JP2000034600A - Barrel plating device - Google Patents

Barrel plating device

Info

Publication number
JP2000034600A
JP2000034600A JP10200809A JP20080998A JP2000034600A JP 2000034600 A JP2000034600 A JP 2000034600A JP 10200809 A JP10200809 A JP 10200809A JP 20080998 A JP20080998 A JP 20080998A JP 2000034600 A JP2000034600 A JP 2000034600A
Authority
JP
Japan
Prior art keywords
plating
container
contact
work
rotary switch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10200809A
Other languages
Japanese (ja)
Other versions
JP2964245B1 (en
Inventor
Tomokichi Kobayashi
友吉 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KONDO KK
Original Assignee
KONDO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KONDO KK filed Critical KONDO KK
Priority to JP20080998A priority Critical patent/JP2964245B1/en
Application granted granted Critical
Publication of JP2964245B1 publication Critical patent/JP2964245B1/en
Publication of JP2000034600A publication Critical patent/JP2000034600A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a plating device which is simple in structure and is suitable for plating a small number of workpieces. SOLUTION: A vertically long plating container 7 is fitted attachably and detachably on the rear surface of a rotary board 6 disposed in a frame 1 mounted on a plating tank with the center axis line of rotation of the plating container 7 tilted to a vertical line. In the container 7, the lower part of a cylindrical body 7a, the upper end of which is constituted to be an ontlet/inlet for the workpiece, is provided with a workpiece housing chamber 7b constituted of a resin net, and a plurality of electrodes are arranged along the bottom peripheral surface of the workpiece housing chamber 7b. A contact plate 11a, in which an electrode is disposed on the rotary board 6, forms a rotary switch 11 together with a contact shoe 13, which is disposed on the frame 1. The electrodes, which successively move on the lower side in accordance with the rotation of the plating container 7, are energized with the rotary switch 11. In such a constitution, the rotary switch 11, etc., is allowed to be formed in a position where the switch 11, etc., is not immersed in a plating liq. in the plating tank.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、きわめて少量の小
型のワーク(主として電子部品)をめっきするに適した
バレルめっき装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrel plating apparatus suitable for plating a very small amount of small work (mainly electronic parts).

【0002】[0002]

【従来の技術】 電子部品等の小型で且つ少量のワーク
をめっきするに使用するバレルめっき装置は、例えば特
開平7ー331497号公報に知られている。
2. Description of the Related Art A barrel plating apparatus used for plating a small and small amount of a work such as an electronic component is known from, for example, JP-A-7-331497.

【0003】[0003]

【発明が解決しようとする課題】このものは、上面を開
放した開放部の開口直径が70mm、深さが80mmの極め
て小型の回転容器aをアクリル樹脂板等で構成し、回転
容器aの周面に無数の小孔を穿設し且つ回転容器aの底
面に周方向に沿って複数個の電極bを配設し、しかも回
転容器a内でワークが良好に転動撹拌されるように、該
回転容器aを傾斜させてめっき槽の漬浸させている。こ
のため、ワークは回転容器aの片隅に片寄り、電極bの
内、ワ−クと接触しない電極ができ、ワークと接触しな
い電極bに電流が流れると、該電極bの表面に粗にめっ
きが付き、これが次ぎにワークに接すると剥がれ落ちて
回転容器内のワークに混在し、作業完了後これを選り分
ける作業を必要とし、しかもワークと接触しない電極b
に電流が流れると、ワークに設計した理論通りの電流が
流れなくなる等の不具合を生じる。
In this apparatus, an extremely small rotating container a having an opening having an open upper surface with an opening diameter of 70 mm and a depth of 80 mm is formed of an acrylic resin plate or the like. A number of small holes are drilled on the surface and a plurality of electrodes b are arranged along the circumferential direction on the bottom surface of the rotating container a, and furthermore, the work is tumbled and stirred well in the rotating container a, The plating container is immersed in the rotating container a by inclining the rotating container a. For this reason, the work is offset to one corner of the rotary container a, and an electrode that does not contact the work is formed among the electrodes b. When a current flows to the electrode b that does not contact the work, the surface of the electrode b is roughly plated. When the next contact with the work, it comes off and mixes with the work in the rotating container.
When a current flows through the workpiece, there arises a problem that a current as designed in the work does not flow.

【0004】そこで、このものは、後述する回転部材f
の回転方向に沿って配設した各電極bに連なる端子c1
と、下側に回転してきた電極bと連なる端子c1 が接す
る導電板c2 からなるロータリースイッチcを備えて、
ワークと接触する電極に集中して通電させるようにして
いる。しかし、このものは、台板d上に回転容器台eを
設け、回転容器台e内に設けた回転部材fと前記ロータ
リースイッチcとを設けているため、該回転部材fの軸
受け部g並びにロータリースイッチcを設けた部分にめ
っき液が浸入しないように、これらを収納する液密の収
納室hを設けなければならず、その構造が複雑になると
いう不具合がある。又、このものは、小型であり小量の
ワークをめっきするに適するが、その内容積は一定であ
るため、該回転容器に適した一定量のワークを入れなけ
れば、ワークに設計した理論通りの電流が流れ難くなる
といった不具合がある。本発明はかかる不具合を解消す
ることを課題とする。
[0004] In view of this, a rotating member f described later is used.
Terminal c1 connected to each electrode b disposed along the rotation direction of
And a rotary switch c composed of a conductive plate c2 in contact with a terminal c1 connected to the electrode b rotating downward.
The current is concentrated on the electrode in contact with the workpiece. However, in this case, since the rotary container table e is provided on the base plate d, and the rotary member f provided in the rotary container table e and the rotary switch c are provided, the bearing g of the rotary member f In order to prevent the plating solution from entering the portion where the rotary switch c is provided, a liquid-tight storage chamber h for storing the plating solution must be provided, and there is a problem that the structure becomes complicated. Further, this is small and suitable for plating a small amount of work, but since its internal volume is constant, unless a fixed amount of work suitable for the rotary container is put, it is in accordance with the theory designed for the work. There is a problem that it becomes difficult for the current to flow. An object of the present invention is to solve such a problem.

【0005】[0005]

【課題を解決するための手段】本願の請求項1記載の発
明は、めっき槽に載架する架台に、モータとこれに連動
して回転する回転盤とを設け、該回転盤の下面に縦長の
めっき容器を、該めっき容器の回転中心軸線を垂線に対
し傾斜させて着脱可能に取り付け、該容器は、上端をワ
ークの出入口とした筒体の下部に樹脂網で構成したワー
ク収容室を形成し、該ワーク収容室の底部周面に沿って
複数個の電極を配設し、且つ、夫々の電極と連なる端子
が接続する前記回転盤上に設けた接触板と、めっき槽に
設けたカソード電極と接続する架台に設けた接触子とで
ロタリースイッチを形成し、該ロタリースイッチで、め
っき容器の回転に伴って順次下側に来る電極に通電させ
るようにしたことで、ロタリースイッチ等をめっき槽の
上に設けることができる。本願の請求項2記載の発明
は、ワーク収容室は、底部が中央に至るに従い漸次突出
する錐形とし、該底部をめっき容器内に押し込むとき底
部周囲を起点として底部がめっき容器内に突出するよう
に、可撓性を有し且つ一定の形状を保ち得る樹脂網で構
成したことで、該収容室の大きさをワークの種類、量に
応じて2段に切り替えることができ、これによってワー
クの量が少量でもダミーを使用することなく、ワークと
電極との接触を良好にすることができる。
According to a first aspect of the present invention, a mount mounted on a plating tank is provided with a motor and a rotating disk that rotates in conjunction with the motor, and a vertically long surface is provided on the lower surface of the rotating disk. The plating container is detachably mounted with the center axis of rotation of the plating container inclined with respect to the perpendicular, and the container forms a work accommodating chamber formed of a resin net at the lower part of a cylindrical body having an upper end as a doorway for a work. A contact plate provided on the rotating plate to which a plurality of electrodes are disposed along a bottom peripheral surface of the work accommodating chamber, and terminals connected to the respective electrodes are connected; and a cathode provided in a plating tank. A rotary switch is formed by a contact provided on a base connected to the electrode, and the rotary switch is used to plate the rotary switch and the like by energizing the lower electrode sequentially with the rotation of the plating container. Can be placed on the tank Kill. In the invention according to claim 2 of the present application, the work accommodating chamber has a conical shape whose bottom gradually protrudes toward the center, and when the bottom is pushed into the plating container, the bottom protrudes from the periphery of the bottom as a starting point into the plating container. As described above, by using a resin net having flexibility and being able to maintain a fixed shape, the size of the storage chamber can be switched between two stages according to the type and amount of the work. Even if the amount is small, the contact between the workpiece and the electrode can be improved without using a dummy.

【0006】[0006]

【発明の実施の形態】本発明実施の形態の一例を別紙図
面に付き説明する。図で1はモータ2とこれに連動して
回転する回転軸3とを設けた架台を示し、該架台1は、
モータ2と、モータ2によって駆動される回転軸3、並
びに該モータ2の回転軸上の歯車4並びに該歯車4と噛
み合う回転軸3上の歯車4を収納する上方から見て方形
の収納ボックス1aと、該収納ボックス1aの一側中央
から突出する導電性の腕1bと、収納ボックス1aの他
側の両側端から突出する電気の不良導体からなる一対の
腕1c、1cと、該収納ボックス1aの上方に突出する
持手1dと、収納ボックス1aの底板1aー1の下面設
けた回転盤6とを備える。該回転盤6は、該収納ボック
ス1aの底板1aー1の下面に突出する前記回転軸3の
下部に結着支持させたもので、該回転盤6の下面周囲に
は、下方に突出する鍔部6aを設け、該鍔部6a内にめ
っき容器7の上端を挿し込んで、該回転盤6の周囲から
螺入した蝶ねじ8で回転盤6に締め付け固定して、めっ
き容器7を脱自在に取り付ける。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to the attached drawings. In the figure, reference numeral 1 denotes a mount provided with a motor 2 and a rotating shaft 3 which rotates in conjunction with the motor 2;
A rectangular storage box 1a for storing a motor 2, a rotating shaft 3 driven by the motor 2, a gear 4 on the rotating shaft of the motor 2, and a gear 4 on the rotating shaft 3 meshing with the gear 4. A pair of arms 1c and 1c, each of which includes a conductive arm 1b protruding from the center of one side of the storage box 1a, and a defective electric conductor protruding from both side ends on the other side of the storage box 1a; And a turntable 6 provided on the lower surface of the bottom plate 1a-1 of the storage box 1a. The turntable 6 is attached and supported to the lower part of the rotary shaft 3 projecting from the lower surface of the bottom plate 1a-1 of the storage box 1a. A portion 6a is provided, the upper end of the plating container 7 is inserted into the flange portion 6a, and the plating container 7 is detachable by being fixed to the turntable 6 with a thumb screw 8 screwed in from around the turntable 6. Attach to

【0007】該架台1は、前記導電性の腕1bを、めっ
き槽(図示しない)に設けたカソードバーAに載せると
共に、腕1c、1cをめっき槽(図示しない)に設けた
アノードバーBに載せてめっき槽(図示しない)上に載
架支持させる。
The gantry 1 places the conductive arm 1b on a cathode bar A provided in a plating tank (not shown), and mounts the arms 1c, 1c on an anode bar B provided in a plating tank (not shown). It is mounted and supported on a plating tank (not shown).

【0008】このとき前記収納ボックス1aの底板1a
ー1は、水平に対し傾斜するように設けられ、該底板1
aー1に支持させた回転軸3並びに回転盤6も水平に対
し傾斜した状態に設けられる。
At this time, the bottom plate 1a of the storage box 1a
The bottom plate 1 is provided so as to be inclined with respect to the horizontal.
The rotating shaft 3 and the rotating disk 6 supported by the a-1 are also provided in a state inclined with respect to the horizontal.

【0009】めっき容器7は、上端面をワークの出入口
とした筒体7aの下部に、樹脂網で構成したワーク収容
室7bを設け、該ワーク収容室7bの周囲に等間隔に複
数個の電極9を設けた。これを更に説明すると、該筒体
7aは、内径90mm程度の上部7aー1と、下方に至る
に従い細径となるテーパを備えた中間部7aー2と、内
径60mm程度の下部7aー3とを備える。
The plating container 7 is provided with a work accommodating chamber 7b formed of a resin net below the cylindrical body 7a having an upper end face as an entrance of the work, and a plurality of electrodes at equal intervals around the work accommodating chamber 7b. 9 were provided. To explain this further, the cylindrical body 7a has an upper part 7a-1 having an inner diameter of about 90 mm, an intermediate part 7a-2 having a taper whose diameter becomes smaller toward the lower part, and a lower part 7a-3 having an inner diameter of about 60 mm. Is provided.

【0010】樹脂網で構成したワーク収容室7bは、筒
体7aの下部7aー3に嵌着させる円筒部7bー1と、
その下部に連なり下方に至るに従い広がる断面6角形の
角状筒部7bー2と、周囲から中央に向かって緩やかに
下方に傾斜する凸状を呈する底面7bー3とからなり、
樹脂網は、可撓性を有し且つ一定の形状を保ち得るアク
リル樹脂等で作った網を用い、図4に実線に示す状態か
ら底部をめっき容器7内に押し込むとき、仮想線で示す
ごとく底部周囲を起点として底部がめっき容器内に突出
状態を保ち得るようにした。即ち、収容室7bの大きさ
を、ワークの種類、量に応じて2段に切り替えることが
できるようにした。
The work accommodating chamber 7b made of a resin net has a cylindrical portion 7b-1 fitted to the lower portion 7a-3 of the cylindrical body 7a,
It is composed of a hexagonal cylindrical portion 7b-2 having a hexagonal cross section connected to a lower portion thereof and extending downward, and a bottom surface 7b-3 having a convex shape gently inclined downward from the periphery toward the center.
As the resin net, a net made of an acrylic resin or the like which has flexibility and can maintain a certain shape is used. When the bottom is pushed into the plating container 7 from the state shown by the solid line in FIG. Starting from the periphery of the bottom, the bottom could be kept protruding into the plating container. That is, the size of the accommodation room 7b can be switched between two levels according to the type and amount of the work.

【0011】容器7の外側面に、等間隔に上下方向に沿
わせた6本の金属帯板10を沿わせ、該金属帯板10の
下端を底面7bー3に沿って折り曲げ、該折り曲部に前
記電極9をねじ10bで締め付け固定するようにした。
そして、該金属帯板10の上端を容器7の上端より上方
に突出させ、該上方に突出する金属帯板10の内側に金
属帯板10上端から下方に伸びる接点として機能する板
ばね10aを設けた。
On the outer surface of the container 7, six metal strips 10 are arranged at equal intervals in the vertical direction, and the lower end of the metal strip 10 is bent along the bottom surface 7b-3. The electrode 9 was fixed to the portion by tightening the screw 10b.
The upper end of the metal strip 10 protrudes upward from the upper end of the container 7, and a leaf spring 10a functioning as a contact extending downward from the upper end of the metal strip 10 is provided inside the metal strip 10 protruding upward. Was.

【0012】11は前記回転盤6の上面に設けた接触板
11aと、架台1に設けた収納ボックス1aの底板1a
ー1から突出する接触子11bからなるロータリースイ
ッチを示す。これを詳述すれば、前記回転盤6は、弗素
樹脂等の非導電材で構成され、該回転盤6の上面には、
図2に示すごとく、回転方向に6分割され且つ等しい間
隔を存して前記接触板11aを設け、且つ回転盤6の各
接触板11aの外側縁より外側位置に、夫々透孔12を
設け、各接触板11aの外側縁から突出する突片11a
ー2を、該透孔12の内側縁に沿って折り曲げて該透孔
12内に臨ませる。なお、接触板11aの端縁には面取
り11aー1を施して接触子11bが各接触板11aに
乗移り易いようにした。
Reference numeral 11 denotes a contact plate 11a provided on the upper surface of the turntable 6, and a bottom plate 1a of a storage box 1a provided on the gantry 1.
1 shows a rotary switch including a contact 11b protruding from -1. More specifically, the turntable 6 is made of a non-conductive material such as fluororesin, and the upper surface of the turntable 6 has
As shown in FIG. 2, the contact plates 11 a are provided at six intervals in the rotation direction and at equal intervals, and through holes 12 are provided at positions outside the outer edges of the respective contact plates 11 a of the turntable 6. Projection piece 11a projecting from the outer edge of each contact plate 11a
2 is bent along the inner edge of the through hole 12 so as to face the inside of the through hole 12. In addition, the edge of the contact plate 11a is chamfered 11a-1 so that the contact 11b can be easily transferred to each contact plate 11a.

【0013】かくて、前記めっき容器7を回転盤6の下
面に当接させ、該めっき容器7に設けた金属帯板10の
上端部を該透孔12に挿入させると、金属帯板10に設
けた接点として機能する板ばね10aが、突片11aー
2と接触する。
Thus, when the plating container 7 is brought into contact with the lower surface of the turntable 6 and the upper end of the metal band plate 10 provided in the plating container 7 is inserted into the through hole 12, the metal band plate 10 The leaf spring 10a functioning as a provided contact contacts the protruding piece 11a-2.

【0014】なお、接触子11bは、架台1に設けた前
記導電性の腕1bとリード線を介して接続し、該導電性
の腕1bを介してカソードバーAに接続させる。
The contact 11b is connected to the conductive arm 1b provided on the gantry 1 via a lead wire, and is connected to the cathode bar A via the conductive arm 1b.

【0015】該接触子11bは、底板1aー1を貫通し
て取り付けた導電性の筒体13内に摺動自在に装着し、
該筒体13の上面に施したねじ蓋14と接触子11bと
の間にばね15を介在させて該接触子11bの下面が前
記接触板11aと接触するようにした。接触子11bの
下部には、回転盤6の回転方向に接触板11aの間隔よ
り広い接触面を備えた膨大部11bー1を備え、回転盤
6の回転に伴って、前の接触板11aに接触した状態か
ら次ぎの接触板11aが接触するとき、前後の接触板1
1a、11aに接触した状態を保って、接触子11bは
必ず接触板11aのいずれかと接触されるようにした。
The contact 11b is slidably mounted in a conductive cylinder 13 which is mounted through the bottom plate 1a-1.
A spring 15 is interposed between the screw lid 14 provided on the upper surface of the cylindrical body 13 and the contact 11b so that the lower surface of the contact 11b contacts the contact plate 11a. At the lower part of the contact 11b, there is provided an enlarged portion 11b-1 having a contact surface wider than the interval between the contact plates 11a in the rotation direction of the turntable 6, and with the rotation of the turntable 6, the front contact plate 11a When the next contact plate 11a comes into contact from the contact state, the front and rear contact plates 1
While maintaining the state of contact with 1a, 11a, the contact 11b was always brought into contact with one of the contact plates 11a.

【0016】なお、金属帯板10は樹脂被膜で覆いめっ
き液と触れないようにし、ねじ10aの先端部にはゴム
キャップ16を取り付けてめっき液と触れないようにし
た。次ぎに本装置によるめっき作業を説明する。ワーク
を入れためっき容器7を、回転盤6の下面に当接させ、
蝶ねじ8で回転盤6に締め付け固定すると、金属帯板1
0の上端が透孔12に挿し込まれ、該金属帯板10の上
端に設けた板ばね10bがそれぞれ接触板11aと接続
された状態となる。
The metal strip 10 was covered with a resin film so as not to come into contact with the plating solution, and a rubber cap 16 was attached to the tip of the screw 10a so as not to come into contact with the plating solution. Next, the plating operation by the present apparatus will be described. The plating container 7 containing the work is brought into contact with the lower surface of the turntable 6,
When it is fastened and fixed to the turntable 6 with the thumb screw 8, the metal strip 1
0 is inserted into the through hole 12, and the leaf springs 10b provided at the upper end of the metal strip 10 are connected to the contact plate 11a.

【0017】次ぎに、この架台1を導電性の腕1bでカ
ソードバーAに載せると共に、腕1c、1cをめっき槽
(図示しない)上に設けたアノードバーB上に載せて、
腕1bと腕1c、1cの3か所でめっき槽上に安定した
状態に架台1を載架支持させる。すると、各電極9は接
触子11bを介してカソードバーAに順次接続され、該
接触子11bと接する接触板11aに金属帯板10を介
して通電される。しかも、めっき容器6はその回転中心
を傾斜させて設けたため、該めっき容器7の回転に伴っ
て、撹拌されつつめっきされる。
Next, the gantry 1 is mounted on the cathode bar A with the conductive arm 1b, and the arms 1c and 1c are mounted on the anode bar B provided on a plating tank (not shown).
The gantry 1 is mounted on and supported by the arm 1b and the arms 1c and 1c in a stable state on the plating tank. Then, each electrode 9 is sequentially connected to the cathode bar A via the contact 11b, and electricity is supplied to the contact plate 11a in contact with the contact 11b via the metal strip 10. In addition, since the plating container 6 is provided with its rotation center inclined, the plating is performed while being stirred with the rotation of the plating container 7.

【0018】なお、めっき容器7からワークを取り出し
は、架台1をめっき槽上から取り外し、蝶ねじ8を緩め
て回転盤6の下面から容器7を取り外して行う。
The work is taken out of the plating container 7 by removing the gantry 1 from the plating tank, loosening the thumb screw 8 and removing the container 7 from the lower surface of the turntable 6.

【0019】[0019]

【発明の効果】本願の請求項1に記載の発明によるとき
は、該ワーク収容室を樹脂網で構成したため、樹脂板に
無数の小孔を設けたものに比し、開孔面積の割合を高く
することができて、該ワーク収容室へめっき液の出入り
を良好にして、収容室内のめっき液のイオン濃度を高め
て良好なめっきを行うことができると共に、該容器を駆
動する回転盤、ロータリースイッチ等をめっき液に漬か
らない位置に設けることができて、従来例のようにこれ
らをめっき液に触れないようにシールする必要がなく、
その分構造簡単となる。
According to the first aspect of the present invention, since the work accommodating chamber is formed of a resin net, the ratio of the opening area is smaller than that of the resin plate having innumerable small holes. A rotating plate that drives the container while increasing the ion concentration of the plating solution in the accommodation chamber by improving the inflow and outflow of the plating solution into and out of the work accommodation room. Rotary switches and the like can be provided at positions that are not immersed in the plating solution, and there is no need to seal them so that they do not touch the plating solution as in the conventional example.
That makes the structure simpler.

【0020】本願の請求項2に記載の発明によるとき
は、収容室の大きさをワークの種類、量に応じて2段に
切り替えることができ、これによってワークの量が少量
なときにはダミーを使用することなく、ワークと電極と
の接触を良好にすることができる。
According to the invention described in claim 2 of the present application, the size of the accommodation chamber can be switched between two stages according to the type and amount of the work, and thus, when the amount of the work is small, a dummy is used. Without contact, the contact between the work and the electrode can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施の形態の1例を示す側面図FIG. 1 is a side view showing an example of an embodiment of the present invention.

【図2】 図1のX−X線截断面図FIG. 2 is a sectional view taken along line XX of FIG. 1;

【図3】 ロータリースイッチ部の拡大截断側面図FIG. 3 is an enlarged sectional side view of a rotary switch section.

【図4】 めっき容器の截断側面図FIG. 4 is a cutaway side view of a plating container.

【図5】 従来例のを示す側面図FIG. 5 is a side view showing a conventional example.

【図6】 図5の回転容器台の拡大截断側面図FIG. 6 is an enlarged cut-away side view of the rotary container table of FIG. 5;

【符号の説明】[Explanation of symbols]

1 架台 2 モータ
3 回転軸 6 回転盤 7 めっき容器
9 電極 10 金属帯板 11a 接触板 1
1b 接触子
1 base 2 motor
3 rotating shaft 6 rotating plate 7 plating vessel
9 electrode 10 metal strip 11a contact plate 1
1b Contact

─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成11年5月18日(1999.5.1
8)
[Submission date] May 18, 1999 (1999.5.1
8)

【手続補正1】[Procedure amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】特許請求の範囲[Correction target item name] Claims

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【特許請求の範囲】[Claims]

【手続補正2】[Procedure amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0003[Correction target item name] 0003

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0003】[0003]

【発明が解決しようとする課題】このものは、上面を開
放した開放部の開口直径が70mm、深さが80mmの極め
て小型の回転容器aをアクリル樹脂板等で構成し、回転
容器aの周面に無数の小孔を穿設し且つ回転容器aの底
面に周方向に沿って複数個の電極bを配設し、しかも回
転容器a内でワークが良好に転動攪拌されるように、該
回転容器aを傾斜させてめっき槽漬浸させている。こ
のため、ワークは回転容器aの片隅に片寄り、電極bの
内、ワ−クと接触しない電極ができ、ワークと接触しな
い電極bに電流が流れると、該電極bの表面に粗にめっ
きが付き、これが次ぎにワークに接すると剥がれ落ちて
回転容器内のワークに混在し、作業完了後これを選り分
ける作業を必要とし、しかもワークと接触しない電極b
に電流が流れると、ワークに設計した理論通りの電流が
流れなくなる等の不具合を生じる。
In this apparatus, an extremely small rotating container a having an opening having an open upper surface with an opening diameter of 70 mm and a depth of 80 mm is formed of an acrylic resin plate or the like. Numerous small holes are drilled on the surface and a plurality of electrodes b are arranged along the circumferential direction on the bottom surface of the rotating container a, and moreover, the work is tumbled and stirred well in the rotating container a, The rotating container a is inclined and immersed in the plating tank. For this reason, the work is offset to one corner of the rotary container a, and an electrode that does not contact the work is formed among the electrodes b. When a current flows to the electrode b that does not contact the work, the surface of the electrode b is roughly plated. When the next contact with the work, it comes off and mixes with the work in the rotating container.
When a current flows through the workpiece, there arises a problem that a current as designed in the work does not flow.

【手続補正3】[Procedure amendment 3]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0005[Correction target item name] 0005

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0005】[0005]

【課題を解決するための手段】本願の請求項1記載の発
明は、めっき容器をめっき槽内のめっき液に浸漬してめ
っき容器収容したワークにめっき処理を施すバレルめ
っき装置において、該めっき容器を、上端の開口をワー
クの出入口とした筒体の下部に樹脂網で構成したワーク
収容室を取付けた縦長に形成し、且つ、めっき槽に載架
する架台に、モータとこれに連動して回転する回転盤と
を設け、該回転盤の下面に、該めっき容器の上端を当接
させて、該めっき容器の回転中心軸線を垂線に対し傾斜
する状態に着脱可能に取り付け、該ワーク収容室の底部
周面に沿って複数個の電極を配設し、夫々の電極と連な
各接点をめっき容器の上端に臨ませ、且つ、前記回転
盤の下面にめっき容器を取り付けたとき、各接点が夫々
接触する接触板を設け、該接触板と、めっき槽に設けた
カソード電極と接続する架台に設けた接触子とでめっ
き容器の回転に伴って順次下側に来る電極に通電させる
ロタリースイッチを形成したことで、ロタリースイッチ
等をめっき槽内のめっき液に触れない位置に設けること
ができる。本願の請求項2記載の発明は、ワーク収容室
の底部は、中央に至るに従い漸次下方に突出する凸状を
呈し、該底部をめっき容器内に押し込むとき底部周囲を
起点として底部がめっき容器内に突出するように、可撓
性を有し且つ一定の形状を保ち得る樹脂網で構成したこ
とで、該収容室の大きさをワークの種類、量に応じて2
段に切り替えることができ、これによってワークの量が
少量でもダミーを使用することなく、ワークと電極との
接触を良好にすることができる。
According to the first aspect of the present invention, a plating container is immersed in a plating solution in a plating tank.
Barrel for plating the work contained in the container
In the plating apparatus, the plating container is
Work consisting of a resin net at the bottom of the cylinder used as the entrance to the
A motor and a rotating disk that rotates in conjunction with the motor are provided on a mount that is formed in a vertically long shape with the accommodation chamber mounted thereon and that is mounted on the plating tank , and the upper end of the plating container is placed on the lower surface of the rotating disk. Contact
Then, the center axis of rotation of the plating vessel is inclined with respect to the perpendicular.
State removably attached to, a plurality of electrodes disposed along the bottom peripheral surface of the workpiece accommodating chamber to face the respective contacts continuous with respective electrodes on the upper end of the plating container and the rotary
When a plating container is attached to the bottom of the board, each contact
A contact plate for contact is provided, and the contact plate and a contact provided on a pedestal connected to the cathode electrode provided in the plating tank are used to supply current to the lower electrode sequentially with the rotation of the plating container.
By forming the rotary switch, the rotary switch or the like can be provided at a position in the plating tank that does not come into contact with the plating solution . The invention according to claim 2 of the present application provides a work accommodation room
The bottom, a convex shape that gradually protrudes downwardly accordance leading to Chuo
Exhibited, so the bottom of the bottom periphery when pressing the bottom portion in the plating vessel starting projects into the plating vessel, flexible is formed of the and resins network may maintain a certain shape has, the accommodation The size of the room depends on the type and quantity of the workpiece.
It is possible to switch to a step, so that even if the amount of the work is small, the contact between the work and the electrode can be improved without using a dummy.

【手続補正4】[Procedure amendment 4]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0019[Correction target item name] 0019

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0019】[0019]

【発明の効果】本願の請求項1に記載の発明によるとき
は、めっき容器を、上端の開口をワークの出入口とした
筒体の下部に樹脂網で構成したワーク収容室を取付けた
縦長に形成したことで、該筒体を通して樹脂網で構成し
たワーク収容室にワークを入れ易く、しかもワーク収容
室を樹脂網で構成したため、樹脂板に無数の小孔を設け
たものに比し、開孔面積の割合を高くすることができ
て、該ワーク収容室へめっき液の出入りを良好にして、
収容室内のめっき液のイオン濃度を高めて良好なめっき
を行うことができると共に、該容器を駆動する回転盤、
ロータリースイッチ等をめっき液に漬からない位置に設
けることができて、従来例のようにこれらをめっき液に
触れないようにシールする必要がなく、その分構造
単となる。しかも、各電極と接続する各接点をめっき容
器の上端に臨ませ、且つ回転盤の下面にめっき容器を取
り付けたとき、各接点が夫々接触する接触板を回転盤に
設けたため、回転盤の下面にめっき容器を取り付けるだ
けで、各接点は通電可能の状態となり、取り扱い易いバ
レルめっき装置が得られる。
According to the first aspect of the present invention, the plating container has an opening at the upper end as a work entrance.
A work accommodating chamber composed of resin net was attached to the lower part of the cylinder.
By being formed vertically, it is composed of a resin net through the cylindrical body.
Since the work is easily inserted into the work storage chamber , and the work storage chamber is made of a resin net, the ratio of the opening area can be increased as compared with the case where a myriad of small holes are provided in the resin plate. Making the plating solution enter and exit the work storage chamber well,
A rotating plate that drives the container while performing good plating by increasing the ion concentration of the plating solution in the storage chamber;
And it can be provided at a position not find a rotary switch or the like in the plating solution, it is not necessary to seal to touch them in a plating solution as in the prior art, correspondingly structure is easy <br/> single . Moreover, each contact connected to each electrode is plated
Face the top of the vessel and place the plating container on the underside of the turntable.
The contact plate where each contact comes in contact with the
The plating container is attached to the lower surface of the turntable.
Each contact is in a state where it can be energized,
A rel plating apparatus is obtained.

【手続補正5】[Procedure amendment 5]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0020[Correction target item name] 0020

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0020】本願の請求項2に記載の発明によるとき
は、収容室の大きさをワークの種類、量に応じて2段に
切り替えることができ、収容室をより小さくすること
で、ワークの量が少量でもダミーを使用することなく、
ワークと電極との接触を良好にすることができる。
According to the invention described in claim 2 of the present application, the size of the accommodation room can be switched between two stages according to the type and amount of the work, and the accommodation room can be made smaller.
In, without the use of a dummy amount of work even in small amounts,
Good contact between the workpiece and the electrode can be achieved.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 めっき槽に載架する架台に、モータとこ
れに連動して回転する回転盤とを設け、該回転盤の下面
に縦長のめっき容器を、該めっき容器の回転中心軸線を
垂線に対し傾斜させて着脱可能に取り付け、該容器は、
上端をワークの出入口とした筒体の下部に樹脂網で構成
したワーク収容室を形成し、該ワーク収容室の底部周面
に沿って複数個の電極を配設し、且つ、夫々の電極と連
なる端子が接続する前記回転盤上に設けた接触板と、め
っき槽に設けたカソード電極と接続する架台に設けた接
触子とでロタリースイッチを形成し、該ロタリースイッ
チで、めっき容器の回転に伴って順次下側に来る電極に
通電させるようにしたことを特徴とするバレルめっき装
置。
A pedestal mounted on a plating tank is provided with a motor and a rotating disk rotating in conjunction with the motor. A vertically long plating container is provided on a lower surface of the rotating disk, and a rotation center axis of the plating container is perpendicular to a vertical line. The container is detachably attached by being inclined with respect to the container.
A work accommodating chamber formed of a resin net is formed at the lower part of the cylindrical body having an upper end as an entrance of the work, and a plurality of electrodes are provided along a bottom peripheral surface of the work accommodating chamber, and A contact plate provided on the turntable to which a series of terminals are connected, and a contact provided on a frame connected to a cathode electrode provided in a plating tank form a rotary switch, and the rotary switch is used to rotate a plating container. A barrel plating apparatus characterized in that a current is sequentially supplied to the lower electrodes.
【請求項2】 ワーク収容室の底部は、中央に至るに従
い漸次下方に突出する凸状を呈し、該底部をめっき容器
内に押し込むとき底部周囲を起点として底部がめっき容
器内に突出するように、可撓性を有し且つ一定の形状を
保ち得る樹脂網で構成したことを特徴とする請求項1記
載のバレルめっき装置。
2. The bottom of the work accommodating chamber has a convex shape gradually projecting downward as it reaches the center, and when the bottom is pushed into the plating container, the bottom protrudes from the periphery of the bottom as a starting point into the plating container. 2. The barrel plating apparatus according to claim 1, wherein the barrel plating apparatus is made of a resin net having flexibility and a constant shape.
JP20080998A 1998-07-15 1998-07-15 Barrel plating equipment Expired - Lifetime JP2964245B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20080998A JP2964245B1 (en) 1998-07-15 1998-07-15 Barrel plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20080998A JP2964245B1 (en) 1998-07-15 1998-07-15 Barrel plating equipment

Publications (2)

Publication Number Publication Date
JP2964245B1 JP2964245B1 (en) 1999-10-18
JP2000034600A true JP2000034600A (en) 2000-02-02

Family

ID=16430566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20080998A Expired - Lifetime JP2964245B1 (en) 1998-07-15 1998-07-15 Barrel plating equipment

Country Status (1)

Country Link
JP (1) JP2964245B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016135897A (en) * 2015-01-23 2016-07-28 株式会社コンドウ Electrolysis plating device and electrolysis plating method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5228964B2 (en) * 2009-02-06 2013-07-03 株式会社村田製作所 Barrel plating equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016135897A (en) * 2015-01-23 2016-07-28 株式会社コンドウ Electrolysis plating device and electrolysis plating method

Also Published As

Publication number Publication date
JP2964245B1 (en) 1999-10-18

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