JP2000011759A - Conductor composition - Google Patents

Conductor composition

Info

Publication number
JP2000011759A
JP2000011759A JP10186959A JP18695998A JP2000011759A JP 2000011759 A JP2000011759 A JP 2000011759A JP 10186959 A JP10186959 A JP 10186959A JP 18695998 A JP18695998 A JP 18695998A JP 2000011759 A JP2000011759 A JP 2000011759A
Authority
JP
Japan
Prior art keywords
conductor composition
silver
particles
paste
softening temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10186959A
Other languages
Japanese (ja)
Other versions
JP3906881B2 (en
Inventor
Hiroshi Hattori
宏 服部
Katsuji Inagaki
克二 稲垣
Yoshinobu Watanabe
嘉伸 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP18695998A priority Critical patent/JP3906881B2/en
Publication of JP2000011759A publication Critical patent/JP2000011759A/en
Application granted granted Critical
Publication of JP3906881B2 publication Critical patent/JP3906881B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a paste having no shrinkage difference from a laminate substrate and exhibiting low resistivity at the time of being fired after the paste is packed into a through hole in the ceramic laminate substrate, by using complex particles, in particular, of silver and magnesium oxide, in relation to a conductor composition comprising conductive metallic particles, an adhesive agent, an organic solvent, and a surfactant. SOLUTION: In the case of a conductor composition comprising conductive metallic particles, a glass powder of high softening temperature and a resin, further, small amounts of organic solvent and surfactant, the conductor composition for use in filling a through hole is characterized in that a glass powder of relatively high softening temperature is jointly used, that the amount of the organic solvent in the conductor composition is as slight as 4.0 to 6.0 wt.%, that complex particles, in particular, of silver and magnesium oxide are used, and that the concentration of solid content in the conductor composition is as high as 88 to 93 wt.%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電気回路形成用導
体組成物に係り、具体的にはセラミックス積層基板に形
成された回路配線のためのスルーホール充填用ペースト
であって、低抵抗値を示し、且つ焼成時の容積変化がな
く、セラミックス積層基板との収縮差のない導体組成物
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductor composition for forming an electric circuit, and more particularly to a paste for filling a through hole for circuit wiring formed on a ceramic laminated substrate, which has a low resistance value. The present invention relates to a conductor composition which shows no change in volume during firing and has no difference in shrinkage from a ceramic laminated substrate.

【0002】[0002]

【従来の技術】近年、電子工業用貴金属ペーストの応用
技術は急速に拡大して来ており、多種にわたる貴金属粒
子が単一又は複合してペースト素材として活用されてい
る。貴金属ペーストとは、導電機能材料としての貴金属
粉末や貴金属レジネートを、有機又は無機バインダー、
金属酸化物からなる粘性を付与する媒体に混練分散して
ペースト状にしたものである。
2. Description of the Related Art In recent years, the application technology of noble metal pastes for the electronics industry has been rapidly expanding, and various kinds of noble metal particles are used singly or in combination as a paste material. Noble metal paste, noble metal powder or noble metal resinate as a conductive functional material, organic or inorganic binder,
It is kneaded and dispersed in a viscosity imparting medium composed of a metal oxide to form a paste.

【0003】電子部品である電極及び導体、抵抗体への
金属膜形成方法として、卑金属又は貴金属のオルガノメ
タル(インキ)から金属膜を造る方法や、電気メッキに
代表される湿式メッキにより薄膜を形成させる方法、ま
た、真空蒸着法、化学蒸着法、スパッタリングなどの乾
式メッキにより薄膜を形成させる方法、ならびに卑金属
又は貴金属ペーストを用いて金属膜を形成させる厚膜法
とがある。
[0003] As a method of forming a metal film on electrodes, conductors and resistors as electronic parts, a method of forming a metal film from a base metal or a precious metal organometal (ink), or a method of forming a thin film by wet plating typified by electroplating. There are a method of forming a thin film by dry plating such as a vacuum evaporation method, a chemical vapor deposition method, and sputtering, and a thick film method of forming a metal film using a base metal or a noble metal paste.

【0004】電子部品分野で広く用いられている導電性
ペーストは、一般に電子部品の導電性回路用として用い
られている。その、成分中の導電性貴金属粒子は、主と
して銀、パラジウムその他の貴金属及び卑金属が使用さ
れるが、スルーホールに充填する場合、導電粉末の焼成
時の収縮がセラミックス積層基板への接着力を超えるた
め、導体がスルーホールから抜け落ちるなどの問題があ
る。
[0004] Conductive pastes widely used in the field of electronic parts are generally used for conductive circuits of electronic parts. The conductive noble metal particles in the component are mainly silver, palladium and other noble metals and base metals, but when filled in through holes, the shrinkage during firing of the conductive powder exceeds the adhesive strength to the ceramic laminated substrate Therefore, there is a problem that the conductor falls out of the through hole.

【0005】その他、0.4mm前後の微孔に導電性ペ
ーストを充填する際、セラミックス積層基板の寸法公差
やペースト充填時のセット擦れを防ぐため、やや大きめ
のパットパターンを有する版を用いてスルーホールに導
電性ペーストを充填するが、その時、はみ出した導体が
欠け易くなるので、セラミックス積層基板を研磨し平面
化処理操作を行う必要がある。何れにしても焼成時に該
基板と導体金属との収縮差を抑えることが、問題解決の
鍵となる。
[0005] In addition, when filling the conductive paste into the pores of about 0.4 mm, in order to prevent dimensional tolerances of the ceramic laminated substrate and set friction at the time of filling the paste, a plate having a slightly larger pad pattern is used. The holes are filled with a conductive paste. At this time, the protruding conductor is likely to be chipped, so that it is necessary to polish the ceramic laminated substrate and perform a planarization process. In any case, the key to solving the problem is to reduce the difference in shrinkage between the substrate and the conductive metal during firing.

【0006】それら従来例として、例えば特開平7−2
35215号、特開平9−46013号があり、セラミ
ック積層基板に形成されているスルーホールに充填し、
焼成する導電性ペーストとして、前者が銀、銅粉末に対
して0.1重量%以上のロジウム粉末を添加すること、
後者は導電粉末に膨張剤と展色剤を含むものであり、膨
張剤には、アルミノ珪酸塩系化合物やチタン酸化合物そ
の他が用いられること、さらにガラスなどの密着性改善
剤、酸化銅、酸化チタンその他の密着性改善助剤を使用
する方法が開示されている。しかしながら、それら導体
組成物は何れも本発明によるものと異なるばかりでな
く、導電性金属類は単なる機械的に混練分散されたもの
である。
For example, Japanese Patent Application Laid-Open No. 7-2
No. 35215 and JP-A-9-46013, which fill a through-hole formed in a ceramic laminated substrate,
As the conductive paste to be fired, the former adds 0.1% by weight or more of rhodium powder to silver or copper powder,
In the latter case, the conductive powder contains a swelling agent and a coloring agent, and an aluminosilicate compound or a titanate compound or the like is used as the swelling agent. A method using titanium or another adhesion improving aid is disclosed. However, these conductor compositions are not only different from those according to the present invention, but also the conductive metals are simply mechanically kneaded and dispersed.

【0007】その他、特開平1−107591号、特開
平1−107592号には、銀粉、ロジウム粉が分散さ
れているビヒクル中に無機結合材として、酸化アンチモ
ンを含有し、実質的にガラスフリットを含有しない導体
組成物で被覆された電気回路基板が紹介されている。こ
のものも、前記と同様にビヒクル成分も、使用目的も、
はんだぬれ性の改善にあり、本発明と課題を全く異にす
るものである。
In addition, JP-A-1-107759 and JP-A-1-107592 disclose that a vehicle in which silver powder and rhodium powder are dispersed contains antimony oxide as an inorganic binder and substantially contains glass frit. An electric circuit board coated with a conductor composition not containing is introduced. This one, as well as the vehicle component, the purpose of use,
An object of the present invention is to improve solder wettability, which is completely different from the present invention.

【0008】また、低温焼成多層基板用の内層銀ペース
ト組成物として、特開平4−206401号があるが、
これは、300〜450℃の低軟化点ガラスフリットと
580〜850℃の高軟化点ガラスフリット、及びアル
ミナ、ジルコニア、マグネシア等の粉末を含有する銀ペ
ースト組成物を用いるものである。そのガラスの軟化点
は850℃より低く、銀とマグネシアは単に機械的に混
練分散して用いるもので、銀と酸化マグネシウム(マグ
ネシア)との複合体粒子ではなく、グリーンシートの貼
り合わせ時の剥離や基板のそりの改善を目的とするにす
ぎない。よって、スルーホール充填組成物の収縮課題の
解決を教示するものではない。
Japanese Patent Application Laid-Open No. 4-206401 discloses an inner layer silver paste composition for a low-temperature fired multilayer substrate.
This uses a silver paste composition containing a low softening point glass frit of 300 to 450 ° C., a high softening point glass frit of 580 to 850 ° C., and a powder of alumina, zirconia, magnesia, or the like. The softening point of the glass is lower than 850 ° C., and silver and magnesia are used by simply mechanically kneading and dispersing, and are not composite particles of silver and magnesium oxide (magnesia), but are peeled off when bonding green sheets. It only aims at improving the warpage of the substrate. Therefore, it does not teach solving the problem of shrinkage of the through hole filling composition.

【0009】その他、端子電極用ペーストとして紹介さ
れているものに、特開平8−64029号があるが、こ
の発明は、セラミックコンデンサの端子電極形成を課題
とし、スルーホール充填とは無関係で、導電性ペースト
として銀、マグネシアを含有しているが、これも、銀粒
子とマグネシア粒子の二種を機械的に混練分散している
だけで、本発明の銀、酸化マグネシウム(マグネシア)
の複合体粒子とは、後記するように解決課題と、作用効
果において、本発明とは似て非なるものである。
Japanese Unexamined Patent Application Publication No. 8-64029 discloses another terminal electrode paste. However, the present invention has an object to form a terminal electrode of a ceramic capacitor, and is independent of filling of a through hole. Silver and magnesia are contained as the conductive paste, but also by mechanically kneading and dispersing two types of silver particles and magnesia particles, the silver and magnesium oxide (magnesia) of the present invention are also used.
The composite particles of the present invention are similar to the present invention in terms of the problem to be solved and the function and effect as described later.

【0010】前記したように、セラミックス積層基板の
スルーホール充填技術は少なく、従来行われている技術
が、セラミックス積層基板の収縮改善にあることは認め
るとしても、まだ十分に好ましい成果が得られていない
のが実情で、OA機器利用の増加に伴い益々品質のよい
回路基板が要求されている現在、この改良が当面の課題
となる。
As described above, there are few techniques for filling through holes in a ceramic laminated substrate. Even if it is recognized that the conventional technology is to improve the shrinkage of the ceramic laminated substrate, sufficiently satisfactory results are still obtained. The fact is that there is no current situation, and as the use of OA equipment increases, a circuit board of higher and higher quality is demanded, and this improvement is an immediate problem.

【0011】[0011]

【発明が解決しようとする課題】今日の、電子部品の小
型軽量化、高性能化が望まれる折、従来技術ではなし得
なかったセラミックス積層基板焼成時の収縮を防ぎ、同
時に、低抵抗性の高品質の回路配線を得るための、スル
ーホール充填用導電性組成物の改良に着目し、高密度実
装を可能にすることを本発明の課題とする。
In today's demand for smaller, lighter, and higher-performance electronic components, shrinkage during firing of a ceramic laminated substrate, which could not be achieved by the prior art, is prevented. An object of the present invention is to focus on improvement of a conductive composition for filling through holes to obtain high-quality circuit wiring, and to enable high-density mounting.

【0012】[0012]

【課題を解決するための手段】本発明の構成は次のとお
りである。 1 導電性金属粒子及び高軟化温度のガラス粉末、樹脂
と、有機溶剤及び界面活性剤からなる導体組成物におい
て、導電性金属粒子が高固形分濃度の銀と酸化マグネシ
ウムとの複合体粒子から成ることを特徴とする導体組成
物。 2 導体組成物中、導電性金属粒子の固形分濃度は、8
8〜93重量%であることを特徴とする前項1記載の導
体組成物。 3 導体組成物中の酸化マグネシウムは、銀に対して
0.5〜4.0重量%であることを特徴とする前項1及
び2のいずれかに記載の導体組成物。 4 高軟化温度のガラス粉末は、軟化温度950〜11
00℃のもの及び軟化温度800〜900℃のものを併
用して用いることを特徴とする前項1〜3のいずれかに
記載の導体組成物。 5 高軟化温度のガラス粉末は、硼素及び珪素からなる
もの及びカルシウム、硼素、珪素からなるものであるこ
とを特徴とする前項1〜4のいずれかに記載の導体組成
物。 6 有機溶剤は、導体組成物中4.0〜6.0重量%の
範囲で用いることを特徴とする前項1〜5のいずれかに
記載の導体組成物。 7 界面活性剤は、カチオン系界面活性剤を導体組成物
中1.5〜4.0重量%使用することを特徴とする前項
1〜6のいずれかに記載の導体組成物。
The configuration of the present invention is as follows. 1 A conductive composition comprising conductive metal particles, a glass powder having a high softening temperature, a resin, an organic solvent and a surfactant, wherein the conductive metal particles comprise composite particles of silver and magnesium oxide having a high solid content concentration. A conductor composition comprising: 2 In the conductor composition, the solid content concentration of the conductive metal particles is 8
2. The conductor composition according to item 1, wherein the content is 8 to 93% by weight. (3) The conductor composition as described in any one of (1) and (2) above, wherein magnesium oxide in the conductor composition is 0.5 to 4.0% by weight based on silver. 4 The glass powder having a high softening temperature has a softening temperature of 950-11.
4. The conductor composition according to any one of the above items 1 to 3, wherein the conductor composition having a softening temperature of 800C and a softening temperature of 800C to 900C are used in combination. (5) The conductor composition as described in any one of (1) to (4) above, wherein the glass powder having a high softening temperature is composed of boron and silicon and calcium, boron and silicon. (6) The conductor composition as described in any of (1) to (5) above, wherein the organic solvent is used in a range of 4.0 to 6.0% by weight in the conductor composition. (7) The conductor composition as described in any one of (1) to (6) above, wherein a cationic surfactant is used in the conductor composition in an amount of 1.5 to 4.0% by weight.

【0013】[0013]

【発明の実施の形態】本発明で使用する銀を主体とする
導体組成物は、従来のものと異なり、銀粒子に少量の酸
化マグネシウムが複合され一体となつたAgMgOを用
い(この複合粒子については図1として別添の電子顕微
鏡写真参照)、少量のターピネオールに界面活性剤を加
えて導電性ペーストとする。その、金属粒子からなるペ
ーストは固形分濃度を93重量%にまでも高められ、し
かも、複合体粒子であるから分散性に優れ、ペースト粘
度は150Pa・s〜300Pa・s(パスカル秒)と
低く、スクリーン印刷又はメタルマスク印刷が可能であ
る。よって、スルーホールへの導電性ペースト印刷充填
度は極限まで高く、銀粒子などの固溶性とガラス軟化温
度が高いことと相まって、1000℃前後の焼成によっ
ても収縮がなく、良好なスルーホール充填が可能となっ
た。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The silver-based conductor composition used in the present invention is different from conventional conductor compositions in that AgMgO is used in which silver particles are combined with a small amount of magnesium oxide to form a single body. Is an electron micrograph attached separately as FIG. 1), a surfactant is added to a small amount of terpineol to form a conductive paste. The paste composed of metal particles has a solid content as high as 93% by weight, and since it is a composite particle, has excellent dispersibility, and the paste viscosity is as low as 150 Pa · s to 300 Pa · s (Pascal second). , Screen printing or metal mask printing is possible. Therefore, the filling degree of the conductive paste into the through-hole is extremely high, combined with the solid solubility of silver particles and the high glass softening temperature. It has become possible.

【0014】銀粒子に酸化マグネシウムが複合されたA
gMgOの製造方法についての概要は、噴霧熱分解法を
利用し、硝酸銀と硝酸マグネシウムとの水溶液を電気炉
内に水滴状に噴霧し、950℃の雰囲気中で加熱して、
水分が飛ばされると同時に熱分解が起こり、銀粒子の周
囲に酸化マグネシウムの結晶が複合一体化した粒子が得
られる。この複合体粒子径は2〜4μmで占められ、銀
の周囲に酸化マグネシウムの微粒子が複合一体化されて
いるもので、酸化マグネシウムの、銀に対する比は0.
5〜4.0重量%である。複合体粒子は、ペースト焼成
時にいわば空隙のない緻密な状態に作ることができる。
A in which magnesium oxide is composited with silver particles
The outline of the production method of gMgO is as follows, using a spray pyrolysis method, spraying an aqueous solution of silver nitrate and magnesium nitrate in an electric furnace in the form of water droplets, and heating in an atmosphere of 950 ° C.
At the same time as the water is expelled, thermal decomposition occurs to obtain particles in which magnesium oxide crystals are combined and integrated around the silver particles. The composite particle diameter is occupied by 2 to 4 μm, and magnesium oxide fine particles are compositely integrated around silver. The ratio of magnesium oxide to silver is 0.1 μm.
5 to 4.0% by weight. The composite particles can be made in a so-called dense state without voids when the paste is fired.

【0015】前記した特開平8−64029号に開示さ
れるものは、セラミックコンデンサの端子電極接合用ペ
ーストで、本件のスルーホール充填用とは異なり、銀粒
子とマグネシア粒子夫々を単に機械的に混練した物であ
るから、濃密性に欠けるばかりでなく、銀粒子、マグネ
シア粒子、ガラス粒子などの分散状態は粗であり、有機
溶剤で分散しても印刷可能な最大固形分濃度は85重量
%を下回るものである。これは端子電極接合用であるか
ら、それ以上を望む必然性もないと考えられる。
The paste disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 8-64029 is a paste for bonding terminal electrodes of a ceramic capacitor. Unlike the paste for filling through holes of the present invention, silver particles and magnesia particles are simply mechanically kneaded. In addition to the lack of density, the dispersion state of silver particles, magnesia particles, glass particles, etc. is coarse, and the maximum printable solid concentration even when dispersed in an organic solvent is 85% by weight. It is below. Since this is for terminal electrode bonding, it is considered that there is no need to desire any more.

【0016】次に、本発明において、軟化温度の高いガ
ラスを二種併用する点は、850℃以下のものを使用し
た場合、セラミックス積層基板との密着性はよいが、焼
成時に急速に溶けて固化する段でペーストの収縮が激し
い。反面、1000℃を大幅に超えるもののみでは焼成
時間が長引くとともに、セラミックス積層基板との馴染
性が落ちるため、本発明では800〜900℃のもの
と、950〜1100℃のもの(好ましくはカルシウム
と硼素と珪素から成る850℃のものと、硼素と珪素か
ら成る1063℃のもの)を併用することにより、銀複
合体粒子の固溶ならびにセラミックス積層基板との馴染
を非常に高め、この面でも収縮を抑え、従来の積層基板
の課題を改善し得たのである。
Next, in the present invention, two types of glass having a high softening temperature are used in combination. When a glass having a softening temperature of 850 ° C. or lower is used, it has good adhesion to a ceramic laminated substrate, but melts rapidly during firing. The paste shrinks sharply during the solidification stage. On the other hand, if the temperature greatly exceeds 1000 ° C., the firing time is prolonged, and the compatibility with the ceramic laminated substrate is reduced. Therefore, in the present invention, the temperature is 800 to 900 ° C. and 950 to 1100 ° C. (preferably, calcium and The combined use of 850 ° C. composed of boron and silicon and 1063 ° C. composed of boron and silicon) greatly enhances the solid solution of the silver composite particles and the compatibility with the ceramic laminated substrate, and also shrinks on this surface. Thus, the problem of the conventional laminated substrate could be improved.

【0017】印刷用ビヒクルのためのバインダー樹脂
は、セルロース系樹脂としてはエチルセルロース、エチ
ルヒドロキシエチルセルロース他、アクリル系樹脂はポ
リメタクリレート、ポリアクリレートなどであるが、本
発明では、ペースト調製時及び高温焼成時に他の物質に
悪影響を与えないことが経験上明らかなエチルセルロー
スを主として用いている。
The binder resin for the printing vehicle is, for example, ethylcellulose or ethylhydroxyethylcellulose as the cellulosic resin, and polymethacrylate or polyacrylate as the acrylic resin. Ethyl cellulose, which is empirically known to have no adverse effect on other substances, is mainly used.

【0018】有機溶剤は、テルペン、ターピネオール、
ブチルカルビトール、ブチルカルビトールアセテート、
ヘキシレングリコール、ジエチルフタレートなどで、何
れも可否なく使用しうるが、ターピネオール、ブチルカ
ルビトールを主として用いている。その使用量は、4.
0〜6.0重量%の範囲で、6.0重量%を超えるとセ
ラミックス積層基板に印刷し易い反面、逸散する量が増
えるだけ収縮の度合いが高くなり、4.0重量%を下回
ると収縮は少ないが、印刷面で技術上不可能となり、好
ましくは5.0重量%である。
Organic solvents include terpenes, terpineols,
Butyl carbitol, butyl carbitol acetate,
Hexylene glycol, diethyl phthalate and the like can be used without any problem, but terpineol and butyl carbitol are mainly used. The amount used is 4.
In the range of 0 to 6.0% by weight, if it exceeds 6.0% by weight, it is easy to print on the ceramic laminated substrate, but on the other hand, the degree of shrinkage increases as the amount of escaping increases, and if it falls below 4.0% by weight. Although the shrinkage is small, it becomes technically impossible on the printing surface, and it is preferably 5.0% by weight.

【0019】界面活性剤は、カチオン系、アニオン系、
両性、ノニオン系何れも使用できるが、少量使用の関係
で特に表面張力降下と分散作用に活性の高いものが好ま
しい。中でも実験の結果からカチオン系のものが好まし
く、デュオミンとエソミン(何れもライオン株式会社製
商品の商品名)を、1:3の割合で、導体組成物に対し
て1.5〜4.0重量%使用する。
The surfactant may be cationic, anionic,
Both amphoteric and nonionic types can be used, but those having a high activity particularly in lowering the surface tension and dispersing action are preferred because of the small amount used. Among them, cationic ones are preferred from the results of experiments, and duomin and esomine (both trade names of products manufactured by Lion Corporation) are added in a ratio of 1: 3 to 1.5 to 4.0 weight parts with respect to the conductor composition. %use.

【0020】前記したとおり、本発明は一義的に、銀・
酸化マグネシウムの複合体粒子を用いることに大きな意
義があり、取扱が簡単で分散性のよいビヒクルを得るこ
とが出来る。そして、セラミックス積層基板に印刷する
ペーストの固形分濃度が最大限高められ、界面活性剤添
加により粘度も低く、表面張力も降下するから、密に充
填しうるのである。ペーストの粘度は150〜300P
a・sで、固形分濃度が93重量%と高くても好適なス
クリーン印刷、メタルマスク印刷が可能である。次に、
実施例に基づき詳細に説明する。
As described above, the present invention is primarily intended for silver
The use of composite particles of magnesium oxide has great significance, and a vehicle that is easy to handle and has good dispersibility can be obtained. Then, since the solid content concentration of the paste to be printed on the ceramic laminated substrate is maximized, and the viscosity is reduced and the surface tension is reduced by adding a surfactant, the paste can be densely filled. Paste viscosity is 150 ~ 300P
In a.s, suitable screen printing and metal mask printing are possible even if the solid content concentration is as high as 93% by weight. next,
This will be described in detail based on an embodiment.

【0021】[0021]

【実施例】先ず、本発明の導電性金属複合体粒子の製造
方法の概要を述べると、硝酸銀と硝酸マグネシウムとの
水溶液を、内部温度950℃の電気炉の中に水滴状に噴
霧し、熱分解して逸散物質は別に補集して、銀・酸化マ
グネシウム複合体粒子を得る。その粒子径は2〜4μm
程度で、小径の酸化マグネシウム微粒子が銀粒子に多数
複合一体化されている。それは別添の図1の電子顕微鏡
写真により明らかである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the outline of the method for producing the conductive metal composite particles of the present invention will be described. An aqueous solution of silver nitrate and magnesium nitrate is sprayed into an electric furnace having an internal temperature of 950 ° C. in the form of water droplets. The decomposed material is collected separately to obtain silver-magnesium oxide composite particles. Its particle size is 2-4 μm
In this order, a large number of small-sized magnesium oxide fine particles are integrated with silver particles. This is apparent from the electron micrograph of FIG. 1 attached separately.

【0022】この導電性金属粒子と、セラミックス積層
基板への接着剤となるガラス粉末及びペースト分散剤と
して高分子化エチルセルロース、有機溶剤ならびに界面
活性剤とを混合分散して、高濃度ながら低粘度の印刷用
ペーストとした。下記の表1に各実施例における添加物
の内訳を記載する。なお導電性金属粒子として銀と酸化
マグネシウム複合体粒子に代えて、銀とロジウムの組合
せも使用し得るが、高価なため必要により適宜使用する
こともある。
The conductive metal particles, glass powder as an adhesive to the ceramic laminated substrate, and polymerized ethyl cellulose as a paste dispersant, an organic solvent and a surfactant are mixed and dispersed to obtain a high-concentration and low-viscosity liquid. This was used as a printing paste. Table 1 below shows the breakdown of additives in each example. It should be noted that a combination of silver and rhodium may be used as the conductive metal particles instead of silver and magnesium oxide composite particles.

【0023】[0023]

【表1】 表1中 界面活性剤は、デュオミン1:エソミン3の割合で用いた 有機溶剤はターピネオールを用いた[Table 1] In Table 1, the surfactant was used in a ratio of duomin 1: esomin3. The organic solvent used was terpineol.

【0024】次に、上記組成にもとづく導体組成物を、
板厚0.125mmのステンレス製メタルマスクを用
い、直径0.3〜1.2mmのスルーホールのある板厚
0.635〜0.8mmの96%アルミナ基板に印刷を
施し、120℃で10分乾燥後、電気炉の中で850℃
で焼成した。冷却後、表2に示す結果を得た。
Next, a conductor composition based on the above composition is
Using a stainless steel metal mask having a thickness of 0.125 mm, printing is performed on a 96% alumina substrate having a thickness of 0.335 to 0.8 mm and having a thickness of 0.335 to 0.8 mm, and a temperature of 120 ° C. for 10 minutes. After drying, 850 ° C in an electric furnace
Was fired. After cooling, the results shown in Table 2 were obtained.

【0025】[0025]

【表2】 表2中 粘度はブルックフィールド製HBT型粘度計で測定した。 密着性はペーストを針状体で刺して観察した。[Table 2] In Table 2, the viscosity was measured with a Brookfield HBT viscometer. The adhesion was observed by piercing the paste with a needle-like body.

【0026】[0026]

【比較例】導電性金属粒子として、銀と酸化マグネシウ
ムの複合体粒子に代えて、従来一般に用いられている銀
とパラジウム粒子、及び、銀と白金粒子を機械的に混練
・分散したものを用いた他は、全て実施例と同様に行っ
た。なお、銀と酸化マグネシウムを機械的に混練・分散
させたものは酸化マグネシウムの量が多くなり、焼成膜
が疎面となって電気特性が劣る。
[Comparative Example] As conductive metal particles, instead of composite particles of silver and magnesium oxide, silver and palladium particles commonly used in the past, and those obtained by mechanically kneading and dispersing silver and platinum particles were used. Other than the above, all were performed in the same manner as in the examples. In the case where silver and magnesium oxide are mechanically kneaded and dispersed, the amount of magnesium oxide increases, and the fired film becomes rough, resulting in poor electrical characteristics.

【0027】[0027]

【発明の効果】以上、詳記したように、従来問題となっ
ていたセラミックス積層基板のスルーホール充填技術に
おける課題を、本発明は悉く改善し得たものである。即
ち、基板に印刷するペーストは、銀と酸化マグネシウム
との複合体粒子であるため緻密な分散が可能で、取扱が
容易であること、また、有機溶剤の添加量が僅かなため
最大限固形分濃度を高められ、しかも、粘度の低下と表
面張力の降下により、スルーホールへの充填度が高く、
高温度での焼成によっても飛散物が小のため収縮は見ら
れなかった。したがって、変形もなく寸法安定性のよ
い、低抵抗値のセラミックス積層基板とすることが出来
るなど、特別顕著な作用効果を奏する。
As described in detail above, the present invention has completely solved the problem in the technique of filling through holes in a ceramic laminated substrate, which has conventionally been a problem. That is, the paste to be printed on the substrate is a composite particle of silver and magnesium oxide, so that it can be densely dispersed and easy to handle, and the addition amount of the organic solvent is small, so that the maximum solid content is small. The concentration can be increased, and the degree of filling of through holes is high due to the decrease in viscosity and the decrease in surface tension.
No shrinkage was observed due to the small size of the scattered matter even after firing at a high temperature. Therefore, a particularly remarkable function and effect can be obtained, for example, a ceramic laminated substrate having good dimensional stability without deformation and a low resistance value can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】銀と酸化マグネシウムとの複合体粒子の200
00倍の電子顕微鏡写真
FIG. 1 shows 200 particles of a composite particle of silver and magnesium oxide.
00x electron micrograph

───────────────────────────────────────────────────── フロントページの続き (72)発明者 渡辺 嘉伸 神奈川県厚木市飯山台ノ岡2453−21 田中 貴金属工業株式会社厚木工場内 Fターム(参考) 4E351 BB31 BB49 CC11 CC22 DD02 DD05 DD08 DD28 DD31 DD52 DD58 EE02 GG09 GG12 GG15 5G301 DA02 DA03 DA33 DA34 DA36 DA37 DA40 DA42 DD01  ────────────────────────────────────────────────── ─── Continuing from the front page (72) Inventor Yoshinobu Watanabe 2453-21 Iiyamadainooka, Atsugi-shi, Kanagawa F-term in the Atsugi Plant of Tanaka Kikinzoku Kogyo Co., Ltd. 4E351 BB31 BB49 CC11 CC22 DD02 DD05 DD08 DD28 DD31 DD52 DD58 EE02 GG09 GG12 GG15 5G301 DA02 DA03 DA33 DA34 DA36 DA37 DA40 DA42 DD01

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 導電性金属粒子及び高軟化温度のガラス
粉末、樹脂と、有機溶剤及び界面活性剤からなる導体組
成物において、導電性金属粒子が高固形分濃度の銀と酸
化マグネシウムとの複合体粒子から成ることを特徴とす
る導体組成物。
1. A conductive composition comprising conductive metal particles, glass powder and resin having a high softening temperature, an organic solvent and a surfactant, wherein the conductive metal particles are composed of silver and magnesium oxide having a high solid content concentration. A conductor composition comprising body particles.
【請求項2】 導体組成物中、導電性金属粒子の固形分
濃度は、88〜93重量%であることを特徴とする請求
項1記載の導体組成物。
2. The conductor composition according to claim 1, wherein the solid content of the conductive metal particles in the conductor composition is 88 to 93% by weight.
【請求項3】 導体組成物中の酸化マグネシウムは、銀
に対して0.5〜4.0重量%であることを特徴とする
請求項1及び2のいずれかに記載の導体組成物。
3. The conductor composition according to claim 1, wherein the content of magnesium oxide in the conductor composition is 0.5 to 4.0% by weight based on silver.
【請求項4】 高軟化温度のガラス粉末は、軟化温度9
50〜1100℃のもの及び軟化温度800〜900℃
のものを併用して用いることを特徴とする請求項1〜3
のいずれかに記載の導体組成物。
4. The glass powder having a high softening temperature has a softening temperature of 9%.
50-1100 ° C and softening temperature 800-900 ° C
4. The combination according to claim 1, wherein
The conductor composition according to any one of the above.
【請求項5】 高軟化温度のガラス粉末は、硼素及び珪
素からなるもの及びカルシウム、硼素、珪素からなるも
のであることを特徴とする請求項1〜4のいずれかに記
載の導体組成物。
5. The conductor composition according to claim 1, wherein the glass powder having a high softening temperature comprises boron and silicon, and calcium, boron and silicon.
【請求項6】 有機溶剤は、導体組成物中4.0〜6.
0重量%の範囲で用いることを特徴とする請求項1〜5
のいずれかに記載の導体組成物。
6. The organic solvent may contain 4.0 to 6.
6. The composition according to claim 1, wherein said compound is used in a range of 0% by weight.
The conductor composition according to any one of the above.
【請求項7】 界面活性剤は、カチオン系界面活性剤を
導体組成物中1.5〜4.0重量%使用することを特徴
とする請求項1〜6のいずれかに記載の導体組成物。
7. The conductor composition according to claim 1, wherein the surfactant comprises a cationic surfactant in an amount of 1.5 to 4.0% by weight in the conductor composition. .
JP18695998A 1998-06-17 1998-06-17 Conductor composition Expired - Fee Related JP3906881B2 (en)

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Application Number Priority Date Filing Date Title
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JP2000011759A true JP2000011759A (en) 2000-01-14
JP3906881B2 JP3906881B2 (en) 2007-04-18

Family

ID=16197729

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005059034A1 (en) * 2003-12-18 2005-06-30 Nitto Denko Corporation Inorganic powder-containing resin composition, film-forming material layer, transfer sheet, method for producing substrate provided with dielectric layer, substrate provided with dielectric layer, and plasma display panel
CN109215828A (en) * 2018-08-22 2019-01-15 湖南省国银新材料有限公司 A kind of welding low temperature drying silver paste and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005059034A1 (en) * 2003-12-18 2005-06-30 Nitto Denko Corporation Inorganic powder-containing resin composition, film-forming material layer, transfer sheet, method for producing substrate provided with dielectric layer, substrate provided with dielectric layer, and plasma display panel
CN109215828A (en) * 2018-08-22 2019-01-15 湖南省国银新材料有限公司 A kind of welding low temperature drying silver paste and preparation method thereof

Also Published As

Publication number Publication date
JP3906881B2 (en) 2007-04-18

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