invention is constituted as described above, and for example, a grinding apparatus D as shown in FIG.
Is used in place of the conventional cassette A. A conventional cassette A 'is placed at a position facing the cassette 5 and accommodates a large-diameter semiconductor wafer (a relatively thick one before grinding) which is an object to be ground.
【0010】カセット5とカセットA′との間には前記
ウェーハ搬出入手段7が配設されており、このウェーハ
搬出入手段7によりカセットA′内から半導体ウェーハ
Wが搬出されると共に、待機領域8まで搬送される。The wafer loading / unloading means 7 is arranged between the cassette 5 and the cassette A '. The wafer loading / unloading means 7 unloads the semiconductor wafer W from the cassette A' and sets a standby area. 8 is conveyed.
【0011】前記ウェーハ搬出入手段7は、図3のよう
に上下動する基台7aに回転軸7bが装着され、この回
転軸7bの上端部には第1のアーム7cが取り付けら
れ、この第1のアーム7cの先端部には第2のアーム7
dが旋回可能に取り付けられている。更に、第2のアー
ム7dの先端部にはウェーハ保持部7eが同じく旋回可
能に取り付けられ、このウェーハ保持部7eの先端部に
は二股に分岐したフォーク状の把持部7fが取り付けら
れると共に、吸着部7gが設けられている。この把持部
7fは、ウェーハ保持部7eの基部7hにおいて180
°反転可能に形成することもある。The wafer loading / unloading means 7 has a rotating shaft 7b mounted on a base 7a which moves up and down as shown in FIG. 3, and a first arm 7c is mounted on the upper end of the rotating shaft 7b. The second arm 7 is provided at the tip of the first arm 7c.
d is pivotably mounted. Further, a wafer holding portion 7e is similarly rotatably attached to the tip end of the second arm 7d, and a fork-like gripping portion 7f branched into two branches is attached to the tip end of the wafer holding portion 7e. A portion 7g is provided. This gripping part 7f is 180 ° at the base 7h of the wafer holding part 7e.
° It may be formed to be reversible.
【0012】半導体ウェーハWの搬出に際しては、ウェ
ーハ搬出入手段7の各アームを旋回させて把持部7fを
半導体ウェーハWの下に挿入し、吸着部7gにより半導
体ウェーハWを吸着すると共に、把持部7fをカセット
A′から外部に引き出す。When the semiconductor wafer W is carried out, each arm of the wafer carrying-in / out means 7 is turned to insert the holding portion 7f under the semiconductor wafer W, and the semiconductor wafer W is sucked by the suction portion 7g and the holding portion is held. 7f is pulled out from cassette A '.
【0013】第1の待機領域8上に搬送された半導体ウ
ェーハWは、図5のように中心位置合わせ部材8aによ
り位置決めされた後に、上下動及び旋回可能なアームを
有しその先端に吸着パッドを備えた第1の搬送手段9に
よってターンテーブル10に配設されたチャックテーブ
ル11に搬送され、このチャックテーブル11上に吸引
保持される。The semiconductor wafer W conveyed onto the first standby area 8 is positioned by a center positioning member 8a as shown in FIG. Is transported to the chuck table 11 provided on the turntable 10 by the first transporting means 9 provided with, and is suction-held on the chuck table 11.
【0014】チャックテーブル11に吸引保持された半
導体ウェーハWは、前記ターンテーブル10を回転させ
て第1の研削手段12の下に位置付けられ、下端の回転
砥石12aによって粗研削が行われる。この粗研削後
に、第2の研削手段13の下に位置付けられ、下端の回
転砥石13aにより仕上げ研削される。これらの研削時
には半導体ウェーハWの表面に研削水が供給される。The semiconductor wafer W sucked and held by the chuck table 11 is positioned below the first grinding means 12 by rotating the turntable 10, and is roughly ground by the rotating grindstone 12a at the lower end. After this rough grinding, it is positioned below the second grinding means 13 and is finish-ground by the rotating grindstone 13a at the lower end. During these grinding operations, grinding water is supplied to the surface of the semiconductor wafer W.
【0015】仕上げ研削された半導体ウェーハWは、取
り出し位置に割り出され第2の搬送手段9′によりスピ
ン洗浄・乾燥手段14に搬送される。ここで、研削時に
付着した研削水等の汚れがスピン洗浄されると共に、ス
ピン乾燥された後に前記ウェーハ搬出入手段7によりカ
セット本体5の支持部5bに搬入される。The finish-ground semiconductor wafer W is indexed to a take-out position and is conveyed to the spin cleaning / drying means 14 by the second conveying means 9 '. Here, dirt such as grinding water adhered at the time of grinding is spin-cleaned, spin-dried, and then carried into the support portion 5b of the cassette body 5 by the wafer carrying-in / out means 7.
【0016】この搬入の際に、図4のように半導体ウェ
ーハWは前記支持板6上に載置されるが、ウェーハ搬出
入手段7の把持部7fが支持板6の保持部挿入領域6b
に入り込むため、支持板6は半導体ウェーハWの外周部
と重心とを含む面で支持することができる。ウェーハ搬
出入手段7は、半導体ウェーハWを支持板6上に載置し
た後、吸着部7gの吸着を解除してカセット本体5から
引き出される。At the time of loading, the semiconductor wafer W is placed on the support plate 6 as shown in FIG. 4, but the holding portion 7f of the wafer loading / unloading means 7 is moved to the holding portion insertion area 6b of the support plate 6.
The support plate 6 can be supported by a surface including the outer peripheral portion of the semiconductor wafer W and the center of gravity. After placing the semiconductor wafer W on the support plate 6, the wafer loading / unloading means 7 releases the suction of the suction portion 7 g and is pulled out from the cassette body 5.
【0017】大径(例えば8インチ)の半導体ウェーハ
Wは、比較的薄くなるまで(300μm以下)研削され
る場合があるが、前記のように特殊な形状の支持板6に
よって安定良く支持される。従って、半導体ウェーハW
は自重により中央部が大きくたわむことはなく、側板3
の受け溝3aから外れ難く、半導体ウェーハW同士が接
触して割れや損傷等が生じることもない。A semiconductor wafer W having a large diameter (for example, 8 inches) may be ground to a relatively small thickness (300 μm or less), but is stably supported by the support plate 6 having a special shape as described above. . Therefore, the semiconductor wafer W
The central part does not bend significantly due to its own weight.
And the semiconductor wafers W do not come into contact with each other to cause cracking or damage.
【0018】尚、図示は省略したが図5で従来のカセッ
トA′の代わりに本発明に係るカセット本体5を載置
し、つまり両方ともカセット本体5を使用して実施する
ことも可能である。Although not shown, the cassette main body 5 according to the present invention can be mounted in place of the conventional cassette A 'in FIG. 5, that is, both can be implemented using the cassette main body 5. .
【0019】[0019]
【発明の効果】以上説明したように、本発明によれば、
ウェーハ収容カセットにおける支持部を、ウェーハの外
周部と重心とを含む面で支持する支持板で構成したの
で、研削装置によって薄く研削された大径の半導体ウェ
ーハであっても中央部がたわまずに安定良く支持できる
と共に、接触による割れや損傷を未然に防止する等の優
れた効果が得られる。As described above, according to the present invention,
Since the supporting portion in the wafer storage cassette is constituted by a supporting plate that supports the surface including the outer peripheral portion and the center of gravity of the wafer, the center portion does not bend even in the case of a large-diameter semiconductor wafer thinly ground by a grinding device. In addition to the above, excellent effects such as stable support and prevention of cracking and damage due to contact can be obtained.
【図1】本発明に係るウェーハ収容カセットの斜視図。FIG. 1 is a perspective view of a wafer storage cassette according to the present invention.
【図2】支持部を構成する支持板の取付状態を示す概略
断面図。FIG. 2 is a schematic cross-sectional view showing a mounting state of a support plate constituting a support portion.
【図3】ウェーハ搬出入手段を示す要部の斜視図。FIG. 3 is a perspective view of a main part showing a wafer loading / unloading unit.
【図4】ウェーハ搬出入手段のウェーハ保持部と支持板
との位置関係を示す説明図。FIG. 4 is an explanatory diagram showing a positional relationship between a wafer holding portion of a wafer carrying-in / out means and a support plate.
【図5】本発明に係るウェーハ収容カセットを研削装置
に用いる態様を示す斜視図。FIG. 5 is a perspective view showing an embodiment in which the wafer storage cassette according to the present invention is used in a grinding device.
1…上板 2…下板 3…側板 4…ストッパ部材 5…カセット本体 5a…開口部 5b…支持部 6…支持板 7…ウェーハ搬出入手段 8…待機領域 9…第1の搬送手段 10…ターンテーブル 11…チャックテーブル 12…第1の研削手段 13…第2の研削手段 14…スピン洗浄・乾燥手段 DESCRIPTION OF SYMBOLS 1 ... Upper plate 2 ... Lower plate 3 ... Side plate 4 ... Stopper member 5 ... Cassette main body 5a ... Opening 5b ... Support part 6 ... Support plate 7 ... Wafer carrying-in / out means 8 ... Stand-by area 9 ... 1st carrying means 10 ... Turntable 11 ... Chuck table 12 ... First grinding means 13 ... Second grinding means 14 ... Spin cleaning / drying means
Claims (4)
であって、 このウェーハ収容カセットは、ウェーハを搬出入する開
口部と、ウェーハを支持する支持部とから構成されてお
り、 前記支持部はウェーハの外周部と重心とを含む面で支持
するように構成されているウェーハ収容カセット。A wafer accommodating cassette for accommodating a wafer, the wafer accommodating cassette comprising an opening for carrying in / out a wafer, and a support for supporting the wafer, wherein the support is a wafer holder. A wafer storage cassette configured to be supported by a surface including an outer peripheral portion and a center of gravity.
ェーハ搬出入手段のウェーハ保持部が挿入できる保持部
挿入領域が形成されている請求項1記載のウェーハ収容
カセット。2. The wafer accommodating cassette according to claim 1, wherein the support section has a holding section insertion area into which a wafer holding section of a wafer loading / unloading means for loading / unloading a wafer can be inserted.
較的薄い半導体ウェーハが収容される請求項1又は2記
載のウェーハ収容カセット。3. The wafer storage cassette according to claim 1, wherein said wafer is a semiconductor wafer, and a relatively thin semiconductor wafer is stored therein.
求項3記載のウェーハ収容カセット。4. The wafer accommodating cassette according to claim 3, wherein the relatively thin thickness is 300 μm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25409098A JP2000091400A (en) | 1998-09-08 | 1998-09-08 | Wafer storage cassette |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25409098A JP2000091400A (en) | 1998-09-08 | 1998-09-08 | Wafer storage cassette |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000091400A true JP2000091400A (en) | 2000-03-31 |
Family
ID=17260092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25409098A Pending JP2000091400A (en) | 1998-09-08 | 1998-09-08 | Wafer storage cassette |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000091400A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6499602B2 (en) | 2000-04-17 | 2002-12-31 | Shin-Etsu Polymer Co., Ltd. | Support device for a wafer shipping container |
JP2003077988A (en) * | 2001-09-06 | 2003-03-14 | Nitto Denko Corp | Semiconductor wafer mounting method and cassette used therefor |
JP2003086667A (en) * | 2001-09-12 | 2003-03-20 | Takatori Corp | Cassette for thin wafer and suction band |
JP2003110014A (en) * | 2001-09-28 | 2003-04-11 | Disco Abrasive Syst Ltd | Wafer cassette and method for carrying in and out semiconductor wafer |
WO2004049430A1 (en) * | 2002-11-26 | 2004-06-10 | Disco Corporation | Cassette for storing multiple sheets of semiconductor wafers |
JP2005159141A (en) * | 2003-11-27 | 2005-06-16 | Ishikawajima Harima Heavy Ind Co Ltd | Substrate transfer device and substrate storage and transfer device |
KR100506930B1 (en) * | 2002-11-04 | 2005-08-09 | 삼성전자주식회사 | Wafer cassette |
US7458469B2 (en) * | 2005-08-05 | 2008-12-02 | Tokyo Electron Limited | Substrate transfer apparatus and method, and storage medium |
KR100874206B1 (en) | 2004-12-24 | 2008-12-15 | 무라타 기카이 가부시키가이샤 | Sheet taking out system and taking out device |
KR100904888B1 (en) * | 2003-08-14 | 2009-06-29 | 가부시기가이샤 디스코 | Cassette for storing a plurality of semiconductor wafers |
JP2012195507A (en) * | 2011-03-17 | 2012-10-11 | Shin Etsu Polymer Co Ltd | Substrate housing container and support jig |
KR102446066B1 (en) * | 2021-04-22 | 2022-09-23 | 주식회사 삼에스코리아 | Tray installed in the panel storage container |
-
1998
- 1998-09-08 JP JP25409098A patent/JP2000091400A/en active Pending
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6499602B2 (en) | 2000-04-17 | 2002-12-31 | Shin-Etsu Polymer Co., Ltd. | Support device for a wafer shipping container |
JP2003077988A (en) * | 2001-09-06 | 2003-03-14 | Nitto Denko Corp | Semiconductor wafer mounting method and cassette used therefor |
JP4748901B2 (en) * | 2001-09-06 | 2011-08-17 | 日東電工株式会社 | Semiconductor wafer mounting method and cassette used therefor |
JP2003086667A (en) * | 2001-09-12 | 2003-03-20 | Takatori Corp | Cassette for thin wafer and suction band |
JP4564695B2 (en) * | 2001-09-28 | 2010-10-20 | 株式会社ディスコ | Wafer cassette and semiconductor wafer loading and unloading method |
JP2003110014A (en) * | 2001-09-28 | 2003-04-11 | Disco Abrasive Syst Ltd | Wafer cassette and method for carrying in and out semiconductor wafer |
KR100506930B1 (en) * | 2002-11-04 | 2005-08-09 | 삼성전자주식회사 | Wafer cassette |
WO2004049430A1 (en) * | 2002-11-26 | 2004-06-10 | Disco Corporation | Cassette for storing multiple sheets of semiconductor wafers |
US7325692B2 (en) | 2002-11-26 | 2008-02-05 | Disco Corporation | Cassette having separation plates for storing a plurality of semiconductor wafers |
CN1316583C (en) * | 2002-11-26 | 2007-05-16 | 株式会社迪斯科 | Box for storing multiple semiconductor sheets |
KR100904888B1 (en) * | 2003-08-14 | 2009-06-29 | 가부시기가이샤 디스코 | Cassette for storing a plurality of semiconductor wafers |
JP4715088B2 (en) * | 2003-11-27 | 2011-07-06 | 株式会社Ihi | Substrate transfer device and substrate storage transfer device |
JP2005159141A (en) * | 2003-11-27 | 2005-06-16 | Ishikawajima Harima Heavy Ind Co Ltd | Substrate transfer device and substrate storage and transfer device |
KR100874206B1 (en) | 2004-12-24 | 2008-12-15 | 무라타 기카이 가부시키가이샤 | Sheet taking out system and taking out device |
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JP2012195507A (en) * | 2011-03-17 | 2012-10-11 | Shin Etsu Polymer Co Ltd | Substrate housing container and support jig |
KR102446066B1 (en) * | 2021-04-22 | 2022-09-23 | 주식회사 삼에스코리아 | Tray installed in the panel storage container |
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