JP2000021019A - 情報担体用樹脂製ディスク基板 - Google Patents

情報担体用樹脂製ディスク基板

Info

Publication number
JP2000021019A
JP2000021019A JP10189208A JP18920898A JP2000021019A JP 2000021019 A JP2000021019 A JP 2000021019A JP 10189208 A JP10189208 A JP 10189208A JP 18920898 A JP18920898 A JP 18920898A JP 2000021019 A JP2000021019 A JP 2000021019A
Authority
JP
Japan
Prior art keywords
substrate
resin
ions
disk
disk substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP10189208A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000021019A5 (enExample
Inventor
Minehiro Sotozaki
峰広 外崎
Yutaka Takei
裕 竹井
Hiroyuki Okita
裕之 沖田
Yuji Horino
裕治 堀野
Akiyoshi Chatanihara
昭義 茶谷原
Atsushi Kinomura
淳 木野村
Nobuteru Tsubouchi
信輝 坪内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Sony Corp
Original Assignee
Agency of Industrial Science and Technology
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Sony Corp filed Critical Agency of Industrial Science and Technology
Priority to JP10189208A priority Critical patent/JP2000021019A/ja
Priority to US09/346,078 priority patent/US6555182B1/en
Priority to CNB991116577A priority patent/CN1197900C/zh
Priority to EP99305292A priority patent/EP0969118A3/en
Publication of JP2000021019A publication Critical patent/JP2000021019A/ja
Publication of JP2000021019A5 publication Critical patent/JP2000021019A5/ja
Abandoned legal-status Critical Current

Links

Landscapes

  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP10189208A 1998-07-03 1998-07-03 情報担体用樹脂製ディスク基板 Abandoned JP2000021019A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10189208A JP2000021019A (ja) 1998-07-03 1998-07-03 情報担体用樹脂製ディスク基板
US09/346,078 US6555182B1 (en) 1998-07-03 1999-07-01 Surface hardened resins for disk substrates, methods of manufacture thereof and production devices for the manufacture thereof
CNB991116577A CN1197900C (zh) 1998-07-03 1999-07-02 树脂表面硬化方法、表面硬化树脂及生产设备和树脂基片
EP99305292A EP0969118A3 (en) 1998-07-03 1999-07-02 Surface hardening of resins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10189208A JP2000021019A (ja) 1998-07-03 1998-07-03 情報担体用樹脂製ディスク基板

Publications (2)

Publication Number Publication Date
JP2000021019A true JP2000021019A (ja) 2000-01-21
JP2000021019A5 JP2000021019A5 (enExample) 2005-09-02

Family

ID=16237356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10189208A Abandoned JP2000021019A (ja) 1998-07-03 1998-07-03 情報担体用樹脂製ディスク基板

Country Status (1)

Country Link
JP (1) JP2000021019A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783644B2 (en) 2001-04-23 2004-08-31 Sony Corporation Film deposition method
JP2006291048A (ja) * 2005-04-12 2006-10-26 Tokyo Metropolis 表面改質された超高分子量ポリエチレン製成形品、およびその製造方法
JP2011021208A (ja) * 2004-02-27 2011-02-03 Lintec Corp 高分子成形体の製造方法、高分子成形体およびその製造装置
JP2011032494A (ja) * 2004-08-05 2011-02-17 Lintec Corp 高分子フィルムの連続的表面改質方法、連続的表面改質装置および表面部にイオン注入層が形成された高分子フィルム

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783644B2 (en) 2001-04-23 2004-08-31 Sony Corporation Film deposition method
JP2011021208A (ja) * 2004-02-27 2011-02-03 Lintec Corp 高分子成形体の製造方法、高分子成形体およびその製造装置
JP2011032494A (ja) * 2004-08-05 2011-02-17 Lintec Corp 高分子フィルムの連続的表面改質方法、連続的表面改質装置および表面部にイオン注入層が形成された高分子フィルム
JP2006291048A (ja) * 2005-04-12 2006-10-26 Tokyo Metropolis 表面改質された超高分子量ポリエチレン製成形品、およびその製造方法

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