JP2000010459A - Transfer sheet having light-diffracting structure - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light-diffracting structure transfer sheet having antistatic property to prevent such problems that in a conventional light-diffracting structure transfer sheet forming a hologram or a diffraction grating, the residue of a heat-resistant lubricating layer or the like of the light-diffracting structure transfer sheet deposits on a thermal head by the influences of electrostatic charges of the thermal head used at the time of transferring for a body to be transferred and that the thermal head is corroded by the influences of the residue to cause the failures of the thermal head. SOLUTION: This light-diffracting structure transfer sheet is produced by forming a heat-resistant lubricating layer 4 through a primer layer 3 on one surface of a supporting sheet 2 and laminating a releasable resin layer 5, a protective layer 6, a light-diffracting structure forming layer 7, a light-reflecting layer 8, and an adhesive layer 9 successively on the other surface of the supporting body sheet 2. At least the heat-resistant lubricating layer 4 or the primer layer 3 contains a polythiophene as an antistatic agent.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light diffraction structure transfer sheet having a hologram or a diffraction grating, and more particularly to a novel light diffraction structure transfer sheet made of a specific material and having excellent antistatic properties.

[0002]

2. Description of the Related Art Conventionally, a light having a light diffraction structure used for displaying various pictures, marks and designs on a whole or a part of a card such as a credit card or a cash card by using a hologram or a diffraction grating. Diffraction structure transfer sheets are already known. As an example of these light diffraction structure transfer sheets, a heat-resistant lubricating layer is formed on one surface of a support sheet via a primer layer, and a release resin layer and a protective layer are formed on the other surface of the support sheet. , A light diffraction structure forming layer, a light reflecting layer, and an adhesive layer are sequentially formed.

When a light diffraction structure such as a hologram or a diffraction grating is transferred to a transfer object such as a credit card or a cash card using the light diffraction structure transfer sheet, the light diffraction structure is transferred using a thermal head. The light diffractive structure transfer layer is transferred by applying heat and pressure from the heat-resistant lubricating layer side of the sheet. The thermal head corrodes due to the influence of the attached debris and causes the thermal head to malfunction, and in some cases, the transfer sheet may be stuck due to static electricity. Met.

[0004]

SUMMARY OF THE INVENTION In order to prevent the above-mentioned problems, the present invention provides a method for transferring a light diffraction structure transfer layer of a light diffraction structure transfer sheet to an object to be transferred by using a static electricity generated by a thermal head. It is an object of the present invention to provide an optical diffraction structure transfer sheet having antistatic properties and heat resistance for preventing adverse effects.

[0005]

In order to achieve the above object, the light diffraction structure transfer sheet according to the present invention has a heat-resistant lubricating layer formed on one side of a support sheet via a primer layer. In a light diffraction structure transfer sheet in which a release resin layer, a protective layer, a light diffraction structure forming layer, a light reflection layer, and an adhesive layer are sequentially formed on the other surface of the support sheet, at least the heat-resistant lubricating layer or the The primer layer comprises a conductive polymer as an antistatic agent.

[0006] Further, the conductive polymer has a formula in the presence of a polyanion.

Embedded image In the formula, R ₁ and R ₂ are independently hydrogen or C ₁ ~ ₄ alkyl group, or the corresponding structural units to form a since it optionally an optionally substituted C ₁ ~ ₄ alkylene group with The light diffraction structure transfer sheet is a dispersion of polythiophene comprising:

[0007]

[About the light diffraction structure transfer sheet]

(Support Sheet) As the support sheet used in the light diffraction structure transfer sheet of the present invention, each layer laminated thereon, that is, a primer layer laminated on one surface of the support sheet,
Laminated on the other side of the heat-resistant lubricating layer and the support sheet,
Mold release resin layer, protective layer, light diffraction structure forming layer, light reflection layer,
It has heat resistance and solvent resistance when each layer of the adhesive layer is sequentially formed by coating etc., and when transferring the formed light diffraction structure transfer layer to a base sheet such as a card, a thermal head etc. It is necessary to have heat resistance when using the thermal transfer method, and it is necessary to use a plastic film having the above performance, for example, a biaxially stretched ethylene terephthalate film (hereinafter, simply referred to as a PET film). it can. When a PET film is used, its thickness is preferably from 5 to 250 μm, and more preferably from 5 to 25 μm in consideration of workability, tensile strength, thermal efficiency during thermal transfer, and the like.

(Primer layer) The primer layer formed on one surface of the support sheet is formed mainly of a binder having good adhesion to both the support sheet and the heat-resistant lubricating layer and polythiophene as an antistatic agent. . Examples of the binder include polyester resins, polyurethane resins, polyacrylic resins, polyvinyl formal resins, epoxy resins, polyvinyl butyral resins, polyamide resins, polyether resins, polystyrene resins, and styrene-acrylic resins. Polymeric resins and the like, among these, a water-soluble or water-dispersible polyester resin having a carboxyl group, adhesion to the substrate, compatibility with sulfonated polyaniline, adhesion to the heat-resistant lubricating layer, etc. Particularly preferred in view of the above, for example, Polyester WR-961 from Nippon Synthetic Chemical Industry Co., Ltd.
And can be used in the present invention.

(Antistatic agent) As the polythiophene used as the antistatic agent, in particular, JP-A-7-9006
And polythiophenes of the structural formula described in
Other conductive polymers such as sulfonated polyaniline may be used. The polythiophenes having the structural formula described in the above-mentioned JP-A-7-90060 are as follows.

Formula in the presence of a polyanion

[0011]

Embedded image

[0012] formula, R ₁ and R ₂ represent independently hydrogen or C ₁ ~ ₄ alkyl group, or since it optionally an optionally substituted C ₁ ~ ₄ alkylene group together, preferably optionally alkyl optionally substituted methylene group, optionally C ₁ ~ ₁₂ - alkyl or phenyl optionally substituted 1,2-ethylene group, a 1,3-propylene group or a 1,2-cyclohexylene group, the corresponding The present invention relates to a dispersion of polythiophene composed of the following structural units.

All methyl and ethyl groups are R ₁ and R ₂
Mentioned above as C ₁ ~ ₄ alkyl groups relative.

R ₁ and R ₂ may form together,
The preferred representatives of the optionally optionally substituted C ₁ to ₄ alkylene group α- olefins such as ethene, prop-1
Ene, hex-1-ene, oct-1-ene, des-1
-1,2-alkylene groups derived from 1,2-dibromoalkanes obtained by bromination of -ene, dodes-1-ene and styrene. Other representatives include 1,2-cyclohexyl, 2,3-butylene, 2,3-dimethyl-
There are 2,3-butylene and 2,3-pentylene groups.

Preferred R ₁ and R ₂ are methylene, 1,2-
These are ethylene and 1,3-propylene groups, with 1,2-ethylene being particularly preferred.

The polyanions are polymeric carboxylic acids such as polyacrylic acid, polymethacrylic acid or polymalenic acid, and polymeric sulfonic acids such as polystyrene sulfonic acid and polyvinyl sulfonic acid. Also, these polycarboxylic acids and polysulfonic acids can be copolymers of vinylcarboxylic acid and vinylsulfonic acid with other polymerizable monomers such as acrylates and styrene.

The molecular weight of the polyacid supplying the polyanion is preferably in the range of 1,000 to 2,000,000, more preferably in the range of 2,000 to 500,000.

The polythiophene having the structural formula described in the above-mentioned Japanese Patent Application Laid-Open No. 7-90060 has been commercialized by Bayer AG in Germany under the trade name of the conductive polymer "Baytron P".

The primer layer in the present invention is formed with the above binder and the above polythiophene as main components,
As a forming method, a coating liquid is prepared by dissolving the binder and the polythiophene in a solvent containing water, for example, a mixture of water and a water-soluble organic solvent such as methanol, ethanol, isopropyl alcohol, and non-malpropyl alcohol. An optional additive such as a surfactant for improving the wettability of the base sheet during coating and an antifoaming agent for suppressing bubbles can be added to the coating liquid.
In particular, a phosphate ester-based surfactant is preferably used as the surfactant.

(Heat-resistant lubricating layer) In the present invention, a heat-resistant lubricating layer comprising a thermoplastic resin containing the above-mentioned polythiophene as an antistatic agent is formed on the surface of the primer layer. Polythiophene, which is an antistatic agent, is added to the heat-resistant lubricating layer in the same manner as added to the primer layer to impart antistatic properties to the heat-resistant lubricating layer. Examples of the thermoplastic resin include a polyester resin, a polyacrylate resin, a polyvinyl acetate resin, a styrene acrylate resin, a polyurethane resin, a polyolefin resin, a polystyrene resin, a polyvinyl chloride resin, and a polyether resin. Thermoplastic resins such as resins, polyamide resins, polycarbonate resins, polyethylene resins, polypropylene resins, polyacrylate resins, polyacrylamide resins, polyvinyl chloride resins, polyvinyl butyral resins, polyvinyl acetoacetal resins, or modified silicones thereof. Among them, particularly preferred resins are polyvinyl acetal resins such as polyvinyl butyral resins and polyacetoacetal resins, or isocyanate groups such as modified silicones thereof. A resin having a that hydroxyl group.

In order to form the heat-resistant lubricating layer, a coating solution is prepared by dissolving or dispersing the above-mentioned material in an appropriate solvent such as acetone, methyl ethyl ketone, toluene, xylene or the like, and this coating solution is gravure-coated. Coater, roll coater,
It is formed by coating and drying by a conventional coating means such as a wire bar, and then performing a crosslinking treatment by a heat treatment. The coating amount, that is, the thickness of the heat-resistant lubricating layer is also important, and in the present invention, the solid content is 2.0 g / m ² or less,
Preferably, a heat-resistant lubricating layer having sufficient performance can be formed at a thickness of 0.1 to 1.0 g / m ² .

(Releaseable resin layer) A release resin layer laminated on the other surface of the support sheet by coating or the like adheres well to the support sheet, and a protective layer formed thereon It is preferable to use a resin which can be relatively easily peeled off and which has excellent heat resistance, solvent resistance and the like. As such a resin, for example, various thermosetting resins having excellent crosslinking properties such as a melamine resin can be suitably used. By using such a resin while controlling the degree of crosslinking, the peeling force at the time of transfer can be appropriately adjusted. The releasable resin layer can be formed by a coating method using a reverse roll coater or the like, and its thickness may be thin, and about 0.1 to 4 μm is sufficient.

(Protective Layer) The protective layer provided on the release resin layer serves as an outermost layer of a card or the like after transfer to protect the lower layer, and has transparency, abrasion resistance, and the like. A resin having abrasion resistance, heat resistance, chemical resistance, stain resistance and the like is suitable. As such a resin, for example, acrylic, vinyl, polystyrene, polycarbonate,
Examples include polyester, melamine, epoxy-based resins, and ionizing radiation-curable resins. Specific examples include polyurethane acrylate, polyester acrylate, epoxy acrylate, and polyether acrylate. In order to adjust the density, a polyfunctional or monofunctional monomer may be added and used, or if necessary, a known photoreaction initiator or sensitizer may be added and used. In addition, a polyene / thiol-based ionizing radiation curable resin and the like are also excellent in abrasion resistance and can be preferably used.

If necessary, additives such as a surfactant, an antistatic agent, and an ultraviolet absorber may be added to the resin for the protective layer as described above. Further, a method for providing a protective layer is as follows. After a coating solution is prepared from the resin composition for a protective layer and applied by various known roll coating methods or gravure coating methods, UV (ultraviolet) irradiation or EB (electron beam) irradiation is performed. ) The protective layer can be formed by curing the resin by irradiation or the like. In order to adjust the viscosity, an appropriate organic solvent may be added to the coating solution, if necessary. In this case, after coating, first, hot air drying is performed to remove the organic solvent, and then UV or EB is applied. The curing of the resin may be performed by the irradiation.

The thickness of such a protective layer is 0.5 to 4.0 μm in order to reduce the thickness of the entire light diffraction structure transfer layer.
It is preferable to be within the range. 0.5μ of protective layer thickness
When the thickness is less than m, sufficient abrasion resistance and abrasion resistance cannot be obtained, and when the thickness exceeds 4.0 μm, there is no necessity because the abrasion resistance is already sufficient. This is not preferable because the thickness of the entire transfer layer may increase and the magnetic recording / reading characteristics may decrease.

(Light Diffraction Structure Forming Layer) On the protective layer, there is provided a light diffraction structure forming layer, that is, a layer on which a hologram or a diffraction grating is formed. The light diffraction structure itself can be used for both planar holograms and volume holograms. Specific examples include relief holograms, Lippmann holograms, Fresnel holograms, Fraunhofer holograms, lensless Fourier transform holograms, laser reproduction holograms (image holograms, etc.), self-color light Examples include a reproduction hologram (such as a rainbow hologram), a color hologram, a computer hologram, a hologram display, a multiplex hologram, a holographic stereogram, and a holographic diffraction grating.

The material of the formation layer for forming these light diffraction structures is polyvinyl chloride, acrylic resin (eg, PMM).
A), thermoplastic resins such as polystyrene and polycarbonate, unsaturated polyester, melamine, epoxy, polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate , A thermosetting resin such as melamine (meth) acrylate or triazine acrylate can be used alone, or a mixture of the above-mentioned thermoplastic resin and thermosetting resin can be used. Or a material obtained by adding a radical polymerizable unsaturated monomer to these materials to make them ionizing radiation-curable. In addition, photosensitive materials such as silver salts, dichromated gelatin, thermoplastics, diazo photosensitive materials, photoresists, ferroelectrics, photochromic materials, thermochromic materials, and chalcogen glass can be used.

The method of forming a light diffraction structure using the above materials can be performed by a conventionally known method.
For example, when recording an interference fringe of a diffraction grating or a hologram as a relief of surface unevenness, an original plate on which the diffraction grating or the interference fringe is recorded in the form of unevenness is used as a press mold, and the releasability is formed on the support sheet. On the protective layer of the laminated sheet obtained by sequentially laminating a resin layer and a protective layer, a coating solution of the resin for the light diffraction structure forming layer is applied by means such as a gravure coating method, a roll coating method, and a bar coating method, By forming a coating film, superimposing the original plate thereon, and applying heat and pressure to both by an appropriate means such as a heating roll, the concavo-convex pattern of the original plate can be duplicated. When a photopolymer is used, a photopolymer can be coated on the protective layer of the laminated sheet in the same manner, and then the original can be overlapped and irradiated with a laser beam to perform replication. As described above, the method of recording the diffraction grating or the interference fringes of the hologram on the surface of the light diffraction structure layer as the relief of the surface unevenness is particularly preferable since it has mass productivity and can reduce the cost. The thickness of such a light diffraction structure forming layer is preferably in the range of 0.1 to 6 μm, and more preferably in the range of 0.1 to 4 μm.

(Light Reflecting Layer) When the diffraction grating or the interference fringes of the hologram is recorded as a relief of unevenness on the surface of the light diffraction structure forming layer as described above, the light reflecting layer is formed in order to increase the diffraction efficiency. Preferably, it is formed on the relief surface.
When a light reflecting metal thin film is formed on the relief surface as the light reflecting layer, a reflection type light diffraction structure can be obtained. When a transparent thin film is formed on the relief surface, a transparent light diffraction structure can be obtained. These can be appropriately selected according to the purpose. As the light reflection layer of the light diffraction ellipse forming layer in the present invention, since an information display and other printing layers are also provided below the light diffraction structure forming layer, it is necessary to have these transmissive properties, Those having properties are used.

Examples of the material of such a light reflecting layer include a continuous thin film of a substance having a different refractive index from that of the light diffraction structure forming layer and a metal thin film. The thickness of the continuous thin film may be a transparent region of a material forming the thin film, but is usually 100 to 100.
1000 ° is preferred. Examples of a method for forming a continuous thin film on the relief surface include a thin film forming method such as a vacuum deposition method, a sputtering method, and an ion plating method. The continuous thin film may have a refractive index larger or smaller than that of the light diffraction structure forming layer, but the difference in the refractive index is preferably 0.3 or more, and the difference is 0.5 or more, and more preferably 1.0 or more. More preferably, there is.

As the continuous thin film having a higher refractive index than the light diffraction structure forming layer, ZnS, TiO ₂ , Al ₂ O ₂ , Sb ₂
Examples include S ₃ , SiO, TiO, and SiO ₂ . As a continuous thin film having a smaller refractive index than the light diffraction structure forming layer,
LiF, MgF ₂ , AlF _{3 and the} like can be mentioned. Also,
When the thickness is 200 ° or less, since the light transmittance is relatively small, it can be used as a light reflecting layer while being transparent. Further, a transparent synthetic resin having a different refractive index from the light diffraction structure forming layer, for example, a layer of polytetrafluoroethylene, polychlorotriploethylene, polyvinyl acetate, polyethylene, polypropylene, polymethyl methacrylate is used as the light reflecting layer. It can also be used.

(Adhesive Layer) An adhesive layer is provided on the light reflecting layer. The material of the adhesive layer has good adhesion to the light reflection layer,
Further, at the time of transfer, a material that can firmly adhere to a transfer object such as a magnetic card is preferable. Specifically, vinyl chloride resins, vinyl acetate resins, vinyl chloride-vinyl acetate copolymer resins, acrylic resins, polyester resins, polyurethane resins, polyamide resins, rubber modified products, and the like. Suitable ones can be selected from among them, and these can be used alone or in a mixed system of two or more kinds, and can be used by further adding a hard resin, a plasticizer, and other additives as necessary. it can.

The adhesive layer formed of the above materials is
Usually, the material can be formed by applying a solution in the form of a solution, applying the solution with a roll coater or the like, and drying.
The thickness of the adhesive layer is preferably in the range of 0.5 to 5 μm,
The range of 1.5 to 3 μm is more preferable.

As described above, the heat-resistant lubricating layer is formed on one side of the support sheet via the primer layer, and the releasable resin layer, the protective layer, and the light-transmitting layer are formed on the other side of the support sheet. In a light diffraction structure transfer sheet in which a diffraction structure forming layer, a light reflection layer, and an adhesive layer are sequentially formed, at least the heat-resistant lubricating layer or the primer layer contains a conductive polymer polythiophene as an antistatic agent. An optical diffraction structure transfer sheet is formed. Although the conductive polymer polythiophene is contained as an antistatic agent, the conductive polymer polythiophene may be contained as an antistatic agent in one of the heat-resistant lubricating layer and the primer layer. In order to obtain the prevention effect, it is effective to include the conductive polymer polythiophene as an antistatic agent in both the heat-resistant lubricating layer and the primer layer.

[0035]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in more detail with reference to the drawings. However, the present invention is not limited to these drawings and examples.

FIG. 1 shows an optical diffraction structure transfer sheet 1 according to the present invention.
FIG. 2 is a schematic cross-sectional view illustrating a configuration of one example. In FIG. 1, the light diffraction structure transfer sheet 1 has a heat-resistant lubricating layer 4 formed on one surface of a support sheet 2 via a primer layer 3, and a release resin on the other surface of the support sheet 2. Layer 5
And a protective layer 6, a light diffraction structure forming layer 7, a light reflection layer 8, and an adhesive layer 9 are sequentially formed as a light diffraction structure transfer layer 10. The protective layer 6 is made of an ionizing radiation-curable resin having a thickness of 0.5 to 4.0 μm. It is configured to have a durability of 100 times or more in a wear resistance test.

When the light diffraction structure transfer layer 10 is transferred onto a transfer object such as a magnetic card, for example, the surface of the adhesive layer 9 of the light diffraction structure transfer sheet 1 is overlapped with the transfer object surface. The adhesive layer 9 is melted or softened and adhered to the surface of the transfer-receiving member by heating and pressing from the heat-resistant lubricating layer 4 side by a hot press device or a hot stamping device. Thereafter, by peeling the support sheet 2,
It is easily peeled off at the interface between the release resin layer 5 and the protective layer 6, and the light diffraction structure transfer layer 10 having the protective layer 6 as the outermost layer is transferred to the transfer object.

FIG. 2 shows the light diffraction structure transfer sheet 1 of the present invention.
Of the light diffraction structure transfer layer 10 of the card base material 1
FIG. 2 is a schematic cross-sectional view illustrating a configuration of an embodiment of a card 12 with a light diffraction structure transferred to the surface of No. 1;

Hereinafter, a specific example will be described. Example 1 (Preparation of Light Diffraction Structure Transfer Sheet) A 12 μm-thick biaxially stretched transparent PET film (single-sided corona discharge treatment) was used as the support sheet 2, and the corona discharge-treated surface had the following composition. The coating liquid for a mold resin layer was applied by a gravure reverse coating method so that the thickness at the time of drying was 0.5 μm, to prepare a support sheet 2 on which a mold release resin layer 5 was laminated. Composition of coating solution for release resin layer Melamine resin 5 parts by weight Solvent Methyl alcohol 25 parts by weight Solvent Ethyl alcohol 45 parts by weight Cellulose acetate resin 1 part by weight Paratoluenesulfonic acid 0.05 part by weight

Next, a coating liquid for a protective layer having the following composition is applied onto the release resin layer 5 by a gravure reverse coating method so that the thickness after curing becomes 0.5 μm. Equipment (High pressure mercury lamp 2 with output 160W / cm2)
UV light was applied at a dose of 500 mJ / cm ² to cure the coating, thereby forming the protective layer 6. Composition of coating solution for protective layer Polyurethane acrylate (prepolymer) 20 parts by weight Dipentaerythritol hexaacrylate 100 parts by weight 2-hydroxyethyl acrylate 5 parts by weight Photopolymerization initiator 1 part by weight Sensitizer 1 part by weight

Next, a coating solution for forming an optical diffraction structure having the following composition was applied onto the protective layer 6 by a gravure rivers coating method so that the thickness when dried became 2 μm.
The resin layer was dried at 0 ° C. for 1 minute to form a resin layer for forming an optical diffraction structure. Composition of coating solution for forming optical diffraction structure layer Acrylic resin 40 parts by weight Melamine resin 10 parts by weight Solvent Cyclohexanone 50 parts by weight Solvent Methyl ethyl ketone 25 parts by weight

A hologram master is placed on a resin layer for forming the light diffraction structure, and the hologram master is placed at 150 ° C. and 50 kg / h.
After forming the hologram relief by heating and pressing under the condition of cm ² for 1 minute, the hologram master was peeled off to form the light diffraction structure forming layer 7 having the hologram relief. Next, a film thickness of 50 nm was formed on the hologram relief forming surface of the light diffraction structure forming layer 7 by magnetron sputtering.
A light reflecting layer 8 was formed by forming a 0 ° thin film layer.

An adhesive layer coating solution having the following composition was applied onto the light reflecting layer 8 by a gravure reverse coating method so as to have a dry thickness of 2 μm, and dried to form an adhesive layer 9. Composition of coating solution for adhesive layer Vinyl chloride-vinyl acetate copolymer 20 parts by weight Acrylic resin 10 parts by weight Solvent Ethyl acetate 20 parts by weight Solvent Toluene 50 parts by weight

On the other side of the support sheet 2,
0.1μm when the following ink is dried using Miyabar ^# 5
After coating so as to have a thickness of 0.1 g / m ² ,
It was dried with hot air to form a primer layer 3 (antistatic layer).

Composition of Ink for Primer Layer (Antistatic Layer) Polythiophene (manufactured by Bayer, 10% aqueous solution of solid content) 0.25 parts by weight (solid content) Water-soluble polyester resin (Polyester WR-961, Nippon Synthetic Chemical Industry Co., Ltd.) 4.75 parts by weight (solid content) Phosphate ester surfactant (Plysurf 217E, manufactured by Daiichi Kogyo Seiyaku) 0.2 parts by weight Water 44.8 parts by weight isopropyl alcohol 50.0 Parts by weight

The following ink for a heat-resistant lubricating layer is applied to the surface of the primer layer 3 so as to have a thickness of 1.0 μm when dried, then dried with warm air, and further cured by heating in an oven at 60 ° C. for 5 days. By performing the treatment, the heat-resistant lubricating layer 4 was formed.

Composition of ink for heat-resistant lubricating layer Polythiophene (manufactured by Bayer, 10% solids aqueous solution)) 0.5 parts by weight (solids) Polyvinyl butyral resin (BX-1: manufactured by Sekisui Chemical) 80 parts by weight Polyishi Cyanate curing agent (Takenate D218, manufactured by Takeda Pharmaceutical) (NCO / OH = 1.8) 35 parts by weight Phosphate ester (Plysurf 208S, manufactured by Daiichi Kogyo Seiyaku) 5 parts by weight Solvent (MEK / toluene = 1/1) 500 parts by weight

Using the light diffraction structure transfer sheet prepared in Example 1 above, the light diffraction structure transfer layer was transferred onto a card substrate by a thermal head transfer type card printer. Good transfer was performed without adhesion or sticking of the transfer sheet due to static electricity.

[0049]

As described above in detail, the light diffraction structure transfer sheet of the present invention has at least a primer layer or a heat-resistant lubricating layer laminated on a support sheet containing polythiophene as a conductive polymer. Because of the antistatic effect of the thermal head, the heat of the heat-resistant lubricating layer adheres to the thermal head due to the static electricity generated by the thermal head, and the thermal head corrodes due to the influence of the adhered debris, causing a failure of the thermal head. Or become
In addition, there is an effect that problems such as sticking of the transfer sheet due to static electricity are prevented.

[0050]

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing one embodiment of a light diffraction structure transfer sheet according to the present invention.

FIG. 2 is a schematic cross-sectional view showing one embodiment of a state where a light diffraction structure transfer layer of the light diffraction structure transfer sheet according to the present invention is adhered to a card base material.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 light diffraction structure transfer sheet 2 support sheet 3 primer layer 4 heat-resistant lubricating layer 5 release resin layer 6 protective layer 7 light diffraction structure forming layer 8 light reflection layer 9 adhesive layer 10 light diffraction structure transfer layer 11 card base 12 Card with light diffraction structure

Claims (2)

[Claims] 1. A heat-resistant lubricating layer (4) is formed on one surface of a support sheet (2) via a primer layer (3), and a release property is formed on the other surface of the support sheet (2). Resin layer (5),
In the light diffraction structure transfer sheet (1) in which a protective layer (6), a light diffraction structure forming layer (7), a light reflection layer (8), and an adhesive layer (9) are sequentially formed, at least the heat-resistant lubricating layer ( 4) The light diffraction structure transfer sheet, wherein the primer layer (3) contains a conductive polymer as an antistatic agent. 2. The method according to claim 1, wherein the conductive polymer has a formula in the presence of a polyanion. In the formula, R ₁ and R ₂ are independently hydrogen or C ₁ ~ ₄ alkyl group, or the corresponding structural units to form a since it optionally an optionally substituted C ₁ ~ ₄ alkylene group with The light diffraction structure transfer sheet according to claim 1, which is a dispersion of polythiophene comprising: