JP2000001602A - Resin composition for sealing, and semiconductor device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a sealing resin composition having good repletion and workability in transfer molding, little in wear of an equipment in the molding process and smaller internal stress in electric parts by compounding silica filler with a thermosetting resin and to provide a semiconductor device. SOLUTION: This resin composition comprises 100 pts.wt. thermosetting resin and 100-2,000 pts.wt. silica filler, and this semiconductor device is produced by sealing the semiconductor chip with the cured product of the sealing resin composition in which the thermosetting resin is an epoxy resin. The silica filler is silica pulverized powder prepared by grinding particles among one another in an aqueous medium while pressing crushed silica from outside to round the rough edges of silica particle, has 200-300 μm maximum particle diameter and 7-35 μm average particle diameter, and contains >=12 wt.% pulverized silica having <=3 μm particle diameter and >=2 wt.% pulverized silica having <=1 μm particle diameter.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sealing resin composition used for sealing an electronic component such as a semiconductor chip by transfer molding or the like, and a semiconductor device resin-sealed with the composition.

[0002]

2. Description of the Related Art Electronic components such as semiconductor chips are sealed with a ceramic package or a resin package in order to protect them from an external environment. A synthetic resin composition containing an inorganic filler has been widely used.

[0003] This synthetic resin composition is composed of a thermosetting resin such as an epoxy resin and an inorganic filler such as silica. However, these synthetic resin compositions have a small coefficient of thermal expansion and a good thermal conductivity. , Low moisture permeability, excellent mechanical properties, etc.
In addition, since a low-cost one is desirable, it is necessary to mix this inorganic filler in as large an amount as possible, as long as its moldability is allowed.

[0004] However, the inorganic powder used as a filler is mainly crushed into a powder having an appropriate size and distribution. When a resin is kneaded to form a sealing material, the fluidity is not sufficient, the filling property and the workability are poor, and the devices used in the molding process have the drawback of being significantly worn. It has also been reported that, even for a semiconductor chip to be sealed, sharp sharp corners of the filler particles damage the surface of the semiconductor element, which causes a soft error.

Generally, when a thermosetting resin is cured,
Shrinkage causes stress, but in addition to this stress,
When the temperature rises due to heat generated from the semiconductor element, there is a stress generated due to a large difference in thermal expansion coefficient between the semiconductor substrate and the sealing resin composition. Of these internal stresses,
In order to alleviate the latter stress, it is usually desirable to fill the inorganic filler having a low coefficient of thermal expansion as much as possible. However, also in this aspect, in the case of a square filler produced by pulverization, an increase in the amount of the filler extremely decreases the flowability, so that the amount of the filler must be limited, and under such restrictions, It does not help alleviate internal stress.

In order to solve such a problem, for example, according to JP-A-58-145613 or JP-A-61-118131, silica fine powder is ejected from a nozzle together with a gas flow to form particles. There has been proposed a method for producing spherical fused fine powder silica by controlling dispersion, melting, cooling and the like of the powder under appropriate conditions. However, this method has the disadvantage of increasing costs.

On the other hand, a method for producing rounded silica fine powder of crystalline spherical silica is disclosed in
No. -60053 (a method for producing silica fine powder particles) has been published. However, this method has drawbacks such as an increase in the impurity ion concentration of the silica filler and an increase in the water content of the silica filler.

[0008]

SUMMARY OF THE INVENTION An object of the present invention is to provide a thermosetting resin composition containing a silica filler, which is suitable for transfer molding, has good filling properties and workability, and is used in a molding process. It is an object of the present invention to provide a sealing resin composition and a semiconductor device in which the wear of the device is small and the internal stress of the electronic component is small.

[0009]

Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and as a result, the maximum particle
0 μm or more and 300 μm or less, average particle diameter of 7 μm or more and 35 μm or less
It has been found that a silica powder containing 12% by weight or more of fine particle silica of 3 μm or less and 3% or less and 2% by weight or more of fine particle silica of 1 μm or less has more excellent properties as a silica filler.

[0010] Furthermore, if the fine silica powder particles obtained by grinding the particles in the presence of an aqueous medium while applying a pressing force from the outside and rounding the corners of the silica particles are blended with the thermosetting resin, the filling property in transfer molding can be improved. It has also been found that a thermosetting resin composition suitable for transfer molding with good workability, little wear of the device in the molding process, and small internal stress of the semiconductor device can be obtained, and completed the present invention. Things.

That is, the present invention comprises a thermosetting resin and a silica filler, and the silica filler grinds the particles in the presence of an aqueous medium while applying an external pressing force to the crushed silica. A silica fine powder having rounded and rounded silica particles having a maximum particle diameter of 200 μm or more and 300 μm or less, an average particle diameter of 7 μm or more and 35 μm or less, and 3 μm or less. It is characterized in that it contains not less than 12% by weight and not more than 1 μm of fine particle silica of 2% by weight or more, and is blended in a ratio of 100 to 2,000 parts by weight of the silica filler to 100 parts by weight of the thermosetting resin. A semiconductor device comprising: a sealing resin composition; and a semiconductor chip sealed with a cured product of the sealing resin composition in which the thermosetting resin is an epoxy resin.

Hereinafter, the present invention will be described in detail.

The crushed silica used in the present invention may be either crystalline silica or fused silica. As the crystalline silica, natural high-purity silica, quartz sand, quartz or the like is generally used. It is obtained by melting silica at a high temperature to form an ingot. Usually, these are crushed by a jaw crusher, a roll crusher or the like, and these crushed products are further finely crushed by a ball mill or the like, and used as crushed silica in the present invention. The average particle size of the crushed silica obtained here must be slightly larger than that of the silica filler which is rounded at the corners of the final product.

In the present invention, while applying a pressing force to the crushed silica from the outside, the particles are ground together in the presence of an aqueous medium to produce fine silica powder. It is not transmitted smoothly to the body, and the grinding efficiency is extremely low. Typically 0.5-18 for crushed silica
%, Preferably 3 to 13% of an aqueous medium effectively acts on the attrition.

As the aqueous medium to be used, any liquid may be used as long as the fine silica particles interact with each other and the pressure from the outside to the powder is easily transmitted. Liquid substances such as water, alcohols and mineral oil are advantageously used. However, water alone or a medium in which alcohols such as ethanol and methanol are dissolved in water can be used most industrially in view of the cost of the medium, ease of handling during operation, ease of separation after operation, and the like.

In the present invention, the pressing force applied to the crushed silica from the outside cannot be numerically limited because the pressing method differs depending on the machine. However, when the pressing force is too strong, not only the cornering but also the particle volume Destruction occurs, crushing proceeds, and cornering is hindered. In addition, if it is too weak, the efficiency of the squaring decreases, so it may be appropriately determined according to the machine, raw material, type (crystalline, non-crystalline) and the like. In addition, a crushed product having a size of several mm or less can be directly sent to the de-squaring step, and the de-sizing operation can be performed simultaneously with the pulverization to a desired particle size.

There are various methods for grinding the particles while applying a pressing force from the outside as described above, but a roller mill can be used most effectively from the viewpoint of cost and efficiency of energy and the like.

The silica filler used in the present invention contains the silica fine powder obtained as described above. The maximum particle size of the silica filler is 200 μm or more and 300 μm or less, preferably 200 μm or more and 250 μm or less. If the particle diameter exceeds 300 μm, it is not possible to use because the clogging occurs in the step of resin sealing of the semiconductor. Furthermore, the average particle size is 7 μm
Not less than 35 μm. If it is less than 7 μm or more than 35 μm, good fluidity of the resin composition is impaired.

Next, regarding the abundance of the particulate silica in the silica filler, good fluidity is obtained when the particulate silica having a particle size of 3 μm or less is contained at 12% by weight or more and the particulate silica having a particle size of 1 μm or less is contained at 2% by weight or more. It is possible to achieve high filling. However, the fine silica having a particle diameter of 3 μm or less does not necessarily have to take a corner and be rounded, and may be crushed fine particles. In any case, if it is more than this, the fluidity of the resin composition decreases. In addition, 1 μm
The upper limit of the abundance of the following fine particle silica is determined by the above-mentioned range definition of the average particle diameter.

The above-mentioned silica filler having an average particle diameter of 7 to 35 μm and fine particles in a desired ratio can be obtained by appropriately adjusting the pressing force, the rotation speed, the amount of the aqueous medium, and the like. In addition, crushed silica having a particle size of 3 μm or 1 μm or less can be obtained by classification before, during or after the main treatment.

The sealing resin composition of the present invention is obtained by mixing the above-mentioned silica filler with a thermosetting resin.

The thermosetting resin used here includes, for example, urea resin, melamine resin, phenol resin, resorcinol resin, epoxy resin, polyurethane resin, vinyl acetate resin, polyvinyl alcohol resin, acrylic resin, vinyl urethane resin, silicone resin , Α-olefin maleic anhydride resin, polyamide resin, polyimide resin and the like, and these can be used alone or in combination of two or more. Among them, epoxy resins are industrially advantageously used. By mixing the silica filler of the present invention in an amount of 100 to 2,000 parts by weight with respect to 100 parts by weight of the thermosetting resin, a desired resin composition can be obtained. The amount of the curing agent and curing catalyst required for the thermosetting resin is included in 100 parts by weight of the thermosetting resin. When the amount of the silica filler is less than 100 parts by weight, the effect of lowering the internal stress is not seen. When the amount is more than 2,000 parts by weight, the fluidity of the resin is unpreferably reduced. As a method of kneading the filler with the thermosetting resin, usually, a kneader, a roll mill, a mixer, or the like may be used.

The encapsulating resin composition of the present invention contains the above-mentioned silica filler and thermosetting resin as main components, but it does not detract from the object of the present invention. Solvents, coupling agents, and other additives can be blended. Examples of the solvent include dioxane, hexane, benzene, toluene, solvent naphtha, industrial gasoline, cellosolve acetate, ethyl cellosolve, butyl cellosolve acetate, butyl carbitol acetate, dimethylformamide, dimethylacetamide, N
-Methylpyrrolidone and the like, which may be used alone or 2
A mixture of more than one species can be used.

The semiconductor device of the present invention can be easily manufactured by sealing a semiconductor chip with the above-mentioned sealing resin composition according to a conventional method.

[0025]

According to the present invention, the sealing resin composition of the present invention is prepared by blending a thermosetting resin with a silica filler having a rounded corner, a specific particle size distribution, and a specific amount of particulate silica. Is obtained. By using this sealing resin composition, it is possible to manufacture a semiconductor device having good filling properties and workability in transfer molding, reduced wear of the device in the molding process, and small internal stress.

[0026]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples.

Example 1 A fine silica powder which was obtained by grinding particles in the presence of an aqueous medium while applying a pressing force to the crushed silica from the outside to make corners of the silica particles round and rounded. Particle size is 230 μm, average particle size is 27 μm, and 3
A silica filler A containing 17% by weight of fine silica particles having a particle size of 1 μm or less and 4.5% by weight of fine particle silica particles having a particle size of 1 μm or less was mixed with 100 parts by weight of an epoxy resin in parts by weight shown in Table 1. Then, after kneading with a roll mill, cooling and pulverizing,
Epoxy resin compositions 1 to 4 were obtained.

Comparative Example 1 Similarly, a rounded silica fine powder having a maximum particle size of 180 μm, an average particle size of 18 μm, and
Silica filler B having a content of fine particle silica of 1 μm or less of 19% by weight and a content of fine particle silica of 1 μm or less of 7.3% by weight is mixed with 100 parts by weight of the epoxy resin in parts by weight shown in Table 2. Then, after kneading with a roll mill, cooling and pulverizing,
Epoxy resin compositions 5 to 8 were obtained.

Comparative Example 2 An angular silica fine powder having a maximum particle size of 120 μm
A silica filler C having an average particle diameter of 25 μm, a content of fine particle silica of 3 μm or less of 15% by weight, and a content of fine particle silica of 1 μm or less of 3.3% by weight, 100 parts by weight of epoxy resin With the parts by weight shown in Table 3,
After kneading with a roll mill, the mixture was cooled and pulverized to obtain epoxy resin compositions 9 to 12.

In order to check the fluidity of the epoxy resin compositions prepared in Example 1 and Comparative Examples 1 and 2, the flow viscosity and spiral flow were measured, and the results are shown in Tables 1 to 3, respectively. . The resin compositions of Nos. 1 to 4 using the silica filler A in Example 1 were compared with Comparative Examples 1 to 4.
Nos. 5 to 12 using silica fillers B and C in No. 2
The resin composition was more excellent in fluidity than the resin composition described above, the viscosity of the resin composition was low even when the filler was filled at a high level, the moldability and the workability were excellent, and the effect of the present invention was confirmed.

[0031]

[Table 1] * 1: Cresol novolak epoxy resin-novolak phenol resin equivalent weight blend, organophosphorus catalyst. * 2: 175 ° C, load 10kg (Shimadzu flow tester CFT-500 type). * 3: Cured at 175 ° C for 2 minutes, according to EMMI Standard 1-166.

[0032]

[Table 2] * 1: Cresol novolak epoxy resin-novolak phenol resin equivalent weight blend, organophosphorus catalyst. * 2: 175 ° C, load 10kg (Shimadzu flow tester CFT-500 type). * 3: Curing at 175 ° C for 2 minutes, according to EMMI Standard 1-166

[0033]

[Table 3] * 1: Cresol novolak epoxy resin-novolak phenol resin equivalent weight blend, organophosphorus catalyst. * 2: 175 ° C, load 10kg (Shimadzu flow tester CFT-500 type). * 3: Curing at 175 ° C for 2 minutes, according to EMMI Standard 1-166

[0034]

By using the thermosetting resin composition containing the silica filler of the present invention for sealing electronic parts such as semiconductors, the fluidity and abrasion in the transfer molding step are improved and the sealing property is improved. It also helps to reduce the internal stress of the fastener and improves both workability and characteristics.

Continued on the front page F term (reference) 4J002 BE021 BF021 BG021 BH001 CC031 CC161 CC181 CD001 CK001 CK041 CL001 CP031 DJ016 FD016 GQ05 4J037 AA18 CC23 DD05 EE29 EE43 EE47 FF11 4M109 EA02 EB06 EB13 EC20

Claims (2)

[Claims] 1. A silica filler comprising a thermosetting resin and a silica filler, wherein the silica filler grinds the particles in the presence of an aqueous medium while applying a pressing force to the crushed silica from the outside to thereby form corners of the silica particles. Taking, rounded silica fine powder, having a maximum particle diameter of 200 μm or more and 300 μm or less, an average particle diameter of 7 μm or more and 35 μm or less, and
It contains 12% by weight or more of fine particle silica of 3 μm or less, 2% by weight or more of fine particle silica of 1 μm or less, and 100 to 2000 parts by weight of the silica filler in 100 parts by weight of the thermosetting resin.
A resin composition for sealing, which is blended in a ratio of parts by weight. 2. A semiconductor device wherein a semiconductor chip is sealed with a cured product of the sealing resin composition according to claim 1, wherein the thermosetting resin is an epoxy resin.