JP2000068413A - Electronic circuit device having multilayer substrate - Google Patents
Electronic circuit device having multilayer substrateInfo
- Publication number
- JP2000068413A JP2000068413A JP10254543A JP25454398A JP2000068413A JP 2000068413 A JP2000068413 A JP 2000068413A JP 10254543 A JP10254543 A JP 10254543A JP 25454398 A JP25454398 A JP 25454398A JP 2000068413 A JP2000068413 A JP 2000068413A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- conductor layer
- concave portion
- semiconductor element
- multilayer substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/49105—Connecting at different heights
- H01L2224/49109—Connecting at different heights outside the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は多層基板に電界効果
トランジスタ等の半導体素子を装着した構造の電子回路
装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic circuit device having a structure in which a semiconductor element such as a field effect transistor is mounted on a multilayer substrate.
【0002】[0002]
【従来の技術】多層基板に電界効果トランジスタを装着
した構成の高周波電力増幅器は例えば特開平10−13
163号公報等で公知である。2. Description of the Related Art A high frequency power amplifier having a structure in which a field effect transistor is mounted on a multilayer substrate is disclosed in, for example, Japanese Patent Application Laid-Open No. 10-13 / 1998.
For example, it is known in JP-A-163 No.
【0003】[0003]
【発明が解決しようとする課題】ところで、電力用半導
体素子を多層基板の上面に実装すると放熱性が悪くな
り、且つ小型化が阻害される。この問題を解決するため
に多層基板に貫通孔を設け、この貫通孔の下側を放熱板
又は放熱層で覆い、貫通孔内に半導体素子を配置すると
共に放熱板又は放熱層に半導体素子を固着する構成が考
えられる。しかし、多層基板の誘電体層(絶縁体層)の
全部を貫通するように半導体素子実装用孔を設けると、
半導体素子の安定した機械的支持を容易に達成できなく
なるばかりか、半導体素子を接続するためのワイヤが長
くなり、高周波特性が悪化する。By the way, when a power semiconductor element is mounted on the upper surface of a multilayer substrate, heat dissipation is deteriorated and miniaturization is hindered. To solve this problem, a through hole is provided in the multilayer substrate, the lower side of the through hole is covered with a heat sink or a heat dissipation layer, and the semiconductor element is arranged in the through hole and the semiconductor element is fixed to the heat sink or the heat dissipation layer. There is a possible configuration. However, if a semiconductor element mounting hole is provided so as to penetrate the entire dielectric layer (insulator layer) of the multilayer substrate,
Not only is it difficult to achieve stable mechanical support of the semiconductor element easily, but also the wires for connecting the semiconductor element become longer and the high-frequency characteristics deteriorate.
【0004】そこで、本発明の目的は電気的特性の低下
を抑えて放熱性を向上させることができる電子回路装置
を提供することにある。Accordingly, an object of the present invention is to provide an electronic circuit device capable of improving heat dissipation while suppressing a decrease in electrical characteristics.
【0005】[0005]
【課題を解決するための手段】上記目的を達成するため
の本発明は、多層基板と半導体素子とを有し、前記多層
基板は高周波信号伝送路導体層とグランド導体層と前記
半導体素子のためのバイアス電圧供給回路導体層とを有
している電子回路装置において、前記多層基板は少なく
とも第1、第2及び第3の誘電体層を有し、前記高周波
信号伝送路導体層は前記第1の誘電体層の表面に配置さ
れ、前記バイアス電圧供給回路導体層は前記第1及び第
2の誘電体層の間に配置され、前記グランド導体層は前
記第2及び第3の誘電体層の間に配置され、前記多層基
板の一方の主面に前記第1及び第2の誘電体層を貫通す
るように凹部が設けられ、前記半導体素子は前記凹部の
底面に露出した前記グランド導体層の上に配置されてい
る電子回路装置に係わるものである。なお、請求項2に
示すように凹部の底と多層基板の裏面(他方の主面)と
の間の誘電体層に貫通孔を形成し、ここに熱伝導性の良
い導体を充填することができる。また、請求項3に示す
ように凹部の底に半導体素子を固着し、半導体素子の表
面の電極を凹部の底のグランド導体層に接続することが
できる。また、請求項4に示すように凹部の底の半導体
素子固着領域とワイヤの接続領域(ボンディングパッ
ド)との間に絶縁性突出部を設けることができる。In order to achieve the above object, the present invention has a multi-layer substrate and a semiconductor element, and the multi-layer substrate includes a high-frequency signal transmission path conductor layer, a ground conductor layer, and the semiconductor element. Wherein the multilayer substrate has at least first, second, and third dielectric layers, and the high-frequency signal transmission line conductor layer has the first conductive layer. The bias voltage supply circuit conductor layer is disposed between the first and second dielectric layers, and the ground conductor layer is disposed on the second and third dielectric layers. A concave portion provided on one main surface of the multilayer substrate so as to penetrate the first and second dielectric layers, wherein the semiconductor element is provided on the ground conductor layer exposed on a bottom surface of the concave portion; To the electronic circuit device located above It is a bad guy. As described in claim 2, it is possible to form a through hole in the dielectric layer between the bottom of the concave portion and the back surface (the other main surface) of the multilayer substrate, and fill the hole with a conductor having good heat conductivity. it can. Further, the semiconductor element can be fixed to the bottom of the concave portion, and the electrode on the surface of the semiconductor element can be connected to the ground conductor layer at the bottom of the concave portion. Further, an insulating protrusion can be provided between the semiconductor element fixing region at the bottom of the concave portion and the wire connection region (bonding pad).
【0006】[0006]
【発明の効果】各請求項の発明によれば半導体素子を多
層基板の凹部に配置するので、多層基板の表面から半導
体素子を突出しないようにすること又は突出量を抑える
ことが可能になり、薄型化が可能になるばかりでなく、
半導体素子と多層基板の他方の主面(裏面)との間の誘
電体層が薄くなり、放熱性が向上する。また、請求項1
の発明によれば、グランド導体層が第2及び第3の誘電
体層の間に配置される。この結果、第1の誘電体層の表
面の高周波信号伝送路導体層(例えばストリップライン
導体層)とグランド導体層との間に第1及び第2の誘電
体層が介在し、両者の距離が比較的長くなる。この様に
両者間の距離が長くなると、高周波信号伝送路のインピ
ーダンスを一定とした場合に、高周波信号伝送路の導体
層(ストリップライン導体層)の幅を広くすることがで
きる。この様に高周波信号伝送路導体層の幅を広くする
と、伝送路の電気的損失が少なくなり、高周波特性が向
上する。また、請求項2の発明によれば、凹部の底と多
層基板の他方の主面との間の誘電体層に貫通孔を設け、
ここに放熱性の良い貫通導体を充填したので、凹部に装
着した半導体素子の放熱性を高めることができる。ま
た,請求項3の発明によれば、半導体素子の表面の電極
のグランドに対する接続を凹部の底面のグランドに対し
て行うので、ワイヤの長さを短くすることができ、高周
波特性が向上する。また、請求項4の発明によれば、半
導体素子個着用接着剤又は接合材がワイヤ接続領域に流
れ出ることを突出部によって防ぐことができ、ワイヤの
接続を確実に行うことができる。According to the invention of each claim, since the semiconductor element is arranged in the concave portion of the multilayer substrate, it is possible to prevent the semiconductor element from projecting from the surface of the multilayer substrate or to suppress the amount of projection. Not only can it be made thinner,
The thickness of the dielectric layer between the semiconductor element and the other main surface (back surface) of the multilayer substrate is reduced, and heat dissipation is improved. Claim 1
According to the invention, the ground conductor layer is disposed between the second and third dielectric layers. As a result, the first and second dielectric layers are interposed between the high-frequency signal transmission path conductor layer (for example, a stripline conductor layer) on the surface of the first dielectric layer and the ground conductor layer, and the distance between the two layers is reduced. Relatively long. As described above, when the distance between the two is long, the width of the conductor layer (strip line conductor layer) of the high-frequency signal transmission line can be increased when the impedance of the high-frequency signal transmission line is constant. When the width of the conductor layer of the high-frequency signal transmission line is increased in this manner, the electric loss of the transmission line is reduced, and the high-frequency characteristics are improved. According to the invention of claim 2, a through hole is provided in the dielectric layer between the bottom of the concave portion and the other main surface of the multilayer substrate,
Since the through conductor having good heat dissipation is filled here, the heat dissipation of the semiconductor element mounted in the recess can be enhanced. According to the third aspect of the present invention, since the connection of the electrode on the surface of the semiconductor element to the ground is made to the ground on the bottom of the recess, the length of the wire can be shortened, and the high-frequency characteristics are improved. According to the invention of claim 4, the adhesive or the bonding material for mounting the semiconductor element can be prevented from flowing out to the wire connection region by the protruding portion, and the connection of the wire can be reliably performed.
【0007】[0007]
【実施形態及び実施例】次に、図1〜図3を参照して本
発明の実施例に係わる多層基板を有する電子回路装置と
しての無線通信装置用の高周波電力増幅器を説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a high-frequency power amplifier for a radio communication device as an electronic circuit device having a multilayer substrate according to an embodiment of the present invention will be described with reference to FIGS.
【0008】本実施例の高周波電力増幅器は図1に示す
ように小電力用の第1のFET(電界効果トランジス
タ)1と、大電力用の第2のFET2と、入力端子3
と、出力端子4と、第1及び第2のドレイン電源端子
5、6と、ゲートバイアス電源端子7と、第1、第2及
び第3の整合回路8、9、10と、第1及び第2のマイ
クロストリップライン11、12と、集中定数型コンデ
ンサ13、14、15、16と、集中定数型抵抗17、
18、19とから成る。なお、第1のFET1は素子本
体部1aの他にコンデンサC1 、C2 、C3 と抵抗R1
を内蔵している。As shown in FIG. 1, the high-frequency power amplifier of this embodiment has a first FET (field effect transistor) 1 for low power, a second FET 2 for high power, and an input terminal 3.
Output terminal 4, first and second drain power terminals 5, 6, gate bias power terminal 7, first, second, and third matching circuits 8, 9, 10, and first and second 2, microstrip lines 11 and 12, lumped-parameter capacitors 13, 14, 15, and 16 and lumped-parameter resistors 17,
18 and 19. The first FET 1 has capacitors C1, C2, C3 and a resistor R1 in addition to the element body 1a.
Built-in.
【0009】図2は図1の回路構成を有する高周波電力
増幅器の幾何学的構成を概略的に示す平面図であり、図
3は図2のA−A線の一部を切断して示す断面図であ
る。本実施例のセラミック多層基板21の一方の主面2
2には、図2に概略で示すように第1のFET1、周知
の3つの整合回路8、9、10、及び1つのブロックに
まとめて示す種々の集中定数型素子23等が配置されて
いる。また、第1の主面22には凹部24が設けられて
いる。この凹部24は第1の凹部24aと第2の凹部2
4bとから成る。第2の凹部24bは第1の凹部24a
を囲むように配置され且つ第1の凹部24aよりも浅く
形成されている。FIG. 2 is a plan view schematically showing a geometric configuration of the high-frequency power amplifier having the circuit configuration of FIG. 1, and FIG. 3 is a cross-sectional view of a part of a line AA in FIG. FIG. One main surface 2 of the ceramic multilayer substrate 21 of the present embodiment
2, a first FET 1, three well-known matching circuits 8, 9, 10, various lumped-constant elements 23 collectively shown in one block, and the like are arranged as shown in FIG. 2. . Further, a concave portion 24 is provided in the first main surface 22. The recess 24 is formed by a first recess 24 a and a second recess 2.
4b. The second concave portion 24b is the first concave portion 24a.
And is formed shallower than the first concave portion 24a.
【0010】第1の凹部24aの底面25には第2のF
ET2が固着され、このドレイン電極Dが金属ワイヤ2
6によって第2の凹部24bの底面即ち段部27のドレ
イン接続導体層28に接続されている。また、FET2
のソース電極Sがワイヤ29によって第1の凹部24a
の底面25のグランド導体層30に接続されている。F
ET2のゲート電極Gはワイヤ31よって段部27のゲ
ート接続導体層32に接続されている。平面的に見てF
ET2の3方向を囲むように形成された突出部33は絶
縁性塗料の印刷によって形成されたものであり、第2の
FET2とグランド導体層30との間の接着層34aを
形成するために流動性を有する接着剤をグランド導体層
30の上に塗布した時に、これがFET2の固着領域か
らワイヤ29の接続領域に流動することを阻止するため
のものである。A second F is provided on the bottom surface 25 of the first concave portion 24a.
ET2 is fixed, and this drain electrode D is
6 is connected to the bottom surface of the second concave portion 24b, that is, the drain connection conductor layer 28 of the step portion 27. Also, FET2
The source electrode S is connected to the first concave portion 24a by the wire 29.
Is connected to the ground conductor layer 30 on the bottom surface 25. F
The gate electrode G of ET2 is connected to the gate connection conductor layer 32 of the step 27 by the wire 31. F in a plan view
The protrusions 33 formed so as to surround the three directions of the ET2 are formed by printing an insulating paint, and flow to form an adhesive layer 34a between the second FET 2 and the ground conductor layer 30. This is to prevent the adhesive from flowing from the fixing region of the FET 2 to the connection region of the wire 29 when an adhesive having properties is applied on the ground conductor layer 30.
【0011】多層基板21は図3に示すように第1、第
2及び第3の誘電体層34、35、36を有する。第1
の誘電体層34の表面は図2に示した基板21の一方の
主面22を形成するものである。図3では第1の誘電体
層34の表面に第1のFET1と第2及び第3の整合回
路9、10に含まれているマイクロストリップライン導
体層9a、10aのみが説明的に示されている。マイク
ロストリップライン導体層9a、10a及び図示が省略
されている各種の配線導体層が多層基板21の第1の導
体層となる。The multilayer substrate 21 has first, second and third dielectric layers 34, 35 and 36 as shown in FIG. First
The surface of the dielectric layer 34 forms one main surface 22 of the substrate 21 shown in FIG. In FIG. 3, only the first FET 1 and the microstrip line conductor layers 9a and 10a included in the second and third matching circuits 9 and 10 are illustrated on the surface of the first dielectric layer 34 for explanation. I have. The microstrip line conductor layers 9a and 10a and various wiring conductor layers not shown are the first conductor layers of the multilayer substrate 21.
【0012】第1の誘電体層34と第2の誘電体層35
との間には多層基板21の第2の導体層として第2のF
ET2のためのドレイン接続導体層28、ゲート接続導
体層32、図1に示されているマイクロストリップライ
ン11、12を形成するための導体層が設けられてい
る。従って、第2の誘電体層35の表面には局部的に第
2の導体層が配置されているのみである。第3の誘電体
層36の表面の大部分に多層基板21の第3の導体層と
して第1のグランド導体層30が形成され、第3の誘電
体層36の裏面の大部分には第2のグランド導体層37
が形成されている。第3の誘電体層36の表面側の第1
のグランド導体層30と裏面側の第2のグランド導体層
37とは第3の誘電体層36の貫通孔38、39に充填
された導体40、41によって接続されている。貫通孔
39は第2のFET2の固着領域の下に相当するように
配置され、ここには第3の誘電体層36の熱伝導率より
高い熱伝導率を有する金属が充填されている。従って、
貫通孔39の導体41は電力用FET2の放熱体として
機能している。A first dielectric layer 34 and a second dielectric layer 35
And the second F as the second conductor layer of the multilayer substrate 21.
A drain connection conductor layer 28 for ET2, a gate connection conductor layer 32, and a conductor layer for forming the microstrip lines 11 and 12 shown in FIG. 1 are provided. Therefore, only the second conductor layer is locally disposed on the surface of the second dielectric layer 35. A first ground conductor layer 30 is formed on most of the surface of the third dielectric layer 36 as a third conductor layer of the multilayer substrate 21, and a second ground layer is formed on most of the back surface of the third dielectric layer 36. Ground conductor layer 37
Are formed. The first on the surface side of the third dielectric layer 36
The ground conductor layer 30 and the second ground conductor layer 37 on the back side are connected by conductors 40 and 41 filled in through holes 38 and 39 of the third dielectric layer 36. The through hole 39 is arranged below the fixing region of the second FET 2, and is filled with a metal having a higher thermal conductivity than that of the third dielectric layer 36. Therefore,
The conductor 41 of the through hole 39 functions as a heat radiator of the power FET 2.
【0013】本実施例の構造の高周波電力増幅器は次の
効果を有する。 (1)凹部24にFET2を配置するので、薄型化が達
成され、且つ放熱性が向上する。 (2) 第2の誘電体層35に大面積のグランド導体層
を設けないで、グランド導体層30を第3の誘電体層3
6の表面に設け、第2の誘電体層35の表面には局部的
にドレイン接続導体層28、ゲート接続導体層32、マ
イクロストリップライン11、12のための導体層を設
けたので、第1の誘電体層34の表面の整合回路8、
9、10のストリップライン導体層9a、10aと第1
のグランド導体層30とに基づくマイクロストリップラ
イン機能を第2の誘電体層35の表面の導体層がほとん
ど妨害しなくなり、第1及び第2の誘電体層34、35
がマイクロストリップラインの誘電体層として有効に作
用する。従来の第1のグランド導体層を第2の誘電体層
35の表面に設ける場合に比べてマイクロストリップラ
インの誘電体層が厚くなり、ストリップライン導体層9
a、10aに基づくインピーダンスを同一に保つ場合に
おいて、ストリップライン導体層9a、10aの幅を広
くすることができ、ここでの損失を低減させて高周波特
性を向上させることができる。 (3) 多層基板21に凹部24を設け、この底面25
にFET2を配置し、ソース電極Sをワイヤ29によっ
て凹部24の底面25のグランド導体層30に接続する
ので、ソース電極Sとグランドとの間の接続導体即ちワ
イヤ29の長さが短くなり、損失及び不要なインダクタ
ンスが少なくなり、高周波特性が向上する。 (4) 凹部24の底面25のFET2の固着領域とワ
イヤ29のボンディング領域との間にダム状突出部33
を設けたので、FET2の固着用の接着剤がボンディン
グ領域に流れ出ることを防止でき、ワイヤ29のボンデ
ィングを確実に達成することができる。 (5) FET2の固着領域の下に貫通孔39を設け、
ここに熱伝導率の高い導体41を充填したので、放熱性
が良くなる。The high-frequency power amplifier having the structure of this embodiment has the following effects. (1) Since the FET 2 is arranged in the concave portion 24, a reduction in thickness is achieved and heat dissipation is improved. (2) The ground conductor layer 30 is formed on the third dielectric layer 3 without providing a large-area ground conductor layer on the second dielectric layer 35.
6 and the drain connection conductor layer 28, the gate connection conductor layer 32, and the conductor layers for the microstrip lines 11 and 12 are locally provided on the surface of the second dielectric layer 35. A matching circuit 8 on the surface of the dielectric layer 34,
9, 10 strip line conductor layers 9a, 10a and the first
The conductor layer on the surface of the second dielectric layer 35 hardly hinders the microstrip line function based on the ground conductor layer 30 of the first and second dielectric layers 35, 35.
Effectively function as a dielectric layer of the microstrip line. Compared with the conventional case where the first ground conductor layer is provided on the surface of the second dielectric layer 35, the dielectric layer of the microstrip line is thicker, and the strip line conductor layer 9
In the case where the impedances based on a and 10a are kept the same, the width of the strip line conductor layers 9a and 10a can be widened, and the loss here can be reduced to improve the high frequency characteristics. (3) The concave portion 24 is provided in the multilayer substrate 21,
And the source electrode S is connected to the ground conductor layer 30 on the bottom surface 25 of the concave portion 24 by the wire 29. Therefore, the length of the connection conductor between the source electrode S and the ground, that is, the wire 29 is reduced, and the loss is reduced. In addition, unnecessary inductance is reduced, and high-frequency characteristics are improved. (4) A dam-like projection 33 is provided between the fixing region of the FET 2 on the bottom surface 25 of the recess 24 and the bonding region of the wire 29.
Is provided, it is possible to prevent the adhesive for fixing the FET 2 from flowing out into the bonding region, and it is possible to reliably achieve the bonding of the wire 29. (5) A through-hole 39 is provided below the fixing region of the FET 2,
Since the conductor 41 having a high thermal conductivity is filled here, heat dissipation is improved.
【0014】[0014]
【別の実施例】次に、図4を参照して別の実施例の高周
波電力増幅器を説明する。但し、図4において図1〜図
3と実質的に同一の部分には同一の符号を付してその説
明を省略する。図4の実施例では誘電体層34、35、
36がガラスエポキシ樹脂即ちガラスが混入されたエポ
キシ樹脂で形成されている。即ち、図4の各誘電体層3
4、35、36はプリント回路基板であり、各層間は接
着剤(図示せず)で接着されている。また、図4では第
1のFET1も凹分24aと同様に形成された凹分50
の底のグランド導体層30上に配置され、接着層34a
で固着され、このエミッタがワイヤ51によってグラン
ド導体層30のパッド52上に接続されている。また、
パッド52と第1のFET1との間にダム状突出部33
aが設けられている。第1のFET1と第2のFET2
との間には第2の誘電体層35のみが残存し、第1及び
第2のFET1、2の接続に利用されている。図4の実
施例によっても、図1〜図3の実施例と同一の作用効果
を得ることができる。Another Embodiment Next, a high-frequency power amplifier according to another embodiment will be described with reference to FIG. However, in FIG. 4, substantially the same parts as those in FIGS. 1 to 3 are denoted by the same reference numerals, and description thereof is omitted. In the embodiment of FIG. 4, the dielectric layers 34, 35,
Reference numeral 36 denotes a glass epoxy resin, that is, an epoxy resin mixed with glass. That is, each dielectric layer 3 in FIG.
Reference numerals 4, 35, and 36 denote printed circuit boards, and each layer is bonded with an adhesive (not shown). In FIG. 4, the first FET 1 also has a recess 50 formed similarly to the recess 24a.
Is disposed on the ground conductor layer 30 at the bottom of the
The emitter is connected to a pad 52 of the ground conductor layer 30 by a wire 51. Also,
A dam-shaped protrusion 33 is provided between the pad 52 and the first FET 1.
a is provided. First FET1 and second FET2
Only the second dielectric layer 35 remains between them, and is used for connecting the first and second FETs 1 and 2. According to the embodiment of FIG. 4, the same operation and effects as those of the embodiment of FIGS. 1 to 3 can be obtained.
【変形例】本発明は上述の実施例に限定されるものでな
く、例えば次の変形が可能なものである。 (1) 凹部24の中に複数の半導体素子(例えば、ド
ライブ段のFETと出力段のFETとの両方)を配置す
ることができる。 (2) 第1のグランド導体層30の上側に2層よりも
多い誘電体層及び導体層を配置し、第1のグランド導体
層30よりも下側に1層よりも多い誘電体層及び導体層
を配置することができる。 (3) FET1、2の代りにバイポーラトランジスタ
等の別の半導体素子を配置することができる。[Modifications] The present invention is not limited to the above-described embodiment, and for example, the following modifications are possible. (1) A plurality of semiconductor elements (for example, both a drive stage FET and an output stage FET) can be arranged in the recess 24. (2) More than two dielectric layers and conductor layers are arranged above the first ground conductor layer 30, and more than one dielectric layer and conductor are arranged below the first ground conductor layer 30. Layers can be arranged. (3) Another semiconductor element such as a bipolar transistor can be arranged instead of the FETs 1 and 2.
【図1】本発明の実施例の高周波電力増幅器の回路図で
ある。FIG. 1 is a circuit diagram of a high-frequency power amplifier according to an embodiment of the present invention.
【図2】実施例の高周波電力増幅器を概略的に示す平面
図である。FIG. 2 is a plan view schematically showing a high-frequency power amplifier according to an embodiment.
【図3】図2のA−A線の一部を切断して示す断面図で
ある。FIG. 3 is a cross-sectional view showing a part of a line AA in FIG. 2;
【図4】別の実施例の高周波電力増幅器を図3と同様に
示す断面図である。FIG. 4 is a sectional view showing a high-frequency power amplifier according to another embodiment, similarly to FIG.
1、2 FET 3 入力端子 4 出力端子 9a、10a ストリップライン導体層 21 多層基板 24 凹部 30、37 グランド導体層 33 突出部 1, 2 FET 3 Input terminal 4 Output terminal 9a, 10a Strip line conductor layer 21 Multilayer substrate 24 Depression 30, 37 Ground conductor layer 33 Projection
Claims (4)
層基板は高周波信号伝送路導体層とグランド導体層と前
記半導体素子のためのバイアス電圧供給回路導体層とを
有している電子回路装置において、 前記多層基板は少なくとも第1、第2及び第3の誘電体
層を有し、 前記高周波信号伝送路導体層は前記第1の誘電体層の表
面に配置され、 前記バイアス電圧供給回路導体層は前記第1及び第2の
誘電体層の間に配置され、 前記グランド導体層は前記第2及び第3の誘電体層の間
に配置され、 前記多層基板の一方の主面に前記第1及び第2の誘電体
層を貫通するように凹部が設けられ、 前記半導体素子は前記凹部の底面に露出した前記グラン
ド導体層の上に配置されていることを特徴とする電子回
路装置。An electronic circuit having a multilayer substrate and a semiconductor element, wherein the multilayer substrate has a high-frequency signal transmission line conductor layer, a ground conductor layer, and a bias voltage supply circuit conductor layer for the semiconductor element. In the apparatus, the multilayer substrate has at least first, second, and third dielectric layers, the high-frequency signal transmission line conductor layer is disposed on a surface of the first dielectric layer, and the bias voltage supply circuit A conductor layer disposed between the first and second dielectric layers; a ground conductor layer disposed between the second and third dielectric layers; An electronic circuit device, wherein a concave portion is provided so as to penetrate the first and second dielectric layers, and the semiconductor element is disposed on the ground conductor layer exposed on a bottom surface of the concave portion.
多層基板とこの多層基板に装着された半導体素子とを備
えた電子回路装置であって、 前記多層基板はその一方の主面に凹部を有し、 前記凹部は前記複数の誘電体層のうちの少なくとも1つ
を貫通するように形成され、 前記半導体素子は前記凹部の底に配置され、 前記凹部の底と前記多層基板の他方の主面との間の誘電
体層は貫通孔を有し、 前記貫通孔に前記誘電体層よりも熱伝導性が良い導体が
充填されていることを特徴とする電子回路装置。2. An electronic circuit device comprising: a multi-layer substrate including a plurality of dielectric layers and a plurality of conductor layers; and a semiconductor element mounted on the multi-layer substrate, wherein the multi-layer substrate has one main surface. A concave portion, the concave portion is formed so as to penetrate at least one of the plurality of dielectric layers, the semiconductor element is disposed at the bottom of the concave portion, and the bottom of the concave portion and the multilayer substrate An electronic circuit device, wherein the dielectric layer between the other main surface has a through hole, and the through hole is filled with a conductor having better thermal conductivity than the dielectric layer.
多層基板とこの多層基板に装着された半導体素子とを備
えた電子回路装置であって、 前記多層基板はその一方の主面に凹部を有し、 前記凹部は前記複数の誘電体層のうちの少なくとも1つ
を貫通するように形成され、 前記凹部の底にはグランド導体層が設けられ、 前記凹部の底の前記グランド導体層に前記半導体素子が
固着され、 前記凹部の底のグランド導体層と前記半導体素子の表面
上の電極とがワイヤによって接続されていることを特徴
とする電子回路装置。3. An electronic circuit device comprising: a multilayer substrate including a plurality of dielectric layers and a plurality of conductor layers; and a semiconductor element mounted on the multilayer substrate, wherein the multilayer substrate has one main surface. A concave portion, wherein the concave portion is formed so as to penetrate at least one of the plurality of dielectric layers, a ground conductor layer is provided at a bottom of the concave portion, and the ground conductor at a bottom of the concave portion is provided. An electronic circuit device, wherein the semiconductor element is fixed to a layer, and a ground conductor layer at a bottom of the concave portion and an electrode on a surface of the semiconductor element are connected by a wire.
前記半導体素子の固着領域と前記ワイヤの接続領域との
間に絶縁性突出部が設けられていることを特徴とする請
求項3記載の電子回路装置。4. The semiconductor device according to claim 3, wherein an insulating protrusion is provided between a fixing region of the semiconductor element on a ground conductor layer at a bottom of the concave portion and a connection region of the wire. Electronic circuit device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10254543A JP2000068413A (en) | 1998-08-24 | 1998-08-24 | Electronic circuit device having multilayer substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10254543A JP2000068413A (en) | 1998-08-24 | 1998-08-24 | Electronic circuit device having multilayer substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000068413A true JP2000068413A (en) | 2000-03-03 |
Family
ID=17266511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10254543A Pending JP2000068413A (en) | 1998-08-24 | 1998-08-24 | Electronic circuit device having multilayer substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000068413A (en) |
-
1998
- 1998-08-24 JP JP10254543A patent/JP2000068413A/en active Pending
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