JP1643124S - - Google Patents

Info

Publication number
JP1643124S
JP1643124S JPD2018-16239F JP2018016239F JP1643124S JP 1643124 S JP1643124 S JP 1643124S JP 2018016239 F JP2018016239 F JP 2018016239F JP 1643124 S JP1643124 S JP 1643124S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2018-16239F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2018-16239F priority Critical patent/JP1643124S/ja
Priority to TW107307217D02F priority patent/TWD208176S/zh
Application granted granted Critical
Publication of JP1643124S publication Critical patent/JP1643124S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2018-16239F 2018-07-25 2018-07-25 Active JP1643124S ( )

Priority Applications (2)

Application Number Priority Date Filing Date Title
JPD2018-16239F JP1643124S ( ) 2018-07-25 2018-07-25
TW107307217D02F TWD208176S (zh) 2018-07-25 2018-12-11 半導體製造用晶圓支持器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-16239F JP1643124S ( ) 2018-07-25 2018-07-25

Publications (1)

Publication Number Publication Date
JP1643124S true JP1643124S ( ) 2019-10-07

Family

ID=68095714

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2018-16239F Active JP1643124S ( ) 2018-07-25 2018-07-25

Country Status (2)

Country Link
JP (1) JP1643124S ( )
TW (1) TWD208176S ( )

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD699199S1 (en) 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode plate for a plasma processing apparatus
USD709536S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD699200S1 (en) 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD709537S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709538S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709539S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD724553S1 (en) 2013-09-13 2015-03-17 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
JP1546800S ( ) 2015-06-12 2016-03-28
USD810705S1 (en) 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD802634S1 (en) 2015-10-23 2017-11-14 Flow International Corporation Contour follower for a fluid jet cutting machine
USD797691S1 (en) 2016-04-14 2017-09-19 Applied Materials, Inc. Composite edge ring
USD815385S1 (en) 2016-10-13 2018-04-10 Entegris, Inc. Wafer support ring
USD830981S1 (en) 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus

Also Published As

Publication number Publication date
TWD208176S (zh) 2020-11-11

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