JP3150932B2 - Conductive paste for ceramic multilayer circuit board - Google Patents
Conductive paste for ceramic multilayer circuit boardInfo
- Publication number
- JP3150932B2 JP3150932B2 JP33137397A JP33137397A JP3150932B2 JP 3150932 B2 JP3150932 B2 JP 3150932B2 JP 33137397 A JP33137397 A JP 33137397A JP 33137397 A JP33137397 A JP 33137397A JP 3150932 B2 JP3150932 B2 JP 3150932B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- circuit board
- conductive paste
- ceramic
- multilayer circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Conductive Materials (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明はセラミック多層回路
基板用導電ペーストに関し、さらに詳しくは、セラミッ
クグリーンシートと同時に焼成しても反りの少ない多層
回路基板を提供することのできる導電ペーストに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste for a ceramic multilayer circuit board, and more particularly, to a conductive paste capable of providing a multilayer circuit board with less warpage even when fired simultaneously with a ceramic green sheet.
【0002】[0002]
【従来の技術】従来、セラミック多層回路基板として
は、アルミナ多層回路基板が主に用いられていた。アル
ミナ多層回路基板を製造するためには、アルミナの焼結
を行うために1500℃以上の高温を必要とし、またそ
の温度に耐えるための導体材料としてMo−MnやW系
の高温焼結用材料が使用されていた。2. Description of the Related Art Conventionally, an alumina multilayer circuit board has been mainly used as a ceramic multilayer circuit board. In order to manufacture an alumina multilayer circuit board, a high temperature of 1500 ° C. or more is required for sintering alumina, and a Mo-Mn or W-based high-temperature sintering material is used as a conductor material to withstand the temperature. Was used.
【0003】一方、最近ではアルミナよりも低温で焼成
することのできる低温焼成基板が徐々に用いられ始めて
いる。この低温焼成基板では、800〜1000℃の焼
成温度で焼結が可能となり、そのため導体材料もMo−
MnやWよりも低抵抗のAgやCuが使用できるように
なり、高密度実装基板としてのCSP(チップサイズパ
ッケージ)、あるいはMCM(マルチチップモジュー
ル)に応用展開が図られつつある。On the other hand, recently, a low-temperature fired substrate that can be fired at a lower temperature than alumina has been gradually used. In this low-temperature fired substrate, sintering can be performed at a firing temperature of 800 to 1000 ° C., so that the conductor material is also Mo-
Ag and Cu having lower resistance than Mn and W can be used, and application development to CSP (chip size package) as a high-density mounting board or MCM (multi-chip module) is being started.
【0004】低温焼成基板は、一般にガラスフリット成
分とセラミック成分を混合したものであって、ガラスフ
リットの低融点を利用して低温度で焼結させて基板とす
るものである。[0004] A low-temperature fired substrate is generally a mixture of a glass frit component and a ceramic component, and is sintered at a low temperature using a low melting point of the glass frit to form a substrate.
【0005】このようなセラミック多層回路基板を製造
する方法は、セラミックの基板となるグリーンシート上
に導電ペーストを印刷し、またセラミック層間の電気的
接続をとるためにセラミックグリーンシートのバイアホ
ール部に導電ペーストを充填し、それらのグリーンシー
トを複数枚積層した後一括で焼成する方法である。A method of manufacturing such a ceramic multilayer circuit board is to print a conductive paste on a green sheet serving as a ceramic substrate, and to form a via hole in a ceramic green sheet to make electrical connection between ceramic layers. This is a method in which a conductive paste is filled, a plurality of green sheets are stacked, and then fired at once.
【0006】[0006]
【発明が解決しようとする課題】ところが、このように
して製造するセラミック多層回路基板には、焼成後に基
板に反りが発生するという問題がある。それは、焼成時
の収縮率の異なる材料であるセラミックグリーンシート
と導電ペーストを同時に焼成するために起こる現象であ
り、もしも反りが発生すると基板として使用できないこ
とは言うまもない。However, the ceramic multilayer circuit board manufactured in this manner has a problem that the board is warped after firing. This is a phenomenon that occurs because ceramic green sheets, which are materials having different shrinkage rates during firing, and a conductive paste are simultaneously fired. If warpage occurs, it cannot be used as a substrate.
【0007】この反り現象は、導電ペーストの収縮がセ
ラミックグリーンシートの収縮よりも早く起こることに
起因している。This warping phenomenon is caused by the fact that shrinkage of the conductive paste occurs earlier than shrinkage of the ceramic green sheet.
【0008】本発明は従来の技術の有する上記のような
問題点に鑑みてなされたものであって、その目的はセラ
ミックグリーンシートと同時に焼成しても反りが非常に
少ない導体回路を形成できるセラミック多層回路基板用
導電ペーストを提供することにある。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and has as its object to form a ceramic circuit capable of forming a conductor circuit with very little warpage even when fired simultaneously with a ceramic green sheet. An object of the present invention is to provide a conductive paste for a multilayer circuit board.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するため
に本発明は、アトマイズ法により製造した平均粒径が3
〜10μmであって且つ最大粒径が40μm以下である
Ag粉末が50重量%以上である導電性粉末を主成分と
する導電ペーストを用いて多層回路基板を形成すること
により、セラミックグリーンシートと同時に焼成しても
反りが非常に少ない導体回路を形成することができる。Means for Solving the Problems To achieve the above object, the present invention relates to a method for producing a powder having an average particle diameter of 3 produced by an atomizing method.
By forming a multilayer circuit board using a conductive paste containing a conductive powder whose main component is 50% by weight or more of an Ag powder having a maximum particle size of 40 μm or less and having a maximum particle size of 40 μm or less, a ceramic green sheet and Even after firing, a conductor circuit with very little warpage can be formed.
【0010】[0010]
【発明の実施の形態】すなわち、本発明は、セラミック
グリーンシートを複数枚積層して焼成することによって
セラミック多層回路基板を製造するに際してセラミック
グリーンシート上に印刷する導電ペーストであって、ア
トマイズ法により製造した平均粒径が3〜10μmであ
って且つ最大粒径が40μm以下であるAg粉末を導電
性粉末とするセラミック多層回路基板用導電ペーストを
第一の発明とし、上記第一の発明において、Ag粉末以
外の導電性粉末として、Pd、Pt、Au、Niまたは
Cuより選ばれる1種以上の金属の粉末を併用し、且つ
前記Ag粉末が導電性粉末の50重量%以上であること
を特徴とするセラミック多層回路基板用導電ペーストを
第二の発明とする。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention relates to a conductive paste which is printed on ceramic green sheets when a ceramic multilayer circuit board is manufactured by stacking and firing a plurality of ceramic green sheets. The first invention is a conductive paste for a ceramic multilayer circuit board having a manufactured average particle diameter of 3 to 10 μm and a maximum particle diameter of 40 μm or less, and the Ag powder as a conductive powder, in the first invention, As the conductive powder other than the Ag powder, a powder of one or more metals selected from Pd, Pt, Au, Ni or Cu is used in combination, and the Ag powder is 50% by weight or more of the conductive powder. The conductive paste for a ceramic multilayer circuit board described above is a second invention.
【0011】上記のようなアトマイズ法により製造した
特定粒径のAg粉末を用いることにより、Ag粉末の収
縮率をセラミックグリーンシートの収縮率と適応させる
ことが可能となり、従って、反りの無いセラミック多層
回路基板を作製することができる。By using the Ag powder having a specific particle size produced by the atomizing method as described above, the shrinkage ratio of the Ag powder can be adapted to the shrinkage ratio of the ceramic green sheet. A circuit board can be manufactured.
【0012】一般に導電ペーストに用いられるAg粉末
は、化学的還元法により製造され、その平均粒径は0.
1〜2μmが多い。しかしながら、これらの粉末を本発
明の用途に用いると、Ag粉末の焼結がセラミックグリ
ーンシートの焼結よりも格段に早く進むため、反りの発
生が抑制できない。The Ag powder generally used for the conductive paste is produced by a chemical reduction method, and has an average particle size of 0.1.
1-2 μm is common. However, when these powders are used for the purpose of the present invention, the sintering of the Ag powder proceeds much faster than the sintering of the ceramic green sheet, so that the occurrence of warpage cannot be suppressed.
【0013】また、特開平3−284896号公報に記
載されているように、通常の化学的還元法により製造さ
れたAg粉末を仮焼して平均粒径を大きくしたものも本
発明の用途には有効であるが、仮焼したAg粉末は元々
の粒子が寄り集まったような形態であって、仮焼した粒
子の中には空洞が多くなる。そのため仮焼した粒子は同
じ粒径の空洞の無い粒子に比べて焼結は早く進む。従っ
て、化学的還元の後に仮焼することによって得られる粒
径の大きなAg粉末も本発明の用途には適さない。As described in JP-A-3-284896, an Ag powder produced by a usual chemical reduction method and calcined to increase the average particle size is also used in the present invention. Is effective, but the calcined Ag powder has a form in which the original particles are gathered, and the calcined particles have many cavities. Therefore, the sintering of the calcined particles proceeds faster than that of the non-hollow particles having the same particle diameter. Therefore, Ag powder having a large particle size obtained by calcining after chemical reduction is not suitable for the use of the present invention.
【0014】本発明でいうアトマイズ法とは、Agを高
温度で溶融し、そのAg液体をノズルから高速度で噴霧
することによって、球状微粉化する方法である。Ag液
体をノズルから高速度で噴霧する際の媒体としてガスを
用いる場合はガスアトマイズ法、あるいは水を用いる場
合は水アトマイズ法と称されるが、本発明で用いること
のできるアトマイズ粉末はどちらの方法によっても得る
ことができる。The atomization method referred to in the present invention is a method in which Ag is melted at a high temperature, and the Ag liquid is sprayed from a nozzle at a high speed to form spherical fine powder. When a gas is used as a medium for spraying an Ag liquid from a nozzle at a high speed, a gas atomization method is used, or when water is used, a water atomization method is called. However, atomized powder that can be used in the present invention is either method. Can also be obtained by
【0015】本発明のアトマイズAg粉末の粒径とし
て、平均粒径を3〜10μmと規定したのは、粒径が3
μmより小さくなると、セラミックグリーンシートと同
時に焼成した場合に反りを無くすことは困難であり、ま
た、粒径を10μm以下としたのは、それより大きいA
g粉末では反りは少なくなるもののAg粉末をペースト
化する際にAg粉末がつぶれて箔状になり、印刷時のス
クリーンの目詰まりを起こすからである。The reason why the average particle size of the atomized Ag powder of the present invention is specified to be 3 to 10 μm is that the particle size is 3 to 10 μm.
If the particle size is smaller than μm, it is difficult to eliminate the warpage when firing simultaneously with the ceramic green sheet.
This is because, although the warpage of the g powder is reduced, the Ag powder is crushed into a foil when the Ag powder is formed into a paste, which causes clogging of the screen during printing.
【0016】同様に、Ag粉末の最大粒径を40μm以
下としたのは、40μmよりも大きなAg粉末を用いる
と、ペースト化する際に粉末がつぶれて箔状になり、印
刷時のスクリーンの目詰まりを起こすからである。Similarly, the reason why the maximum particle size of the Ag powder is set to 40 μm or less is that if an Ag powder having a size larger than 40 μm is used, the powder is crushed into a foil when it is made into a paste, and the size of the screen during printing is reduced. This is because it causes clogging.
【0017】本発明の導電ペーストは、セラミックグリ
ーンシートの内層用の導電ペーストとして、また、ビア
の充填用のペーストとして、あるいは表層用のペースト
として適用が可能である。The conductive paste of the present invention can be applied as a conductive paste for an inner layer of a ceramic green sheet, as a paste for filling a via, or as a paste for a surface layer.
【0018】本発明の導電ペーストでは、アトマイズ法
により製造した、平均粒径が3〜10μmであって且つ
最大粒径が40μm以下であるAg粉末が導電性粉末の
50重量%以上であることが好ましい。Ag粉末が50
重量%未満では、セラミックグリーンシートと同時に焼
成した場合に、反りを無くすことができないからであ
る。In the conductive paste of the present invention, the Ag powder having an average particle size of 3 to 10 μm and a maximum particle size of 40 μm or less, which is produced by an atomizing method, may be 50% by weight or more of the conductive powder. preferable. 50 Ag powder
If the amount is less than the weight percentage, the warpage cannot be eliminated when the ceramic green sheet is fired simultaneously.
【0019】Ag以外の導電性粉末を加えることも可能
であり、例えば、Pt、Pd、Au、NiまたはCuを
併用することもできる。さらに、これら1種以上の金属
の粉末とAg粉末を併用することも可能である。It is also possible to add a conductive powder other than Ag. For example, Pt, Pd, Au, Ni or Cu can be used in combination. Further, it is also possible to use powder of one or more of these metals and Ag powder in combination.
【0020】また、導電性粉末以外に種々の添加物、例
えば、無機化合物、ガラスフリット、有機金属化合物等
を導電ペーストとしての特性を低下させない範囲で一定
量加えることも可能である。In addition to the conductive powder, it is also possible to add various additives, for example, inorganic compounds, glass frit, organometallic compounds and the like in a fixed amount within a range that does not deteriorate the properties as a conductive paste.
【0021】[0021]
【実施例】以下に実施例を挙げて本発明を具体的に説明
する。実施例で使用したAg粉末の詳細は次の表1に示
すとおりである。EXAMPLES The present invention will be specifically described below with reference to examples. The details of the Ag powder used in the examples are as shown in Table 1 below.
【0022】[0022]
【表1】 [Table 1]
【0023】また、使用したグリーンシートは、酸化珪
素、酸化アルミニウム、酸化ホウ素を主成分とするガラ
スフリット50重量部と酸化アルミニウム50重量部を
混合したものを用いた。グリーンシートの厚みは200
μmである。The green sheet used was a mixture of 50 parts by weight of a glass frit mainly composed of silicon oxide, aluminum oxide and boron oxide and 50 parts by weight of aluminum oxide. Green sheet thickness is 200
μm.
【0024】一方、導電ペーストは以下の表2に示す組
成のものをプラネタリーミキサーで予備混練後、3本ロ
ールで混練することによって得た。On the other hand, the conductive paste having the composition shown in Table 2 below was preliminarily kneaded with a planetary mixer and then kneaded with three rolls.
【0025】そして、グリーンシートの上に表2に示す
各組成の導電ペーストを10mm□の大きさでスクリー
ン印刷し、それらを5枚重ねて熱プレスした後、最高温
度900℃で1時間焼成することによって多層回路基板
を作製し、その基板の反りを測定した。Then, a conductive paste having each composition shown in Table 2 is screen-printed on a green sheet in a size of 10 mm □, five of them are stacked and hot-pressed, and then fired at a maximum temperature of 900 ° C. for 1 hour. Thus, a multilayer circuit board was produced, and the warpage of the board was measured.
【0026】なお、反りの測定は、反りゲージを用いて
基板全体の反り量を求め、基板の厚みをその反り量から
差し引いたものを反り量とし、その値を表2に示す。な
お、表2に示す反り量は、20μm以下のものが良好で
ある。In the measurement of the warpage, the amount of warpage of the entire substrate is obtained using a warp gauge, and the value obtained by subtracting the thickness of the substrate from the amount of warpage is defined as the amount of warpage. The warpage shown in Table 2 is preferably 20 μm or less.
【0027】[0027]
【表2】 [Table 2]
【0028】表2から以下の点が明らかである。 (1)実施例1、2は本発明のアトマイズ法により製造
した平均粒径3〜10μmのAg粉末であるから、基板
の反りは良好である。The following points are clear from Table 2. (1) Since Examples 1 and 2 are Ag powders having an average particle size of 3 to 10 μm manufactured by the atomizing method of the present invention, the warpage of the substrate is good.
【0029】(2)実施例3、4は、アトマイズ法によ
り製造した平均粒径3.6μmのAg粉末にPt粉末ま
たはPd粉末とガラス粉末をさらに添加したものである
が、ともに反り量は少なく良好である。(2) In Examples 3 and 4, Pt powder or Pd powder and glass powder were further added to Ag powder having an average particle diameter of 3.6 μm produced by the atomizing method, but both of them had a small amount of warpage. Good.
【0030】(3)しかし、平均粒径2.7μmのAg
粉末を用いた比較例1は、反り量が大きい。(3) However, Ag having an average particle size of 2.7 μm
Comparative Example 1 using powder has a large amount of warpage.
【0031】(4)また、比較例2は、Ag粉末の平均
粒径が10.5μmと大きすぎるので、ペーストを作製
した後スクリーン印刷する際に、スクリーン版への目詰
まりが生じて良好に印刷できなかった。(4) In Comparative Example 2, since the average particle size of the Ag powder was too large, 10.5 μm, clogging of the screen plate occurred during screen printing after the paste was produced, so that the paste was excellent. I could not print.
【0032】(5)また、比較例3は、Ag粉末の平均
粒径が1.6μmと小さすぎるので、反り量が非常に大
きい。(5) In Comparative Example 3, since the average particle size of the Ag powder is too small at 1.6 μm, the amount of warpage is very large.
【0033】(6)さらに、平均粒径が1.6μmのA
g粉末を仮焼して平均粒径を大きくした比較例4や5は
比較例3に比べて反り量は改善されるものの、まだ良好
なレベルとは言えない。(6) Further, A having an average particle size of 1.6 μm
In Comparative Examples 4 and 5, in which the average particle size was increased by calcining the g powder, the amount of warpage was improved as compared with Comparative Example 3, but it was still not at a satisfactory level.
【0034】以上の結果は、グリーンシート材料とし
て、酸化珪素、酸化アルミニウムおよび酸化ホウ素を主
成分とするガラスフリット成分と酸化アルミニウムをセ
ラミック成分として用いたものであるが、それ以外の一
般に800〜1000℃で焼成される低温焼成基板用ガ
ラスセラミックグリーンシートにも本発明は適用可能で
ある。The above results show that the green sheet material used was a glass frit component containing silicon oxide, aluminum oxide, and boron oxide as main components and aluminum oxide as a ceramic component. The present invention is also applicable to a glass ceramic green sheet for a low-temperature fired substrate fired at ℃.
【0035】[0035]
【発明の効果】本発明によれば、セラミックグリーンシ
ートと同時に焼成しても反りが非常に少ない導体回路を
形成できるセラミック多層回路基板用導電ペーストを提
供することができる。According to the present invention, it is possible to provide a conductive paste for a ceramic multilayer circuit board capable of forming a conductive circuit having very little warpage even when fired simultaneously with the ceramic green sheet.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小倉 晋一 京都府京都市下京区西七条東久保町19− 19 (56)参考文献 特開 平6−349315(JP,A) 特開 昭57−70243(JP,A) 特開 平5−114328(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05K 1/09 H01B 1/16 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shinichi Ogura 19-19 Nishi-Shichijo Higashikubocho, Shimogyo-ku, Kyoto-shi, Kyoto (56) References JP-A-6-349315 (JP, A) JP-A-57-70243 ( JP, A) JP-A-5-114328 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H05K 1/09 H01B 1/16
Claims (2)
して焼成することによってセラミック多層回路基板を製
造するに際してセラミックグリーンシート上に印刷する
導電ペーストであって、アトマイズ法により製造した平
均粒径が3〜10μmであって且つ最大粒径が40μm
以下であるAg粉末を導電性粉末とするセラミック多層
回路基板用導電ペースト。1. A laminate of a plurality of ceramic green sheets
And firing to produce a ceramic multilayer circuit board.
Printing on ceramic green sheets when manufacturing
A conductive paste having an average particle size of 3 to 10 μm manufactured by an atomizing method and a maximum particle size of 40 μm.
The following conductive paste for a multilayer ceramic circuit board using Ag powder as conductive powder .
d、Pt、Au、NiまたはCuより選ばれる1種以上
の金属の粉末を併用し、且つ前記Ag粉末が導電性粉末
の50重量%以上であることを特徴とする請求項1記載
のセラミック多層回路基板用導電ペースト。2. The conductive powder other than Ag powder is P
d, Pt, Au, Ni or Cu, in combination with one or more metal powders , wherein the Ag powder is a conductive powder
2. The conductive paste for a ceramic multilayer circuit board according to claim 1 , wherein the content is 50% by weight or more .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33137397A JP3150932B2 (en) | 1997-12-02 | 1997-12-02 | Conductive paste for ceramic multilayer circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33137397A JP3150932B2 (en) | 1997-12-02 | 1997-12-02 | Conductive paste for ceramic multilayer circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11163487A JPH11163487A (en) | 1999-06-18 |
JP3150932B2 true JP3150932B2 (en) | 2001-03-26 |
Family
ID=18242968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33137397A Expired - Lifetime JP3150932B2 (en) | 1997-12-02 | 1997-12-02 | Conductive paste for ceramic multilayer circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3150932B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3734731B2 (en) | 2001-09-06 | 2006-01-11 | 株式会社ノリタケカンパニーリミテド | Ceramic electronic component and method for manufacturing the same |
JP4933998B2 (en) * | 2007-09-28 | 2012-05-16 | 株式会社ノリタケカンパニーリミテド | Conductor paste and thick film circuit board |
JP5953003B2 (en) * | 2011-01-17 | 2016-07-13 | 京都エレックス株式会社 | Conductive paste for ceramic multilayer circuit boards |
JP2015043429A (en) * | 2014-09-02 | 2015-03-05 | 京都エレックス株式会社 | Conductive paste for ceramic multilayer circuit board |
JP6856350B2 (en) | 2015-10-30 | 2021-04-07 | Dowaエレクトロニクス株式会社 | Silver powder and its manufacturing method |
-
1997
- 1997-12-02 JP JP33137397A patent/JP3150932B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH11163487A (en) | 1999-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5527627A (en) | Ink composition for an ultra-thick thick film for thermal management of a hybrid circuit | |
JP2001135138A (en) | Conductor paste | |
JPH0387091A (en) | Alumina multilayer wiring board having high dielectric layer | |
KR100286091B1 (en) | Via paste conductive paste and monolithic ceramic substrate manufacturing method using the same | |
JP3507084B2 (en) | Copper conductor composition | |
JP3517062B2 (en) | Copper metallized composition and glass-ceramic wiring board using the same | |
JP3150932B2 (en) | Conductive paste for ceramic multilayer circuit board | |
JP3416044B2 (en) | Conductive paste for low-temperature firing substrates | |
US5346720A (en) | Palladium thick film resistor containing boron nitride | |
US5932326A (en) | Ceramic wiring boards and method for their manufacture | |
JP2006302525A (en) | Conductive paste composition | |
JP5201974B2 (en) | Method for manufacturing metallized substrate | |
JP3649775B2 (en) | Thick film conductive paste composition | |
JP2006093003A (en) | Conductive paste and method of manufacturing circuit board using same | |
JP5953003B2 (en) | Conductive paste for ceramic multilayer circuit boards | |
JP2002197922A (en) | Conductive paste and method for manufacturing of ceramic circuit board | |
JP2002231049A (en) | Conductive paste | |
JP3628146B2 (en) | Low temperature fired ceramic composition and low temperature fired ceramic | |
JP3906881B2 (en) | Conductor composition | |
JP5313526B2 (en) | Conductive paste for low-temperature fired multilayer substrates | |
JP2015043429A (en) | Conductive paste for ceramic multilayer circuit board | |
JP2611290B2 (en) | Manufacturing method of high thermal conductive ceramic substrate | |
JP3631590B2 (en) | Wiring board | |
JP2004165274A (en) | Manufacturing method of low-temperature calcination ceramic circuit substrate | |
WO1994009182A1 (en) | Metal powder composition for metallization and metallized substrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20010109 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080119 Year of fee payment: 7 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080119 Year of fee payment: 7 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080119 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080119 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080119 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090119 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090119 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100119 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110119 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110119 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120119 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120119 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130119 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130119 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140119 Year of fee payment: 13 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |