JP2000058565A - Position correcting device - Google Patents

Position correcting device

Info

Publication number
JP2000058565A
JP2000058565A JP22952898A JP22952898A JP2000058565A JP 2000058565 A JP2000058565 A JP 2000058565A JP 22952898 A JP22952898 A JP 22952898A JP 22952898 A JP22952898 A JP 22952898A JP 2000058565 A JP2000058565 A JP 2000058565A
Authority
JP
Japan
Prior art keywords
path member
rotary stage
suction
rotary
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP22952898A
Other languages
Japanese (ja)
Inventor
Yoshihiro Kusube
善弘 楠部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP22952898A priority Critical patent/JP2000058565A/en
Publication of JP2000058565A publication Critical patent/JP2000058565A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors

Abstract

PROBLEM TO BE SOLVED: To prevent contact abrasion between a sucking path member and a rotary stage as well as the fluctuation of suction force, by arranging the sucking path member and rotary stage having a suction hole in a manner that they are not in contact with each other with a void therebetween. SOLUTION: A rotary stage 11 is provided with a rotary shaft 16 which is held freely rotatably on a frame 14 by a rolling bearing 15 and a suction hole 13 to suck a pellet 1 on a rotary central shaft thereof respectively. A belt 18 is wound around a pulley 17 fixed on the end of the rotary shaft 16 so as to give a rotating force thereto, and the quantity of rotation of a motor is controlled to adjust the rotary angular position of the rotary shaft 16. A sucking path member 21 screwed in the supporting bracket 14A of the frame 14 is inserted in a hollow part 16A which is provided on the rotary central shaft of the rotary shaft 16 in the rotary stage 11. A vacuum pressure supplied to a suction hole 21B of the sucking path member 21 is regulated by means of small void in the midway to the suction hole 13 of the rotary stage 11. Therefore, the leakage of vacuum pressure in the clearance between the sucking path member 21 and hollow part 16A can be eliminated.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、回転ステージに載
置された物品の回転方向位置を修正するための位置修正
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a position correcting device for correcting the position of an article placed on a rotary stage in the rotational direction.

【0002】[0002]

【従来の技術】従来、ペレットボンディング装置等で、
ウエハステージ上のウエハリングユニットから取り出さ
れたペレットの回転方向位置ずれを修正するため、特開
平7-201897号公報に記載の如くの位置修正装置が用いら
れている。
2. Description of the Related Art Conventionally, using a pellet bonding apparatus or the like,
In order to correct the positional deviation of the pellets taken out of the wafering unit on the wafer stage in the rotational direction, a position correcting device as described in JP-A-7-201897 is used.

【0003】従来の位置修正装置は、図3に示す如く、
半導体ペレット1を吸着する吸着孔2Aを有する回転ス
テージ2を、架台3に設けてブッシュ4に回転自在に支
持し、回転ステージ2の回転軸5に固定したプーリ6に
ベルト7を巻き付けて回転力を付与し、回転ステージ2
の回転角位置を調整可能としている。そして、真空源に
接続された真空供給管8を架台3、ブッシュ4、回転軸
5に設けた吸引路に接続し、回転軸5の吸引孔5Aに供
給される真空圧を、回転ステージ2の吸着孔2Aに及ぼ
すようにしている。これにより、ペレット1は回転ステ
ージ2に吸着され、回転ステージ2の回転角位置の調整
によって回転方向位置ずれを修正可能とされる。
[0003] As shown in FIG.
A rotary stage 2 having a suction hole 2A for sucking a semiconductor pellet 1 is provided on a gantry 3 and supported rotatably on a bush 4, and a belt 7 is wound around a pulley 6 fixed to a rotary shaft 5 of the rotary stage 2 to rotate the rotary force. And rotating stage 2
Is adjustable. Then, the vacuum supply pipe 8 connected to the vacuum source is connected to the base 3, the bush 4, and the suction path provided in the rotary shaft 5, and the vacuum pressure supplied to the suction hole 5A of the rotary shaft 5 is applied to the rotary stage 2. It is made to affect the suction hole 2A. As a result, the pellet 1 is attracted to the rotary stage 2, and the rotational position shift can be corrected by adjusting the rotational angle position of the rotary stage 2.

【0004】[0004]

【発明が解決しようとする課題】従来技術では、回転ス
テージ2の回転軸5に供給される真空圧の漏れ防止のた
めに、回転ステージ2の軸受としてブッシュ4を用いて
いる。ところが、ブッシュ4は回転ステージ2の回転に
より徐々に摩耗し、回転軸5に供給された真空圧は徐々
に漏れ、結果として、回転ステージ2の吸着力は次第に
低下する。これにより、回転ステージ2はペレット1を
安定して吸着できず、回転ステージ2の回転時に、回転
ステージ2に吸着したペレット1の位置ずれを生じ、ボ
ンディング精度が低下する虞れがある。
In the prior art, the bush 4 is used as a bearing of the rotary stage 2 in order to prevent leakage of the vacuum pressure supplied to the rotary shaft 5 of the rotary stage 2. However, the bush 4 gradually wears due to the rotation of the rotary stage 2, the vacuum pressure supplied to the rotary shaft 5 gradually leaks, and as a result, the suction force of the rotary stage 2 gradually decreases. As a result, the rotating stage 2 cannot stably suck the pellets 1, and when the rotating stage 2 rotates, the pellets 1 sucked to the rotating stage 2 are displaced, and there is a possibility that the bonding accuracy may be reduced.

【0005】本発明の課題は、位置修正装置において、
回転ステージの吸着孔に真空力を及ぼす吸引路部材と該
回転ステージとの接触摩耗を防止し、両者間の摩耗に起
因する回転ステージの吸着力の変動を防止することにあ
る。
An object of the present invention is to provide a position correcting device,
An object of the present invention is to prevent contact abrasion between a suction path member, which exerts a vacuum force on a suction hole of a rotary stage, and the rotary stage, and to prevent fluctuation of the suction force of the rotary stage due to wear between the two.

【0006】[0006]

【課題を解決するための手段】請求項1に記載の本発明
は、吸着孔を有する回転ステージを回転自在に支持し、
真空源に接続された吸引路部材の吸引孔に供給される真
空圧を、回転ステージの吸着孔に及ぼす位置修正装置に
おいて、吸引路部材と回転ステージとが空隙を介して非
接触配置されてなるようにしたものである。
According to a first aspect of the present invention, a rotary stage having a suction hole is rotatably supported.
In a position correction device for applying a vacuum pressure supplied to a suction hole of a suction path member connected to a vacuum source to a suction hole of a rotary stage, the suction path member and the rotary stage are arranged in a non-contact manner via a gap. It is like that.

【0007】請求項2に記載の本発明は、請求項1に記
載の本発明において更に、前記吸引路部材と回転ステー
ジの間の空隙を調整することにより、回転ステージの吸
着孔に及ぶ真空圧を調整する手段を備えてなるようにし
たものである。
According to a second aspect of the present invention, in the first aspect of the present invention, the vacuum pressure applied to the suction hole of the rotary stage is further adjusted by adjusting a gap between the suction path member and the rotary stage. Is provided.

【0008】請求項3に記載の本発明は、請求項1又は
2に記載の本発明において更に、前記回転ステージがこ
ろがり軸受により支持されてなるようにしたものであ
る。
According to a third aspect of the present invention, in the first or second aspect of the present invention, the rotary stage is further supported by a rolling bearing.

【0009】請求項4に記載の本発明は、請求項1〜3
のいずれかに記載の本発明において更に、前記吸引路部
材が回転ステージの吸着孔に貫通配置され、該吸引路部
材を回転ステージの表面レベル以下の吸着作業位置と、
該回転ステージの表面レベルより上の突き上げ位置とに
切換え移動可能とする手段を備えてなる
The present invention described in claim 4 provides the invention according to claims 1 to 3.
Further, in the present invention according to any one of the above, the suction path member is disposed through the suction hole of the rotary stage, the suction path member and the suction work position below the surface level of the rotary stage,
Means for switching and moving to a thrust position above the surface level of the rotary stage.

【0010】[0010]

【作用】請求項1の本発明によれば下記の作用があ
る。 回転ステージの吸着孔に真空力を及ぼす吸引路部材と
該回転ステージとを空隙を介して非接触配置したから、
両者の間に接触摩耗を生ずることがない。従って、両者
間の摩耗による真空圧の漏れがなく、回転ステージの吸
着力の変動を防止できる。これにより、ペレット等の被
吸着物品を安定して吸着でき、回転ステージに吸着した
ペレット等に位置ずれが生ずることを防止できる。
According to the first aspect of the present invention, the following operations are provided. Since the rotation path and the suction path member that exerts a vacuum force on the suction hole of the rotation stage are arranged in a non-contact manner through a gap,
No contact wear occurs between them. Therefore, there is no leak of vacuum pressure due to wear between the two, and it is possible to prevent fluctuations in the attraction force of the rotary stage. This makes it possible to stably adsorb an article to be adsorbed such as a pellet, and prevent the pellet or the like adsorbed on the rotary stage from being displaced.

【0011】請求項2の本発明によれば下記、の作
用がある。 吸引路部材と回転ステージの間の空隙が小さくなるよ
うに調整することで、この空隙から漏れる真空圧を極力
少なくできる。
According to the second aspect of the present invention, the following operations are provided. By adjusting the gap between the suction path member and the rotary stage to be small, the vacuum pressure leaking from the gap can be reduced as much as possible.

【0012】回転ステージの吸着孔に作用する真空圧
は、吸引路部材に付与される真空圧が同じであれば、上
述の空隙が小さい程上がる。従って、吸引路部材と回
転ステージの間の空隙量を調整することで、回転ステー
ジの吸着孔に生ずる吸着力を調整できる。これは、ペレ
ット等の品種が変わり、回転ステージの吸着孔に発生さ
せるべき吸着力を調整する必要がある時に短時間で対応
できることを意味する。
The vacuum pressure acting on the suction holes of the rotary stage increases as the above-mentioned gap becomes smaller, as long as the vacuum pressure applied to the suction path member is the same. Therefore, by adjusting the gap amount between the suction path member and the rotary stage, it is possible to adjust the suction force generated in the suction holes of the rotary stage. This means that it is possible to cope in a short time when the kind of pellet or the like changes and it is necessary to adjust the suction force to be generated in the suction hole of the rotary stage.

【0013】請求項3の本発明によれば下記、の作
用がある。 回転ステージをころがり軸受で支持したから、ブッシ
ュ等のすべり軸受で支持する場合に比して軸受耐久性を
大幅に向上し、長期に渡って軸受摩耗による回転ステー
ジのがたつきを防止できる。従って、回転ステージのが
たつきによるペレット等の位置ずれを長期的に防止でき
る。
According to the third aspect of the present invention, the following operations are provided. Since the rotary stage is supported by rolling bearings, the durability of the bearing is greatly improved as compared with the case where the rotary stage is supported by a sliding bearing such as a bush, and rattling of the rotary stage due to bearing wear can be prevented over a long period of time. Therefore, it is possible to prevent the displacement of the pellet or the like due to the backlash of the rotary stage for a long time.

【0014】回転ステージをころがり軸受で支持した
から、上述の如くに軸受耐久性を大幅に向上し、長期
に渡って軸受摩耗による回転ステージのがたつきを防止
でき、回転ステージのがたつきの定期点検の頻度、及び
がたつきが許容値を越えた場合の位置修正装置の交換作
業の頻度を少なくし、定期点検と交換作業に伴う作業者
の負担を軽減できる。また、定期点検と交換作業に伴う
装置の停止による生産性の低下を回避できる。
Since the rotating stage is supported by rolling bearings, the durability of the bearing is greatly improved as described above, and the rattling of the rotating stage due to bearing wear can be prevented for a long period of time. The frequency of the inspection and the frequency of the replacement work of the position correcting device when the backlash exceeds the allowable value can be reduced, and the burden on the operator due to the periodic inspection and the replacement work can be reduced. Further, it is possible to avoid a decrease in productivity due to the stoppage of the apparatus due to the periodic inspection and replacement work.

【0015】請求項4の本発明によれば下記の作用が
ある。 吸引路部材を回転ステージの表面レベル以下の吸着作
業位置と、表面レベルより上の突き上げ位置とに切換え
移動することにより、単一の装置構成により、ペレット
等の吸着動作と突き上げ動作とを併せ行うことができ、
装置構成を簡素化できる。
According to the present invention, there is provided the following operation. By switching and moving the suction path member between a suction operation position lower than the surface level of the rotary stage and a thrusting position above the surface level, the suction operation and the thrusting operation of the pellets and the like are performed by a single device configuration. It is possible,
The device configuration can be simplified.

【0016】[0016]

【発明の実施の形態】図1は第1実施形態を示す模式
図、図2は第2実施形態を示す模式図、図3は従来例を
示す模式図である。
FIG. 1 is a schematic diagram showing a first embodiment, FIG. 2 is a schematic diagram showing a second embodiment, and FIG. 3 is a schematic diagram showing a conventional example.

【0017】(第1実施形態)(図1) 位置修正装置10は、例えば特開平7-201897号公報に記
載のペレットボンディング装置で用いられ、ウエハリン
グユニットからのペレット取り出し位置と、基板へのペ
レットボンディング位置との間に配置される。即ち、ペ
レット取り出しアームの吸着ノズルでウエハリングユニ
ットからペレット1を取り出し、このペレット1を位置
修正装置10に載置し、そのペレット1の回転方向位置
ずれを修正し、位置修正後のペレット1をペレット供給
アームの吸着ノズルでピックアップして基板上にボンデ
ィング可能とするものである。このとき、位置修正装置
10は、図1に示す如く、回転ステージ11と吸引路部
材21とを有する。
(First Embodiment) (FIG. 1) The position correcting device 10 is used in, for example, a pellet bonding device described in Japanese Patent Application Laid-Open No. 7-201897, and a position for taking out a pellet from a wafering unit and a position on a substrate. It is arranged between the pellet bonding position. That is, the pellet 1 is taken out from the wafering unit by the suction nozzle of the pellet take-out arm, and the pellet 1 is mounted on the position correcting device 10 to correct the rotational displacement of the pellet 1, and the pellet 1 after the position correction is removed. The pickup is picked up by a suction nozzle of a pellet supply arm and can be bonded to a substrate. At this time, the position correcting device 10 includes a rotary stage 11 and a suction path member 21, as shown in FIG.

【0018】回転ステージ11は、架台14にころがり
軸受15により回転自在に支持される回転軸16を有す
るとともに、ペレット1を吸着する吸着孔13をその回
転中心軸上に有している。そして、回転ステージ11
は、回転軸16の端部に固定したプーリ17にベルト1
8を巻付けて回転力を付与され、不図示のモータの回転
量制御により、その回転角位置を調整可能とされてい
る。
The rotary stage 11 has a rotary shaft 16 rotatably supported by a rolling bearing 15 on a gantry 14 and has a suction hole 13 for sucking the pellet 1 on a center axis of its rotation. And the rotating stage 11
The belt 1 is attached to a pulley 17 fixed to the end of the rotating shaft 16.
8, a rotational force is applied, and its rotational angle position can be adjusted by controlling the rotation amount of a motor (not shown).

【0019】また、回転ステージ11は、架台14と一
体の支持ブラケット14Aに丸棒状の吸引路部材21の
雄ねじ部21Aを螺着し、ロックナット22でロック可
能としている。吸引路部材21は、真空源に接続された
真空供給管23を接続され、真空圧を伝える吸引孔21
Bを穿設してある。
The rotary stage 11 is configured such that a male screw portion 21A of a round bar-shaped suction path member 21 is screwed to a support bracket 14A integral with the gantry 14, and can be locked by a lock nut 22. The suction path member 21 is connected to a vacuum supply pipe 23 connected to a vacuum source, and a suction hole 21 for transmitting vacuum pressure.
B is drilled.

【0020】ここで、架台14の支持ブラケット14A
に螺着された吸引路部材21は、回転ステージ11の回
転軸16の回転中心軸上に設けた中空部16Aに挿入さ
れている。そして、吸引路部材21の先端面と中空部1
6Aの天井面との間、吸引路部材21の側面と中空部1
6Aの壁面との間に微小空隙を介して、吸引路部材21
と回転ステージ11の回転軸16とを非接触配置してあ
る。これにより、吸引路部材21の吸引孔21Bに供給
された真空圧は、上述の微小空隙を介して、回転ステー
ジ11の吸着孔13に付与される。吸引路部材21の吸
引孔21Bに供給される真空圧は、吸引路部材21と中
空部16Aとの間の微小空隙から真空圧が漏れたとして
も、回転ステージ11の吸着孔13によるペレット1の
吸着に支障をきたさない程度の真空圧に設定される。
Here, the support bracket 14A of the gantry 14
Is inserted into a hollow portion 16A provided on the rotation center axis of the rotation shaft 16 of the rotation stage 11. Then, the distal end surface of the suction path member 21 and the hollow portion 1
6A, the side surface of the suction path member 21 and the hollow portion 1
6A, the suction path member 21
And the rotating shaft 16 of the rotating stage 11 are arranged in non-contact. As a result, the vacuum pressure supplied to the suction holes 21B of the suction path member 21 is applied to the suction holes 13 of the rotary stage 11 through the above-described minute gaps. The vacuum pressure supplied to the suction hole 21B of the suction path member 21 is such that even if the vacuum pressure leaks from the minute gap between the suction path member 21 and the hollow portion 16A, the pellet 1 is not removed by the suction hole 13 of the rotary stage 11. The vacuum pressure is set to a level that does not interfere with the suction.

【0021】位置修正装置10にあっては、架台14の
支持ブラケット14Aに吸引路部材21のねじ部21A
を螺着してあり、この螺着位置を変えることにより、吸
引路部材21の先端面と中空部16Aの天井面との空隙
量を調整し、回転ステージ11の吸着孔13に及ぶ真空
圧を調整可能としている。これにより、吸引路部材21
と中空部16Aとの間の空隙からの真空圧の漏れを極力
少なくすることができるとともに、回転ステージ11の
吸着孔13に作用させるべき真空圧をペレット品種に応
じて短時間で調整できる。
In the position correcting device 10, the screw portion 21 A of the suction path member 21 is
By changing the screwing position, the amount of air gap between the distal end surface of the suction path member 21 and the ceiling surface of the hollow portion 16A is adjusted, and the vacuum pressure applied to the suction holes 13 of the rotary stage 11 is reduced. Adjustable. Thereby, the suction path member 21
Leakage of vacuum pressure from the gap between the air gap and the hollow portion 16A can be minimized, and the vacuum pressure to be applied to the suction holes 13 of the rotary stage 11 can be adjusted in a short time in accordance with the type of pellet.

【0022】尚、吸引路部材21の螺着位置の変更によ
る、吸引路部材21の先端面と中空部16Aの天井面と
の間の空隙量の調整手順は、例えば下記(a) 又は(b) に
て行うことができる。
The procedure for adjusting the gap between the front end surface of the suction path member 21 and the ceiling surface of the hollow portion 16A by changing the screwing position of the suction path member 21 is described in, for example, the following (a) or (b). ).

【0023】(a) 吸引路部材21の先端面が中空部16
Aの天井面に到達する位置まで吸引路部材21をねじ込
む。次に、吸引路部材21を少しずつ逆方向に回転させ
ながら手で回転ステージ11を回転させる。回転ステー
ジ11が抵抗なく回転する状態になったところで吸引路
部材21を固定する。この時、ベルト18を外しておく
と回転ステージ11の回転抵抗の変化がわかり易い。
尚、吸引路部材21の固定は、ロックナット22を締め
付けることにより行う。
(A) The tip end surface of the suction path member 21 is
The suction path member 21 is screwed to a position where the suction path member A reaches the ceiling surface. Next, the rotary stage 11 is manually rotated while the suction path member 21 is gradually rotated in the reverse direction. When the rotary stage 11 is rotated without resistance, the suction path member 21 is fixed. At this time, if the belt 18 is removed, a change in the rotation resistance of the rotary stage 11 can be easily understood.
The suction path member 21 is fixed by tightening the lock nut 22.

【0024】(b) モータにより回転ステージ11を一定
速度で回転させる。吸引路部材21を少しずつねじ込ん
でいき、このときのモータの回転速度の変化をモータに
設けた速度検出器で検出する。モータの回転速度が低下
した位置から所定量戻したねじ込み位置で吸引路部材2
1を固定する。
(B) The rotary stage 11 is rotated at a constant speed by a motor. The suction path member 21 is screwed in little by little, and a change in the rotation speed of the motor at this time is detected by a speed detector provided in the motor. At the screwing position which is returned by a predetermined amount from the position where the rotation speed of the motor is lowered, the suction path member 2
Fix 1

【0025】従って、位置修正装置10は以下の如くに
用いられる。 (1) ペレット1の品種に応じ、架台14の支持ブラケッ
ト14Aに対する吸引路部材21の螺着位置を調整し、
回転ステージ11の吸着孔13に適宜な真空圧を及ぼし
可能とする。
Therefore, the position correcting device 10 is used as follows. (1) Adjust the screwing position of the suction path member 21 to the support bracket 14A of the gantry 14 according to the type of the pellet 1,
Appropriate vacuum pressure can be applied to the suction holes 13 of the rotary stage 11.

【0026】(2) ペレット取出アームの吸着ノズルが取
り出してきたペレット1を回転ステージ11に載置し、
吸引路部材21から回転ステージ11の吸着孔13に加
えられている真空圧により該ペレット1を吸着する。
(2) The pellet 1 taken out by the suction nozzle of the pellet take-out arm is placed on the rotary stage 11,
The pellet 1 is sucked by the vacuum pressure applied to the suction hole 13 of the rotary stage 11 from the suction path member 21.

【0027】(3) 回転ステージ11を適宜な角度回動
し、ペレット1の回転方向位置ずれを修正する。
(3) The rotary stage 11 is rotated at an appropriate angle to correct the positional deviation of the pellet 1 in the rotation direction.

【0028】(4) ペレット供給アームの吸着ノズルによ
り、上記(3) の位置修正済のペレット1をピックアップ
しボンディングする。
(4) The pellet 1 whose position has been corrected in the above (3) is picked up and bonded by the suction nozzle of the pellet supply arm.

【0029】本実施形態によれば以下の作用がある。 回転ステージ11の吸着孔13に真空力を及ぼす吸引
路部材21と該回転ステージ11とを空隙を介して非接
触配置したから、両者の間に接触摩耗を生ずることがな
い。従って、両者間の摩耗による真空圧の漏れがなく、
回転ステージ11の吸着力の変動を防止できる。これに
より、ペレット1を安定して吸着でき、回転ステージ1
1に吸着したペレット1に位置ずれが生ずることを防止
でき、安定したボンディング精度を維持できる。
According to this embodiment, the following operations are provided. Since the suction path member 21 for applying a vacuum force to the suction hole 13 of the rotary stage 11 and the rotary stage 11 are arranged in a non-contact manner through a gap, no contact wear occurs between them. Therefore, there is no leakage of vacuum pressure due to wear between the two,
Variations in the suction force of the rotating stage 11 can be prevented. Thereby, the pellet 1 can be stably adsorbed, and the rotating stage 1
It is possible to prevent the displacement of the pellet 1 adsorbed by the pellet 1 and to maintain stable bonding accuracy.

【0030】吸引路部材21と回転ステージ11の間
の空隙が小さくなるように調整することで、この空隙か
ら漏れる真空圧を極力少なくできる。
By adjusting the gap between the suction path member 21 and the rotary stage 11 to be small, the vacuum pressure leaking from this gap can be minimized.

【0031】回転ステージ11の吸着孔13に作用す
る真空圧は、吸引路部材21に付与される真空圧が同じ
であれば、上述の空隙が小さい程上がる。従って、吸
引路部材21と回転ステージ11の間の空隙量を調整す
ることで、回転ステージ11の吸着孔13に生ずる吸着
力を調整できる。これは、ペレット1の品種が変わり、
回転ステージ11の吸着孔13に発生させるべき吸着力
を調整する必要がある時に短時間で対応できることを意
味する。
The vacuum pressure acting on the suction holes 13 of the rotary stage 11 increases as the above-mentioned gap becomes smaller if the vacuum pressure applied to the suction path member 21 is the same. Therefore, the suction force generated in the suction holes 13 of the rotary stage 11 can be adjusted by adjusting the gap amount between the suction path member 21 and the rotary stage 11. This is because the type of pellet 1 changes,
This means that when it is necessary to adjust the suction force to be generated in the suction holes 13 of the rotary stage 11, it can be dealt with in a short time.

【0032】回転ステージ11をころがり軸受15で
支持したから、ブッシュ等のすべり軸受で支持する場合
に比して軸受耐久性を大幅に向上し、長期に渡って軸受
摩耗による回転ステージ11のがたつきを防止できる。
従って、回転ステージ11のがたつきによるペレット1
の位置ずれを長期的に防止でき、安定したボンディング
精度を維持できる。
Since the rotating stage 11 is supported by the rolling bearing 15, the bearing durability is greatly improved as compared with the case where the rotating stage 11 is supported by a sliding bearing such as a bush, and the rotating stage 11 is loose due to bearing wear over a long period of time. Sticking can be prevented.
Therefore, the pellet 1 due to the rattling of the rotary stage 11
Can be prevented for a long time, and stable bonding accuracy can be maintained.

【0033】回転ステージ11をころがり軸受15で
支持したから、上述の如くに軸受耐久性を大幅に向上
し、長期に渡って軸受摩耗による回転ステージ11のが
たつきを防止でき、回転ステージ11のがたつきの定期
点検の頻度、及びがたつきが許容値を越えた場合の位置
修正装置の交換作業の頻度を少なくし、定期点検と交換
作業に伴う作業者の負担を軽減できる。また、定期点検
と交換作業に伴う装置の停止による生産性の低下を回避
できる。
Since the rotating stage 11 is supported by the rolling bearings 15, the durability of the bearing is greatly improved as described above, and the rattling of the rotating stage 11 due to bearing wear can be prevented for a long period of time. The frequency of the regular check for rattling and the frequency of replacement work of the position correcting device when the rattling exceeds the allowable value can be reduced, and the burden on the operator involved in the periodic check and replacement work can be reduced. Further, it is possible to avoid a decrease in productivity due to the stoppage of the apparatus due to the periodic inspection and replacement work.

【0034】尚、吸引路部材21にあっては、回転ステ
ージ11の中空部16Aに入る部分の直径に対して雄ね
じ部21Aの直径を大きく形成しておくことにより、吸
引路部材21を架台14の下側から支持ブラケット14
Aの雌ねじ部にねじ込むことができ、これにより、位置
修正装置10の組立時、回転ステージ11回りの回転機
構等の組み付けが全てが完了した後で、吸引路部材21
を組み付けることができ、架台14の上側から吸引路部
材21を組み付ける場合に比して位置修正装置10の組
み立てを容易に行うことができる。
In the suction passage member 21, the diameter of the external thread portion 21A is made larger than the diameter of the portion of the rotary stage 11 that enters the hollow portion 16A, so that the suction passage member 21 Support bracket 14 from below
A can be screwed into the female screw portion of the suction path member 21. After the assembly of the rotation mechanism and the like around the rotary stage 11 is completed at the time of assembling the position correcting device 10,
Can be assembled, and assembling of the position correcting device 10 can be easily performed as compared with the case where the suction path member 21 is assembled from the upper side of the gantry 14.

【0035】(第2実施形態)(図2) 第2実施形態が第1実施形態と異なる点は、回転ステー
ジ11の回転軸16に設けた中空部16Aの天井を抜
き、吸引路部材21を中空部16Aにて形成した吸着孔
13Aに貫通配置するとともに、吸引路部材21を支持
ブラケット14Aに設けた軸受14Bに支持して上下動
可能としたものである。吸引路部材21の上下動の駆動
源としては、カム31を用い、カム31と吸引路部材2
1の基端部のカムフォロワ32とを衝合せしめている。
(Second Embodiment) (FIG. 2) The second embodiment is different from the first embodiment in that the ceiling of a hollow portion 16A provided on the rotating shaft 16 of the rotary stage 11 is removed, and the suction path member 21 is removed. The suction passage member 21 is supported by a bearing 14B provided on a support bracket 14A so that the suction passage member 21 can be moved up and down while being disposed through the suction hole 13A formed by the hollow portion 16A. A cam 31 is used as a driving source for the vertical movement of the suction path member 21, and the cam 31 and the suction path member 2 are used.
1 and a cam follower 32 at the base end thereof.

【0036】第2実施形態にあっては、カム31の回転
位置を調整し、回転ステージ11のペレット載置面(表
面)よりも若干下方に吸引路部材21の先端面を設定
し、載置面に載置された半導体ペレット1の底面と吸引
路部材21の先端面との間に微小間隙が形成されるよう
にするものであり、間隙の調整はカム31の回転角を変
えることで行えるものである。
In the second embodiment, the rotation position of the cam 31 is adjusted, and the distal end surface of the suction path member 21 is set slightly below the pellet mounting surface (surface) of the rotary stage 11, and the mounting is performed. A minute gap is formed between the bottom surface of the semiconductor pellet 1 placed on the surface and the tip end surface of the suction path member 21, and the gap can be adjusted by changing the rotation angle of the cam 31. Things.

【0037】更に、第2実施形態にあっては、カム31
により、吸引路部材21を回転ステージ11のペレット
載置面レベル以下の吸着作業位置と、該回転ステージ1
1のペレット載置面レベルより上の突き上げ位置とに切
換え移動可能とし、ペレット位置修正後のペレット1の
ピックアップ動作を効率的に行わせることも考えられ
る。即ち、まずカム31により、回転ステージ11のペ
レット載置面よりも若干下方に吸引路部材21の先端面
を位置付ける。位置修正のために搬送されてすぐ半導体
ペレット1は、吸引路部材21の吸引力で回転ステージ
11の上に吸着保持される。この後、所定の位置修正動
作が行われる。位置修正動作が終了すると、カム31が
再び回転して吸引路部材21を上昇させ、半導体ペレッ
ト1をステージ面より上方に突き上げる。待ち受けてい
た吸着ノズル100は、吸引路部材21にて突き上げら
れたペレットをピックアップする。
Further, in the second embodiment, the cam 31
As a result, the suction path member 21 is moved to the suction work position below the level of the pellet mounting surface of the rotary stage 11 and the rotary stage 1
It is also conceivable to make it possible to switch to a push-up position above the level of the pellet mounting surface 1 so that the pick-up operation of the pellet 1 after correcting the pellet position can be performed efficiently. That is, first, the tip surface of the suction path member 21 is positioned slightly below the pellet mounting surface of the rotary stage 11 by the cam 31. Immediately after being transported for position correction, the semiconductor pellet 1 is suction-held on the rotary stage 11 by the suction force of the suction path member 21. Thereafter, a predetermined position correcting operation is performed. When the position correcting operation is completed, the cam 31 rotates again to raise the suction path member 21 and push the semiconductor pellet 1 upward from the stage surface. The suction nozzle 100 that has been waiting picks up the pellet pushed up by the suction path member 21.

【0038】従って、この第2実施形態によれば、吸引
路部材21を回転ステージ11のペレット載置面レベル
以下の吸着作業位置と、載置面レベルより上の突き上げ
位置とに切換え移動することにより、単一の装置構成に
より、ペレット1の吸着動作と突き上げ動作とを併せ行
うことができ、装置構成を簡素化できる。また、吸引路
部材21がペレット1の突き上げ動作を行うことから、
ペレット1が回転ステージ11のペレット載置面に密着
している場合であっても、これを確実に剥離でき、吸着
ノズル100によるピックアップミスを防止できる。
Therefore, according to the second embodiment, the suction path member 21 is switched between the suction operation position below the pellet mounting surface level of the rotary stage 11 and the push-up position above the mounting surface level. Thus, the adsorption operation and the pushing-up operation of the pellet 1 can be performed together with a single device configuration, and the device configuration can be simplified. Further, since the suction path member 21 performs the pushing-up operation of the pellet 1,
Even when the pellet 1 is in close contact with the pellet mounting surface of the rotary stage 11, it can be reliably peeled off, and a pickup error by the suction nozzle 100 can be prevented.

【0039】以上、本発明の実施の形態を図面により詳
述したが、本発明の具体的な構成はこの実施の形態に限
られるものではなく、本発明の要旨を逸脱しない範囲の
設計の変更等があっても本発明に含まれる。例えば、本
発明は半導体ペレットを位置修正物品とするものに限ら
ず、広く一般の物品の位置修正に適用できる。
The embodiment of the present invention has been described in detail with reference to the drawings. However, the specific configuration of the present invention is not limited to this embodiment, and the design can be changed without departing from the scope of the present invention. The present invention is also included in the present invention. For example, the present invention is not limited to using semiconductor pellets as position-correcting articles, but can be widely applied to position correction of general articles.

【0040】また、本発明の実施において、回転ステー
ジを支持する軸受は、ころがり軸受に限らず、空気軸受
等であっても良い。
In the embodiment of the present invention, the bearing for supporting the rotary stage is not limited to a rolling bearing, but may be an air bearing or the like.

【0041】また、本発明の実施において、吸引路部材
と回転ステージとの間の空隙を調整可能とする手段は、
ねじ、カム等によるものに限らない。また、吸引路部材
は回転ステージとの間の空隙を調整可能とするために相
対移動できるものでなく、吸引路部材の基端フランジ部
を架台の支持ブラケットに固定されて回転ステージとの
間の空隙を固定化して用いられるものであっても良い。
In the embodiment of the present invention, the means for adjusting the gap between the suction path member and the rotary stage includes:
It is not limited to a screw, a cam, or the like. Further, the suction path member cannot be moved relative to the rotation stage in order to adjust the gap between the suction path member and the rotation stage. It may be used by fixing the gap.

【0042】また、本発明の実施において、吸引路部材
を架台に固定し、この吸引路部材回りにころがり軸受を
介して回転ステージの中空回転軸を回転自在に支持する
ものであっても良い。この場合にも、吸引路部材と回転
ステージの中空回転軸とは、空隙を介して非接触配置さ
れるものとなる。
In the embodiment of the present invention, the suction path member may be fixed to a gantry, and the hollow rotary shaft of the rotary stage may be rotatably supported around the suction path member via a rolling bearing. Also in this case, the suction path member and the hollow rotary shaft of the rotary stage are arranged in a non-contact manner via a gap.

【0043】[0043]

【発明の効果】以上のように本発明によれば、位置修正
装置において、回転ステージの吸着孔に真空力を及ぼす
吸引路部材と該回転ステージとの接触摩耗を防止し、両
者間の摩耗に起因する回転ステージの吸着力の変動を防
止することができる。
As described above, according to the present invention, in the position correcting apparatus, contact abrasion between the suction path member exerting a vacuum force on the suction hole of the rotary stage and the rotary stage is prevented, and wear between the two is reduced. It is possible to prevent the fluctuation of the suction force of the rotating stage caused by the fluctuation.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は第1実施形態を示す模式図である。FIG. 1 is a schematic diagram showing a first embodiment.

【図2】図2は第2実施形態を示す模式図である。FIG. 2 is a schematic diagram showing a second embodiment.

【図3】図3は従来例を示す模式図である。FIG. 3 is a schematic view showing a conventional example.

【符号の説明】[Explanation of symbols]

10 位置修正装置 11 回転ステージ 13、13A 吸着孔 15 ころがり軸受 21 吸引路部材 21A 雄ねじ部(空隙量調整手段) 21B 吸引孔 31 カム(空隙量調整手段)(切換え移動手段) DESCRIPTION OF SYMBOLS 10 Position correction apparatus 11 Rotation stage 13, 13A Suction hole 15 Rolling bearing 21 Suction path member 21A Male screw part (gap amount adjustment means) 21B Suction hole 31 Cam (gap amount adjustment means) (switching movement means)

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 吸着孔を有する回転ステージを回転自在
に支持し、真空源に接続された吸引路部材の吸引孔に供
給される真空圧を、回転ステージの吸着孔に及ぼす位置
修正装置において、 吸引路部材と回転ステージとが空隙を介して非接触配置
されてなることを特徴とする位置修正装置。
1. A position correcting device for rotatably supporting a rotary stage having a suction hole and applying a vacuum pressure supplied to a suction hole of a suction path member connected to a vacuum source to the suction hole of the rotary stage. A position correcting device, wherein a suction path member and a rotary stage are arranged in a non-contact manner via a gap.
【請求項2】 前記吸引路部材と回転ステージの間の空
隙を調整することにより、回転ステージの吸着孔に及ぶ
真空圧を調整する手段を備えてなる請求項1記載の位置
修正装置。
2. The position correcting apparatus according to claim 1, further comprising means for adjusting a gap between the suction path member and the rotary stage to adjust a vacuum pressure applied to a suction hole of the rotary stage.
【請求項3】 前記回転ステージがころがり軸受により
支持されてなる請求項1又は2記載の位置修正装置。
3. The position correcting device according to claim 1, wherein said rotary stage is supported by a rolling bearing.
【請求項4】 前記吸引路部材が回転ステージの吸着孔
に貫通配置され、 該吸引路部材を回転ステージの表面レベル以下の吸着作
業位置と、該回転ステージの表面レベルより上の突き上
げ位置とに切換え移動可能とする手段を備えてなる請求
項1〜3のいずれかに記載の位置修正装置。
4. The suction path member is disposed so as to penetrate through a suction hole of a rotary stage. The position correcting device according to any one of claims 1 to 3, further comprising means for enabling switching movement.
JP22952898A 1998-07-31 1998-07-31 Position correcting device Withdrawn JP2000058565A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22952898A JP2000058565A (en) 1998-07-31 1998-07-31 Position correcting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22952898A JP2000058565A (en) 1998-07-31 1998-07-31 Position correcting device

Publications (1)

Publication Number Publication Date
JP2000058565A true JP2000058565A (en) 2000-02-25

Family

ID=16893590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22952898A Withdrawn JP2000058565A (en) 1998-07-31 1998-07-31 Position correcting device

Country Status (1)

Country Link
JP (1) JP2000058565A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007035757A (en) * 2005-07-25 2007-02-08 Toshiba Corp Ultrasonic bonding device, ultrasonic bonding method, and method of manufacturing semiconductor component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007035757A (en) * 2005-07-25 2007-02-08 Toshiba Corp Ultrasonic bonding device, ultrasonic bonding method, and method of manufacturing semiconductor component

Similar Documents

Publication Publication Date Title
JP2517178B2 (en) Electronic component mounting method
US6561408B2 (en) Bonding head and component mounting apparatus
JP2004140058A (en) Wafer conveying device and wafer processing apparatus
JP2000058565A (en) Position correcting device
US5287616A (en) Electronic component mounting apparatus
CN108217156A (en) For changing the equipment of the spacing between mobile article
US5331731A (en) Cycloid motion work mounting apparatus
JP5410388B2 (en) Chip holding device, chip supply device and chip mounting machine
JP4659440B2 (en) Substrate transfer device and chip mounting machine
US6497241B1 (en) Hollow core spindle and spin, rinse, and dry module including the same
JP3939044B2 (en) Position correcting apparatus and pellet bonding apparatus using the same
KR200397740Y1 (en) Mask aligner mounted with air bearing
KR100302270B1 (en) Apparatus for dispensing of resin
WO2023149072A1 (en) Substrate-conveying robot
JPH11156771A (en) Substrate conveying device and substrate conveying method
KR100325628B1 (en) Transfer having centering function of semiconductor wafer
JPH0117838B2 (en)
JP2004140057A (en) Wafer positioning device
JP2000252693A (en) Mounting head
JP2003163493A (en) Installing head of electronic part mounting device
JP2000117200A (en) Method and apparatus for cleaning substrate
JP3044840B2 (en) Semiconductor parts joining equipment
JPH11163106A (en) Work rotating and sucking device for work aligner
KR20230082037A (en) industrial robot
JP2002137184A (en) Suction head, suction device and conveying device

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20051004