JP2000072488A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2000072488A5 JP2000072488A5 JP1998242175A JP24217598A JP2000072488A5 JP 2000072488 A5 JP2000072488 A5 JP 2000072488A5 JP 1998242175 A JP1998242175 A JP 1998242175A JP 24217598 A JP24217598 A JP 24217598A JP 2000072488 A5 JP2000072488 A5 JP 2000072488A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- layer
- film thickness
- mainly composed
- geometric film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 11
- 229910052799 carbon Inorganic materials 0.000 claims 11
- 239000011521 glass Substances 0.000 claims 5
- 229910052710 silicon Inorganic materials 0.000 claims 5
- 239000010703 silicon Substances 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- 239000001257 hydrogen Substances 0.000 claims 4
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 238000004544 sputter deposition Methods 0.000 claims 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 229910052731 fluorine Inorganic materials 0.000 claims 3
- 239000011737 fluorine Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- 229910052786 argon Inorganic materials 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24217598A JP3948130B2 (ja) | 1998-08-27 | 1998-08-27 | 防汚ガラスとその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24217598A JP3948130B2 (ja) | 1998-08-27 | 1998-08-27 | 防汚ガラスとその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000072488A JP2000072488A (ja) | 2000-03-07 |
| JP2000072488A5 true JP2000072488A5 (https=) | 2005-01-06 |
| JP3948130B2 JP3948130B2 (ja) | 2007-07-25 |
Family
ID=17085442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24217598A Expired - Fee Related JP3948130B2 (ja) | 1998-08-27 | 1998-08-27 | 防汚ガラスとその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3948130B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4576765B2 (ja) * | 2001-07-12 | 2010-11-10 | 株式会社島津製作所 | 保護膜成膜方法、保護膜成膜装置および保護膜 |
| JP6028878B2 (ja) * | 2015-02-23 | 2016-11-24 | Toto株式会社 | 水まわり用ガラス部材 |
| EP3059330A1 (en) | 2015-02-23 | 2016-08-24 | Toto Ltd. | Wet area member |
-
1998
- 1998-08-27 JP JP24217598A patent/JP3948130B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6024873B2 (ja) | トラックパッド用カバーガラス及びその製造方法 | |
| CN102463714B (zh) | 具有抗指纹性的被覆件及其制造方法 | |
| MY132894A (en) | Layered resist system using tunable amorphous carbon film as a bottom layer and methods of fabrication thereof | |
| JP2013522813A (ja) | 透明導電性酸化物、金属、及び酸化物の組み合わせに基づく透明電極 | |
| JP2005513811A5 (https=) | ||
| JP2009158782A5 (https=) | ||
| TW201234920A (en) | Electrochromic layer, coated article having same, and method for making the article | |
| TW200520649A (en) | Conductive sheet having metal layer formed on at least a portion of surface of insulating substrate, product using the same, and manufacturing method thereof | |
| EP2091053A3 (en) | Transparent substrate with transparent conductive film, method of manufacturing the same, and photoelectric conversion element including the substrate | |
| US20220098094A1 (en) | Silicon and silica nanostructures and method of making silicon and silica nanostructures | |
| JP2000072488A5 (https=) | ||
| JP2007051327A5 (https=) | ||
| CN109797370A (zh) | 一种玻璃基透射可见光的dlc复合增硬薄膜及其制备方法 | |
| JP2006503185A5 (https=) | ||
| CN106350771A (zh) | 一种低热阻、抗辐照的纳米多层薄膜材料及其制备方法 | |
| CN103183522A (zh) | 基于Cu膜退火和氯气反应的SiC衬底上制备石墨烯的方法 | |
| CN119776766A (zh) | 一种耐腐蚀低摩擦的CoCrNiTiC中熵合金碳化物薄膜及其制备方法 | |
| CN104233207A (zh) | 一种增强漆膜抗原子氧侵蚀的方法 | |
| CN102268653A (zh) | 一种硬质合金工具金刚石过渡层的制备方法 | |
| KR20160150412A (ko) | 표면 개질된 그래핀 투명 전극 및 이의 제조 방법 | |
| JP2010251307A (ja) | 透明電極の製造方法 | |
| TWI496931B (zh) | 鍍膜件及其製作方法 | |
| JP2004111928A5 (https=) | ||
| JP2010261098A (ja) | 新規金属窒素酸化物プロセス | |
| CN202415379U (zh) | 具有保护膜层的镀膜玻璃 |