JP2000045064A - Vapor deposition device for producing recording medium, and crucible for vapor deposition - Google Patents
Vapor deposition device for producing recording medium, and crucible for vapor depositionInfo
- Publication number
- JP2000045064A JP2000045064A JP10210711A JP21071198A JP2000045064A JP 2000045064 A JP2000045064 A JP 2000045064A JP 10210711 A JP10210711 A JP 10210711A JP 21071198 A JP21071198 A JP 21071198A JP 2000045064 A JP2000045064 A JP 2000045064A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- crucible
- recording medium
- bottomed
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、磁気テープなどの
記録媒体に真空中で薄膜磁性層などを膜付けする際に、
蒸着用ルツボ内に収容した蒸着材料のスプラッシュ(突
沸)の発生を抑制できる記録媒体製造用蒸着装置及び蒸
着用ルツボに関するものである。The present invention relates to a method for forming a thin film magnetic layer or the like on a recording medium such as a magnetic tape in a vacuum.
The present invention relates to a vapor deposition apparatus for producing a recording medium and a crucible for vapor deposition capable of suppressing generation of splash (bumping) of a vapor deposition material contained in a vapor deposition crucible.
【0002】[0002]
【従来の技術】近年、ディジタル・ビデオ/オーディオ
・テープレコーダなどに適用される磁気テープは、高密
度及び薄膜化を達成するために、とくに、薄膜磁気テー
プが注目されている。2. Description of the Related Art In recent years, thin-film magnetic tapes have attracted attention as magnetic tapes applied to digital video / audio tape recorders and the like in order to achieve high density and thin film.
【0003】上記薄膜磁気テープは、現在、磁性膜が斜
方蒸着法により形成されている。これは、具体的には、
記録媒体製造用蒸着装置内でピアス型電子銃などから発
射された電子ビームを蒸着用ルツボ内のCo又はCoN
iなどの蒸着材料(以下、金属磁性材料と記す)に照射
し、これらの金属磁性材料を溶融して蒸発させ、酸素を
導入しながらPET,PEN,PI(ポリイミド),P
A(ポリアミド)などのベースフィルム上に付着させる
ことにより、CoO又はCoNiOなどよりなる薄膜磁
性層をベースフィルム上に膜付けしている。At present, the thin film magnetic tape has a magnetic film formed by an oblique evaporation method. This is, specifically,
An electron beam emitted from a pierce-type electron gun or the like in a vapor deposition device for producing a recording medium is used to deposit Co or CoN in a crucible for vapor deposition.
i, etc., to irradiate a vapor-deposited material (hereinafter referred to as a metal magnetic material) to melt and evaporate the metal magnetic material, and to introduce PET, PEN, PI (polyimide), P while introducing oxygen.
A thin film magnetic layer made of CoO, CoNiO, or the like is formed on the base film by attaching it to a base film such as A (polyamide).
【0004】図5は斜方蒸着法を適用した一般的な記録
媒体製造用蒸着装置の構成を示した構成図、図6(A)
〜(C)は図5に示した記録媒体製造用蒸着装置内に設
置される従来の蒸着用ルツボを説明するための図であ
り、(A)は外観斜視図,(B)は(A)のX−X断面
図,(C)は(A)のY−Y断面図である。FIG. 5 is a structural view showing the structure of a general vapor deposition apparatus for producing a recording medium to which the oblique vapor deposition method is applied, and FIG.
5A to 5C are diagrams for explaining a conventional vapor deposition crucible installed in the vapor deposition apparatus for manufacturing a recording medium shown in FIG. 5, wherein FIG. 5A is an external perspective view and FIG. (C) is a cross-sectional view taken along the line YY in (A) of FIG.
【0005】図5に示した如く、斜方蒸着法を適用した
一般的な記録媒体製造用蒸着装置(以下、装置と記す)
1の真空槽2内は真空状態に保たれている。この真空槽
2内には、テープ供給ロール3と、テープ巻取ロール4
と、テープガイドロール5,6と、冷却キャンロール7
とが回転自在に配置されており、これらのロール3〜7
に沿って薄膜磁気テープ(記録媒体)8の記録媒体素材
となるベースフィルム8aが巻回され、テープ供給ロー
ル3からテープ巻取ロール4に向かってベースフィルム
8aが図中矢印に示した方向に走行している。この際、
冷却キャンロール7の内部には、冷却器(図示せず)が
設置され、蒸着時にベースフィルム8aの温度上昇によ
る変形などを抑制している。[0005] As shown in FIG. 5, a general vapor deposition apparatus for manufacturing a recording medium to which the oblique vapor deposition method is applied (hereinafter, referred to as an apparatus).
The inside of one vacuum chamber 2 is kept in a vacuum state. In the vacuum chamber 2, a tape supply roll 3 and a tape winding roll 4
, Tape guide rolls 5 and 6 and cooling can roll 7
And the rolls 3 to 7 are rotatably arranged.
A base film 8a serving as a recording medium material of the thin film magnetic tape (recording medium) 8 is wound along the base film 8a, and the base film 8a moves from the tape supply roll 3 to the tape take-up roll 4 in a direction indicated by an arrow in the drawing. I am running. On this occasion,
A cooler (not shown) is provided inside the cooling can roll 7, and suppresses deformation and the like of the base film 8a due to a temperature rise during vapor deposition.
【0006】また、真空槽2内で冷却キャンロール7の
斜め下方には、ルツボ材料としてMgO(マグネシア)
を用いて箱状に形成した蒸着用ルツボ(以下、ルツボと
記す)9が設置されている。上記したルツボ9には、上
面9a側にCo又はCoNiなどの金属磁性材料10を
収容した有底収容部9bが形成され、且つ、有底収容部
9b内の底面9b1は平坦に形成されている。この際、
ルツボ9の有底収容部9bの長手方向(紙面に垂直方
向)がベースフィルム8aの幅方向(紙面に垂直方向)
に対応するように設置されている。[0006] In the vacuum chamber 2, obliquely below the cooling can roll 7, MgO (magnesia) is used as a crucible material.
A crucible for vapor deposition (hereinafter, referred to as a crucible) 9 formed in a box shape by using is provided. In the above-mentioned crucible 9, a bottomed accommodation portion 9b accommodating a metal magnetic material 10 such as Co or CoNi is formed on the upper surface 9a side, and a bottom surface 9b1 in the bottomed accommodation portion 9b is formed flat. . On this occasion,
The longitudinal direction (vertical direction to the paper surface) of the bottomed storage portion 9b of the crucible 9 is the width direction (vertical direction to the paper surface) of the base film 8a.
It is installed to correspond to.
【0007】また、真空槽2の側壁2aには、ルツボ9
内に収容した金属磁性材料10を溶融して蒸発させるピ
アス型電子銃11が取り付けられている。このピアス型
電子銃11は、ルツボ9の有底収容部9bの中心部に向
かって電子ビーム12が出射されており、有底収容部9
b内の金属磁性材料10を溶融してベースフィルム8a
側に蒸発させている。A crucible 9 is provided on the side wall 2a of the vacuum chamber 2.
A piercing type electron gun 11 for melting and evaporating the metal magnetic material 10 housed therein is attached. In this pierced electron gun 11, the electron beam 12 is emitted toward the center of the bottomed housing 9b of the crucible 9, and the bottomed housing 9
b) to melt the metallic magnetic material 10 in the base film 8a.
Has evaporated to the side.
【0008】また、ベースフィルム8aの走行時に、ル
ツボ9から蒸着した金属磁性材料10のベースフィルム
8aに対する最大入射角θmaxを入射角規制マスク1
3により、また、同じく最小入射角θminを入射角規
制マスク14により、それぞれ所定の角度に設定してい
る。また、入射角規制マスク14の内側にはノズル14
Nが取り付けられており、このノズル14Nから酸素が
蒸発した金属磁性材料10に向かって射出されている。When the base film 8a runs, the maximum incident angle θmax of the metal magnetic material 10 deposited from the crucible 9 with respect to the base film 8a is determined by the incident angle limiting mask 1.
3, and the minimum incident angle θmin is set to a predetermined angle by the incident angle regulating mask 14, respectively. Further, a nozzle 14 is provided inside the incident angle regulating mask 14.
N is attached, and oxygen is injected from the nozzle 14N toward the evaporated metal magnetic material 10.
【0009】また、ピアス型電子銃11から出射される
電子ビーム12は、軌道に偏向磁界を印加するための偏
向マグネット15と、ルツボ9に近設した偏向マグネッ
ト16とにより制御されている。従って、ルツボ9の有
底収容部9bの長手方向に電子ビーム12を走査するこ
とにより、蒸発したCo又はCoNiなどの金属磁性材
料10がベースフィルム8aの幅方向にCoO又はCo
NiOなどよりなる薄膜磁性層として膜付けされ、これ
をベースフィルム8aの長さ方向に繰り返すことにより
長尺な薄膜磁気テープ8がテープ巻取ロール4側に得ら
れている。The electron beam 12 emitted from the pierce-type electron gun 11 is controlled by a deflection magnet 15 for applying a deflection magnetic field to a trajectory and a deflection magnet 16 provided near the crucible 9. Therefore, by scanning the electron beam 12 in the longitudinal direction of the bottomed accommodating portion 9b of the crucible 9, the evaporated metal magnetic material 10 such as Co or CoNi is deposited on the base film 8a in the width direction of CoO or CoNi.
The film is formed as a thin film magnetic layer made of NiO or the like, and this is repeated in the length direction of the base film 8a to obtain a long thin film magnetic tape 8 on the tape winding roll 4 side.
【0010】[0010]
【発明が解決しようとする課題】ところで、装置1の真
空槽2内でベースフィルム8a上に薄膜磁性層を膜付け
して薄膜磁気テープ8を製造する際、金属磁性材料10
がルツボ9内で溶融されるに際しては、金属磁性材料1
0中に含有されている酸化物やカーボンなどの高融点不
純物、あるいは、金属磁性材料10の内部の微小な空孔
に閉じこめられていた空気やガスによって、スプラッシ
ュ(突沸)が発生してしまうことがある。When a thin film magnetic layer is formed on the base film 8a in the vacuum chamber 2 of the apparatus 1 to manufacture the thin film magnetic tape 8, the metal magnetic material 10
Is melted in the crucible 9 when the metallic magnetic material 1 is melted.
Splash (bumping) caused by high-melting impurities such as oxides and carbon contained in oxygen, or air or gas trapped in minute pores inside the metal magnetic material 10. There is.
【0011】この際、図6(A)〜(C)に示した如
く、箱状のルツボ9は、上面9a側に金属磁性材料10
を収容するための有底収容部9bが形成されており、こ
の有底収容部9b内の底面9b1が平坦に形成されてい
るため、溶融した金属磁性材料10の表面全体に酸化物
やカーボンなどの高融点不純物が乖離している。At this time, as shown in FIGS. 6A to 6C, the box-shaped crucible 9 has a metal magnetic material 10 on the upper surface 9a side.
Is formed, and the bottom surface 9b1 in the bottomed housing portion 9b is formed flat, so that the entire surface of the molten metal magnetic material 10 is covered with oxide, carbon, or the like. Are separated from each other.
【0012】この際、ルツボ9の有底収容部9bで溶融
した金属磁性材料10にスプラッシュが発生すると、ベ
ースフィルム8a上に膜付けした薄膜磁性層が不良とな
り、この薄膜磁気テープ8をディジタル・ビデオ/オー
ディオ・テープレコーダなどで記録/再生した場合に、
記録/再生した信号にドロップアウトやエラーが発生す
る原因となる。At this time, if a splash occurs in the molten metal magnetic material 10 in the bottomed accommodating portion 9b of the crucible 9, the thin film magnetic layer formed on the base film 8a becomes defective, and the thin film magnetic tape 8 is When recording / reproducing with a video / audio / tape recorder,
This may cause a dropout or error in the recorded / reproduced signal.
【0013】したがって、スプラッシュの発生を抑制す
るには、従来はピアス型電子銃11から出射される電子
ビーム12の強度を弱めて酸化物や高融点不純物に対す
る衝撃を弱めるなどの方法を取っている。しかしなが
ら、上記したスプラッシュの抑制対策方法では、薄膜磁
気テープ8の生産効率を上げることに対して十分考慮さ
れていない。Therefore, in order to suppress the generation of the splash, conventionally, a method of weakening the intensity of the electron beam 12 emitted from the pierced electron gun 11 to reduce the impact on oxides and high melting point impurities is adopted. . However, the above-described method for suppressing the splash does not sufficiently take into consideration the enhancement of the production efficiency of the thin-film magnetic tape 8.
【0014】[0014]
【課題を解決するための手段】本発明は上記課題に鑑み
てなされたものであり、第1の発明は、内部を真空状態
に保たれた真空槽と、前記真空槽内に設けられ、記録媒
体用素材を装着する手段と、前記真空槽内に設置され、
前記記録媒体用素材に膜付けするための蒸着材料を収容
した有底収容部を上面側に形成した蒸着用ルツボと、前
記真空槽に取り付けられ、前記蒸着用ルツボの有底収容
部の略中心部に向かって電子ビームを出射して、該有底
収容部内の前記蒸着材料を溶融して前記記録媒体用素材
側に蒸発させる電子銃とを備えた記録媒体製造用蒸着装
置において、前記蒸着用ルツボの有底収容部内の底面の
略中心部を周辺の底面より突出させて、前記蒸着材料の
スプラッシュの発生を抑制することを特徴とする記録媒
体製造用蒸着装置である。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and a first invention is a vacuum chamber having an inside maintained in a vacuum state, and a vacuum chamber provided in the vacuum chamber and having a recording medium. Means for mounting a medium material, installed in the vacuum chamber,
A crucible for vapor deposition formed on the upper surface side with a bottomed accommodation portion for accommodating a vapor deposition material for applying a film to the recording medium material; and a substantially central portion of the bottomed accommodation portion of the crucible for vapor deposition attached to the vacuum chamber. An electron gun that emits an electron beam toward the recording portion and melts the vapor deposition material in the bottomed storage portion and evaporates the vaporized material toward the recording medium material. A vapor deposition apparatus for manufacturing a recording medium, wherein a substantially central portion of a bottom surface in a bottomed storage portion of a crucible is projected from a peripheral bottom surface to suppress a splash of the vapor deposition material.
【0015】また、第2の発明は、蒸着装置内に設置さ
れ、蒸着材料を収容した有底収容部を上面側に形成し、
該有底収容部内の底面の略中心部を周辺の底面より突出
させたことを特徴とする蒸着用ルツボである。According to a second aspect of the present invention, there is provided a bottomed storage section which is installed in a vapor deposition apparatus and stores a vapor deposition material on an upper surface side,
A vapor deposition crucible characterized in that a substantially central portion of a bottom surface in the bottomed housing portion protrudes from a peripheral bottom surface.
【0016】[0016]
【発明の実施の形態】以下に本発明に係る記録媒体製造
用蒸着装置及び蒸着用ルツボの一実施例を図1乃至図4
を参照して詳細に説明する。1 to 4 show an embodiment of a vapor deposition apparatus and a crucible for vapor deposition for producing a recording medium according to the present invention.
This will be described in detail with reference to FIG.
【0017】図1は本発明に係る記録媒体製造用蒸着装
置の構成を示した構成図、図2は本発明に係る蒸着用ル
ツボを説明するための図であり、(A)は外観斜視図,
(B)は(A)のX−X断面図,(C)は(A)のY−
Y断面図、図3は本発明に係る蒸着用ルツボの動作を説
明するためのY−Y断面図である。FIG. 1 is a structural view showing the structure of a vapor deposition apparatus for producing a recording medium according to the present invention. FIG. 2 is a view for explaining a vapor crucible according to the present invention. ,
(B) is a sectional view taken along line XX of (A), and (C) is a sectional view taken along line Y- of (A).
FIG. 3 is a sectional view taken along the line Y-Y for explaining the operation of the crucible for vapor deposition according to the present invention.
【0018】尚、説明の便宜上、先に従来例で示した構
成部材と同一構成部材に対しては同一の符号を付して適
宜説明し、且つ、従来例の構成部材の異なる構成部材に
新たな符号を付す共に、この実施例では従来例と異なる
点を中心に説明する。For the sake of convenience, the same components as those shown in the conventional example will be denoted by the same reference numerals and will be described as appropriate, and new components different from those in the conventional example will be described. In this embodiment, different points from the conventional example will be mainly described.
【0019】図1に示した本発明に係る記録媒体製造用
蒸着装置(以下、装置と記す)20は、先に図5を用い
て説明した一般的な記録媒体製造用蒸着装置1に対し
て、後述する蒸着用ルツボ(以下、ルツボと記す)21
の形状が一部異なるだけであり、従来と同様にルツボ2
1は冷却キャンロール7の斜め下方に設置されている。
その他の構成部材は従来と同一であり、真空槽2内に薄
膜磁気テープ(記録媒体)8のベースフィルム(記録媒
体素材)8aを装着する手段としてテープ供給ロール3
と、テープ巻取ロール4と、テープガイドロール5,6
と、冷却キャンロール7とが回転自在に配置されてお
り、真空槽2の側壁2aにルツボ21内の金属磁性材料
10(蒸着材料)を溶融してベースフィルム8a側に蒸
発させるピアス型電子銃11が取り付けられている。The vapor deposition apparatus for producing a recording medium (hereinafter referred to as an apparatus) 20 according to the present invention shown in FIG. 1 is different from the general vapor deposition apparatus 1 for producing a recording medium described above with reference to FIG. , A crucible for vapor deposition (hereinafter referred to as a crucible) 21 described later
The shape of the crucible 2 is the same as before
Reference numeral 1 is installed diagonally below the cooling can roll 7.
The other components are the same as the conventional ones, and the tape supply roll 3 is used as a means for mounting the base film (recording medium material) 8a of the thin film magnetic tape (recording medium) 8 in the vacuum chamber 2.
, A tape winding roll 4, and tape guide rolls 5, 6
And a cooling can roll 7 are rotatably arranged, and a pierce-type electron gun that melts the metal magnetic material 10 (evaporation material) in the crucible 21 on the side wall 2a of the vacuum chamber 2 and evaporates it to the base film 8a side 11 is attached.
【0020】ここで、図2(A)〜(C)に拡大して示
した如く、本発明に係る蒸着用ルツボ)21は、従来と
同様に、MgO(マグネシア)を用いて形成されてお
り、且つ、薄膜磁気テープ8のベースフィルム8aに薄
膜磁性層を膜付けするための金属磁性材料10を収容し
た有底収容部21bが上面21a側に形成されている。Here, as shown in FIGS. 2A to 2C in an enlarged manner, the evaporation crucible 21 according to the present invention is formed using MgO (magnesia) as in the prior art. In addition, a bottomed accommodation portion 21b accommodating a metal magnetic material 10 for forming a thin film magnetic layer on the base film 8a of the thin film magnetic tape 8 is formed on the upper surface 21a side.
【0021】そして、真空槽2の側壁2aに取り付けた
ピアス型電子銃11から電子ビーム12がルツボ21の
有底収容部21bの中心部に向かって出射され、この電
子ビーム12によって有底収容部21b内の金属磁性材
料10を溶融して蒸発させている。Then, an electron beam 12 is emitted from the pierced electron gun 11 attached to the side wall 2a of the vacuum chamber 2 toward the center of the bottomed receiving portion 21b of the crucible 21. The metal magnetic material 10 in 21b is melted and evaporated.
【0022】ここで、従来と異なる点は、ルツボ21の
上面21a側に形成した有底収容部21bの底面21b
1の略中心部を、周辺の底面より突出させて突出部21
b2を形成していることである。このように、ルツボ2
1の有底収容部21bの底面21b1の略中心部に突出
部21b2を形成することにより、突出部21b2の熱
容量が小さくなるので、突出部21b2は他の部位より
温度が高くなる。Here, the point different from the conventional one is that the bottom surface 21b of the bottomed storage portion 21b formed on the upper surface 21a side of the crucible 21
1 is made to protrude from the peripheral bottom surface so that
b2 is formed. Thus, crucible 2
By forming the protruding portion 21b2 substantially at the center of the bottom surface 21b1 of the bottomed receiving portion 21b, the heat capacity of the protruding portion 21b2 is reduced, so that the temperature of the protruding portion 21b2 becomes higher than other portions.
【0023】この結果、図3に示したように、ルツボ2
1の有底収容部21b内では中央部から外周部(側壁
部)に向かって溶融した金属磁性材料10の対流が起き
る。そして、ルツボ21の有底収容部21b内では、溶
融した金属磁性材料10中でスプラッシュ(突沸)の要
因となる酸化物や高融点不純物が、有底収容部21b内
の側壁部21b3,21b4の方向に移動し、側壁部2
1b3,21b4の上部に堆積する。従って、ルツボ2
1の有底収容部21bの中心部に向かってピアス型電子
銃11から出射された電子ビーム12は、側壁部21b
3,21b4の上部に堆積した酸化物や高融点不純物に
当たらないので、スプラッシュ(突沸)の発生を抑制す
ることができる。従って、従来の場合と比較して、ピア
ス型電子銃11から出射される電子ビーム12の強度を
弱める必要がなくなり、電子ビーム12の強度を高めた
ままで薄膜磁気テープ8のベースフィルム8aに薄膜磁
性層を膜付けすることができるので、薄膜磁気テープ8
の生産効率を上げることが可能となる。As a result, as shown in FIG.
In the one bottomed storage portion 21b, convection of the molten metal magnetic material 10 occurs from the central portion toward the outer peripheral portion (side wall portion). Then, in the bottomed receiving portion 21b of the crucible 21, an oxide or a high melting point impurity which causes a splash (bumping) in the molten metal magnetic material 10 is removed from the side wall portions 21b3 and 21b4 of the bottomed receiving portion 21b. In the direction of the side wall 2
It is deposited on top of 1b3 and 21b4. Therefore, crucible 2
The electron beam 12 emitted from the pierce-type electron gun 11 toward the center of the bottomed receiving portion 21b is formed on the side wall portion 21b.
Since it does not hit the oxide or the high melting point impurity deposited on the upper part of 3, 21b4, the generation of splash (bumping) can be suppressed. Therefore, it is not necessary to weaken the intensity of the electron beam 12 emitted from the pierce-type electron gun 11 as compared with the conventional case, and the base film 8a of the thin-film magnetic tape 8 remains thin while the intensity of the electron beam 12 is increased. Since the layers can be coated, the thin film magnetic tape 8
Production efficiency can be increased.
【0024】<実施例>図4は本発明に係る蒸着用ルツ
ボの形状と比較例の形状とで、蒸着材料(金属磁性材
料)のスプラッシュの発生状態を示した図である。<Embodiment> FIG. 4 is a view showing a state of generation of a splash of a vapor deposition material (metal magnetic material) in the shape of the crucible for vapor deposition according to the present invention and the shape of a comparative example.
【0025】図2(B),(C)において、aはルツボ
21に形成した有底収容部21bの長手方向の寸法、b
はルツボ21に形成した有底収容部21bの短手方向の
寸法、cはルツボ21の上面21aから有底収容部21
b内の底面21b1までの深さ寸法、dは底面21b1
の略中心部に形成した突出部21b2の底面21b1を
基準とした高さ寸法である。尚、ルツボ21の有底収容
部21bの長手方向(紙面に垂直方向)がベースフィル
ム8aの幅方向(紙面に垂直方向)に対応するように設
置されている点は従来と同様である。2 (B) and 2 (C), a is a longitudinal dimension of the bottomed storage portion 21b formed on the crucible 21, b
Is the dimension in the short direction of the bottomed storage portion 21b formed on the crucible 21, and c is the distance from the upper surface 21a of the crucible 21 to the bottomed storage portion 21b.
The depth dimension to the bottom 21b1 in b, d is the bottom 21b1
Is a height dimension based on the bottom surface 21b1 of the protruding portion 21b2 formed substantially at the center. In addition, it is the same as the conventional one that the longitudinal direction (vertical direction to the paper surface) of the bottomed accommodation portion 21b of the crucible 21 corresponds to the width direction (vertical direction to the paper surface) of the base film 8a.
【0026】実施例及びこの実施例に対して比較する比
較例(従来例)では、ルツボ21の有底収容部21bの
各寸法寸を以下の如く設定している。In the embodiment and the comparative example (conventional example) which is compared with this embodiment, the respective dimensions of the bottomed accommodation portion 21b of the crucible 21 are set as follows.
【0027】即ち、実施例,比較例共に、有底収容部2
1bの長手方向の寸法aを600mmに、短手方向の寸
法bを150mmに、深さ法cを70mmにそれぞれ固
定し、一方、有底収容部21bの底面21b1の略中心
部に形成した突出部21b2の高さ寸法dを、比較例で
は0mmに、実施例では10mm,20mm,30m
m,40mm,50mmに可変して、5種類の実験を行
った。That is, in both the embodiment and the comparative example,
The dimension a in the longitudinal direction of 1b is fixed to 600 mm, the dimension b in the transversal direction is fixed to 150 mm, and the depth method c is fixed to 70 mm. On the other hand, the protrusion formed in the substantially central portion of the bottom surface 21b1 of the bottomed storage portion 21b. The height d of the portion 21b2 is set to 0 mm in the comparative example, and 10 mm, 20 mm, and 30 m in the example.
Five types of experiments were performed while varying the parameters to m, 40 mm, and 50 mm.
【0028】この際、ルツボ21の材料にMgO(マグ
ネシア)を用い、且つ、ルツボ21内の金属磁性材料1
0としてCo(コバルト)を用いて、電子ビーム12を
ルツボ21の有底収容部21bの略中心部の1点に絞っ
て50kWのパワーで供給した。At this time, MgO (magnesia) is used as the material of the crucible 21, and the metallic magnetic material 1 in the crucible 21 is used.
Using Co (cobalt) as 0, the electron beam 12 was supplied to the crucible 21 at a power of 50 kW by focusing on one point substantially at the center of the bottomed accommodating portion 21b.
【0029】そして、真空槽2のルツボ監視窓(図示せ
ず)より、ルツボ21の有底収容部21b内に収納した
金属磁性材料10のスプラッシュの発生状態を監視し
た。ここでは、図4に示した如く、目視観察できるスプ
ラッシュの発生個数を毎分10個以上を×,2〜9個を
△,1個以下を○として判定した。この結果、有底収容
部21bの底面21b1の略中心部に突出部21b2を
形成することにより、溶融した金属磁性材料10のスプ
ラッシュの発生を抑制することが判明した。Then, from the crucible monitoring window (not shown) of the vacuum chamber 2, the state of the splash of the metallic magnetic material 10 stored in the bottomed storage portion 21b of the crucible 21 was monitored. Here, as shown in FIG. 4, the number of splashes that can be visually observed was determined as × for 10 or more per minute, Δ for 2 to 9 and ○ for 1 or less. As a result, it was found that by forming the protruding portion 21b2 substantially at the center of the bottom surface 21b1 of the bottomed accommodation portion 21b, generation of the splash of the molten metal magnetic material 10 was suppressed.
【0030】尚、記録媒体製造用蒸着装置20内に装着
される記録媒体素材として円盤状のディスクでも良い。
更に、蒸着装置20内に設置される蒸着用ルツボ21は
蒸着可能ないかなる素材にも適用でき、その外観形状も
限定されるものでもない。Incidentally, a disk-shaped disk may be used as a recording medium material mounted in the vapor deposition apparatus 20 for producing a recording medium.
Furthermore, the crucible 21 for vapor deposition installed in the vapor deposition device 20 can be applied to any material capable of vapor deposition, and its external shape is not limited.
【0031】[0031]
【発明の効果】以上詳述した本発明に係る記録媒体製造
用蒸着装置及び蒸着用ルツボによると、真空槽内に設置
された蒸着用ルツボの有底収容部内の底面の略中心部を
周辺の底面より突出させているので、有底収容部内で溶
融した蒸着材料の対流が起き、蒸着材料中でスプラッシ
ュ(突沸)の要因となる酸化物や高融点不純物が、有底
収容部内の側壁部の方向に移動して側壁部の上部に堆積
するため、電子銃から出射した電子ビームが側壁部の上
部に堆積した酸化物や高融点不純物に当たらないので、
スプラッシュの発生を抑制することができる。According to the vapor deposition apparatus and the crucible for producing a recording medium according to the present invention described in detail above, the substantially central portion of the bottom surface in the bottomed accommodating portion of the vapor deposition crucible installed in the vacuum chamber is surrounded by the peripheral portion. Because it protrudes from the bottom surface, convection of the vapor deposition material that has melted in the bottomed container occurs, and oxides and high-melting impurities that cause splash (bumping) in the vaporized material are removed from the side walls in the bottomed container. The electron beam emitted from the electron gun does not hit the oxide or high melting point impurities deposited on the upper part of the side wall because it moves in the direction and deposits on the upper part of the side wall.
Splash generation can be suppressed.
【図1】本発明に係る記録媒体製造用蒸着装置の構成を
示した構成図である。FIG. 1 is a configuration diagram showing a configuration of a vapor deposition apparatus for manufacturing a recording medium according to the present invention.
【図2】本発明に係る蒸着用ルツボを説明するための図
であり、(A)は外観斜視図,(B)は(A)のX−X
断面図,(C)は(A)のY−Y断面図である。2A and 2B are views for explaining a crucible for vapor deposition according to the present invention, wherein FIG. 2A is an external perspective view, and FIG. 2B is XX of FIG.
FIG. 3C is a cross-sectional view of FIG.
【図3】本発明に係る蒸着用ルツボの動作を説明するた
めのY−Y断面図である。FIG. 3 is a YY cross-sectional view for explaining the operation of the crucible for vapor deposition according to the present invention.
【図4】本発明に係る蒸着用ルツボの形状と比較例の形
状とで、蒸着材料(金属磁性材料)のスプラッシュの発
生状態を示した図である。FIG. 4 is a view showing a state of occurrence of a splash of a deposition material (metal magnetic material) in the shape of the crucible for vapor deposition according to the present invention and the shape of a comparative example.
【図5】斜方蒸着法を適用した一般的な記録媒体製造用
蒸着装置の構成を示した構成図である。FIG. 5 is a configuration diagram showing a configuration of a general vapor deposition apparatus for manufacturing a recording medium to which an oblique vapor deposition method is applied.
【図6】(A)〜(C)は図5に示した記録媒体製造用
蒸着装置内に設置される従来の蒸着用ルツボを説明する
ための図であり、(A)は外観斜視図,(B)は(A)
のX−X断面図,(C)は(A)のY−Y断面図であ
る。6A to 6C are views for explaining a conventional crucible for vapor deposition installed in the vapor deposition apparatus for manufacturing a recording medium shown in FIG. 5, and FIG. 6A is an external perspective view, (B) is (A)
(C) is a cross-sectional view taken along the line YY in (A) of FIG.
2…真空槽、3…テープ供給ロール、4…テープ巻取ロ
ール、5…テープガイドロール、6…テープガイドロー
ル、7…冷却キャンロール、8…記録媒体(薄膜磁気テ
ープ)、8a…記録媒体素材(ベースフィルム)、10
…蒸着材料(金属磁性材料)、11…電子銃(ピアス型
電子銃)、12…電子ビーム、20…記録媒体製造用蒸
着装置、21…蒸着用ルツボ(ルツボ)、21a…上
面、21b…有底収容部、21b1…底面、21b2…
突出部、21b3,21b4…側壁部。2: vacuum chamber, 3: tape supply roll, 4: tape take-up roll, 5: tape guide roll, 6: tape guide roll, 7: cooling can roll, 8: recording medium (thin film magnetic tape), 8a: recording medium Material (base film), 10
... Evaporation material (metal magnetic material), 11 ... Electron gun (pierce type electron gun), 12 ... Electron beam, 20 ... Evaporation apparatus for manufacturing recording medium, 21 ... Crucible for evaporation (crucible), 21a ... Top surface, 21b ... Yes Bottom accommodation section, 21b1 ... bottom face, 21b2 ...
Projecting portions, 21b3, 21b4 ... side wall portions.
Claims (2)
段と、 前記真空槽内に設置され、前記記録媒体用素材に膜付け
するための蒸着材料を収容した有底収容部を上面側に形
成した蒸着用ルツボと、 前記真空槽に取り付けられ、前記蒸着用ルツボの有底収
容部の略中心部に向かって電子ビームを出射して、該有
底収容部内の前記蒸着材料を溶融して前記記録媒体用素
材側に蒸発させる電子銃とを備えた記録媒体製造用蒸着
装置において、 前記蒸着用ルツボの有底収容部内の底面の略中心部を周
辺の底面より突出させて、前記蒸着材料のスプラッシュ
の発生を抑制することを特徴とする記録媒体製造用蒸着
装置。A vacuum chamber whose inside is maintained in a vacuum state; a means provided in the vacuum chamber for mounting a material for a recording medium; and a film installed in the vacuum chamber and forming a film on the material for a recording medium. A crucible for vapor deposition formed on the upper surface side with a bottomed accommodation portion for accommodating an evaporation material for attachment, attached to the vacuum chamber, and an electron beam directed substantially toward the center of the bottomed accommodation portion of the crucible for evaporation. An electron gun that emits light and melts the vapor deposition material in the bottomed storage part and evaporates the material to the recording medium material side, wherein the vapor deposition crucible has a bottomed storage part. A vapor deposition apparatus for manufacturing a recording medium, wherein a substantially central portion of the bottom surface is made to protrude from a peripheral bottom surface to suppress a splash of the vapor deposition material.
た有底収容部を上面側に形成し、該有底収容部内の底面
の略中心部を周辺の底面より突出させたことを特徴とす
る蒸着用ルツボ。2. A bottomed housing portion which is installed in a vapor deposition apparatus and houses a vapor deposition material is formed on an upper surface side, and a substantially central portion of a bottom surface in the bottomed housing portion is protruded from a peripheral bottom surface. Crucible for vapor deposition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10210711A JP2000045064A (en) | 1998-07-27 | 1998-07-27 | Vapor deposition device for producing recording medium, and crucible for vapor deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10210711A JP2000045064A (en) | 1998-07-27 | 1998-07-27 | Vapor deposition device for producing recording medium, and crucible for vapor deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000045064A true JP2000045064A (en) | 2000-02-15 |
Family
ID=16593846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10210711A Pending JP2000045064A (en) | 1998-07-27 | 1998-07-27 | Vapor deposition device for producing recording medium, and crucible for vapor deposition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000045064A (en) |
-
1998
- 1998-07-27 JP JP10210711A patent/JP2000045064A/en active Pending
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